For Refractive Indexing Patents (Class 356/517)
  • Patent number: 6417927
    Abstract: Methods and apparatus that combine dispersion interferometry with refractometry to compensate for refractive index fluctuations in the measurement path of a dispersion interferometer over both short and long time periods. Dispersion and refractometry data are weighted over appropriate time intervals, and means and methods are also provided for initializing &Ggr;, the inverse dispersive power, so that the dispersion and refractometry data are self consistent. A refractometer is placed in close proximity to the measurement path of the dispersion interferometer to experience substantially the same air flow and act as a surrogate for obtaining information about the index of refraction.
    Type: Grant
    Filed: April 28, 1999
    Date of Patent: July 9, 2002
    Assignee: Zygo Corporation
    Inventor: Peter J. de Groot
  • Patent number: 6407816
    Abstract: Apparatus and methods particularly suitable for use in electro-optical metrology and other applications to measure and monitor the refractive index of a gas in a measurement path and/or the change in optical path length of the measurement path due to the gas while the refractive index of the gas may be fluctuating due to turbulence or the like and/or the physical length of the measuring path may be changing. More specifically, the invention employs electronic frequency processing to provide measurements of dispersion of the refractive index, the dispersion being substantially proportional to the density of the gas, and/or measurements of dispersion of the optical path length, the dispersion of the optical path length being related to the dispersion of the refractive index and the physical length of the measurement path.
    Type: Grant
    Filed: December 13, 2000
    Date of Patent: June 18, 2002
    Assignee: Zygo Corporation
    Inventors: Peter De Groot, Henry A. Hill, Frank C. Demarest
  • Patent number: 6404505
    Abstract: A positioning stage system includes a first stage movable at least in one of a rotational direction and a tilt direction, a second stage movable at least in X and Y directions, a measurement mirror system fixed to the second stage, a reference mirror system disposed on the first stage, and a measuring system for measuring displacement of the measurement mirror system in the X or Y direction, while using the reference mirror system as a positional reference, wherein the reference mirror system is arranged so that laser light incident on the reference mirror system is reflected in the same direction as the incidence direction, substantially constantly.
    Type: Grant
    Filed: April 7, 1999
    Date of Patent: June 11, 2002
    Assignee: Canon Kabushiki Kaisha
    Inventor: Shin Matsui
  • Patent number: 6381025
    Abstract: An optical detection scheme for on-chip, high sensitivity refractive index detection is based on micro-interferometry, and allows for picoliter detection volumes and universal analyte sensitivity. The invention employs three main elements: a source of coherent light, such as a VCSEL, laser diode or He—Ne laser; an etched channel of capillary dimensions in a substrate for reception of a sample to be analyzed; and a photodetector for detecting laser light reflected off of the channel. The laser source generates an unfocused laser beam that is incident on the etched channel. A unique multi-pass optical configuration is inherently created by the channel characteristics, and is based on the interaction of the unfocused laser beam and the curved surface of the channel, that allows RI measurements in small volumes at high sensitivity. The entire device, including the laser and the photodetector can be formed on a single microchip.
    Type: Grant
    Filed: March 6, 2000
    Date of Patent: April 30, 2002
    Assignee: Texas Tech University
    Inventors: Darryl J. Bornhop, Kelly Swinney, Dmitry Markov
  • Patent number: 6341015
    Abstract: An apparatus and method for compensating for measurement uncertainty due to atmospheric effects. In one embodiment the apparatus includes two sources separated by a predetermined distance and two target locations separated by a predetermined distance. The radiation at the target locations is combined to form an interference pattern onto a detector which generates a signal corresponding to the measurement having a substantially reduced error due to atmospheric effects such as temperature variations. In another embodiment the radiation from the sources crosses somewhere in the measurement environment as it propagates toward the target locations. In yet another embodiment the separation between the two sources is substantially the same as the separation between the two target locations.
    Type: Grant
    Filed: March 7, 2001
    Date of Patent: January 22, 2002
    Assignee: Massachusetts Institute of Technology
    Inventor: Lyle Shirley
  • Publication number: 20020001086
    Abstract: Methods and apparatus that combine dispersion interferometry with refractometry to compensate for refractive index fluctuations in the measurement path of a dispersion interferometer over both short and long time periods. Dispersion and refractometry data are weighted over appropriate time intervals, and means and methods are also provided for initializing &Ggr;, the inverse dispersive power, so that the dispersion and refractometry data are self consistent. A refractometer is placed in close proximity to the measurement path of the dispersion interferometer to experience substantially the same air flow and act as a surrogate for obtaining information about the index of refraction.
    Type: Application
    Filed: April 28, 1999
    Publication date: January 3, 2002
    Inventor: PETER J. DE GROOT
  • Patent number: 6330065
    Abstract: Displacement measuring interferometers (DMI) are disclosed for use in conjunction with apparatus for measuring and monitoring the intrinsic optical properties of the gas in the measurement leg of a DMI to compensate for variations in the refractive index of the gas that would otherwise render subsequent displacement calculations less accurate. The DMIs may be used for either linear or angular displacements. Cyclic error compensation, wavelength monitoring and correction, and phase redundancy features are included to further enhance the accuracy with which displacement determinations may be made and are particularly suitable for use in photolithographic applications.
    Type: Grant
    Filed: April 28, 1999
    Date of Patent: December 11, 2001
    Assignee: Zygo Corporation
    Inventor: Henry Allen Hill
  • Patent number: 6327039
    Abstract: Apparatus and methods particularly suitable for use in electro-optical metrology and other applications to measure and monitor the refractive index of a gas in a measurement path and/or the change in optical path length of the measurement path due to the gas while the refractive index of the gas may be fluctuating due to turbulence or the like and/or the physical length of the measuring path may be changing. More specifically, the invention employs electronic frequency processing to provide measurements of dispersion of the refractive index, the dispersion being substantially proportional to the density of the gas, and/or measurements of dispersion of the optical path length, the dispersion of the optical path length being related to the dispersion of the refractive index and the physical length of the measurement path.
    Type: Grant
    Filed: February 18, 1999
    Date of Patent: December 4, 2001
    Assignee: Zygo Corporation
    Inventors: Peter de Groot, Henry A. Hill, Frank C. Demarest
  • Publication number: 20010043334
    Abstract: An optical measuring light path formed by a vacuum-side laser beam (Pa) as a reference standard and an optical measuring light path formed by a gas-side laser beam (Pb) as a dimension to be measured are coaxially located sandwiching a movable end (optical transparent body 12) of a vacuum container (11) in order to satisfy Abbe's principle requiring linear disposition of the reference standard and the dimension to be measured in measurement direction, thereby reducing measurement error in measuring air refractive index and improving measurement accuracy therefor.
    Type: Application
    Filed: March 27, 2001
    Publication date: November 22, 2001
    Applicant: KAZUMASA KUSAKA, DIRECTOR GENERAL OF NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND
    Inventors: Jun Ishikawa, Morimasa Ueda, Hiroki Masuda, Yutaka Kuriyama
  • Publication number: 20010009462
    Abstract: An apparatus and method for compensating for measurement uncertainty due to atmospheric effects. In one embodiment the apparatus includes two sources separated by a predetermined distance and two target locations separated by a predetermined distance. The radiation at the target locations is combined to form an interference pattern onto a detector which generates a signal corresponding to the measurement having a substantially reduced error due to atmospheric effects such as temperature variations. In another embodiment the radiation from the sources crosses somewhere in the measurement environment as it propagates toward the target locations. In yet another embodiment the separation between the two sources is substantially the same as the separation between the two target locations.
    Type: Application
    Filed: March 7, 2001
    Publication date: July 26, 2001
    Inventor: Lyle Shirley
  • Patent number: 6239877
    Abstract: The invention is an interferential refractometry method and device using fine measurement of the displacement of the fringes of an interference pattern between two light beams with one of the beams undergoing phase variations due to variations in the refractive index thereof. The method comprises application, to one of the two beams, of a relatively fast periodic phase modulation by a modulating signal. Displacement of the fringes resulting from the combined application of the two modulations is picked up by a photodetector and a measuring system evaluates the slow modulation by determining the frequency spectrum of the signal coming from the detect or and measuring the phase shift affecting the fundamental frequency of this frequency spectrum. The method may be applied to detection of variations in the composition of mixtures, for example in analytical or preparative chromatography.
    Type: Grant
    Filed: January 26, 1999
    Date of Patent: May 29, 2001
    Assignee: Institut Francais du Petrole
    Inventor: Claude Beauducel
  • Patent number: 6229619
    Abstract: An apparatus and method for compensating for measurement uncertainty due to atmospheric effects. In one embodiment the apparatus includes two sources separated by a predetermined distance and two target locations separated by a predetermined distance. The radiation at the target locations is combined to form an interference pattern onto a detector which generates a signal corresponding to the measurement having a substantially reduced error due to atmospheric effects such as temperature variations. In another embodiment the radiation from the sources crosses somewhere in the measurement environment as it propagates toward the target locations. In yet another embodiment the separation between the two sources is substantially the same as the separation between the two target locations.
    Type: Grant
    Filed: June 3, 1999
    Date of Patent: May 8, 2001
    Assignee: Massachusetts Institute of Technology
    Inventor: Lyle Shirley
  • Patent number: 6184992
    Abstract: An apparatus that can measure a space between a first surface and a second surface. The apparatus may include a light source that can reflect a light beam from the first and second surfaces. A birefringent element may split the reflected light beam into an ordinary beam and an extraordinary beam. The ordinary and extraordinary beams are detected by a photodetector. The apparatus may include a controller that is coupled to the photodetector and which can compute the space from a phase value that is determined from data collected when the mechanism varies the phase between the ordinary and extraordinary beams, and a ratio between a first modulation amplitude detected from light reflected from the first and second surfaces and a second modulation amplitude detected from light reflected from the first surface when the second surface is not adjacent to the first surface. The ratio can also be used to compute the reflectance and index of refraction of the second surface.
    Type: Grant
    Filed: February 9, 1999
    Date of Patent: February 6, 2001
    Assignee: Phase Metrics, Inc.
    Inventors: Carlos A. DurĂ¡n, Rui-Fang Shi
  • Patent number: 6178000
    Abstract: An interferometer device includes a first prism portion and a second prism portion. The first prism portion has a semi-transparent surface, a beam incident surface and a beam emerging surface. The beam incident surface receives an incident light beam at a wavelength of &lgr; and at an angle of incidence &thgr; with respect to a normal to the beam incident surface. The second prism portion has a surface that corresponds to the semi-transparent surface of the first prism portion and a beam emerging surface that corresponds to the beam emerging surface of the first prism portion. The first and second prism portions are attached to each other at the semi-transparent surface of the first prism portion and the surface of the second prism portion corresponding to the semi-transparent surface.
    Type: Grant
    Filed: July 8, 1998
    Date of Patent: January 23, 2001
    Assignee: International Business Machines Corporation
    Inventor: John A. Hoffnagle
  • Patent number: 6169603
    Abstract: Even though a laser interferometer is affected by the changes in the environment, a reticle can be inspected with a high accuracy by synthesizing a reference image corrected appropriately to compare with an optical image. The reticle which a pattern is plotted in advance is irradiated with a light beam to obtain the optical image from the transmitted light to compare the optical image with the reference image synthesized by converting draft data used at plotting said pattern and to detect defects of the pattern. The reference image is corrected based on the deviation data obtained at the preceding pattern defect detection.
    Type: Grant
    Filed: November 25, 1998
    Date of Patent: January 2, 2001
    Assignee: NEC Corporation
    Inventor: Naohisa Takayama
  • Patent number: 6157458
    Abstract: An improved interferometric system with reduced air turbulence error. The system includes an optical retarder that functions as a quarter wave plate for two harmonically related frequencies. The retarder may be formed by a pair of quartz disks cut so that the C axis lie in the plane of the disk and are oriented orthogonally relative to each other.
    Type: Grant
    Filed: April 30, 1998
    Date of Patent: December 5, 2000
    Assignee: Agilent Technologies
    Inventor: Paul Zorabedian