Abstract: Pedestal assemblies with a thermal barrier plate, a torque plate and at least one kinematic mount to change a plane formed by the thermal barrier plate are described. Susceptor assemblies and processing chambers incorporating the pedestal assemblies are also described. Methods of leveling a susceptor to form parallel planes between the susceptor surface and a gas distribution assembly surface are also described.

Abstract: The invention relates to a positioning device for positioning a substrate, in particular a wafer, comprising: a process chamber; a base body; a carrier element which comprises a support for supporting the substrate, the carrier element being arranged above the base body and formed movable in terms of distance from the base body; and a holder for an additional substrate, in particular an additional wafer or a mask, the holder being arranged opposite the carrier element; wherein there is, between the base body and the carrier element, a sealed-off cavity to which a pressure, in particular a negative pressure, can be applied so as to prevent undesired movement of the carrier element as a result of the action of an external force.

Abstract: Pedestal assemblies with a thermal barrier plate, a torque plate and at least one kinematic mount to change a plane formed by the thermal barrier plate are described. Susceptor assemblies and processing chambers incorporating the pedestal assemblies are also described. Methods of leveling a susceptor to form parallel planes between the susceptor surface and a gas distribution assembly surface are also described.

Abstract: A projector includes an illuminating system and an imaging system. The illuminating system includes a light source module, a lens array, a condenser lens and a display panel, in which light beams are generated by the light source module, uniformly dispersed by the lens array, condensed by the condenser lens, and reflected by the display panel to obtain image light, and the condenser lens has an effective focal length substantially equal to a product of an f-number of the illuminating system and a thickness of the lens array. The imaging system outwardly projects the image light.

Abstract: The present invention provides an exposure apparatus and an exposure method. The method comprises: utilizing an exposure light source to provide light rays to the photo-resist layer, wherein the light rays pass through the mask and the transparent substrate to reach the photo-resist layer; and utilizing a reflective plate to reflect the light rays passing through the transparent substrate and the photo-resist layer back to the photo-resist layer. The present invention can reduce a line space of a pattern of the photo-resist layer.

Abstract: A photo-alignment apparatus is provided, which includes an exposure machine, at least one mask and a photo-alignment area. The exposure machine includes a light source, a polarization plate, and a multilayer splitter. The light source emits an unpolarized light. The polarization plate receives the unpolarized light and converts the unpolarized light into a polarized light. The multilayer splitter split the polarized light into a first light beam and a second light beam. The mask includes at least two transmission portions which allow the first and second light beams to be transmitted therethrough and be projected onto the photo-alignment area for exposure thereto.

Abstract: A method for alignment processing including making a substrate 4, coated with an aligned film, closely face the photo mask 7 having a first mask pattern group having a plurality of elongated first openings formed at a fixed array pitch and a second mask pattern group provided in parallel with the first mask pattern group and having a plurality of elongated second openings formed at the same pitch as the array pitch of the first openings and moving the substrate in a direction crossing the first and second mask pattern groups, applying P polarizations with different incidence angles ? to the first and second mask pattern groups of the photo mask, and alternately forming, on the aligned film, first and second slit alignment regions in different aligned states.

Abstract: A system for forming a pattern on a part comprises a chamber base, a pressure vessel and a retaining device. The retaining device is positionable between the chamber base and the pressure vessel to secure a deformable mask therebetween. The system further comprises a first pressure source, a second pressure source and a third pressure source. The first pressure source provides a negative pressure within the chamber to draw the mask towards a part installed within the chamber base. The second pressure source provides a positive pressure within the pressure vessel to direct the mask towards the part so that the mask corresponds to at least one complex non-planar surface of the part. The third pressure source provides a negative pressure within pressure vessel. An exposure source exposes the part through the mask while the mask is deformed corresponding to the at least one complex non-planar surface of the part.

Abstract: A method and a device are described for producing copies/replica of a volume reflection hologram wherein a holographic film (4) is guided over a drum with polygon cross-section having at least two planar (polygon) master surfaces (3) to each of which at least one master (7) is attached in the circumferential direction, where the film is brought into contact with at least one master hologram (7) and its entire surface is exposed to laser. It is essential that to at least one of the master surfaces (5) with the film guided over it, a laser exposure unit (22) is assigned which allows full exposure of the respective master surface to parallel, coherent laser beams (6), and that the at least one exposure unit (22) follows section wise the rotational movement of the drum by a splitting angle with equal velocity and exposes the corresponding master surface (5) to then be reset quickly again and perform the same angular displacement and exposure together with the next master surface.

Abstract: In the present invention, a number of times the brightness changes detected at the same position while a substrate conveys are added up in the conveying direction, thereby obtaining a plurality of edge count data, and then, a plurality of positions of long sides of patterns parallel to the conveying direction is identified based on the plurality of edge count data exceeding a predetermined threshold value, middle point positions of a plurality of proximity pairs are calculated, and a middle point position close to the target position preset in the imaging device is selected from the plurality of middle point positions of the proximity pairs, an amount of position displacement between the selected middle point position and the target position of imaging device is calculated, and the photomask in the direction substantially perpendicular to the conveying direction so that the amount of position displacement is a predetermined value.

Abstract: A digital stereo imaging photosensitive device for a grating and a photosensitive material, includes: a photosensitive platform (8), connected with a base via a platform moving mechanism; a compressing mechanism (7) mounted on the photosensitive platform, wherein a grating (5) is positioned on the compressing mechanism; a LCD displayer (2) suspending above the photosensitive platform; and a lens suspending above the photosensitive platform via a lens moving mechanism, wherein the lens is under the LCD displayer. And a method for digital stereo projection is also provided.

Abstract: A device for mounting a grating and a photosensitive material for stereoprojection imaging, includes: an enlarging-printing platform; and an exposure head positioned above the enlarging-printing platform; wherein the enlarging-printing platform is a chamber structure, and has a plurality of suction holes provided on an upper surface thereof and at least one exhaust port provided on a side connected with an exhaust device; the device for mounting the grating and the photosensitive material for stereoprojection imaging further includes a compressing mechanism connected with the upper surface. The device for mounting the grating and the photosensitive material provides a real-time composite device for developing stereopictures. With the mounting device, the grating and photosensitive photographic paper need either being combined beforehand, or being developed with the grating after exposure.

Abstract: A method and system for automatically determining an optimal re-training interval for a fault diagnoser based on online monitoring of the performance of a classifier are disclosed. The classifier generates a soft measure of membership in association with a class based on a training data. The output of the classifier can be utilized to assign a label to new data and then the members associated with each class can be clustered into one or more core members and potential outliers. A statistical measure can be utilized to determine if the distribution of the outliers is sufficiently different than the core members after enough outliers have been accumulated. If the outliers are different with respect to the core members, then the diagnoser can be re-trained; otherwise, the output of the classifier can be fed to the fault diagnoser.

Abstract: A lithographic apparatus is disclosed that has a first substrate table arranged to hold a substrate and a second substrate table arranged to hold a substrate, an imprint template holder arranged to hold an imprint template, and an imprintable medium dispenser, wherein the first substrate table is moveable between a first position located at or adjacent to the imprintable medium dispenser, and a second position located at or adjacent to the imprint template holder, and the second substrate table is moveable between the first and second positions, such that the first and second substrate tables swap positions.

Abstract: A light-emitting device includes a plurality of light-emitting elements, an element substrate on which the plurality of light-emitting elements are disposed, a plate-shaped sealing member having a lens array in which a plurality of lenses is arranged and sealing the plurality of light-emitting elements together with the element substrate, and a spacer disposed between the element substrate and the plate-shaped sealing member for maintaining a distance between the light-emitting elements and the lenses, in which the spacer is provided with a plurality of sealing cavities, at least one lens of the plurality of lenses is disposed so as to overlap each of the sealing cavities, and the light-emitting elements are disposed in each of the sealing cavities so as to overlap the corresponding lenses.

Abstract: A contact lithography apparatus, system and method use a hydraulic deformation to facilitate pattern transfer. The apparatus, system and method include a spacer that provides a spaced apart proximal orientation of lithographic elements, and a hydraulic force member that provides the hydraulic deformation. One or more of the lithographic elements and the spacer is deformable, such that hydraulic deformation thereof facilitates the pattern transfer.

Abstract: A contact lithography apparatus, system and method use a deformation to facilitate pattern transfer. The apparatus, system and method include a spacer that provides a spaced apart parallel and proximal orientation of lithographic elements, such as a mask and a substrate, when in mutual contact with the spacer. One or more of the mask, the substrate and the spacer is deformable, such that deformation thereof facilitates the pattern transfer.

Abstract: A contact lithography apparatus and a method use one or both of spacers and a mesa to facilitate pattern transfer. The apparatus and the method include one or both of a spacer that provides a spaced apart orientation of lithographic elements, such as a patterning tool and a substrate, when in mutual contact with the spacer and a mesa between the patterning tool and the substrate. The mesa supports a contact surface of one or both of the mold and the substrate. One or both of the spacers and the mesa may be non-uniform. One or more of the patterning tool, the substrate and the spacer is deformable, such that deformation thereof facilitates the pattern transfer.

Abstract: A lithographic apparatus is disclosed that has a template holder configured to hold an imprint template, a substrate table arranged to receive a substrate, a radiation output arranged to illuminate a part of the imprint template, and a detector configured to detect radiation scattered from an interface between the imprint template and imprintable material provided on the substrate.

Abstract: A near-field exposure mask includes a light blocking film having an opening smaller than a wavelength of exposure light, and a mask base material for holding the light blocking film. The near-field exposure mask is configured and positioned to effect exposure of an object to be exposed to near-field light generated corresponding to the opening during contact thereof with the object to be exposed. The mask base material is transparent to the exposure light and comprises a synthetic resin material having Young's modulus in a range of 1 GPa or more to 10 GPa or less.

Abstract: A near-field exposure method including preparing a photomask for near-field exposure, having a light blocking film provided on a base material constituting a membrane portion and a support member supporting the base material, wherein a first alignment mark for rough alignment is provided on the support member and a second alignment mark for fine alignment is provided on the membrane portion, setting the photomask and an object to be exposed in a near-field exposure apparatus, aligning the photomask and the object using the first alignment mark, flexing the membrane portion to contact with the object and detecting a positional relation between the membrane portion and the object using the second alignment mark, aligning the photomask and the object based on the detected positional relation and flexing the membrane portion to contact with the object, and exposing the object to light from a light source by way of the photomask.

Abstract: Systems and methods for near-field photolithography utilize surface plasmon resonances to enable imaging of pattern features that exceed the diffraction limit. An example near-field photolithography system includes a plasmon superlens template including a plurality of opaque features to be imaged onto photosensitive material and a metal plasmon superlens. The opaque features and the metal superlens are separated by a polymer spacer layer. Light propagates through the superlens template to form an image of the opaque features on the other side of the superlens. An intermediary layer including solid or liquid material is interposed between the superlens and a photoresist-coated semiconductor wafer to reduce damage resulting from contact between the superlens template and the photoresist-coated semiconductor wafer.

Abstract: A second substrate, e.g. a III/V compound semiconductor, is placed on a first substrate, e.g. a wafer, in the vicinity of placement marks on the first substrate. The second substrate is exposed to patterned radiation, e.g. for the manufacture of integrated circuits.

Abstract: A mechanical self-reciprocating oscillator and mechanism and method for establishing and maintaining regular back and forth movement of a micromachined device without the aid of any electronic components are provided. The fully mechanical micromachined oscillator and mechanism are driven using only a DC power source on at least one substrate such as a semiconductor chip. The oscillator and mechanism preferably include an electrothermal actuator, that, when actuated, opens a switch to cut off supply current to the actuator. Two versions of the oscillator and mechanism are provided using distinct hysteresis mechanisms, one structural and the other thermal.

Abstract: A dual sprocket contact motion picture film printer maintains film steadiness when running a film negative in contact with an unexposed raw stock film by tensioning perforations along one film side against sprocket teeth of a full fitting sprocket and a shrinkage sprocket on the other side. The films pass through a fluid chamber before passing through a printer aperture and a vacuum pressure applied from one side of the chamber tensions the negative against the sprocket teeth while a positive fluid pressure applied from an opposite side tensions the raw stock against the sprocket. The films are self-aligned by the fluid forces maintaining equal tension on both sides of each film strip as the films pass the aperture of the film printer.

Abstract: Contact printing can be used to form electrically active micro-features on a substrate. An ink formulation containing an oxide precursor is used to form the micro-features, which are heat cured to form oxides. Various precursors are illustrated which can be used to form conducting, insulating, and semiconductor micro-features.

Abstract: A contact lithography system includes a patterning tool having a pattern for transfer to a substrate; and at least one alignment device coupled to the patterning tool. The alignment device is configured to measure alignment between the patterning tool and a substrate for receiving the pattern of the patterning tool. A contact lithography method includes aligning a patterning tool having a pattern for transfer with a substrate for receiving the pattern of the patterning tool using at least one alignment device coupled to the patterning tool.

Abstract: An exposure apparatus for exposing an object to be exposed by elastically deforming an exposing mask having a micro-opening pattern so as to bring the exposing mask into contact with the object includes a compression/decompression section for elastically deforming the exposing mask with compression/decompression so as to bring the exposing mask into contact with the object or into detachment from the object; and a controlling section for controlling the compression/decompression operation with the compression/decompression section. The controlling section controls the compression/decompression operation with the compression/decompression section based on control data prepared in advance.

Abstract: Systems and methodologies are provided that account for surface variations of a wafer by adjusting grating features of an imprint lithography mask. Such adjustment employs piezoelectric elements as part of the mask, which can change dimensions (e.g., a height change) and/or move when subjected to an electric voltage. Accordingly, by regulating the amount of electric voltage applied to the piezoelectric elements a controlled expansion for such elements can be obtained, to accommodate for topography variations of the wafer surface.

Abstract: A pattern forming process and a pattern forming apparatus comprising forming a liquid receptive particle layer on an intermediate transfer body in a specified area by using liquid receptive particles capable of receiving a recording liquid containing a recording material; applying a liquid droplet of the recording liquid on a specified position of liquid receptive particle layer according to specified data, trapping the recording material near the surface of the liquid receptive particle layer on the intermediate transfer body, and forming a pattern of the recording material near the surface of the liquid receptive particle layer; and removing the liquid receptive particle layer provided with the recording liquid from the intermediate transfer body so that the pattern may be positioned between the transfer object and the liquid receptive particle layer, and transferring the liquid receptive particle layer to the transfer object.

Abstract: A near-field exposure apparatus including a light source, a stage on which an object to be exposed to light is placed, and a photomask with a deformable membrane portion having on a first surface a light shielding membrane that has a micro aperture and a substrate for supporting a peripheral region of a second surface of the deformable membrane portion. Exposure is conducted with the deformable membrane portion in a sagged condition. The photomask has a stress relieving structure to relieve stress that is generated at a border between the deformable membrane portion and the substrate when the deformable membrane portion sags. The stress relieving structure is one of: a reinforcing member placed at the border, the substrate being partially thinned near the border, and an intermediate layer that is formed between the substrate and the second surface of the deformable membrane portion.

Abstract: An apparatus for forming a pattern by using a photomask including both a minute aperture where a main component of a transmitted light is an evanescent light and an aperture where a main component of a transmitted light is a propagating light. The apparatus includes a sample stand for placing a substrate to be processed on which a photoresist with a film thickness equal to or smaller than a width of the minute aperture is formed, a stage for placing the photomask, a light source for generating light for exposure, and a device for controlling a distance between the substrate to be processed and the photomask.

Abstract: Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.

Abstract: An aligner which enables a uniform close contact between a photo mask and a printed circuit board is provided. The aligner includes: a photo mask (20) provided with tapered portions (21); a mask holder (2) for supporting the photo mask (20) at the tapered portions; a copy frame (1) for supporting the mask holder (2); a load regulating system (3); and a Z-axis moving system (8) having supporting arms (80) on which the mask holder (2) is placed through the load regulating system (3); and a guide system (4) having a guide shaft (40), so that the photo mask (20) can be moved relative to a printed circuit board (B) while maintaining the position in X and Y directions by the guidance of the guide system (4). The photo mask (20) closely contacts with a printed circuit board (B) by a tare weight of the copy frame (1), mask holder (2), and the photo mask (20), and the contact pressure is regulated by the load regulating system (3).

Abstract: The transfer apparatus transfers an image displayed in an image display area of an image display unit of transmission type to an image forming area of a light-sensitive recording medium by means of light passing through the image display unit. The apparatus has an image processing section by means of which either a size or a display position of the image to be displayed in the image display area or both are adjusted prior to image display in accordance with either a size of the image forming area or a relative position of the image forming area with respect to the image display area or both.

Abstract: Full-contact exposure device that allows high adherence of a photo mask with a board. Upon completion of prescribed processing, a controller controls a moving mechanism to move a platen upward, thereby moving the photo mask and a board closer, and to stop at a position where a sealed space is formed between the two. At the same time a controller starts vacuuming by controlling a vacuum pump. By this vacuum pressure in the space between the photo mask and the board becomes negative, and the photo mask bends downward with its center area sagging and contacting the board. The controller controls a cam drive mechanism to rotate cams while vacuuming, allowing the photo mask to gradually make contact with the board from the center area to its periphery while pushing out the air gradually from the center to the periphery, thereby completing full contact with the board.

Abstract: A photographic film strip in the form of a length of photographic film has a pre-exposed area and an unexposed area. The pre-exposed area is continuous and extends along one edge of the strip between ends of the strip. The unexposed area is also continuous and has a length suitable for making multiple single exposure frames with adjacent frames being separated by a frame line. Upon development the film, an image formed by the pre-exposed section of each print will extend between opposite edges of prints formed by individual frames without the need to preregister the film in a camera The pre-exposure comprises a contact exposure. A strip of film can be placed in contact with a partially pre-exposed master on a cylindrical drum in a light tight housing so that pre-exposed section of the film can be exposed by one activation of an electronic flash located in the center of the drum.

Abstract: In a near-field exposure system: a light source emits exposure light having a predetermined wavelength and being unpolarized; a polarizer plate linearly polarizes the exposure light; an exposure mask which has a pattern of openings each having a dimension smaller than the wavelength of the exposure light is placed at such a position that the exposure light is applied to the exposure mask; an exposure table holds a photosensitive material sensitive to the exposure light, at a position which near-field light emerging from the openings reaches; and a polarizer-plate holding device holds the polarizer plate in such a manner that the polarizer plate can be moved between first and second positions, where the first position is in an optical path of the exposure light from the light source to the exposure mask, and the second position is outside the optical path.

Abstract: The present invention is to easily examine the contact state of two piled films in a short time.

Abstract: The invention provides a full-contact type exposure device that allows high adherence of a photo mask with a board.

Abstract: A method for inspecting features on a reticle is provided. The method includes providing a layout design of a test feature and transferring the layout design of the test feature onto the reticle. After the test feature is transferred onto the reticle, an image of the transferred layout design is captured to determine whether or not the transfer is acceptable. This determination is made by comparing the captured image of the transferred layout design against the layout design of the test feature. The comparison ascertains deviations between the captured image and the layout design and determines if the deviations fall within a user specified range.

Abstract: The invention provides apparatus for exposing a face of a panel, in particular a printed circuit panel, the device including a light source.

Abstract: An aligner which enables a uniform close contact between a photo mask and a printed circuit board is provided. The aligner includes: a photo mask (20) provided with tapered portions (21); a mask holder (2) for supporting the photo mask (20) at the tapered portions; a copy frame (1) for supporting the mask holder (2); a load regulating system (3); and a Z-axis moving system (8) having supporting arms (80) on which the mask holder (2) is placed through the load regulating system (3); and a guide system (4) having a guide shaft (40), so that the photo mask (20) can be moved relative to a printed circuit board (B) while maintaining the position in X and Y directions by the guidance of the guide system (4). The photo mask (20) closely contacts with a printed circuit board (B) by a tare weight of the copy frame (1), mask holder (2), and the photo mask (20), and the contact pressure is regulated by the load regulating system (3).

Abstract: To provide a contact exposure device that does not require replacement of a interval setting means between a mask and workpiece, even if processing workpieces of different thickness, an interval setting device (10) between a mask and workpiece is provided which has an attachment member (10a) which is attached to a workpiece stage (WS) and a movable member (10b). The attachment member (10a) and the movable member (10b) are fitted together by screw threading. Consequently, the height can be adjusted by rotating the movable member (10b). The workpiece stage WS and a mask stage are separated from each other by a prescribed distance by the interval setting device (10), and the space between a mask and the workpiece (W) is depressurized. A gap is formed between the mask and workpiece (W) without contact even upon depressurization since the workpiece stage (WS) and the mask stage are separated a prescribed distance by the interval setting means (10).

Abstract: The present invention is to easily examine the contact state of two piled films in a short time.

Abstract: A substrate conveying system wherein, at a substrate transfer position of a conveyance robot, a robot arm is moved upwardly at a normal speed from its lowermost position, and wherein the movement speed is changed to a lower speed at a predetermined position. During upward motion at the lower speed, the substrate is received and, while continuing the upward motion, the movement speed is changed back to the normal speed, at a second predetermined position. The robot arm continues its upward motion to its topmost position, with this normal speed.

Abstract: A contact printer including a liquid crystal display (LCD) for presenting an image for printing; a supply adapted to contain at least one sheet of photosensitive media; and a structure for pressing the photosensitive media sheet from the supply against the LCD. The printer further includes electronics for driving the LCD for causing an image to be presented against a pressed photosensitive sheet for contact printing of such image.

Abstract: Spoke shaped (petal shaped) through holes or cavities are provided at the center or a substrate holder which attaches and holds a substrate over substantially the entire surface, to allow vertical movement of a center-up member having a plurality of radially extended spoke shaped mounting portions. As a result, degradation in the flatness of a substrate at the time of attaching the substrate to the mounting surface of the substrate holder is minimized.

Abstract: Disclosed is the image forming apparatus 1 in which, when the image displayed on the display 31 of the other electronic apparatus 30 is formed on the microcapsule sheet 2, the LC shutter 9 is opened for a predetermined time while contacting the display 31 to the contact plane A of the image forming apparatus 1 and light is irradiated on the microcapsule sheet 2 from the display 31, thereby, the desirable image is formed on the image forming layer 13 of the microcapsule sheet 2 according to the image displayed on the display 31.

Abstract: A proximity exposure device with a distance adjustment device in which sufficient determination sensitivity can be obtained even in areas with a low reflectance factor, such as on a glass surface, is achieved by a distance measurement part having a light source for measurement purposes, a pinhole plate, an objective lens, a light detection device and the like, light emerging form the light source for measurement purposes being emitted via the pinhole plate and objective lens onto the mask surface/workpiece surface, and light reflected thereby is detected via the objective lens and pinhole plate by the light detection device. If the mask surface/workpiece surface is located at the focal point of the objective lens on the object side, reflected light with high intensity is incident in the light detection device.