Vapor Or Gas Treatment Patents (Class 34/448)
  • Patent number: 9267882
    Abstract: An apparatus for detecting an organic compound and an apparatus for manufacturing a display device, the apparatus for detecting an organic compound including an infrared light emitting unit that irradiates infrared rays toward a gas-phase organic compound used as a process gas in an atmospheric pressure equipment; a first window that separates the organic compound from the infrared light emitting unit; an infrared detection unit that measures an infrared absorbance of the organic compound; and a second window that separates the organic compound from the infrared detection unit, wherein infrared absorption regions of the first window and the second window are different from an infrared absorption region of the organic compound.
    Type: Grant
    Filed: March 26, 2014
    Date of Patent: February 23, 2016
    Assignee: SAMSUNG DISPLAY CO., LTD.
    Inventors: Eun-Ju Song, Hun-Jung Yi
  • Patent number: 9209010
    Abstract: A substrate cleaning method includes removing a foreign material attached to a substrate while preventing deterioration of the substrate and any film formed on or above the substrate. A cleaning gas at a pressure between 0.3 MPa and 2.0 MPa is sprayed towards a wafer W with attached foreign material 22 placed in a near-vacuum, producing clusters 21 made up of a multitude of gas molecules 20, and the clusters 21 collide with the wafer W without undergoing ionization.
    Type: Grant
    Filed: February 3, 2011
    Date of Patent: December 8, 2015
    Assignees: TOKYO ELECTRON LIMITED, IWATANI CORPORATION
    Inventors: Hidefumi Matsui, Tsuyoshi Moriya, Masaki Narushima
  • Patent number: 8769842
    Abstract: A substrate drying apparatus includes a drying gas nozzle configured so that, assuming that a surface WA of the substrate W is a projection plane, regarding the drying gas flow Gf in the nozzle moving direction Dr, a collision position Gfw with the substrate W is located downstream of a projected discharge position Gfv?, the projected discharge position Gfv? being a discharge position from the drying gas nozzle projected on the projection plane. In a three-dimensional space, the drying gas flow Gf is inclined, such that an angle ? formed by an axis Ga of the drying gas flow Gf and a vertical line Wp of the substrate W is in a range from a half contact angle ?/2 to an angle determined by deducting the half contact angle ?/2 from 90°, the half contact angle ?/2 being a half of the contact angle ?.
    Type: Grant
    Filed: April 11, 2013
    Date of Patent: July 8, 2014
    Assignee: Ebara Corporation
    Inventors: Tomoatsu Ishibashi, Takahiro Ogawa, Kenichi Sugita, Shinji Kajita, Koichi Fukaya, Akira Nakamura
  • Patent number: 8628188
    Abstract: The invention provides an apparatus including: a rotatable belt having an outer surface and an inner surface, the outer surface partially coming into contact with a sheet; a plurality of rollers being arranged in a direction of movement of the sheet and including a first roller and a second roller adjacent to each other, the plurality of rollers being pressed against the outer surface and the moving sheet being nipped between the plurality of rollers and the outer surface; a blowing mechanism configured to blow hot air from between the first roller and the second roller toward the sheet; and a heating unit including a heater and a contact surface coming into contact with the inner surface, the heating unit being configured to be able to set the contact surface thereof to have a predetermined non-uniform temperature distribution.
    Type: Grant
    Filed: December 7, 2010
    Date of Patent: January 14, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Toshiaki Tokisawa, Yoshiaki Suzuki, Kanto Kurasawa, Toshihide Wada
  • Publication number: 20120005917
    Abstract: A sheet-processing machine includes at least one dryer, air feed devices for the dryers, at least one air extraction device for heated exhaust air and a mixing device for mixing warm dryer exhaust air with the dryer feed air. An open loop or closed loop control device controls or regulates an extent to which the dryer exhaust air is mixed with the dryer feed air by using measured variables or setting values which are correlated with the moisture content of the exhaust air. A method for drying printed and/or varnished sheets is also provided.
    Type: Application
    Filed: July 7, 2011
    Publication date: January 12, 2012
    Inventors: JOCHEN JUNG, ROLF MUELLER
  • Patent number: 7971370
    Abstract: An apparatus and method for treating a moving substrate of indefinite length. The apparatus has a control surface positioned in close proximity to a surface of the substrate to define a control gap between the substrate and the control surface. A first chamber is positioned near the control surface, with the first chamber having a gas introduction device. A second chamber is positioned near the control surface, the second chamber having a gas withdrawal device. The control surface and the chambers together define a region wherein the adjacent gas phases possess an amount of mass. Upon inducement of at least a portion of the mass within the region, the mass flow is controlled to significantly reduce dilution of the gas phase component in the adjacent gas phase. This is accomplished through the introduction of a controlled gas stream thereby reducing the flow of an uncontrolled ambient gas stream due to pressure gradients in the system.
    Type: Grant
    Filed: April 11, 2006
    Date of Patent: July 5, 2011
    Assignee: 3M Innovative Properties Company
    Inventors: Craig A. Miller, Nirmal K. Jain, William Blake Kolb
  • Patent number: 7918039
    Abstract: A web coating process and apparatus employing a coating applicator, dryer or curing station and web-handling equipment for conveying the web past the coating applicator and through the dryer. The web is enclosed from at least the coating applicator to the dryer or curing station in a close-coupled enclosure or series of close-coupled enclosures supplied with one or more streams of conditioned gas flowing at a rate sufficient to reduce materially the particle count or change materially a physical property of interest in a close-coupled enclosure.
    Type: Grant
    Filed: November 30, 2006
    Date of Patent: April 5, 2011
    Assignee: 3M Innovative Properties Company
    Inventor: William Blake Kolb
  • Patent number: 7918038
    Abstract: An apparatus and method for treating a moving substrate of indefinite length. The apparatus has a control surface positioned in close proximity to a surface of the substrate to define a control gap between the substrate and the control surface. A first chamber is positioned near the control surface, with the first chamber having a gas introduction device. A second chamber is positioned near the control surface, the second chamber having a gas withdrawal device. The control surface and the chambers together define a region wherein the adjacent gas phases possess an amount of mass. Upon inducement of at least a portion of the mass within the region, the mass flow is controlled to significantly reduce dilution of the gas phase component in the adjacent gas phase. This is accomplished through the introduction of a controlled gas stream thereby reducing the flow of an uncontrolled ambient gas stream due to pressure gradients in the system.
    Type: Grant
    Filed: March 2, 2006
    Date of Patent: April 5, 2011
    Assignee: 3M Innovative Properties Company
    Inventors: Craig A. Miller, Nirmal K. Jain, William Blake Kolb
  • Publication number: 20080148595
    Abstract: A method for processing a substrate using a proximity head is disclosed. The method is initiated by, providing a head with a head surface positioned proximate to a surface of the substrate. The head has a width and a length, and the head has a plurality of ports that are configured in rows along the length of the head. The plurality of rows can extend over a width of the head, and there is a first group of ports configured to dispense a first fluid. The first fluid is dispensed to the surface of the substrate forming a meniscus between the surface of the substrate and the surface of the head. The method also includes delivering gaseous carbon dioxide from a second group of ports of the head to an interface between the meniscus and the substrate. The carbon dioxide assists in promoting a reduced surface tension on the meniscus relative to surface of the substrate.
    Type: Application
    Filed: December 20, 2006
    Publication date: June 26, 2008
    Applicant: Lam Research Corporation
    Inventors: John M. de Larios, Paul A. Kittle, Michael Ravkin, Mikhail Korolik, Erik Freer, Katrina Mikhaylich, Fritz C. Redeker
  • Patent number: 7268323
    Abstract: To be provided are a heat treatment apparatus having blocking members which block gaps between the side walls of nozzle boxes provided with slit nozzles, whose size in the lengthwise direction is greater than the width of a sheet, and the side walls of a heat treatment chamber, and gas having a uniform velocity fluctuating no more than ±25% in the lengthwise direction of the slit nozzles is blown out of the slit nozzles to subject the sheet to heat treatment, resulting in little unevenness of temperature in the widthwise direction and reduced energy loss, and a heat treatment method using this heat treatment apparatus.
    Type: Grant
    Filed: February 27, 2004
    Date of Patent: September 11, 2007
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Hitoshi Tomobe, Hirotoshi Mizota, Hajime Okutsu, Tomonari Murakami, Daisuke Morimoto
  • Patent number: 7244465
    Abstract: A method for manufacturing a coated sheet that may form a coated layer having a uniform film thickness by a coating liquid even when a substrate has a large area. A method for manufacturing a coated sheet to form a coated layer by a process including a process (1) for coating a coating liquid including a resin material and a solvent on a substrate, and a drying process (2) for drying a coated liquid, wherein a value L obtained in drying process (2) satisfies a following relationship; L = ? 0 T ? ? ? [ mN / m ] × ( h ? [ m ] ) 3 ? ? [ mPa · sec ] ? ? ? t > 1.9 × 10 - 13 ? [ m 4 / sec ] (where: T: total period of drying process [sec]; ?: surface tension of coated liquid [mN/m]; h: thickness of coated liquid [m]; and ?: viscosity of coated liquid [mPa·sec]).
    Type: Grant
    Filed: September 12, 2003
    Date of Patent: July 17, 2007
    Assignee: Nitto Denko Corporation
    Inventors: Seiji Kondou, Kazuki Tsuchimoto, Tomoaki Masuda
  • Patent number: 7125473
    Abstract: An apparatus and method for conditioning a moving porous web on a papermaking machine is disclosed. The web has a first and a second surface and a high temperature gaseous boundary layer adjacent at least the second surface.
    Type: Grant
    Filed: September 12, 2003
    Date of Patent: October 24, 2006
    Assignee: International Paper Company
    Inventor: Dennis W. Anderson
  • Patent number: 6998021
    Abstract: In a paper machine which comprises process elements and a measuring beam, the measuring beam is arranged at least at one paper machine process element so that a measuring device for measuring quality properties of a paper web is arrangeable in the measuring beam. The paper machine process element is e.g. a blow box, which is arrangeable in a dryer unit of the paper machine between drying cylinders to blow air via at least one blow air channel provided in the blow box to guide the moving paper web and/or to assist drying.
    Type: Grant
    Filed: March 22, 2002
    Date of Patent: February 14, 2006
    Assignee: Metso Automation Oy
    Inventors: Markku Mäntylä, Matti Kukkurainen, Jari Koivu
  • Patent number: 6962007
    Abstract: A device for drying substrates which stores a plurality of substrate (1) and which comprises a processing container (3) to which cleaning fluid (2) after cleaning the substrates (1) is drained and an injection nozzle (5) for injecting drying fluid located at the terminating part of a feed pipe (4) through which liquid drying fluid is supplied, whereby an exhaust equipment is eliminated or simplified, and the drying fluid is fed smoothly.
    Type: Grant
    Filed: August 10, 1999
    Date of Patent: November 8, 2005
    Assignees: Toho Kasei Ltd., Daikin Industries, Ltd.
    Inventors: Norio Maeda, Koji Sumi, Hiroshi Aihara, Masao Oono, Naoaki Izu Tani
  • Patent number: 6954994
    Abstract: A moisture removal mechanism comprises a drying zone through which product to be dried passes. A fluid circulation path is in fluid communication with the drying zone. A forced fluid feed device directs drying fluid to and from the drying zone, the fluid feed device being mounted in the fluid circulation path. A heater is arranged in the fluid circulation path for heating the drying fluid prior to entry of the fluid into the drying zone. A fluid control arrangement is arranged in the fluid circulation path for controlling moisture content of the drying fluid, the fluid control arrangement being responsive to flow of fluid in the fluid circulation path.
    Type: Grant
    Filed: June 30, 2004
    Date of Patent: October 18, 2005
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventors: Cherng Linn Teo, Eng Guan Yeo, Seng San Koh
  • Patent number: 6869506
    Abstract: An apparatus for decreasing heat emission and enhancing a vacuum system in a papermaking machine is provided. Such an apparatus includes a drying device having an inlet for receiving heated air for removing moisture from a paper web and an outlet for exhausting the moisture-containing air from the drying device. A vacuum system is configured to produce a suction and receive the moisture-containing air. A web handling device is disposed upstream of the drying device and is configured to interact with the web before the web is directed to the drying device. The web handling device is further configured to receive a portion of the moisture-containing air from the drying device, wherein the portion of the moisture-containing air is directed through the web by the web handling device to facilitate dewatering of the web before the moisture-containing air is received by the vacuum system.
    Type: Grant
    Filed: November 22, 2002
    Date of Patent: March 22, 2005
    Assignee: Metso Paper Karlstad Aktiebolag (AB)
    Inventor: Dennis Edward Jewitt
  • Patent number: 6783602
    Abstract: The present invention is directed to a method for controlled environment processing of parts in a chamber or chambers wherein solvents and/or solutions used for processing the parts can be introduced. The process includes applying a negative gauge pressure to the chamber to remove air or other non-condensable gases. Next a solvent, solvent mixture or solution in either a liquid or vapor state is introduced to the chamber. A first system is then applied to recover the solvent(s) or solution(s) from the object being processed and chamber, and a second system, separate from the first system, is applied that further recovers residual solvent or solution from the object and chamber. Treatment of the part may be in the form of coating, etching, deposition, cleaning, stripping, plating, adhesion, dissolving, penetrating, anodizing, impregnating, debinding or any other process in which material is removed or deposited on a solid surface by transfer from or to a liquid or gas phase.
    Type: Grant
    Filed: September 23, 2003
    Date of Patent: August 31, 2004
    Inventor: Donald Gray
  • Patent number: 6775925
    Abstract: Apparatus and a method for the evaporative cooling of a web within a dryer in a compact manner. Excess fluid overspray is controlled, thereby avoiding problems with fluid depositing on internal surfaces of the dryer, which can cause mineral build-up and can result in web breaks or quality defects if fluid drips onto the web. More specifically, a water delivery system is used which directs a water mist to the web by appropriate design and placement of the spray nozzles. The quantity of water delivered to the web is regulated, and is preferably based upon web temperature. Excess mist is controlled by directing hot air to effectively vaporize the excess mist before it is able to contact the internal surfaces of the dryer enclosure and its internal components.
    Type: Grant
    Filed: April 14, 2003
    Date of Patent: August 17, 2004
    Assignee: Megtec Systems Inc.
    Inventors: Steven J. Zagar, Paul Seidl, Jerry Packer, David Welter
  • Publication number: 20040139626
    Abstract: There are provided a substrate drying method and apparatus by which an attachment amount of particles to surfaces of substrates can be reduced when the substrates are exposed from pure water, and occurrence of non-uniform drying can be prevented by improving drying efficiency of the substrates. Air or an inert gas, and gaseous or droplet-like isopropyl alcohol (hereinafter, referred to as IPA) are supplied into a space on a liquid level of the pure water in a drying chamber, and pure water on a liquid level side is drained from the liquid level or the vicinity of the liquid level of the pure water, while raising the pure water in which the substrates are immersed together with the substrates, the substrates are exposed from the pure water above the liquid level in the drying chamber, and, at the same time, the pure water held on the exposed surfaces of the substrates is replaced by IPA, whereby the substrates are dried.
    Type: Application
    Filed: January 21, 2003
    Publication date: July 22, 2004
    Inventors: Yoshio Takemura, Susumu Matsuda, Hiroaki Mizunoe
  • Patent number: 6742280
    Abstract: A method in consolidation and drying of paper. A wet web is contacted with superheated steam, whose temperature is 200-600° C. for the purpose of reducing, by heat transfer from the superheated stream, the water content of the web by evaporation of a substantial part of the water in the same. The wet web is supported and transported by means of a heat-conductive, gas-impermeable belt whose width is equal to or exceeds the width of the web, and jets of the superheated steam are directed towards the side of the web facing away from the belt.
    Type: Grant
    Filed: September 13, 2002
    Date of Patent: June 1, 2004
    Assignee: Andritz Technology and Asset Management GMBH
    Inventors: Anders Andrén, Stefan Backa, Johan Ekh, Xiaolong Feng, Thomas Liljenberg, Ulf Persson, Xiaojing Zhang
  • Patent number: 6715217
    Abstract: A microfilm drying device and method are presented for salvaging and drying microfilm which has become wet due to excessive moisture resulting from high water, floods and the like. The device includes a needle assembly which is slidably affixed within a frame to direct air into the internal compartments of a flexible jacket containing microfilm strips. In another embodiment, a hand held drying device allows air to pass through a series of needles to dry the interior of the flexible jackets.
    Type: Grant
    Filed: October 30, 2002
    Date of Patent: April 6, 2004
    Assignee: Eastern Microfilm Sales and Service, Inc.
    Inventors: David E. Wright, Dwayne D. Wright
  • Patent number: 6615510
    Abstract: Liquid is removed from wafers for drying a wafer that has been wet in a liquid bath. The wafer and the bath are separated at a controlled rate as the wafer is positioned in a gas-filled volume. The controlled rate is generally not less than the maximum rate at which a meniscus will form between the liquid bath and the surface of the wafer when the liquid bath and the wafer are separated. The gas-filled volume is defined by a hot chamber that continuously transfers thermal energy to the wafer in the gas-filled volume. Hot gas directed into the volume and across the wafer and out of the volume continuously transfers thermal energy to the wafer.
    Type: Grant
    Filed: August 28, 2002
    Date of Patent: September 9, 2003
    Assignees: Lam Research Corporation, Oliver Design, Inc.
    Inventors: Oliver David Jones, Kenneth C. McMahon, Jonathan E. Borkowski, Scott Petersen, Donald E. Stephens, Yassin Mehmandoust, James M. Olivas
  • Patent number: 6606802
    Abstract: Method and apparatus are disclosed for improving the cleaning efficiency of a high density plasma system by introducing thermally hot gases to heat downstream chamber walls to improve the fluorine attack on deposit coatings. In certain embodiments of the invention, the cleaning gas and thermally hot gas are allowed into the region of the high vacuum pump to provide cleaning of the high vacuum pump.
    Type: Grant
    Filed: November 30, 2001
    Date of Patent: August 19, 2003
    Assignee: Micron Technology Inc.
    Inventors: Gurtej S. Sandhu, Michael Li, Neal R. Rueger
  • Patent number: 6598312
    Abstract: A wafer drying apparatus of increased efficiency in which isopropyl alcohol (IPA) supplied to a hood is activated by heat, thereby increasing its diffusion efficiency and enabling it to vaporize pure water on a wafer quickly, includes a washing tank for storing pure water, a hood positioned at an upper portion of the washing tank, an injection nozzle for ejecting IPA positioned in the hood, a storage tank for storing the IPA, a bubble maker in the storage tank to create IPA vapor, a nitrogen supplier for storing a carrier gas for transferring the IPA vapor in the storage tank to the hood, and a heater provided near the injection nozzle to heat the IPA vapor that is ejected through the injection nozzle to a predetermined temperature, thereby uniformly diffusing the IPA vapor.
    Type: Grant
    Filed: March 21, 2002
    Date of Patent: July 29, 2003
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Tae-Ho Kim, Dong-Kwan Hong, Nung-Suck Kang
  • Publication number: 20030131495
    Abstract: A method and apparatus for heating and cooling a substrate are provided. A chamber is provided that comprises a heating mechanism adapted to heat a substrate positioned proximate the heating mechanism, a cooling mechanism spaced from the heating mechanism and adapted to cool a substrate positioned proximate the cooling mechanism, and a transfer mechanism adapted to transfer a substrate between the position proximate the heating mechanism and the position proximate the cooling mechanism.
    Type: Application
    Filed: November 12, 2002
    Publication date: July 17, 2003
    Inventors: Ratson Morad, Ho Seon Shin, Robin Cheung, Igor Kogan
  • Patent number: 6589359
    Abstract: A cleaning method is provided for cleaning a semiconductor wafer. In this method, after removing adhering substances from the wafer by using a chemical liquid of organic amine type, there is carried out a pure-water cleaning capable of prevention of electrostatic destruction and alkaline corrosion on the wafer. In detail, it is executed to make a processing chamber have an atmosphere of carbon dioxide and subsequently introduce steam into the chamber to dissolve CO2-gas into the steam. Next, spray the pure water to the wafer. Then, the steam in which CO2-gas is dissolved dissolves in the pure water, so that the pure wafer becomes weak acid, accomplishing the reduction of resistivity of the pure water. Additionally, alkaline substances is neutralized by carbonated water to prevent an alkaline corrosion on a wiring layer on the wafer's surface.
    Type: Grant
    Filed: July 10, 2001
    Date of Patent: July 8, 2003
    Assignee: Tokyo Electron Limited
    Inventors: Yuji Kamikawa, Hiroshi Tanaka
  • Patent number: 6584703
    Abstract: The invention relates to a method by means of which the machine-direction moisture of a web being calendered or coated and calendered can be controlled in an optimal manner that takes into account moisture content changes along the entire path of the coating and drying process. Advantageously, all the dryers and the calender of the coater section are controlled in an integrated manner in order to obtain a controlledly processed product which is optimized in regard to energy consumption and product quality. Each process section and unit contributing to the drying of the web is identified by means of a mathematical submodel describing the specific evaporation rate in the respective process section/unit and, by chaining these submodels, a composite model is compiled for the entire process, whereby the composite model makes it possible to manage the drying operation in the process so that the individual units are controlled as a portion of the overall process.
    Type: Grant
    Filed: October 1, 2001
    Date of Patent: July 1, 2003
    Assignee: Metso Paper, Inc.
    Inventors: Tapio Mäenp{umlaut over (aa)}, Vesa Ijäs
  • Patent number: 6576066
    Abstract: According to a supercritical drying method of this invention, a substrate having a pattern is dipped in water and rinsed with water. Then, the substrate is placed in the reaction chamber of a predetermined sealable vessel, and surfactant-added liquid carbon dioxide is introduced into the reaction chamber. The substrate is dipped in surfactant-added liquid carbon dioxide, and liquid carbon dioxide is changed to the supercritical state. After that, supercritical carbon dioxide is gasified.
    Type: Grant
    Filed: November 28, 2000
    Date of Patent: June 10, 2003
    Assignee: Nippon Telegraph and Telephone Corporation
    Inventor: Hideo Namatsu
  • Publication number: 20030101614
    Abstract: Device and process for dewatering a fibrous material web by expelling water via gas pressure. The dewatering device includes at least four rolls arranged to radially limit at least one pressure chamber and sealing units arranged to axially limit the at least one pressure chamber. Adjustment devices are arranged to at least partially individually axially adjust positions of the at least four rolls and the sealing units. A pressure gas is introducible into and the fibrous material web is guidable through the at least one pressure chamber.
    Type: Application
    Filed: October 7, 2002
    Publication date: June 5, 2003
    Applicant: Voith Paper Patent GmbH
    Inventor: Klaus Dolle
  • Publication number: 20030094254
    Abstract: This invention relates to a three-stream atomizing nozzle for use with a rewet shower. The nozzle has an air stream divider that separates the atomizing air from the source into three streams. The first stream is a straight air stream staying closest to and around the atomized water jet. The second stream is a swirl running around the first straight stream. The third stream is also a straight stream that wraps around the first straight stream and the second swirl. The nozzle also has a mixing chamber in which the three air streams are mixed together for the atomizing purpose. The nozzle can from the combination of the three air streams produce fine water droplets that are suitable for a paper rewet shower and more importantly creates a tailorable water mass profile. The mass profile can be tailored into a shape that is close to a square shape which is ideal for rewet showers as a square profile creates minimal coupling between adjacent zones.
    Type: Application
    Filed: October 22, 2001
    Publication date: May 22, 2003
    Applicant: ABB Inc.
    Inventor: Shizhong Duan
  • Patent number: 6553689
    Abstract: A vapor collection method and apparatus capable of capturing vapor compositions without substantial dilution. The method and apparatus utilize a material that has a surface with an adjacent gas phase. A chamber is positioned in close proximity to a surface of the material. The position of the chamber creates a relatively small gap between the surface of the material and the chamber. The adjacent gas phase between the chamber and the surface define a region possessing an amount of mass. At least a portion of the mass is drawn through the region by induced flow. The utilization of a small gap limits the flow of mass that is external to the chamber from being swept through the chamber by induced flow.
    Type: Grant
    Filed: September 21, 2001
    Date of Patent: April 29, 2003
    Assignee: 3M Innovative Properties Company
    Inventors: Nirmal K. Jain, Peter T. Benson, James L. Capps, William Blake Kolb, Eldon E. Lightner, Norman L. Rogers, Jr., Robert A. Yapel
  • Patent number: 6519869
    Abstract: A method and an apparatus for drying semiconductor wafers by using an IPA drying apparatus. The present invention uses a vapor generator to generate an IPA vapor. The IPA vapor is generated and saved in a closed surrounding and then transferred in a porous hollow plate in the dryer tank by using a quartz pipe. The IPA vapor is diffused evenly from the porous hollow plate. Furthermore, the present invention increases the safety of the process and can easily control the input amount of the IPA vapor.
    Type: Grant
    Filed: May 15, 2001
    Date of Patent: February 18, 2003
    Assignee: United Microelectronics, Corp.
    Inventor: Fu-Sheng Peng
  • Patent number: 6511708
    Abstract: A system, such as a gap drying system, moves a substrate having a substrate tension over a curved plate at a substrate speed such that the substrate floats over at least a region of substantially constant clearance (H0) between the substrate and the curved plate. H0 is controlled without adjusting the substrate speed and without adjusting the substrate tension.
    Type: Grant
    Filed: November 14, 2000
    Date of Patent: January 28, 2003
    Assignee: Imation Corp.
    Inventors: William Blake Kolb, Marcio da Silveira Carvalho, Gary Lee Huelsman
  • Publication number: 20030000673
    Abstract: The specification discloses embodiments of a process and related apparatus for conditioning a fibrous web in order to improve the efficiency of drying and calendering thereof. In the process, a moving fibrous web is conditioned after the drier unit of a papermaking machine by applying a flow of moistened gas through one or more arrays of radial jet reattachment nozzles placed in close proximity to the web surface prior to a calendering unit or prior to a steaming unit placed between the nozzles and the calender unit to cool the web and/or increase its moisture content. Webs treated according to the invention exhibit improved properties including less moisture streaking, enhanced smoothness and avoidance of optical property loss.
    Type: Application
    Filed: July 9, 2002
    Publication date: January 2, 2003
    Inventor: Dennis W. Anderson
  • Patent number: 6491761
    Abstract: The present invention is directed to a mothod for preventing the formation of additional surface stains on destained steel sheet processed in a continuous pickle line operation.
    Type: Grant
    Filed: July 24, 2000
    Date of Patent: December 10, 2002
    Assignee: Bethlelem Steel Corporation
    Inventors: John W. Wray, Darrell E. Murphy, Michael Pilnock
  • Patent number: 6473997
    Abstract: The invention relates to a method and a drying section for dewatering a fibrous web (9), the drying section preferably being intended to dry fibrous webs in a paper machine, and the drying section comprising a number of drying cylinders (8), by which an inlet and outlet nip are formed when running the fibrous web, and the drying section comprising drying devices for decreasing the moisture content of the fibrous web, the drying devices comprising a blow device for blowing air in the proximity of the surface of the fibrous web.
    Type: Grant
    Filed: April 9, 2001
    Date of Patent: November 5, 2002
    Assignee: Equitor OY
    Inventor: Carl-Gustav Berg
  • Patent number: 6449873
    Abstract: Disclosed is a dry cleaning apparatus and method using cluster for cleaning a surface of a specimen such as semiconductor wafer. The cleaning method first forms a neutral cluster no having polarity by passing a cleaning gas such as argon, nitrogen, or carbon dioxide gas through a sand glass-shaped nozzle. The formed neutral cluster is injected at an acute angle with respect to a surface of the specimen, thereby removing particles or organic remnants attached on the surface of the specimen without damaging the surface of the specimen.
    Type: Grant
    Filed: September 25, 2000
    Date of Patent: September 17, 2002
    Assignee: Dasan C & I Co., Ltd.
    Inventors: Deok-Joo Yoon, Myeon-Chang Sung, Kwang-Ho Jeong
  • Patent number: 6446356
    Abstract: A method for controlling the drying process taking place in the dryer section of a paper machine. The dryer section comprises at least one drying cylinder unit and at least one air impingement unit. Optimal evaporation is first compiled in a manner known, for example, on the basis of a recipe or by utilising a machine-direction quality model or quality profile, when the geometry of the dryer section, the process parametersrequired, such as machine speed, paper grade and total evaporation required are known. Limit values are calculated for at least two controlled variables of the dryer section, such as the steam pressure and the temperature of blowing air, making use of drying quality models, such as models representing the adhesion and brightness of paper. After this the dryer section is divided an the basis of the distribution formed by the limit values of the controlled variables into drying segments, so that in two adjacent segments, the limit value of at least one controlled variable is different.
    Type: Grant
    Filed: August 31, 2001
    Date of Patent: September 10, 2002
    Assignee: Metso Paper, Inc.
    Inventors: Kristian Hamström, Jorma Kari, Hans Sundqvist
  • Patent number: 6446355
    Abstract: Liquid is removed from disks by apparatus and methods for drying a disk that has been wet in a liquid bath. The disk and the bath are separated at a controlled rate to form a monolayer of liquid on the disk as the disk is positioned in a gas-filled volume. The separation may be by moving the disk out of the liquid bath, and the controlled rate is generally not less than the maximum rate at which a meniscus will form between the liquid bath and the surface of the disk when the liquid bath and the disk are separated. The gas-filled volume is defined by a hot chamber that continuously transfers thermal energy to the disk in the gas-filled volume. Hot gas directed into the volume and across the disk and out of the volume continuously transfers thermal energy to the disk. The directing of the gas out of the volume is independent of the separation of the bath and the disk.
    Type: Grant
    Filed: May 26, 2000
    Date of Patent: September 10, 2002
    Assignee: Lam Research Corporation
    Inventors: Oliver David Jones, Kenneth C. McMahon, Jonathan Borkowski, Scott Petersen, Donald Stephens, Yassin Mehmandoust, James M. Olivas
  • Publication number: 20020095818
    Abstract: A vapor collection method and apparatus capable of capturing vapor compositions without substantial dilution. The method and apparatus utilize a material that has a surface with an adjacent gas phase. A chamber is positioned in close proximity to a surface of the material. The position of the chamber creates a relatively small gap between the surface of the material and the chamber. The adjacent gas phase between the chamber and the surface define a region possessing an amount of mass. At least a portion of the mass is drawn through the region by induced flow. The utilization of a small gap limits the flow of mass that is external to the chamber from being swept through the chamber by induced flow.
    Type: Application
    Filed: September 21, 2001
    Publication date: July 25, 2002
    Inventors: Nirmal K. Jain, Peter T. Benson, James L. Capps, William Blake Kolb, Eldon E. Lightner, Norman L. Rogers, Robert A. Yapel
  • Patent number: 6418639
    Abstract: The invention concerns a method and a device in the dryer section of a paper/board machine. In the dryer section a normal single-wire draw is applied at least partly, in which method the web (W) is passed through the dryer group on support of a drying wire (H). The drying wire (H) presses the web (W) on the drying cylinders (Kn, Kn+1 . . . ) against the heated cylinder faces, and on the reversing cylinders or rolls (Sn, Sn+1 . . . ) between the drying cylinders (10) the web (W) remains at the side of the outside curve. There is one integrated device, through which a support suction and/or blowing is produced in order to improve the runability of the web (W) and to keep the web (W) in contact with the face of the wire, and through which same device, additionally, impingement blowing is produced in order to dry the web (W) and/or to control its tendency of curling.
    Type: Grant
    Filed: July 12, 2000
    Date of Patent: July 16, 2002
    Assignee: Metso Paper, Inc.
    Inventors: Raimo Virta, Pekka Saarikivi, Juha Kaihovirta, Kari Juppi, Nenad Milosavljevic
  • Publication number: 20020073576
    Abstract: A cleaning processing apparatus of wafers W held by a rotor capable of holding a plurality of wafers W, which is one embodiment of the liquid processing apparatus of the present invention, comprises an outside chamber, an inside chamber arranged slidable between a process position and a retreat position, and a cleaning mechanism for cleaning the inside chamber in the retreat position. The cleaning mechanism includes a cylindrical body arranged in the inside chamber so as to form a substantially cylindrical cleaning processing space between the inside chamber and the cylindrical body, a cleaning liquid spurting nozzle for spurting a cleaning liquid into the cleaning processing space, and a gas supply nozzle for supplying a predetermined drying gas into the cleaning processing space so as to make it possible to clean and dry the inside chamber.
    Type: Application
    Filed: December 14, 2001
    Publication date: June 20, 2002
    Inventors: Yuji Kamikawa, Taichi Sakaguchi
  • Patent number: 6398875
    Abstract: A process of drying a semiconductor wafer which includes at least one microelectric structure disposed thereon which includes contacting a water-containing thin film-covered semiconductor wafer with a composition which includes liquid or supercritical carbon dioxide and a surfactant.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: June 4, 2002
    Assignee: International Business Machines Corporation
    Inventors: John Michael Cotte, Dario L. Goldfarb, Kenneth John McCullough, Wayne Martin Moreau, Keith R. Pope, John P. Simons, Charles J. Taft
  • Patent number: 6381872
    Abstract: A mixture of lower alcohols whose mean molecular weight is 46 or less is supplied onto a surface of a semiconductor wafer cleansed with water. With this supply, the amount of alcohols left on the semiconductor wafer which has been dried can be suppressed to 2 ng/cm2 or less, and thus a gate oxide film formed on the semiconductor wafer is prevented from deterioration. As a result, a high yield of semiconductor products can be realized.
    Type: Grant
    Filed: August 14, 2001
    Date of Patent: May 7, 2002
    Assignee: NEC Corporation
    Inventor: Yasushi Sasaki
  • Patent number: 6367164
    Abstract: Dryer section and process for drying a fibrous web. Dryer section includes a plurality of dryer groups with at least one heated dryer cylinder and at least one belt to press the fibrous web against a surface of the at least one heated dryer cylinder. Transfer elements, i.e., a delivery transfer element and an accepting transfer element, are arranged to form at least one transfer point. Accepting transfer element has a greater speed than the delivering transfer element, and the transfer elements are arranged not to press against each other at the transfer point and to have a distance from one another of less than about 70 mm. Process includes guiding fibrous web to a first dryer group, pressing, with the at least one belt, fibrous web against surfaces of the at least one heated dryer cylinders of each dryer group, and transferring, without pressing, fibrous web between transfer elements.
    Type: Grant
    Filed: November 22, 2000
    Date of Patent: April 9, 2002
    Assignee: Voith Paper Patent GmbH
    Inventors: Markus Oechsle, Gerhard Kotitschke, Roland Mayer
  • Patent number: 6321463
    Abstract: A substrate treating apparatus including a substrate support mechanism for supporting a substrate 1 to be treated, a rotary impeller 4 placed to face the surface of the substrate 1 supported by the substrate support mechanism, and at least one nozzle 14 provided in an approximately central portion of the rotary impeller 4, wherein rotating the rotary impeller 4 produces a flow of gas passing through the nozzle 14 and flowing from the central portion of the rotary impeller 4 toward the outer periphery thereof, thereby drying the surface of the substrate supported in a stationary state by the substrate support mechanism.
    Type: Grant
    Filed: May 25, 2000
    Date of Patent: November 27, 2001
    Assignee: Ebara Corporation
    Inventor: Hiroyuki Shinozaki
  • Patent number: 6298578
    Abstract: A method and apparatus for drying a tennis court or other surface removes water from the tennis court and heats the surface of the tennis court to facilitate evaporation of water from the court.
    Type: Grant
    Filed: October 12, 2000
    Date of Patent: October 9, 2001
    Inventor: Mark H. Frampton
  • Patent number: 6293031
    Abstract: Method and apparatus for drying a coated paper web (W) or the like web. The apparatus (10) comprises sequentially in the running direction of the web—a turning device (16) arranged on the first side of the web and provided with blow nozzles (20), with which the running direction of the web to be dried is turned in a non-contacting way, and web drying devices (30, 30′) arranged on the first and the second sides of the web, in which the web is dried in a non-contacting manner. The apparatus further comprises a counterpart (18) provided with overpressure nozzles (24), arranged on the second side of the web at the point of the turning device (16), for stabilizing the web run by means of blows generating a local overpressure between the web (W) and the carrier surfaces of the overpressure nozzles (24).
    Type: Grant
    Filed: February 1, 2000
    Date of Patent: September 25, 2001
    Assignee: Metso Paper, Inc.
    Inventors: Knut Ringbom, Richard Solin
  • Publication number: 20010008181
    Abstract: The specification discloses embodiments of a process and related apparatus for conditioning a fibrous web in order to improve the efficiency of drying and calendering thereof. In the process, a moving fibrous web is conditioned after the drier unit of a papermaking machine by applying a flow of moistened gas through one or more arrays of radial jet reattachment nozzles placed in close proximity to the web surface prior to a calendering unit or prior to a steaming unit placed between the nozzles and the calender unit to cool the web and/or increase its moisture content. Webs treated according to the invention exhibit improved properties including less moisture streaking, enhanced smoothness and avoidance of optical property loss.
    Type: Application
    Filed: February 20, 2001
    Publication date: July 19, 2001
    Inventor: Dennis W. Anderson
  • Patent number: 6256904
    Abstract: A system, such as a gap drying system, moves a substrate having a substrate tension over a curved plate at a substrate speed such that the substrate floats over at least a region of substantially constant clearance (H0) between the substrate and the curved plate. H0 is controlled without adjusting the substrate speed and without adjusting the substrate tension.
    Type: Grant
    Filed: May 6, 1998
    Date of Patent: July 10, 2001
    Assignee: Imation Corp.
    Inventors: William Blake Kolb, Marcio da Silveira Carvalho, Gary Lee Huelsman