Abstract: Micron-scale displacement measurement devices having enhanced performance characteristics are disclosed. One embodiment of a micron-scale displacement measurement device includes a phase-sensitive reflective diffraction grating for reflecting a first portion of an incident light and transmitting a second portion of the incident light such that the second portion of the incident light is diffracted. The device can further include a mechanical structure having a first region and a second region, the mechanical structure positioned a distance d above the diffraction grating and forming a wall of a cavity, the second portion of the incident light is reflected off of the first region of the structure such that an interference pattern is formed by the reflected first portion and the reflected second portion of the incident light. The device can further include an orifice formed in the cavity to provide for the passage of air between the inside and outside of the cavity.

Abstract: A measurement method for measuring a wavefront aberration of a target optical system using an interference pattern formed by a light from a first image side slit, and a light from a second image side slit, the first and second image side slits being located at an image side of the target optical system, the first image side slit having, in a shorter direction, a width equal to or smaller than a diffraction limit of the target optical system, and the second image side slit having, in a shorter direction, a width greater than the diffraction limit of the target optical system includes the steps of obtaining three or more primary wavefronts of the target optical system from different measurement directions, and calculating a wavefront aberration of the target optical system based on the three or more primary wavefronts obtained by the obtaining step.

Abstract: The invention provides for identification and use of crystal structures of Dicamba monooxygenase (DMO) that may be complexed with iron or cobalt cofactor and substrate (dicamba), or product (DCSA) in order to define residues important for enzymatic structure and function. Methods of using such structures are described. Data storage media comprising the crystal structural coordinate information are also described.

Abstract: Methods and systems for measuring a surface of an object are provided, wherein portions of the surface of the object are interferometrically measured and data representing a shape of the surface of the object are obtained by stitching the measurement data corresponding to each portion together. For measuring the individual portions of the surface of the object a variable light shaping member is utilized preferably constructed by arranging two diffraction gratings in a beam path of measuring light and appropriately displacing the two diffraction gratings relative to each other depending on a target shape of a particular portion of the surface of the object.

Abstract: A wavefront measuring apparatus for optical pickup includes: a beam splitting section; a wavefront shaping section; a beam combining section that generate interference light; an interference fringe image-acquiring section that acquires an interference fringe image including wavefront information of the light beam; and an analyzing section that analyzes a wavefront of the light beam on the basis of the interference fringe image. The analyzing section includes: an image processing section that performs a filtering process on the interference fringe image to eliminate a frequency component corresponding to the sub beam, so as to acquire the filtering-processed interference fringe image, and a wavefront analyzing section that analyzes a wavefront of the main beam on the basis of the filtering-processed interference fringe image.

Abstract: The method comprises positioning a diffraction grating with a two-dimensional meshing on the path of the beam to be analyzed and processing at least two interferograms of at least two different colors, each interferogram being obtained in a plane from two sub-beams with different diffraction orders. The invention can be used to analyze and correct divided wavefronts.

Abstract: Optical scattering disk, use and wavefront measuring apparatus. The optical scattering disk includes a transparent substrate (1) and a light scattering layer (2) adjoining a surface of the substrate and having light-scattering-active particles (3). The light scattering layer has an embedding medium (4) which is optically denser than air and directly adjoins the facing surface of the substrate without intervening air gaps and by which the light-scattering-active particles are surrounded. Such optical scattering disks may be used, e.g., in apparatuses for wavefront measurement of high-aperture microlithography projection objectives employing lateral shearing interferometry.

Abstract: A holographic adaptive optic system for correcting the wavefront of a light. A phase correction device with a plurality of pixels in the path of the light. A holographic wavefront sensor in the path providing a pair of reconstruction beams for each phase correction device pixel. The relative intensity of the two beams being proportional to the amount of aberration present in the initial beam. A detector that measures the relative intensity of the pair of reconstructed beams. The detector connected by at least one individual control connector to the relevant pixel in the phase correction device. The individual control connectors controlling the phase correction device based upon the relative intensity between the two reconstruction beams to reduce the wavefront aberration.

Abstract: An optical system includes a substrate adapted for supporting a sample, where the substrate has a refractive index, nsub, larger than a refractive index of the sample, nsample, a source of electromagnetic radiation having wavelength, ?o, and a detector having multiple individual detector elements configured for detecting a signal resulting from an interaction of the electromagnetic radiation with the sample. The system includes dividing optics, directing optics, and control optics. The dividing optics are configured for dividing the electromagnetic radiation from the source into at least three substantially independent excitation beams.

Abstract: An optical fly height measurement system includes a planar waveguide, a first diffraction grating for coupling an electromagnetic wave into the planar waveguide wherein the first diffraction grating is positioned for directing the electromagnetic wave towards an air bearing surface of a slider. A second diffraction grating is provided for receiving the electromagnetic wave reflected from the air bearing surface. A detector module and processor are provided to determine the fly height.

Abstract: An optical position encoder employs spatial filtering of diffraction orders other than +/? 1st diffraction orders for greater accuracy. The encoder includes a light source, a scale including a diffractive scale pattern, an optical detector adjacent to the scale, and first and second spaced-apart diffraction gratings between the light source and the scale. The gratings and scale are configured to spatially separate +/? 1st diffraction orders from other diffraction orders and to direct the +/? 1st diffraction orders along respective optical paths. The optical paths diverge from the first grating to respective locations on the second grating that are separated by more than the beam width of the source light beam. The optical paths further converge from the locations on the second grating to an area of the scale adjacent to the detector, and then extend from the area of the scale to the detector to create an interference pattern as a function of the relative position between the scale and the light source.

Abstract: Device for white light interferometry comprising a light source of main emission wavelength ?0 and spectral width ?? and an evaluating unit with a line sensor of pixel width P for detecting an interference fringe pattern with a fringe spacing F, a mask being placed in front of the line sensor having a periodically modulated light transmittance along said line sensor, characterized in that the period length M of the mask is such as to fulfill the condition ? ? ? ? ? 0 < ? 1 - F M ? < 1 2 ? F P - ? ? ? ? ? 0 .

Abstract: Embodiments of the invention include a SCOL targeting groups configured to increase target to target separation and thereby increase target utility to simultaneous exposures to multiple illumination dots and associated inspection methodologies. The embodiments of the invention further relate to apparatus for projection simultaneous illumination dots onto different targets of the same targeting group on a wafer to conduct multiple simultaneous target inspections. Embodiments of the invention further relate to methods used to inspect SCOL targets using simultaneous illumination dots directed onto different targets of the same targeting group to conduct multiple simultaneous target inspections.

Abstract: A moiré interferometric strain sensor for detecting strain on a specimen, a diffraction grating being on the specimen, the strain sensor including an array of a plurality of microlenses for receiving at least one reflected beam of at least one incident beam upon the specimen; and a detector array at a focal plane of the array of a plurality of microlenses.

Abstract: Disclosed is a method of analyzing an interference fringe, with which method the optical characteristics of an optical system to be examined can be analyzed very precisely. In one preferred form of the invention, the analyzing method includes a step of detecting information related to a first interference fringe produced by interference of two light fluxes, a step of detecting information related to a second interference fringe produced while changing a phase of one of the two light fluxes by ? as multiplied by an odd number (e.g., 1?, 3?, . . . ), and a step of detecting averaged information of phase information of the two interference fringes, on the basis of the detected information of the first and second interference fringes and by use of Fourier transform.

Abstract: An improved condition testing system and method includes a structure including a semiconductor material with a target portion and a second portion. The target portion has a first feature when at least one of the following occurs: an external force is received by the second portion of the structure and an internal condition occurs in the target portion. The system and method further has a grating shaped and located to produce a first optical interference pattern when the target portion and the grating are exposed to non-invasive illumination and when the target portion has the first feature. Further implementations use a second grating spaced apart from the first grating.

Abstract: In a position-measuring device for recording the relative position of a scanning unit and a measuring graduation that is movable with respect to the latter in at least one measuring direction, the scanning unit includes a plurality of grating structures as well as at least one reflector element. The elements in the scanning unit are arranged such that the beams of rays diffracted by the measuring graduation pass through first grating structures in the scanning unit, subsequently impinge on the reflector element, from which there takes place a retroreflection in the direction of the measuring graduation, and the partial beams of rays then pass through second grating structures and then once again impinge upon the measuring graduation. The first and the second grating structures are arranged such that, upon the first and second passing through of the partial beams of rays, a defined lens effect on the partial beams of rays results.

Abstract: A method of manufacturing an optical element having an optical surface of a non-rotationally symmetric shape is described. Measuring light is generated using an interferometer optics, wherein the interferometer optics has at least one diffractive component having a grating. The optical surface is positioned at a first position relative to the diffractive component, wherein first measuring light diffracted at the diffractive component is incident on the optical surface at plural locations thereof, and at least one first interference pattern generated from first measuring light reflected from the optical surface is detected. The optical surface is positioned at a second position relative to the at least one diffractive component, wherein second measuring light diffracted at the diffractive component is incident on the optical surface at plural locations thereof, and at least one second interference pattern generated from second measuring light reflected from the optical surface is detected.

Abstract: A method and system for correcting aberrations in a beam of light including correcting for effects from an undiffracted portion of an input beam. The method and system includes (1) a component for providing a beam of light; (2) a component for applying a diffraction grating pattern to the beam of light to establish an optical gradient to form an optical trap; (3) component for measuring aberration in the beam of light having the applied diffraction grating pattern; (4) component for calculating a phase-shifting diffraction grating encoding the aberration; and (5) component for projecting the phase-shifting diffraction grating in conjunction with the diffraction grating pattern characteristic of the optical trap.

Abstract: A phase difference detecting device includes a splitter for splitting laser beams into a first group which will travel along a first path and a second group which will travel along a second path, a beam selection/extraction unit for selecting, as reference light, one beam from the first group to allow it to pass therethrough, a path length changing unit for changing the length of the first path, a combining unit for combining the reference light and beams which construct the second group to produce interference light, and a detector for detecting the intensity of the interference light. The device changes the length of the first path using the path length changing unit to detect a path length which maximizes the intensity of the interference light for each of the beams which construct the second group, and determines a phase difference among the beams from the detected path length.

Abstract: A measurement method for measuring a wavefront aberration of a target optical system using an interference pattern formed by a light from a first image side slit, and a light from a second image side slit, the first and second image side slits being located at an image side of the target optical system, the first image side slit having, in a shorter direction, a width equal to or smaller than a diffraction limit of the target optical system, and the second image side slit having, in a shorter direction, a width greater than the diffraction limit of the target optical system includes the steps of obtaining three or more primary wavefronts of the target optical system from different measurement directions, and calculating a wavefront aberration of the target optical system based on the three or more primary wavefronts obtained by the obtaining step.

Abstract: Disclosed is a device for detecting at least one ligand contained in a sample that is to be analyzed. Said device comprises an optical waveguide, on the surface of which at least one ligand-specific receptor is directly or indirectly immobilized. The ligand bonds to said receptor during contact therewith. The inventive device comprises at least one optical source of radiation for injecting excitation radiation into the waveguide, the radiation being used for exciting emission of luminescence radiation in accordance with the bonding of the ligand to the receptor. At least one radiation receiver is integrated into the semiconductor substrate of a semiconductor chip so as to detect the luminescence radiation. The waveguide is integrated in a monolithic manner into the semiconductor substrate or is applied thereupon as a wave-guiding layer.

Abstract: A tissue imaging system (200) for examining the medical condition of tissue (290) has an illumination optical system (205), which comprises a light source (220), having one or more light emitters, beam shaping optics, and polarizing optics. An optical beamsplitter (260) directs illumination light to an imaging sub-system, containing a spatial light modulator array (300). An objective lens (325) images illumination light from the spatial light modulator array to the tissue. An optical detection system (210) images the spatial light modulator to an optical detector array. A controller (360) drives the spatial light modulator to provide time variable arrangements of on-state pixels. The objective lens operates in a nominally telecentric manner relative to both the spatial light modulator and the tissue. The polarizing optics are independently and iteratively rotated to define variable polarization states relative to the tissue.

Abstract: An alignment tool for a lithographic apparatus illuminates an alignment mark on a substrate with an alignment beam and measures the reflected spectrum. The reflected spectrum is compared with a reference mark to determine any misalignment. A blazed sub-wavelength grating is used to deflect the sub-beams created by diffracting the alignment beam from the alignment mark onto the reference mark.

Abstract: Provided is a method of determining one or more profile parameters of a photomask covered with a pellicle, the method comprising developing an optical metrology model of a pellicle covering a photomask, developing an optical metrology model of the photomask, the photomask separated from the pellicle by a medium and having a structure, the structure having profile parameters, the optical metrology model of the photomask taking into account the optical effects on the illumination beam transmitted through the pellicle and diffracted by the photomask structure. The optical metrology model of the pellicle and the optical metrology model of the photomask structure are integrated and optimized. At least one profile parameters of the photomask structure is determined using the optimized integrated optical metrology model.

Abstract: Modified MZ (Mach-Zender) interferometers preferably are utilized to analyze the transmitted, aspherical wavefront of an ophthalmic lens by mounting the lens in a cuvette having a rotatable carousel that can hold multiple lenses. Fresh, temperature controlled, saline solution is circulated about the lenses, and the cuvette is positioned in a vertical test arm of the interferometer configuration. Reverse raytracing preferably is utilized to remove aberrations induced into the wavefront as it is imaged from immediately behind the lens to the detector of the interferometer.

Abstract: There is provided an evaluation method of a reflective optical element on which a multilayer film is formed, including the step of calculating a phase difference between light incident upon the multilayer film and light reflected from the multilayer film using a standing wave produced when introducing light with a wavelength of 2 to 40 into the optical element.

Abstract: The present invention is directed to an optical grating sensor configured to detect a phase change in light passing though the system due to a binding event caused by an analyte. The grating sensor may include a light source that may be, for example, a coherent light source. The invention may also include a first diffraction grating having a first period. A micro-electrical mechanical system (MEMS) may be displaced from the first diffraction grating and may be configured to modulate the light received form the coherent light source. An analyte recognition material may be disposed on the surface of the first grating. A detector may be configured to receive light form the coherent light source after the light has been diffracted from the first diffraction grating and modulated by the MEMS. In another embodiment of the present invention, the grating sensor may be configured to operate in two modes. The first mode may be a mode the detect a phase change in the light due to a binding event.

Abstract: The present invention is directed to a system and method for using a spatial light modulator (SLM) to perform a null test of an (aspheric) optical surface. In an embodiment, such a system includes an interferometer, an optical element, and an SLM. The interferometer provides electromagnetic radiation. The optical element conditions the electromagnetic radiation to provide a first beam of radiation and a second beam of radiation. The SLM shapes a wavefront of the first beam of radiation resulting in a shaped wavefront corresponding to an optical surface. The shaped wavefront is incident on and conditioned by the optical surface. The shape of the optical surface is analyzed based on a fringe pattern resulting from interference between the shaped wavefront mapped by the optical surface and the second beam of radiation. The system may also include an optical design module that converts a null corrector design corresponding to the optical surface into instructions for the SLM.

Abstract: A measurement apparatus which measures a wavefront aberration of an optical system to be measured, the apparatus comprises a detection unit configured to detect an interference pattern formed by light having passed through a mask inserted on an object plane of the optical system to be measured, and a mask inserted on an image plane of the optical system to be measured.

Abstract: Micron-scale displacement measurement devices having enhanced performance characteristics are disclosed. One embodiment of a micron-scale displacement measurement device includes a phase-sensitive reflective diffraction grating for reflecting a first portion of an incident light and transmitting a second portion of the incident light such that the second portion of the incident light is diffracted. The device further includes a mechanical structure having a first region and a second region, the mechanical structure positioned a distance d above the diffraction grating, the second portion of the incident light is reflected off of the first region of the structure such that an interference pattern is formed by the reflected first portion and the reflected second portion of the incident light. The device can further include an electrode extending toward, but spaced a distance away from, the second region of the mechanical structure.

Abstract: A measuring system (100) for the optical measurement of an optical imaging system (150), which is provided to image a pattern arranged in an object surface (155) of the imaging system in an image surface (156) of the imaging system, comprises an object-side structure carrier (110) having an object-side measuring structure (111), to be arranged on the object side of the imaging system; an image-side structure carrier (120) having an image-side measuring structure (121), to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector (130) for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid (171).

Abstract: A measuring apparatus for optical, for example interferometric, measurement of an optical imaging system, imaging of a useful pattern in an imaging operation, including a device for production of radiation information, for example interference information, which is indicative of imaging errors, having a mask structure arrangement which contains a measurement pattern, and a device for detection and evaluation of the interference information which is indicative of imaging errors; also a method for operation of the optical imaging system including imaging error correction.

Abstract: A device for the tomographic imaging of an object to be analyzed, the device comprising a light source that emits a light beam with a coherence length substantially equal to the thickness of a slice of the object to be analyzed; and an interferometric imaging system comprising at least one objective, a reference mirror and a light-beam splitting means; wherein the interferometric system is arranged so that the objective defines a first focusing plane at the slice of the object to be analyzed and a second focusing plane at the reference mirror, and wherein the interferometric imaging system comprises at least a first compensating medium positioned between the second focusing plane and the splitting means, the thickness and the optical index of the at least one compensating medium having optical properties such that a first optical path of the light beam emitted from the light source between the first focusing plane and the splitting means is substantially equal to a second optical path of the light beam betwee

Abstract: Various embodiments include spectrometers comprising diffraction gratings monolithically integrated with other optical elements. These optical elements may include slits and mirrors. The mirrors and gratings may be curved. In one embodiment, the mirrors are concave and the grating is convex. The mirrors and grating may be concentric or nearly concentric.

Abstract: A pattern monitoring method for an exposure apparatus that includes an optical modulator having at least one element that provides incident light with plural phase differences, and a projection optical system that uses first diffracted light among lights exited from the optical modulator to project a pattern onto an object to be exposed includes the steps of detecting second diffracted light having an order different from that of the first diffracted light among the lights exited from the optical modulator, and obtaining a state of the pattern projected onto the object based on a detection result by the detecting step.

Abstract: A device and method for the interferometric measurement of phase masks, particularly from lithography. Radiation passing through a coherence mask is brought to interference by a diffraction grating. A phase mask is arranged in or near the pupil plane of the first imaging optics which can be positioned exactly in the x-y direction by which interferograms are generated which are phase-shifted in the x-y direction by translational displacement of the coherence mask or of the diffraction grating. The interferograms are imaged onto the spatially resolving detector by second imaging optic and the phase and transmission functions of the phase mask are determined by an evaluation unit. The invention can, of course, generally be applied to planar phase objects, such as biological structures, for example, points of establishment with respect to an interference microscope.

Abstract: A measurement method measures a wavefront aberration of a target optical system using an interference pattern formed by lights from first and second image side slits. The first image side slit has a width equal to or smaller than a diffraction limit of the target optical system. The measurement method includes the steps of obtaining a first and second wavefronts having wavefront aberration information of the target optical system in ±45° directions relative to the polarization direction of the light, and calculating wavefront aberration of the target optical system based on the first and second wavefronts of the target optical system obtained by the obtaining step.

Abstract: Apparatus and methods for in situ and ex situ measurements of spatial profiles of the modulus of the complex amplitude and intensity of flare generated by an optical system. The in situ and ex situ measurements comprise interferometric and non-interferometric measurements that use an array of diffraction sites simultaneously located in an object plane of the optical system to increase signals related to measured properties of flare in a conjugate image plane. The diffraction sites generate diffracted beams with randomized relative phases. In general, the interferometric profile measurements employ phase-shifting point-diffraction interferometry to generate a topographical interference signal and the non-interferometric measurements are based on flare related signals other than topographic interference signals.

Abstract: An object of the invention is to provide a detection apparatus, an optical path length measuring apparatus, a method for evaluating an optical member, and the like, which can evaluate optical characteristics such as chromatic dispersion and an optical path length at a high speed. Another object is to provide a detection apparatus and a method for detecting a change in temperature, which can evaluate chemical and biological reactions and an effect of hyperthermia with high accuracy. In a detection apparatus 10A, zero-order light B0 undergoing chromatic dispersion of a measurement object S is superimposed on first-order light B1 shifted in frequency, whereby a low-frequency beat is produced, and wavelength dependence of a beat phase thereof is measured. Moreover, using an AC electric signal from a frequency shifter 12 as a phase reference signal, a relative position of a probe signal is detected.

Abstract: Diffraction grating based fiber optic interferometric systems for use in optical coherence tomography, wherein sample and reference light beams are formed by a first beam splitter and the sample light beam received from a sample and a reference light beam are combined on a second beam splitter. In one embodiment, the first beam splitter is an approximately 50/50 beam splitter, and the second beam splitter is a non 50/50 beam splitter. More than half of the energy of the sample light beam is directed into the combined beam and less than half of the energy of the reference light beam are directed into the combined beam by the second beam splitter. In another embodiment, the first beam splitter is a non 50/50 beam splitter and the second beam splitter is an approximately 50/50 beam splitter. An optical circulator is provided to enable the sample light beam to bypass the first beam splitter after interaction with a sample.

Abstract: An interferometer of the present invention includes: a splitting element which splits an incident light beam into a first split beam and a second split beam; and a first phase compensator which is positioned in an optical path of the first split beam, and which compensates a phase difference occurring between the first split beam and the second split beam upon splitting of the incident light beam by said splitting element.

Abstract: An imaging-type interferometric optical profiler splits a beam reflected from a sample into two beam portions. One portion is a reference beam and the other a sample beam. The reference and sample beams are combined to create interference patterns which are used to obtain a surface profile of the sample. Since vibration of the sample causes the same optical path change, and no reference mirror is used, the interferometric optical profiler is relatively vibration-insensitive and has a fast measurement speed.

Abstract: Methods and compositions are provided for detecting biomolecular interactions. The use of labels is not required and the methods can be performed in a high-throughput manner. The invention also provides optical devices useful as narrow band filters.

Abstract: Light from a broadband source (4) is directed along a sample path (SP) towards a region of a sample surface (7) and along a reference path (RP) towards a reference surface (6) such that light reflected by the region of the sample surface and light reflected by the reference surface interfere. A mover (11) effects relative movement along a scan path between the sample surface (7) and the reference surface (6). A detector (10) senses light intensity at intervals to provide a series of intensity values representing interference fringes produced by a region of a sample surface.

Abstract: The present relates generally to methods, systems and apparatuses for three dimensional and cross-sectional imaging of objects (e.g., silicon) and subjects at a nanometer-scale resolution using short wave-length (e.g., extreme ultra-violet) light.

Abstract: A system for evaluation of optical quality of an optical device includes a light source configured to generate light, the generated light be received by an optical device. An interferometric lens apparatus is removably mounted to the optical device to generate interference fringes. A camera device is configured to receive and display the interference fringes, and a computer configured to analyze the interference fringes received from the camera device to determine aberrations of the optical device and generate a recommendation to correct the determined aberrations. Methods for evaluating the optical quality of an optical device are also described.

Abstract: An improved condition testing system and method includes a structure including a semiconductor material with a target portion and a second portion. The target portion has a first feature when at least one of the following occurs: an external force is received by the second portion of the structure and an internal condition occurs in the target portion. The system and method further has a grating shaped and located to produce a first optical interference pattern when the target portion and the grating are exposed to non-invasive illumination and when the target portion has the first feature. Further implementations use a second grating spaced apart from the first grating.

Abstract: Methods, systems, and computer program products for removing undesired artifacts in Fourier domain optical coherence tomography (FDOCT) systems using integrating buckets are disclosed. According to one aspect, a method includes introducing a variable phase delay between a reference arm and a sample arm of an FDOCT interferometer using sinusoidal phase modulation. Further, the method includes acquiring an interferometric intensity signal using an integrating buckets technique. The method also includes resolving the interferometric intensity signal to remove undesired artifacts.

Abstract: Sensor interrogation systems based on optical phase changes are configured to quantify analytes. Sensor chips and wells can include light scattering regions, light absorbing regions, or tilted regions to reduce or eliminate unwanted portions of an interrogation optical beam. In some examples, a spatial phase modulation is used to compensate static birefringence or to provide a selected sensor bias point. Phase changes can be detected based on state of polarization using interferometry. Optical resonator structures can be used to enhance phase changes to simplify detection of optical phase changes.