Abstract: Novel thin film optical filters have an integral air layer. The frustrated total internal reflection (FTIR) phenomenon, combined with thin film interference, is used to effectively control the polarization properties of thin film coatings operating at oblique angles. The invention is applicable to high-performance thin film polarizing beam-splitters, non-polarizing beam-splitters, non-polarizing cut-off filters and non-polarizing band-pass filters, and any other thin film coatings that require the control of polarization effect. The low index layer offers an improvement in performance and the simplification of the thin film optical filter coating designs by reducing the total number of layers and the total layer thicknesses to minimize the angles of incidence and the size of the filter substrates, thereby minimizing the contact area and hence reducing the manufacturing costs.

Abstract: An optical element for reflecting solar light has excellent weather resistance, and furthermore, a high reflectance in a wide band. When solar light enters an optical element (OE), light (L1) in a short wavelength band among the solar light is reflected by a dielectric multilayer film (DF). Other light (L2) in longer wavelength bands are passed through the dielectric multilayer film (DF), then a base material (SS), and reflected by a metal deposition film (MV) to pass through the base material (SS) and the dielectric multilayer film (DF). Thus, high reflectance in a wide band is ensured.

Abstract: In a tunable interference filter according to the invention, a second substrate includes a light transmission hole and alight transmissive member provided within the light transmission hole, and the light transmission hole is formed in a tapered shape having a diameter dimension of an inner circumferential surface increasing from the first surface toward the second surface, and the light transmissive member has a light incident surface in parallel to the first reflection surface and the second reflection surface, a light exiting surface in parallel to the first reflection surface and the second reflection surface, and a tapered side surface having a diameter dimension increasing from the first surface toward the second surface, and the tapered side surface is in contact with the inner circumferential surface of the light transmission hole.

Abstract: A light dispersion filter is composed of three or more optically transparent layers each having a value equal to the value of the product of the refractive index and thickness of the optically transparent layer and transmitted light, and a plurality of partially reflective layers arranged alternately with the optically transparent layers and having predetermined reflectivities. Alternatively, a light dispersion filter has a plurality of etalon resonators which are arranged in series such that the value of the product of the refractive index of air and the interval of the etalon resonators is equal to the value of the product of the refractive index and thickness of the optically transparent layers.

Abstract: A method and apparatus involve: routing first radiation and second radiation respectively having first and second wavelengths that are different along respective first and second optical paths; reflecting the first radiation with an optical component as the first radiation is traveling along the first optical path; and reflecting the second radiation with the optical component as the second radiation is traveling along the second optical path, the optical component causing a first optical path length traveled by the first radiation along the first optical path from arrival at to departure from the optical component to be shorter than a second optical path length traveled by the second radiation along the second optical path from arrival at to departure from the optical component.

Abstract: The present invention discloses a non-quarter wave multilayer structure having a plurality of alternating low index of refraction material stacks and high index of refraction material stacks. The plurality of alternating stacks can reflect electromagnetic radiation in the ultraviolet region and a narrow band of electromagnetic radiation in the visible region. The non-quarter wave multilayer structure, i.e. nLdL?nHdH??0/4, can be expressed as [A 0.5 qH pL(qH pL)N 0.5 qH G], where q and p are multipliers to the quarter-wave thicknesses of high and low refractive index material, respectively, H is the quarter-wave thickness of the high refracting index material; L is the quarter-wave thickness of the low refracting index material; N represents the total number of layers between bounding half layers of high index of refraction material (0.5 qH); G represents a substrate and A represents air.

Abstract: The present invention discloses a multi-layer fluoropolymeric film that is useful as a light capture front sheet in solar modules, and more broadly as an antireflection layer. The present invention further discloses a glass shaped article having a multi-layer fluoropolymeric film disposed upon the surface thereof. The shaped article is useful in applications where it is desirable to reduce reflection of incident light.

Abstract: The invention relates to a glass substrate with interference colouration for a facing panel, comprising a glass sheet covered on one of the faces thereof by a stack of coatings including successively at least: a first transparent coating made from a dielectric material having an optical thickness at least greater than or equal to 5 nm and at most less than or equal to 258 nm; a semi-transparent functional coating having a geometric thickness at least greater than or equal to 0.1 nm and at most less than or equal to 50 nm; a second transparent coating made from a dielectric material and having an optical thickness at least greater than or equal to 20 nm and at most less than or equal to 300 nm; and a coating providing opacity or quasi-opacity and having a geometric thickness at least greater than or equal to 30 nm.

Abstract: The present invention relates to an optical bandpass filter system that has at least one combination of a bandpass filter that provides a first nanostructured metallic layer (4) and a bandstop filter comprising a second nanostructured metallic layer (7), which are arranged one behind the other, and the layer thicknesses of which are different. The bandstop filter is tuned to the bandpass filter in such a way that it blocks a contiguous wavelength range that partially overlaps a pass-band width of the bandpass filter. With the suggested optical filter system it is possible to create various filter characteristics side by side in a small space with a small pass-band width.

Abstract: A light extraction film laminated to a glass substrate for organic light emitting diode (OLED) devices. The light extraction film includes a flexible substantially transparent film, a low index nanostructured layer applied to the film, and a high index planarizing backfill layer applied over the nanostructured layer. A glass substrate is laminated to the flexible substantially transparent film on a side opposite the nanostructured layer and including an ultra-low index region between the film and the glass substrate. The ultra-low index region is used to reduce optical losses occurring with the glass substrate.

Abstract: A reflective optical element e.g. for use in EUV lithography, configured for an operating wavelength in the soft X-ray or extreme ultraviolet wavelength range, includes a multilayer system (20) with respective layers of at least two alternating materials (21, 22) having differing real parts of the refractive index at the operating wavelength. Preferably, at least at an interface from the material (21) having the higher real part of the refractive index to the material (22) having the lower real part of the refractive index, a further layer (23) of a nitride or a carbide of the material (22) having the lower real part is arranged. Particularly preferably the material (22) having the lower real part of the refractive index is lanthanum or thorium. Preferably, the layers (21, 22, 23) of at least one material are applied in a plasma-based process for manufacturing a reflective optical element as described.

Abstract: According to one embodiment, an interference filter includes a base body, a lower semi-transmissive layer, and an upper semi-transmissive layer. The base body includes a major surface. The lower semi-transmissive layer is provided on the major surface. The upper semi-transmissive layer is provided on the lower semi-transmissive layer. The base body, the lower and upper semi-transmissive layers form a first region to selectively transmit blue light, a second region to selectively transmit green light, and a third region to selectively transmit red light, arranged in a plane parallel to the major surface. A distance between the lower semi-transmissive layer and the upper semi-transmissive layer in the second region is shorter than a distance between the lower semi-transmissive layer and the upper semi-transmissive layer in the first region, and shorter than a distance between the lower semi-transmissive layer and the upper semi-transmissive layer in the third region.

Abstract: A laminated film includes a structure where each 200 layers or more of a layer composed of a resin A (A layer) and a layer composed of a resin B (B layer) are alternately laminated, wherein a relative reflectance in a wavelength range of 400 nm to 1000 nm is 30% or more, tensile stresses at 100% elongation in a longitudinal direction and a width direction of the film are 3 MPa or more and 90 MPa or less in a tensile test at 150° C., and the number of layers with a layer pair-thickness of 120 nm or more and less than 220 nm is 1.05 times or more to 2.5 times or less the number of layers with a layer-thickness of 220 nm or more and 320 nm or less.

Abstract: A method for designing a first optical filter, exhibiting a first filter performance satisfying a first preset criterion, and a second optical filter, exhibiting a second filter performance satisfying a second preset criterion, includes providing initial first and second filter designs for the first and second optical filters, respectively, as first and second ordered stacks of layers, respectively. A pair of layers, including a first layer, characterized by a first thickness, and a second layer, characterized by a second thickness, is selected from the first and second ordered stacks of layers. The first thickness is constrained to a first constrained thickness that is a positive integer multiple of the second thickness to yield a constrained first filter design. A predicted performance of the constrained first filter design is determined and compared with the first preset criterion for one of accepting and rejecting the constrained first filter design.

Abstract: A photonic crystal structure includes a nano structure layer including a plurality of nano particles of various sizes, and a photonic crystal layer on the nano structure layer. The plurality of nano particles are spaced apart from each other. The photonic crystal layer has a non-planar surface, and is configured to reflect light of a particular wavelength.

Abstract: An imaging optical system includes an aperture stop, a first lens group disposed on an object side of the aperture stop, a second lens group disposed on an image side of the aperture stop and a plate-like ND filter disposed close to a position of the aperture stop in an optical axis direction of the first and second lens groups, and the second lens group includes positive refracting power as a whole, the ND filter is configured to be retractable from the optical axis, and to attenuate a passing light amount.

Abstract: A mini-scope for multi-directional imaging is disclosed. The mini-scope includes an elongated mini-scoped body. An emissions aperture is disposed on the distal end of the elongated mini-scope body, which can be configured to emit a beam of optical energy propagating through a flexible optical conductor. A selective mirror is also positioned at the distal end of the elongated mini-scope body and is configured to selectively pass or reflect the beam of optical energy based on the optical characteristics of the beam. A solid state imaging device is further disposed on the distal end of the elongated mini-scope body for imaging illumination reflected by an external object in response to the beam of optical energy. This illumination is directed to pass through or reflect from the selective mirror to the camera based on optical characteristics of the beam.

Abstract: An article comprising a substrate and an anti-reflection coating, and methods for depositing the coating, are disclosed. The coating comprises (a) a first coating layer having a high refractive index deposited on the substrate; (b) an epoxide-silica coating layer deposited onto the high refractive index coating layer, comprising an inorganic silica component and an organic organo-silicate component, and (c) a silica coating layer consisting essentially of silica, deposited directly onto the epoxide-silica coating layer. The anti-reflection coating optionally comprises a stack of coating layers, between the first high refractive index coating layer and the epoxide-silica coating layer, having alternating a low refractive index and a high refractive index. Individual coating layer compositions, refractive indexes, and thicknesses are carefully controlled such that reflectance is minimized through destructive interference in the visible light wavelength range of 400 to 700 nm.

Abstract: This invention relates to methods of generating NP gallium nitride (GaN) across large areas (>1 cm2) with controlled pore diameters, pore density, and porosity. Also disclosed are methods of generating novel optoelectronic devices based on porous GaN. Additionally a layer transfer scheme to separate and create free-standing crystalline GaN thin layers is disclosed that enables a new device manufacturing paradigm involving substrate recycling. Other disclosed embodiments of this invention relate to fabrication of GaN based nanocrystals and the use of NP GaN electrodes for electrolysis, water splitting, or photosynthetic process applications.

Abstract: Provided are a filter having a metamaterial structure and a method of manufacturing the filter. The filter includes a first dielectric layer, a first fishnet pattern having one or more first holes partially exposing the first dielectric layer, a second dielectric layer covering the first fishnet pattern and the first dielectric layer, a plurality of reverse patterns having the same shape as those of the first holes, and disposed on the second dielectric layer over the first holes, and a third dielectric layer covering the reverse patterns and the second dielectric layer.

Abstract: An optical filter includes a substrate and a filter film attached on the substrate. The filter film has alternate layers of high reflective layers and low reflective layers to form a plurality of Fabry-Perot resonators. A basic optical thickness of the high reflective layers and the low reflective layers is one fourth a central wavelength (?0/4) of incident ray, and each of the Fabry-Perot resonators has two high reflector films and a spacer between the high reflector films. The spacers in the Fabry-Perot resonator, which is most proximal to the substrate, and in the Fabry-Perot resonator, which is most distal to the substrate, have an optical thickness respectively in a range between four times the basic optical thickness and fourteen times the basic optical thickness.

Abstract: The object is to easily expand a variable range of selective wavelengths without enlarging a device. A spectral device 1 of the present invention includes four band pass filters 11a to 11d through which a light L2 from a light source 3 is selectively transmitted within a wavelength range according to an incident angle of the light L2, and a tabular rotary table 10 in which the band pass filters 11a to 11d are installed upright on a principal surface 10a, and which is made rotatable around a rotational center C1 along the principal surface 10a, and the four band pass filters 11a to 11d are respectively disposed so that optical incidence planes 12 or optical emission planes 13 are inclined with respect to lines connecting the rotational center C1 on the principal surface 10a of the rotary table 10 and center points 15a and 15d of the bandpass filters 11a to 11d.

Abstract: A process for designing and manufacturing an omnidirectional structural color (OSC) multilayer stack. The process can include providing a digital processor operable to execute at least one module and a table of index of refraction values corresponding to different materials that are usable for manufacturing an OSC multilayer stack. An initial design for the OSC multilayer stack can be provided and at least one additional layer is added to the initial design OSC multilayer stack to create a modified OSC multilayer stack. In addition, the thickness of each layer of the modified OSC multilayer stack is calculated using a merit function module until an optimized OSC multilayer stack has been calculated.

Abstract: A static interferometric image device including a plurality of solidified liquid layers is formed over a substrate by an inkjet process such that the layers are lateral to one another. In some embodiments, the substrate includes pre-defined cavities, and the liquid layers are formed in the cavities. In other embodiments, the substrate includes a substantially planar, stepped, or continuously transitioning surface, and the solidified liquid layers are formed on the surface. Optical fillers or spacers are provided for defining interferometric gaps between absorbers and reflectors in the display device, based at least partially on an image that the display device is designed to display.

Abstract: In accordance with the invention, a filter is fabricated to take into account the effect of absorption by filter material. The method is exemplified by the fabricating of an ultraviolet light transmission filter for transmitting a band within the range 230-320 nanometers. The resulting filter comprises plurality of hard-coating, thin-film layers of alternating high and low index of refraction. The improved filter provides high transmission, sharp edge slopes, and deep and extended out-of-band blocking. As compared with currently available filters, the filter provides transmission up to three or more times greater, edge slopes up to four times sharper, and deep extended out-of-band blocking extending further, even through the visible range.

Abstract: An apparatus includes an optical filter having first and second passbands that are different, the optical filter including selectively operable first passband adjusting structure that varies a characteristic of the first passband without influencing the second passband. According to a different aspect, a method includes filtering radiation with an optical filter having first and second passbands that are different, and selectively varying a characteristic of the first passband without influencing the second passband.

Abstract: A variable reflectivity notch filter (100), suitable for use with a laser image projection source (1001) is provided. The variable reflectivity notch filter (100) defines a transmission curve (101) having a plurality of reflective peaks (102,103,104) each centered about a predetermined wavelength (105,106,107), which can correspond to output wavelengths from laser sources. Reflective peaks (204) corresponding to wavelengths that change with temperature are configured with wider widths (223) and lesser reflectivities (210) than are other reflective peaks (202,203). To provide enhanced color balance, lasers (821) corresponding to these reflective peaks (204) can be driven at higher output power. Variable reflectivity notch filters (100) are suitable for use in head-up displays as well as other applications.

Abstract: A display device is applied to a light sensing system. The display device includes a display module and a pattern layer. The pattern layer is made of optical material and formatted on the display module. The pattern layer includes patterned optical material and gaps without optical material. The pattern layer selectively reflects or absorbs invisible light with specific wavelength emitted from the display module, such that a light sensor cannot sense the invisible light reflected or absorbed by the optical material or just can sense a little invisible light through the optical material. However, the invisible light can be emitted out of the gaps without the optical material, such that the light sensor can selectively sense the invisible light. Based on the light sensing result, the light sensor can recognize the corresponding pattern.

Abstract: An optical filter includes a first substrate, a second substrate, a first reflective film that is disposed on the first substrate, a second reflective film that is disposed on the second substrate, first and second fixed electrodes that are disposed on the first substrate at positions located at the periphery of the first reflective film in plan view, and first and second variable electrodes that are disposed on the second substrate and face the first and second fixed electrodes. Slit portions of the second variable electrode are formed such that the first and second variable electrodes have a center symmetrical structure with the reflective film as its center.

Abstract: A variable wavelength interference filter includes a fixed substrate having a fixed reflecting film, a movable substrate having a movable reflecting film, and an electrostatic actuator including a fixed electrode and a movable electrode. The fixed electrode includes first and second fixed partial electrodes electrically isolated from each other. First and second extraction electrodes extending from the first and second fixed partial electrodes, respectively, are formed on the fixed substrate. The movable electrode is formed in a ring shape covering first and second facing regions facing the first and second fixed partial electrodes, respectively.

Abstract: A method for producing an optical article. A first layer that is light-transmissive is formed on an optical substrate directly or with an additional layer in between. A silicide material, light-transmissive thin film is formed on the surface of the first layer.

Abstract: The present invention relates to a thin-film element (30) having an interference layer structure for security papers, value documents and the like, having at least two semitransparent absorber layers (34, 38) and at least one dielectric spacing layer (36) arranged between the at least two absorber layers. According to the present invention, it is provided that the two absorber layers (34, 38) are each formed from a material having a complex refractive index N whose real part n and imaginary part k differ at least in a portion of the visible spectral range by a factor of 5 or more.

Abstract: An optical element includes: a first optical layer having a concavo-convex surface; a wavelength-selective reflective layer provided on the concavo-convex surface of the first optical layer; a second optical layer provided on the concavo-convex surface on which the wavelength-selective reflective layer is provided so as to fill the concavo-convex surface, and in the optical element described above, the wavelength-selective reflective layer includes a metal layer, a protective layer provided on the metal layer and containing a metal oxide as a primary component, and a high refractive index layer provided on the protective layer and containing a metal oxide other than zinc oxide as a primary component, and the wavelength-selective reflective layer selectively directionally reflects light in a specific wavelength band while transmitting light other than that in the specific wavelength band.

Abstract: Provided is a structure with an observation port. The structure with the observation port is provided with the observation port and an internal structure. The internal structure is located to the backside of the observation port and has a third reflection preventing film. The first reflection preventing film is a film that reduces reflected light by using light interference. Each of the second and third reflection preventing films has a surface comprising a plurality of convex portions, a distance between apexes of each adjacent two of which does not exceed the visible light wavelengths. Light obtained by combining light reflected by the surface of the first reflection preventing film, light reflected by the surface of the second reflection preventing film, and light reflected by the surface of the third reflection preventing film has a flat wavelength dispersion within the visible light range.

Abstract: A thin film interference filter system includes a plurality of stacked films having a determined reflectance; a modeled monitor curve; and a topmost layer configured to exhibit a wavelength corresponding to one of the determined reflectance or the modeled monitor curve. The topmost layer is placed on the plurality of stacked films and can be a low-index film such as silica or a high index film such as niobia.

Abstract: A wavelength variable interference filter includes: a first movable mirror disposed on a first substrate; a second movable mirror disposed so as to be opposed to the first movable mirror with a predetermined gap interposed therebetween; and an electrostatic actuator which varies the length of the gap between the mirrors. The first substrate has a first movable portion on which the first movable mirror is disposed, and a first linkage portion which holds the first movable portion in such a manner that the first movable portion can shift in the thickness direction of the substrate. The second substrate has a second movable portion on which the second movable mirror is disposed, and a second linkage portion which holds the second movable portion in such a manner that the second movable portion can shift in the thickness direction of the substrate.

Abstract: An optical filter and a lighting device using the same wherein the suppression of the melatonin secretion by the reception of light in the nighttime is prevented and the color of light is maintained. The optical filter has a mean transmissivity of a light beam in a wavelength range of about 480˜550 nm is about 30% or less. The optical filter is formed by at least molding a transparent resin and a resin composition material containing an orange color series florescent dye material, and, for 100 weight part of the transparent resin, the resin composition material containing about 0.005˜0.2 weight part of the orange color series florescent dye material is molded. This can prevent the suppression of the melatonin secretion in the nighttime. The color of light is maintained desirable. The optical filter may be applied to a lighting apparatus.

Abstract: The invention relates to an interference filter (100) for receiving an incident light (135) and selecting a light component of the incident light to be transmitted (115). The interference filter (100) includes a metal mirror (110), a dielectric mirror (130), and a spacer (120) placed between the metal mirror (110) and the dielectric mirror (130). The metal mirror (110) and the dielectric mirror (130) are configured to enable optical interference in the spacer (120) to select the light component of the incident light to be transmitted (115). Using one metal mirror and one dielectric mirror allows achieving a spectral response with high finesse and large rejection band while reducing the total number of layers in the filter and reducing the number of additional filters necessary for removing transmitted side bands, relative to prior art approaches.

Abstract: An antireflection coating is formed on a transparent substrate and includes an Al film having a transmittance of lower than 10% at a wavelength of 550 nm with a thickness of 25 nm and predominantly composed of aluminum (Al), and an Al—N film formed in at least one of an upper layer and a lower layer of the Al film, having a transmittance of equal to or higher than 10% at a wavelength of 550 nm with a thickness of 25 nm, predominantly composed of Al and at least containing a nitrogen (N) element as an additive. A specific resistance of the antireflection coating is equal to or lower than 1.0×10?2 O·cm, and a reflectance of a surface of the Al—N film is equal to or lower than 50% in a visible light region.

Abstract: Disclosed is an objective lens used for an optical pickup apparatus to perform writing and/or reading of an optical information recording medium, comprising an antireflective film on a surface of a light source side, wherein a light flux of wavelengths including a wavelength ?1 of 380 nm??1?420 nm and a wavelength ?2 of 630 nm??2?810 nm, is condensed on the medium, a numerical aperture on the light source side with respect to the wavelength ?1 is within a range of 0.8-0.9, and that with respect to the wavelength ?2 is 0.7 or less, and a band of the antireflective film is within a range of 700 nm-800 nm in a state where a reflectance of a light flux perpendicularly entering a central portion of the surface in a wavelength region from 400 nm to 1200 nm is 3.0% or less.

Abstract: A reflective optical element exhibits an increase in the maximum reflectivity at operating wavelengths in the extreme ultraviolet or soft x-ray wavelength range. A first additional intermediate layer (23a, 23b) and a second additional intermediate layer (24a, 24b) are provided between the absorber layer (22) and the spacer layer (21), wherein the first additional intermediate layer increases the reflectivity and the second additional intermediate layer (24a,b) prevents chemical interaction between the first additional intermediate layer (23a,b) and the adjoining spacer layer (21) and/or the absorber layer (22).

Abstract: A lithographic apparatus comprising a support configured to support a patterning device; a substrate table configured to hold a substrate; a projection system configured to project a pattern imparted to a radiation beam by the patterning device onto a target portion of the substrate; and a first multi-layer mirror and a second multi-layer mirror, the first multi-layer mirror and the second multi-layer minor being arranged along a path of the radiation beam, the first multi-layer minor and the second multi-layer mirror each having a reflectivity of at least about 50% in extreme ultra violet wavelength range, and the first multi-layer mirror configured to reduce radiation having wavelengths in a first wavelength range and the second multi-layer minor configured to reduce radiation having wavelengths in a second wavelength range different from the first wavelength range, wherein the first wavelength range and the second wavelength range are outside extreme ultra violet wavelength range.

Abstract: A method for manufacturing and/or protecting an optical element, wherein the optical element has at least one surface comprising a profile having height differences, thereby providing cavities and elevations having a predetermined maximum height difference, includes providing a transmissive layer in the cavities and on the elevations of the optical elements, the transmissive layer having a first height in the cavities that is larger than the predetermined maximum height difference, and surfacing the transmissive layer after providing the transmissive layer such that the transmissive layer has a second height on the elevations that is substantially zero or larger, thereby providing a transmissive layer with a substantially planar surface.

Abstract: To provide a functional spectral filter through which, it is possible for an observer wearing the functional spectral filter to change his or her color sensitivity (ease of color distinction), and which is for designing a color scheme easy to be distinguished for a color deficient observer by using the filter. A functional spectral filter including a multilayer is formed in accordance with a thin film design (an optimization method) determined by use of a color vision theory so as to make color sensitivity into a desired pattern. With respect to combinations that two colors among a plurality of specified colors are combined, color differences in the respective combinations are made close to a color difference given in advance. Alternatively, with respect to specified combinations, the color differences are made small or the color differences are made large.

Abstract: Certain examples described herein are directed to optical devices and systems that include first and second optical elements. In some examples, the first optical element may be configured to pass light received from an excitation source, and the second optical element may be optically coupled to the first optical element and may be configured to reflect incident light from the first optical element back to the first optical element and configured to pass the light reflected from the first optical element. Methods using the devices and systems are also described.

Abstract: An etalon includes a fixed mirror disposed on a first substrate, a movable mirror disposed on a second substrate to face the fixed mirror with a gap interposed therebetween, a first electrode disposed on the surface of the first substrate facing the second substrate, a second electrode disposed on a first surface of the second substrate facing the first substrate and separated from the first electrode, and a warp preventing film disposed on a second surface of the second substrate so as to cover at least the movable mirror in a plan view. The direction of an internal stress acting in the in-plane direction of the warp preventing film is parallel to the direction of an internal stress acting in the in-plane direction of the movable mirror and the second electrode.

Abstract: An interference filter includes two reflective films that are opposed to each other with a gap interposed therebetween and substrates that support the corresponding reflective films. The reflective films each include a pure silver film and a silver alloy film. The pure silver film and the silver alloy film are formed on the corresponding substrate sequentially from the substrate. The silver alloy film is one of an Ag—Sm—Cu alloy film containing silver (Ag), samarium (Sm), and copper (Cu) and an Ag—Bi—Nd alloy film containing silver (Ag), bismuth (Bi), and neodymium (Nd).

Abstract: An Etalon filter includes a first substrate, a second substrate which faces the first substrate, a first optical film which is provided on the first substrate, and a second optical film which is provided on the second substrate to face the first optical film. The reflective characteristic of the first optical film determined by the reflectance of light of each wavelength in a reflective band is different from the reflective characteristic of the second optical film determined by the reflectance of light of each wavelength in the reflective band. The first optical film can have a reflective characteristic with a first wavelength ?1 as a center wavelength, and the second optical film can have a reflective characteristic with a second wavelength ?2 different from the first wavelength as a center wavelength.

Abstract: A method for forming a color shifting film on a support, the film comprising a reflective stack disposed adjacent to the support and an image is disclosed. The reflective stack comprises an at least partially transparent spacer layer comprising a substituted acrylamide polymer disposed between a partially reflective first layer and a reflective second layer. The acrylamide layer has a thickness sufficient to produce an interference color.

Abstract: An object of the present invention is to provide a film having a high brightness and a natural metal-effect, and also having excellent formability, causing no delamination and maintaining the metal-effect after forming. Another object is to provide a molded body having less environmental burden, excellent in recycling efficiency and giving no electromagnetic interference. A laminated film including a structure where each 30 layers or more of a layer composed of a resin A (A layer) and a layer composed of a resin B (B layer) are alternately laminated, wherein a relative reflectance in a wavelength range of 400 nm to 1000 nm is 30% or more, tensile stresses at 100% elongation in a longitudinal direction and a width direction of the film are 3 MPa or more and 90 MPa or less in a tensile test at 150° C., and the number of layers with a layer-pair thickness of 10 nm or more and less than 220 nm is more than the number of layers with a layer-pair thickness of 220 nm or more and 320 nm or less.