Abstract: A vertically disposed HID lamp fixture for growing plants, which includes a housing having an interior, an exterior, a top hole, and a lower lip defining a light opening towards the plants, further including an inlet duct and outlet duct for the forced air cooling embodiment, a socket tower having an upper flange and a lower flange, the upper flange affixed around the perimeter of the top hole securing the socket tower to the housing, a reflector having an aperture, the lower flange affixed around the perimeter of the aperture suspends the reflector within the housing such that an isolation chamber is formed between the exterior side of the reflector and the interior of the housing, a HID lamp removably engages within said socket tower longitudinally extending substantially downward and through said aperture vertically disposed above said light opening sealed by a compressively held glass sheet.

Abstract: Disclosed is a support unit for supporting a substrate. The support unit includes a support plate having an inner space defined therein, a heating member disposed in the inner space and emitting light for heating the substrate supported on the support unit, and a reflective member disposed along an edge region of the support plate and reflecting thermal energy of the light to an edge region of the substrate supported on the support unit.

Abstract: A reflector includes a first reflector section and a second reflector section. The first reflector section extends along a portion of a first ellipse. The second reflector section extends along a portion of a second ellipse, the second ellipse intersecting the first ellipse. The first reflector section and the second reflector section are joined at an intersecting point of the first ellipse and the second ellipse.

Abstract: At least two radiation members are each powered by an energy source. A reflective member includes an at least partially ring-shaped concave reflective surface facing at least one radiation member which includes an at least partial ring shape for distributing energy to an at least partially ring-shaped zone. At least one other radiation member includes a lamp base assembly for being received in a lamp socket assembly, to provide illumination or other forms of radiation, with concentration in a focal zone. A remote control and switch apparatus or radiation scanning and detection control and switch apparatus is provided, for control of remote power activation, the radiation members and for activating, varying, modifying and/or controlling, optimizing, maximizing, minimizing or otherwise altering the complete or partial constructive interference and/or the complete or partial destructive interference of the electromagnetic radiation emitted from the respective radiation sources of the radiator.

Abstract: Apparatus for providing pulsed or continuous energy in a process chamber, and methods of fabricated said apparatus, are provided herein. The apparatus may include a substrate having a plurality of electrical terminals disposed on one or more surfaces of the substrate, a plurality of solid state sources grown on top of the plurality of electrical terminals, the plurality of solid state sources providing pulsed or continuous energy when electrically powered, and one or more cooling channels formed in one or more areas of the substrate.

Abstract: An apparatus for reducing residual stress of a semiconductor includes a stage configured to support a semiconductor wafer having the residual stress generated by a semiconductor manufacturing process. The apparatus includes an intense pulsed light (IPL) irradiation unit configured to irradiate IPL to the semiconductor wafer to reduce the residual stress of the semiconductor wafer, the IPL radiation unit being separated from the stage. The apparatus further includes at least one alignment unit configured to adjust relative positions of the stage and the IPL irradiation unit.

Abstract: An infrared firing furnace includes a case-integrated cooling system to provide high performance cooling as the first step in the cooling process. The cooling system includes a cooling manifold integrated into, and made from, the same case material as the adjacent firing zone. As the cooling system is made from the same material as the rest of the case, it can handle being exposed to higher temperatures. The cooling system is positioned such that the plane of its outlet is at a specific clearance level relative to the product passing underneath. High pressure cooling jets of air are directed downward toward the products as they pass under the cooling manifold in order to quickly bring the temperature of the products down from the much higher firing temperature, and minimize the dwell time of the product at the higher temperature.

Abstract: A device and method for locally heat treating at least one airfoil in an integrally bladed rotor device. A pair of IR heat sources are positioned to direct IR heat rays in the direction where local heat treatment is required. A pair of parabolic mirrors are positioned to direct the IR heat rays on to the metal component. The heat treating is useful after welding the airfoil on to the rotor device.

Abstract: A heating tool, including a housing having a handle, a heat source, a control circuit for controlling power of the heat source, one or more reflectors mounted in the housing to focus radiant energy from the heat source toward a focal region, an opening in the housing for receiving an object to be heated in the focal region, and a blower directing cooling air toward the reflectors and exiting the housing.

Abstract: A process for heat treating selected portions of an integrally bladed rotor (IBR) having a plurality of blades, the process using an IBR on a fixture having a rotor engaging portion that moves the IBR into an environmental chamber. An IR heater is placed on one of the IBR blades and heat treated after air has been removed from the chamber and an inert gas is added. The IR heater is lifted from the blade and indexed to position another blade on the IBR. The process is repeated until all the IBR blades are heat treated.

Abstract: A rotary furnace for conditioning performs includes a heating wheel, a plurality of heating modules disposed on the heating wheel and a control device. Each heating module includes a heating chamber including at least one heating radiator adapted for irradiating the preform with infrared radiation, a holding and lifting device configured to lift or lower at least one of the preform and heating chamber so as to introduce the preform into the heating chamber and/or withdraw the preform from the heating chamber, and a temperature measurement device configured to measure a temperature of at least one of the preform and the heating chamber. The control device is configured to actuate the heating modules based on the measured temperature.

Abstract: A radiator apparatus for concentrating or dispersing energy. In one embodiment, the radiator includes a thermal conductive layer, a radiation layer, and a thermal insulation layer. The radiation layer is powered by an energy source and includes at least one radiation element embedded in at least a portion of the thermal conductive layer. The thermal insulation layer faces the thermal conductive layer. In another embodiment, the radiator includes a generally helical dome-shaped radiation member powered by an energy source and a generally dome-shaped reflection member including a reflective surface facing the radiation member. In yet another embodiment, the radiator includes a radiation member powered by an energy source and a reflection member having an at least partially ring-shaped concave reflective surface facing the radiation member for distributing energy to an at least partially hat-shaped or ring-shaped area or zone.

Abstract: A heating apparatus comprises a wall for surrounding and defining a heating space, a heating element mounted on the inner side of the wall, reflecting members for reflecting the heat emitted from the heating element. Also, a moving unit joined to one end of each of the reflecting members for moving the reflecting members. Moreover, pivotal members joined to the reflecting members beside more their respective other side than one side of the reflecting members for controlling as pivots the movement of the reflecting member driven by the moving unit.

Abstract: A heat treating device including a treatment room for accommodating therein a substrate, a plurality of light sources, which is disposed above the treatment room, for irradiating the substrate, a first reflector, whose inner surface is a reflective surface of a dome shape, for reflecting and directing a part of light emitted from each light source to the substrate, and a plurality of second reflectors, each of which is provided for each light source, for reflecting and focusing light emitted from each light source and directing it to the substrate. The reflective surface of each of the second reflectors is a part of a spheroidal surface or a curved surface approximate to it surrounding a first focal point in such a manner that the first focal point is formed at a position near each light source and a second focal point is formed on a side of the substrate.

Abstract: A thermal processing apparatus includes a chamber for accommodating a semiconductor wafer and a radiant fitting. The radiant fitting includes a plurality of first radiant sources having a first reflectivity positioned in a center region of the radiant fitting and a plurality of second radiant sources having a second reflectivity. The second reflectivity is larger than the first reflectivity.

Abstract: Isolation IR heat lamp module and method of firing multi-zone IR furnaces for solar cell processing comprising lamps disposed in individual parallel channels in a reflector/insulator body to provide a cooling air channel surrounding each tube; the channels are covered with IR-transmissive plate material to isolate each lamp from adjacent lamps and the process zone. Cooling air is exhausted and recycled upstream for energy conservation. Lamp spacing can be varied and power to each lamp individually controlled to provide infinite control of temperature profile in each heating zone. For a spike zone, and in combination with downstream quench control and annealing zones, steep heating and cooling curves with very short dwell (sharp) peak temperature profiles permit faster throughput due to operation of the lampsm at essentially 100% rated capacity, at a 2× or greater heating and throughput rate without compromising lamp life, while producing solar cells with improved output efficiency.

Abstract: A radiator apparatus for concentrating or dispersing energy. In one embodiment, the radiator includes a thermal conductive layer, a radiation layer, and a thermal insulation layer. The radiation layer is powered by an energy source and includes at least one radiation element embedded in at least a portion of the thermal conductive layer. The thermal insulation layer faces the thermal conductive layer. In another embodiment, the radiator includes a generally helical dome-shaped radiation member powered by an energy source and a generally dome-shaped reflection member including a reflective surface facing the radiation member. In yet another embodiment, the radiator includes a radiation member powered by an energy source and a reflection member having an at least partially ring-shaped concave reflective surface facing the radiation member for distributing energy to an at least partially hat-shaped or ring-shaped area or zone.

Abstract: A welding apparatus is provided with a lamp unit having a light source such as a halogen lamp and a multiple reflection surface. The light source applies incoherent electromagnetic waves that belong to a visible region and a near-infrared region in which a wavelength is 500 nm (nanometer) or more. The multiple reflection surface reflects and collects the light from the light source in the shape of a desired dot or line. The housing and the transparent cover are superimposed, and the light from the light source is collected by the multiple-reflection surface on the portion where the housing is superimposed on the transparent cover.

Abstract: An oven for heating, cooking, or toasting a food product. The oven can comprise a conveyor for conveying the food product, and a parabolically shaped top surface with a plurality of reflectors connected thereto, to direct heat back toward the conveyor. The oven can also comprise a fan for circulating air within the oven cavity. The oven can also comprise a controller that can place the oven in an energy savings mode, when it detects that the oven is not in use. The controller can place the oven in energy savings mode by adjusting the speed of, or shutting off the conveyor, or by adjusting the amount of energy supplied to heating elements disposed within the oven.

Abstract: An apparatus for heating a splice seal includes structural members defining a heating area that receives a splice seal. At least one of the structural members is moveable between an open position and a closed position. At least one heat source is arranged in the heating area. The heat source directs infrared radiation toward the splice seal when the structural member is in the closed position. At least one cooling device cools the heating area when the structural member is in the closed position.

Abstract: A system for coating a substrate includes a heater that heats the substrate. The heater includes a two-dimensional array of a plurality of heat sources which supply heat to the substrate when the substrate is in the presence of the array of heat sources. The heater further includes a controller that controls the operation of each heat source to heat a localized area of the surface of the substrate according to a predetermined temperature profile for the substrate.

Abstract: A heating device includes a case having a plurality of openings and a plurality of slits are defined in bars of the case so that a plurality of heating boards are engaged with the slits of the case at an equal distance. A power control device is connected to the case and includes a power line having a plurality of male connectors. Each heating board includes a heating layer sandwiched between two isolation plates. Two wires are connected to the heating layer and each wire has female connectors, which are connected with the male connectors of the power line. The heating layers of the heating boards dispense heat evenly from the openings of the case.

Abstract: Radiation module for thermal or UV irradiation processing procedures with a large number of radiation sources essentially adjacent and parallel to one another for electromagnetic radiation whose main effective range is in the UV spectrum, visible spectrum, and/or near infrared (NIR) part of the spectrum, particularly at wavelengths between 250 nm and 1.5 ?m, whereby each of the radiation sources possesses an elongated central section, two bent ends, and two bent sections connecting the ends with the central section, and a reflector and cooler body bearing the radiation sources, whereby the reflector and cooler body possesses two end reflector sections assigned to the bent sections of the radiation source from the straight elongated main section to the ends formed as one piece.

Abstract: It is provided that a reflection plate of semiconductor heat treatment, which is resistant to cracks or deformations by controlling the adsorption of foreign materials and the production of reaction. Said reflection plate 1 for semiconductor heat treatment is composed of a disk-shaped or ring-shaped plate of optically transmissible material and a plate 2 of inorganic material hermetically enclosed in said disk-shaped or ring-shaped plate, in which said plate of inorganic material has at least one side in contact with said plate of optically transmissible material, said at least one side 2a having a surface roughness of Ra 0.1 to 10.0 ?m, said at least one side 2a formed grooves 2c therein.

Abstract: An apparatus for heating a splice seal includes structural members defining a heating area that receives a splice seal. At least one of the structural members is moveable between an open position and a closed position. At least one heat source is arranged in the heating area. The heat source directs infrared radiation toward the splice seal when the structural member is in the closed position. At least one cooling device cools the heating area when the structural member is in the closed position. A method for heating a splice seal includes providing structural members that define a heating area; supporting the splice seal in the heating area; directing infrared radiation toward the splice seal; and cooling the heating area with a cooling device simultaneously with directing the infrared radiation toward the splice seal.

Abstract: A heating device for a vehicle is provided with a radiation-heat generating unit for generating radiation heat, a first light-distributing unit for converting irradiation directions of the radiation heat into a substantial single irradiation direction, and a second light-distributing unit for distributing the radiation heat to at least one heating object in a passenger compartment of the vehicle. The second light-distributing unit slantways intersects the radiation heat which has the substantial single irradiation direction converted by the first light-distributing unit.

Abstract: A radiant heater includes a radiant heat source and a reflector to direct the bulk of the heat generated by the radiant source in one direction. The shape of the reflector determines the radiant pattern of the heater, and generally defocuses the output to provide a diffuse heat pattern that is substantially free of hot spots.

Abstract: The invention relates to a method for ceramizing starting glass of glass-ceramics into glass-ceramics, comprising at least the following steps: 1.1 the starting glass is heated from an initial temperature T1 to a temperature T2 which is disposed above the glass transformation temperature TG at which crystallization nuclei are precipitated; 1.2 the glass is held at the temperature T2 for a period t2 for the precipitation of crystallization nuclei; 1.3 the glass is further heated to a temperature T3 at which a crystal phase grows on the nuclei formed following step 1.1 and 1.2; 1.4 the glass is held for period t3 at a temperature T3 or heated during this period to a higher temperature T4 until the predetermined properties of the glass-ceramics have been reached; 1.5 the control of the temperature curve is performed with the help of a control loop comprising at least one temperature sensor for sensing the temperature and a heating unit as an actuator. The invention is characterized in that 1.

Abstract: In an apparatus for performing heating treatment of a structure composed of a substrate and a structure arranged on the front surface of the substrate, the latter structure having thermal capacity smaller than that of the substrate, heaters are arranged to be opposed to the front surface and the back surface of the substrate. A cooling body is arranged at a position opposed to the back surface of the substrate to sandwich the heater of the back surface between the cooling body and the substrate.

Abstract: A method, apparatus, and system including a reflecting device having a plurality of reflecting zones with associated reflectivities for reflecting light from a flash lamp, are described herein.

Abstract: An ultraviolet lamp assembly includes an elongate lamp bulb, a central reflector mounted above the bulb and side reflector panels mounted on opposite sides of the central reflector panel. A first air gap is located between the first side reflector panel and the central reflector panel when the first and second side reflector panels are in the open position. A second air gap is located between the second side reflector panel and the central reflector panel when the first and second side reflector panels are in the open position. An air moving device is configured to direct cooling air downwardly through the perforations at the upper portion of the bulb and downwardly through the first and second air gaps at the lower portion of the bulb.

Abstract: An infrared welder for thermoplastic materials comprising the combination of a halogen lamp producing illumination in the infrared band located at the focal point of a first parabolic reflector. The parabolic reflector is joined in a substantially continuous fashion with a non-imaging lower reflector such as a Winston cone or a “CPC” having a lower aperture through which essentially all of the radiation from the source is directed. The aperture defines the shape and size of the weld area. The lower reflector may be brought into contact with the thermoplastic materials during the welding operation. Alternatively, a selectively operable press device may be used. Several embodiments are disclosed including embodiments which produce circular spot welds, linear welds, curved welds and corner welds.

Abstract: A radiant source for heating a workpiece such as a semiconductor wafer includes a plurality of radiant heating elements, arranged in an array that is generally concentric about a source center axis. A reflector has a reflecting surface that bounds a cavity or channel that contains the heating elements, the reflector comprising walls that extend around the center axis and that are finished for reflecting radiant energy emitted by the heating elements to a region occupied by a wafer. The channel reflecting surfaces comprise at least a part of a plane and/or cylinder and/or a cone and/or a convex to the heating elements curved surface of revolution bordering or spanning two or more adjacent heating elements.

Abstract: A radiant source for heating a workpiece such as a semiconductor wafer including a plurality of radiant heating elements, arranged in an array that is generally concentric about a source center axis. A reflector has a reflecting surface that bounds a cavity or channel that contains the heating elements, said reflector comprising walls that extend around the center axis and that are finished for reflecting radiant energy emitted by the heating elements to a region occupied by a wafer. The channel reflecting surfaces comprise at least a part of a plane and/or cylinder and/or a cone and/or a convex to said heating elements curved surface of revolution bordering or spanning two or more adjacent heating elements.

Abstract: A heating device of the light irradiation type in which uniform illuminance can be obtained without placing a single end lamp in the middle of the light source part is achieved providing a light source part in which circular lamps are arranged concentrically to one another with a mirror in the center of the circular lamps. The mirror is convex toward the workpiece and reflects the light emitted from the innermost circular lamp located closest to the center area so that, without placing a single end lamp in the middle area, the reduction of illuminance in the middle area of the irradiated surface is reduced. Furthermore, the reflector can be made conical, and in this way, the light from the lamps can be emitted with high efficiency onto the workpiece surface.

Abstract: An optical radiation measurement apparatus is provided. The apparatus has at least one radiation detector for measuring electromagnetic radiation emitted from at least two radiation sources. Separate radiation channels are provided in a channel member in order to provide a radiation path between the radiation sources and the radiation detector, which is common to all of the radiation sources.

Abstract: An optical radiation measurement apparatus is provided. The apparatus has at least one radiation detector for measuring electromagnetic radiation emitted from at least two radiation sources. Separate radiation channels are provided in a channel member in order to provide a radiation path between the radiation sources and the radiation detector, which is common to all of the radiation sources.

Abstract: An optical heating device for use in a rapid thermal processing (RTP) system includes a substrate having first and second sides. A plurality of lamps are arranged in generally coaxially circles on the first side of the substrate. An optical reflector portion is formed in the substrate adjacent the lamps and is configured and positioned to reflect light from the lamps toward an object to be heated. The reflector is formed as a trough in the substrate.

Abstract: A heating apparatus for chemical vapor deposition equipment which is capable of providing a uniform temperature distribution, even for a wafer having a large surface area. The heating apparatus may include upper and lower reflection plates, with a heater located between the reflection plates. The apparatus may also include a barrier plate to help provide a uniform heat distribution and to minimize dust generation and metallic pollution on a wafer. The apparatus may also include a heater cover for covering the upper portions of the first reflection plate, the heater and the barrier plate, and the sides thereof. The upper reflection plate, which is installed above the heater cover, may be integrally formed with a gas spraying means.

Abstract: A horizontal reactor for depositing an epitaxial layer on a semiconductor wafer. The reactor includes a reaction chamber sized and shaped for receiving the semiconductor wafer and a susceptor having an outer edge and a generally planar wafer receiving surface positioned in the reaction chamber for supporting the semiconductor wafer. In addition, the reactor includes a heating array positioned outside the reaction chamber including a plurality of heat lamps and a primary reflector for directing thermal radiation emitted by the heat lamps toward the susceptor to heat the semiconductor wafer and susceptor. Further, the reactor includes a secondary edge reflector having a specular surface positioned beside the heating array for recovering misdirected thermal radiation directed generally to a side of the heating array and away from the susceptor.

Abstract: An optical system which utilizes a conventional light source to produce a narrowly focused beam of radiation having intensity similar to that produced by a laser. The system broadly includes an omnidirectional light source and an elliptical reflector, wherein the physical parameters of the light source and the reflector are matched to produce a narrowly focused beam of intense radiation. The light produced by the system is coupled into a fiber optic system for delivery to the target area. In one embodiment, a mirrored surface having an aperture therein is placed at a point near the second focal point of the reflector. The aperture is positioned such that only rays meeting predetermined geometrical exit criteria can pass through the aperture and be accepted by the fiber optic located at the second focal point. Those rays which do not meet the exit criteria are reflected by the mirrored surface toward the interior of the cavity.

Abstract: Conventional infrared, spot reflector lamps are modified by removing portions of the reflector to form reflector edges and then placing the reflector edges next to each other to form an array of lamps with a wide variety of configurations. The combined lamps are particularly effective when the filaments of each lamp are oriented in the same direction as that of a desired heating line. Maximum energy flux density is achieved by positioning the lamps at a distance of about twice the focal length of the uncut, spot-focused lamps. By removing segments from the reflectors to form edges that define planes that are parallel to or intersect with each other, various shaped reflectors are formed that are used to assemble arrays that provide uniform heating lines of various shapes.

Abstract: A module for use in a heating appliance has a frame with first, second, third, and fourth sides. A first heating lamp is mounted substantially along the first side of the frame, a second heating lamp is mounted substantially along the second side of the frame, a third heating lamp mounted substantially along the third side of the frame, and an fourth heating lamp is mounted substantially along the fourth side of the frame. Fifth, sixth, seventh, and eighth heating lamps are mounted substantially diagonally to the frame. A first reflector reflects radiant energy from the first heating lamp, a second reflector reflects radiant energy from the second heating lamp, a third reflector reflects radiant energy from the third heating lamp, and a fourth reflector reflects radiant energy from the fourth heating lamp. A fifth reflector reflects radiant energy from the fifth, sixth, seventh, and eighth heating lamps.

Abstract: A combined radiative and convective rework system is provided for repair, replacement, removal and rework of an electronic component on a printed circuit board. The system includes a guide for guiding heat-inducing radiation and heated gas towards at least one lead of the electronic component, and for preventing the heat-inducing radiation from damaging the body of the component. A heater, including a source of infrared radiation, provides the heat-inducing radiation and the heated gas. In one embodiment, the guide includes a single funnel cooperative with apparatus for reducing component body heating. In second and third embodiments, the guide includes two concentric funnels which form a volume which is traversed by the heat-inducing radiation and heated gas, and which provide at least one narrow region of heat energy to at least one of the leads, but not directly to the component body.

Abstract: An infrared (IR) heater array apparatus that provides focused lines of IR radiation for soldering integrated circuit components or devices, especially fine pitch integrated circuit devices (FPD), in aligned combination with printed circuit boards. The apparatus is configured for concentric mounting in combination with the placement head of placement apparatus wherein FPDs and other IC devices may be bonded to the circuit board while the device is held in place by the placement apparatus. One preferred embodiment of the apparatus includes an array of IR lamps and associated lamp envelopes and lenses, together with control apparatus for operating the IR lamps and aligning the focused IR radiation generated thereby. The radiation generated by the IR lamps is configured to provide a desired line pattern of energy which is directed onto the leads of a device being soldered. The perimeter of the energy pattern is programmably alterable to suit particular device lead sizes and configurations.

Abstract: An infrared (IR) heater array apparatus that provides focused lines of IR radiation for soldering integrated circuit components or devices, especially fine pitch integrated circuit devices (FPD), in aligned combination with printed circuit boards. The apparatus is configured for concentric mounting in combination with the placement head of placement apparatus wherein FPDs and other IC devices may be bonded to the circuit board while the device is held in place by the placement apparatus. One preferred embodiment of the apparatus includes a rectangular frame member having four radiation slits, a rectangular array of four IR lamps and associated lamp envelopes mounted in combination outside the frame member, X and Y pairs of reflecting members rotatably mounted within the frame member, and control subsystems for operating the IR lamps and aligning the focused IR radiation generated thereby.

Abstract: A radiant heating structure having a formed first sheet and a pair of reflectors therein removably postioned so as to be hingeable with another similar radiant heating structure. A pair of radiant energy tube holders are positioned within the formed sheet at opposite ends of the reflectors.

Abstract: A reflector surface furnace includes an open ended ellipsoidal or near ellipsoidal reflector segment having two focal areas, there being a source of radiation in the one focal area, the material to be processed being placed into the other focal area, the furnace is completed as inventive improvement by two end segments of parabolic or near parabolic configurations each having an axis of symmetry that coincides with an axis of symmetry of the central ellipsoid and interfaces with the ellipsoid in these focal areas, the two parabolical end segments have focal points which namely coincide with the focal points of the ellipsoidal segment, but for control purposes there may be separation.