Photographing On Both Sides Of Photo-sensitive Paper Patents (Class 355/26)
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Patent number: 12124171Abstract: An apparatus for exposure of a relief precursor (P) which comprises a substrate layer and at least one photosensitive layer. The apparatus includes a carrying structure for carrying a relief precursor and an LED array configured to illuminate a photosensitive layer of the relief precursor carried by the carrying structure. The LED array is configured to illuminate simultaneously a predetermined surface area of at least 900 cm2. The LED array includes a plurality of subsets of one or more LEDs, each subset being individually controllable. The apparatus also includes a control unit to control the plurality of subsets individually, and such that an irradiation intensity difference in the predetermined surface area is within a predetermined range.Type: GrantFiled: July 14, 2020Date of Patent: October 22, 2024Assignee: XSYS PREPRESS N.V.Inventors: Pieter Lenssens, Frederik Defour
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Patent number: 11287746Abstract: Semiconductor processing apparatuses and methods are provided in which a semiconductor wafer is flipped and then rotated between patterning of front and back sides of the semiconductor wafer by first and second reticles, respectively. In some embodiments, a method includes patterning, by a first reticle, a first layer on a first side of a semiconductor wafer while the first side of the semiconductor wafer is facing a first direction. The semiconductor wafer is then flipped. A second side of the semiconductor wafer that is opposite the first side faces the first direction after the flipping the semiconductor wafer. The semiconductor wafer is then rotated about a rotational axis extending along the first direction, and a second layer on the second side of the semiconductor wafer is patterned by a second reticle.Type: GrantFiled: March 10, 2021Date of Patent: March 29, 2022Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Hung-Chung Chien, Hao-Ken Hung, Chih-Chieh Yang, Ming-Feng Shieh, Chun-Ming Hu
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Patent number: 10665444Abstract: Slide analysis a gripper with three sensors for controlling a slide grip sequence and at least one rotatable carousel with a slide receiving channel. The systems also include a robot with a robot arm that holds a slide gripper residing inside the housing in communication with the rotatable carousel. The systems also include a load lock chamber and a door sealably coupled to the second end portion and an acquisition vacuum chamber with an X-Y stage and a slide holder with a vacuum seal.Type: GrantFiled: February 11, 2019Date of Patent: May 26, 2020Assignee: bioMérieux, Inc.Inventors: Jared Bullock, Scott Collins, Ian MacGregor, Mark Talmer
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Patent number: 9915896Abstract: An image forming apparatus includes a photosensitive drum, a fixing unit including a fixing roller, a sheet ejection tray, a switchback roller, a re-feeding roller, a first frame, a second frame, a first motor, a first transmission mechanism, a second motor, and a second transmission mechanism. The switchback roller is configured to rotate in a forward direction to convey a sheet to the tray and in a reverse direction to convey the sheet back toward the photosensitive drum. The first motor and the first transmission mechanism are disposed to the first frame. The first transmission mechanism is configured to transmit the drive force from the first motor to the fixing roller. The second motor and the second transmission mechanism are disposed to the second frame. The second transmission mechanism is includes a clutch mechanism configured to intermittently transmit the drive force from the second motor to the re-feeding roller.Type: GrantFiled: January 27, 2017Date of Patent: March 13, 2018Assignee: Brother Kogyo Kabushiki KaishaInventors: Yoshihiro Oyama, Tomoya Yamamoto
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Patent number: 9141000Abstract: A double-surface manufacturing method and an exposure apparatus in the manufacturing process of semiconductors and liquid crystal displays (LCD) are provided. In the exposure process, two masks in the exposure apparatus are subjected to alignment treatment; the substrate is conveyed to a position between the two masks in the exposure apparatus; and patterns of the two surfaces of the substrate are processed. The exposure apparatus comprises two masks, wherein a substrate to be processed is disposed between the two masks; and mask alignment marks are respectively disposed on the two masks. The embodiments of the present invention improve the accuracy of the patterns of the two surfaces of the substrate and the product quality in the double surfaces manufacturing of the substrate.Type: GrantFiled: November 20, 2013Date of Patent: September 22, 2015Assignee: BOE TECHNOLOGY GROUP CO., LTD.Inventors: Can Wang, Xuan He
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Patent number: 8994916Abstract: A double-sided maskless exposure system and method consists of light sources which includes two light wavelength segments, maskless optical engines in which a 2D spatial light modulation (spatial light modulator) device, such as DMD, is generating a plurality of pixel array of the pattern, vision system, moving substrate and computer control system. The double-sided maskless exposure system at least includes two maskless optical engines with auto-calibration function which can correct any alignment error in-line. Each optical engine is for each side of the substrate. The optical engines are aligned each other in pairs and are simultaneously patterning on each side of the moving substrate. The system also includes a manipulator for moving, stepping or scanning the optical engines, relative to the substrate so that it can create a contiguous whole image on the both sides of the subject.Type: GrantFiled: June 15, 2012Date of Patent: March 31, 2015Inventors: Wenhui Mei, Weichong Du, Lujie Qu
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Publication number: 20140139813Abstract: A double-surface manufacturing method and an exposure apparatus in the manufacturing process of semiconductors and liquid crystal displays (LCD) are provided. In the exposure process, two masks in the exposure apparatus are subjected to alignment treatment; the substrate is conveyed to a position between the two masks in the exposure apparatus; and patterns of the two surfaces of the substrate are processed. The exposure apparatus comprises two masks, wherein a substrate to be processed is disposed between the two masks; and mask alignment marks are respectively disposed on the two masks. The embodiments of the present invention improve the accuracy of the patterns of the two surfaces of the substrate and the product quality in the double surfaces manufacturing of the substrate.Type: ApplicationFiled: November 20, 2013Publication date: May 22, 2014Applicant: BOE TECHNOLOGY GROUP CO., LTD.Inventors: CAN WANG, XUAN HE
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Patent number: 8277040Abstract: A printer has an exhaust path that rectifies the exhaust flow of a centrifugal fan for producing air flow through a vacuum platen. Exhaust from a centrifugal fan 30 tends to flow in the direction of rotation A of the blades due to inertia even after being discharged from the exhaust opening 39. The exhaust thus produces a curving exhaust current C. An exhaust duct 32 connected to the exhaust opening 39 of the centrifugal fan 30 therefore curves in the direction of rotation A of the blades so as to not impede the flow of the exhaust current C. As a result, turbulence inside the exhaust duct 32 is suppressed, and the exhaust current C is rectified. The exhaust from the centrifugal fan 30 can therefore flow smoothly, and a loss of exhaust flow can be suppressed. In addition, noise caused by the exhaust current C hitting the inside wall of the exhaust duct 32 can be suppressed.Type: GrantFiled: March 1, 2010Date of Patent: October 2, 2012Assignee: Seiko Epson CorporationInventors: Tetsugo Ishida, Shun Oya
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Patent number: 7843601Abstract: A method for forming a color image that allows a color image forming device to detect print chromaticity by an actually used print medium and automatically perform an optimal color balance adjustment in consideration of the chromaticity of the print medium. At a first step of the method, it is determined whether a feeder is selected for a subsequent printing operation. If selected, the process proceeds to a second step. If not selected, it is determined that the printing operation is not performed for some time and the process is completed without color balance adjustment. At the second step, a print medium for printing a test pattern is fed from the feeder selected for a subsequent printing operation, which is determined at the first step. A color sensor detects the chromaticity of the test pattern transferred and fused on the print medium, and the color balance is then adjusted.Type: GrantFiled: July 9, 2004Date of Patent: November 30, 2010Assignee: Canon Kabushiki KaishaInventor: Kazuro Yamada
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Patent number: 7722180Abstract: A liquid droplet discharge apparatus includes a conveyor belt that retains and conveys a recording medium, a liquid droplet discharge head that discharges liquid droplets onto the recording medium retained on the conveyor belt, a discharge belt that moves to a recording medium feeding position of the conveyor belt, receives the recording medium, and retains and conveys the recording medium to a discharge port; and an inversion belt that moves to the recording medium feeding position, receives and retains the recording medium, and feeds the recording medium to an inversion path. By disposing the inversion belt, the conveyance direction of the recording medium can be switched without contacting the recording surface of the recording medium, and even when two-sided printing is to be conducted at a high speed, the inversion belt does not become soiled by the liquid droplets adhering to the recording surface of the recording medium.Type: GrantFiled: February 10, 2006Date of Patent: May 25, 2010Assignee: Fuji Xerox Co., Ltd.Inventor: Masao Mashima
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Patent number: 7253826Abstract: A thermal development apparatus is provided with: a thermal development section for heating a photosensitive thermal developable recording material to elicit a latent image recorded on an image-forming layer on both faces of the photosensitive thermal developable recording material by a heating unit, a cassette holder section for holding a cassette that houses the photosensitive thermal developable recording material therein, a conveyor unit for taking the photosensitive thermal developable recording material out of the cassette held in the cassette holder section and conveying the photosensitive thermal developable recording material to the thermal development section, and a control unit for controlling at least one of a heating temperature and a conveyance speed in the heating unit in the thermal development section, wherein the control unit is provided with a moisture correction information of the photosensitive thermal developable recording material and the control unit suitably corrects and controls theType: GrantFiled: August 26, 2004Date of Patent: August 7, 2007Assignee: Fujifilm CorporationInventor: Koichi Okada
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Patent number: 7190432Abstract: Provided is a wafer exposure apparatus used in a semiconductor device manufacturing process, the exposure apparatus including: a reflective mirror for reflecting light provided from a light source; an optical path changer for changing a path of the light provided from the reflective mirror; first mirrors installed at both sides of the optical path changer to change the path of the light; second mirrors installed at both sides of a material to change the path of the light; and third mirrors installed at both sides of a mask to enter the light reflected by the first mirrors to the mask and to enter the light passed through the mask into the second mirrors, whereby it is possible to continuously expose one surface, both surfaces or a specific surface of a wafer in a state that the wafer is once aligned.Type: GrantFiled: October 13, 2005Date of Patent: March 13, 2007Assignee: Electronics and Telecommunications Research InstituteInventors: Sang Gi Kim, Ju Wook Lee, Jong Moon Park, Seong Wook Yoo, Kun Sik Park, Yong Sun Yoon, Yoon Kyu Bae, Byung Won Lim, Jin Gun Koo, Boo Woo Kim
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Patent number: 7180578Abstract: An exposure assembly and an exposure installation for exposing a double-sided printed circuit panel to light through a first and a second artwork, including at least one exposure assembly having a frame, a first and a second artwork support, means for moving closer/separating for the artwork supports, and means for holding the printed circuit panel. The installation furthermore includes an optical detection device for detecting position errors, a light source, and an optical device for directing a light beam emitted by said light source. The exposure assembly furthermore has a common displacement device making it possible to jointly displace the artwork supports, and a separate displacement device making it possible to displace the second artwork support with respect to the first artwork support.Type: GrantFiled: October 15, 2004Date of Patent: February 20, 2007Assignee: Automa-TechInventors: Grégoire Gout, Christophe Cousin
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Patent number: 7088420Abstract: A printing system includes a support arrangement. A print cartridge receiving arrangement is mounted on the support arrangement to engage a print cartridge. A drive mechanism delivers print media from the print cartridge. A print engine is mounted on the support arrangement downstream of the print cartridge and has a pair of opposed printhead assemblies that are configured to perform double-sided printing on print media fed from the print cartridge between the printhead assemblies. A slitter is mounted on the support arrangement downstream of the print engine and is configured to separate the print media into sheets.Type: GrantFiled: August 24, 2005Date of Patent: August 8, 2006Assignee: Silverbrook Research Pty LtdInventors: Kia Silverbrook, Toby Allen King
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Patent number: 7052986Abstract: A method for manufacturing a semiconductor apparatus device includes a plurality of layers on a semiconductor substrate. The method includes the steps of dividing a pattern of at least a layer into a plurality of sub-patterns, and joining the divided sub-patterns to perform patterning. The layer including wiring substantially affects operation of the semiconductor device depending on a positional relationship to any other wiring, the patterning is performed by one-shot exposure using a single mask, and only as to the layer including the wiring substantially affecting the operation of the semiconductor device depending on the positional relationship to any other wiring, the patterning is performed by one-shot exposure, and as to all of the other layers, the patterning is performed by division exposure.Type: GrantFiled: September 22, 2003Date of Patent: May 30, 2006Assignee: Canon Kabushiki KaishaInventor: Yasuo Yamazaki
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Patent number: 7002663Abstract: In an exposure apparatus, an exposure stage is moved from an exposure position to a work piece feeding and discharging position, exposure light is emitted from a light emitting unit to a first alignment mark on a first mask and an image of the first alignment mark is projected on a first reflecting material, and a reflected image of the first alignment mark image is detected by the alignment microscope thereby detecting position of the first mask, and when the exposure stage is moved to a reversal handing over position, exposure light is emitted to a second alignment mark of a second mask from the light emitting unit, an image of a second alignment mark of a second mark is projected on a second reflecting material, and a reflected image of the projected second alignment mark image is detected by the alignment microscope thereby detecting position of the second mask.Type: GrantFiled: December 23, 2003Date of Patent: February 21, 2006Assignee: Ushio Denki Kabushiki KaishaInventor: Shoichi Okada
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Patent number: 6806945Abstract: An automatic both sides exposing apparatus 1 is provided, and includes a first exposing mechanism 10 having a first mask and the second exposing mechanism 20 having a second mask; a carrying-in portion 2 and a carrying-out portion 30; an optical system for exposing the substrate; and a first holder A and a second holder B for holding the substrate and delivering the substrate from the first holder A to the second holder B with reversal of sides at a spot located in an interval between the first and second exposing mechanisms where both holders meet each other. Accordingly, a frequency at which the substrate is delivered is minimized, the substrate can be turned over without the reversing mechanism, the substrate can be transferred (and delivered) at good efficiency in limited space and exposed accurately, any inconvenient origin for the substrate may be minimized, and the apparatus is made compact.Type: GrantFiled: September 10, 2001Date of Patent: October 19, 2004Assignee: Orc Manufacturing Co., Ltd.Inventors: Masaru Ise, Masaaki Matsuda
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Patent number: 6795160Abstract: An image reading apparatus having an original sheet feeding portion and an image reading portion includes two reading sensors which read an image (top surface and back surface) of an original and can almost simultaneously read both sides of the original without a reversing mechanism. In the image reading apparatus, when an instruction for starting reading is implemented without selecting a single-side reading mode or a both-side reading mode of the original, the reading of the both sides is executed for a first original. In the case that the first original is determined to be the both-side original, the both-side reading mode is still executed. In the case that the first original is determined to be the single-side original, the single-side reading mode is executed.Type: GrantFiled: June 18, 2003Date of Patent: September 21, 2004Assignee: Canon Kabushiki KaishaInventor: Tetsuro Fukusaka
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Patent number: 6674456Abstract: A thermal printer includes a thermal printing head in an image forming section, which prints an image on one of first and second surfaces of a recording sheet oriented downwards. Feeder rollers feed the recording sheet to the image forming section after the recording sheet is set in a sheet supply slot. The printer includes at least one first memory for storing first image data of an image for being printed on the first surface, and second image data of an image for being printed on the second surface. The first or second image data are read from the first memory, and input to the image forming section. A second memory stores information of discrimination bar code adapted for designating the second image data associated with the first image data according to common assignment to the recording sheet. The information of the discrimination bar code is read from the second memory at a time of printing with the first image data to the first surface, and is printed on the first surface by the image forming section.Type: GrantFiled: July 25, 2002Date of Patent: January 6, 2004Assignee: Fuji Photo Film Co., Ltd.Inventor: Takao Miyazaki
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Publication number: 20040001187Abstract: An image reading apparatus having an original sheet feeding portion and an image reading portion includes two reading sensors which read an image (top surface and back surface) of an original and can almost simultaneously read both sides of the original without a reversing mechanism. In the image reading apparatus, when an instruction for starting reading is implemented without selecting a single-side reading mode or a both-side reading mode of the original, the reading of the both sides is executed for a first original. In the case that the first original is determined to be the both-side original, the both-side reading mode is still executed. In the case that the first original is determined to be the single-side original, the single-side reading mode is executed.Type: ApplicationFiled: June 18, 2003Publication date: January 1, 2004Applicant: Canon Kabushiki KaishaInventor: Tetsuro Fukusaka
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Patent number: 6621553Abstract: An apparatus and method for double-sided imaging of a plurality of photoresist-coated substrates is provided. The apparatus includes a first and second substrate holder comprising at least three extendable chucks, each adapted to hold the substrate. The first substrate holder is mounted about a first axis and the second substrate holder is mounted about a second axis such that the at least three chucks are capable of rotation about the first axis between at least a first, second and third chuck positions. A first transfer arm is disposed adjacent the first substrate holder and adapted to transfer the substrate to a chuck of the first substrate holder when the chuck is in the first chuck position. A first mask is positioned adjacent the chuck in the second chuck position of the first substrate holder. A second mask is provided adjacent the chuck in the second chuck position of the second substrate holder.Type: GrantFiled: March 30, 2001Date of Patent: September 16, 2003Assignee: Perkinelmer, Inc.Inventors: Gregory R. Baxter, Victor M. Jacobo, William J. Pappas
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Patent number: 6593995Abstract: In dual mode document imaging systems for either scanning a stationary document with a moving document imager on a large fixed platen or feeding documents past an imaging station on an adjacent smaller platen with the same document imager held there stationary, the smaller platen is mounted to allow vertical movement to allow for different thickness of documents being fed relative to a fixed axis of rotation constant velocity document transport. Thin flexible transition members bridge the outer edges of the gap between the lower surface of the vertically movable smaller platen and the lower surface of the fixed platen to allow the document imager to laterally slide freely, on focal distance maintaining slide pads, across a small gap between the bottom surface of one platen and the bottom surface of the other, with the document imager being spring biased upwardly towards the lower surfaces of both platens.Type: GrantFiled: April 12, 2002Date of Patent: July 15, 2003Assignee: Xerox CorporationInventor: Richard C. Hogestyn
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Patent number: 6583849Abstract: In exposing a photocurable resin to light, the light is irradiated on the photocurable resin while a base material to which the photocurable resin is applied is immersed in a liquid. An apparatus for carrying out the exposure includes an exposure tank in which a liquid does not dissolve the photocurable resin is reserved and a light source irradiating light to the photocurable resin is immersed in the liquid reserved in the tank. The exposure tank has two opposite side walls which have exposure windows closed by transparent plates respectively. The apparatus may include a plurality of light sources disposed so as to correspond to the representative exposing window. A temperature of the liquid in which the base material is immersed is controlled.Type: GrantFiled: July 31, 2000Date of Patent: June 24, 2003Assignee: Noda Screen Co., Ltd.Inventors: Masanori Noda, Hirotaka Ogawa
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Publication number: 20030081194Abstract: A method for scanning and autocropping the valid scope of a frame or consecutive frames of negative film comprises several steps, including step (A) through step (G). Step (A) is to build a database of negative film. Step (B) is to preview a negative film frame for obtaining a plurality of vertex coordinates. Step (C) is to calculate coordinates of the center of the frame according to the vertex coordinates obtained. Step (D) is to input the brand name of the negative film through an input interface of the scanner driver. Step (E) is to search the database for a valid frame scope of the negative film according to the brand name thereof. Step (F) is to calculate the plurality of vertex coordinates in the valid frame scope according to the coordinates of center and the valid frame scope of the negative film. And, step (G) is to display a cropped scope, that is the valid frame scope of the negative film, according to the plurality of the vertex coordinates in the valid frame scope of the negative film.Type: ApplicationFiled: October 29, 2001Publication date: May 1, 2003Inventor: Shih-Wen Chen
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Patent number: 6545744Abstract: Apparatus and method for side-by-side scanning of substrate panels to use a single-approach projection optical system to provide a patterned image on each of two substrate surfaces. More particularly, the system provides a technique for pattern scanning obverse and reverse surfaces, patterning one substrate surface, inverting the substrate panel and repositioning the substrate panel for patterning the opposite substrate surface. The inversion provides access to both surfaces of a substrate panel for pattern scanning by the same optics and the same precision x-y stage in quick succession. The system positions the same substrate panel inverted, or another substrate panel, as required, twice at one station or sequentially at first and second stations. The flipping mechanism may be a simple grabber/retractor with a rotatable wrist for substrate inverting; the stage selects the imaging station. Forwarders may be Inexpensive standard pick-and-place, slide-shuttle or carousel loader/unloader mechanisms.Type: GrantFiled: June 12, 2001Date of Patent: April 8, 2003Assignee: Anvik CorporationInventor: Marc I. Zemel
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Patent number: 6493060Abstract: The footprint of a document scanning unit such as a copier, facsimile machine or document scanner or combinations thereof is reduced by causing overlap of the leading and trailing edges of long document sheets to be scanned in the document delivery roller system downstream of the scanning station. Differential slippage of the overlapping ends between a drive roller and a pinch roller is provided in a first embodiment. A second embodiment uses a moveable pinch roller in the document delivery system to selectively open and close a gap to permit slippage of the leading and trailing edges of the document. A third embodiment uses three document delivery rollers defining two spaced nips in which the leading and trailing edges of a long document are simultaneously present and a crenellated roller surface to guide the leading edge of the document to the desired nip in the delivery system.Type: GrantFiled: February 21, 2001Date of Patent: December 10, 2002Assignee: Hewlett-Packard CompanyInventors: Glenn Gaarder, William Wistar Rhoads, Kevin Bokelman
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Patent number: 6437850Abstract: A method is described for exposing both sides of a light sensitive sheet such as a printed circuit board panel according to imaging data. The method uses a device that has an optical system for scanning the sensitive sheet by one or more beams. The optical system scans both sides with the scan lines on one side mutually positioned with respect to the scan lines on the other side. According to one implementation, the optical system includes two optical scanning units driven by a single source, with a switch alternating the beam from the source to one then the other optical scanning unit.Type: GrantFiled: March 16, 2001Date of Patent: August 20, 2002Assignee: ManiaBarco NVInventors: Marc Vernackt, Ronny A. De Loor, Anne-Marie F. Empsten, Mark Ryvkin
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Patent number: 6396561Abstract: A device is described for exposing both sides of a light sensitive sheet such as a printed circuit board panel according to imaging data. The device comprises an optical system for scanning the sensitive sheet by one or more beams. The optical system scans both sides with the scan lines on one side mutually positioned with respect to the scan lines on the other side. According to one implementation, the optical system includes two optical scanning units driven by a single source, with a switch alternating the beam from the source to one then the other optical scanning unit.Type: GrantFiled: November 8, 1999Date of Patent: May 28, 2002Assignee: ManiaBarco N.V.Inventors: Marc Vernackt, Ronny A. De Loor, Anne-Marie F. Empsten, Mark Ryvkin
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Patent number: 6369877Abstract: A system and method is disclosed that provides an automated, flow-through, dual side, laser direct imaging process and apparatus. This provides the capability to simultaneously register and image both sides of a substrate in a continuous flow-through process. The present invention provides efficiency improvements over the prior art on several levels. First, the prior art is batch process in which substrates are imaged one (or a batch) at a time in contrast with the present invention is a continuous, flow through, sequential process whereby a first substrate is followed into the apparatus by a second substrate which is, in turn followed by a third and so forth and the second substrate begins the process through the apparatus before the first substrate completes the process through the apparatus. Second, the process time per substrate is reduced as compared to the prior art.Type: GrantFiled: July 19, 2001Date of Patent: April 9, 2002Assignee: ManiaBarlo, N. V.Inventor: Marc Vernackt
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Patent number: 6356337Abstract: Apparatus and method for side-by-side scanning of a substrate to use a single-approach projection optical system to provide a patterned image on each of two surfaces of a substrate panel, and more particularly a technique for pattern scanning a first surface, reverse, of the substrate panel at a reverse patterning station, flipping the substrate panel over and repositioning the substrate panel at the same or another location for patterning the opposite surface, obverse. This provides access to a second surface of the substrate panel for pattern scanning, and positions another substrate panel at the first station. The flipping mechanism may be a simple grabber/retractor with a rotatable wrist for substrate inverting. The forwarder may be a simple shuttle mechanism. Inexpensive standard pick-and-place loader/unloader mechanisms may be used for loading and unloading.Type: GrantFiled: March 8, 2000Date of Patent: March 12, 2002Assignee: Anvik CorporationInventor: Marc I. Zemel
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Publication number: 20020024642Abstract: Apparatus and method for side-by-side scanning of a substrate to use a single-approach projection optical system to provide a patterned image on each of two surfaces of a substrate panel, and more particularly a technique for pattern scanning a first surface (reverse) of the substrate panel at a reverse patterning station, flipping the substrate panel over and repositioning the substrate panel at the same or another location for patterning the opposite surface (obverse). This provides access to a both surfaces of the substrate panel for pattern scanning, and positions a second substrate panel at the first station. The flipping mechanism may be a simple grabber/retractor with a rotatable wrist. The forwarder may be a simple shuttle mechanism. Inexpensive standard pick-and-place loader/unloader mechanisms may be used for loading and unloading. To reduce the number of substrate handling mechanisms, however, it may be economical for individual robots to perform multiple substrate panel handling tasks.Type: ApplicationFiled: June 12, 2001Publication date: February 28, 2002Inventor: Marc I. Zemel
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Patent number: 6333774Abstract: There is disclosed a printing method and a printing system for printing a pair of images on both sides of a recording sheet. When printing a first image on a first side of a recording sheet, a printer records directional marks records on the recording sheet to indicate the direction of the first image on the recording sheet. Thereafter when the recording sheet with the first image is manually set in the printer for printing a second image on the back side, the directional marks are detected from the recording sheet to detect the posture of the recording sheet in the printer: the direction of the recording sheet with respect to the first image, as well as which side of the recording sheet is oriented for printing. If the back side is not oriented for printing, the printer stops printing the second image, and makes a warning.Type: GrantFiled: April 10, 2000Date of Patent: December 25, 2001Assignee: Fuji Photo Film Co., Ltd.Inventors: Atsushi Ito, Kazuhito Fukushi
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Patent number: 6323936Abstract: The invention relates to a machine for exposing a panel to laser radiation, said panel having a working length L in a first direction Y, and being subdivided into N successive segments. The machine has a fixed structure; a horizontal panel support that is movable relative to the structure; device for generating and modulating N laser beams; and N optical units which are fixed relative to the structure. Each optical unit has deflector device for generating a continuously deflected beam, and a mirror for directing the deflected beam towards the panel, the length l1 of the mirror being greater than L/N.Type: GrantFiled: October 16, 2000Date of Patent: November 27, 2001Assignee: Automa-TechInventors: Serge Charbonnier, Damien Boureau
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Patent number: 6307614Abstract: The footprint of a document scanning unit such as a copier, facsimile machine or document scanner or combinations thereof is reduced by causing overlap of the leading and trailing edges of long document sheets to be scanned in the document delivery roller system downstream of the scanning station. Differential slippage of the overlapping ends between a drive roller and a pinch roller is provided in a first embodiment. A second embodiment uses a moveable pinch roller in the document delivery system to selectively open and close a gap to permit slippage of the leading and trailing edges of the document. A third embodiment uses three document delivery rollers defining two spaced nips in which the leading and trailing edges of a long document are simultaneously present and a crenellated roller surface to guide the leading edge of the document to the desired nip in the delivery system.Type: GrantFiled: December 1, 1999Date of Patent: October 23, 2001Assignee: Hewlett-Packard CompanyInventors: Glenn Gaarder, William Wistar Rhoads, Kevin Bokelman
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Publication number: 20010017690Abstract: A device is described for exposing both sides of a light sensitive sheet such as a printed circuit board panel according to imaging data. The device comprises an optical system for scanning the sensitive sheet by one or more beams. The optical system scans both sides with the scan lines on one side mutually positioned with respect to the scan lines on the other side. According to one implementation, the optical system includes two optical scanning units driven by a single source, with a switch alternating the beam from the source to one then the other optical scanning unit.Type: ApplicationFiled: March 16, 2001Publication date: August 30, 2001Inventors: Marc Vernackt, Ronny A. De Loor, Anne-Marie F. Empsten, Mark Ryvkin
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Patent number: 6249334Abstract: An image forming apparatus includes: a recording material accommodating device for accommodating recording materials; an image forming device for forming an image on the recording material; a conveyance section for conveying the recording material fed from the recording material accommodating device to the image forming device; a reversal and re-feeding device having a sheet reversal section and a sheet re-feeding section for conducting image formation on two sides of the recording material. After the image is formed by the image forming device on one side surface of the recording material conveyed from the recording material accommodating device through the conveyance section, the recording material is conveyed to the reversal and re-feeding device, and conveyed again to the image forming device through the sheet re-feeding section of the reversal and re-feeding device and the conveyance section, and an image is formed on the other side surface of the recording material by the image forming device.Type: GrantFiled: November 16, 1999Date of Patent: June 19, 2001Assignee: Konica CorporationInventors: Makoto Ui, Fumio Haibara
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Patent number: 6226069Abstract: The invention provides a stackless continuous dual-sided copying method in photocopying machines.Type: GrantFiled: November 23, 1999Date of Patent: May 1, 2001Assignee: Mita Industrial Co., Ltd.Inventors: Hidehiro Tabuchi, Yasuhiko Kida, Katsuji Furushige
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Patent number: 6215548Abstract: Apparatus that supports and aligns a pair of glass image masters facilitates relative movements of the masters between separated positions to accommodate insertion of a circuit board, and proximate position in precision alignment of the images carried thereby on opposite sides of the circuit board. Various configurations of reference blocks and engaging followers mounted on one and the other masters assure precision alignment of the masters in proximate position, and resilient bias force exerted in relative orientation between the masters assures precision aligning engagement of followers and reference blocks. Precision positional alignment of one image master relative to the other image master is accomplished by a differential threaded assembly between relatively moveable members interposed between an image master and a follower that engages a reference block.Type: GrantFiled: March 10, 2000Date of Patent: April 10, 2001Assignee: OLEC CorporationInventor: Albert H. Ohlig
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Patent number: 6211942Abstract: A double-sided exposure system (1) has a first work holding device (21L) for holding a substrate (P) opposite to an exposure mask (55) to expose a first surface of the substrate (P) through the exposure mask (55) to light, and a second work holding device (21R) for holding the substrate (P) opposite to another exposure mask (55) to exposure a second surface of the substrate (P) through the exposure mask (55) to light. Phases of operations for receiving, transferring and pretreating an unexposed substrate, and those of operations for transferring, exposing and pretreating the substrate having one surface processed by an exposure operation can be staggered to prevent time loss due to waiting during an exposure operation can be prevented even if the double-sided exposure system is provided with a single light source.Type: GrantFiled: March 10, 2000Date of Patent: April 3, 2001Assignee: Howa Machinery Ltd.Inventor: Atsushi Okamoto
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Patent number: 6201595Abstract: An electrophotographic color printer includes a photoconductor and a printing unit for producing a toner image on the photoconductor. The printing unit is removably provided in a receptacle in the printer.Type: GrantFiled: April 19, 1999Date of Patent: March 13, 2001Assignee: Oce Printing Systems GmbHInventors: Volkhard Maess, Martin Schleusener
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Patent number: 6198525Abstract: Apparatus for contact exposing each side of a substrate to a different image on a mask includes a first-side imaging station for imaging the first side of the substrate, a second-side imaging station for imaging the second side thereof, an intermediate station between the imaging stations for inverting the substrate. In each imaging station, the substrate is moved longitudinally with a transport carriage, from which it is transferred to an imaging carriage to be driven to an imaging point at which illumination through the mask occurs. The imaging carriage moves in both longitudinal and transverse directions, providing for both exposure to a mask covering the substrate and for step-and-repeat exposure of multiple portions of the substrate to a smaller image. Before exposure, the top surface of the substrate is aligned to be parallel to the adjacent mask, fiducial markings in the substrate are aligned with fiducial markings on the mask, and air is evacuated from the area between the mask and the substrate.Type: GrantFiled: February 19, 1999Date of Patent: March 6, 2001Assignee: International Business Machines CorporationInventors: Wayne Albert Barringer, Guenter Schaefer
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Patent number: 6177977Abstract: In a one-face mode, a first sheet discharge portion arranged on an upper face of an apparatus body, or a second sheet discharge portion arranged in the apparatus body so as to be freely opened and closed is opened, and a sheet forming an image on one surface thereof is discharged to this second sheet discharge portion. In a both-face mode, a sheet forming images on both surfaces thereof is conveyed to the first sheet discharge portion through a sheet discharge path formed by closing the second sheet discharge portion.Type: GrantFiled: December 20, 1999Date of Patent: January 23, 2001Assignee: Canon Kabushiki KaishaInventors: Tomoko Tanaka, Takashi Nakahara, Hitoshi Ueki, Kohei Maeda, Atsushi Wada, Hiroshi Fuse
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Patent number: 5995205Abstract: The invention relates to a light exposure installation of a double-sided printed circuit plate through a first and a second artwork equipped with a location mark. It includes a first (10) and a second fixed supporting structure in a horizontal plane, a first and a second support of the first and second artworks (12), optical means for detecting the positioning errors between said circuit and said first and second supports, means for moving perpendicularly to its plane, one of said supports towards the other support, means (26, 28) arranged outside the unit made up of said supports and said circuit to maintain said circuit fixed in its plane with respect to said supporting structure; and means (20, 22) for moving independently said first support (12) with respect to said circuit and said second support with respect to said circuit depending on the detected positioning errors.Type: GrantFiled: March 8, 1999Date of Patent: November 30, 1999Assignee: Automa-TechInventors: Alain Sorel, Serge Charbonnier
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Patent number: 5933216Abstract: A high-performance projection optical system uses the multiple spectral peaks of an excimer laser system by using an optical dispersive system to physically separate the broadband laser output into separate narrowband beams which can be used for imaging different substrate surfaces simultaneously. The separated narrowband beams are directed along different optical paths and used to illuminate the object planes of different, identical projection lenses. The projection lenses are designed for the narrowed bandwidth corresponding to one spectral peak of the excimer laser rather than the broadband, multiple-peak laser output This dramatically simplifies both the design and the construction of the projection lens, leading to substantial cost-savings.Type: GrantFiled: October 16, 1997Date of Patent: August 3, 1999Assignee: Anvik CorporationInventor: Thomas J. Dunn
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Patent number: 5929973Abstract: Disclosed is a double-side exposure apparatus having a substrate holder for holding a photosensitizable substrate; a first exposure system containing a first light source, a first illumination unit for striking a ray of light emitted from the first light source in a first mask, and a first projection optical unit for projecting an image of the first mask onto a front surface of the photosensitizable substrate; and a second exposure system, mounted at the side opposite to the first exposure system, containing a second light source, a second illumination unit for striking a ray of light emitted from the first light source in a second mask, and a second projection optical unit for projecting an image of the second mask onto a back surface of the photosensitizable substrate; wherein the pattern of the first mask is exposed to the front surface of the photosensitizable substrate and the pattern of the second mask is exposed to the back surface thereof substantially simultaneously with exposure of the pattern of thType: GrantFiled: October 22, 1996Date of Patent: July 27, 1999Assignee: Nikon CorporationInventors: Yukio Kakizaki, Hidetoshi Mori
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Patent number: 5923403Abstract: This projection imaging system is capable of simultaneously exposing both the upper and lower sides of a substrate while providing high-resolution, a large exposure area, and high exposure throughput.Type: GrantFiled: July 8, 1997Date of Patent: July 13, 1999Assignee: Anvik CorporationInventor: Kanti Jain
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Patent number: 5627007Abstract: A method for exposing a radiation sensitive material is disclosed comprising a double-sided laser exposure of the same information in register on both sides. In a preferred embodiment this material is a thermal imaging medium comprising a support, an image forming layer preferably containing carbon black, a release layer and an adhesive layer. By laser exposing this medium in register on both sides a heat mode image can be obtained after lamination and delamination which shows practically no pinhole defects.Type: GrantFiled: October 18, 1995Date of Patent: May 6, 1997Assignee: Agfa-Gevaert N.V.Inventors: Rudolf Van den Bergh, Johan Lamotte, Andr e Bellens
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Patent number: 5623719Abstract: Electrostatographic image reproduction apparatus forms images of toner particles on a receptor material moving along a transport path. A rotatable contact roller contacts the receptor material while it has an electrostatically charged toner particle image on at least the adjacent surface thereof. The contact roller is selected from a receptor material transport roller, a guiding roller, and a reversing roller. Electrostatic charging device provide an electrostatic charge, having the same polarity as the charge polarity of the toner particles, on the surface of the contact roller before contact of the receptor material with the surface of the contact roller. Cleaning means remove any toner particles from the surface of the roller after release of the receptor material from the surface of the contact roller. Smudging of the toner image on the receptor material is reduced.Type: GrantFiled: March 6, 1995Date of Patent: April 22, 1997Assignee: XEIKON NVInventors: Etienne M. De Cock, Lucien A. De Schamphelaere, Erik G. G. Van Weverberg
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Patent number: 5418607Abstract: A method and apparatus for recording a plurality of documents each carrying an image on one side thereof on both sides of paper sheets in order of page. During the first circulation or cycle of a recirculating document handler (RDH), the second document and successive every other document are illuminated to be sequentially reproduced on one side of paper sheets. The resulting one-sided copy sheets are sequentially stacked on an intermediate tray. Whether or not the last document during the first cycle is subjected to image formation is determined to thereby determine whether the number of documents is odd (subjected to image formation) or even (not subjected to it). A particular image forming processing matching the result of decision is executed. Further, whether or not the copy sheet should be routed through a turning device before discharge is determined to stack them in order of page.Type: GrantFiled: September 2, 1992Date of Patent: May 23, 1995Assignee: Ricoh Company, Ltd.Inventor: Tatsuo Tani
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Patent number: 5343269Abstract: A method and device for rotating images about an optical axis by changing the direction of a light path by a composite mirror unit having a simple structure. A printing device has a light source for emitting light to an image Xa on a negative film, a printing lens for adjusting the magnification of the light that passes through the image, and a composite mirror unit for reversing the light path to print an image Ya on a printing material. The entire composite mirror unit can be rotated through a predetermined angle about a rotary shaft by a driving motor. The composite mirror unit has two oppositely arranged mirrors which are mounted on separate blocks and so as to be inclined by 45.degree. with respect to the vertical. By turning the unit by .+-.45.degree. from the reference position (0.degree.), the image will rotate by 90.degree. or 270.degree. with respect to the image Xa.Type: GrantFiled: May 27, 1993Date of Patent: August 30, 1994Assignee: Noritsu Koki Co., Ltd.Inventors: Yuji Yamamoto, Ikuhiro Tamaki