Abstract: A projector includes a beam homogenizer receiving light from a light source and creating a predetermined illumination, and a spatial light modulator including grating stages to receive the predetermined illumination. Each grating stage may include a plurality of pixels where corresponding pixels in the grating stages are aligned with one another. Each of the pixels may include a liquid crystal layer disposed between two substrates, where a pixel is switchable by applying a voltage thereto, with a grating period of the pixel selected such that, when the voltage is applied to the pixel and light is passed therethrough, optical energy from the light in plus and minus first orders is deflected toward sides of the pixel and optical energy from a zero order of the light is allowed to pass through the pixel, with a polarization state of the light maintained through the pixel.

Abstract: A metrology system includes a first beam analysis system for analyzing at least one first measurement beam that was coupled from the excitation laser beam before a reflection on the target material and a second beam analysis system for analyzing at least one second measurement beam that was coupled from the excitation laser beam after a reflection on the target material. Each of the first beam analysis system and the second beam analysis system has at least one wavefront sensor system.

Abstract: A method of characterising particles in a sample, comprising: obtaining a scattering measurement comprising a time series of measurements of scattered light from a detector, the scattered light produced by the interaction of an illuminating light beam with the sample; producing a corrected scattering measurement, comprising compensating for scattering contributions from contaminants by reducing a scattering intensity in at least some time periods of the scattering measurement; determining a particle characteristic from the corrected scattering measurement.

Abstract: A measurement apparatus (10) for interferometrically determining a surface shape of a test object (14). A radiation source provides an input wave (42), a multiply-encoded diffractive optical element (60), which is configured to produce by diffraction from the input wave a test wave (66) that is directed at the test object and has a wavefront in the form of a free-form surface and at least one calibration wave (70), and a capture device (46). The calibration wave has a wavefront with a non-rotationally symmetric shape (68f), wherein cross sections through the wavefront of the calibration wave along cross-sectional surfaces each aligned transversely to one another have a curved shape. The curved shapes in the different cross-sectional surfaces differ in terms of an opening parameter. The capture device (46) captures a calibration interferogram formed by superimposing a reference wave (40) with the calibration wave after interaction with a calibration object (74).

Abstract: A wavefront sensor includes a mask and a sensor utilized to capture a diffraction pattern generated by light incident to the mask. A reference image is captured in response to a plane wavefront incident on the mask, and another measurement image is captured in response to a distorted wavefront incident on the mask. The distorted wavefront is reconstructed based on differences between the reference image and the measurement image.

Abstract: A single ion imaging-based detection method and device are provided. After being reflected by an electromodulation singularity coupling differential imaging reaction unit, a probe beam from a total internal reflection ellipsometry imager converges on a CCD or CMOS detector, the acquired sensing surface image data is transmitted to a signal processing unit, the common mode noise is eliminated by performing spectral analysis on differential signals of a working sensing surface and a reference sensing surface, the peak intensity of a modulating signal is selected on the spectrum for wave filtering to obtain a real-time signal of interaction of single ions or charged molecules at a solid-liquid interface. Based on the singularity effect at a surface plasma resonance angle of an ellipsometry phase and a corresponding optical signal noise suppression scheme, the present application can achieve real-time observation of the adsorption of single ions or charged molecules at a solid surface.

Abstract: A method of operating an optically pumped magnetometer (OPM) includes directing a light beam through a vapor cell of the OPM including a vapor of atoms; applying RF excitation to cause spins of the atoms to precess; measuring a frequency of the precession; for each of a plurality of different axes relative to the vapor cell, directing a light beam through the vapor cell, applying a magnetic field through the vapor cell along the axis, applying RF excitation to cause spins of the atoms to precess, and measuring a frequency of the precession in the applied magnetic field; determining magnitude and components of an ambient background magnetic field along the axes using the measured frequencies; and applying a magnetic field based on the components around the vapor cell to counteract the ambient background magnetic field to facilitate operation of the OPM in a spin exchange relaxation free (SERF) mode.

Abstract: A single-shot Fresnel non-coherent correlation digital holographic device based on a polarization-oriented planar lens, comprising: A polarization-oriented planar lens (1) for wavefront modulation and beam splitting, a focusing element (2), a half-wave plate (3) with a small hole and a polarization imaging camera (4). Incident light passes through the polarization-oriented planar lens (1) and the focusing element (2) and is divided into two beams with different polarizations, that is, focused and parallel or focused and divergent beams, wherein the focused beam passes through the small hole of the half-wave plate (3), the parallel or divergent beam passes through the half-wave plate (3), so as to make the polarization of the two beams consistent behind pass through the half-wave plate (3).

Abstract: Illustrative embodiments of determining characteristics of reflective surfaces and transparent materials are disclosed. In at least one illustrative embodiment, a method of determining characteristics of transparent materials includes using a camera to capture light from a target structure with light regions and dark regions. Before the light is captured by the camera, it passes through a transparent specimen, reflects off of a reflective surface, and passes through the transparent specimen a second time. Deformations in the transparent specimen caused by, e.g., static or dynamic stresses deflect the light passing through it. The amount of the deflection can be used to determine the stresses in the specimen.

Abstract: An underwater communications system may include a first device and a second device being movable relative to one another. The first device may include a first laser transmitter configured to generate a first laser beam having a selectable spatiotemporal beam shape from among a plurality thereof, and a first controller coupled to the first laser transmitter and configured to select a spatiotemporal beam shape for the first laser beam from among the spatiotemporal beam shapes. The second device may include a second laser receiver configured to receive the first laser beam, and a second controller coupled to the second laser receiver.

Abstract: Herein disclosed is an optoelectronic measuring device. The optoelectronic measuring device comprises an objective lens, an imaging lens, a camera, and an optical path adjusting module which are disposed at the first light path. The objective lens receives a first testing light, and transforms the first testing light into a second testing light. The imaging lens receives the second testing light, and transforms the second testing light into a third testing light. The camera measures a beam characteristic of the third testing light. The optical path adjusting module, disposed between the imaging lens and the camera, comprises a mirror, the mirror moves relatively to the imaging lens according to a test command, and adjusts the distance between the imaging lens and the camera at the first light path to be a first optical distance or a second optical distance. Wherein the mirror reflects the third testing light vertically.

Abstract: An aberration estimating method includes acquiring a light intensity distribution of an optical image of an object formed via a target optical system, acquiring an approximated aberration of the target optical system based on the light intensity distribution, determining an initial value of the aberration of the target optical system based on the approximated aberration, and estimating an aberration of the target optical system using the initial value.

Abstract: A weapons system with at least two HEL effectors, which have at least one beam guidance system, the use of only one laser source or one pump source for the at least two HEL effectors is provided. The beam guidance systems of the HEL effectors resort to the common laser source or common pump source. An optical link of the common laser source or of the common pump source with the beam guidance system, be it direct or indirect, is implemented by means of at least one optical switching unit, and so at least one functional, complete HEL effector of the weapons system is provided to defend against threats.

Abstract: A matter-wave gyro with counter-propagating traps uses three-dimensional lattices formed of interference fringes from three pairs of interfering laser beams. Particles, such as neutral atoms, ion, or molecules are cooled to a ground state near absolute zero. The resulting ultra-cold particles are loaded into the lattices. The laser beams used to form the lattices are driven according to functions that cause the lattices to counter-propagate about a closed path (Sagnac loop) N times, where a desired tradeoff between spatial resolution and temporal resolution can be achieved by choosing an appropriate integer value of N. The lattices can be extinguished so that the particles can be imaged to identify an interference pattern. A shift in the interference pattern relative to an interference pattern that would occur with zero angular momentum can be used to measure angular momentum.

Abstract: A confocal microscope is provided that includes one or more lasers focused by an optical system into a line on the surface of a sample mounted to a stage. The microscope further includes, at least one linear array detector that is optically conjugated to the focused line. The stage permits movement of the sample with respect to all other components of the microscope, which remain stationary.

Abstract: Mask inspection apparatuses and/or mask inspection methods are provided that enable quick and accurate inspection of a registration of a pattern on a mask while a defect of the mask and the registration of the pattern are inspected simultaneously. The mask inspection apparatus may include a stage configured to receive a mask for inspection; an e-beam array including a plurality of e-beam irradiators configured to irradiate e-beams to the mask and detectors configured to detect electrons emitted from the mask; and a processor configured to process signals from the detectors. A defect of the mask may be detected through processing of the signal and registrations of patterns on the mask may be inspected based on positional information regarding the e-beam irradiators.

Abstract: A variety of femtoprojector optical systems are described. The optical bodies for the systems may be made in batches by wafer-level optics. Each individual system may be made small enough to fit in a contact lens. In some designs, the optical systems include a solid transparent body with a curved primary mirror, a secondary mirror, an entrance window, an exit window, and at least one groove. The grooves function as a light trap that reduces the amount of stray light exiting the body of the optical system. The grooves may also create a snap point which allows removal of individual bodies from the wafer through controlled breakage. The designs may also include various light blocking, light-redirecting, absorbing coatings, or other types structures to reduce stray light.

Abstract: Techniques are described for aligning optical components within a LIDAR assembly. The techniques may be performed to align the optical components during manufacturing or assembly of the LIDAR assembly. For example, a first optical element (e.g., one of a light source or light sensor) may be installed in the LIDAR assembly. An optimal alignment for a second optical element (e.g., the other of the light source or light sensor) may be determined and the second optical element may be installed at the optimal alignment. The optimal alignment for the second optical element may be determined based on detected signals, for example, which may correspond to an alignment resulting in a strongest return signal, highest quality return signal, and/or minimal interference. Additionally or alternatively, techniques may be used to align optical components at runtime by using an actuator to move one or more components of the LIDAR assembly during operation.

Abstract: A method is used to generate a report presenting parameter values corresponding to a structured illumination microscopy (SIM) optical system. The parameter values are based at least in part on the performed modulation calculation corresponding to an image set captured with the SIM optical system. A minimum FWHM slice is identified, based at least in part on an average FWHM value across the images in the first image set. Parameter estimation is performed on the identified minimum FWHM slice. Best in-focus parameters are identified based at least in part on the performed estimation. A phase estimate is performed for each image in the set. A modulation calculation is performed based at least in part on the identified best in-focus parameters. The report is based at least in part on the performed modulation calculation.

Abstract: Exemplary apparatus and method are provided for illuminating a sample. With such exemplary apparatus and/or method, it is possible to, using at least one source arrangement, provide at least one first electro-magnetic radiation. Using an optical system of an optics arrangement, it is possible to receive the first electro-magnetic radiation(s), and modifying the at least one first electro-magnetic radiation to be at least one second electro-magnetic radiation so as to be forwarded to the sample. Further, with the optical system, it is possible to extend the at least one second electro-magnetic radiation into or across the sample for a distance of at least 2 times the Raleigh range of a Gaussian beam when the optics arrangement and the sample are stationary with respect to one another. Additionally, using the optical system, it is possible to control a placement of a focus of the at least one second electro-magnetic radiation on or in the sample.

Abstract: A method and apparatus for non-contact measurement of stress in a thin-film deposited on a substrate is disclosed. The method may include positioning a substrate on a plurality of support-elements, the substrate having a thin-film deposited thereupon. A first-polynomial may be defined for representing a surface of the substrate that is in contact with the support elements. A second-polynomial may be determined based on an optimization determination of potential-energy acting upon the substrate. A finite-order polynomial may be created by calculating a product of the first and second polynomials to represent a shape of the surface of the substrate as a model of the surface. Thereafter, stress in the substrate may be determined based on fitting the model of the surface with a measured topographical data of the surface.

Abstract: An optical system includes a collimated light source, a beam splitter, two mirrors and two lenses, a focus lens, and a detector. An initial light beam is generated by the light source and then separated by the beam splitter into a first light beam and a second light beam. The two mirrors respectively direct the first and second light beams on a sample with symmetrical paths and the two lenses focus the first and second light beam on the sample respectively. The first and second light beams are reflected from the sample and along the counterpart paths to the beam splitter. An interfered light beam is then generated by combining the reflected first and second light beams, and focused by a focus lens on a detector. A Dove prism can be configured between one mirror and one lens of the two for contrast enhancement. It can produce the photon combination with same of direction in this setup to enhance contrast.

Abstract: An optical system has an illumination optical assembly, a detection optical assembly, a wavefront shaping device, and a controller. The illumination optical assembly focuses interrogating optical radiation to a focal point on or in a sample. The interrogating optical radiation propagates to the focal point along a first optical axis. The detection optical assembly direct optical radiation emanating from the focal point to a detector. The emanating optical radiation propagates from the focal point along a second optical axis. The wavefront shaping device is disposed in an optical path of the interrogating optical radiation or in an optical path of the emanating optical radiation. The controller sets a configuration of the wavefront shaping device to correct for aberration. The first optical axis is at a non-zero angle with respect to the second optical axis.

Abstract: Method for detecting wavefront aberration for optical imaging system based on grating shearing interferometer, the grating shearing interferometer system comprising a light source and illumination system, an optical imaging system to be tested, a one-dimensional diffraction grating plate, a two-dimensional diffraction grating plate, a two-dimensional photoelectric sensor, and a computing unit. The one-dimensional and two-dimensional diffraction grating plates are respectively placed on the object plane and the image plane of the optical imaging system to be tested.

Abstract: An apparatus for detecting the presence of liquid in a high pressure gas pipeline (4) is described. The apparatus comprises a sight glass (2), providing a window into the inside of the pipeline, and a light sensor (1), for receiving and sensing reflected light from the inside of the pipeline through the sight glass. The apparatus also comprises a processor, for automatically detecting the presence of a liquid based on the sensed reflected light. In this way, automatic detection of the presence of liquid in a gas pipeline can be achieved based on the measurement of reflected light, which can be expected to differ when liquid is present compared with when no liquid is present. No visual inspection by an operator is required—although the data can be stored for later operator use or verification if necessary.

Abstract: The present invention relates to a device for aligning an X-ray grating to an X-ray radiation source, the device (10) comprising at least two flat X-ray grating segments (11-19); at least one alignment unit (31-39) for aligning one of the at least two flat X-ray grating segments; wherein the at least two flat X-ray grating segments (11-19) are arranged in juxtaposition and are forming an X-ray grating (20); wherein the at least two flat X-ray grating segments (11-19) each comprise a grating surface (41-49) for X-ray radiation, each grating surface (41-49) comprising a geometrical center; wherein normals (21-29) to each of the grating surfaces (41-49) define a common plane (73), wherein the normals (21-29) intersect the geometrical center of the grating surface (41-49); wherein at least a first of the at least two flat X-ray grating segments (11-19) is rotatable around an axis (131-139) that is perpendicular to the common plane (73); and wherein the first of the at least two flat X-ray grating segments (11-19)

Abstract: The disclosure pertains to an apparatus comprising a circuitry. The circuitry is configured to obtain a calibration image of a target, to derive a sparse image based on the calibration image, wherein the sparse image includes image points, to derive ray support points based on the image points by performing an image to target mapping of the image points based on a polynomial function, wherein the ray support points being indicative of light rays reflected by the target and incidenting on an image sensor, and to generate a camera model based on the derived ray support points.

Abstract: Various optical systems equipped with diode laser light sources are discussed in the present application. One example system includes a diode laser light source for providing a beam of radiation. The diode laser has a spectral output bandwidth when driven under equilibrium conditions. The system further includes a driver circuit to apply a pulse of drive current to the diode laser. The pulse causes a variation in the output wavelength of the diode laser during the pulse such that the spectral output bandwidth is at least two times larger the spectral output bandwidth under the equilibrium conditions.

Abstract: A confocal microscope is provided that includes one or more lasers focused by an optical system into a line on the surface of a sample mounted to a stage. The microscope further includes at least one linear array detector that is optically conjugated to the focused line. The stage permits movement of the sample with respect to all other components of the microscope, which remain stationary.

Abstract: A test appliance and a method for testing a mirror, e.g., a mirror of a microlithographic projection exposure apparatus. The test appliance has a computer-generated hologram (CGH), and a test can be carried out on at least a portion of the mirror by way of an interferometric superposition of a test wave that is directed onto the mirror by this computer-generated hologram and a reference wave. Here, the computer-generated hologram (CGH) (120, 320) is designed in such a way that, during operation of the appliance, it provides a first test wave for testing a first portion of the mirror (101, 301) by interferometric superposition with a reference wave in a first position of the mirror (101, 301) and at least a second test wave for testing a second portion of the mirror (101, 301) by interferometric superposition with a reference wave in a second position of the mirror (101, 301).

Abstract: Two-dimensional image acquiring apparatuses, systems, methods and storage mediums are provided herein. An apparatus includes a Spectrally Encoded Endoscopy (“SEE”) probe including a diffractive element, the diffractive element operating to separate and diffract a transmitted light into separated light beams such that the diffracted light beams are superposed or substantially superposed on a target region; an image sensor that operates to acquire one or more intensities from a detected light; and an imaging optical system that operates to image light beams separated from the detected light, wherein the diffractive element, the imaging optical system, and the sensor are disposed for each of the light beams separated from the detected light to acquire spectral data of each of the light beams separated from the detected light. The diffractive element operates to rotate such that an image of the image sensor is changed, and a two-dimensional image is acquired.

Abstract: An optical encoding device includes a light source module, an encoding disc, and a photodetector. The light source module emits a source beam. The encoding disc is disposed on a passing path of the source beam. The encoding disc has first diffracting patterns. The first diffracting patterns include a plurality of sets of first diffracting patterns arranged along a radial direction of the encoding disc. Each set of the first diffracting patterns includes a plurality kinds of first diffracting patterns having different pattern extending directions and different pattern periods. When the encoding disc is rotating, the first diffracting patterns in each set of first diffracting patterns enter the passing path of the source beam in sequence, to cause a diffraction and form diffracted beams having different angles. The photodetector receives the diffracted beams having the different angles.

Abstract: Disclosed is an optical sensor, including an external cavity laser configured to output sensing light and reference light; and a photodetector configured to detect a beating signal by an interference of the sensing light and the reference light output from the external cavity laser, in which the external cavity laser includes a reflecting filter including a sensing grating, to which a sensing object is attachable, and a reference grating, which is disposed on the same plane as that of the sensing grating, and outputs sensing light reflected from the sensing grating and reference light reflected from the reference grating. Accordingly, the optical sensor does not require a high-resolution spectroscope and has improved resolution and sensitivity.

Abstract: An adaptive optics apparatus includes an aberration measuring unit that measures an aberration caused by a subject's eye, the aberration being measured on the basis of returning light that returns from the subject's eye; an aberration correcting unit that performs aberration correction in accordance with the aberration measured by the aberration measuring unit; an irradiation unit that irradiates the subject's eye with light corrected by the aberration correcting unit; and an adjusting unit that maintains a correction characteristic of the aberration correcting unit when the subject's eye moves out of a predetermined area.

Abstract: The present disclosure relates to a method for detecting focal plane based on a grating Talbot effect, the function of which is to detect position of a silicon wafer in a photolithography machine in real time so as to implement an adjustment of leveling and foal plane of the silicon wafer in a high resolution. The detection system utilizes a phase change of “self-image” generated by a grating Talbot effect caused by defocusing of the silicon wafer, so as to accomplish the detecting for focal plane of the silicon wafer in the photolithography machine in a high resolution: if the silicon wafer is at a focal plane, the imaged wavefront by the grating is a planar wavefront; and when the silicon wafer is defocused, the imaged wavefront is a spherical wavefront. Such a detection system has a simple structure, a higher anti-interference capability and a perfect adaption of the process.

Abstract: A diffraction interferometer includes a reference light passage, a test light passage and a pinhole substrate. The pinhole substrate includes a test pinhole and a reference pinhole. The diffracted wavefront emitted from the test pinhole is reflected by the optical component to be tested adjacent to the pinhole substrate and a converge adjacent to the reference pinhole. The diffracted wavefront includes surface shape information of an optical component to be tested that is reflected by the pinhole substrate. Interference with the diffracted wavefront is emitted by the reference pinhole and forms interference fringes. The large numerical aperture phase-shifting dual pinhole diffraction interferometer adopts a dual pinhole substrate and a illumination manner with two converged light paths to enable the separation of the reference light and test light, to prevent disturbance between the two light paths, which would induce the change of interferogram status during phase-shifting.

Abstract: According to one aspect, the invention relates to a device (100, 200, 300, 400, 500) for measuring the distance, with respect to a reference plane (PREF), from a point of light (Pi) of an object (O). The device comprises a two-dimensional detector (30) comprising a detection plane (PDET) and an imaging system (10) adapted to form an image of a light spot (Pi) situated on an object of interest plane (11) in an image plane (11?) arranged in the vicinity of the detection plane (PDET) or a conjugate plane (P?DET) of the detection plane.

Abstract: A method for performing optical wavefront sensing includes providing an amplitude transmission mask having a light input side, a light output side, and an optical transmission axis passing from the light input side to the light output side. The amplitude transmission mask is characterized by a checkerboard pattern having a square unit cell of size ?. The method also includes directing an incident light field having a wavelength ? to be incident on the light input side and propagating the incident light field through the amplitude transmission mask. The method further includes producing a plurality of diffracted light fields on the light output side and detecting, at a detector disposed a distance L from the amplitude transmission mask, an interferogram associated with the plurality of diffracted light fields.

Abstract: Systems and methods for structured illumination super-resolution phase microscopy are disclosed. According to an aspect, an imaging system includes a light source configured to generate light. The system also includes a diffraction grating positioned to receive and diffract the output light. The system also includes a sample holder positioned to receive the diffracted light for transmission through a sample. Further, the system includes an image detector positioned to receive the light transmitted through the sample and configured to generate image data based on the received light. The system also includes a computing device configured to apply subdiffraction resolution reconstruction to the image data for generating an image of the sample.

Abstract: Apparatus, sensor chips and techniques for optical sensing of substances by using optical sensors on sensor chips.

Abstract: Various imaging apparatuses, methods and their implementation are characterized herein. As may be implemented with one or more embodiments, a phase mask and optics operate to provide characterization of object depth and related rotational mobility of a feature corresponding to the object. In various implementations, the optics include a microscope having an objective and a detection pathway that operate with the phase mask for passing the light from the objective. Circuitry, such as light detector, processor or combination thereof operates with the phase mask and microscope to characterize the depth and rotational mobility, based on detected light passed via the microscope and the phase mask.

Abstract: A method of processing a depth image includes receiving a high-resolution color image and a low-resolution depth image corresponding to the high-resolution color image, generating a feature vector based on a depth distribution of the low-resolution depth image, selecting a filter to upsample the low-resolution depth image by classifying a generated feature vector according to a previously learnt classifier, upsampling the low-resolution depth image by using a selected filter, and outputting an upsampled high-resolution depth image.

Abstract: An x-ray imaging system includes an x-ray source, an x-ray detector including a plurality of detector strips arranged in a first direction of the x-ray detector. Each detector strip includes a plurality of detector pixels arranged in a second direction of the x-ray detector. A phase grating and a plurality of analyzer gratings including grating slits are disposed between the x-ray source and detectors. The x-ray source and the x-ray detector are adapted to perform a scanning movement in relation to an object in the first direction, in order to scan the object. Each of the plurality of analyzer gratings is arranged in association with a respective detector strip with the grating slits arranged in the second direction. The grating slits of the analyzer gratings of the detector strips are offset relative to each other in the second direction.

Abstract: Certain aspects pertain to Fourier ptychographic imaging systems, devices, and methods such as, for example, high NA Fourier ptychographic imaging systems and reflective-mode NA Fourier ptychographic imaging systems.

Abstract: An EO sensor is configured to time multiplex a primary optical channel that provides high detection sensitivity to maintain high SNR and a multi-filtered optical channel that provides detection in different measurement bands (e.g. spectral, polarization, amplitude or phase). The channels may, for example, be time multiplexed based on range to target or within each integration period of the EO sensor. The multi-filtered optical channel uses a field directing array to sample the FOV to form different optical sub-channels that are filtered by different optical filters. These sub-channels may be spatially multiplexed onto different sub-regions of the detector or may be time multiplexed onto the entire detector. The light modulator used to time multiplex the primary and multi-filtered optical channels may be used to time de-multiplex spatially overlapping regions of the FOV onto a pixel of the detector in order to detect high spatial resolution images with low resolution detectors.

Abstract: An optical system for a holographic microscope includes: a light source configured to emit a light beam; a grating configured to split the light beam into a reference beam and an object beam; a lens unit configured to irradiate a sample by the reference and object beams split by the grating; a spatial filter including a first region for the reference beam and a second region for the object beam; and a detector configured to detect an interference pattern caused by the reference and object beams.

Abstract: The disclosure generally relates to imaging optical systems that include a plurality of mirrors, which image an object field lying in an object plane in an image field lying in an image plane, where at least one of the mirrors has a through-hole for imaging light to pass through. The disclosure also generally relates to projection exposure installations that include such im-aging optical systems, methods of using such projection exposure installa-tions, and components made by such methods.

Abstract: A method for measuring the centricity of a conductor in an insulating casing, in which the string formed by the conductor with its insulating casing is moved along a conveying direction. A device for measuring the centricity of a conductor in an insulating casing includes an inductive measuring apparatus, first and second optical measuring apparatus and an evaluation apparatus.

Abstract: There is provided an optical accelerometer including a first substrate, a second substrate, a spacer and a processing unit. The first substrate includes a frame, a movable member and at least one elastic member. Periodic slots are formed on the movable member along at least one direction to be served as a diffraction grating. The elastic member is connected between the frame and the movable member. The second substrate includes at least one sensing unit configured to detect a diffraction pattern formed by the diffraction grating. The spacer is disposed between the first substrate and the second substrate to define a predetermined height. The processing unit is coupled to the sensing unit and configured to calculate a 3D acceleration according to the diffraction pattern.

Abstract: The cost and size of an atomic magnetometer are reduced by attaching together a first die which integrates together a vapor cell, top and side photo detectors, and processing electronics, a second die which integrates together an optics package and a heater for the vapor cell, and a third die which integrates together a VCSEL, a heater for the VCSEL, and control electronics.