Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

Abstract: A projection apparatus has a spatial light modulator to modulate illumination from a laser light source. A base projection lens has, from its long conjugate side to its short conjugate side, a first lens group with negative focal length and with a first lens element that has a negative focal length and a second lens element of positive focal length, a second lens group of negative focal length and spaced apart from the first lens group and having one or more cemented lens elements, and a third lens group spaced apart from the second lens group and having a lens with a positive focal length. The base projection lens has a first field of view and is telecentric in its short conjugate. An afocal attachment to the base projection lens alters the first field of view by the same amount in both of two orthogonal directions.

Abstract: Disclosed are a projection lens that has a simple inner focus structure, an appropriate back focal length, telecentricity, a high optical performance, and a small size and can effectively correct, particularly, lateral chromatic aberration, and a projection display device. A projection lens includes a first lens group having a negative refractive power and a second lens group having a positive refractive power arranged in this order from a magnification side. A fifth lens arranged closest to a reduction side in the first lens group is moved along an optical axis to adjust focus, and at least two lenses are made of a material with anomalous dispersion capable of reducing chromatic aberration in a wide visible range.

Abstract: An image system adapted to a projection display apparatus includes a first lens group having a negative refractive power, a second lens group having a positive refractive power, an aspheric reflector, and a curved reflector. The second lens group includes an aspheric lens which is the nearest to the light valve in the second lens group. A material of the aspheric lens includes glass, the thermal-optical coefficient of the glass is between 1.0×10?6/K and 12.5×10?6/K, and the refractive index of the glass is between 1.482 and 1.847. The aspheric reflector is disposed front of the first lens group for reflecting the image beam passing through the first lens group and second lens group. The curved reflector is disposed above the first lens group for reflecting the image beam reflected by the aspheric reflector onto the screen. The image system has a good imaging quality.

Abstract: A micro-mirror based projection display system in an enclosure with minimum chin and depth measurements is disclosed. A light source, such as a solid state laser light source, generates light of multiple primary colors that is modulated by a digital micro-mirror device. The projection optics of the system include a telecentric rear group of glass lenses with spherical surfaces, followed by a pair of aspheric lenses formed of plastic. A folding mirror, such as a single-piece or multi-piece angular mirror, is disposed between the aspheric lenses, to reduce the depth of the enclosure, and an aspheric mirror projects the image onto a TIR Fresnel projection screen. The aspheric lenses are magnifying to reduce the magnification required of the aspheric mirror, and the aspheric lenses and mirror are clipped to reduce enclosure volume. A folding mirror may be used after the aspheric mirror to further reduce the depth of the enclosure.

Abstract: A projection lens system includes, in order from the magnification side, a negative first lens group and a positive second lens group, and is telecentric on the reduction side. The first lens group includes a first lens formed as an aspheric lens which is disposed closest to the magnification side. The second lens group includes a second lens formed as a positive lens, in or near which an aperture diaphragm is disposed, disposed closest to the magnification side, and an aspheric lens. Between the aperture diaphragm and the aspheric lens of the second lens group, two or more negative lenses and two or more cemented surfaces are disposed. And, 0.10<f/f2-1<0.30, and N2-1>1.75 are satisfied. Here, f denotes a focal length of the whole system, f2-1 denotes a focal length of the second lens, and N2-1 is a refractive index of the second lens at the d-line.

Abstract: A projection optical system including a first optical system configured to form a second image conjugate to a first image and a second optical system configured to include a reflective optical element which reflects light from the second image and to project a third image conjugate to the second image onto a projection surface is provided, wherein the first optical system has a Petzval sum with a sign opposite to a sign of a Petzval sum of the second optical system.

Abstract: A projection lens includes, in the order from a large conjugate side to a small conjugate side thereof, a negative lens group having a negative refractive power and a positive lens group having a positive refractive power. The positive lens group includes, in the order from the large conjugate side to the small conjugate side of the projection lens, a front sub-group and a rear sub-group each having a positive refractive power. The projection lens satisfies the formulas: ?1.35<F1/F<?0.35 and 3<F24/F<5, where F1, F24, and F correspondingly represent the effective focal lengths of the negative lens group, the rear sub-group, and the projection lens.

Abstract: A lens module including a first lens group, a second lens group, a third lens group, and an aperture stop is provided. The first lens group disposed between a magnified side and a reduced side has a positive refractive power. The second lens group disposed between the first lens group and the reduced side has a negative refractive power. The third lens group disposed between the second lens group and the reduced side has a positive refractive power. The aperture stop is disposed between the first lens group and the second lens group. Additionally, the distance from a center of the second surface to a center of the third surface is L1, an effective focal length is f, and the lens module satisfies 0.4<L1/f<1.2.

Abstract: An object of the invention is to provide a projection lens capable of sufficiently correcting lateral chromatic aberration at both of the wide-angle end and the telephoto end, with an increased zoom ratio, a less number of lens elements, and less variation in telecentricity.

Abstract: A projection lens consists of first and second les groups and a stop. The first lens group is formed of a negative lens. The second lens group is formed of three positive lenses and a negative lens. The stop is disposed between the first and second lens groups or in the second lens group. The first and second lens groups are arranged in order from a magnification side. The projection lens is telecentric on a reduction side. The projection lens is configured to satisfy the following conditional expressions (1) and (2): 1.0?f2h/f?5.0??(1) ?2.5?f1/f??0.8??(2) where f2h is a focal length of an aspheric lens of at least one of the first and second positive lenses of the second lens group, f is a focal length of the whole system, and f1 is a focal length of the first lens group.

Abstract: A small projection lens includes a first lens, which is a biconvex lens, an aperture, an aperture diaphragm (or an aperture), a second lens, which is a negative meniscus lens having a concave surface facing a magnification side, a third lens, which is a positive meniscus lens having a convex surface facing a reduction side, and a fourth lens, which is a biconvex lens having aspheric surfaces at both sides on an optical axis, arranged in this order from the magnification side. A minimum portion of the length of all lens elements of the small projection lens in a diametric direction vertical to the optical axis is equal to or less than 15 mm, and the small projection lens satisfies the following conditional expression: 2.5<?/S<10.0 (where S indicates the maximum length of a magnification-side image (inch) and ? indicates a magnifying power).

Abstract: Disclosed are a projection lens that is faster than F1.95 and has a simple inner focus structure, a high optical performance, and a small size, and a projection display device. A projection lens includes a first lens group having a negative refractive power, a second lens group having a positive refractive power, and a third lens group having a positive refractive power arranged in this order from a magnification side. A fifth lens arranged closest to a reduction side in the first lens group is moved along an optical axis to adjust focus. The projection lens satisfies the following conditional expression: 0.2<DG12/f<0.8 where DG12 indicates a distance between the first lens group and the second lens group and f indicates the focal length of the entire lens system.

Abstract: According to one embodiment of the present invention, a system for illuminating a target includes a light source configured to emit one or more light beams with a first divergence. The system further includes a lens separated from the light source. The lens is configured to substantially satisfy the sine condition without removing spherical aberrations from the one or more light beams. The lens is further configured to receive the one or more light beams with the first divergence. The lens is further configured to change the first divergence of the one or more light beams to a second divergence. The second divergence is less than the first divergence. The second divergence is greater than zero. The lens is further configured to transmit the one or more light beams with the second divergence.

Abstract: A micro-mirror based projection display system in an enclosure with minimum chin and depth measurements is disclosed. A solid-state laser light source generates light of multiple primary colors that is modulated by a digital micro-mirror device. The projection optics of the system include a telecentric rear group of glass lenses with spherical surfaces, followed by a pair of aspheric lenses formed of plastic. A folding mirror is disposed between the aspheric lenses, to reduce the depth of the enclosure, and an aspheric mirror projects the image onto a TIR Fresnel projection screen. The aspheric lenses are magnifying, to reduce the magnification required of the aspheric mirror, and the aspheric lenses and mirror are clipped to reduce enclosure volume.

Abstract: A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

Abstract: A wide-angle lens and a projection device using the same are provided. The wide-angle lens from an image side sequentially comprises a first lens group, a second lens group and a third lens group. The third lens group comprises an aperture stop. The first lens group has a negative refracting power, the second lens group has a positive refracting power, and the third lens group has a positive refracting power. A focal length f1 of the first lens group and a focal length fw of the wide-angle lens satisfy the following conditions: ?15 mm<f1<?7.5 mm, and 0.5<|f1/fw|<1.5.

Abstract: The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

Abstract: Disclosed is an ultrasonic lens configuration permitting the production of an acoustic field from low frequency ultrasound waves with predictable regions of energy concentration. The lens comprises at least three adjacent convex surface contours. Each surface contour corresponds to an arc of an ellipse. The first surface contour is within the center of the lens and is flanked by two adjacent contours. The flanking contours correspond to arcs from two symmetrical ellipses having semi-latus rectums at least equal to the semi-latus rectum of the ellipse to which the first, central, contour corresponds. The contours of the lens are arranged such that the flanking contours extend past the first contour by positioning the contours so that if the ellipses to which they correspond were drawn the ellipses of the flanking contours directly adjacent to the first contour would have their centers aligned on a plane parallel to and not below the major or minor axis of the ellipse of the first contour.

Abstract: Very high aperture microlithography projection objectives operating at the wavelengths of 248 nm, 193 nm and also 157 nm, suitable for optical immersion or near-field operation with aperture values that can exceed 1.4 are made feasible with crystalline lenses and crystalline end plates P of NaCl, KCl, KI, RbI, CsI, and MgO, YAG with refractive indices up to and above 2.0. These crystalline lenses and end plates are placed between the system aperture stop AS and the wafer W, preferably as the last lenses on the image side of the objective.

Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.

Abstract: The projection zoom lens system includes a negative first lens group, a positive second lens group, a third lens group, a positive fourth lens group, a fifth lens group, and a positive sixth lens group. The lens system is nearly telecentric on a reduction side. During zooming, the second to fifth lens groups are moved while the first and six lens groups remain stationary. The third lens group includes a positive lens LP having a convex surface directed to a magnification side, and a negative lens LN having a concave surface which is directed to the reduction side and has a curvature stronger than a magnification-side surface of the negative lens LN. The conditional expression of 5.0?|fG3/RLN-2| is satisfied. Here, fG3 denotes a focal length of the third lens group, and RLN-2 denotes a radius of curvature of the reduction-side surface of the negative lens LN.

Abstract: A projection apparatus has a spatial light modulator to modulate illumination from a laser light source. A base projection lens has, from its long conjugate side to its short conjugate side, a first lens group with negative focal length and with a first lens element that has a negative focal length and a second lens element of positive focal length, a second lens group of negative focal length and spaced apart from the first lens group and having one or more cemented lens elements, and a third lens group spaced apart from the second lens group and having a lens with a positive focal length. The base projection lens has a first field of view and is telecentric in its short conjugate. An afocal attachment to the base projection lens alters the first field of view by the same amount in both of two orthogonal directions.

Abstract: A projection lens includes, in order form a magnification side: a first lens group having negative refractive power; and a second lens group having positive refractive power. An aspheric lens is arranged on the most magnification side of the first lens group. The conditional expressions 3<Bf/f and 0.4<H/L are satisfied, where f denotes a focal length of the projection lens, Bf denotes an air-converted back focal length, H denotes a height of a principal ray at the maximum angle of view on a plane which is orthogonal to an optical axis and which passes through point A, and L denotes a length from the point A to a vertex of a lens surface on the most reduction side on the optical axis. Here, the point A is a vertex of a lens surface on the most magnification side on the optical axis.

Abstract: A rear-projection-type display apparatus projects an image formed by a display element with a light beam emitted from a light source on a screen that is larger than the display element through a projection lens. The rear-projection-type display apparatus includes a reflective optical-element group having at least two reflecting mirrors provided between the projection lens and the screen to deflect a light from the projection lens.

Abstract: A lens particularly suited to elongated grooved lens holders such as heat sinks for light emitting diodes. The lens may have a curved surface which projects light in rectangular beams and a radial flange for engaging grooves of a grooved lens holder. Curvature is that of a flattened or compressed sine wave, with less than one full wave being formed along the lens. In one aspect of the invention, the crest of the wave, which would ordinarily be domed, may be flat. The radial flange has straight sides to enable contiguity when arrayed in abutment as well as for cooperating with the grooves of the lens holder.

Abstract: The present invention provides new projection schemes for wide angle imaging lenses rotationally symmetric about optical axis wherein the field of view of lenses and the size of image sensors are directly reflected without any reference to the effective focal length of the lenses. This invention also provides explicit examples of wide-angle lenses implementing the newly developed projection schemes. According to the present invention, by providing new projection schemes explicitly reflecting the physical quantities of direct interest to the user for industrial applicability, namely, the field of view and the image sensor size, it is possible to realize wide-angle lenses providing the most satisfactory images.

Abstract: An imaging lens includes, in the order from the object side to the image side, a first lens of positive refraction power, a second lens of negative refraction power, a third lens of positive refraction power, and a fourth lens of negative refraction power. The imaging lens satisfies the formulae (1) 1<T/F<1.4; (2) R3/F>4; and (3) S1/S2>3, where T is the overall length of the imaging lens, F is the focal length of the imaging lens, R3 is the radius of curvature of the object-side surface of the second lens, S1 is the vertical distance from the edge to the center of the image-side surface of the third lens, and S2 is the horizontal distance from the edge to the center of the image-side surface of the third lens.

Abstract: In a liquid immersion type projection optical system for forming an image of a first plane on a second plane, an optical path between the optical system and the second plane is filled with a liquid having the refractive index larger than 1.5, and the optical system has a boundary optical element whose surface on the first plane side is in contact with a gas and whose surface on the second plane side is in contact with the liquid. The optical system satisfies the condition of 3.2<Nb·Eb/|Rb|<4.0, where Rb is a radius of curvature of the surface on the first plane side of the boundary optical element, Eb an effective diameter of the surface on the first plane side of the boundary optical element, and Nb a refractive index for used light, of an optical material forming the boundary optical element.

Abstract: A fixed-focus lens including a first lens group, a second lens group and a third lens group which are arranged in sequence from an object side to an image side is provided. The first lens group has a negative refractive power and includes a first lens and a second lens arranged in sequence from the object side to the image side, and both having negative refractive powers. The first lens is an aspheric lens. The second lens group has a positive refractive power and includes a lens with positive refractive power. The third lens group has a positive refractive power and includes at least one first cemented lens. The fixed-focus lens satisfies 1.2<|fG1/f|<4.2 and 2.8<|fL2/f|<8.6, where f, fG1 and fL2 are effective focal lengths of the fixed-focus lens, the first lens group and the second lens respectively.

Abstract: A projector optical system for forming a real image by projecting an image of a display element has, sequentially from a screen side or an observation side, a first lens group having positive refractive power, an aperture diaphragm, a second lens group, and a third lens group having positive refractive power, with a diffractive optical element being provided on at least one of the first lens group and the second lens group which are adjacent to the aperture diaphragm. The projector optical system satisfies: 0.05<G/L<0.9 wherein G is an air gap on the optical axis between the second lens group and the third lens group, and L is a length on the optical axis, from the surface that is closest to the screen side to the display element.

Abstract: A projection lens device includes, in order from a magnification side, a first lens group G1 having a negative refractive power, and a second lens group G2 having a positive refractive power. The projection lens device is substantially telecentric on a reduction side thereof. The second lens group G2 includes a three-element cemented lens L10 to L12 formed by cementing three lens elements. A space between the first lens group G1 and the second lens group G2 is set as the maximum inter-lens space (the maximum air space) so that a reflection mirror 4 can be inserted. Also, the projection lens device satisfies eight conditional expressions.

Abstract: The invention features a system for microlithography that includes a mercury light source configured to emit radiation at multiple mercury emission lines, a projection objective positioned to receive radiation emitted by the mercury light source, and a stage configured to position a wafer relative to the projection objective. During operation, the projection objective directs radiation from the light source to the wafer, where the radiation at the wafer includes energy from more than one of the emission lines. Optical lens systems for use in said projection objective comprise four lens groups, each having two lenses comprising silica, the first and second lens groups on one hand and the third and fourth lens groups on the other hand are positioned symmetrically with respect to a plane perpendicular to the optical axis of said lens system.

Abstract: A very high-aperture, purely refractive projection objective having a multiplicity of optical elements has a system diaphragm (5) arranged at a spacing in front of the image plane. The optical element next to the image plane (3) of the projection objective is a planoconvex lens (34) having a substantially spherical entrance surface and a substantially flat exit surface. The planoconvex lens has a diameter that is at least 50% of the diaphragm diameter of the system diaphragm (5). It is preferred to arrange only positive lenses (32, 33, 34) between the system diaphragm (5) and image plane (3). The optical system permits imaging in the case of very high apertures of NA?0.85, if appropriate of NA?1.

Abstract: An optical scanning device provides a radiation source (2,200), a collimator lens (4,40), an objective (7,90) for converting a beam (5,30?) to a scanning spot at the position of an information layer (101) of a record carrier (1,100). The device also includes an electrowetting cell (6). The electrowetting cell (6) acts such that a beam (5,30?) enters the objective (7,90) at a predetermined height of an entrance pupil of the objective (7,90) independent of the position of the objective (7,90) and that the beam (5,30?) forms a predetermined angle at the entrance pupil of the objective (7,90) with the optical axis (8). In this way the rim intensity may be kept constant over the entrance pupil of the objective (7,90).

Abstract: Off-axis projection optics that includes first and second mirrors positioned off-axis and sharing a confocal point that are arranged to reduce linear astigmatism. If a distance between an object plane and the first mirror is l1, an incident angle of light coming from the object plane to the first mirror is i1, a distance between the first mirror and the confocal point is l1?, a distance between the confocal point and the second mirror is l2, an incident angle of light coming from the first mirror to the second mirror is i2, and a distance between the second mirror and an image plane is l2?, the off-axis projection optics may satisfy the following equation: l 1 ? + l 1 l 1 ? tan ? ? i 1 = l 2 ? + l 2 l 2 ? tan ? ? i 2 .

Abstract: To provide a high-brightness, small, low-cost optical apparatus which covers a wide-angle to super-wide-angle region and which reliably corrects various aberrations with a small number of lenses. At least one negative lens unit 1, a meniscus lens 2 that is convex on an object side, an aperture stop S, and a double-convex positive lens 3 are arranged in order from the object side. At least one of the lenses positioned on the object side of the aperture stop S and the positive lens 3 include respective aspherical surfaces.

Abstract: The invention relates to a method -for improving the imaging properties of a micro lithography projection objective (50), wherein the projection objective has a plurality of lenses (L1, L2, L3, L4, L5, L6, L7, L8) between an object plane and an image plane, a first lens of the plurality of lenses being assigned a first manipulator (ml, Mn) for actively deforming the lens, the first lens being deformed for at least partially correcting an aberration, at least one second lens of the plurality of lenses furthermore being assigned at least one second manipulator, and the second lens being deformed in addition to the first lens. Furthermore, a method is described for selecting at least one lens of a plurality of lenses of a projection objective as actively deformable element, and a projection objective.

Abstract: A fixed-focus lens including a first lens group, a second lens group, and a third lens group arranged from an object side to an image side in sequence is provided. The first lens group has a negative refractive power, and includes at least one aspheric lens. The second lens group has a positive refractive power, and includes a lens. The third lens group has a positive refractive power, and includes a triple cemented lens. An effective focal length (EFL) of the fixed-focus lens is f. An EFL of the first lens group is f1. An EFL of the second lens group is f2. An EFL of the third lens group is f3. An axial distance between the first lens group and the second lens group is d. The fixed-focus lens satisfies: 2.5<|f1/f|<4.5, 7.5<f2/f<10, 4.5<f3/f<8.5, and 13<d/f<14.

Abstract: An objective optical system is disclosed that is suitable for a high-precision endoscope that performs focusing by moving a single lens component. The objective optical system includes, in order from the object side, a front lens group, a middle lens group, and a rear lens group. The middle lens group is composed of two or more lens components, at least two of which have positive refractive power, and the lens component that is moved for focusing is in the middle lens group. Additionally, the objective optical system satisfies two specified conditions, and other conditions may apply.

Abstract: To provide a compact and low-cost projector lens capable of appropriately performing temperature correction and obtaining excellent image quality although using a plurality of plastic lens elements, a first lens unit having negative refractive power and a second lens unit having positive refractive power are provided from the screen side, the first lens unit includes a negative meniscus lens element 1b being a plastic lens element, being convex to the screen side and having an aspherical surface, the second lens unit includes: a negative lens element 2b being a plastic lens element and having an aspherical surface; and at least two positive lens elements having anomalous dispersibility and a temperature coefficient of a negative refractive index, and an image plane fluctuation by a temperature change due to a temperature coefficient of a negative refractive index of the plastic lens elements 1b and 2b of the first and second lens units is corrected by the temperature coefficient of the predetermined negative

Abstract: A projection lens device includes, in order from a magnification side, a first lens group G1 having a negative refractive power, and a second lens group G2 having a positive refractive power. The projection lens device is substantially telecentric on a reduction side thereof. The second lens group G2 includes a three-element cemented lens L10 to L12 formed by cementing three lens elements. A space between the first lens group G1 and the second lens group G2 is set as the maximum inter-lens space (the maximum air space) so that a reflection mirror 4 can be inserted. Also, the projection lens device satisfies eight conditional expressions.

Abstract: A first lens group having a negative refractive power, an aperture diaphragm, and a second lens group having a positive refractive power are arranged in order from an enlargement side. A reduction side of a projection lens is made essentially telecentric. Further, cemented triplet lenses, each of which includes cemented three lenses, are provided in the first lens group and the second lens group, respectively. Further, air spacing which enables placement of a mirror is ensured between the first lens group and the second lens group. Moreover, specific conditional expressions for the lens are satisfied.

Abstract: A micro-mirror based projection display system in an enclosure with minimum chin and depth measurements is disclosed. A solid-state laser light source generates light of multiple primary colors that is modulated by a digital micro-mirror device. The projection optics of the system include a telecentric rear group of glass lenses with spherical surfaces, followed by a pair of aspheric lenses formed of plastic. A folding mirror is disposed between the aspheric lenses, to reduce the depth of the enclosure, and an aspheric mirror projects the image onto a TIR Fresnel projection screen. The aspheric lenses are magnifying, to reduce the magnification required of the aspheric mirror, and the aspheric lenses and mirror are clipped to reduce enclosure volume.

Abstract: A fixed-focus lens including a first lens group, a second lens group, and a third lens group is provided. The first lens group has a negative refractive power, includes a plurality of lenses, and is disposed between an object side and an image side. The lenses of the first lens group include at least one aspheric lens. The second lens group is disposed between the first lens group and the image side and has a positive refractive power. The third lens group is disposed between the second lens group and the image side and has a positive refractive power. The third lens group includes a first triple cemented lens and a second triple cemented lens arranged from the object side to the image side in sequence.

Abstract: In general, in a first aspect, the invention features a system that includes a microlithography projection optical system. The microlithography projection optical system includes a plurality of elements arranged so that during operation the plurality of elements image radiation at a wavelength ? from an object plane to an image plane. At least one of the elements is a reflective element that has a rotationally-asymmetric surface positioned in a path of the radiation. The rotationally-asymmetric surface deviates from a rotationally-symmetric reference surface by a distance of about ? or more at one or more locations of the rotationally-asymmetric surface.

Abstract: A focusing lens for an LED is provided.

Abstract: Methods and systems for effecting responses on surfaces utilizing microlens arrays including microoptical components embedded or supported by a support element and positioned from the surface at a distance essentially equal to the image distance of the microoptical component with spacer elements are disclosed. Microlens arrays can be used to manipulate incident energy or radiation having a distribution in characteristic property(s) defining an object pattern to form a corresponding image pattern on a substrate surface. The energy can be light having a pattern or a specific wavelength, intensity or polarization or coherence alignment. The image pattern can have features of order 100 nm in size or less produced from corresponding object patterns having features in the order millimeters. The size of the object pattern can be reduced by the microlens arrays described by a factor of 100 or more using a single step process to form the image patterns.

Abstract: A projection optical system for magnifying an image on a primary imaging plane onto a secondary imaging plane includes a first optical system for forming an intermediate image and a second optical system including a concave reflecting surface disposed between the intermediate image and the secondary plane. The first optical system includes first and second groups respectively having negative and positive power, an aperture, and a third group having positive power from the intermediate image. The surfaces of the first and second optical systems have rotational symmetry about a light axis. A ray traveling from the center of the primary plane to the center of the secondary plane intersects the light axis, is reflected off the reflecting surface, intersects the light axis again, and reaches the secondary plane. The following conditions are satisfied: 0.5<?1/?2<3, 1<AST/ASS<5, |AST|/L12<1, and ?3<K_rel.

Abstract: A projector includes a projection lens having a first lens. The first lens is a plastic lens made by injection molding using a single gate, and has a gate mark on its outer edge. The first lens also has a weld line at the opposite side to the gate mark, which extends from the outer edge. The first lens is positioned such that the gate mark faces a long side of a rectangular pattern of image light on the lens surface, and the weld line becomes disposed outside the rectangular pattern.