Abstract: Methods and apparatus for modulating light using a tunable light modulation device. The tunable light modulation devices comprises an elastomer structure including at least one elastomer layer, a compliant electrode network of conducting fibers arranged on a first surface of the at least one elastomer layer, a patterned electric conductor arranged on a second surface of the at least one elastomer layer opposite the first surface. The patterned electric conductor includes a plurality of individually-addressable sections, and the compliant electrode network is configured to compress the at least one elastomer layer in the presence of an electric field between the compliant electrode network and one or more of the individually-addressable sections of the patterned electric conductor to produce a voltage-dependent roughening of the at least one elastomer layer.

Abstract: A mask, a mask assembly, an exposure machine, a method for testing shadowing effect on a window, and a photolithography method are provided. The mask includes a light transmission area; a functional window provided at a side of the light transmission area; and at least one of a first detection mark and a second detection mark; wherein the first detection mark is flushed with a border of the functional window adjacent to an interior of the mask; and the second detection mark is disposed between the profile of the light transmission area and the functional window.

Abstract: An electronic measurement device or electronic scale including an arrangement of multiple low-cost sensors to measure a physical property of an object is disclosed. The electronic measurement device or electronic scale utilizes an accurate and effective calibration method that compensates for the idiosyncrasies of using individual sensors. The electronic measurement device positions a plurality of sensors at predetermined observational locations to provide sensor output signals in response to sensing physical characteristics of the physical property of the object to be measured and combines the different sensor output signals by applying a combined calibration transfer function that represents a calibration function for each of the plurality of sensors to provide a cumulative measurement signal that represents the measurement of the physical property of the object.

Abstract: Embodiments of the present disclosure generally relate to apparatus and methods for semiconductor processing, more particularly, to a thermal process chamber. The thermal process chamber may include a substrate support, a first plurality of heating elements disposed over the substrate support, and one or more high-energy radiant source assemblies disposed over the first plurality of heating elements. The one or more high-energy radiant source assemblies are utilized to provide local heating of cold regions on a substrate disposed on the substrate support during processing. Localized heating of the substrate improves temperature profile, which in turn improves deposition uniformity.

Abstract: An exposure apparatus according to the present invention includes a projection optical system projecting, onto a substrate, exposure light for forming a pattern on the substrate, a light shielding member having an opening for allowing the exposure light to pass therethrough, a focus detecting unit detecting a defocus amount representing a positional deviation between a condensed position of the exposure light and the substrate, a light receiving element receiving a light flux passing through the opening in the light shielding member after being reflected by the substrate, and a control unit moving the light shielding member in a direction of an optical axis of the projection optical system on the basis of a result of detection in the focus detecting unit. The focus detecting unit detects the defocus amount on the basis of the amount of light received by the light receiving element.

Abstract: An apparatus for inspecting a semiconductor die bonded on a top surface of a substrate uses an optical assembly including an image sensor and an optical system for conducting the inspection. The optical assembly is tilted at an oblique angle with respect to the top surface of the substrate, and is arranged such that its depth of focus is substantially perpendicular to the top surface of the substrate for inspecting at least one side wall of the semiconductor die.

Abstract: The present invention relates to an optical system including at least one objective lens (2) for receiving light from an object (1), an array of image forming elements (4) for generating multiple images of the object on an image sensor plane (SP) and a filter (F). The optical system is configured to form a real image of the filter on the array of image forming elements to filter the multiple images of the object, the filter being arranged with respect to the at least one objective lens so that a real image of the filter is formed on the array of image forming elements, and wherein the optical system is configured to be telecentric in the image plane of the filter.

Abstract: An apparatus and method for enlarging digital photographs in a dark room environment by interchanging the film carrier with a digital projection module, wirelessly receiving the digital photograph data within the digital projection module and then automatically and wirelessly configuring the enlarger to generate the enlarged photograph on photosensitive printing paper. The apparatus and method include a software application for use on a computing device containing the digital photographs that permits the user to wirelessly communicate with the enlarger to configure and control the enlarger for printing. The digital projection module permits the enlarger to be easily reconfigured for enlarging photographs produced from film. An alternative is also disclosed that uses a laser projector instead of the interchangeable digital projection module for generating enlarged prints from digital photographs. The software application also permits burn and dodge effects in the print.

Abstract: There is provided a pattern forming apparatus including a holding unit configured to suction and hold a substrate, and an optical system configured to detect, from a suction surface side of the substrate, an alignment mark formed on the substrate held by the holding unit. The pattern forming apparatus is provided with a wavelength separation element for performing wavelength separation between pattern forming light for forming a pattern on the substrate and alignment mark detection light for detecting the alignment mark.

Abstract: A structured illumination microscopy (SIM) system for generating single focal point patterns of a sample is disclosed. The SIM system performs a focusing, scaling and summing operation on each single focal point that completely scan the sample to produce a high resolution composite image.

Abstract: Imaging objectives and inspection systems equipped with such imaging objectives are disclosed. The imaging objective may include a front objective configured to produce a diffraction limited intermediate image. The imaging objective may also include a relay configured to receive the intermediate image produced by the front objective. The relay may include three spherical mirrors positioned to deliver a projection of the intermediate image to a fixed image plane.

Abstract: A substance detection method includes exposing a sensor chip for surface-enhanced Raman scattering having a metal microstructure and an organic molecular modification film which modifies the metal microstructure to a first gas, irradiating a first region of the sensor chip exposed to the first gas with first laser light, performing first measurement by acquiring the intensity of Raman scattered light from the first region, blocking the first laser light after the performing the first measurement, and adjusting an irradiation region where the sensor chip is irradiated with the first laser light from the first region to a second region which is different from the first region of the sensor chip after the blocking the first laser light.

Abstract: According to one aspect of the present invention, a method of correcting a position of a stage mechanism, includes generating a two-dimensional map of a distortion amount at a position of a stage by applying a distortion amount of a position in a first direction of the stage at each of measured positions in a second direction as a distortion amount of a position in the first direction of the stage at each position in the second direction at each position in the first direction and by applying a distortion amount of a position in the second direction of the stage at each of measured positions in the first direction as a distortion amount of a position in the second direction of the stage at each position in the first direction at each position in the second direction; and correcting position data by using the two-dimensional map.

Abstract: The present disclosure relates a method of forming substrate identification marks. In some embodiments, the method may be performed by forming a photosensitive material over a substrate. A first type of electromagnetic radiation is selectively provided to the photosensitive material to expose a plurality of substrate identification marks within the photosensitive material, and a second type of electromagnetic radiation is selectively provided to the photosensitive material to expose one or more alignment marks within the photosensitive material. Exposed portions of the photosensitive material are removed to form a patterned photosensitive material. The substrate is etched according to the patterned photosensitive material to form recesses within the substrate that are defined by the plurality of substrate identification marks and the one or more alignment marks.

Abstract: A mirror for EUV radiation includes a mirror body, which has at least one EUV radiation-reflecting region and at least two EUV radiation-permeable regions. A spatial separation of the illumination and imaging beam paths is possible with small angles of incidence and a large object-side numerical aperture.

Abstract: An electronic device display may have an organic light-emitting diode layer that emits light to form images for a user. Reflective structures such as metal signal lines may be present in the organic light-emitting diode layer. Ambient light reflections from the metal signal lines may be suppressed using a circular polarizer on the organic light-emitting diode layer. To increase light emission efficiency from the organic light-emitting diode display layer under low ambient light conditions in which ambient light reflections are not significant, the polarization efficiency of the circular polarizer may be reduced. Control circuitry may make measurements of ambient light intensity using an ambient light sensor and can control the polarization efficiency of the circular polarizer accordingly by applying adjustable amounts of light or electric field. Polarization efficiency may also be adjusted using a photosensitive polarizer material that responds directly to changes in ambient light level.

Abstract: An illumination system for an EUV projection exposure apparatus is designed for shaping illumination radiation from at least a portion of received EUV radiation. The illumination radiation is directed into an illumination field in an exit plane of the illumination system during exposure operation. An EUV radiation source is arranged in a source module separate from the illumination system. The illumination system includes an alignment state determining system including an alignment detector configured to receive a portion of the EUV radiation emerging from the secondary radiation source and to generate therefrom an alignment detector signal representative of the alignment state.

Abstract: An image forming apparatus includes a main assembly, a first openable portion provided on a first side of the main assembly, a second openable portion provided on a second side of the main assembly, a single projector portion, a first projecting portion configured to project the image from above the first openable portion onto a projection object provided on the first side or onto the first openable portion when the first openable portion is open, and a second projecting portion configured to project the image from above the second openable portion onto a projection object provided on the second side or onto the second openable portion when the second openable portion is open.

Abstract: Methods and systems for determining coordinates for an area of interest on a specimen are provided. One system includes one or more computer subsystems configured for, for an area of interest on a specimen being inspected, identifying one or more targets located closest to the area of interest. The computer subsystem(s) are also configured for aligning one or more images for the one or more targets to a reference for the specimen. The image(s) for the target(s) and an image for the area of interest are acquired by an inspection subsystem during inspection of the specimen. The computer subsystem(s) are further configured for determining an offset between the image(s) for the target(s) and the reference based on results of the aligning and determining modified coordinates of the area of interest based on the offset and coordinates of the area of interest reported by the inspection subsystem.

Abstract: Systems and methods for positionally stable magneto-optical trapping over temperature are provided. In certain embodiments, an atomic sensor may include at least one laser source configured to produce at least one laser; one or more optical components, wherein the one or more optical components direct the at least one laser; and a vacuum cell, wherein the one or more optical components direct the at least one laser into the vacuum cell, wherein the one or more optical components and the vacuum cell are bonded together and components within the atomic sensor are fabricated from materials having similar coefficients of thermal expansion.

Abstract: Metrology tool stage configurations and respective methods are provided, which comprise a pivoted connection arranged to receive a wafer and enable rotation thereof about a pivot; a radial axis arranged to radially move the rotatable pivoted connection attached thereto; and optics having a stationary part configured to generate a collimated illumination beam. For example, the optics may be stationary and the radial axis may be centrally rotated to enable stage operation without requiring additional space for guiding systems. In another example, a part of the optics may be rotatable, when configured to receive illumination via a mechanically decoupled or empty region, receive power and control wirelessly and deliver data wirelessly. The disclosed configurations provide more compact and more robust stages which efficiently handle large wafers. Stage configurations may be horizontal or vertical, the latter further minimizing the tool's footprint.

Abstract: A beam exposure device includes a light-emitting unit for emitting light beams from a plurality of light-emitting positions, a scan unit, an optical condensing system for condensing a spot of the light beams onto a surface to be exposed, and a micro-deflection unit for micro-deflecting the plurality of light beams to expose the space between the beams in the plurality of light beams. The optical condensing system includes a first microlens array arranged between the light-emitting unit and the micro-deflection unit and provided with a plurality of microlenses corresponding to the light-emitting positions; and a second microlens array arranged between the micro-deflection unit and the surface to be exposed and provided with a plurality of microlenses each microlens corresponding to the light-emitting unit.

Abstract: An exposure apparatus obtains information on a relationship between a moving amount of a substrate stage in the first direction and an amount of a positional shift in an image of a mask-side reference mark projected on a substrate-side reference mark by a projection optical system in the second direction perpendicular to an optical axis of the projection optical system with respect to the substrate-side reference mark. A controller determines a focus position based on the measurement result by causing the measurement device to measure the light amount while, together with driving the substrate stage in the first direction and the second direction based on the information.

Abstract: Systems and methods to generate a multi-mode image containing different modes such as color, grayscale, and black and white to minimize digital file size while retaining the desired modes for selected portions of the image.

Abstract: A method for aligning and bringing a first substrate into contact with a second substrate as well as a corresponding device with at least four detection units wherein: at least two first detection units can move at least in the X-direction and in the Y-direction, and at least two second detection units can move exclusively in the Z-direction.

Abstract: A polarized light irradiating method includes a first movement step and a second movement step. The first movement step includes a step (a) of moving a first stage from a first position to the irradiation area and irradiating a polarized light onto a first substrate mounted on the first stage, and a step (b) of returning the first stage to the first position from the irradiation area. The second movement step includes a step (c) of moving a second stage from a second position to the irradiation area and irradiating the polarized light onto a second substrate mounted on the second stage, and a step (d) of returning the second stage to the second position from the irradiation area. The step (c) follows after beginning of the step (b). The step (a) follows after beginning of the step (d).

Abstract: A multi-focal selective illumination microscopy (SIM) system for generating multi-focal patterns of a sample is disclosed. The multi-focal SIM system performs a focusing, scaling and summing operation on each multi-focal pattern in a sequence of multi-focal patterns that completely scan the sample to produce a high resolution composite image.

Abstract: There is provided an information processing apparatus including an operation unit acquiring an input operation for a message composed of at least one of text and an image, a recording control unit recording the message in accordance with the acquired input operation, and a reproduction control unit reproducing the recorded message to display the message on a display unit.

Abstract: Disclosed is a method of fabricating an electromechanical transducer film. The method includes treating a surface of a first electrode to be liquid-repellent, the first electrode being formed on one surface of a substrate, irradiating the surface of the first liquid-repellent electrode with an energy ray while moving an irradiation position in accordance with a shape of the electromechanical transducer film to be formed and a shape of an alignment mark to be formed, and forming the alignment mark by applying an application liquid to an area including a portion irradiated with the energy ray in accordance with the shape of the alignment mark in the irradiating step, the application liquid being applied by an inkjet method.

Abstract: A real-time spectrum analyzer for measuring time domain data of an input signal includes an ADC, a resampler and a density histogram memory unit. The ADC has a first sample rate and is configured to acquire and digitize the input signal at the first sample rate to provide first samples. The resampler has a second sample rate and is configured to acquire the first samples at the second sample rate to provide second samples grouped in sample sets, where the second sample rate is selected so that each sample set includes an integer number of second samples per an integer number of periods at a frequency of interest of the input signal. The density histogram memory unit is configured to store at least a portion of the second samples output by the resampler for generating a continuous real-time gap-free density histogram corresponding to the time domain data.

Abstract: An instrument and method for scanning large microscope specimen on a specimen holder has a scanning optical microscope that is configured to scan the specimen in one of brightfield and fluorescence. The specimen is dynamically tillable about a scan direction during a scan to maintain focus along the length of each scan line as the scan proceeds. A three dimensional image of the specimen can be obtained wherein the specimen tilt and relative focus are maintained from a first image contour to a second image contour through a thickness of a specimen.

Abstract: The present invention provides a lithography apparatus which forms a pattern on a substrate, the apparatus including an optical unit including a plurality of optical systems each of which irradiates the substrate with a beam for forming the pattern and which are arranged in at least one of a first direction and a second direction orthogonal to an optical axis thereof, and a pair of interferometers configured to measure a rotation angle of the optical unit around an axis parallel to the optical axis, wherein a distance between measurement axes of the pair of interferometers is not small than longer one of a distance between optical axes of two optical systems, of the plurality of optical systems, farthest away from each other in the first direction and a distance between optical axes of two optical systems, of the plurality of optical systems, farthest away from each other in the second direction.

Abstract: A system and method for inspecting a surface, comprising: illuminating said surface with an electromagnetic radiation to generate scattered radiation from features of said surface; inducing a change in phase to said scattered radiation for reducing divergence of said scattered radiation and for redirecting said scattered radiation towards a predetermined spatial region; focusing after said radiation has propagated to said spatial region; capturing an image of radiation, whereby said features of said surface are detected in said image of radiation.

Abstract: System and method for manufacturing multiple light emitting diodes in parallel are disclosed. In one embodiment, the method includes providing an imaging writer system that includes a plurality of spatial light modulator (SLM) imaging units arranged in one or more parallel arrays, providing one or more substrates corresponding to multiple LEDs to be manufactured, receiving mask data to be written to the one or more substrates corresponding to the multiple LEDs, processing the mask data to form a plurality of partitioned mask data patterns corresponding to the plurality substrates of the multiple LEDs, assigning one or more SLM imaging units to handle each of the partitioned mask data pattern, and controlling the plurality of SLM imaging units to write the plurality of partitioned mask data patterns to the plurality substrates of the multiple LEDs in parallel.

Abstract: A method for aligning substrates in different spaces and having different sizes includes: capturing actual local images of two substrates; comparing specific marks in standard local feature regions of the two substrates, and obtaining specific marks in actual local feature regions of the two substrates; separately establishing actual coordinate systems of the two substrates to synthesize aligned assembly coordinate system; comparing coordinate values of the specific marks of the two substrates in the two actual coordinate systems to obtain first group of offsets, and comparing sizes of the two substrates to obtain a size difference; using the first group of offsets and the size difference to correct coordinate values of specific marks of one of the two substrates; comparing coordinate values of the specific marks of the two substrates, to obtain second group of offsets; and moving the one to a position compensated by the second group of offsets.

Abstract: A backside alignment apparatus and method for determining a position relationship between a substrate (6) and a workpiece stage (24). The backside alignment apparatus includes: an illumination apparatus (1) for emanating infrared light; a workpiece stage assembly (2) for supporting and moving the substrate (6); an imaging apparatus (3) for detecting alignment marks and calculating positions of the alignment marks, the alignment marks including a reference plate alignment mark (41) and a backside alignment mark (20); and a reference plate assembly (4) for setting up a relationship between position coordinates of the imaging apparatus (3) and the workpiece stage assembly (2). The illumination apparatus (1) and the imaging apparatus (3) are able to illuminate and align different alignment marks using only one set of illumination apparatus.

Abstract: An optical system has a plurality of elements arranged to image radiation at a wavelength ? from an object surface to an image surface, the elements include mirror elements having a reflective surface positioned at a path of radiation. At least one of the mirror elements is a pupil mirror having a pupil mirror surface arranged at or near to a pupil surface of the optical system. At least one of the remaining mirror elements is a highly loaded mirror having a mirror surface arranged at a position where at least one of a largest value of a range of angles of incidence and a largest value of an average angle incidence of all remaining mirrors occurs, where the remaining mirrors include all mirrors except for the pupil mirror.

Abstract: An electrically programmable reticle is made using at least one electrochromatic layer that changes its optical transmissibility in response to applied voltages. Transparent conductor layers are configured to the desired patterns. The electrically programmable reticles are either patterned in continuous forms that have separately applied voltages or in a matrix of rows and columns that are addressed by row and column selects such that desired patterns are formed with the application of a first voltage level and reset with the application of a second voltage level.

Abstract: An apparatus for manufacturing a liquid crystal display device includes a unitary vacuum processing chamber, upper and lower stages confronting each other at upper and lower spaces inside the vacuum processing chamber to bond a first and second substrates, and a first substrate lifting system formed in the lower stage for lifting the second substrate.

Abstract: A lithographic projection apparatus includes an illumination system configured to provide a beam of radiation; a support configured to support a patterning device, the patterning device configured to impart the beam of radiation with a pattern in its cross section; a substrate table configured to hold a substrate, and a projection system configured to project the patterned beam of radiation onto a target portion of the substrate, wherein the illumination system has a radiation source and at least one mirror configured to enhance an output of the source. The illumination system may include a second radiation source and at least one mirror positioned between the radiation sources to image the output of the second source onto the first source, thereby enhancing the output of the source. The radiation sources may be operable to emit radiation in the EUV wavelength range.

Abstract: A method of correcting apodization in an optical system includes determining effects of apodization on an intensity distribution of a beam of radiation in a predetermined plane of the optical system; determining a more desirable intensity distribution of the beam of radiation in the predetermined plane such that apodization is corrected for; and absorbing portions of the beam of radiation in the predetermined plane as a function of location such that downstream from the predetermined plane the beam of radiation shows the more desirable intensity distribution. An optical component includes one or more absorbing layers designed to perform the absorption as a function of the location. The optical component may located in the pupil plane of the optical system.

Abstract: A scanning exposure apparatus includes an illumination optical system for illuminating a pattern of an original through an opening being conjugate or approximately conjugate with the pattern of the original, and a changing mechanism for changing a width of the opening with respect to a scan direction of the original. The changing mechanism includes a light blocking plat, and a plurality of driving mechanisms for moving the light blocking plate. The plurality of driving mechanisms is provided at different positions with respect to the light blocking plate and also are arranged to be driven by an actuator. At least one of the plurality of driving mechanisms includes a guiding mechanism for allowing a deviation between a position of an object to be driven by the actuator and a position of the light blocking plate, with respect to a direction different from a direction of displacement of the object to be driven.

Abstract: A process and system for making an image replication element from a photosensitive printing element by digital photopolymerization are provided. The process includes forming a desired printing image on a photopolymer layer by digital light processing without the use of either a mask layer or a laser.

Abstract: An image medium is attached in an image input unit of a printing system, and an image to be printed and its number of prints are set through an operation panel. As contents of an order is determined, a credit card is inserted in an ID reading unit, and the printing system identifies a customer, and registers the order, then settles a payment. If the payment is done in cash, the printing system issues a magnetic card and the like on which a number is recorded for the customer to verify. The printing system has a plurality of container boxes for storing the printed material related to the customer's order by separating and keeping the printed material for each customer. A host unit verifies the properness of the person who comes to receive the prints by his/her credit card or the magnetic card and the like, and opens a corresponding outlet among the container boxes, so that the customer can receive his/her prints.

Abstract: An object of the invention is to provide a position measuring apparatus which can measure position information of a mark formed on an object with high accuracy, and an exposure apparatus which can perform exposure by performing alignment highly accurately, based on the highly accurate position information measured by the position measuring apparatus, and as a result, can realize fine processing. In order to achieve the object, the present invention is a position information measuring apparatus for measuring position information of an alignment mark, by converting an image Im1 of an alignment mark formed on an image pickup plane F1 of an image pickup device into image information, while scanning the image Im1 in a scanning direction SC1, and performing calculation processing with respect to the obtained image information, wherein the measuring direction D11 of the image Im1 of the alignment mark is set so as to be orthogonal to the scanning direction SC1.

Abstract: The present invention relates to an apparatus and method for patterning a work piece arranged at an image plane and sensitive to electromagnetic radiation. Said apparatus comprising a source for emitting electromagnetic radiation directed onto a selected object plane, a computer-controlled reticle comprising a plurality of object pixels, adapted to receive said electromagnetic radiation at said selected object plane and being capable of relaying said electromagnetic radiation toward said work piece arranged at said image plane, an optical projection system comprising a Fourier filter adapted to filter said relayed radiation in a Fourier space and a first lens arrangement adapted to create essentially parallel central axis of cones of radiation onto said image plane, where every cone of radiation in a specific image pixel in said image plane corresponds to a specific object pixel in said computer-controlled reticle.

Abstract: The invention relates to a system for projecting or displaying images comprising a valve exhibiting a plurality of image-forming elements having a light transmission coefficient which can be controlled so as to present the image, and a means of illuminating the valve comprising a light source and an integrator having two lens arrays associated in such a way that each lens of the second array distributes over the valve the light received from a corresponding lens of the first array. This system comprises a means for focusing the illuminating beam onto the integrator. The dimensions of the integrator are thus minimized. The focusing means comprises, for example, a reflector which reflects the light produced by the source, the integrator being arranged substantially in the focal plane of the reflector.

Abstract: A position detecting method for detecting a position of a surface of an object. The method includes a first step for detecting registration of the object surface with a predetermined plane with respect to a first direction, while changing the position of the object surface in a direction intersecting with the first direction, a second step for detecting the position of the object surface in the first direction, and determining a detection value in the second detecting step, corresponding to the predetermined plane, by use of an error in the result of the detection made with reference to the predetermined plane, which error is attributable to a difference in the detection position along a direction intersecting with the first direction and upon the same object surface in the first and second detecting steps.

Abstract: A PBS for guiding light from a light source to a DMD as light modulating means as well as for guiding light modulated by the DMD to photographic paper is provided on an optical path between the light source and the DMD. The DMD is arranged so that light from the PBS perpendicularly enters itself, and is equipped with a plurality of micromirrors which swing in accordance with image data. This arrangement allows optical components to be disposed so that an angle of incidence of light with respect to the DMD is 0°, thereby enabling tight layout of the light source section. In other words, there is no need to spread the optical components around the light modulating means like in the conventional cases where an angle of incidence with respect to the light modulating means is more or less required.

Abstract: An optical printer capable of controlling the amount of exposure light, and so forth, accurately is disclosed, and the optical printer comprises a light source irradiating light and an optical shutter producing exposure light for exposing a photosensitive object by controlling transmission of the light from the light source.