Abstract: An arrangement for controlling the deflection of an electron beam in a vapor deposition system includes a control unit to which are assigned deflection modules (23, 27) which can be driven in accordance with respective selected functions. By driving these deflection modules, the electron beam can be deflected in two coordinate directions. At least one of the selected functions has a time-changing term via which the periodicity of the deflection of the electron beam (14) changes with respect to this coordinate direction. The term can be pregiven manually or automatically. The invention also relates to a method for controlling the deflection of the electron beam in a vapor deposition system.

Abstract: An electron beam exposure apparatus for exposing a pattern to a wafer by a plurality of electron beams, comprising an electron beam generating section for generating a plurality of electron beams, a deflecting section having a plurality of deflectors for deflecting the plurality of electron beams, and a screening section having a first screen electrode disposed between the plurality of deflectors and extending from a position close to the electron beam generating section from one end of the deflector to a position close to the wafer from one end of the deflector along the direction of radiation of electron beams.

Abstract: An electron gun that prevents undesirable arcing by providing an improved electrostatic field that generates a confined electron stream, an improved magnetic field that directs the confined electron stream to a crucible with minimal divergence, and an improved insulation on high voltage leads. The improved electrostatic field is provided by a cathode plate disposed adjacent to a filament and forming a cathode window aligned to the filament. An anode plate disposed adjacent to the cathode plate forms an anode window aligned to the cathode window. The cathode plate and anode plate form an electrostatic field and lensing effect that directs electrons emitted from the filament through the cathode and anode windows with minimal divergence. The improved magnetic field is provided by a magnet having a pair of poles, a pair of extension plates each extending from the magnet poles, and a plurality of extension members that extend from the extension plates toward the path of the electron stream.

Abstract: In a rotational rod-fed electron-beam evaporation source used with sublimating rod material, the ingot rod can be free-standing with respect to the crucible. This means that the side of the ingot rod near the tip of the rod does not contact a cooling crucible. In this way, the system can be operated in a defocused position of the electron beam, and the sweep of the electron beam can go over the edge of the ingot rod tip. Using these features, a substantially radial sweep of the tip of an ingot rod that sweeps over the edge can produce a substantially flat evaporation pattern on the ingot rod, producing a good utilization of the expensive ingot rod material.

Abstract: A rod-fed electron beam evaporation system having a rod-fed electron beam evaporation source for evaporating an ingot. The ingot is of rod-like configuration and has a peg-like element to self-engage a socket of a replacement ingot so that both ingot and replacement ingot are brought into alignment.

Abstract: A magnetic deflection system for a high-power electron beam with an expanding cross-section area is used for melting or vaporizing metallic materials. Saddle coils are provided which open in a direction of expansion of the electron beam. With the aid of these saddle coils large deflection speeds of the electron beam are obtained with small imaging errors and large deflection angles.

Abstract: An electron beam source assembly includes a water cooled crucible positioned substantially flush with the top of the block. A magnet is attached to each long sides of the rectangular block to establish parallel opposed pole magnets with the crucible therebetween. A smaller magnet is attached to each end of each longitudinal magnet to form a second and a third parallel magnet pair. The six magnets produce plano-convex magnetic field lines above the crucible, and additional plano-convex field lines of increased field strength extending outwardly from the end of the block having the four magnets. A magnetic base plate provides a low reluctance path to decrease magnetic flux at the crucible.

Abstract: A grounded metallic shield which comprises an electrode enclosing the filament leads and emitters of an e-Gun in a high vacuum chamber of the type used in melting and casting metals and other materials and evaporation sources. The shield is spaced from the filament leads and emitters a distance in the order of the electron mean free path for the pressure uses within the high vacuum chamber. The structure and method of use thereof suppresses or eliminates arc-downs or glow discharges.

Abstract: A method of producing finely divided particles or powder, vapor or fine droplets comprises the steps of heating and melting the starting raw material in a vessel having opposed reflecting surfaces, and ejecting the melted raw material from the vessel as heated finely divided particles or powder, vapor or fine droplets, by introducing a carrier gas into the vessel.

Abstract: In the particular embodiments described in the specification, a vacuum furnace includes a conveying arrangement for holding four solid metal members with their end faces in closely-spaced relation and an energy beam gun directs energy to the adjacent faces to melt the metal. Metal ejected from the heated surfaces by explosive vaporization of inclusions in the metal is trapped by the adjacent surfaces of the other metal members.

Abstract: The present invention provides an electron beam evaporation source designed so that the size of the impact area of the electron beam on an evaporant will remain essentially constant in any position of the impact area on the evaporant; and thus, the rate of evaporation will remain essentially constant. To this end, a quadrapole comprising a set of two pairs of electromagnets is used to deflect the electron beam. The quadrapoles provide a uniform magnetic deflection field to prevent distortion of the impact area. A pair of pole pieces, used in deflecting the electron beam through an arc of 270 degrees, are provided with a predetermined thickness and spacing to prevent lengthening of the impact area parallel to the pole pieces as the electron beam is deflected parallel to the pole pieces. The pole pieces, however, produce the formation of tail regions in the impact area when the impact area is positioned near the pole pieces.

Abstract: A crucible contains a metal to be evaporated by heating from an electron beam source wherein the path of the electrons is controlled by a horizontal transverse magnetic field over the source and crucible. A number of small individual magnets are arranged horizontally along opposite sides of the crucible parallel to the beam path. The inner end of each magnet is in the closest position possible to deliver its flux lines to the magnetic field area. By varying the positions of the magnets, the field generated may be controlled in the desired manner.

Abstract: A crucible contains a metal to be evaporated by heating from an electron beam source wherein the path of the electrons is controlled by a horizontal transverse magnetic field over the source and crucible. A number of small individual magnets are arranged vertically along opposite sides of the crucible parallel to the beam path. One end of each such magnet is in the closest position possible to deliver its flux lines to the magnetic field area. The magnets maybe permanent or electro- or a combination thereof. By varying the positions of the magnets, the field generated may be controlled in the desired manner.

Abstract: An electron beam line evaporator for coating heat-sensitive strips or substrates includes a magnetic trap overlying an evaporation crucible to prevent unpermissible heating and static electrification by back-scattered electrons, complemented with means to influence the injection angle of a dynamically deflected electron beam in such a manner that the beam enters the horizontal magnetic field of the trap at the same angle in each deflection phase independent of stray fields. Such means are arranged inside a gap of a pole shoe necessary for the horizontal magnetic field used by the trap and are operative to generate a vertical magnetic field variable in time and locally alongside the pole shoe.

Abstract: An electron beam gun generates an electron beam directed at a target. The gun comprises electrodes for creating an electric field along the direction of beam travel and focusing coils for creating a magnetic field along the direction of beam travel. The electrodes include a plurality of members each having a beam-shaping aperture therein for passage of the beam substantially without interception of the electrons in the beam. The electrodes and focusing coils are disposed for accelerating electrons in the beam in non-parallel paths through the beam-shaping apertures and for converging the electrons in the beam in at least one cross-sectional dimension of the beam to minimize that dimension at the target.

Abstract: An electron-beam heated vapor source for operation in vacuum is disclosed. The source comprises a magnet and a pair of parallel pole plates for deflecting the beam from an electron-beam gun through an angle of approximately 270.degree. into a crucible containing material to be vaporized by evaporation, sublimation or other process. A pole rod extends from each of the pole plates into the space between them. A means is provided for precisely adjusting the distance separating the pole rods while the vapor source is in vacuum. This adjustment enables the impact area of the beam, and thus, the deposition rate or other impact area related parameter to be optimized while the vapor source is in operation. Preferably, each pole rod extends through a clearance hole in the pole plate and the adjustment means comprises a rack integral with the rod and a pinion which can be driven by a control means located outside the vacuum chamber.

Abstract: An electron-beam furnace for melting and refining metals in a trough-like hearth by scanning high-intensity, narrow electron beams across the hearth is provided with a wire coil located near the hearth for producing a relatively weak magnetic field in the vicinity of the molten metal in the hearth to prevent erratic local beam deflections caused by fluctuations in the plasma that forms in the vicinity of the molten metal. The use of the weak magnetic field allows the electron beams projected by remotely positioned electron guns to be accurately scanned across the hearth by deflection yokes associated with the electron guns.

Abstract: An electron beam vaporizer with an electron beam generator (1), a first magnetic deflector system (7) with parallel elongate pole plates (8) for linear beam deflection along a first coordinate, and with a second magnetic deflector system (10) for beam deflection along a second coordinate, perpendicular to the first coordinate. An elongate vaporizing crucible (6) holds the material to be vaporized. To solve the problem of maintaining focus even over large deflection angles and to be able to correct the deflection pattern, the invention proposes the following:(a) the second magnetic deflection system (10) has two parallel, non-metallic coil cores (11) which extend parallel to the pole plates (8) of the first deflection system (7) and are disposed below them.

Abstract: A grounded metallic shield which comprises an electrode enclosing the filament leads and emitters of an e-Gun in a high vacuum chamber of the type used in melting and casting metals and other materials and evaporation sources. The shield is spaced from the filament leads and emitters a distance in the order of the electron mean free path for the pressure uses within the high vacuum chamber. The structure and method of use thereof suppresses or eliminates arc-downs or glow discharges.