With Developing Patents (Class 355/27)
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Patent number: 6558051Abstract: An automatic processing apparatus is provided which includes a processing station for photographic-processing a film; a scanner for scanning the film during the photographic-processing by the processing station; an image data memory device for storing image data acquired by the scanner; and an image output device for outputting the image data stored in the image data memory device in parallel with a following photographic-processing.Type: GrantFiled: March 14, 2001Date of Patent: May 6, 2003Assignee: Konica CorporationInventors: Satoru Kuse, Koji Takemura, Katsutoshi Sawada
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Patent number: 6559930Abstract: An image exposure apparatus in which positioning of a photosensitive material, such as a printing plate to be wound around a rotating drum, is implemented in a small space. A turning unit and a transport conveyor are provided at a plate supply/transport section. The turning unit trains the printing plate about the rotating drum and feeds the plate to the transport conveyor. At the transport conveyor, the printing plate is transported and a leading end of the printing plate abuts pin rollers. Then, a positioning motor is operated to move the turning unit and the transport conveyor integrally. Thus, the printing plate abuts another pin roller in a width direction to implement positioning of the printing plate. The leading end of the positioned printing plate is then fed to a puncher by the transport conveyor.Type: GrantFiled: June 8, 2001Date of Patent: May 6, 2003Assignee: Fuji Photo Film Co., Ltd.Inventor: Takao Ozaki
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Patent number: 6556274Abstract: A process for full-automatic and synchronous quick thermoprinting of stereoscopic color film and apparatus adopting the process uses the internationally accepted nontoxic oil ink to design patterns on a transfer medium, which medium is in turn absorbed by a special thin film so as to be attached to a printing stock, whereupon the thus prepared printing stock is put into the apparatus. By gas pressure a pressure column of an inclined surface is pushed downward so as to contact and press a sliding mold jig of the inclined surface to synchronously move toward the center, so that each outer mold thermocompresses onto the outer surface of the printing stock from upper, left, right, front and rear directions simultaneously. After a predetermined period at predetermined temperature, the mold automatically returns to its original position. The disadvantages of manual operation which is of lower efficiency and unstable quality are thus overcome.Type: GrantFiled: September 28, 2001Date of Patent: April 29, 2003Assignee: Wan Ho Industrial Co., Ltd.Inventor: Chit Ho Tam
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Patent number: 6554504Abstract: Photo-images are read from film using a digital film processing (DFP) system, and then transmitted for processing, along with any necessary associated information. After processing, the images can be stored in a database or transmitted to an image delivery system, such as a personal computer or kiosk, where a print, negative, computer file, or other representation of the image is prepared for delivery to a customer. All or any part of the image processing, archival, manipulation, retrieval, and delivery systems and associated interfaces may reside on an Internet web site.Type: GrantFiled: February 5, 2001Date of Patent: April 29, 2003Assignee: Applied Science Fiction, Inc.Inventors: Stacy S. Cook, Leland A. Lester
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Patent number: 6540416Abstract: One embodiment is a system for the development of a film includes an infrared light source and a visible light source. The system also includes at least one sensor operable to collect a first set of optical data from light associated the infrared light source and a second set of optical data from light associated with the visible light source. The system further includes a processor in communication with the at least one sensor, the processor operable to determine an image on the film in response to the first and second sets of optical data.Type: GrantFiled: December 29, 2000Date of Patent: April 1, 2003Assignee: Applied Science Fiction, Inc.Inventors: Albert D. Edgar, Stacy S. Cook
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Publication number: 20030058428Abstract: In a method for controlling a processing apparatus, an error value between an input value of the processing apparatus for processing a subject to be processed, and a measurement value obtained by measuring the subject being processed is obtained. A correction value is computed for correcting the input value of the processing apparatus in the direction of decreasing the error value, and the values are managed as processing data to be utilized in computing a next correction value. Previous processing data having a history identical to that of the subject loaded to the processing apparatus is searched, and a current bias correction value is predicted from a plurality of most recent correction values having the identical history. Also, a current random correction value is predicted by means of a neural network on the basis of a plurality of most recent random correction values. The predicted bias correction value is summed with the random correction value as a current correction value of the processing apparatus.Type: ApplicationFiled: February 12, 2002Publication date: March 27, 2003Inventors: Kyoung Shik Jun, Chan Hoon Park, Yil Seug Park, Bong Su Cho, Hyun Tai Kang, Jae Won Hwang, Young Ho Jei
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Patent number: 6538718Abstract: To achieve for a photographic film conveying device that no external force causing conveying speed to vary is applied to a photographic film during image reading, after a preceding photographic film is discharged from a reading conveying path, the time until a subsequent photographic film is conveyed to the reading conveying path is not long, or even if a photographic film set in a film supplying section is elongate, image reading of photographic films by an image reading section can be carried out efficiently, there is provided a photographic film conveying device comprising a section setting a discharge conveying section in a withdrawn state or a conveying state, a section controlling conveying of preceding and subsequent photographic films, or a section switching a conveying path of a photographic film.Type: GrantFiled: June 5, 2001Date of Patent: March 25, 2003Assignees: Fuji Photo Film Co., Ltd., Fuji Photo Optical Co., Ltd.Inventors: Shigeru Ando, Yasuhiro Kaneko
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Patent number: 6515731Abstract: A substrate processing apparatus configured to process a substrate by a photolithography process, comprising a plurality of heating sections for heating substrate, respectively, a plurality of first cooling sections, the number of which is equal to or smaller than the number of the heating sections, for cooling the substrate heated in the heating section to a first temperature, a second cooling section for further cooling the substrate cooled in the first cooling section to a second temperature lower than the first temperature, and a plurality of liquid process sections for supplying a process liquid to the substrate cooled in the second cooling section to form a liquid film of the process liquid on the substrate.Type: GrantFiled: April 27, 2000Date of Patent: February 4, 2003Assignee: Tokyo Electron LimitedInventor: Masami Akimoto
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Patent number: 6509950Abstract: A preexposure apparatus comprises a film supply station ST1 for arranging a film cartridge 14 containing a film 12 accommodated therein, a film-drawing station-ST3 for automatically drawing the film 12 over its entire length, an exposure station ST5 for exposing a predetermined portion of the drawn film 12 with an image by the aid of an exposure section 32, a winding station ST6 for automatically rewinding the film 12 after the exposure into the film cartridge 14, and a withdrawing station ST8 for withdrawing the film cartridge 14. Accordingly, the predetermined portion of the film can be preexposed with a desired image automatically and efficiently.Type: GrantFiled: July 10, 2001Date of Patent: January 21, 2003Assignee: Fuji Photo Film Co., Ltd.Inventor: Shinji Nishizawa
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Publication number: 20030012574Abstract: A method of processing a print order in which the entire order is delivered simultaneously. An exposed sheet carrying all the latent images of the order is developed in a single processing space.Type: ApplicationFiled: June 5, 2002Publication date: January 16, 2003Applicant: Eastman Kodak CompanyInventors: Nigel R. Wildman, Roy King
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Patent number: 6507386Abstract: An image forming apparatus including a photosensitive member and a support portion for detachably supporting a developing unit for developing a latent image formed on the photosensitive member. The support portion supports the developing unit in a pivotable manner. A driving force transmitting portion disposed on an axis substantially the same as a pivot axis of the developing unit supported by the support portion is adapted to transmit a driving force to the developing unit supported by the support portion.Type: GrantFiled: July 28, 1998Date of Patent: January 14, 2003Assignee: Canon Kabushiki KaishaInventor: Mitsugu Inomata
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Publication number: 20030007053Abstract: Method for high definition printing to be dip transferred to a three-dimensional article comprises four color process printing a digital image from a digital image file onto a water soluble polymer film with solvent based ink to form a printed water soluble film and dip transfer printing the solvent based ink image through transcription on the surface of the article. The method is suitable for printing three-dimensional articles of a variety of shapes with high definition, photographic-quality images. The method is particularly suitable for decorating articles with complex images such as camouflage patterns.Type: ApplicationFiled: July 9, 2001Publication date: January 9, 2003Inventors: Royce J. Bowles, James Patrick Epling, James Phillip Hand, Samuel C. Ruffner, Jeffery Wayne Walker
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Publication number: 20020191162Abstract: An image recording device includes: a supplying section for supplying recording media; an image recording section for exposing, on the basis of digital image data, the recording media supplied from the supplying section, so as to record images on the recording media; a developing section for developing the recording media on which the images have been recorded; a drying section for drying the recording media which have been developed; and a sealing mechanism, provided between the image recording section and one of the developing section and the drying section, for preventing one of heat and vapor from one of the developing section and the drying section from entering the image recording section. The image recording section is disposed above or below the developing section.Type: ApplicationFiled: June 13, 2002Publication date: December 19, 2002Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Naoyuki Morita
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Publication number: 20020191164Abstract: To enable continuation of the transport of a strip-shaped workpiece, its delivery from a delivery reel and its take-up onto a take-up reel even for strip-shaped workpieces that have through openings, such as device holes or the like, in portions thereof, an upper sensor and a lower sensor are provided for detecting sagging of the workpiece at two points, one above the other, and a control element controls the drive of the delivery reel based on the outputs of the upper sensor and the lower sensor which are located between the delivery reel and processing part. Additionally, the control element controls the drive of the take-up reel based on the outputs of a second upper sensor and a second lower sensor located between the processing part and the take-up reel.Type: ApplicationFiled: May 31, 2002Publication date: December 19, 2002Applicant: Ushiodenki Kaabushiki KaishaInventors: Hirosuke Takamatsu, Yoshihiko Mitsumoto
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Patent number: 6496245Abstract: The present invention is a method of supplying a developing solution to an entire face of a substrate to perform a developing treatment, including the steps of: moving a developing solution supply nozzle at a predetermined speed at least from one end to another end of the substrate while the developing solution is being supplied; measuring an amplitude of a wave on a solution face of the developing solution supplied on the substrate after the supply of the developing solution; and changing the predetermined speed of the developing solution supply nozzle based on a measured value. Accordingly, it is unnecessary to measure a line width or the like which is finally formed on the substrate before correction as in the conventional art, and thus the correction can be made earlier as compared with the conventional case, resulting in a reduced number of defective items and improved yield.Type: GrantFiled: April 23, 2001Date of Patent: December 17, 2002Assignee: Tokyo Electron LimitedInventors: Hitoshi Kosugi, Hideharu Kyouda
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Publication number: 20020186360Abstract: In accordance with the present invention, there is provided an image exposure apparatus whose installation area and height are reduced and which enables smooth conveying of a printing plate. In this image exposure apparatus, a cassette accommodating printing plates therein is loaded in such a manner as to be inclined at a predetermined angle, and preferably at an angle near 90°. A printing plate which has been taken out by a sheet unit is diverted in a curved manner and is sent to a recording section by a diverting unit. With this compact structure, the installation area and the height of the apparatus can be reduced.Type: ApplicationFiled: August 6, 2002Publication date: December 12, 2002Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Takao Ozaki
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Patent number: 6490023Abstract: A method and apparatus for processing thermal film includes a process sequence that involves a pre-process of a portion of a thermal film to determine optimal conditions for a subsequent process for developing images on the film. In a first feature of the invention, the thermal film undergoes a pre-process for determining the requirements of the subsequent full process of the thermal film. During the pre-process, a portion of the film, preferably before or after an area in which images are captured is used as a process test area. Thereafter, processing during a subsequent processing as well as scanning conditions can be modified based on the optimum processing characteristics determined during the pre-process. In a second feature of the invention, the process sequence can include a pre-process of the entire film and an infrared scanning of the entire film to determine optimal processing conditions for the second process for developing the image.Type: GrantFiled: June 13, 2000Date of Patent: December 3, 2002Assignee: Eastman Kodak CompanyInventors: David H. Levy, Mark E. Irving, James H. Reynolds
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Patent number: 6490024Abstract: An image forming device in which a plurality of image frames are exposed onto a photosensitive material at an exposure device, and the photosensitive material is superposed with image receiving materials of same sizes as the image frames on a heat drum, such that a plurality of image frames can be heat transferred all at once onto the image receiving materials. Image receiving materials of different sizes are readied in a plurality of magazines, and an image receiving material (magazine) of an appropriate size is selected in accordance with an exposure pattern and sizes of the image frames. Various types of prints can be formed by merely setting one photosensitive material. Further, because the plurality of image frames are heat transferred onto the image receiving materials all at once, printing processing efficiency can be improved.Type: GrantFiled: November 7, 2000Date of Patent: December 3, 2002Assignee: Fuji Photo Film Co., Ltd.Inventor: Takehisa Ohno
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Patent number: 6483575Abstract: An image forming device includes an imaging member for forming a latent image on a photosensitive medium and a pressure assembly for applying pressure to the photosensitive medium and develop images on the medium. The photosensitive medium comprises a plurality of microcapules which encapsulate imaging material such as coloring material. In a feature of the invention, a controller is responsive to sensed ambient conditions to control the amount of pressure applied to the medium and thereby control the amount of crushing force applied to the microcapsules. In a further feature, a flexible pressure strip is provided between a crushing roller of the pressure assembly and the media to prevent a marking of the media.Type: GrantFiled: June 19, 2000Date of Patent: November 19, 2002Assignee: Eastman Kodak CompanyInventors: Loretta E. Allen, Yongcai Wang, Stephen M. Reinke, Yeh-Hung Lai
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Patent number: 6480261Abstract: The present invention overcomes many of the disadvantages of prior lithographic microfabrication processes while providing further improvements that can significantly enhance the ability to make more complicated semiconductor chips at lower cost. A new type of programmable structure for exposing a wafer allows the lithographic pattern to be changed under electronic control. This provides great flexibility, increasing the throughput and decreasing the cost of chip manufacture and providing numerous other advantages. The programmable structure consists of an array of shutters that can be programmed to either transmit light to the wafer (referred to as its “open” state) or not transmit light to the wafer (referred to as its “closed” state). The programmable structure can comprise or include an array of selective amplifiers.Type: GrantFiled: June 4, 2001Date of Patent: November 12, 2002Assignee: Pixelligent Technologies LLCInventors: Gregory D. Cooper, Richard M. Mohring
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Patent number: 6473151Abstract: A substrate processing apparatus has a film forming unit group disposed along a first transfer route and a developing processing unit group disposed along a second transfer route. A substrate is transferred along the first transfer route, undergoes film forming processing in the film forming unit group, and thereafter undergoes exposure processing. After undergoing exposure processing, the substrate is transferred along the second transfer route and undergoes developing processing in the developing unit group. The unit groups in which different sorts of processing are performed are disposed along the different transfer routes as described above, thereby enabling the substrate to be transferred efficiently.Type: GrantFiled: April 26, 2000Date of Patent: October 29, 2002Assignee: Tokyo Electron LimitedInventor: Masatoshi Deguchi
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Patent number: 6469771Abstract: A preexposure apparatus includes a film supply station (ST1) for arranging a film cartridge (14) containing a film (12) accommodated therein, a film-drawing station (ST3) for automatically drawing the film (12) over its entire length, an exposure station (ST5) for exposing a predetermined portion of the drawn film (12) with an image by the aid of an exposure section (32), a winding station (ST6) for automatically rewinding the film (12) after the exposure into the film cartridge (14), and a withdrawing station (ST8) for withdrawing the film cartridge (14). Accordingly, the predetermined portion of the film can be preexposed with a desired image automatically and efficiently.Type: GrantFiled: July 10, 2001Date of Patent: October 22, 2002Assignee: Fuji Photo Film Co., Ltd.Inventor: Shinji Nishizawa
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Patent number: 6469776Abstract: A method is provided for transferring dye from a dye imbibed matrix film to a receiver film for producing a dye transfer print of a motion picture print. A dye imbibed matrix film and a receiver film are superimposed together in precise registration on a seating apparatus, e.g., a pin belt, to create a two-film sandwich. The two-film sandwich is stripped from the seating apparatus before completing dye transfer, and dye transfer from the matrix film to the receiver film is completed along a pinless, substantially rectilinear film path while maintaining the two-film sandwich in precise registration. For example, a transfer cabinet may be provided that includes a plurality of rollers having a predetermined relationship to one another and defining the substantially rectilinear film path, and the two-film sandwich may be directed along the film path to complete dye transfer.Type: GrantFiled: June 15, 2001Date of Patent: October 22, 2002Assignee: Technicolor, Inc.Inventors: Ronald W. Jarvis, Richard J. Goldberg, Frank J. Ricotta, Ronald W. Corke, Lawrence A. Curtis, Steven Garlick, David M. Gilmartin
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Patent number: 6466300Abstract: A substrate processing apparatus for performing processing having a plurality of processes, for example, resist coating and developing processing for a substrate, comprises a plurality of processing mechanisms each for performing predetermined processing for the substrate in correspondence with the plurality of processes and a transfer section for transferring the substrate. The transfer section includes a plurality of transfer mechanisms for carrying the substrate into or out of the plurality of processing mechanisms and a buffer mechanism provided at a position to which each of the plurality of transfer mechanisms is accessible and having a standby section for allowing the substrate to stand by thereon temporarily, and the plurality of processing mechanisms are provided around the transfer section.Type: GrantFiled: March 15, 2000Date of Patent: October 15, 2002Assignee: Tokyo Electron LimitedInventor: Masatoshi Deguchi
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Patent number: 6464412Abstract: The invention relates to an apparatus for radiant thermal development of photothermal film comprising a receiving chamber for a film cartridge, drive means to advance thermal film from said film cartridge and rewind film into said film cartridge, an accumulator to gather said film after it has left the cartridge, a source of radiant energy, a guiding means to guide said radiant energy to develop said thermal film as said thermal film passes between said cartridge and said accumulator, a radiant energy absorbing material incorporated into said photothermal film, and a lighttight container for said chamber, heater, and accumulator.Type: GrantFiled: May 15, 2000Date of Patent: October 15, 2002Assignee: Eastman Kodak CompanyInventors: Timothy W. Stoebe, Mark E. Irving, David H. Levy, Kevin W. Williams
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Publication number: 20020140914Abstract: A light beam cut-off device installed separately from a light beam scanning device and making it possible to cut off a light beam emitted from the light beam scanning device to a photosensitive material when exposure for the photosensitive material is stopped, and prevent transmission of vibration to the light beam scanning device. The light beam cut-off device disposed below the light beam scanning device. An elongated plate shutter member extending along a main scanning direction of a laser beam emitted from the light beam scanning device, is provided so as to, when exposure for the photosensitive material is stopped, swing due to driving force of the stepping motor to a position at which the laser beam is blocked. Further, when the photosensitive material is exposed, the shutter member swings to a position at which it retreats from the optical path of the laser beam.Type: ApplicationFiled: March 25, 2002Publication date: October 3, 2002Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Naoto Yamada
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Patent number: 6459475Abstract: A chuck for detachably fixing an object to a rotatable base, the chuck comprising (a) a support detachably mountable to the base, (b) a clamp having opposite ends, the clamp being pivotally mounted to the support between the ends of the clamp, and (c) a resilient member connected to one end of the clamp, the resilient member being resiliently deformed when the support is mounted to the base, which applies a force to the one end of the clamp, thereby causing the other end of the clamp to pivot downward, and apply a pressing force against an object disposed between the base and the other end of the clamp, wherein when the base rotates, centrifugal force acts on the clamp and increases the pressing force against the object.Type: GrantFiled: October 27, 2000Date of Patent: October 1, 2002Assignee: Fuji Photo Film Co., Ltd.Inventor: Takashi Fukui
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Patent number: 6456358Abstract: The present invention provides a surface-treatment apparatus for forming a plurality of photoresist-isolating walls on an organic electroluminescent panel. The surface-treatment apparatus has a photoresist-coating module, a prebaking unit, an exposure unit, a post-exposure surface treatment module with an alkaline atmosphere, a development module and a hard baking unit. The photoresist-coating module coats a photoresist layer on the surface of the organic electroluminescent panel. The prebaking unit bakes the photoresist layer on the organic electroluminescent panel by a heating plate and initially drives solvents from the photoresist layer. The exposure unit performs an UV exposure process on the photoresist layer after the prebaking. The post-exposure surface treatment module with an alkaline atmosphere bakes the photoresist layer by a heating plate after the exposure process, wherein the alkaline atmosphere surfacely terminates a self-catalyzed reaction of photo-acid ions of the photoresist layer.Type: GrantFiled: May 4, 2000Date of Patent: September 24, 2002Assignee: Ritek Display Technology Co.Inventor: Tien-Rong Lu
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Publication number: 20020131029Abstract: To detect a deviation of an object focal plane of a printing lens from a reference focal plane that is perpendicular to an optical axis of the lens, a focusing chart with a test pattern thereon is held inclined to the reference focal plane with a center of the test pattern aligned with the reference focal plane, and test prints are made from the focusing chart through the printing lens while setting the printing lens at different printing magnifications. The test pattern consists of a plurality of lines extending in parallel to a transverse direction to the inclined direction of the focusing chart, and being spaced equally from each other in the inclined direction.Type: ApplicationFiled: March 15, 2002Publication date: September 19, 2002Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Kaoru Uchiyama
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Publication number: 20020127747Abstract: A lithography method and apparatus is provided for forming at least one semiconductor device on a wafer (12). The method comprises the step, exposing (21) said wafer to an irradiation through a reticle in an exposure tool (4), wherein said exposing (21) includes: at least one mounting step for mounting a first reticle (15) by a mounting device, at least one first exposure step (201), in which said wafer (12) is exposed to said irradiation through said predetermined first reticle (15), at least one change-over step (203) for removing said first reticle (15) and mounting a second predetermined reticle (18) by a change-over device, at least one second exposure step (201), in which said wafer (12) is exposed to said irradiation through said predetermined second reticle (18).Type: ApplicationFiled: March 8, 2001Publication date: September 12, 2002Applicant: Motorola, Inc.Inventors: John George Maltabes, Alain Bernard Charles, Karl Emerson Mautz
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Patent number: 6443640Abstract: Photosensitive material is processed by passing the material through a chamber holding processing solution, the temperature of the solution being raised as the material passes through the chamber.Type: GrantFiled: September 24, 2001Date of Patent: September 3, 2002Assignee: Eastman Kodak CompanyInventors: Anthony Earle, Nigel R. Wildman
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Patent number: 6445443Abstract: A lithography system includes a spinner, a first controller, a stepper and a second controller. The spinner coats a photoresist film on a semiconductor substrate. The first controller sets a first optimal process parameter according to external information regarding the semiconductor wafer and controls the spinner according to the first optimal process parameter, when the semiconductor wafer is loaded into the spinner. The stepper exposes the semiconductor wafer, which is coated with the photoresist film, to light of a predetermined wavelength. The second controller sets a second optimal process parameter according to the external information regarding the semiconductor wafer and controls the stepper according to the second optimal process parameter, when the semiconductor wafer coated with the photoresist film is loaded into the stepper.Type: GrantFiled: June 29, 2000Date of Patent: September 3, 2002Assignee: Samsung Electronics Co., Ltd.Inventors: Chan-hoon Park, Hee-sun Chae
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Patent number: 6439784Abstract: A method and system (100) for using reference patches (108) to enhance electronic film processing of a scene image (104) contained on a first area of a film (112) include creating a reference patch (108) on a second area of the film (112); coating the film (112) with a developing solution to form a scene image (104) and a patch image (108); scanning the film (112) coated with the developing solution to generate signals corresponding to digital representations of the scene image (104) and the patch image (108); calculating image processing parameters from the signals associated with the patch image (108); and processing the digital representations of the scene image (104) using the image processing parameters calculated from the patch image (108) to produce color values which more accurately reflect the original scene and which are pleasing to the eye.Type: GrantFiled: August 17, 2000Date of Patent: August 27, 2002Assignee: Applied Science Fiction, Inc.Inventors: Michael P. Keyes, Philip E. Cannata
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Publication number: 20020114632Abstract: The present invention is a substrate processing apparatus for performing processing of a substrate including: a heat treatment unit provided in a casing of the processing apparatus and having a heating section in which a heat treatment of the substrate is performed; a duct provided on a side part on the heating section side of the casing; and a cooling flow passage provided in the duct for allowing a cooling fluid to flow therethrough. Heat generated from the heating section is prevented from conducting by an air current flowing in the duct, and further the heat is absorbed by the cooling fluid. Therefore, it is possible to prevent the heat from conducting to the outside of the casing.Type: ApplicationFiled: February 21, 2002Publication date: August 22, 2002Applicant: TOKYO ELECTRON LIMITEDInventors: Masatoshi Deguchi, Eiichi Sekimoto
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Patent number: 6435740Abstract: In a shutter facing an aperture portion in a partition plate in a photosensitive material processing device, a blocking member, formed substantially in a semicircular cylindrical shape, is placed by the rotation of a shaft between blades thereby closing the aperture portion. The opening between the blades is opened by rotating the blocking member integrally with the shaft so that a photosensitive material can pass through. Multi-leveled surfaces are formed on the top surface of a guide plate. Aperture portions for mounting rollers with adaptors are formed in an alternating pattern on the surfaces. A plurality of protruding guide ribs are provided extending across the surfaces. A plurality of brush roller parameters are adjusted so that a winding mark index defined by the parameters falls within a predetermined range. Rollers are washed when a finisher control system is restarted after an unforeseen long stoppage.Type: GrantFiled: November 9, 2000Date of Patent: August 20, 2002Assignee: Fuji Photo Film Co., Ltd.Inventors: Ryoei Nozawa, Toshihiro Suya, Hideto Yamamoto, Takayuki Iwamoto, Shinichi Matsuda
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Publication number: 20020105630Abstract: In the heat developing apparatus to heat the heat developing sheet A on which the latent image by the exposure is formed, to the developing temperature through the preliminary heating means I, the rotating body pairs are arranged so that the preliminary developing means I has a plurality of rotating body pairs 1a-1d, 2a-2d, which nip the heat developing sheet A and heat to the developing temperature and convey it, and by at least one pair of rotating body pair in the plurality of rotating body pairs, the conveying direction of the heat developing sheet is changed.Type: ApplicationFiled: February 7, 2002Publication date: August 8, 2002Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Akihiro Hashiguchi
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Patent number: 6429925Abstract: The improved image recording apparatus comprises a main scanning section; an auxiliary scanning section; and an upstream transport section; wherein a light-sensitive material, as it is transported in an auxiliary scanning direction after its position in a main scanning direction was regulated by the upstream transport section, is illuminated with recording light beams, whereby the light-sensitive material is scanned two-dimensionally with the recording light beams to record an image on the light-sensitive material. The apparatus further includes vibration damping members by which the main scanning section, the auxiliary scanning section and the upstream transport section are coupled to other components of the image recording apparatus in such a way as to insulate vibrations.Type: GrantFiled: February 23, 2001Date of Patent: August 6, 2002Assignee: Fuji Photo Film, Co., Ltd.Inventor: Tsuyoshi Tanabe
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Patent number: 6429924Abstract: A photofinishing method, including the steps of: exposing machine readable metadata and a scene image within an entire safe frame area on a filmstrip; processing the filmstrip to produce a visible image including the machine readable metadata and the scene image; scanning the safe frame area to produce a digital image; extracting the machine readable metadata from the digital image; extracting the scene image from the digital image; and processing the scene image according to the extracted machine readable metadata.Type: GrantFiled: November 30, 2000Date of Patent: August 6, 2002Assignee: Eastman Kodak CompanyInventor: James R. Milch
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Publication number: 20020094205Abstract: The invention concerns an apparatus for developing films, particularly movie films, comprising a plurality of substantially vertical frames (1), for supporting and winding the film (3), placed within the different treatment rooms, each one of said frames (1) providing a plurality of transmission turns for the film, each one of said turns substantially comprising an upper pulley (2) and a lower pulley (4), and tensioning means of the film acting on the lower pulley (4), said apparatus being characterised in that said tensioning means of the film (3) in the single turns are comprised of piston means (11), provided under the lower pulley (4) of said turn, a single feeding system being provided for the piston means (11) of each frame (1).Type: ApplicationFiled: August 22, 2001Publication date: July 18, 2002Inventors: Giancarlo Marcari, Osvaldo Valelli
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Patent number: 6420098Abstract: The invention relates to a system and a method for manufacturing semiconductor devices on a wafer with the steps of: coating (201) a photoresist onto said wafer, heating (202) said wafer to a prebake temperature for outgassing the solvent of the photoresist, exposing (203) said wafer to deep UV light for chemically modifying said photoresist in predetermined areas, heating (204) said wafer to a post exposure bake temperature for activating a chemical reaction, developing (205) said photoresist, stabilizing (206) said photoresist, meteorology inspection (207), etching, wet processing or implanting ion, wherein said stabilizing (206) of said photoresist occurs before the beginning of the etch process and comprises a controlled chemical contamination of said photoresist surface by ammonia/amine chemicals.Type: GrantFiled: July 12, 2000Date of Patent: July 16, 2002Assignee: Motorola, Inc.Inventor: Karl Mautz
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Publication number: 20020089652Abstract: There is disclosed an exposure control method in a lithography system having a resist coating and developing apparatus, a wafer transferring mechanism and an exposure control apparatus. The exposure control method in the lithography system includes the steps of transmitting data of temperature for heat-treating a resist film in the resist coating and developing apparatus to the exposure control apparatus; determining and controlling exposure time based on the temperature data; and exposing the resist film on a wafer which is moved or transferred by the wafer transferring mechanism during the determined exposure time.Type: ApplicationFiled: December 11, 2001Publication date: July 11, 2002Applicant: Samsung Electronics Co., Ltd.Inventor: Jong-Kill Lim
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Publication number: 20020089655Abstract: An object of the invention is to provide a substrate transport apparatus which enables prompt transfer of a substrate, and a substrate processing apparatus incorporating this. A substrate transport apparatus of the invention comprises a transport arm (45, 46, 145, 146) for supporting a peripheral portion of a substrate (W) at at least two places on the peripheral portion, and transporting the substrate to a stage (7).Type: ApplicationFiled: February 1, 2002Publication date: July 11, 2002Applicant: NIKON CORPORATIONInventors: Yoshiki Kida, Kenji Nishi
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Publication number: 20020089653Abstract: A method and a device are provided for automating receipt of orders for additional printing of a photographic print, including order information relating to desired image processing. In a print order receiving machine, when a photographic print is inserted, an image of the photographic print is read and displayed on a monitor (steps 150, 152). When order conditions are inputted, an image which is processed on the basis of the order conditions is displayed on the monitor (steps 154 through 158). Further, when input of the order conditions is completed, the order conditions and order information based on the order conditions are set. The set order information is printed onto a photographic print as an invisible two-dimensional bar code. Copying processing of the photographic print is carried out on the basis of the order information which is read from the photographic print.Type: ApplicationFiled: December 4, 2001Publication date: July 11, 2002Inventor: Takayuki Iida
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Patent number: 6417911Abstract: A photographic processing fluid spread system, for use with integral type self-processable film unit, by which the thickness of a layer of processing fluid is controlled and restricted in a uniform manner as the processing fluid is spread across preselected portions of the film unit, while the film unit is also simultaneously being progressively exposed and advanced.Type: GrantFiled: January 31, 2000Date of Patent: July 9, 2002Assignee: Polaroid CorporationInventors: Alfredo G. Kniazzeh, Bruce K. Johnson, Margaret A. Obermiller
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Publication number: 20020085182Abstract: A film assemblage of the self-developing type comprising a pair of upper and lower carrier sheets in juxtaposed relationship to one another. A pair of openings is provided in each of the carrier sheets. A photosensitive sheet and a positive receiving sheet are joined to outer surfaces of the upper and lower carrier sheets; respectively, so as to cover the respective openings. The pair of upper and lower carrier sheets is fixedly joined together in overlapping relationship, whereby the photosensitive and receiving sheets are in superimposed and spaced apart relationship thereby torming, in combination, an image area of the film.Type: ApplicationFiled: January 9, 2002Publication date: July 4, 2002Inventors: John E. Meschter, Philip R. Norris, Harry R. Parsons, Richard P. Breen
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Publication number: 20020085186Abstract: An image forming apparatus is provided with a storage unit for storing setting information including at least a size of a substitute recording medium, and a processing unit for executing a print instruction by automatically changing a size of a recording medium to be used to the size of the substitute recording medium based on the setting information stored in the storage means, when the size of the recording medium specified by the print instruction is not available.Type: ApplicationFiled: December 21, 2001Publication date: July 4, 2002Inventor: Nozomi Sawada
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Patent number: 6412990Abstract: A method and apparatus for developing an unprocessed photosensitive media and providing a visual receipt of the images developed. The apparatus includes a mechanism for moving a strip of photosensitive media along a processing path; a mechanism for applying a coating of a developing solution on the photosensitive media so as to develop any exposed image presented on the photosensitive media; a scanner for scanning the photosensitive media after the images have been developed so as to provide a digital record of the images; an order mechanism for allowing a consumer to place a photofinishing order; and a printing mechanism for printing a customer order receipt of the photofinishing order.Type: GrantFiled: November 30, 1999Date of Patent: July 2, 2002Assignee: Eastman Kodak CompanyInventors: James C. Stoffel, Dale F. McIntyre, Joseph A. Manico
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Publication number: 20020075463Abstract: It is one objective of the invention to provide a thermal development apparatus and a cooling method that can suppress the deterioration of image quality due to development time variances.Type: ApplicationFiled: November 28, 2001Publication date: June 20, 2002Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Akihiro Hashiguchi
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Patent number: 6398428Abstract: The invention relates to an apparatus for thermal development having a receiver for receiving an imagewise exposed thermal film, an accumulator for gathering the film, a drive for advancing the film from the receiver to the accumulator, a heater located between the receiver and the accumulator for developing the film, a compound image scanner for scanning the film after it has been thermally developed, the scanner having a first light source and a fist sensor placed for forming a first electronic record of the image formed on the developed firm by reflection, a second light source and a second sensor placed for forming a second electronic record of the image by an opposing reflection, and a third sensor and a third light source placed for forming a third electronic record of the image formed by transmission, and a lighttight container for the receiver and the heater.Type: GrantFiled: May 15, 2000Date of Patent: June 4, 2002Assignee: Eastman Kodak CompanyInventors: Richard P. Szajewski, Mark E. Irving
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Patent number: 6400446Abstract: A thermally developing apparatus for thermally developing a thermally developable material by heating the thermally developable material to 80° C. or more, is provided with a thermally developing device having a heater and for thermally developing the thermally developable material with heat generated by the heater; and a controller to control heat generation by the heater; wherein the thermally developing device thermally develops the thermally developable material such that an amount M of heat given to the thermally developable material during thermally developing a single sheet of the thermally developable material satisfies the following formula for a maximum amount Hmax of heat generation of the heater: 0.07≦M/Hmax≦0.Type: GrantFiled: March 3, 2000Date of Patent: June 4, 2002Assignee: Konica CorporationInventors: Teruo Kashino, Akira Taguchi, Hirofumi Okabe, Yasuaki Tamakoshi, Masaya Shimoji