Abstract: A wafer cleaning chamber comprising a plurality of carrier arms each having concentrically-mounted midpoints between opposing ends of the carrier arms with a wafer carrier mounted on each of the opposing ends of the carrier arms. A hub includes a plurality of concentrically mounted drives where each of the plurality of drives is coupled near the midpoint of a respective one of the plurality of carrier arms. Each of the plurality of drives is configured to be controlled independently of the remaining plurality of concentrically-mounted drives. A respective motor is coupled to each of the concentrically mounted drives and is configured to move the coupled carrier arm in a rotary manner under control of a program containing a velocity profile. At least one cleaning chemical-supply head is positioned proximate to a path of the wafer carriers.

Abstract: A holding apparatus for holding a semiconductor wafer comprises a pneumatic cylinder, a plunger movably connected to the pneumatic cylinder, an inlet pipe connected to the pneumatic cylinder, and a relief valve connected to the inlet pipe. Clean dry air is pumped into the pneumatic cylinder through the inlet pipe to impel the plunger in a first direction to contact the wafer. A part of the air in the inlet pipe is discharged through the relief valve to regulate air pressure to the pneumatic cylinder.

Abstract: Embodiments of the present invention as recited in the claims generally provide an apparatus for transferring substrates in a processing system where the substrate is exposed to high temperatures. In one embodiment a blade for transporting a substrate is provided. The blade comprises a base having an arcuate lateral shoulder, a first finger extending outward from and perpendicular to the base, a second finger extending outward from the base and parallel to and spaced-apart from the first finger, a first support tab configured to support the substrate and positioned along the arcuate lateral shoulder, a second support tab configured to support the substrate and coupled with the first finger, and a third support tab configured to support the substrate coupled with the second finger, wherein the arcuate lateral shoulder extends from an outer edge of the first finger to an outer edge of the second finger.

Abstract: A cassette for a liquid crystal display (LCD) device, comprises: a body for receiving a substrate on which a plurality of LC panels divided from one another by a dummy region are formed; a plurality of supporting bars rotatably installed in the body and having a predetermined shape, for supporting a substrate; and a plurality of pads formed on each surface of the supporting bar with a different gap therebetween and contacting the dummy region of the substrate. When LCD devices of various sizes are received in the cassette, supporting bars for supporting each of the LCD devices are prevented from contacting an image display region of the LCD device and thus an inferiority of the LCD device is prevented.

Abstract: A chemical-mechanical polishing machine and associated methods are disclosed. One embodiment of the machine includes a polishing pad, a wafer carrier corresponding to the polishing pad and configured to carry a semiconductor wafer, and a transfer station proximate to the polishing pad for holding the wafer during loading and/or unloading. At least one of the wafer carrier and the transfer station is configured to dissipate electrostatic charge from the wafer.

Abstract: Device for turning over electronic components, comprising a turntable (1) for driving the electronic components to be turned over in succession between the following stationary locations: a location (A) for loading them onto the turntable; a start of turning over location (B); an end of turning over location (C); and a location (D) for unloading the turntable. A turning-over device (2) actuated by a fixed rotating motor (21), not linked to said turntable, allows the electronic components to be turned over between the start of turning over position and the end of turning over position.

Abstract: A transfer apparatus includes a stationary base, a swivel supported by the stationary base to be rotatable about a vertical axis, a guide member mounted on the swivel, a linear movement mechanism supported by the swivel or the guide member, a hand supported by the linear movement mechanism and moved by the linear movement mechanism for carrying a work along a straight and horizontal travel stroke, a drive source disposed inside the stationary base, and a transmission shaft disposed along the vertical axis to transmit drive power from the drive source to the linear movement mechanism. The swivel includes an upper section and a lower section detachably connected with each other. The upper section has a connecting member supported by the upper section to be rotatable about the vertical axis. The connecting member has a detachable engagement member for engagement with the transmission shaft from the above.

Abstract: Briefly, the present invention provides a system and method for high throughput processing using sample holders. The system has a plurality of work perimeters, with a rotational robot preferably associated with each work perimeter. At least one transfer station area is provided between adjacent work perimeters to facilitate robotic transfer of sample holders from one work perimeter to another area. Each work perimeter typically includes a plurality of defined station locations, with each station location positioned to be accessible by the robot associated with that area. In addition, each station location is typically configured to receive a device, such as an automated instrument or a holding nest. Device components are arranged at selected station locations according to specific application requirements to provide a flexible, robust, reliable, and accurate high throughput processing system.

Abstract: Glass substrates are transported to a plurality of processing devices to be processed. Certain of the processing devices have associated storage shelf for storing glass substrates and a transfer device. The transfer device is adapted to move the glass substrate between the processing device and the storage shelf and between the storage shelf and the transporting device.

Abstract: An exemplary device (27) for adjusting angle of a base plate (2710) includes: two side walls (21) being parallel to and spaced apart from each other, each of the side walls including a pivot hole (217); a base plate disposed between the two side walls and pivotally attached to the side walls via the pivot axles; and a plurality of magnetism members (211, 212 and 2715) disposed on the base plate (2710) and the side wall. The magnetism members configures for holding the base plate stably in a starting position and further configures to allow the base plate to be displaced from the starting position by manual pressure applied to the base plate, such that a tilt angle of the base plate relative to the two side walls is adjustable up or down as desired. An exemplary apparatus (2) for testing display modules using the angle adjusting device is also provided.

Abstract: An apparatus for treating wafer-shaped articles includes at least one linear arranged array of a plurality of at least two process units wherein in each such process unit one single wafer-shaped article can be treated, a cassette-holding unit for holding at least one cassette storing at least one wafer-shaped article therein and a transport system for picking a wafer-shaped article from a cassette and placing it into one of a process unit. The apparatus has a transport unit movably mounted on a linear track. The transport unit includes at least one holding member for holding a single wafer-shaped article in a substantially vertical plane parallel to the linear track.

Abstract: A storage and retrieval apparatus including a robotic device capable of gripping items stored in the apparatus and delivering the item to a separate, proximate instrument. The items to be stored are loaded from the outside of the apparatus at each face of the hexagonal or octagonal shaped storage carousel. The storage carousel, which can be manually rotated, is mounted on a stationary base, both structures including a hollow core. The robotic device includes slider bars within the core of the apparatus and is rotatable about the central axis of the apparatus. The robotic device is capable of translating vertically, telescoping horizontally, rotating and gripping an item stored at a desired location within the storage carousel. Upon retrieval of a desired item, the robotic device will proceed to retract and translate downward to an aperture within the base. The item is transferred to an adjacent instrument through the aperture using the telescopic arm of the robotic device.

Abstract: The present invention provides tools and methods of processing microelectronic substrates in which the tools maintain high throughput yet have dramatically lower footprint than conventional tools. In preferred aspects, the present invention provides novel tool designs in which multiple tool functions are overlapped in the x, y, and/or z axes of the tool in novel ways.

Abstract: An exposure apparatus has a mask stage (9), a prealignment device (7) which prealigns a mask (1) to be transferred to the stage (9), and a manipulating mechanism (10) which transports a master or exchanges two masters between the stage (9) and prealignment device (7). A master transport apparatus (30) includes a mask transport mechanism (8) which holds the mask (1) with holding portions (8a, 8b) that can hold at least two masks (1) and transports the master (1), and a controller (11) which controls the transport mechanism (8). The controller (11) controls the transport mechanism (8) such that, when a mask (1) that should be used in a first turn for exposure is to be mounted on the stage (9), a mask (1) to be used in a second turn is provided to the prealignment device (7), and a mask (1) to be used in a third turn is held by the holding portion (8a, 8b).

Abstract: A substrate processing apparatus includes a transport robot (TR1) formed with a telescopic vertical movement mechanism of a so-called telescopially nestable multi-tier construction. A drive mechanism (D1) is initially driven to move a support member (48) upwardly to simultaneously elevate a vertical movement member (42d). As the vertical movement member (42d) rises, a pulley (47c) simultaneously moves upwardly. As the pulley (47c) moves upwardly, a vertical movement member (42c) is lifted upwardly by a belt (L1). Similar actions elevate a pair of transport arms (31a, 31b) provided on the top of a vertical movement member (42a). The increase in the number of tiers of the nestable multi-tier structure precludes the increase in height of the transport robot (TR1) in its retracted position.

Abstract: An apparatus for handling and positioning wafers or other flat objects. The apparatus has an XY stage with an X-drive and a Y-drive, and a bed attached to the XY stage. A chuck (e.g. a vacuum chuck) is disposed on the bed and an effector is attached to the bed. The effector can rotate about an axis of rotation extending in the Z-direction. The effector can pick up objects and place the objects onto the chuck. The effector can also pick up objects from the chuck. Preferably, the chuck has a recessed region for accommodating the effector so that the effector can be inserted under a flat object on the chuck. The X-drive or Y-drive of the XY stage provides linear motion for the effector so that the effector can pull wafers from a cassette such as used in the semiconductor industry. Alternatively, the effector is attached to a linear actuator disposed on the bed.

Abstract: A workpiece changing system capable of automatically changing a heavy workpiece using a robot. A jig for attaching a workpiece thereto is mounted on a jig mounting device. The jig mounting device comprises a jig mounting unit having a rotary member and a swing member. The rotary member rotates the jig and the workpiece on the jig and hold them at a desired rotary position. The tilting member swings around an axis to tilt the jig and the workpiece on the jig and hold them at a desired tilting position. As the jig and the workpiece on the jig can take a suitable orientation or posture for being handled by the handling robot, the handling robot can hold a heavy workpiece without exerting excessive load on the robot wrist.

Abstract: The aim of the invention is to make it as easy as possible to change a spindle in a lifting device (2) for substrates, which device comprises a support (10). To this end the support is configured such that it can be made to engage the substrate holder (25) by rotation or by pivoting.

Abstract: Apparatus for manipulating wafers comprising a fixture including seats each for receiving and supporting a wafer in a seated condition and an element mounted for reciprocal movement in opposition to the fixture between a retracted condition and an extended condition into an opening of the fixture for engaging a wafer held by the fixture in the seated condition.

Abstract: A wafer transfer apparatus provides a rotational and translational motions using only one stationary motor drive. The apparatus includes a drive assembly and a transport arm assembly. The transport arm assembly includes a transport arm rotatably attached to a linking arm. The linking arm is fixedly attached to a sleeve, which is rotatably attached to a housing. A shaft runs axially through the sleeve, and coupled with the transport arm so that rotation of the sleeve relative to the shaft causes the movement of the transport arm assembly. A locking mechanism allows the shaft to be locked to the housing or to the sleeve. A motor fixedly attached to the housing and operational attached to the sleeve. When the shaft is locked to the sleeve, the motor rotates the sleeve and the shaft simultaneously, which effects rotation of the transfer arm relative to the housing.

Abstract: An apparatus includes a chamber for containing a fluid, a guide seated in the chamber, and a transfer robot for loading and/or unloading a plurality of wafers to and/or from the guide. The wafers are located on the guide. The guide has a supporting member for supporting a wafer and a stopper member for preventing the wafer from being inclined over a predetermined range. The stopper member is in contact with a wafer edge disposed at a higher position than a wafer edge supported by the supporting member. A wafer guide has a stopper member to prevent adjacent wafers from being inclined and coming in contact with each other. Therefore, it is possible to suppress a poor drying such as water spots (or watermarks) produced when wafers are adhered to each other in a drying process.

Abstract: This invention provides a substrate transportation apparatus in which a loader and macroinspection/transportation section are separate to be independent of each other. The loader can be arranged on the left side or rear side of the macroinspection/transportation section when seen from the front side. The substrate transportation apparatus can easily be changed in accordance with various types of specifications of apparatus layout.

Abstract: In a loading and unloading station for semiconductor processing installations, the object of the present invention is to ensure charging proceeding from transporting containers under clean room conditions. These transporting containers themselves serve as magazines for disk-shaped objects and are open laterally. It should also be possible, optionally, to load and unload a greater quantity of such transporting containers, wherein the exchange of transporting containers must be effected under favorable ergonomic conditions. According to the invention, the transporting container for loading, unloading and reloading of disk-shaped objects is coupled in a stationary manner by the container cover with the closure by means of an adhering engagement. The charging opening and the transporting container are opened simultaneously in that the container cover and the closure are moved down jointly into the semiconductor processing installation.

Abstract: An apparatus and method for the efficient simultaneous loading and unloading a plurality of compact disc media into and out of a plurality of recording bays. The present invention provides a plurality of two position platters that allow the simultaneous rotation of a plurality of compact discs along horizontal planes defined by the platters above compact disc drive input trays for the transfer of the compact discs to a plurality of compact disc drives using a plurality of associated compact disc lifting devices that lift the compact discs off the platters allowing the platters to rotate along a central axis and then distributes the plurality of compact discs into the compact disc trays. One platter is used for each compact disc recording or writing drive.

Abstract: An alignment apparatus which obtains an amount of correction for centering a semiconductor wafer from four points of a wafer edge detected by noncontact proprioceptors in a wafer delivery position P1 where the semiconductor wafer is passed to a wafer carrying unit from a wafer carrying robot and centers the semiconductor wafer.

Abstract: A substrate processing system includes a primary processing assembly and secondary processing assembly. The secondary processing assembly has one or more interconnected modules and includes one or more process stations. The primary and secondary processing assemblies are connected by a vacuum conveyor, so that the substrates remain in vacuum during transport. The secondary processing assembly may include one or more modules which are interconnected to provide a desired system configuration. A dual processing module, including first and second process stations, is selectably operable in a serial mode or a parallel mode.

Abstract: A wafer transfer apparatus provides a rotational and translational motions using only one stationary motor drive. The apparatus includes a drive assembly and a transport arm assembly. The transport arm assembly includes a transport arm rotatably attached to a linking arm. The linking arm is fixedly attached to a sleeve, which is rotatably attached to a housing. A shaft runs axially through the sleeve, and coupled with the transport arm so that rotation of the sleeve relative to the shaft causes the movement of the transport arm assembly. A locking mechanism allows the shaft to be locked to the housing or to the sleeve. A motor fixedly attached to the housing and operational attached to the sleeve. When the shaft is locked to the sleeve, the motor rotates the sleeve and the shaft simultaneously, which effects rotation of the transfer arm relative to the housing.

Abstract: This invention provides a substrate transportation apparatus in which a loader and macroinspection/transportation section are separate to be independent of each other. The loader can be arranged on the left side or rear side of the macroinspection/transportation section when seen from the front side. The substrate transportation apparatus can easily be changed in accordance with various types of specifications of apparatus layout.

Abstract: In a loading and unloading station for semiconductor processing installations, the object of the present invention is to ensure charging proceeding from transporting containers under clean room conditions. These transporting containers themselves serve as magazines for disk-shaped objects and are open laterally. It should also be possible, optionally, to load and unload a greater quantity of such transporting containers, wherein the exchange of transporting containers must be effected under favorable ergonomic conditions. According to the invention, the transporting container for loading, unloading and reloading of disk-shaped objects is coupled in a stationary manner by the container cover with the closure by means of an adhering engagement. The charging opening and the transporting container are opened simultaneously in that the container cover and the closure are moved down jointly into the semiconductor processing installation.

Abstract: In a loading and unloading station for semiconductor processing installations, the object of the present invention is to ensure charging proceeding from transporting containers under clean room conditions. These transporting containers themselves serve as magazines for disk-shaped objects and are open laterally. It should also be possible, optionally, to load and unload a greater quantity of such transporting containers, wherein the exchange of transporting containers must be effected under favorable ergonomic conditions. According to the invention, the transporting container for loading, unloading and reloading of disk-shaped objects is coupled in a stationary manner by the container cover with the closure by means of an adhering engagement. The charging opening and the transporting container are opened simultaneously in that the container cover and the closure are moved down jointly into the semiconductor processing installation.

Abstract: A substrate processing apparatus includes a transport robot (TR1) formed with a telescopic vertical movement mechanism of a so-called telescopically nestable multi-tier construction. A drive mechanism (D1) is initially driven to move a support member (48) upwardly to simultaneously elevate a vertical movement member (42d). As the vertical movement member (42d) rises, a pulley (47c) simultaneously moves upwardly. As the pulley (47c) moves upwardly, a vertical movement member (42c) is lifted upwardly by a belt (L1). Similar actions elevate a pair of transport arms (31a, 31b) provided on the top of a vertical movement member (42a). The increase in the number of tiers of the nestable multi-tier structure precludes the increase in height of the transport robot (TR1) in its retracted position.

Abstract: Disclosed is an apparatus for unloading substrates. The apparatus includes a handling station, a conveying robot, and a process apparatus controller. The handling station arranges substrates having different sizes and processed by a prior process apparatus. The conveying robot lifts the substrate arranged on the handling station and loads the substrate to a predetermined position on a cassette or a subsequent process apparatus. The process apparatus controller controls the arrangement of the substrate or motions of the conveying robot so that the substrate is loaded on the predetermined position of the cassette or the subsequent process apparatus. The unloading apparatus according to the present invention adjusts the position on which the substrate is placed in the handling station according to the size of the substrate or adjusts a rotational arc of the conveying robot so that the substrate is loaded to a secure position on the cassette or subsequent process apparatus.

Abstract: An LCD handler is disclosed. The LCD handler includes a body having a test site for testing an LCD panel and feeding/recovering sites on both sides of the test site for feeding and recovering the LCD panel. It also includes a pre-aligner in the body for mechanically aligning the LCD panel and feeding the aligned LCD panel to the feeding/recovering site. The handler also includes a carrier for carrying the LCD panel fed to the feeding/recovering site by the pre-aligner to the test site, and a driving mechanism for moving the carrier in a lateral direction of the body.

Abstract: An apparatus for processing wafers one at a time. The apparatus has a vacuum chamber 1 into which wafers are loaded through a pair of loadlocks 3, 4 which are spaced one above the other. A robot within the vacuum chamber 1 has a pair of gripper arms 22, 29 which are moveable along and rotatable about a vertical axis 23 so as to be moveable between the loadlocks 3, 4 and a wafer processing position. Each of the loadlocks 3, 4 has a vertically moveable portion 8, 26 which is moveable away from the remainder of the loadlock to provide access in a horizontal plane for one of the gripper arms 22, 29.

Abstract: In a pallet changer apparatus, a pallet changing arm is connected to a motor via a raising/lowering mechanism and an intermittent drive unit. During operation of the motor, the pallet changing arm is raised from a lowermost position to an uppermost position, and is held at the uppermost position, and then is lowered from the uppermost position to the lowermost position. The pallet changing arm is also connected to the motor via a turning mechanism and a second cam drive portion. During operation of the motor, the pallet changing arm is turned while being held at the uppermost position. The pallet changing arm is moved up and down and turned by using the single motor provided above a table. The table below the pallet changing arm is reduced in size so as to allow an operator to perform operations without being impeded by the table.

Abstract: In a cover apparatus of a machine tool, a slide cover and turning covers are connected to a motor via an up-down movement mechanism and a cam drive portion. During operation of the motor, the slide cover and the turning covers are raised from a lowermost position to an uppermost position, and are held at the uppermost position, and then are lowered from the uppermost position to the lowermost position. The turning covers are connected to the motor also via a pivoting mechanism and an intermittent drive unit. During operation of the motor, the turning covers are turned while being held at the uppermost position. The apparatus thus prevents deviations of the up-down movement timing of the slide cover 47 and the up-down movement timing of the turning covers, thereby improving reliability.

Abstract: A substrate transfer system is used in an in-line film deposition system. The substrate transfer system is provided with an auxiliary vacuum chamber and a main vacuum chamber. The auxiliary vacuum chamber has a plurality of first substrate cassettes. The main vacuum chamber is communicated with another vacuum chamber through which carriers are transferred along a transport path. The main vacuum chamber has two robots and a plurality of second substrate cassettes arranged in parallel on which the substrates is placed. The second substrate cassettes are arranged between the two robots. The substrates are disk-shaped substrates having center holes. The center holes are utilized as hook parts during a pickup operation. Thereby the method of mounting substrates in the holders of carriers etc. is improved without changing the operating speed of the robots. Therefore the amount of substrates transported per unit time is increased and the processing capacity of the substrate processing system is enhanced.

Abstract: Lifting device, in particular a pallet device (10), comprising a pivotal arm (19) at the free end of which in the area of a controllable rotary mount (42) is mounted a separate support element for a lifting head (43), i.e. a pivotal support arm (46) at the free end of which the lifting head (43) is rotary mounted, and the rotary movements of the lifting head (43) are carried out by an operating cylinder (49), preferably with two end positions.

Abstract: An apparatus for handling and positioning wafers or other flat objects. The apparatus has an XY stage with an X-drive and a Y-drive, and a bed attached to the XY stage. A chuck (e.g. a vacuum chuck) is disposed on the bed and an effector is attached to the bed. The effector can rotate about an axis of rotation extending in the Z-direction. The effector can pick up objects and place the objects onto the chuck. The effector can also pick up objects from the chuck. Preferably, the chuck has a recessed region for accommodating the effector so that the effector can be inserted under a flat object on the chuck. The X-drive or Y-drive of the XY stage provides linear motion for the effector so that the effector can pull wafers from a cassette such as used in the semiconductor industry. Alternatively, the effector is attached to a linear actuator disposed on the bed.

Abstract: An apparatus for displacing a plurality of objects from a pickup station to a deposition station offset horizontally from the pickup station has a support movable in a horizontal transport direction between a position directly above the pickup station and a position directly above the deposition station, an elongated lift plate underneath the support and provided with grabs for picking up and releasing the objects, a flexible belt having a lower end extending in the direction and secured to the lift plate, a drive on the support for paying out and winding in the belt and thereby raising and lowering the plate, and rigid links connected between the plate and the support for inhibiting movement of the plate perpendicular to the direction.