Abstract: Methods and systems for interferometrically characterizing diffractive elements are disclosed.

Abstract: A measuring device that employs interference optics for detecting and tracking the movement of a mechanical element (4) has a light source (31) for emitting a light bundle that is capable of interference, a diffraction grating and a sensor arrangement (33). A beam path leads from the light source to the sensor arrangement (33) by way of the diffraction grating (32). The diffraction grating divides the light bundle into at least three partial components, thereby forming a light patch having three overlapping maxima, the center, zero maximum and the two minus one and plus one maxima on either side, at the optical sensor arrangement (33). The light beams for generating the three brightness maxima interfere with one another, so the resulting superposed light patch (46) contains interference bands that run in one direction or another when the diffraction grating is moved. The movement of the interference bands is detected with the sensor arrangement (33), and evaluated in an evaluation circuit.

Abstract: A high speed high resolution spectral sensor is formed by placing a cascade of chained wide field-of-view Mach-Zender interferometers inside a dispersive sensor between the sensor's grating and the focusing lens. Also is disclosed an optical filter with wide field-of-view capabilities. Such a filter is formed by inserting a plurality of gap plates of certain thicknesses and refractive indices. The invention provides formulas for calculation of optimal dimensions for such gap plates.

Abstract: Methods for detection and analysis of allosteric receptor/ligand binding by changes in surface refractive index are provided. When analyzed by surface plasmon resonance, binding of such allosteric binding agents to their ligands may result in a negative deviation in the optical response (i.e., a decrease in resonance angle) or in an increase in the optical response (i.e., an increase in resonance angle) depending on the binding properties of the selected allosteric receptor. Other methods for analysis of surface refractive index are also useful in the invention. The methods of the invention are particularly useful for small ligands which would not be expected to produce detectable changes in refractive index because they do not add significant mass upon binding.

Abstract: In a process for analyzing the wavefront of a light beam, a diffraction grating with rectangular meshing is placed in a plane perpendicular to the light beam to be analyzed and optically conjugate with the analysis plane. Different emergent beams from the grating interfere to form an image whose deformations are related to the slopes of the wavefront analyzed. The grating multiplies an intensity function, implemented by a two-dimensional intensity grating, which defines a rectangular meshing of sub-pupils transmitting the light from the beam to be analyzed into a plurality of emergent beams disposed in accordance with a rectangular meshing, with a phase function implemented by a two-dimension phase grating which introduces a phase shift between two adjacent emergent beams such that the two emergent beams are in phase opposition.

Abstract: A new interferometry configuration combines the strengths of two existing interferometry methods, improving the quality and extending the dynamic range of both. On the same patterned mask, placed near the image-plane of an optical system under test, patterns for phase-shifting point diffraction interferometry and lateral shearing interferometry coexist. The former giving verifiable high accuracy for the measurement of nearly diffraction-limited optical systems. The latter enabling the measurement of optical systems with more than one wave of aberration in the system wavefront.

Abstract: A light wave measuring instrument has a small optical system. Beams from a laser light source illuminate a grating scale and plus-first-order-diffracted and minus-first-order-diffracted beams from the grating scale are diffracted and reflected so as to travel through their original optical paths. The beams are returned to a non-polarization beam splitter, transmitted through a quarter wavelength plate and converted into one straight polarized beam having a polarization direction varying with the phase difference between the two beams. The straight beam is then separated. The separate beams are separated into P and S polarized beams. The S polarized beams are reflected by a polarization film, while the P polarized beams are reflected by a parallel glass plate. These beams are transmitted through the polarization film again to become coherence signal beams having reverse phases of fringes, which are then emitted in the same direction.

Abstract: A method for measuring acceleration uses an accelerometer apparatus having an optically transparent, stress-birefringent material, a source of polarized light positioned to direct a polarized beam of light into the optically transparent, stress-birefringent material, and a detector system positioned to detect an output beam from the optically transparent, stress-birefringent material. The accelerometer apparatus is accelerated, and the acceleration of the accelerometer apparatus is simultaneously determined from a measurement of stress-induced optical birefringence in the optically transparent, stress-birefringent material.

Abstract: A system and method for performing selected optical measurements on a sample is provided utilizing an optical coherence domain reflectometer which includes a diffraction grating. A broad band light source produces light having a short coherence length. A beamsplitter splits the light into a signal beam and a reference beam. A reference mirror is disposed to receive the reference beam. A lens brings the signal beam to focus on the sample. A diffraction grating receives reflections from the sample and from the reference mirror, the reflections being incident on the diffraction grating with respect to said diffraction grating normal such that a positive diffraction order from one of the reflections and a negative diffraction order from the other one of the reflections and a negative diffraction order from the other one of the reflections propagate along a common path.

Abstract: The present invention comprises a tool for and a method of inspecting a mask used in photolithography to determine errors in phase, amplitude, and pattern edges. An embodiment of the tool comprises a laser source, a polarizing beam splitter, a first shutter, a mask, a second shutter, a quarter wave retarder, a single-mode optical fiber, and a CCD detector array. An embodiment of the method comprises four independent measurements of light intensity, comprising: a pattern of a mask, a diffraction pattern of a reference pinhole, an interference pattern of the mask and the reference pinhole, and an interference pattern of the mask and the reference pinhole with a known phase difference. Calculations are performed to determine phase and amplitude information as a function of location on the mask. The phase and amplitude information is then compared with a design layout of the mask to determine pattern edge information and identify possible defects in the mask.

Abstract: Apparatus for splitting, imaging, and measuring wavefronts with a reference wavefront and an object wavefront. A wavefront-combining element receives and combines into a combined wavefront an object wavefront from an object and a reference wavefront. A wavefront-splitting element splits the combined wavefront into a plurality of sub-wavefronts in such a way that each of the sub-wavefronts is substantially contiguous with at least one other sub-wavefront. The wavefront-splitting element may shift the relative phase between the reference wavefront and the object wavefront of the sub-wavefronts to yield a respective plurality of phase-shifted sub-wavefronts. The wavefront-splitting element may then interfering the reference and object wavefronts of the phase-shifted sub-wavefronts to yield a respective plurality of phase-shifted interferograms. An imaging element receives and images the phase-shifted interferograms.

Abstract: A point-diffraction interferometer having a source (1) of electromagnetic radiation, a perforated mask (2) on its entrance end, an optics-testing space (4) into which the optics (9) to be tested may be inserted, elements (5, 6) that create a testing beam and a reference beam using a perforated mask (6) on its exit end, and a component (7, 8) that analyzes an interference pattern (16) created by superimposing its testing beam and reference beam. One-dimensional or two-dimensional arrays (12, 15) of nearly point-like through holes are incorporated into the perforated masks (2, 6) on the interferometer's entrance end and exit end. The interferometer has particular application to testing optical systems employed on photolithographic exposure systems.

Abstract: A wavelength detector includes an optical structure receiving an input beam, the optical structure outputting at least three wavelength dependent two-beam interference signals. Each wavelength dependent two-beam interference signal has a different phase offset. A detector receives the at least three wavelength dependent two-beam interference signals and outputs an electrical signal representative of each wavelength dependent two-beam interference. A processor receives the at least three electrical signals from the detector and generates a composite control signal. Alternatively, two of the three signals are periodic with respect to wavelength and the third signal is a reference signal. The two-beam interference signals may be created by providing patterned apertures in respective beam paths. Phase shifting interferometry techniques may be used to determine the wavelength from the periodic signals.

Abstract: A method for evaluating aberrations of an optical element such as optical head for use with an optical system such as DVD. In this method, light is transmitted through the optical element and then diffracted into 0, ±1, ±2, . . . order diffraction lights, for example. Among others, first and second lights (e.g., 0 and +1, 0 and −1, +1 and −1, or 0 and ±1 order diffracted lights) are overlapped to form an image shared by the first and second lights. Then, light intensity at first and second points in the shared image are detected. At this moment, light intensity at the first and second points are changed. Then, a phase difference in light intensity of between first and second points is determined. Using the phase difference, aberrations of the optical element are determined.

Abstract: A system for performing real time optical comparisons using an optical correlator permits comparing a sampled image to a wide variety of reference images through the utilization of a multiple quantum well spatial light modulator which is utilized to rapidly present a large number of reference images for correlation. The utilization of the multiple quantum well spatial light modulator as the spatial light modulator in a van der Lugt image correlator in combination with a spectrometer permits optical comparisons at 300,000 frames per second versus 10,000 frames per second, the best case for liquid crystal based spatial light modulators.

Abstract: Techniques for optically evaluating phase masks for fabricating waveguide Bragg gratings by measuring diffraction orders.

Abstract: An optical system (10) for correcting wavefront aberrations of an optical beam (12). The beam (12) is received by an entrance pupil (14), where a portion of the beam (12) at the entrance pupil (14) is coupled off of the main beam (12) to be used as a reference beam (22). The reference beam (22) is taken from a small enough portion of the main beam (12) so that the temporal coherence of the reference beam wavefront is substantially in phase. The reference beam (22) is amplified by a coherent reference amplifier (24), expanded and collimated. The main beam (12) and the collimated beam (28) are applied to a beam splitter (16) that splits the main beam (12) and the reference beam (22) into two separate beam paths, where the main beam (12) and the reference beam (22) traveling along a common path are coupled together. One optical path from the beam splitter (16) is applied to a detector array (32) and the other optical path from the beam splitter (16) is applied to a light valve (40).

Abstract: A method of manufacturing a projection optical system (37) for projecting a pattern from a reticle to a photosensitive substrate, comprising a surface-shape-measuring step wherein the shape of an optical test surface (38) of an optical element (36) which is a component in the projection optical system is measured by causing interference between light from the optical surface (38) and light from an aspheric reference surface (70) while the optical test surface (38) and said reference surface (70) are held in integral fashion in close mutual proximity. A wavefront-aberration-measuring step is included, wherein the optical element is assembled in the projection optical system and the wavefront aberration of the projection optical system is measured.

Abstract: Focusing means to focus a beam upon a reflective-transmissive surface. Reflecting means to reflect a central portion of the beam from the reflective-transmissive surface. Transmitting means to transmit a portion of the beam that lies outside the central portion. Receiving means to receive the transmitted portion of the beam and combining means to combine the reflected central portion of the beam with a test beam to generate an interference pattern.

Abstract: An accelerometer facilitates optical, interferometric measurement of acceleration. The device includes a proof mass having a first set of spaced-apart, elongated fingers projecting therefrom, and a stationary housing or substrate comprising a second set of similarly arranged projecting fingers. A spring connects the proof mass to the substrate such that, in a rest configuration, the first and second set of fingers interdigitate. When the structure is accelerated, the substrate fingers remain stationary, while the alternating fingers of the proof mass are displaced therefrom. This creates a phase-sensitive diffraction grating which, when illuminated, facilitates determination of the relative displacement between the sets of fingers by measuring the intensity of the diffracted modes. This displacement, in turn, indicates the acceleration experienced by the accelerometer structure.

Abstract: An interferometer has a semiconductor laser which oscillates in multiple modes, an optical member for providing a beam from the semiconductor laser with a substantial optical path difference between optical paths partially in one beam, and an interference optical system for causing interference, using the beam having traveled via the optical member.

Abstract: An alignment sensor having a fixed reference grating and a movable wafer grating receiving electromagnetic radiation from a coherent illumination source. The illumination source is split into two beams by a beamsplitter. One beam is directed to a fixed reference grating and the diffracted orders are collected. The other beam from the beamsplitter is directed to a movable wafer grating. The diffracted orders from the movable wafer grating are collected and caused to interfere with the diffracted orders from the fixed reference grating, causing a phase shift indicative of the wafer movement or misalignment with respect to the fixed reference grating. Multiple channels having discrete wavelengths or colors are used to optimize detection and alignment irrespective of wafer processing variables. A polarization fixture on the illumination source and a central polarizing portion on the beamsplitter is used to provide contrast optimization, or alternately a latent image metrology mode.

Abstract: A sensor platform for use in sample analysis comprises a substrate (30) of refractive index (n1) and a thin, optically transparent layer (32) of refractive index (n2) on the substrate, (n2) is greater than (n1). The platform incorporates one or multiple corrugated structures in the form of periodic grooves (31), (33), which defines one or more sensing areas each for one or more capture elements. The grooves are so profiled, dimensioned and oriented that when coherent light is incident on the platform it is diffracted into individual beams or diffraction order resulting in reduction of the transmitted beam and an abnormal high reflection of the incident light thereby creates an enhanced evanescent field at the surface of the or each sensing area. The amplitude of this field at the resonant condition is greater by an order of approximately 100 than the field of prior art platforms so that the luminescence intensity created from samples on the platform is also increased by a factor of 100.

Abstract: An optical correction system for correcting thermally-induced wavefront distortions in an optical signal emanating from a crystal or other form of optical device/system. An optical output signal from the thermally sensitive optical device/system is fed to a beamsplitter, which produces a reflected optical signal and a refracted optical signal containing thermally-induced distortion. The refracted signal is fed to a wavefront distortion sensor which produces an output signal representative of the thermally-induced distortion. The output of the wavefront distortion sensor is fed to a computational device which determines the necessary degree of error correction to compensate for the thermally-induced optical distortion. A stress application device receives the output of the computational device and generates an electrical signal in accordance therewith which is then used to control a force applicator in physical contact with the crystal.

Abstract: A system and method for performing selected optical measurements on a sample is provided utilizing an optical coherence domain reflectometer which includes a diffraction grating. A broad band light source produces light having a short coherence length. A beamsplitter splits the light into a signal beam and a reference beam. A reference mirror is disposed to receive the reference beam. A lens brings the signal beam to focus on the sample. A diffraction grating receives reflections from the sample and from the reference mirror, the reflections being incident on the diffraction grating with respect to said diffraction grating normal such that a positive diffraction order from one of the reflections and a negative diffraction order from the other one of the reflections and a negative diffraction order from the other one of the reflections propagate along a common path.

Abstract: Apparatus and methods for passing a focused laser beam through a thin ferrofluid cell creates a spatial distribution in the refractive index of the ferrofluid and generates a diffraction ring patterns. Using a pair of perpendicularly placed ferrofluid cells, two sets of diffraction ring patterns can be produced on two viewing screens. Deformations in the diffraction patterns due to an acceleration can be viewed on the screens, providing a ferrofluid accelerometer. By applying an electric or a magnetic field on a thin ferrofluid sample, the light passing through the sample can be modulated by the field, providing a light modulator. The apparatus and method has applications for detecting acceleration information within a gyroscope and for use in toys.

Abstract: A scanning microlens array functions in a manner analogous to an array of interference microscopes to provide phase-sensitive, confocal micro-imaging capability. Moreover, the scanning mechanism can effectively perform a phase-modulation function. In this mode of operation, each image point is scanned by multiple microlenses that have fixed, but differing, built-in phase offsets, and the combination of signals acquired from the multiple scans effectively simulate a phase-modulated interference signal.

Abstract: The invention relates to a point diffraction interferometer which measures a profile irregularity on a surface to be measured by, irradiating light irradiated from a light source to a pinhole mirror via a collective optical system, irradiating a part of the light diffracted from a pinhole provided in the pinhole mirror to the surface to be measured as a luminous flux for measurement, making the luminous flux for measurement reflected by the surface to be measured interfere with a reference luminous flux which is an other part of light diffracted from the pinhole, and detecting the state of an interference fringe caused by the interference. In the invention, a diameter range of the pinhole is: &lgr;/2≦&phgr;PH≦&lgr;/NA (wherein &lgr; is a wavelength of light irradiated from the light source, NA is a numerical aperture of the collective optical system, and &phgr; PH is a diameter of the pinhole).

Abstract: Wavefront information for an optical system is calculated based on the intensity of an image of a plurality of gratings having different periods and orientations taken from at least two different planes a predetermined distance apart. The image of a plurality of gratings having different spatial frequencies or periods and orientations, the location of which are precisely known, are imaged in a nominal focal plane of the optical system, and, preferably, in two additional planes displaced a predetermined distance from the nominal focal plane. The phase shift, if any, from a fundamental frequency of the image intensity, is determined based on the known location of the grating and the grating image intensity. The grating image intensity is detected and measured in a first detection plane in a nominal focal plane and in a second detection plane a predetermined distance from the nominal focal plane. From these measurements wavefront information is calculated.

Abstract: The present invention is directed at a coherence test reticle or lithographic plate, and a method for testing the coherence of a laser beam using the test reticle. The quality or coherence of the laser beam is measured by illuminating the test reticle and the recording and/or analyzing the optical patterns generated by the illumination. The technique was designed for, but not limited to, the characterization of laser-based systems via the detection of optical radiation modulated by transmissive, reflective and diffractive patterns printed on a reticle or lithographic plate designed specifically for this purpose. The novelty and advantages over the prior art are insensitivity to vibration, alignment, and multi-path differences of classical interferometric coherence measurement techniques. Spatial coherence and longitudinal or temporal coherence may be measured independently. Vertical and horizontal coherence may be measured independently. The technique is focus error insensitive.

Abstract: Methods and systems for evaluating curvatures in line features embedded in a different material layer formed on substrates.

Abstract: Apparatus and methods are disclosed for measuring the surface topography of a test surface, such as a spherical or aspherical surface of a refractive or reflective optical element. The test surface is measured by detecting the state of interference fringes generated by interference of a reference light beam and a measurement light beam that interacts (e.g., reflects from) the test surface. The reference and measurement beams are produced by a point light source having a reflective surface. The point light source is disposed between a source of input light and the test surface. The measurement beam (after interacting with the test surface) and the reference beam are caused to interfere with each other to produce a first interference-fringe state. The distance between the point light source and the test surface can be changed between production of the first interference-fringe state and production of a second interference-fringe state.

Abstract: Apparatus for splitting, imaging, and measuring wavefronts with a reference wavefront and an object wavefront. A wavefront-combining element receives and combines into a combined wavefront an object wavefront from an object and a reference wavefront. A wavefront-splitting element splits the combined wavefront into a plurality of sub-wavefronts in such a way that each of the sub-wavefronts is substantially contiguous with at least one other sub-wavefront. The wavefront-splitting element may shift the relative phase between the reference wavefront and the object wavefront of the sub-wavefronts to yield a respective plurality of phase-shifted sub-wavefronts. The wavefront-splitting element may then interfering the reference and object wavefronts of the phase-shifted sub-wavefronts to yield a respective plurality of phase-shifted interferograms. An imaging element receives and images the phase-shifted interferograms.

Abstract: An apparatus for wavefront detection includes a wavefront source for the production of a wavefront, an optical system transforming the wavefront, a diffraction grating through which the transformed wavefront passes, and a spatially resolving detector following the diffraction grating. The wavefront source has a two-dimensional structure.

Abstract: A system and method for performing selected optical measurements on a sample is provided utilizing an optical coherence domain reflectometer which includes a diffraction grating. A broad band light source produces light having a short coherence length. A beamsplitter splits the light into a signal beam and a reference beam. A reference mirror is disposed to receive the reference beam. A lens brings the signal beam to focus on the sample. A diffraction grating receives reflections from the sample and from the reference mirror, the reflections being incident on the diffraction grating with respect to said diffraction grating normal such that a positive diffraction order from one of the reflections and a negative diffraction order from the other one of the reflections and a negative diffraction order from the other one of the reflections propagate along a common path.

Abstract: A method and an apparatus are provided for the determination of a condition or state of an object based on quasi-elastic interaction between the object and light transmitted to the object. This light is transmitted from a light source through a diffractive optical element. The light that has interacted with the object is collected and detected. The diffractive optical element is designed in such a way that the determination of the condition or state of the object is substantially exclusively defined by the diffractive optical element and substantially independent of properties of the light source. Several diffraction patterns may be integrated in one diffractive optical element, thereby integrating several optical functions, such as lenses, beam splitters, etc. in one optical component. Use: Transit-time-velocity measurement, Doppler velocity measurement, viscoelastic measurement, differential speckle determination, differential vibrometer, distance determination apparatus, etc.

Abstract: In a phase-shifting point diffraction interferometer, different image-plane mask designs can improve the operation of the interferometer. By keeping the test beam window of the mask small compared to the separation distance between the beams, the problem of energy from the reference beam leaking through the test beam window is reduced. By rotating the grating and mask 45°, only a single one-dimensional translation stage is required for phase-shifting. By keeping two reference pinholes in the same orientation about the test beam window, only a single grating orientation, and thus a single one-dimensional translation stage, is required. The use of a two-dimensional grating allows for a multiplicity of pinholes to be used about the pattern of diffracted orders of the grating at the mask. Orientation marks on the mask can be used to orient the device and indicate the position of the reference pinholes.

Abstract: A precision grating period measurement system uses a pair of properly positioned photodetectors to provide sub-Angstrom resolution. That is, the absolute position of a first detector with respect to a zero point in the measurement system is assured by including a second photodetector that measures a retroreflected signal. The system is then “zeroed” on the retroreflected signal such that the subsequent measurements recorded by the first photodetector are a precise measurement of the grating period.

Abstract: Apparatus for splitting, imaging, and measuring wavefronts with a reference wavefront and an object wavefront. A wavefront-combining element receives and combines into a combined wavefront an object wavefront from an object and a reference wavefront. A wavefront-splitting element splits the combined wavefront into a plurality of sub-wavefronts in such a way that each of the sub-wavefronts is substantially contiguous with at least one other sub-wavefront. The wavefront-splitting element may shift the relative phase between the reference wavefront and the object wavefront of the sub-wavefronts to yield a respective plurality of phase-shifted sub-wavefronts. The wavefront-splitting element may then interfere the reference and object wavefronts of the phase-shifted sub-wavefronts to yield a respective plurality of phase-shifted interferograms. An imaging element receives and images the phase-shifted interferograms.

Abstract: A method of manufacturing a projection optical system (37) for projecting a pattern from a reticle to a photosensitive substrate, comprising a surface-shape-measuring step wherein the shape of an optical test surface (38) of an optical element (36) which is a component in the projection optical system is measured by causing interference between light from the optical surface (38) and light from an aspheric reference surface (70) while the optical test surface (38) and said reference surface (70) are held in integral fashion in close mutual proximity. A wavefront-aberration-measuring step is included, wherein the optical element is assembled in the projection optical system and the wavefront aberration of the projection optical system is measured.

Abstract: In an interferometer for detecting interference light between light flux passed through an object to be inspected and reference light to be generated from a portion of the light flux passed therethrough, a phase of the interference light is detected with high precision. The light flux passed through the optical system to be inspected forms a spot image on a pinhole formed in a plate. Measuring light from the spot image and the reference-light diffracted out of the light flux from the spot image at the pinhole create interference light which in turn is received by an observation system. An image of interference fringes formed by the interference light is taken with an image pickup element. Further, heterodyne interference light is created by vibrating the plate in the direction intersecting the light flux or in the direction along the light path of the light flux, thereby detecting a phase of each portion of the interference fringes with high precision.

Abstract: An interferometer includes a beamsplitter for splitting a source beam into a test beam and a reference beam, an imaging device for detecting an interference pattern, a mirror disposed in a path of the test beam for reflection of the test beam toward the imaging device, a micromirror disposed in a path of the reference beam for reflection of a portion of the reference beam toward the imaging device, and a focusing mechanism disposed for focusing the reference beam on the micromirror. The micromirror has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the reference beam focused thereon by the focusing mechanism. A spatial filter for reducing effects of aberration in a beam includes a reflector disposed upon a transparent base wherein the reflector has a lateral dimension not exceeding the approximate lateral dimension of a central lobe of the spatial intensity distribution of the beam focused upon the reflector.

Abstract: Apparatus and methods for passing a focused laser beam through a thin ferrofluid cell creates a spatial distribution in the refractive index of the ferrofluid and generates a diffraction ring patterns. Using a pair of perpendicularly placed ferrofluid cells, two sets of diffraction ring patterns can be produced on two viewing screens. Deformations in the diffraction patterns due to an acceleration can be viewed on the screens, providing a ferrofluid accelerometer. By applying an electric or a magnetic field on a thin ferrofluid sample, the light passing through the sample can be modulated by the field, providing a light modulator. The apparatus and method has applications for detecting acceleration information within a gyroscope and for use in toys.

Abstract: Diffraction phase gratings are employed in phase-shifting point diffraction interferometers to improve the interferometric fringe contrast. The diffraction phase grating diffracts a zeroth-order diffraction of light at a first power level to the test-beam window of a mask that is positioned at the image plane and a first-order diffraction at a second power to the reference-beam pinhole. The diffraction phase grating is preferably selected to yield a desired ratio of the first power level to second power level.

Abstract: A two-beam interferometer illuminates a sample surface with light at grazing incidence angles for the purpose of analyzing a surface characteristic such as surface topography. The interferometer includes a diffractive-optic beam splitter, which separates an incoming light beam into measurement and reference beams and a diffractive-optic beam combiner, which produces an output beam by interfering portions of the reference beam with reflected portions of the measurement beam. Those portions of the reference wavefront and the measurement wavefront that interfere originate from substantially the same portion of the initial illumination wavefront.

Abstract: Interferometric methods are presented to facilitate alignment of image-plane components within an interferometer and for the magnified viewing of interferometer masks in situ. Fourier-transforms are performed on intensity patterns that are detected with the interferometer and are used to calculate pseudo-images of the electric field in the image plane of the test optic where the critical alignment of various components is being performed. Fine alignment is aided by the introduction and optimization of a global contrast parameter that is easily calculated from the Fourier-transform.

Abstract: The extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) provides the high-accuracy wavefront characterization critical to the development of EUV lithography systems. Enhancing the implementation of the PS/PDI can significantly extend its spatial-frequency measurement bandwidth. The enhanced PS/PDI is capable of simultaneously characterizing both wavefront and flare. The enhanced technique employs a hybrid spatial/temporal-domain point diffraction interferometer (referred to as the dual-domain PS/PDI) that is capable of suppressing the scattered-reference-light noise that hinders the conventional PS/PDI. Using the dual-domain technique in combination with a flare-measurement-optimized mask and an iterative calculation process for removing flare contribution caused by higher order grating diffraction terms, the enhanced PS/PDI can be used to simultaneously measure both figure and flare in optical systems.

Abstract: The invention features methods and systems for optical correlation of ultrashort optical waveforms, e.g., pulses. The optical waveform passes through a diffractive optic, e.g., a mask or grating, to generate multiple sub-beams corresponding to different diffractive orders. At least two of the sub-beams are then imaged onto the sample to produce a desired crossing pattern. To perform the correlation, the diffracted sub-beams are variably delayed relative to one another prior to overlapping on the sample. The sample generates a signal beam in response to the overlapping sub-beams, the signal beam providing a correlation between the sub-beams for each of the variable delays.

Abstract: A dual sensor wavefront correction system is adaptable to correcting wavefronts including wavefronts that are severely scintillated. The system includes a Hartmann wavefront sensor as well as a unit shear lateral shearing interferometer (LSI) wavefront sensor. The optical output signals from the Hartmann wavefront sensor are applied to a real reconstructor which provides an estimation of the distortion in the wavefront during most conditions except for conditions of severe turbulence. In order to provide compensation for the phase discontinuities in a scintillated wavefront, a unit shear lateral shearing interferometer (LSI) wavefront sensor is provided. The optical output signals from the unit shear LSI wavefront sensor are processed by a complex reconstructor in order to provide relatively accurate estimates of the tilt signals at the discontinuities.