Abstract: A drying device comprising a titano-alumino-phosphate with thermal management for the more efficient drying of objects and appliances, and its production. Further, a drying method for obtaining dried objects and appliances, as well as a method for regeneration accompanied by the desorption of water from water-containing titano-alumino-phosphate.

Abstract: A modular system according to one embodiment of the invention for treating a fabric load comprises a first module and a second module. The first module can include a chamber having an interior for holding a fabric load, and the second module can have at least one of a fluid delivery system, a fluid removal system, and a fluid recycling system. The modular system can further include conduits for coupling the systems of the second module with the first module.

Abstract: A substrate treating apparatus for drying substrates with a solvent vapor after treating the substrates with a treating liquid, includes a solvent vapor supply device for supplying the solvent vapor into a treating chamber, an exhaust device for exhausting gas from the chamber through an exhaust pipe, a drain pipe connected to the chamber for draining the treating liquid from the chamber, a gas-liquid separator at the other end of the exhaust pipe for receiving the gas from the exhaust device, and connected to the other end of the drain pipe for receiving the treating liquid from the drain pipe, the gas-liquid separator separating the gas and the liquid, and a mixer mounted on the exhaust pipe for mixing deionized water into the gas exhausted by the exhaust device.

Abstract: The removal of moisture from an object to be sterilized is provided through at least the steps of placing the load in the chamber, reducing the pressure within the chamber to increase the rate of evaporation of moisture from the load, monitoring over a predetermined period of time the increase in the quantity of vapor within the chamber resulting from evaporation of moisture from the load, admitting gas into the chamber and repeating the steps following placing the load into the chamber.

Abstract: The removal of moisture from an object to be sterilized is provided through at least the steps of placing the load in the chamber, reducing the pressure within the chamber to increase the rate of evaporation of moisture from the load, monitoring over a predetermined period of time the increase in the quantity of vapor within the chamber resulting from evaporation of moisture from the load, admitting gas into the chamber and repeating the steps following placing the load into the chamber.

Abstract: A dryer device having a receiving chamber for receiving textiles and drying agents including a vacuum pump for creating a vacuum in the receiving chamber. A drying method includes introducing textiles and drying agents, particularly based on zeolite, into the receiving chamber, followed by a vacuum being created in the receiving chamber.

Abstract: A method and a reaction apparatus which can safely and continuously treat/discharge especially a short object is treated without any direct contact with a gas atmosphere, and which surely/efficiently treats the object with a gas without any uneven treatment. A short object A to be treated is put in a hermetically sealed cylindrical treatment section 1. In the treatment section 1, the object is held in a predetermined position by a first operation piece 11 to be treated with a gas for a predetermined time. Then, the holding by the first operation piece is released to move the object A by a desired distance. Subsequently, the object is held in a predetermined position by a second operation piece 12 to be treated again with the gas for a predetermined time, and then a treated object A1 is discharged. This discharged treated object A1 is conveyed to the outside of the apparatus.

Abstract: A substrate treating apparatus for drying substrates with a solvent vapor after treating the substrates with a treating liquid.

Abstract: An apparatus and a method are described to dry solid objects being manufactured in a chain of steps. The apparatus contains a cartridge to hold the objects, a chamber to house the cartridge, nozzle sections to spray drying agents on the objects, and a vacuum section to remove the drying agent and the released solvent. The apparatus also contains an optical radiation source such as an IR lamp for heating the objects, which can be used in conjunction with the vacuum section for removing solvent and drying steps. The cartridge or the nozzles can be swayed changing the orientation of the objects and the nozzles. The spraying step and evacuating steps can be repeated as needed.

Abstract: A lithographic mask is placed in a chamber which is then sealed. The gas pressure in the chamber is reduced to dislodge contaminant particles on the mask surface.

Abstract: Provided is a method of manufacturing incombustible wood that enables maximization of the amount of an incombustion agent used to be impregnated into wood. Further provided is a method of manufacturing incombustible wood that completely satisfies incombustible-wood conditions required by the Building Standard law and that can be relatively easily manufactured. The method of manufacturing incombustible wood includes performing plural times of individual drying steps for drying wood (for example, board material B), decompression steps for decompressing the wood, decompression impregnation steps for impregnating the wood with an incombustibility treatment agent in a decompressed state, and compression impregnation steps for impregnating the wood with the incombustibility treatment agent in a compressed state, wherein two times of the individual decompression steps, individual decompression impregnation steps, and compression impregnation steps are performed, and three times of the drying steps are performed.

Abstract: The invention concerns a method for obtaining dry plant extracts under mild conditions, in which a liquid plant extract is introduced into a vacuum drying equipment having a multi-shaft stirrer extending through a cylindrical mixing and drying chamber and with its own drive, together with a chopper rotating through a stator, and the liquid plant extract is dried at a vessel shell temperature of 20° C. to 50° C., a product temperature between 20° C. and 40° C., a pressure between 0.

Abstract: An improved process for removing trace solvent from a material comprises rewetting the product with water during the drying process. Finished products such as suramin are produced efficiently to a high quality on a factory scale.

Abstract: A cake resistance measuring system and method are used to measure the cake resistance of a freeze dried sample during or after processing, with the results of the measurement being used to improve that processing and/or subsequent freeze drying processes or formulations.

Abstract: By a simple apparatus construction and process, it is made possible to “clean precisely” a surface at the molecular/atomic level, and the purification degree of the surface processed minutely is made into 1012 molecules/cm2 or less. A steam-spraying nozzle is disposed such that a line slit nozzle is in a diameter direction, and mist-containing steam is sprayed onto the surface of a substrate. Thereby, particles in the steam-spraying surface (the particles were made to adhere by dipping the substrate in a solution containing polystyrene (particle diameter of 0.6 &mgr;m) or alumina (particle diameter of 0.3 &mgr;m to 0.5 &mgr;m) particles at 105 particles/ml.) are removed by about 90% to 95% after ten-seconds spraying, and by 99% or more, that is, to less than the detection limit of a wafer inspection device, after twenty-seconds spraying.

Abstract: Method and apparatus are disclosed for improving the cleaning efficiency of a high density plasma system by introducing thermally hot gases to heat downstream chamber walls to improve the fluorine attack on deposit coatings. In certain embodiments of the invention, the cleaning gas and thermally hot gas are allowed into the region of the high vacuum pump to provide cleaning of the high vacuum pump.

Abstract: An apparatus and method for reducing particles in reactors. The apparatus includes an enclosure with a wafer handling chamber connected by an isolation gate valve to a processing chamber. Pipes deliver purge gas into the wafer handling chamber to eliminate particles from the enclosure. A pilot operated back pressure regulator regulates the delivery and removal of the purge gas. The apparatus actuates the isolation gate valve in a controlled rate to reduce disturbances from the purge gas entering into the enclosure. A Bernoulli wand is provided for lifting and holding a single semiconductor wafer. A dome loaded regulator actuated by a pilot gas is used to control the ramp rates of gas to the Bernoulli wand. The ramping rates of the Bernoulli wand gas can be controlled by restrictions and check valves in the pilot gas line. The apparatus also utilizes ionizers in the purge gas lines entering the wafer handling chamber and load locks.

Abstract: A method of removing water from the surface of a silicon wafer or other substrate subjected to wet processing which includes a step of water rinsing. In this method a silicon wafer whose surface includes liquid water is disposed in an atmosphere saturated with water vapor. The water vapor is removed from the surface of the silicon wafer by a stream of water-saturated gas. Upon removal of liquid water from the surface of the silicon wafer the water vapor in the water vapor saturated atmosphere is removed by evaporation.

Abstract: A method of and an apparatus for drying a wafer using the Marangoni effect quickly forms an isopropyl alcohol layer on a cleaning liquid in which the wafer is submerged. The isopropyl alcohol is first heated and then supplied in a fluid state onto the cleaning liquid. The isopropyl alcohol liquid thus diffuses rapidly to form the isopropyl alcohol layer. The wafer is thoroughly dried by removing it from the cleaning liquid through the isopropyl alcohol while only supplying more of the heated nitrogen gas into the ambient above the cleaning liquid.

Abstract: A system (10) is disclosed for cleaning a vertical furnace (12) pedestal (34) and cap (36) including at least one inlet conduit (40) in fluid communication with a pressurized cleaning medium source (46). The system also includes at least one exhaust conduit (42) in fluid communication with a negative pressure source (48). A boat assembly (30) may be positioned such that the at least one conduit (40) is operable to direct cleaning medium at the boat assembly (30) to dislodge contaminate particles associated with the boat assembly. The exhaust outlet (42) then evacuates the cleaning medium and any dislodged contaminate particles. The system may operate automatically within a closed processing environment and after each process cycle.

Abstract: Disclosed herein is an apparatus and method for drying solid articles such as semiconductor wafers. In one embodiment, the dryer comprises a process tank and a drying fluid supply system. The process tank includes a plurality spray nozzles to spray a non-flammable drying fluid to wet surfaces of the article for drying without the necessity of heat or other external means. The drying fluid comprises a non-flammable, environmentally compatible, and a non-hazardous fluid including a drying agent of (hydrofluoroether) HFE and a surfactant of isopropyl alcohol (IPA). Even without the benefit of heating, little if any solution or static charge remains after drying. The drying apparatus includes a drying fluid supply system for providing the drying fluid to the plurality of spray nozzles.

Abstract: A process for manufacturing improved granulated fatty alcohol sulfates. The process includes slowly drying and mechanically mixing the fatty alcohol sulfate.

Abstract: An apparatus for drying semiconductor wafers using IPA (Isopropyl Alcohol) vapor includes a first chamber for producing the IPA vapor, and a second chamber connected to the first chamber through an IPA supply line, for receiving the IPA vapor and drying semiconductor wafers using the IPA vapor. With the drying apparatus, the first and second chambers are separated from each other, which allows the process steps of producing the IPA vapor and the drying the wafers to be separately performed. The drying apparatus thus prevents particles from being generated in the second chamber during the drying process. The wafers can be dried without a variation in temperature in the second chamber. The IPA vapor is exhausted from the second chamber by introducing nitrogen into the second chamber. As a result, the IPA vapor in the second chamber is not liquified and thereby leaves no substance to adhere to a contact portion between a wafer carrier and each wafer.

Abstract: The present invention is a method and apparatus for the dynamic cleaning of semiconductor fabrication equipment and particularly quartzware with thermally activated nitrogen trifluoride wherein the cleaning effluent is safely removed and cleaning by-products isolated or diluted to provide for efficient cleaning and rapid restarts of fabrication equipment so cleaned.

Abstract: A colloidal substance is injected into a vacuum chamber to be dehydrated therein. The dehydrated substance is extracted from the vacuum chamber by a screw extruder disposed at a bottom of the vacuum chamber. A gas resulting from the dehydration is drawn from the vacuum chamber into a surface condenser to be cooled through an indirect heat exchange with cooling water. After the dehydration of the substance, the extraction of the dehydrated substance and the cooling of the gas are carried out in parallel.

Abstract: A device for drying articles such as semiconductor wafers comprising a vacuum process chamber for holding articles to be dried; a vapor generator substantially isolated from the process chamber for supplying a substance such as isopropyl alcohol in vapor form to the process chamber; a heater for heating the walls of the process chamber to discourage the substance vapor from condensing on the inside walls of the process chamber. The device can also be used for rinsing and cleansing articles prior to drying.