Abstract: A multilayer optical film including a stack of microlayers arranged into optical repeat units. At a design angle of incidence, such as normal incidence, the stack provides a 1st order reflection band, a 2nd order reflection band, and optionally a 3rd order reflection band. The 2nd order reflection band substantially overlaps the 1st and/or 3rd order reflection bands to form a single wide reflection band. The wide reflection band may cover at least a portion of visible and infrared wavelengths. The multilayer optical film may include an additional optical layer which maybe be an anti-glare layer and/or may be an absorbing layer. The multilayer optical film is suitable for use as a window film.

Abstract: An opaque cover for a capacitive sensor is provided. The cover includes a transparent substrate and a black color stack disposed adjacent the transparent substrate. The black color stack includes a pigment stack having a first dielectric layer, a second dielectric layer, and a first light absorbing layer positioned between the first and second dielectric layers. The first dielectric layer has a first refractive index. The second dielectric layer has a second refractive index different from the first refractive index. The black color stack also includes a plurality of second light absorption layers interleaved with a plurality of third dielectric layers.

Abstract: An insulating glass (IG) window unit includes first and second substrates, and a low-emissivity (low-E) coating supported by one of the substrates. The low-E coating has two silver based infrared (IR) reflecting layers and allows the IG window unit to realize an increased SHGC to U-value ratio, and an increased thickness ratio of an upper silver based layer of the coating to a bottom silver based layer of the coating. The low-E coating is designed to have a low film-side reflectance, so that for example when the low-E coating is used on surface number three of an IG window unit the IG window unit can realize reduced visible reflectance as viewed from the outside of the building on which the IG window unit is mounted or is to be mounted.

Abstract: The invention provides a glazing sheet and a low-emissivity coating on the glazing sheet. The low-emissivity coating comprises, in sequence moving outwardly from the glazing sheet, a layer comprising oxide film, nitride film, or oxynitride film, an infrared-reflective layer, a nickel-aluminum blocker layer, and an oxide layer. Also provided are methods of depositing such a low-emissivity coating.

Abstract: An optical element in which transmittance of light monotonically decreases from a center portion toward a peripheral portion, the optical element includes an absorbing material portion made of a material that absorbs a part of light and formed such that its thickness monotonically increases from the center portion toward the peripheral portion; and a transparent material portion made of a material that transmits light and is stacked on the absorbing material portion, a total thickness of the absorbing material portion and the transparent material portion being substantially constant.

Abstract: The invention provides a glazing sheet and a coating on the glazing sheet. The coating comprises, in sequence moving outwardly from the glazing sheet, a dielectric base coat comprising oxide film, nitride film, or oxynitride film, a first infrared-reflective layer, a first nickel-aluminum blocker layer in contact with the first infrared-reflective layer, a first dielectric spacer coat comprising an oxide film in contact with the first nickel-aluminum blocker layer, a second infrared-reflective layer, a second nickel-aluminum blocker layer in contact with the second infrared-reflective layer, a second dielectric spacer coat comprising an oxide film in contact with the second nickel-aluminum blocker layer, a third infrared-reflective layer, a third nickel-aluminum blocker layer in contact with the third infrared-reflective layer, and a dielectric top coat comprising an oxide film in contact with the third nickel-aluminum blocker layer. Also provided are methods of depositing such a coating.

Abstract: An image sensor for short-wavelength light includes a semiconductor membrane, circuit elements formed on one surface of the semiconductor membrane, and a pure boron layer on the other surface of the semiconductor membrane. An anti-reflection or protective layer is formed on top of the pure boron layer. This image sensor has high efficiency and good stability even under continuous use at high flux for multiple years. The image sensor may be fabricated using CCD (charge coupled device) or CMOS (complementary metal oxide semiconductor) technology. The image sensor may be a two-dimensional area sensor, or a one-dimensional array sensor.

Abstract: A multilayer stack displaying a red omnidirectional structural color. The multilayer stack includes a reflector layer, a dielectric layer extending across the reflector layer, and an absorbing layer extending across the dielectric layer. The dielectric layer reflects more than 70% of incident white light that has a wavelength greater than 580 nanometers (nm). In addition, the absorbing layer absorbs more than 70% of the incident white light with a wavelength less than 580 nm. In combination, the reflector layer, dielectric layer, and absorbing layer form an omnidirectional reflector that reflects a narrow band of electromagnetic radiation with a center wavelength between 580-680 nm, has a width of less than 200 nm wide and a color shift of less than 100 nm when the reflector is viewed from angles between 0 and 45 degrees.

Abstract: A multilayer polymeric reflector is provided which comprises: a) a plurality of first optical layers, each first optical layer comprising a polyester having terephthalate comonomer units and ethylene glycol comonomer units, the polyester having a glass transition temperature, where each first optical layer is oriented, and b) a plurality of second optical layers disposed in a repeating sequence with the plurality of first optical layers, each second optical layer comprising a blend of polymethyl methacrylate (PMMA) and polyvinylidene fluoride (PVDF), where the blend has a glass transition temperature less than the glass transition temperature of the polyester comprising the first optical layers, and where the amount of PVDF in the PMMA/PVDF blend is greater than and not equal to about 40% and not more than about 65%. Articles comprising the multilayer polymeric reflector are also provided.

Abstract: Light management film constructions contain a first optical film having a first major surface and a second major surface opposite the first major surface. The first major surface is a microstructured surface with asymmetrical structures. The asymmetrical structures form an ordered arrangement of a plurality of multi-sided refractive prisms, with the multi-sided refractive prisms having a cross section of 3 or greater sides. A second optical film contacts and is bonded to substantially all of the structures of the first major structured surface of the first optical film. The light management constructions can be incorporated into optical articles such as windows.

Abstract: A method of manufacture of an extreme ultraviolet reflective element includes: providing a substrate; forming a multilayer stack on the substrate, the multilayer stack includes a plurality of reflective layer pairs having a first reflective layer and a second reflective layer for forming a Bragg reflector; and forming a capping layer on and over the multilayer stack, the capping layer formed from titanium oxide, ruthenium oxide, niobium oxide, ruthenium tungsten, ruthenium molybdenum, or ruthenium niobium, and the capping layer for protecting the multilayer stack by reducing oxidation and mechanical erosion.

Abstract: A method aleviating blistering, cracking and chipping in topmost layers of a multilayer system exposed to reactive hydrogen, when producing a reflective optical element (50) having a maximum reflectivity at an operating wavelength of 5 nm to 20 nm. A multilayer system (51) composed of 30-60 stacks (53) is applied to a substrate (52). Each stack has a layer (54) of thickness dMLs composed of a high refractive index material and a layer (55) of thickness dMLa composed of a low refractive index material. The thickness ratio is dMLa/(dMLa+dMLs)=?ML. Two to five further stacks (56) are applied to the multilayer system. at least one further stack having a layer (54) of thickness ds composed of a high refractive index material and a layer (55) of thickness da composed of a low refractive index material, wherein the thickness ratio is da/(da+ds)=? and wherein ???ML.

Abstract: Evanescently-coupled planar waveguides for enhancing total internal reflection fluorescence microscopy are disclosed. The waveguides include multiple thin layers of one or more materials on a cover slip arranged resonantly enhance the optical field at the surface of the layer stack by evanescently coupling to a leaky guided mode.

Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.

Abstract: A near-infrared cut filter according to the present invention includes a repeated layered structure of a high-refractive index layer, a middle-refractive index layer, and a low-refractive index layer, and includes a transmission band where a mean transmittance is 85% or higher in a wavelength range of 400 nm to 700 nm, and a stopband having a width of 100 nm to 280 nm where a mean transmittance is 10% or lower in a wavelength range of 750 nm to 1100 nm.

Abstract: To provide a liquid composition capable of forming a coating film which has sufficient ultraviolet-absorbing ability and infrared-absorbing ability. A liquid composition for forming a coating film comprising an infrared absorber selected from indium tin oxide, antinomy tin oxide and a composite tungsten oxide, an ultraviolet absorber selected from a benzophenone compound, a triazine compound and a benzotriazole compound, a dispersing agent having an acid value and/or an amine value, a binder component and a liquid medium, wherein the dispersing agent is contained in a content such that the product of the sum (mgKOH/g) of the acid value and the amine value of the dispersing agent, and the mass ratio of the dispersing agent to the infrared absorber, is from 2 to 30 (mgKOH/g).

Abstract: A polycrystalline chemical vapour deposited (CVD) diamond wafer comprising: a largest linear dimension equal to or greater than 70 mm; a thickness equal to or greater than 1.3 mm; and one or both of the following characteristics measured at room temperature (nominally 298 K) over at least a central area of the polycrystalline CVD diamond wafer, said central area being circular, centred on a central point of the polycrystalline CVD diamond wafer, and having a diameter of at least 70% of the largest linear dimension of the polycrystalline CVD diamond wafer: an absorption coefficient ?0.2 cm?1 at 10.6 ?m; and a dielectric loss coefficient at 145 GHz, of tan ??2×10?4.

Abstract: A multi-layer photonic structure may include alternating layers of high index material and low index material having a form [H(LH)N] where, H is a layer of high index material, L is a layer of low index material and N is a number of pairs of layers of high index material and layers of low index material. N may be an integer?1. The low index dielectric material may have an index of refraction nL from about 1.3 to about 2.5. The high index dielectric material may have an index of refraction nH from about 1.8 to about 3.5, wherein nH>nL and the multi-layer photonic structure comprises a reflectivity band of greater than about 200 nm for light having angles of incidence from about 0 degrees to about 80 degrees relative to the multi-layer photonic structure. The multi-layer photonic structure may be incorporated into a paint or coating system thereby forming an omni-directional reflective paint or coating.

Abstract: A mirror (1) for the EUV wavelength range having a reflectivity of greater than 40% for at least one angle of incidence of between 0° and 25° includes a substrate (S) and a layer arrangement, wherein the layer arrangement has at least one non-metallic individual layer (B, H, M), and wherein the non-metallic individual layer (B, H, M) has a doping with impurity atoms of between 10 ppb and 10%, in particular between 100 ppb and 0.1%, providing the non-metallic individual layer (B, H, M) with a charge carrier density of greater than 6*1010 cm?3 and/or an electrical conductivity of greater than 1*10?3 S/m, in particular with a charge carrier density of greater than 6*1013 cm?3 and/or an electrical conductivity of greater than 1 S/m.

Abstract: An optical element (14) transparent for radiation with a wavelength ? in the ultraviolet wavelength range below 250 nm, in particular at 193 nm, comprises a substrate (17) with a refractive index ns larger than 1.6, and an antireflection coating (16) formed on at least part of the surface of the substrate (17) between the substrate (17) and an ambient medium with a refractive index nA, preferably with nA=1.0. The antireflection coating (16) consists of a single layer of a material with a refractive index nL of about nL=?{square root over (nAnS)}, in particular nL>1.3, and the optical thickness dL of the single layer is about ?/4. The optical element (14) is preferably part of a projection objective (5) in a microlithography projection exposure apparatus (1) and located adjacent to a light-sensitive substrate (10).

Abstract: An optical module includes an optical waveguide, at least one beam splitter and a light source. The optical waveguide has a first surface, a second surface and a light incidence surface. An interior angle between the light incidence surface and the first surface is ?. A distance between the first and the second surfaces is T. A refractive index of the optical waveguide is n. Each beam splitter and the first surface have a first intersection point on a reference plane perpendicular to the first surface, and the light incidence surface and the second surface have a second intersection point having a first orthogonal projection on the first surface. A distance between the first orthogonal projection and the first intersection point closest to the light incidence surface is H. An incidence angle of a beam at the light incidence surface is a, and a ? sin - 1 ? { n × sin - 1 ? [ 90 ? ° - ? - tan - 1 ? ( H T ) ] } .

Abstract: There may be included: a master oscillator configured to output pulsed laser light; two or more power amplifiers disposed in an optical path of the pulsed laser light to amplify the pulsed laser light; and an optical isolator provided between adjacent two of the power amplifiers in the optical path of the pulsed laser light, and configured to suppress transmission of light traveling from the power amplifiers to a side where the master oscillator is provided.

Abstract: A diffractive optics element includes a substrate configured of a sapphire substrate and a diffractive optics structure, provided on the substrate, that forms an image when a laser beam is incident thereon. The diffractive optics structure has a diffractive optics portion, and the diffractive optics portion has a base material and a diffractive optics layer disposed on the base material. The thickness of the base material is no greater than 20 ?m.

Abstract: Provided are a semiconductor device manufacturing method and a substrate processing apparatus that are capable of increasing a work function of a film to be formed, in comparison with a related art. The method comprises: (a) supplying a metal-containing gas simultaneously with one selected from the group consisting of an oxygen-containing gas, a halogen-containing gas and combinations thereof into a processing chamber accommodating the substrate; and (b) supplying a nitrogen-containing gas with one of the oxygen-containing gas, the halogen-containing gas and the combinations thereof into the processing chamber.

Abstract: A retroreflective article and method is provided. The retroreflective article includes a first transparent layer having a back surface with retroreflective prisms, and a planar front surface that has an index of refraction n1. A second transparent layer having an index of refraction n2 is less than n1 overlies the back surface of the first layer. The second layer includes an array of uniform nanostructures of transparent material that define pores having a width that is less than one half of the wavelength of visible light. The nanostructures may be an array of parallel, same-sized nanorods that are obliquely oriented with respect to the first transparent layer, or a grid-like or parallel array of tapered nano-ridges of uniform size that define tapered pores or tapered grooves. The second layer preferably has a porosity greater than 60% so that the resulting index of refraction n1 is no larger than about 1.20.

Abstract: A multi-reflector lighting apparatus including a reflector having a reflecting layer deposited on a base layer. The multi-reflector lighting apparatus further includes a first oxide layer deposited on the reflecting layer. The multi-reflector lighting apparatus further includes a second oxide layer deposited on the first oxide layer. The multi-reflector lighting apparatus further includes an alternating plurality of a relatively low refractive index oxide layer material and a relatively high refractive index oxide layer material deposited on the second oxide layer.

Abstract: The present disclosure provides one embodiment of a method for extreme ultraviolet lithography (EUVL) process. The method includes loading a mask to a lithography system. The mask includes defect-repaired regions and defines an integrated circuit (IC) pattern thereon. The method also includes setting an illuminator of the lithography system in an illumination mode according to the IC pattern, configuring a pupil filter in the lithography system according to the illumination mode and performing a lithography exposure process to a target with the mask and the pupil filter by the lithography system in the illumination mode.

Abstract: The present invention provides materials, structures, and methods for III-nitride-based devices, including epitaxial and non-epitaxial structures useful for III-nitride devices including light emitting devices, laser diodes, transistors, detectors, sensors, and the like. In some embodiments, the present invention provides metallo-semiconductor and/or metallo-dielectric devices, structures, materials and methods of forming metallo-semiconductor and/or metallo-dielectric material structures for use in semiconductor devices, and more particularly for use in III-nitride based semiconductor devices. In some embodiments, the present invention includes materials, structures, and methods for improving the crystal quality of epitaxial materials grown on non-native substrates.

Abstract: An optical filter comprises a base material (i) which comprises a transparent resin layer comprising a compound (Z) having an absorption maximum in the wavelength region of from 600 to 850 nm; and a dielectric multilayer film provided on at least one surface of the base material (i). The optical filter selectively transmits visible rays and a part of near-infrared rays, and the optical filter satisfies specific requirements.

Abstract: One disclosed method for designing an integrated computational element (ICE) core includes generating with a computer a plurality of predetermined ICE core designs having a plurality of thin film layers, wherein generating the plurality of predetermined ICE core designs includes iteratively varying a thickness of each thin film layer by applying coarse thickness increments to each thin film layer, calculating a transmission spectrum for each predetermined ICE core design, calculating a performance of each predetermined ICE core design based on one or more performance criteria, identifying one or more predictive ICE core designs based on the performance of each predetermined ICE core design, and optimizing the one or more predictive ICE core designs by iteratively varying the thickness of each thin film layer with fine thickness increments, wherein the one or more predictive ICE core designs are configured to detect a particular characteristic of interest.

Abstract: An optical element is provided includes an optical layer having a flat incident surface on which light is incident and a wavelength-selective reflective layer disposed in the optical layer. Of light incident on the incident surface at an incident angle (?, ?), the optical element selectively directionally reflects light in at least one specific wavelength range in at least one direction other than a specular reflection direction (??, ?+180°) while transmitting light in at least one wavelength range other than the specific wavelength range, and is transparent to light in at least one wavelength range other than the specific wavelength range.

Abstract: An infrared shielding film includes a laminated body including a high refractive index layer and a low refractive index layer, the high refractive index layer and the low refractive index layer being alternately laminated and including a high refractive index material and a low refractive index material, respectively, and the high refractive index material and the low refractive index material having mutually different refractive indexes. The infrared film also includes a primary reflection unit providing a primary reflection band with reflectivity exceeding 60% in near-infrared region in reflection spectra of the infrared shielding film for incident light angles of 0° and 60°. In a short-wavelength side of the primary reflection band, wavelengths exhibiting 70% reflectivity of the peak value in the primary reflection band are referred to as s(0) nm and s(60) nm, respectively, a relationship s(60) nm>700 nm is satisfied.

Abstract: An anti-reflection coating having an three-layer structure comprising first to third layers formed in this order on a substrate, the substrate having a refractive index of 1.6-1.9, the first layer having a refractive index of 1.37-1.57, the second layer having a refractive index of 1.75-2.5, and the third layer having a refractive index of 1.18-1.32, to light in a wavelength range of 550 nm; the third layer being formed by silica aerogel; and the first and second layers containing no Al2O3.

Abstract: A laser reflecting has a low transmittance at one or more laser wavelengths while substantially transmitting all other wavelengths in the spectral range of interest, is coated on one or both sides of an absorbing or non-absorbing substrate. A laser reflecting filter on both sides of an absorbing substrate can result in an enhancement of the absorption of laser light by multiple reflections of the laser light in the absorbing substrate. The high transmittance of the laser-reflecting filter at non-laser wavelengths results in a relatively high overall transmittance through the coated substrate. In the specific case of laser reflecting coatings on a lens to protect an eye, this allows a high luminous transmittance and good color discrimination.

Abstract: An infrared filter includes a transparent substrate, and an infrared-filtering multilayer film. The infrared-filtering multilayer film is coated on the transparent substrate, and the infrared-filtering multilayer film includes a plurality of the first kind of film layers, a plurality of the second kind of film layers, a plurality of the third kind of film layers and a plurality of the fourth kind of film layers, wherein the four kinds of film layers are arranged in order of gradient refractive indexes. At least two kinds of film layers are made of composite materials.

Abstract: A mirror (1a; 1a?; 1b; 1b; 1c; 1c?) with a substrate (S) and a layer arrangement configured such that light (32) having a wavelength below 250 nm and incident on the mirror at at least an angle of incidence of between 0° and 30° is reflected with more than 20% of its intensity. The layer arrangement has at least one surface layer system (P??) having a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include a high refractive index layer (H??) and a low refractive index layer (L??). The layer arrangement has at least one graphene layer. Use of graphene (G, SPL, B) on optical elements reduces surface roughness to below 0.1 nm rms HSFR and/or protects the EUV element against a radiation-induced volume change of more than 1%. Graphene is also employed as a barrier layer to prevent layer interdiffusion.

Abstract: An infrared-transmitting film which is excellent in mechanical strength and environmental resistance. The infrared-transmitting film comprises a buffer layer formed on a surface of an infrared optical substrate and having a Vickers hardness greater than that of the substrate and an environmental resistance improving layer provided in contact with the buffer layer and having a Vickers hardness greater than that of the buffer layer.

Abstract: A multiple glazing unit with thermal isolation properties, obtained by associating at least two glass substrates, which substrates are separated by gas-filled cavities, the multiple glazing unit incorporating: a first low-E film multilayer including at least one functional metallic film; and a second low-E film multilayer including at least one functional film made of a transparent conductive oxide, and a film made essentially of silicon oxide deposited on the function film made of transparent conductive oxide.

Abstract: An insulating glass (IG) window unit includes first and second substrates, and a low-emissivity (low-E) coating supported by one of the substrates. The low-E coating has two silver based infrared (IR) reflecting layers and allows the IG window unit to realize an increased SHGC to U-value ratio, and an increased thickness ratio of an upper silver based layer of the coating to a bottom silver based layer of the coating. The low-E coating is designed to have a low film-side reflectance, so that for example when the low-E coating is used on surface number three of an IG window unit the IG window unit can realize reduced visible reflectance as viewed from the outside of the building on which the IG window unit is mounted or is to be mounted.

Abstract: This invention relates to a transparent conductive coating that is substantially transparent to visible light and is designed to have a visible reflectance which more closely matches that the visible reflectance of the underlying substrate. In certain example embodiments, the transparent conductive multilayer coating includes a silver layer(s) and may be used as an electrode(s) in a capacitive touch panel so as to provide for an electrode(s) transparent to visible light but without much visibility due to the substantial matching visible reflection design.

Abstract: A transparent substrate provided with a stack of thin layers includes an alternation of n functional layers having reflection properties in the infrared region and/or in solar radiation with n?2 and of n+1 coatings including one or more dielectric layers, so that each functional layer is positioned between two coatings, the coatings and the functional layers are numbered according to their position with respect to the transparent substrate, the lower coating 1 is placed above the transparent substrate and below the functional layer 1, the intermediate coatings 2 to n are placed between two functional layers and the upper coating n+1 is placed above the functional layer n, wherein at least one of the upper or intermediate coatings 2 to n+1 includes at least one barrier coating including at least two barrier layers, one layer including silicon and one layer based on aluminum nitride.

Abstract: In one aspect, a multi-layer absorber is disclosed, which comprises a proximal layer having a radiation-receiving surface adapted for receiving electromagnetic radiation, and a distal layer disposed adjacent the proximal layer to receive at least a portion of the received radiation, if any, transmitted through said proximal layer, wherein said proximal layer exhibits an index of refraction having a real part that is less than the real part of an index of refraction of the said distal layer for at least one frequency of the electromagnetic radiation in a range of about 1 GHz to about 110 GHz.

Abstract: A multi-layer laminated film includes layers composed using a thermoplastic resin A and layers composed using a thermoplastic resin B, which A layers and B layers are alternately laminated in 51 or more layers, wherein the film has: a heat shrinkage stress of 0.5 MPa to 5 MPa at 150° C. in the longitudinal and width directions of the film; and a heat shrinkage stress kick-off temperature of 110° C. or lower in at least one of the longitudinal and width directions of the film.

Abstract: Disclosed herein are systems, methods, and apparatus for forming low emissivity panels. A first dielectric layer is disposed over a substrate and includes a bi-metal oxide having tin and bismuth or niobium. A seed layer is disposed directly on the first dielectric layer. A reflective layer including silver is disposed directly on the seed layer. A barrier layer is disposed above the reflective layer. The barrier layer includes one of a nickel chromium titanium aluminum alloy or a nickel chromium titanium aluminum oxide. The nickel chromium titanium aluminum alloy or the nickel chromium titanium aluminum oxide includes between about 5% and about 10% by weight nickel, between about 25% and about 30% by weight chromium, between about 30% and about 35% by weight titanium, and between about 30% and about 35% by weight aluminum.

Abstract: Techniques include receiving a design of an integrated computational element (ICE) including (1) specification of a substrate and multiple layers, their respective target thicknesses and refractive indices, adjacent layer refractive indices being different from each other, and a notional ICE fabricated based on the ICE design being related to a characteristic of a sample, and (2) indication of target ICE performance; forming one or more of the layers of an ICE based on the ICE design; in response to determining that an ICE performance would not meet the target performance if the ICE having the formed layers were completed based on the received ICE design, updating the ICE design to a new total number of layers and new target layer thicknesses, such that performance of the ICE completed based on the updated ICE design meets the target performance; and forming some of subsequent layers based on the updated ICE design.

Abstract: A mirror (1a; 1a?; 1b; 1b?; 1c; 1c?) for the EUV wavelength range and having a substrate (S) and a layer arrangement, wherein the layer arrangement includes at least one surface layer system (P??) consisting of a periodic sequence of at least two periods (P3) of individual layers, wherein the periods (P3) include two individual layers composed of different materials for a high refractive index layer (H??) and a low refractive index layer (L??), wherein the layer arrangement includes at least one surface protecting layer (SPL, Lp) or at least one surface protecting layer system (SPLS) having a thickness of greater than 20 nm, and preferably greater than 50 nm.

Abstract: A light-reflecting material of a radiation detector, which also comprises photo-detecting elements and imaging elements adjacent to the photo-detecting elements, is provided. Typically, epoxy resin is used as the light-reflecting material. A tough, pliable resin may be used for the photo-detecting elements. This has the advantage of reducing thermal stresses inside the radiation detector, thus reducing the risk of delamination due to e.g. temperature shifts. Moreover, the tough, pliable resin preferably also has a low refractive index, which may increase the scattering co-efficient of the resin as compared to epoxy resin, which has a refractive index of 1.58. The layer thickness of a low-refractive index resin may thereby be reduced as compared to the layer thickness of epoxy resin for a given level of optical crosstalk. Preferable resins are silicon resins and resins of thermoplastic fluoropolymers.

Abstract: Certain example embodiments of this invention relate to articles including anticondensation coatings that are exposed to an external environment, and/or methods of making the same. In certain example embodiments, the anticondensation coatings may be survivable in an outside environment. The coatings also may have a sufficiently low sheet resistance and hemispherical emissivity such that the glass surface is more likely to retain heat from the interior area, thereby reducing (and sometimes completely eliminating) the presence condensation thereon. The articles of certain example embodiments may be, for example, skylights, vehicle windows or windshields, IG units, VIG units, refrigerator/freezer doors, and/or the like.

Abstract: A multilayer film includes 50 or more layers of each of two or more thermoplastic resins having different optical properties are alternately laminated with each other, wherein the average reflectance in a wavelength range of 900 to 1,200 nm is 70% or higher; both of the differences between the a* values (?a*) and between the b* values (?b*), respectively, of transmitted light incoming at an angle of 12° and of transmitted light incoming at an angle of 45° are 10 or less; and the multilayer film comprises a bandwidth of not less than 50 nm where the transmittance is 80% or lower in a wavelength range of 400 to 800 nm.

Abstract: An EUV mirror arrangement (100) has a multiplicity of mirror elements (110, 111, 112) which are arranged alongside one another and jointly form a mirror surface of the mirror arrangement. Each mirror element has a substrate (120) and a multilayer arrangement (130) applied on the substrate and having a reflective effect with respect to radiation from the extreme ultraviolet range (EUV), said multilayer arrangement comprising a multiplicity of layer pairs (135) having alternate layers composed of a high refractive index layer material and a low refractive index layer material. The multilayer arrangement has an active layer (140) arranged between a radiation entrance surface and the substrate and consisting of a piezoelectrically active layer material, the layer thickness (z) of which active layer can be altered by the action of an electric field. For each active layer provision is made of an electrode arrangement for generating an electric field acting on the active layer.