Abstract: A paper sorting system allows the high speed determination of color, glossiness and the presence of printed matter for individual sheets of paper in a stream of waste paper. Sorting criteria may be selected from a plurality of predefined options to sort the paper stream.

Abstract: An optical droplet sensor can include a light emitter, a light receiver and a light guide, and can be adhered onto an inner surface of a windshield via a light transmissive adhesive layer. The light guide can include a light entry surface and a light exit surface formed of respective convex-shaped arbitrary curved surfaces, a light entry/exit surface formed of a flat plane, and a reflecting surface that can be made of a metal film. The light emitted from the light emitter is given an optimized light distribution at the light entry surface and introduced into the light guide. The light is then reflected from the metal film-applied reflecting surface toward an outer surface of the windshield. The light totally reflected at the outer surface returns to the light exit surface and is given an optimized light distribution at the light exit surface. The light is then externally transmitted/released from the light guide and collected on a light-receiving surface of the light receiver.

Abstract: A method of determining a physical property of a substrate includes recording a first spectrum obtained from a substrate, the first spectrum being obtained during a polishing process that alters a physical property of the substrate. The method includes identifying, in a database, at least one of several previously recorded spectra that is similar to the recorded first spectrum. Each of the spectra in the database has a physical property value associated therewith. The method includes generating a signal indicating that a first value of the physical property is associated with the first spectrum, the first value being determined using the physical property value associated with the identified previously recorded spectrum in the database. A system for determining a physical property of a substrate includes a polishing machine, an endpoint determining module, and a database.

Abstract: An integrated optical waveguide type surface plasmon resonance (SPR) sensor having an optical waveguide with a corresponding SPR sensing area, photodetectors, and wavelength tunable laser or any kind of external tunable laser source/coupler formed on a substrate. In an embodiment, the laser is a wavelength tunable laser and optionally, the integrated device may include a power source on the substrate for providing a electric power to the wavelength tunable laser and the photodetectors, or a circuit for signal processing, or a microfluidic structure for routing a target sample to the SPR sensor area. The microfluidic structure optionally includes a mixer or a reaction chamber for mixing and allowing a physical or chemical reaction to occur, respectively. In an embodiment, plural planar integrated optical waveguide type SPR sensors may be fabricated on a substrate to form an array of SPR sensors.

Abstract: A fuel property detection device for detecting a property of fuel based on a detection signal output from a photoreceptor includes a light guiding member having a reflecting surface located in direct contact with the fuel. The light guiding member includes a light emitting surface through which measurement light from a light source is emitted from the light guiding member into the fuel, a light incident surface through which the measurement light emitted from the light emitting surface and passing through the fuel enters again the light guiding member, and the reflecting surface from which the measurement light incident from the light incident surface is reflected toward the photoreceptor. The light incident surface and the light emitting surface are opposite to each other to have a space therebetween in the light guiding member, and the space is provided to be filled with the fuel.

Abstract: In systems and methods measure overlay error in semiconductor device manufacturing based on target image asymmetry. As a result, the advantages of using very small in-chip targets can be achieved, while their disadvantages are reduced or eliminated. Methods for determining overlay error based on measured asymmetry can be used with existing measurement tools and systems. These methods allow for improved manufacturing of semiconductor devices and similar devices formed from layers.

Abstract: An approach that determines an ion implantation processing characteristic in a plasma ion implantation of a substrate is described. In one embodiment, there is a light source configured to direct radiation onto the substrate. A detector is configured to measure radiation reflected from the substrate. A processor is configured to correlate the measured radiation reflected from the substrate to an ion implantation processing characteristic.

Abstract: An article, process, and method for surface plasmon resonance plates are described. A substrate is covered with a thin metal film onto which a second thin metal film is deposited. The surface of the second thin metal film is converted to the metal oxide which is used to covalently bond organosilanes to the surface. Reactive organosilanes containing terminal bonding groups are arranged in a plurality of spots that are surrounded by inert organosilanes. Biomolecule attachment to the binding group is detected or measured from surface plasmon signals from the first thin metal film.

Abstract: A sensor and method for surface plasmon resonance sensing, wherein a small variation of the refractive index of an ambient medium results in a large variation of loss of a sensing mode. The surface plasmon resonance sensor comprises an antiguiding waveguide including a core characterized by a refractive index and a reflector surrounding the core. The reflector has an external surface and is characterized by a band gap and a refractive index higher than the refractive index of the core. A coating is deposited on the external surface of the core, the coating defining with the ambient medium a coating/ambient medium interface. In operation, the coating is in contact with the ambient medium, and the antiguiding waveguide is supplied with an electromagnetic radiation to (a) propagate a mode for sensing having an effective refractive index lower than the refractive index of the core and higher than a refractive index of an ambient medium and (b) produce surface plasmons at the coating/ambient medium interface.

Abstract: Disclosed are optical devices including one or more carbon nanotubes that can function as plasmon waveguides. The presently disclosed devices advantageously utilize the existence of surface plasmons on carbon nanotubes through the generation and transport of surface plasmon polaritons across the nanotubes. Also disclosed are methods for tuning the devices through particular formation parameters for the nanotubes and/or selection of particular substrate materials. Systems of the present invention can provide optical data concerning a sample, for instance via construction of an NSOM image, as well as topological date concerning a sample via construction of an AFM image. In one embodiment, the disclosed systems can provide simultaneous acquisition of optical images and topological images.

Abstract: This application describes designs, implementations, and techniques for controlling propagation mode or modes of light in a common optical path, which may include one or more waveguides, to sense a sample.

Abstract: An apparatus and method are herein disclosed which utilize a ratio based on a varied angle of incidence of light on an optical fiber analysis system. By calculating the ration of light incident on the sample element, variations in the system parameters which can provide deleterious effects are obviated.

Abstract: A measuring optical system for emitting and receiving light is fixedly installed in a ceiling portion of a measuring device, and a wafer holding part for supporting a semiconductor wafer is provided in a bottom portion of the measuring device. A support table is horizontally laid between support pins of the wafer holding part, and a calibration standard member for calibration is placed on an upper surface of the support table. When a semiconductor wafer is supported by the support pins, light emerging from the measuring optical system impinges upon the semiconductor wafer, and the reflection intensity of the light is measured. When no semiconductor wafer is supported by the support pins, light emerging from the measuring optical system impinges upon the calibration standard member, whereby the calibration can be done at any time.

Abstract: An elongated bar shaped housing contains an optical sensing apparatus with at least one light source to create a sensing beam and a deflecting arrangement which moves the sensing beam back and forth between the longitudinal ends of the housing. One of the walls of the housing has an output window extending in the longitudinal direction of the housing for the sensing beam and an input window parallel to the output window for the sensing beam reflected from a workpiece or its support. In the housing behind the input window there is a strip shaped light receiving arrangement with a plurality of optical sensors, as well as an evaluation unit connected to the light receiving arrangement to which the output signals of the light receiving arrangement are sent.

Abstract: A gloss sensor for optically measuring the gloss of a moving surface includes a housing having an exterior surface which is generally parallel with the moving surface. A light source is carried by the housing and configured for emitting a source beam of light. At least one light detector is carried by the housing. An optical prism is mounted to the housing at the exterior surface. The prism is configured to split the source beam into a reference beam which is reflected by the prism internally within the housing to the one or more light detectors, and a measurement beam which passes through the prism and is reflected by the moving surface to the one or more light detectors.

Abstract: Methods for measuring a property of a sample material present at an interface of an emerging medium in a spectroscopic device include a sensor (10) featuring at least one dielectric member (14) disposed upon a entrant medium (12), with the dielectric member being of an optical thickness selected to produce an observable interference effect for an incident angle of light below the critical angle of total internal reflection at the interface with the dielectric member (14). The dielectric member (14) of the sensor device (10) may be modified and functionalized for binding of a sample analyte by disposing a sensing surface area (38, 40, 42) upon it. Moreover, an metal layer (18) may be added to an entrant medium (20) to produce a sensor (16) that generates observable optical phenomena both above (resonance) and below (interference) a given critical angle.

Abstract: An optical measurement system having a spectrophotometer and a ellipsometer is calibrated, the spectrophotometer and the ellipsometer first being calibrated independently of one another. A spectrophotometer layer thickness (dphoto) of a specimen is then determined at an initial angle of incidence (?init) using the spectrophotometer. An ellipsometer layer thickness (delli) of the specimen is then determined using the layer thickness determined with the ellipsometer. The spectrophotometer and the ellipsometer are matched to one another by varying the initial angle of incidence (?init) until the absolute value of the difference between the spectrophotometer layer thickness (dphoto) and the ellipsometer layer thickness (delli) is less than a predefined absolute value.

Abstract: Apparatus and methods are disclosed for verifying one or more operational conditions of an optical inspection machine. A row of grooves (1-5) that simulate a reagent pad containing a specific type of analytes at known concentrations can be used for verification of the operation of the machine. Apparatus can include a row of grooves (1-5), each with different geometry, configured on an insertable device (20). The insertable device (20) can be positioned so that the row of grooves (1-5) can be illuminated by the readhead of the machine. If the optical inspection machine provides results corresponding to the known type(s) and concentrations of analyte(s), proper operation of the optical inspection machine is indicated. If the simulated type and concentration of specified reagen is not indicated, improper operation is indicated. Measurement error due to non-machine error is indicated when the known type and concentration of the analyte simulated by the rows (1-5) is indicated.

Abstract: A device has first and second units that lights an object at first or second incident angles; a unit that generates image signals according to the intensity of the received light; units that guides diffusely and specularly reflected light from the object to the image-input unit; units that generates glossiness information, and texture information for the object, and image data based on image signals generated; a unit that generates and outputs the image data from glossiness information, texture information, and image data.

Abstract: A method for assessing a performance of a laser system for use in corneal ablation is provided that includes directing a beam of laser shots onto a fluorescent indicator. The indicator is adapted to emit a first wavelength of light different from a second wavelength of light impinging thereon. The directing step is performed in a plane of a cornea of an eye desired to be ablated and also onto a cornea positioned at the corneal plane. Light reflected from the indicator is detected, and a difference between a detected light pattern from the camera and a predetermined ablation pattern desired to be made on the cornea is calculated. The predetermined pattern is then corrected to compensate for the calculated difference.

Abstract: Device and method for inspecting a polychromatic region, such as a polychromatic pattern, on a moving workpiece. The method includes device includes a solid-state light source, preferably a light emitting diode, adapted to emit light in a range of wavelengths for illuminating the polychromatic region. Photodetectors are positioned relative to the workpiece to intercept light from the light source reflected by the polychromatic region. Each of the photodetectors is adapted to detect reflected light within a corresponding one of a plurality of bands defined within the range of wavelengths. The method includes detecting intensities of the light reflected from the polychromatic region within different wavelength bands in the range of wavelengths and evaluating a ratio of the intensities for comparison with a standard ratio to ascertain a variation in the evaluated ratio.

Abstract: Various embodiments include a method for providing instructions to a process tool. The method includes emitting an incident light beam at a substrate, receiving a reflected light beam from the substrate and determining a spectrum of the reflected light beam. The method further includes determining a first property of a first layer of the substrate and a second property of a second layer of the substrate, based on the spectrum determination. The method further includes comparing the first property of the first layer to a first reference property and comparing the second property of the second layer to a second reference property. The method further includes determining the instructions based on the first property comparison and the second property comparison; and providing the instructions to the process tool.

Abstract: In one embodiment a system to detect multi-domain regions in the soft under layer of a perpendicular magnetic media comprises a radiation targeting assembly to target a polarized radiation beam onto a surface of a substrate covered by the soft under layer of a perpendicular magnetic media, a radiation collecting assembly that collects radiation reflected from the surface, a processor coupled to the first radiation collecting assembly, and a memory module coupled to the processor. The memory module comprises logic instructions which, when executed by the processor, configure the processor to record signal values from radiation reflected by the radiation beam at different positions on the surface and analyze the signal values to detect a region of multiple magnetic domains in the soft under layer of a perpendicular magnetic media.

Abstract: A method is disclosed for repairing an opaque defect on a mask substrate. After examining one or more opaque patterns in a predetermined area of the mask substrate, at least one opaque defect in the opaque patterns is identified based on a difference between its light reflection rate and a reference reflection rate. A residue height of the opaque defect is further determined based on its light transmission rate, and a repair formula such as an etching dosage is devised based on the determined residue height.

Abstract: A measuring device measures sensitivity distribution of a photo sensor including a light projector element for projecting detection light externally, and a photoreceptor element for receiving the detection light reflected externally, and photoelectrically detects an article. The measuring device includes a test panel, having a test pattern, formed on a surface thereof and in at least two colors, for being read by the photo sensor photoelectrically for inspection. A moving mechanism moves the test panel relative to the photo sensor and at a regular speed. A controller actuates the moving mechanism, and evaluates an output from the photoreceptor element, in order to determine the sensitivity distribution of the photo sensor according thereto. Sensitivity distribution of the photo sensor is initially expressed two-dimensionally. Also, a plurality of the sensitivity distribution being obtained are used to determine sensitivity distribution of the photo sensor expressed three-dimensionally.

Abstract: The present invention relates to a method of detecting phycocyanin algae or bacteria in water from reflected light, and also includes devices for the measurement, calculation and transmission of data relating to that method.

Abstract: A state of attenuation in total internal reflection is detected by the use of a measuring apparatus having a measuring unit and a reference unit and a measuring system which corrects result of detection by the measuring unit on the basis of result of detection by the reference unit and measures the change of a state of attenuation in total internal reflection on the basis of the corrected result of detection by the measuring unit. The difference in sensitivity between the measuring unit and the reference unit is detected before initiating the measurement of the change of a state of attenuation in total internal reflection, and result of measurement by the measuring system is calibrated on the basis of the difference in sensitivity between the measuring unit and the reference unit.

Abstract: A measuring apparatus comprising a measuring chip, an optical incidence system, a photodiode array, a differentiation part, and a computation part. The differentiation part differentiates an optical detection signal output from each light-receiving element, in a direction where light-receiving elements are juxtaposed, at intervals of outputs of two adjacent light-receiving elements. The computation part specifies a reference light-receiving element, then judges whether or not values of the optical detection signals of a first predetermined number of light-receiving elements increase monotonously in directions going to both sides, and computes a position of a dark line on the basis of a value obtained by differentiating the outputs of a second predetermined number of light-receiving elements sandwiching the reference light-receiving element when it is judged that the values of the optical detection signals increase monotonously, in the above-described direction.

Abstract: A device and method for verifying correct performance of an optical clinical assay system is provided.

Abstract: Coupled fiber-optic, evanescent-wave biosensors are improved through the use of configurations which adjust certain optical characteristics for enhanced sensitivity. In the preferred embodiment, this is carried out by inputting light into the coupler at either a different wavelength or multiple wavelengths simultaneously. In alternative embodiments, different modulation schemes and/or interferometric schemes are utilized. For example, at each of the inputs, different carrier frequencies may be used and modulated at lower frequencies, including prime-number frequencies. As the refractive index is changed in the vicinity of the coupling, a shift in the wavelength will induce a phase shift in the baseline signal such that, during data collection, the sensor is able to detect more refined changes. In general, through appropriate choice of input wavelength, fewer operational points will fall in an inefficient local maximum or minimum, thereby affording much greater sensitivity.

Abstract: An apparatus and method for measuring feature sizes having form birefringence.

Abstract: A method of media type differentiation includes the steps of providing a media sensor including a specular detector that provides a specular signal output having a signal level related to an amount of the reflected specular light received; providing a highly reflective surface positioned to face the media sensor; interposing a print media sheet between the media sensor and the highly reflective surface; using the media sensor to measure a first amount of the reflected specular light and determining a first signal level of the specular signal output of the specular detector; and using the first signal level to differentiate the print media sheet as being one of a transparency media sheet or a high glossy media sheet.

Abstract: The present invention is directed to several inventive methods for characterizing implant profiles. In one embodiment, the method comprises forming a first plurality of implant regions in a substrate, and illuminating the implant regions with a light source in a scatterometry tool, the scatterometry tool generating a trace profile corresponding to an implant profile of the illuminated implant regions. In another embodiment, the method comprises measuring profiles of implant regions by forming a plurality of implant regions in a substrate, illuminating the implant regions, measuring light reflected off the substrate to generate a profile trace for the implant regions, comparing the generated profile trace to a target profile trace from a library, and modifying, based upon a deviation between the generated profile trace and the target profile trace, at least one parameter of an ion implant process used to form implant regions on subsequently processed substrates.

Abstract: A method and apparatus for inspecting the optical quality of a reflective surface providing for the reflecting of a beam of light off the reflective surface, measuring an intensity of the reflected light at a first distance from said reflective surface, measuring an intensity of the reflected light at a second distance from said reflective surface, and comparing the intensity of the light measured at the two distances to determine the distortion of the reflective surface.

Abstract: An anti-glare rearview mirror assembly and a reflectance control method thereof are disclosed. The assembly includes an electrochromic rearview mirrors, two rearward light sensors, and a comparative controller. The sensors receiving a first rearward light from a first specified region and a second rearward light from a second specified region at the same time point, respectively, wherein the first and second specified regions partially overlap with each other. The intensities of the first and second rearview mirror light are compared to obtain a light difference. The reflectance of the anti-glare rearview mirror is adjusted according to the light difference.

Abstract: A system and methodology for monitoring and/or controlling a semiconductor fabrication process is disclosed. Scatterometry and/or ellipsometry based techniques can be employed to facilitate providing measurement signals during a damascene phase of the fabrication process. The thickness of layers etched away during the process can be monitored and one or more fabrication components and/or operating parameters associated with the fabrication component(s) can be adjusted in response to the measurements to achieve desired results, such as to mitigate the formation of copper oxide during etching of a copper layer, for example.

Abstract: In an automatic optical measurement method according to the invention, with a movable reflection plate 6 moved to place under an optical axis, light projected from a light projecting portion 3a is received by a light receiving portion 3b via the movable reflection plate 6, a stationary reflection plate 11 and the movable reflection plate 6, whereas with the movable reflection plate 6 moved away from the optical axis and a reference 8 set on a sample stage 10, light projected from the light projecting portion 3a is received by the light receiving portion 3b via the reference 8 whereby a ratio between the intensities of the received lights is determined.

Abstract: An object sensor is provided, which has a high object detection rate with respect to an object such as a raindrop adhering to a detection surface, and which is capable of detecting the presence/absence of an object with a high sensitivity. A light source 10, a detection surface 110, a focusing lens 40, and a plurality of photodetecting elements of a photodetecting unit 50 form a focusing system of equal magnification that is capable of catching an image in a size smaller than an object to be detected. Light emitted from the light source 10 is incident on the detection surface 110 via a prism 20 at a predetermined incident angle. Without a raindrop 120, the total internal reflection condition is satisfied as shown by a path 140 of a beam, so that the beam is subjected to the total internal reflection. Then, the beam passes through a prism 30, and is focused on a photodetecting surface of the photodetecting unit 50 by the focusing lens 40.

Abstract: An optical system for determining an optical constant by measuring the absolute reflectance and the absolute transmittance of a substance by using an incoming side beam switching mirror for selectively switching the direction of a light from a light source to first or second converged light reflecting units. The first and second converged light reflecting units project the light from the beam switching mirror so as to be converged in an intersecting manner at the position of a sample holder that can be positioned to present a sample fitting hole or a through hole for measuring the reflectance/transmittance by providing the light to an exit side beam switching mirror and detector.

Abstract: An apparatus for characterizing multilayer samples is disclosed. An intensity modulated pump beam is focused onto the sample surface to periodically excite the sample. A probe beam is focused onto the sample surface within the periodically excited area. The power of the reflected probe beam is measured by a photodetector. The output of the photodetector is filtered and processed to derive the modulated optical reflectivity of the sample. Measurements are taken at a plurality of pump beam modulation frequencies. In addition, measurements are taken as the lateral separation between the pump and probe beam spots on the sample surface is varied. The measurements at multiple modulation frequencies and at different lateral beam spot spacings are used to help characterize complex multilayer samples. In the preferred embodiment, a spectrometer is also included to provide additional data for characterizing the sample.

Abstract: An optical instrument for determining properties of the imaging and non-imaging areas of offset printing plates is disclosed. A laser light source (30) directs a laser beam (35) at the surface layer (50) of an offset printing plate (60). A specularly reflected beam (45) is detected by a light detector (40). Additionally. scattered light (55) is detected by a light detector (50). The detectors (40, 50) produce light intensity signals for the reflected and scattered light, respectively. A data processor (70) processes the intensity signals to determine various properties relating to the dampening solution and ink present on the non-imaging and imaging areas of the printing plate, respectively. These properties include the thickness of dampening solution in non-imaging areas, the image density in imaging areas of a moving printing plate, and the occurrence of scumming in non-imaging areas of a printing plate.

Abstract: Print media thickness and transmissivity is determined using transmissive light. The light is beamed onto a reflective and absorptive surface. A profile is generated and stored for each predetermined medium. The data stored is used in the manner of a look-up table for comparison to a profile of an unknown type media. Hard copy apparatus multi-pick recognition is also described.

Abstract: A state of attenuation in total internal reflection is detected by the use of a measuring apparatus having a measuring unit and a reference unit and a measuring system which corrects result of detection by the measuring unit on the basis of result of detection by the reference unit and measures the change of a state of attenuation in total internal reflection on the basis of the corrected result of detection by the measuring unit. The difference in sensitivity between the measuring unit and the reference unit is detected before initiating the measurement of the change of a state of attenuation in total internal reflection, and result of measurement by the measuring system is calibrated on the basis of the difference in sensitivity between the measuring unit and the reference unit.

Abstract: A method of using scatterometric techniques to control stepper process is disclosed. In one illustrative embodiment, the method comprises providing a library of optical characteristic traces, each of which corresponds to a grating structure comprised of a plurality of features having a known profile, and forming a plurality of grating structures in a layer of photoresist, each of said formed grating structures being comprised of a plurality of features having an unknown profile.

Abstract: A method of using high yielding spectra scatterometry measurements to control semiconductor manufacturing processes and systems for accomplishing same is disclosed. In one embodiment, the method comprises providing a library comprised of at least one target optical characteristic trace of a grating structure comprised of a plurality of gate stacks, the target trace corresponding to a semiconductor device having at least one desired electrical performance characteristic, providing a substrate having at least one grating structure formed thereabove, the formed grating structure comprised of a plurality of gate stacks, illuminating at least one grating structure formed above said substrate, measuring light reflected off of the grating structure formed above the substrate to generate an optical characteristic trace for the formed grating structure, and comparing the generated optical characteristic trace to the target trace.

Abstract: An in-line system and method for determining T-top gate dimensions is provided. The system comprises a wafer structure undergoing a T-top gate formation process; a scatterometry system coupled to the formation process for directing light at and collecting reflected light from the wafer structure; a signature store; a T-top gate formation analysis system coupled to the scatterometry system and to the signature store for determining the T-top gate dimensions; and a feedback control system coupled to the T-top gate formation analysis system for optimizing T-top gate formation. The method comprises providing a wafer structure having a T-top gate formed thereon; generating a signature associated with the T-top gate; comparing the generated signature with a signature store to determine the dimensions of the T-top gate; if the dimensions of the T-top gate are not within a pre-determined acceptable range, then adjusting T-top gate process parameters using feedback control.

Abstract: An optical system for simultaneously compensating a source drift of a light source and a detector drift of a light detector includes a test location, a first beam path from the light source to the test location, a second beam path from the test location to the light detector. First and second beam paths are arranged to intersect at a beam crossing. A calibration sample having a known reflectivity is positioned at the test location and illuminated by a probe beam generated by the light source. A known response beam of the calibration sample is used for calibrating the light source and the detector. A reference sample is placed at the beam crossing and illuminated by the probe beam. In response, the reference sample sends a reference beam along the second path length, which is used for compensating the source and detector drift.

Abstract: A hidrogen detection system (14) includes a hydrogen sensor(16) that detects contamination within a reaction member and generates a hydrogen contamination signal. A surface spectroscopic system (18) is operational in conjuction with the hydrogen sensor (16) and determines contamination of the hydrogen sensor (16) and generates a sensor contamination signal. A controller (20) is electrically coupled to the hydrogen sensor (16) and the surface spectroscopic system (18) and compares the hydrogen contamination signal to the sensor contamination signal and generates a corrected hydrogen contamination signal.

Abstract: A sensor system of a surface plasmon resonance (SPR) for analyzing a characteristic of a substance and the measuring method thereof are provided. The system includes an optical device for generating a first light beam and a second light beam in sequence; a sensor device for respectively generating a first plasmon wave and a second plasmon wave in response to an optical characteristic change of the first light beam and the second light beam with respective to the substance, in which a resonance is generated from the first plasmon wave and the second plasmon wave respectively generating a first reflective signal and a second reflective signal; and a measuring device for measuring spectra of the first reflective signal and the second reflective signal and obtaining the measured value which is substituted into an operational formula to calculate a reference value used for analyzing the characteristic of the substance.

Abstract: To provide a thin film forming method and apparatus that can automatically form thin films having constant optical properties with high reproducibility Antireflection films are deposited on lenses 2a that are held by a coating dome 2 by vaporizing an evaporation material 4 by using an electron gun 3 The power to be applied to the electron gun 3 is controlled so that a transmission or reflection light quantity value that is measured at each time point by an optical film thickness meter 10 becomes equal or approximately equal to a standard light quantity value stored in a standard light quantity value data storing means