Abstract: A substrate processing method according to an embodiment is a substrate processing method for drying a substrate. The substrate processing method includes supplying a solution in which a sublimation material is dissolved in a first solvent to a surface of a cleaned substrate. The substrate processing method includes eliminating at least a portion of association states of the sublimation material. The substrate processing method includes precipitating the sublimation material on the surface of the substrate. The substrate processing method includes removing the precipitated sublimation material by sublimation.

Abstract: A shaped compressed pellet formed from a composite of a well treatment agent adsorbed onto a calcined porous metal oxide or into the interstitial spaces of the calcined porous metal oxide may be introduced into an oil or gas producing well. The well treatment agent of the shaped compressed pellet may be used to prevent and/or control the formation of deposits in the well.

Abstract: A drying machine is disclosed. The drying machine includes a selectively rotatable drum receiving an object to be dried, a steam supply member having one side connected to a steam generator and the other side connected to the drum, and a swirler installed in the steam supply member at a predetermined position for swirling steam flowing through the steam supply member. A method for controlling the drying machine includes heating a drum, supplying steam generated in a steam generator into the drum, and supplying hot air into the drum. The drying machine having the above described configuration can efficiently eliminate creases of clothes.

Abstract: A situation where sulfur compounds originating from a castable are mixed into synthesis gas produced by way of a reforming reaction and the mixed sulfur compounds are separated and collected with carbon dioxide and further fed into a reformer to thereby degrade the reforming catalyst of the reformer by sulfur poisoning is avoided. Purge gas that is steam or steam-containing gas is made to flow into the piping to be used for a synthesis gas production apparatus and dried out to remove the sulfur compounds contained in the castable prior to the start-up of operation of the synthesis gas production apparatus, in order to prevent the sulfur compounds from being released by hot synthesis gas.

Abstract: Disclosed are an evaporator, an evaporation method, and a substrate processing apparatus, which can increase the concentration of generated vapor of an organic solvent and efficiently heat the organic solvent. The evaporator includes a fluid tube, a liquid organic solvent supply device for supplying the organic solvent liquid to one end of the fluid tube, and heating units for heating the fluid tube. The fluid tube has a cross section that increases from the one end to the other end. When the organic solvent liquid supplied to one end of the fluid tube is heated, the organic solvent vapor is discharged from the other end of the fluid tube. The substrate processing apparatus includes the above-described evaporator.

Abstract: The present disclosure generally relates to cloth treating machines and methods for operating a cloth treating machine. The controls can supply an appropriate amount of water initially and subsequently based on one or more selected courses or modes of operating the cloth treating machine. For example, the cloth treating machine can supply an appropriate amount of water to a steam generator initially based on a selected course. The steam generator can use the water to generate steam to sanitize and de-wrinkle clothes placed inside a cabinet of the cloth treating machine. During operation, a sensor can sense the level of the water inside the steam generator. An appropriate amount of water can then be re-supplied subsequently based on the selected course or sensed water level, repeatedly. The operation of the cloth treating machine can improve efficiency by reducing the time taken to supply water and generate steam.

Abstract: A method for drying sludge comprising the following steps: (a) Dry dehydrated sludge to obtain a carrier for drying sludge (6); (b) Transport the carrier for drying sludge (6) and dehydrated sludge to be dried (1) to a stirring and mixing apparatus (2) for stirring and mixing and thereby obtain mixed sludge; (c) Transport the mixed sludge (3) to a drying apparatus (4) for drying; (d) Repeat steps (b) and (c); characterized in that in said step (d) a portion of the mixed sludge (3) obtained from the stirring and mixing apparatus (2) which is in an amount determined by amount of sludge carrier (6) required for drying is extracted and transported to the drying apparatus (4) for drying and the rest of the mixed sludge is discharged as final product (7).

Abstract: A situation where sulfur compounds originating from a castable are mixed into synthesis gas produced by way of a reforming reaction and the mixed sulfur compounds are separated and collected with carbon dioxide and further fed into a reformer to thereby degrade the reforming catalyst of the reformer by sulfur poisoning is avoided. Purge gas that is steam or steam-containing gas is made to flow into the piping to be used for a synthesis gas production apparatus and dried out to remove the sulfur compounds contained in the castable prior to the start-up of operation of the synthesis gas production apparatus, in order to prevent the sulfur compounds from being released by hot synthesis gas.

Abstract: A method for operating a laundry appliance including a housing having a substantially circular housing opening closable by a door, a substantially cylindrical container disposed within the housing and including a substantially circular container opening and configured to receive laundry for treatment. The laundry appliance also includes a steam generating device including a heating element, an inlet opening and an outlet opening for steam, and a nozzled disposed in a region of the container opening. The method includes activating the heating element until a temperature of the steam generating device reaches a predetermined upper limit. Water is introduced into a tank of the steam generating device at a predetermined flow rate and the temperature of the steam generator device is measured as the water is introduced. The flow rate of water is reduced when the temperature of the steam generator device drops below a lower limit.

Abstract: A fluid heater 20 includes a duct pipe 26 through which a fluid to be heated flows, and a heating part 23 configured to heat the duct pipe 26. One or more fillers 30 is provided inside the duct pipe 26. A substrate processing apparatus 60 includes: a supply source 92 configured to supply a liquid of a volatile organic solvent; the aforementioned fluid heater 20 configured to heat the liquid of the organic solvent supplied by the supply source 92 so as to generate a steam of the organic solvent; and a chamber 65 configured to accommodate a substrate W and to dry the substrate W accommodated therein, to which the steam of the organic solvent generated by the fluid heater 20 is supplied.

Abstract: The invention relates to a method and apparatus for drying wood by means of vapor. In the method according to the invention the vapor essentially is generated from the wood's own liquid by means of electric energy by conducting the electric energy by means of electrodes directly to the wood to be dried so that the vapor generated first in the center of the wood pushes out the liquids in the wood via the capillaries of the wood. The apparatus according to the invention includes a current source and electrodes connected thereto built to be brought into contact with the wood to be dried in order to conduct electricity to the wood.

Abstract: A system, method, and apparatus for supplying a gas-liquid vapor to a process tank for performing semiconductor manufacturing. In one aspect, the invention is a method of supplying a gas-liquid vapor to a process tank comprising: supplying a gas stream through at least one hydrophobic tube; exposing the outside surface of the hydrophobic tube to a liquid so that the liquid permeates the hydrophobic tube and enters the gas stream, forming a gas-liquid vapor inside the tube; and transporting the gas-liquid vapor to the process tank. In another aspect, the invention is an apparatus for supplying a gas-liquid vapor to a process tank comprising: at least one hydrophobic tube adapted to carry a gas; and a housing forming a chamber that surrounds the tube, the chamber adapted to receive a liquid that can permeate the tube, forming a gas-liquid vapor.

Abstract: A delivery system and method for vaporizing and delivery of vaporized solid and liquid precursor materials at sub-atmospheric pressures between a heatable vaporization vessel and a processing tool. The system includes a pressure regulator internally positioned within the vaporization vessel and in fluid communication with a downstream mass flow controller to maintain a consistent flow of vaporized source material. The system further comprises introducing a carrier/diluent gas for diluting the vaporized source material before entry into the processing tool. A venturi is positioned directly upstream of the processing tool and provides for mixing of the carrier gas with the vaporized source material while providing the negative pressure required to open the gas pressure regulator within the vaporization vessel.

Abstract: The process of mitigation of spacecraft surface charging using ionized water vapor is used, since it helps taking excess surface electrons away from a spacecraft surface, leaving practically no residue after complete evaporation.

Abstract: A process of drying a semiconductor wafer which includes at least one microelectric structure disposed thereon which includes contacting a water-containing thin film-covered semiconductor wafer with a composition which includes liquid or supercritical carbon dioxide and a surfactant.

Abstract: A drying apparatus for washed objects is capable of drying the objects in a reduced period of time, effectively preventing contamination of the objects during drying thereof, and attaining energy saving and a reduction in consumption of chemicals used. Mist of an organic solvent is generated by means of an ultrasonic wave in an organic solvent mist generating tank and the objects are immersed in a pure water tank, the pure water tank and organic solvent mist generating tank are then operated to communicate with each other to discharge pure water and place the objects in an atmosphere of the organic solvent mist, and then nitrogen gas is fed to the pure water tank to purge the organic solvent mist with the nitrogen gas.

Abstract: A refrigerant is directly contacted to a substrate to be processed that was heated so as to quickly cool the substrate. Thus, the temperature of the substrate is dropped to a predetermined temperature level. The substrate is cooled by a cooling device and cooling water. Thus, the cooling temperature can be accurately controlled. In addition, the substrate can be effectively cooled.

Abstract: A method for removing moisture and contaminants, at the monolayer level, from the surface of planar and non-planar objects such as semiconductor wafers or corrugated epitaxial layers. The apparatus comprises of two process chambers. Each chamber contains a selected solvent. The interior of each chamber is saturated with the vapors from their respective solvents. The first solvent of the first process chamber has a boiling point much lower than the boiling points of the second solvent in the second process chamber and a rinsing solvent. Vapors from the first solvent displace the rinsing solvent. Vapors from the second solvent displace the first solvent and any other contaminants; the second solvent is then removed resulting in a dry, contaminant free surface.

Abstract: A method of cleaning metal articles comprises the steps of cleaning metal articles with alkaline washing water, rinsing the metal articles with deoxidized rinsing water, removing water from the metal articles by blowing dry vapor on the metal articles and drying the same in a heated atmosphere. Further, an apparatus for cleaning metal articles comprises a washing reservoir for containing alkaline washing water, a rinsing water deoxidizing device, a rinsing reservoir connected to the water-deoxidizing device, for containing deoxidized rinsing water supplied from the rinsing water deoxidizing device, a boiler, a water-removing reservoir connected to the boiler and supplied with dry vapor from the boiler, and a drying reservoir having an interior in which a heated atmosphere is created, which reservoirs are arranged in this order.

Abstract: The present invention is a process of removal of moisture from surfaces, such as metal conduit for transmission of high purity gases in electronic component fabrication facilities, and the passivation of such metal surfaces to retard the readsorption of moisture, wherein the moisture removal and passivation is enhanced using an agent of the formula: R.sub.a SiX.sub.b Y.sub.c Z.sub.d where a =1-3; b, c, and d are individually 0-3 and a+b+c+d=4; R is one or more organic groups; and at least one of X, Y or Z have a bond to silicon that is readily hydrolyzable. The moisture removal and passivation is conducted at less than 65.degree. C. and at least ambient pressure.

Abstract: An apparatus and method for applying textile treatment finishing agents to garments or garment work pieces is provided. The apparatus includes a rotating drum and a nozzle for generating a fine mist or fog of textile treatment agents inside the rotating drum. The apparatus can be constructed as a dedicated processing machine, or a conventional, industrial washer or dryer can be fitted with an appropriate nozzle and feed lines to provide a dual purpose machine which can be used for its originally intended purpose, and can be selectively used for applying textile treatment agents. Uniform coverage of the surface of the garment is assured by tumbling the garments through the fog created by the nozzle means. By controlling the size of the droplets, and the time during which mist or fog is generated, the amount of chemical agent absorbed by the garments can be controlled.