Projection Printing And Copying Cameras Patents (Class 355/18)
  • Patent number: 11531232
    Abstract: An optical film for a back light unit that includes an array of light emitting diodes. The optical film includes a substrate, and a plurality of regions of spatially modulated microstructures on at least one side of the substrate. The spatially modulated microstructures have different sizes and/or shapes configured to create a gradient structure within each region. The gradient structure within each region is constructed and arranged to cause more spreading of light when positioned directly above an individual light emitting diode and less spreading of light at locations not directly above an individual light emitting diode. Within the back light unit, the gradient structure converts light beams emitted by the respective light emitting diode at different angles into a more uniform and higher on-axis luminance upon exiting the back light unit.
    Type: Grant
    Filed: January 22, 2021
    Date of Patent: December 20, 2022
    Inventors: Jennifer Aspell, Thomas A. Rinehart, Bing Shen, Kenneth L. Walker
  • Patent number: 11480871
    Abstract: An imprint apparatus is provided. The imprint apparatus includes an imprint head, at least one cable assembly configured to supply a signal to the imprint head, and a cable assembly sensor configured to detect a state of the at least one cable assembly. The signal may include one or more of a voltage signal, a current signal, and a pneumatic signal. The cable assembly sensor may include a strain gauge configured to measure a strain of the at least one cable assembly or a load cell configured to measure a force on the at least one cable assembly. For example, the cable assembly may include an electric wire and/or a gas supply tube.
    Type: Grant
    Filed: March 30, 2020
    Date of Patent: October 25, 2022
    Assignee: CANON KABUSHIKI KAISHA
    Inventors: Nilabh K. Roy, Mario Johannes Meissl
  • Patent number: 11384168
    Abstract: An additive manufacturing method wherein the carrier (400) is within a vessel (100), the vessel contains the free-radically crosslinkable resin (300) and a liquid (200) which is immiscible with the free-radically cross-linkable resin (300) and has a higher density than the free-radically crosslinkable resin (300), such that the free-radically crosslinkable resin (300) floats on top of the liquid (200) and, prior to each step II), the distance between the carrier (400) and the free-radically crosslinkable resin (300) is altered such that a layer of the free-radically crosslinkable resin forms above the uppermost surface (420), viewed in vertical direction, of the previously deposited layer of the construction material (600) and at least partially forms contact with this uppermost surface (420) of the previously deposited layer of the construction material (600). The free-radically crosslinkable resin (300) comprises a urethane (meth)acrylate.
    Type: Grant
    Filed: December 12, 2018
    Date of Patent: July 12, 2022
    Assignee: Covestro Deutschland AG
    Inventors: Dirk Achten, Thomas Buesgen, Roland Wagner, Florian Stempfle, Christoph Tomczyk
  • Patent number: 11320753
    Abstract: A projection exposure apparatus for semiconductor lithography includes at least one component which is provided with a damping arrangement for dissipating mechanical vibration energy. The damping arrangement includes a ferromagnetic element, through which a magnetic field passes at least partly. The magnetic flux density is inhomogeneous at least regionally. The ferromagnetic element is mounted in such a way that it is movable with a movement component in the direction of the inhomogeneity of the magnetic field.
    Type: Grant
    Filed: March 11, 2021
    Date of Patent: May 3, 2022
    Assignee: Carl Zeiss SMT GmbH
    Inventor: Philipp Meinkuss
  • Patent number: 11208291
    Abstract: A post-processing apparatus includes a post-processing unit configured to receive sheets from an image forming apparatus, perform processing on the received sheets, and then discharge the processed sheets through a discharge port. A sensor is configured to detect a presence of an object at the discharge port. The sensor includes a first light emitter on a first side of the discharge port that is positioned to emit a light across a width of the discharge port, a reflector on a second side of the discharge port opposite the first side in a first direction, and a first light receiver positioned to receive light of the first light emitter from the reflector. A controller is configured to terminate the processing on the received sheets by the post-processing unit when the sensor detects the presence of the object at the discharge port.
    Type: Grant
    Filed: July 6, 2020
    Date of Patent: December 28, 2021
    Assignee: TOSHIBA TEC KABUSHIKI KAISHA
    Inventors: Yasunobu Terao, Yoshiaki Sugizaki
  • Patent number: 11128776
    Abstract: The present invention provides a mechanism by which an image forming apparatus notifies an apparatus that inputs an image forming job to the image forming apparatus that the image forming apparatus is during remote support service, and suitably restricts acceptance of image forming jobs.
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: September 21, 2021
    Assignee: Canon Kabushiki Kaisha
    Inventor: Nobuhiro Kawamura
  • Patent number: 11004573
    Abstract: The present invention relates to a method creating highly concentrated quantum entangled particles which can be embedded into substrates such that the particles, and therefore substrates they are embedded upon are remotely controllable. The invention includes streaming a beam of particles through a beam splitter and then applying a selected correlation system, such as NMR or supercooling, to the particles in order to align the particle spins. The particles are then released from the correlation system resulting in an unnaturally high saturation of concentrated quantum entangled particles on a macro scale. The particles and substrates are then in a salve-x relationship configuration and are therefore remotely controllable. Through stimulation and detection, changes in state may be observable in order to determine the level of concentration and remote control.
    Type: Grant
    Filed: January 31, 2019
    Date of Patent: May 11, 2021
    Assignee: ARIAT Innovations
    Inventors: Everly Dean Putnam, David J. Kaufman
  • Patent number: 10992786
    Abstract: The disclosure details the implementation of au apparatus, method, and system comprising a portable device configured to communicate with a terminal and a network server, and execute stored program code in response to user interaction with an interactive user interface. The portable device contains stored program code configured to render an interactive use interface on a terminal output component to enable the user the control processing activity on the portable device and access data and programs from the portable device and a network server.
    Type: Grant
    Filed: July 18, 2019
    Date of Patent: April 27, 2021
    Assignee: IOENGINE LLC
    Inventor: Scott McNulty
  • Patent number: 10972584
    Abstract: The disclosure details the implementation of an apparatus, method, and system comprising a portable device configured to communicate with a terminal and a network server, and execute stored program code in response to user interaction with an interactive user interface. The portable device contains stored program code configured to render an interactive user interface on a terminal output component to enable the user the control processing activity on the portable device and access data and programs from the portable device and a network server.
    Type: Grant
    Filed: September 23, 2019
    Date of Patent: April 6, 2021
    Assignee: IOENGINE LLC
    Inventor: Scott McNulty
  • Patent number: 10885603
    Abstract: Embodiments provide for a graphics processing apparatus comprising a graphics processing engine configured for tiled memory access. In one embodiment the graphics processing engine is configured to render pixel data to a tile of memory and write to metadata associated with the tile of memory that indicates a data characteristic of the pixel data. The data characteristic of the pixel data includes whether the pixel data is transparent or whether the pixel data is an update of data from a previous frame.
    Type: Grant
    Filed: December 25, 2015
    Date of Patent: January 5, 2021
    Assignee: INTEL CORPORATION
    Inventor: Xiaocheng Marc Mao
  • Patent number: 10754254
    Abstract: An extreme ultraviolet (EUV) exposure apparatus includes a chamber, an EUV source in the chamber and configured to generate an EUV beam, an optical system above the EUV source and configured to provide the EUV beam to a substrate, a substrate stage in the chamber and configured to receive the substrate, a reticle stage in the chamber and configured to hold a reticle that is configured to project the EUV beam onto the substrate, and a plasma source configured to provide plasma to the reticle to electrically neutralize the reticle charged by the EUV beam.
    Type: Grant
    Filed: November 8, 2019
    Date of Patent: August 25, 2020
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Keunhee Bai, Jinhong Park, Jinseok Heo, Heeyoung Go, Seongchul Hong
  • Patent number: 10725275
    Abstract: The invention discloses an optical microscopy system (10) for stimulated emission depletion (STED) of an object (O). An optical element (6) is applied for focusing a first excitation (1) and a second depletion (2) beam on the object thereby defining a common optical path (OP) for both the first and the second beam. A phase modifying member (5) is inserted in the common optical path (OP), and the phase modifying member is optically arranged for leaving the wavefront of the first beam substantially unchanged, and for changing the wavefront of the second beam (2?) so as to create an undepleted region of interest (ROI) in the object. The first beam and the second beam have a common optical path because the phase modifying member adapts the wavefront or phase in such a way that it has no effect on the first beam, while on the second beam it gives rise to a wavefront, or phase change, resulting in a depleted region in the object (e.g. to the donut shaped spot) at the focal plane.
    Type: Grant
    Filed: January 13, 2011
    Date of Patent: July 28, 2020
    Assignee: Koninklijke Philips N.V.
    Inventors: Bernardus Hendrikus Wilhelmus Hendriks, Gert 'T Hooft, Jeroen Jan Lambertus Horikx
  • Patent number: 10649341
    Abstract: An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes.
    Type: Grant
    Filed: October 6, 2016
    Date of Patent: May 12, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Clemens Johannes Gerardus Van Den Dungen, Nicolaas Franciscus Koppelaars, Martinus Hendrikus Antonius Leenders, Paulus Martinus Maria Liebregts, Johannes Catharinus Hubertus Mulkens, Erik Henricus Egidius Catharina Eummelen, Marcel Beckers, Richard Moerman, Cédric Désiré Grouwstra, Danny Maria Hubertus Philips, Remko Jan Peter Verhees, Pieter Mulder, Evert Van Vliet
  • Patent number: 10634457
    Abstract: The invention discloses a stealth method by use of three-dimensional spraying.
    Type: Grant
    Filed: July 8, 2016
    Date of Patent: April 28, 2020
    Inventors: Jianbo Shi, Zhanyu Shi
  • Patent number: 10627741
    Abstract: An image forming apparatus includes a body casing provided therein with a container mounting part in which a plurality of toner containers are juxtaposed and mounted in a predetermined direction and an opening and closing door for opening and closing a toner container attaching/detaching opening formed on a sidewall opposite to the container mounting part in the body casing. The opening and closing door includes a plurality of sliding doors configured to slidably move within a range of a width of the opening in the predetermined direction.
    Type: Grant
    Filed: April 24, 2019
    Date of Patent: April 21, 2020
    Assignee: KYOCERA Document Solutions Inc.
    Inventor: Yoshiki Yokoyama
  • Patent number: 10587818
    Abstract: A vision system for a vehicle includes a camera disposed at a vehicle and having a field of view exterior of the vehicle. A brightness control, responsive to processing of a frame of image data captured by the camera, interpolates towards an expected brightness for a next frame of captured image data by calculating a set of at least three brightness values using three different control coefficients derived from a previous frame of image data captured by said camera. The brightness control interpolates toward the expected brightness of the next frame of captured image data using the current expected brightness value and two of the three brightness values derived from the three control coefficients derived from the previous frame of captured image data.
    Type: Grant
    Filed: July 31, 2017
    Date of Patent: March 10, 2020
    Assignee: MAGNA ELECTRONICS INC.
    Inventor: Wenxue Gao
  • Patent number: 10527955
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: March 29, 2019
    Date of Patent: January 7, 2020
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • Patent number: 10458909
    Abstract: A micro electrical mechanical system (MEMS) optical sensor including a fluid channel having an input portion, an output portion and a curved portion positioned between the input portion and the output portion; a light source impinging on a first boundary of the curved portion and exiting from a second boundary of the curved channel; a photodetector to record a light path of refraction of the light source exiting from the second boundary of the curved portion; a processor to compute the refractive index of a fluid in the curved portion using the light path of refraction of the light source and compare the computed refractive index to a known refractive index for the fluid to determine a difference between the computed refractive index and the known refractive index.
    Type: Grant
    Filed: October 24, 2018
    Date of Patent: October 29, 2019
    Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Jonathan Fry, Daniel Piper, Jang Sim, Yongchun Xin
  • Patent number: 10341570
    Abstract: An assembly for a rotatable surveillance camera is disclosed. The assembly can include a gimbal ring, a base securable to the gimbal ring and a flexible hook member securable to the base. The gimbal ring can have a slotted channel recessed into an interior surface. The slotted channel can have a spiral configuration with opposing ends and can extend around the interior of the gimbal ring at least one full revolution. The base can have a side wall with a slot provided through at least a portion thereof. The hook member can have a proximal end within the interior of the base and can extend outside the base through the slot to an opposing end having a tab. The slotted channel can receive the tab and be slidably rotated around said tab between the opposing ends during rotation of the gimbal ring relative the base.
    Type: Grant
    Filed: April 10, 2018
    Date of Patent: July 2, 2019
    Assignee: ADEMCO INC.
    Inventors: Lei Kong, Kevin Gao, Lili Zou
  • Patent number: 10248034
    Abstract: Liquid is supplied to a space between the projection system and the substrate by an inlet. In an embodiment, an overflow region removes liquid above a given level. The overflow region may be arranged above the inlet and thus the liquid may be constantly refreshed and the pressure in the liquid may remain substantially constant.
    Type: Grant
    Filed: October 28, 2016
    Date of Patent: April 2, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Bob Streefkerk, Johannes Catharinus Hubertus Mulkens, Erik Theodorus Maria Bijlaart, Aleksey Yurievich Kolesnychenko, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Bernardus Antonius Slaghekke, Patricius Aloysius Jacobus Tinnemans, Helmar Van Santen
  • Patent number: 10248064
    Abstract: An image forming apparatus includes: a print job acquisitor that acquires a print job; a hardware processor that calculates, before starting printing based on the print job, a distance in a paper conveying direction in which the printing is continuously executed, and in a case where the distance is equal to or greater than a predetermined distance, allows a user to select at least one image as a print image out of a first image generated on the basis of the print job and a second image different from the first image; and a printing part that prints the print image selected by the user on paper.
    Type: Grant
    Filed: March 7, 2018
    Date of Patent: April 2, 2019
    Assignee: Konica Minolta, Inc.
    Inventor: Masahiro Matsuo
  • Patent number: 10175579
    Abstract: A manufacturing method of a glass substrate is provided, in which a mask including a light-blocking area, a transparent area and a partial-transparent area is adopted. The partial-transparent area protrudes from edges of the light-blocking area to admit some of the UV rays to pass through. In addition, a glass substrate manufactured with the method is also disclosed. By arranging the partial-transparent area on the edges of the light-blocking area, the mask is formed with a slope having a small angle after a lithography process. As such, in an etching process, an edge of a thin film is formed with a slope having a small angle, which contributes to the formation of a second thin film. The thin films are prevented from being fragmented around the slope and the ITO layer is also prevented from fragmented around the periphery of the through hole.
    Type: Grant
    Filed: July 27, 2016
    Date of Patent: January 8, 2019
    Assignee: Shenzhen China Star Optoelectronics Technology Co., Ltd
    Inventor: Li Chai
  • Patent number: 10101668
    Abstract: An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength ? includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion ?ni=ni(?0)?ni(?0+1 pm) for a wavelength variation of 1 pm from a wavelength ?0. The objective satisfies the relation ? ? i = 1 N ? ? ? ? n i ? ( s i - d i ) ? ? 0 ? NA 4 ? A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected.
    Type: Grant
    Filed: December 31, 2012
    Date of Patent: October 16, 2018
    Assignee: CARL ZEISS SMT GMBH
    Inventors: Alexander Epple, Heiko Feldmann, Hans-Juergen Rostalski
  • Patent number: 9877020
    Abstract: Provided are an inter-layer video encoding method and apparatus therefor and an inter-layer video decoding method and apparatus therefor. An inter-layer video decoding method involves reconstructing a first layer image, based on encoding information obtained from a first layer bitstream; in order to reconstruct a second layer block determined as a predetermined partition type and to be in a prediction mode, determining whether to perform illumination compensation for the reconstructed second layer block determined by using a first layer reference block that is from among the reconstructed first layer image and corresponds to the second layer block; and generating the reconstructed second layer block by using inter-layer prediction information obtained from a second layer bitstream and the first layer reference block, and generating a second layer image including the reconstructed second layer block whose illumination is determined according to whether the illumination compensation was performed.
    Type: Grant
    Filed: January 10, 2014
    Date of Patent: January 23, 2018
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Min-woo Park, Jae-won Yoon, Byeong-doo Choi
  • Patent number: 9835940
    Abstract: A method for fabricating a pellicle assembly includes forming a release layer over a carrier. A membrane layer is fabricated over the release layer. A pellicle frame is attached to the membrane layer. After attaching the pellicle frame to the membrane layer, a release treatment process is performed to the release layer to separate the carrier from the membrane layer. A pellicle assembly including the pellicle frame and the membrane layer attached to the pellicle frame is formed.
    Type: Grant
    Filed: September 18, 2015
    Date of Patent: December 5, 2017
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Hao Tseng, Sheng-Chi Chin, Yuan-Chih Chu
  • Patent number: 9703211
    Abstract: A method for sub-diffraction-limited patterning using a photoswitchable layer is disclosed. A sample of the photoswitchable layer can be selectively exposed to a first wavelength of illumination that includes a super-oscillatory peak. The sample can be selectively exposed to a second wavelength of illumination that does not include the super-oscillatory peak. A region in the sample that corresponds to the super-oscillatory peak and is associated with the second transition state can optionally be converted into a third transition state. The region in the sample at the third transition state can constitute a pattern of an isolated feature with a size that is substantially smaller than a far-field diffraction limit.
    Type: Grant
    Filed: October 16, 2015
    Date of Patent: July 11, 2017
    Assignee: University of Utah Research Foundation
    Inventor: Rajesh Menon
  • Patent number: 9536273
    Abstract: The present invention relates to a method for simulating image quality improvement of an image display device, in which the image display device to be tested is made to display an optimized picture quality with a simplified process by applying simplified simulation program and device; and a device therefor.
    Type: Grant
    Filed: July 28, 2011
    Date of Patent: January 3, 2017
    Assignee: LG Display Co., Ltd.
    Inventors: Dong-Woo Kang, Hyun-Ho Shin, Moo-Jong Lim, Jae-Kyeong Yun, Ho-Young Jung
  • Patent number: 9360792
    Abstract: An optical writing controller controls emission of a light source device including multiple light emitting element rows each constituted by multiple light emitting elements arranged in a sub-scanning direction to form an electrostatic latent image on a photoconductor. The optical writing controller includes an image information acquisition unit to acquire image information on an image to be formed as the electrostatic latent image; a light source control unit to sequentially control emission of the multiple light emitting elements on the basis of information on pixels generated on the basis of the acquired image information; an error information acquisition unit to acquire information indicating an error of a direction in which the light emitting elements are arranged with respect to the sub-scanning direction; and an adjustment value generation unit to generate an adjustment value for adjusting a light quantity of each light emitting element on the basis of the error.
    Type: Grant
    Filed: March 13, 2015
    Date of Patent: June 7, 2016
    Assignee: Ricoh Company, Limited
    Inventors: Masatoshi Murakami, Masayuki Hayashi, Motohiro Kawanabe, Yoshinori Shirasaki, Yuusuke Kohri, Akinori Yamaguchi
  • Patent number: 9342533
    Abstract: A system for document searching can include a camera. The system may further include an image capturing module configured to capture a first image of a first portion of a document, a feature recognition module in communication with the image capturing module, the feature recognition module configured to determine a first feature associated with the first image, a search module configured to send search information to a server and receive a first result from a first search of a set of documents that was performed based on one or more search criteria determined based on the first feature associated with the first image, and a search interface configured to present the first result on the device.
    Type: Grant
    Filed: July 2, 2014
    Date of Patent: May 17, 2016
    Assignee: Open Text S.A.
    Inventor: Simon Dominic Copsey
  • Patent number: 9256137
    Abstract: An exposure apparatus includes a first member disposed at least in a part of a periphery of an optical path of the exposure light, and has a first face that faces an upper face of the object through a first gap and holds the liquid between the upper face of the object and the first face, a second member disposed at an outer side of the first face with respect to the optical path and has a second face facing the upper face of the object through a second gap, a first supply port disposed at an outer side of the second face and supplies a fluid, and a first suction port disposed between the first face and the second face, and suctions at least part of gas in an outer space of the second member via a gap between the second face and the upper face of the object.
    Type: Grant
    Filed: August 23, 2012
    Date of Patent: February 9, 2016
    Assignee: NIKON CORPORATION
    Inventor: Hiroyuki Nagasaka
  • Publication number: 20150138526
    Abstract: Disclosed is a printing device comprising a collimation layer disposed between a display screen and a sheet of instant film. The printing device quickly and compactly prints the display screen contents to the instant film, using a collimation layer that may be embedded in an opaque ribbon and drawn across the instant film. The collimation layer blocks any light not parallel to the normal vector of the display screen, thereby eliminating the need for traditional lenses to focus light. This in turn allows the printing device to yield high resolution photos with very short printing timeframes.
    Type: Application
    Filed: February 20, 2014
    Publication date: May 21, 2015
    Applicant: Pacific Opal LLC
    Inventors: Ismail Degani, Isaac Degani
  • Publication number: 20150072293
    Abstract: A method of forming a three-dimensional object is carried out by providing a carrier and an optically transparent member having a build surface, the carrier and the build surface defining a build region therebetween; filling the build region with a polymerizable liquid; irradiating the build region through the optically transparent member to form a solid polymer from the polymerizable liquid and advancing the carrier away from the build surface to form the three-dimensional object from the solid polymer, while also concurrently with the irradiating and/or advancing steps: (i) continuously maintaining a dead zone of polymerizable liquid in contact with the build surface, and (ii) continuously maintaining a gradient of polymerization zone between the dead zone and the solid polymer and in contact with each thereof. The gradient of polymerization zone comprises the polymerizable liquid in partially cured form (e.g.
    Type: Application
    Filed: August 11, 2014
    Publication date: March 12, 2015
    Inventors: Joseph M. DeSimone, Alexander Ermoshkin, Nikita Ermoshkin, Edward T. Samulski
  • Patent number: 8895225
    Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of increasing the polarity by the action of the acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) forming a protective film on the resist film with a protective film composition after forming the resist film and before exposing the resist film, (c) exposing the resist film via an immersion medium, and (d) performing development with a negative developer.
    Type: Grant
    Filed: November 19, 2013
    Date of Patent: November 25, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Hideaki Tsubaki
  • Publication number: 20140312500
    Abstract: Features are fabricated on a semiconductor chip. The features are smaller than the threshold of the lithography used to create the chip. A method includes patterning a first portion of a feature (such as a local interconnect) and a second portion of the feature to be separated by a predetermined distance, such as a line tip to tip space or a line space. The method further includes patterning the first portion with a cut mask to form a first sub-portion (e.g., a contact) and a second sub-portion. A dimension of the first sub-portion is less than a dimension of a second predetermined distance, which may be a line length resolution of a lithographic process having a specified width resolution. A feature of a semiconductor device includes a first portion and a second portion having a dimension less than a lithographic resolution of the first portion.
    Type: Application
    Filed: April 17, 2013
    Publication date: October 23, 2014
    Applicant: Qualcomm Incorporated
    Inventors: John J. Zhu, Zhongze Wang, Yang Da
  • Patent number: 8857999
    Abstract: The present disclosure relates to systems and methods that are related to projection.
    Type: Grant
    Filed: August 22, 2008
    Date of Patent: October 14, 2014
    Assignee: The Invention Science Fund I, LLC
    Inventors: Edward K. Y. Jung, Eric C. Leuthardt, Royce A. Levien, Richard T. Lord, Robert W. Lord, Mark A. Malamud, John D. Rinaldo, Jr., Lowell L. Wood, Jr.
  • Publication number: 20140300883
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: May 8, 2014
    Publication date: October 9, 2014
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
  • Patent number: 8852847
    Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with respect to water, wherein the resist composition for negative development contains a resin capable of increasing the polarity by the action of an acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) exposing the resist film via an immersion medium, and (c) performing development with a negative developer.
    Type: Grant
    Filed: November 7, 2013
    Date of Patent: October 7, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Hideaki Tsubaki
  • Patent number: 8845114
    Abstract: To provide a lighting device for image capturing in an electronic component mounting apparatus that has small dimensions in the height direction and a small size in a plan view and thus can meet demands in a reduction in size. In an electronic component mounting apparatus, a surface lighting unit 30 that emits illumination light to a substrate, which is an object whose image is to be captured by a camera 25, includes as a main component a flat lighting substrate 31 that is provided between the camera 25 and the substrate, which is an object whose image is to be captured, so as to be substantially parallel to the surface of the substrate.
    Type: Grant
    Filed: February 19, 2008
    Date of Patent: September 30, 2014
    Assignee: Panasonic Corporation
    Inventors: Yasuichi Okada, Tadashi Endou, Hirokazu Tanaka
  • Publication number: 20140233031
    Abstract: A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large targets and small targets which are for measuring overlay. Some of the smaller targets are distributed at locations between the larger targets, while other small targets are placed at the same locations as a large target. By comparing values measured using a small target and large target at the same location, parameter values measured using all the small targets can be corrected for better accuracy. The large targets can be located primarily within scribe lanes while the small targets are distributed within product areas.
    Type: Application
    Filed: April 25, 2014
    Publication date: August 21, 2014
    Applicant: ASML Netherlands B.V.
    Inventors: Maurits VAN DER SCHAAR, Patric Warnaar, Kaustuve Bhattacharyya, Hendrik Jan Hidde Smilde, Michael Kubis
  • Publication number: 20140232997
    Abstract: The disclosed embodiments provide systems and methods for mitigating lensing and scattering as an optical fiber is being inscribed with a grating. The disclosed systems and methods mitigate the lensing phenomenon by surrounding an optical fiber with an index-matching material that is held in a vessel with a sealed phase mask. The sealed phase mask allows it to be in contact with a liquid index-matching material without having the liquid index-matching material seep into the grooves of the sealed phase mask. Thus, for some embodiments, the sealed phase mask may be immersed in a liquid index-matching material without adversely affecting the function of the phase mask.
    Type: Application
    Filed: February 20, 2014
    Publication date: August 21, 2014
    Applicant: OFS Fitel, LLC
    Inventors: Kenneth S. Feder, Paul S. Westbrook
  • Publication number: 20140205934
    Abstract: A reticle for multiple patterning a layer of an integrated circuit die includes a first portion with a first layout pattern for multiple patterning the layer of the integrated circuit die, and a second portion with a second layout pattern for multiple patterning the layer of the integrated circuit die. The first layout pattern is different from the second layout pattern.
    Type: Application
    Filed: January 21, 2013
    Publication date: July 24, 2014
    Applicant: XILINX, INC.
    Inventor: Xilinx, Inc.
  • Publication number: 20140199615
    Abstract: A two-dimensional dense array of contact holes can be printed on a negative photoresist employing a combination of a quadrupole illumination lens and a lithographic mask including a criss-cross pattern of opaque lines. The openings in the quadrupole illumination lens are aligned along the perpendicular directions of the opaque lines. Discrete contact holes can be printed on a negative photoresist employing a combination of a quadrupole illumination lens and a lithographic mask including a criss-cross pattern of opaque subresolution assist features and discrete opaque cross patterns. Alternately, a two-dimensional array of contact holes can be printed on a negative photoresist employing a quadrupole illumination lens and a checkerboard pattern of openings. The openings in the quadrupole illumination lens are in diagonal directions.
    Type: Application
    Filed: January 15, 2013
    Publication date: July 17, 2014
    Applicant: International Business Machines Corporation
    Inventors: Martin Burkhardt, Yongan Xu
  • Publication number: 20140191372
    Abstract: Spacer-based pitch division lithography techniques are disclosed that realize pitches with both variable line widths and variable space widths, using a single spacer deposition. The resulting feature pitches can be at or below the resolution limit of the exposure system being used, but they need not be, and may be further reduced (e.g., halved) as many times as desired with subsequent spacer formation and pattern transfer processes as described herein. Such spacer-based pitch division techniques can be used, for instance, to define narrow conductive runs, metal gates and other such small features at a pitch smaller than the original backbone pattern.
    Type: Application
    Filed: December 29, 2011
    Publication date: July 10, 2014
    Inventors: Swaminathan Sivakumar, Elliot N. Tan
  • Patent number: 8773730
    Abstract: A scan assisting fixing device and a scanner using the same are provided. The fixing device is for fixing an object to be scanned, which includes a scanning portion and a holding portion. The fixing device includes an accommodation region, a scan window and a protrusion portion. When the holding portion is loaded in the accommodation region, the scanning portion correspondingly disposed in the scan window is retained and fixed by the protrusion portion, and the position of the holding portion in the fixing device is constant, so that the scanning portion is always within the range of the field depth of the scanner regardless of the specification of the positive film holder, and the clarity of the scanned image is assured.
    Type: Grant
    Filed: May 23, 2011
    Date of Patent: July 8, 2014
    Assignee: Qisda (Suzhou) Co., Ltd
    Inventors: Yun-Bin Gu, Yong-Xiang Yi, Zhi-Hai Zhang, Jian-Chun Yu, Hong-Peng Li, Ming-Jie Zhao
  • Patent number: 8698997
    Abstract: A stereoscopic image printing device includes an actuating unit for moving a grating structure, and a positioning module. The positioning module includes a plurality of shelters, a planar light source for emitting light to pass through the grating structure and an interval between the adjacent shelters, and a photosensitive component for receiving the light passing through the grating structure and the interval between the adjacent shelters, so as to generate a corresponding optical intensity signal. The printing device further includes a controller coupled to the actuating unit and the photosensitive component for controlling the actuating unit to move the grating structure according to the optical intensity signal generated by the photosensitive component.
    Type: Grant
    Filed: March 21, 2011
    Date of Patent: April 15, 2014
    Assignee: Hiti Digital, Inc.
    Inventor: Wen-Yue Wu
  • Publication number: 20140072904
    Abstract: There is provided a photomask capable of improving alignment accuracy with respective photomasks disposed on the front and rear faces of a substrate. A photomask has a drawing pattern for exposure formed on one face opposing a substrate, a first alignment mark for alignment with a substrate side mark formed on the substrate, the first alignment mark being provided in a region of the one face, the region opposing the substrate when the substrate is retained and the drawing pattern is not formed in the region, and a second alignment mark for alignment with a third alignment mark provided on another photomask, the second alignment mark being provided in a region which does not oppose the substrate when the substrate is retained.
    Type: Application
    Filed: August 30, 2013
    Publication date: March 13, 2014
    Applicant: NIPPON MEKTRON, LTD.
    Inventors: Shoji TAKANO, Fumihiko MATSUDA, Yoshihiko NARISAWA
  • Patent number: 8661375
    Abstract: Systems and methods for generating an image are provided. These systems and methods include generating multiple light beams from a light source by controlling at least one parameter of the light source to be different among each of the multiple light beams. The systems and methods further include forming multiple light patterns of circuit structures that are separated in frequency by directing each of the light beams at a mask of circuit features. The systems and methods, when used in lithography for example, further include directing each of the light patterns toward a silicon substrate. The silicon substrate includes a silicon wafer having a surface at least partially covered with at least one of a photoresist material and a reversible contrast enhancement material (R-CEM).
    Type: Grant
    Filed: December 16, 2010
    Date of Patent: February 25, 2014
    Assignee: Cadence Design Systems, Inc.
    Inventor: Yao-Ting Wang
  • Publication number: 20130340637
    Abstract: An apparatus for and a method of loading and unloading of plates to and from an imager. The apparatus includes a loading area holding one single or a plurality of plates and an unloading area holding a single plate, the areas arranged vertically. The plate includes ultraviolet curable material. The apparatus includes a control system configured when in operation to control the automated loading and unloading and the apparatus elements therefor. One fully automatic version includes automatic loading from a stack or set of plate magazines and in the case that the plate includes a protective sheet thereon, includes removing the protective sheet from the plate. Some versions also include one or more ultraviolet sources to irradiate the flexographic plates with ultraviolet radiation during the automated loading and/or unloading. The ultraviolet sources are controlled by the same control system.
    Type: Application
    Filed: August 23, 2013
    Publication date: December 26, 2013
    Applicant: Esko-Graphics Imaging GmbH
    Inventors: Jörg Wolterink, Jörg Koberg
  • Publication number: 20130337386
    Abstract: The invention relates to a processing apparatus for processing a flexographic plate, comprising a receiving unit for receiving a flexographic plate including a relief layer containing a photosensitive material, and an optical system for locally exposing the relief layer. The optical system includes an illumination system for generating an optical beam and an imaging system for directing the beam towards the relief layer for polymerizing a relief pattern in the layer. The relief pattern is constituted by a multiple number of relief parts upwardly protruding from a ground layer, wherein a protruding relief part includes a top section and a basis section. The basis section has a supporting section supporting the top section, and a stiffening section extending from the supporting section in a lateral direction.
    Type: Application
    Filed: June 14, 2012
    Publication date: December 19, 2013
    Inventors: Dirk De Rauw, Pieter Lenssens
  • Publication number: 20130321789
    Abstract: A mask data generation method includes obtaining data of a pattern including a plurality of pattern elements, dividing a region of the pattern into a plurality of sections so that each pattern element is arranged in each section by using the obtained data of the pattern and generating map data including information indicative of presence or absence of the pattern element in each section, setting one piece of mask individual information out of a plurality pieces of mask individual information for each section including the pattern element by using a constraint condition, which inhibits setting of same mask individual information in a constraint region including one section and surrounding sections thereof, and the map data, and generating the data of the plurality of masks corresponding to the plurality pieces of mask individual information by using the set mask individual information.
    Type: Application
    Filed: May 30, 2013
    Publication date: December 5, 2013
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Tadashi Arai