Abstract: The disclosed technology relates to a protection device for a piece of electronic equipment comprising a housing having a female port. In one aspect, the device comprises a shell suitable for receiving the housing of the equipment, having a male port matching the female port, such that when the shell receives the housing, the male port is engaged in the female port of the equipment. At least one slider that can be moved along an axis by a user to a setpoint position. A position sensor sensing the position of the cursor is configured to transmit a signal representative of the setpoint position to the male port.

Abstract: An information processing apparatus for transmitting image data input by sequentially reading documents, with limiting an allowable frame size, includes: a transmission controller, wherein, in a case where the document has an irregular size, the transmission controller transmits the image data to a transmission destination in a preset frame of a first frame size until a rear edge of the document is detected, and if a portion, which is not transmitted, of the image data exists when the rear edge of the document is detected, transmits the portion to the transmission destination in a frame of a second frame size smaller than the first frame size so that the transmitting of the portion is finished before a start of transmission of image data corresponding to a next document.

Abstract: The exposure apparatus includes: a light source which emits parallel light having a wavelength used for exposure; a photomask which includes a substrate, an optical shielding layer and an optical selective layer, the substrate being capable of transmitting the light of the wavelength, the optical shielding layer being made of a material not transmitting the light of the wavelength, the optical selective layer selectively transmitting light in accordance with a shape to be formed by the exposure, the optical shielding layer and the optical selective layer being arranged on a first side of the substrate; a photomask stage which holds the photomask of which the first side has been coated with photosensitive material, in such a manner that the light emitted from the light source falls on a second side of the photomask reverse to the first side and is projected to the photosensitive material on the first side; a photomask rotation device which rotates the photomask stage on an axis perpendicular to the second side

Abstract: Plate positioning and processing method and apparatus are disclosed. A plate is conveyed in a predetermined first direction so that the plate is in contact with a pair of first positioning pins. The plate is laterally moved contacting with the first positioning pins until reference positions displaced from contacting positions of the plate with the first positioning pins contact with the first positioning pins. A predetermined first processing is applied to the plate. The plate subjected to the first processing is conveyed in a predetermined second direction so that the plate is in contact with a pair of second positioning pins in positions different from the reference positions of front edge of the plate. The plate contacting with the second positioning pins is laterally moved until the same positions as the reference positions contact with the second positioning pins.

Abstract: A perforation and image exposure system comprises an image exposure apparatus and a punch unit. The image exposure apparatus has a first reference pin for defining a lateral position of a plate through contacting with one side edge of the plate contacting a pair of first positioning pins, and image exposure means for exposing the image into the plate subjected to positioning by the pair of first positioning pins and the first reference pin. The punch unit has a second reference pin for defining a lateral position of the plate through contacting with one side edge of the plate contacting a pair of second positioning pins, and perforation means for forming punched holes for positioning on the plate subjected to positioning by the pair of second positioning pins and the second reference pin.

Abstract: A perforation and image exposure system comprises an image exposure apparatus and a punch unit. The image exposure apparatus has a first reference pin for defining a lateral position of a plate through contacting with one side edge of the plate contacting a pair of first positioning pins, and image exposure means for exposing the image into the plate subjected to positioning by the pair of first positioning pins and the first reference pin. The punch unit has a second reference pin for defining a lateral position of the plate through contacting with one side edge of the plate contacting a pair of second positioning pins, and perforation means for forming punched holes for positioning on the plate subjected to positioning by the pair of second positioning pins and the second reference pin.

Abstract: An aligner which enables a uniform close contact between a photo mask and a printed circuit board is provided. The aligner includes: a photo mask (20) provided with tapered portions (21); a mask holder (2) for supporting the photo mask (20) at the tapered portions; a copy frame (1) for supporting the mask holder (2); a load regulating system (3); and a Z-axis moving system (8) having supporting arms (80) on which the mask holder (2) is placed through the load regulating system (3); and a guide system (4) having a guide shaft (40), so that the photo mask (20) can be moved relative to a printed circuit board (B) while maintaining the position in X and Y directions by the guidance of the guide system (4). The photo mask (20) closely contacts with a printed circuit board (B) by a tare weight of the copy frame (1), mask holder (2), and the photo mask (20), and the contact pressure is regulated by the load regulating system (3).

Abstract: A microlithography system, capable of performing high resolution imaging on large-area curved surfaces, based on projection lithography. The system utilizes a high-resolution lens to image a curved mask directly onto a curved substrate. The system uses a curved mask which is identical in shape to the curved substrate, in order to achieve a constant track length for conjugate object and image points, thereby maintaining focus over the full area of curved substrates having height variations that greatly exceed the depth-of-focus of the imaging lens. Magnification errors are controlled by continuous adjustments of the z-position of the projection lens during scanning, with the adjustments depending upon the topography of the curved mask and substrate. By performing the lithography using a step-and-scan seamless-patterning microlithography system, it is possible to pattern over large areas, greater than the field size of the lens.

Abstract: A projection microlithography system that can pattern very large, curved substrates at very high exposure speeds and any desired image resolution, the substrates being permitted to have arbitrary curvature in two dimensions. The substrate is held rigidly on a scanning stage, on which is also mounted a mask containing the pattern to be formed on the substrate. The mask is imaged on the substrate by a projection subsystem which is stationary and situated above the scanning stage. The mask is illuminated with a polygonal illumination beam which causes a patterned region of similar shape to be imaged on the substrate. Different regions of the substrate are moved in a direction parallel to the direction of the optical axis at the substrate (z-axis) by suitable amounts to keep the segment being exposed within the depth of focus of the imaging lens. The stage is programmed to scan the mask and substrate simultaneously across the polygonal regions so as to pattern the whole mask.

Abstract: In a photosensitive material printing apparatus, a film on which an image area indicating mark indicating an area where an image has been recorded, are marked, is positioned at a predetermined position of a photosensitive material to print the image onto the photosensitive material. After punch-holes are punched by a punching device, a position of the image area indicating mark recorded on the film is read by a reading sensor to obtain a relative position between the punch-holes and the image area indicating mark. A film positioning device is moved, according to the relative position obtained by the reading sensor, to a position where the image area indicating mark corresponds to the predetermined position of the photosensitive material to hold the film at the position.

Abstract: A method and an apparatus for exposing multi-pages original images or several separate text and/or picture portions onto a light sensitive material like an offset plate or an intaglio plate by a laser exposure process. The apparatus includes a cassette for a light sensitive material, a laser unit for exposing the light sensitive material, a discharge conveyor for the exposed light sensitive material, and an exposure table which is stepwise movable between the plate cassette and the discharge conveyor and under the laser unit. The exposure table is formed with a device for holding the light sensitive material in a predetermined position thereon.

Abstract: A process and device for adjusting distance for purposes of parallel positioning of a workpiece relative to a mask at a preset distance in which production can be done easily and with low costs. A workpiece is held at a distance from a mask on a work-holding fixture and one of the work-holding fixture and a mask carrier carrying the mask is moved by a moving device toward the other to bring the workpiece comes into contact with the mask. After such contact has occurred, movement of the moving device is continued until a signal is transmitted to a system controller from each of at least three alignment devices which are arranged on the work-holding fixture or the mask carrier, the alignment devices having calibration device which essentially begin to move beginning at a time at which the workpiece and mask come into contact with one another and can no longer execute any further relative movement.

Abstract: An optical lithographic device having a machine frame (1) to which is fastened a lens system (11) having a vertical optical main axis (13). Below the lens system (11), a positioning device (35) is fastened on a support member (3) of the machine frame (1), by means of which device an object table (27) is displaceable relative to the lens system (11) over a guide surface (5) of the support member (3) extending perpendicular to the optical main axis (13).The device is provided with a force actuator system (67) fastened to a reference frame (83) and controlled by a feedforward control system (95). The force actuator system (67) exerts a compensatory force on the support member (3) with a direction opposite to a direction of a reaction force simultaneously exerted by the positioning device (35) on the support member (3), and with a value which is substantially equal to a value of the said reaction force.

Abstract: An automatic printing system includes an array of printing devices arranged along a direction in which the printing member is fed, each of printing devices having a positioning mechanism for positioning the printing member, a feeding device for feeding a printing member to each printing device, a delivery device for picking up the printing member from the feeding device and bringing the printing member into engagement with the positioning mechanism, and a discharging device for discharging the printing member, which has been exposed by the printing device, from the printing device. the automatic printing system further includes a supplying device for storing printing members of different sizes and selectively supplying the printing members one at a time, a punching device for forming a positioning opening in the printing member supplied by the supplying device, and an automatic developing device for developing the printing member which has been exposed by the printing device.

Abstract: A method and apparatus for forming and imaging press plates whereby the image is exposed on the press plate under conditions which duplicate the manner in which the plate will be mounted to a specific press cylinder so as to insure alignment of the image with the rotational axis of the cylinder and wherein the apparatus includes an exposure device including a platen having a forward beveled end to which is engaged the forward bent end of a preformed press plate and which also includes rear tensioning pins which are engageable through preformed holes formed in the trailing edge of the press plate.

Abstract: An apparatus for applying a phototool to a light sensitive substrate by means of a roller for applying the phototool to the substrate and a vacuum restraining means for restraining the phototool to maintain it under tension during application of the phototool to the substrate.

Abstract: A method for amending a defective mask pattern of a photomask. A pattern component of a normal mask pattern having the same pattern layout as that of the defective mask pattern to be amended is irradiated by a spotlight. The shape of the spotlight is aligned with the shape of the pattern component which is the same pattern as the component of the defective mask pattern to be amended. At least one base mark is aligned with at least another pattern component near the irradiated portion. Then, the position of the base mark relative to the position of the irradiated portion is fixed. After that, the normal mask pattern is replaced by the defective mask pattern. The base mark is aligned with a pattern component near the defective pattern component in the same manner as the alignment of the normal mask pattern. After that, the spotlight irradiates the defective mask pattern, the luminous intensity of said spotlight being intensified so that it can amend the defective pattern component.

Abstract: A device for supplying/discharging PS plates in an inclined-type step and repeat machine having a rearwardly inclined exposing table which includes a supplying holder disposed on a side of the exposing table for supplying the PS plate thereto, the holder having a surface thereof rearwardly inclined at the same angle with respect to the horizontal as that of a surface of the exposing table, a pair of endless chains respectivley disposed along both side edges of the holder and adapted to move up and down longitudinally of the holder in synchronism with each other, metal support supported by the chains at both ends thereof, support bars also supported by the chains at respective both ends thereof via metal pieces the chains being driven to move up while carrying the PS plate which is being held by the metal support and support bars, and a guide provided on the top of the supplying holder and bent backwardly for guiding upward the plate being discharged.

Abstract: A contact printer includes a printing table for mounting of photosensitive material thereon, a framework for supporting a light-transmitting plate, a packing, a conveyor belt for movement of an original in X and Y-directions, and an air-blowing nozzle and drive means for open and close operation of the framework. The framework is held at a position where it is in a slightly opened state during movement of the original, supported by the blown air in order to prevent the photosensitive material from being damaged and to insure accurate positioning of the original.

Abstract: An apparatus for applying a phototool to a light sensitive substrate by means of a roller for applying the phototool to the substrate and a vacuum restraining means for restraining the phototool to maintain it under tension during application of the phototool to the substrate.

Abstract: The exposure head of a repeating copying machine is disposed on a slide, with the exposure head being able to be traversed on a table of the copying machine by means of the slide and having a master carriage, an exit carriage and feed means, with a magazine having individual compartments for masters being attached at that end of the slide that is adjacent to the master carriage. The magazine and the feed means are mutually adjustable one relative to the other in both the vertical and horizontal planes, thereby permitting the feed means to be brought into engagement with any of the masters contained in the individual compartments of the magazine for the purpose of removing the master from the magazine and transferring it to the master carriage.

Abstract: A mask aligner for aligning a wafer with a mask and exposing the wafer to an image of the mask, includes an illumination source for illuminating the mask, plural devices for executing plural functions of the aligner, a controller for controlling operation of the apparatus in accordance with a predetermined routine, a detector for automatically detecting a malfunction, a memory of plural routines for disposing of one kind of malfunction; a selector for manually selecting one of the routines; and another controller for controlling the apparatus in accordance with the selected routine, when the detector detects a malfunction.

Abstract: In an apparatus for printing a mask pattern on a wafer for manufacturing a semiconductor circuit element, the exposure of the mask pattern is effected by being divided into a plurality of times. Each time the divided exposure is effected, the relative positional relation of the mask pattern and the wafer is made to differ by a minute amount. Thereby, a mask pattern thinner than the line width of the mask pattern is formed on the wafer.

Abstract: A device for the precision positioning of substantially planar materials, especially for use in the lithographic arts. In particular, photographic masks are precisely located for superimposition on photosensitive films or lithographic printing plates held within the frame of a plate making machine.

Abstract: A projection exposure apparatus in which a mask and a wafer are displaced in a plane perpendicular to the optical axis of the projection optical system to form circuit patterns on the entire surface of the wafer. The mask and wafer are displaced along guides having two guide rails between which are provided means for compensating for non-linearity of one of the guide rails.

Abstract: An apparatus for moving a table or a stage having movable parts adapted to be guided by guide rail means slidingly and rectilinearly. At least the movable parts are made of a non-iron light metal material. The sliding surfaces of the movable parts making sliding contact with the guide rail means are made of a self-lubricating material, while the sliding surfaces of the guide rail means making sliding contact with the movable parts are made of a material having a higher hardness and wear resistance than the non-iron light metal material, so that the weight of at least the movable parts is reduced to decrease the weight of the apparatus as a whole.

Abstract: A photocomposer includes a fixed rearwardly inclined backboard for supporting a sensitized lithographic plate. To substantially reduce the weight of the backboard and its supporting structure, the main portion of the backboard is of cellular construction. Depressible register pins for positioning the lithographic plate are mounted on the backboard. Each pin is part of an assembly constructed to readily permit transverse adjustment of the pins.

Abstract: By providing a photographic original plate on which an original picture image and a light-shielding mask are formed, two identical pictures can be formed by exposing a sheet of photosensitive material with the original plate placed thereon and repeating the procedure after rotating the original plate 180 degrees about a point which is located outside of the picture image and the light-shielding mask. Though the two printed images are inverted relative to each other, the final prints are eventually cut apart along a central line and no problem arises. Through adoption of the method and the use of the novel photographic original plate, not only the printing process becomes simpler than conventional method but a better result in the final prints can be obtained.

Abstract: A method of reading selected ones of an array of data frames from a microfiche medium substantially without errors attributable to misalignment of the frames. The method, which utilizes a microfiche reader-printer in adjusting for misalignment of the frames, includes the steps of determining the average distance between the frames along a first selected axis (e.g., the X-axis) of the array, and using said average distance in positioning the frames along the axis for reading. The frames are separated from each other by a predetermined nominal distance along the axis. The average distance is determined by dividing the distance between the outermost frames along the axis (the distance between the outermost frames being expressed in terms of the number of stepper motor steps needed to traverse said distance) by one less than the number of frames along said axis to produce a quotient, and adding the quotient to the predetermined nominal distance.

Abstract: There is described an exposure frame for aligning and holding photomasks in registration with a printed circuit board coated with a light sensitive material. The printed circuit board is held between an independently adjustable mounting strip and slides. A contact strip is floated on the mounting strip by a spring mounting to permit the slides to position the printed circuit board relative to the photomask. The photomask, in turn, is mounted on the adjustable mounting strip. This facilitates good registration between the board and mask.

Abstract: A machine and a control system are provided for generating high registration photomasks with a contact printing arrangement. Further, a unique control arrangement is provided for controlling a machine such as a high registration contact print machine or other type of machine. In a preferred embodiment, a control system generates signals to a step and repeat contact printing machine that exposes many prints of master die images on a photographic film, where these prints have a high registration characteristic. In a further embodiment a unique control arrangement is provided for machine control operations.

Abstract: A microfiche editing device for mechanically aligning a portion of one microfilm with respect to a second microfiche along an optical path. The first microfilm may be a microfiche held and aligned by a rectangular toothed rack or a microfilm held and aligned by a double spool mechanism.

Abstract: An apparatus for automatically aligning a semiconductor wafer with a mask in the manufacture of integrated circuit devices is disclosed. The mask and wafer are each provided with alignment patterns, the alignment pattern on the wafer cooperating with the alignment pattern on the mask in a unique visual manner to signify alignment. A scanning mechanism is provided for automatically scanning the alignment pattern areas and producing output signals indicative of the relative positions of the alignment patterns on the wafer and mask. Logic circuitry is provided for operating in response to any misalignment represented by the scan output signals to compute formulae which are utilized to produce control signals for driving motor drive mechanisms to produce relative movement between the mask and wafer to bring them into alignment. Several separate alignment cycles are provided, if needed, for zeroing in on finalized alignment.

Abstract: Objects, such as a pattern mask and a photoresist coated substrate, are placed in translational and/or rotational alignment by a system in which a target on one object is successively aligned to two targets on the other object so that the accuracy of each alignment can be verified. The system compares a known stored distance between alignment targets with the distance determined from the successive alignments. When the distances agree within a preselected tolerance, then the objects are moved into alignment.

Abstract: An apparatus for automatically aligning a semiconductor wafer with a mask in the manufacture of integrated circuit devices is disclosed. The mask and wafer are each provided with alignment patterns, the alignment pattern on the wafer cooperating with the alignment pattern on the mask in a unique visual manner to signify alignment. A scanning mechanism is provided for automatically scanning the alignment pattern areas and producing output signals indicative of the relative positions of the alignment patterns on the wafer and mask. Logic circuitry is provided for operating in response to any misalignment represented by the scan output signals to compute formulae which are utilized to produce control signals for driving motor drive mechanisms to produce relative movement between the mask and wafer to bring them into alignment. Several separate alignment cycles are provided, if needed, for zeroing in on finalized alignment.

Abstract: A wafer-bearing chuck, an annular reference plate, a copy lens system, and a mask-bearing holder are mounted on a floating unit so that the copy lens system produces an image of a pattern-bearing surface of the mask at a plane positioned between the annular reference plate and the wafer chuck and produces an image of a selected pattern-bearing region of a photosensitive-film-bearing surface of the wafer at the pattern-bearing surface of the mask. The wafer chuck is movably mounted for positioning the photosensitive-film-bearing surface of the wafer in abutment with the annular reference plate in a plane parallel to the image plane of the pattern-bearing surface of the mask and for subsequently positioning the selected pattern-bearing surface region of the wafer in the image plane of the pattern-bearing surface of the mask.