Gas Or Vapor Flow To Bottom Of Treated Material Patents (Class 34/434)
  • Patent number: 8257767
    Abstract: A desiccating device and method providing variable drying conditions allowing the desiccated material to substantially maintain its natural characteristics upon rehydration as well as have a low microbial content. The method provides a process of subjecting the material to ultrasound and flowing hot air or gas for a defined period of time. The ultrasonic frequency, temperature, air flow and time of exposure can be varied to produce the most efficient drying conditions depending on the material to be dried. The apparatus has plurality of drying chambers with forced heated air or gas input and output ducts and ultrasonic emitter. The material passes through each chamber at a pre-determined rate on a perforated conveyor belt in one embodiment of the invention. Optionally, the material may be placed on a drying bed or substrate comprising a number of spheres.
    Type: Grant
    Filed: January 17, 2008
    Date of Patent: September 4, 2012
    Inventor: Gerald J. Ware
  • Patent number: 5992044
    Abstract: A grain dryer has a horizontal plenum connected to a source of heated forced air and has at least one generally perforated wall. A substantially enclosed grain conduit extends along the plenum and has one of its sidewalls being the perforated wall of the plenum. The grain conduit has upper and lower ends to receive and discharge, respectively, a quantity of grain to be dried by heat conveyed to the grain through the perforated wall of the plenum. The lower end of the grain conduit defines an opening generally dwelling in a substantially vertical plane and having upper and lower discharge ports, separated by a plate extending across the central portion thereof to close the flow of grain therethrough.
    Type: Grant
    Filed: June 12, 1998
    Date of Patent: November 30, 1999
    Assignee: Sukup Manufacturing Company
    Inventor: John A. Hanig
  • Patent number: 5709037
    Abstract: A material to be dried, such as a semiconductor substrate during manufacturing a semiconductor device, is loaded into a process chamber fitted at a loading opening with a lid which is closed from above. The inner side wall surface of the process chamber has a first surface formed in the lower part thereof and is substantially in parallel with the inner wall surface of the lid, and a second surface extending from the upper end part of the first surface and bent outwards to face the inner wall surface of the lid. A processing solution vapor is fed through a steam supply port in the second surface into the process chamber and flowed downwardly over the material to be dried. The processing solution vapor is condensed and recovered below the material to be dried.
    Type: Grant
    Filed: October 7, 1996
    Date of Patent: January 20, 1998
    Assignees: Mitsubishi Denki Kabushiki Kaisha, Ryoden Semiconductor System Engineering Corporation
    Inventors: Hiroshi Tanaka, Nobuaki Doi, Masashi Omori, Hiroaki Ishikawa
  • Patent number: 5642671
    Abstract: A method of printing a material web includes the steps of applying ink to the material web, subsequently drying the material web with the use of heat and subsequently drying the material web, and, after cooling and prior to further processing, moistening the material web while simultaneously applying heat to the material web, and subsequently once again cooling the material web. An apparatus for carrying out the method includes, in a travel direction, a printing unit, a drying section following the printing unit, a cooling section following the drying section, a moistening section following the cooling section, and an after-cooling section following the moistening section.
    Type: Grant
    Filed: April 24, 1996
    Date of Patent: July 1, 1997
    Assignee: V.I.B. Apparatebau GmbH
    Inventor: Stefan Winheim