Free Halogen Patents (Class 423/241)
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Patent number: 11033878Abstract: An agent for removing a halogen gas, such as chlorine, in a waste gas by means of reduction; a method for producing this agent; a method for removing a halogen gas by use of this agent; and a system for removing a halogen gas. The agent for removing the halogen gas contains at least pseudo-boehmite, that serves as a host material, and a sulfur-containing reducing agent, that serves as a guest material. 1-8% by weight of the reducing agent, in terms of elemental sulfur, based on the total amount of the pseudo-boehmite and sulfur-containing reducing agent is present in the agent. At least one inorganic compound selected from among oxides, carbonates salts and hydrocarbon salts of alkaline earth metal elements, transition metal elements and zinc group elements is additionally contained in the agent as a third component.Type: GrantFiled: November 15, 2017Date of Patent: June 15, 2021Assignee: CLARIANT CATALYSTS (JAPAN) K.K.Inventors: Tadahito Nakashima, Kenichiro Sunata, Yasushi Shioya, Hyun-Joong Kim
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Patent number: 10770190Abstract: A catalytic recombiner and filter apparatus is especially suited for placement in a containment of a nuclear reactor. The apparatus has a natural convection flow duct with a number of catalytic elements for recombining hydrogen and oxygen contained in a gas flow through the flow duct. The catalytic recombiner and filter apparatus provides for reliable hydrogen reduction and iodine filtering for a gas flow even for a comparatively long period of operation. The catalytic recombiner and filter apparatus includes a number of adsorber elements with iodine adsorbing surfaces and with macroscopic flow channels in between. The iodine adsorbing surfaces are flown over by the gas flow, and the adsorber elements are arranged, when in use, downstream of the catalytic elements in a direction of the gas flow.Type: GrantFiled: July 5, 2019Date of Patent: September 8, 2020Assignee: Framatome GmbHInventors: Axel Hill, Stefan Rosenberger
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Patent number: 9764268Abstract: This gas purification filter unit (10) is provided with: a first elimination unit (11) that eliminates gas component impurities among the impurities contained in ozone generated from an ozone generating device; and a second elimination unit (12) that is disposed at a later stage than the first elimination unit and that further eliminates solid particulate impurities from among the impurities from which the gas component has been eliminated. Ozone containing impurities are caused to flow in from the inflow end (10a) of such a gas purification filter unit (10) and is passed through the first elimination unit (11) and second elimination unit (12), and thus ozone from which impurities have been eliminated is discharged from an outflow end (10b).Type: GrantFiled: December 9, 2013Date of Patent: September 19, 2017Assignee: Entegris, Inc.Inventors: Fumio Nozaki, Yutaka Shimada
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Patent number: 9302226Abstract: A method of removing a radioactive material from a gas includes directing the gas through a bed of salt, wherein the gas includes water vapor and the radioactive material. The salt constitutes more than 50 percent by weight of the bed. The method additionally includes condensing the water vapor in the bed and dissolving a portion of the salt to form a salt solution. The method further includes absorbing the radioactive material into the salt solution while a remainder of the gas passes through the bed. A salt filtration system configured to perform the method may be implemented as a pre-filter (or post-filter) to an existing filter unit or as a standalone filter.Type: GrantFiled: May 5, 2014Date of Patent: April 5, 2016Assignee: GE-HITACHI NUCLEAR ENERGY AMERICAS LLCInventors: Eric Paul Loewen, Pradip Saha, Emma Lebwohl, Kelly Ann Fitzwater
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Patent number: 8834824Abstract: A method is described for treating a gas stream comprising fluorine (F2) gas. In a preferred embodiment, the method comprises adding water vapor to a gas stream and conveying the gas stream and water vapor to a reaction chamber containing a heated bed of material to react with F2 to form an inorganic fluoride while inhibiting formation of CF4 within the reaction chamber, and at least partially evacuating the reaction chamber so that the gas stream is conveyed to and from the reaction chamber at sub-atmospheric pressure.Type: GrantFiled: September 21, 2006Date of Patent: September 16, 2014Assignee: Edwards LimitedInventors: James Robert Smith, Andrew David Wright
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Patent number: 8668868Abstract: A method for abating effluent from an electronic device manufacturing process is provided, including abating the effluent in a thermal abatement tool to form abated effluent; determining whether the abated effluent contains one or more chemical species of interest; and changing one or more operating parameters of the thermal abatement tool based upon the determination. Numerous other embodiments are provided.Type: GrantFiled: October 25, 2008Date of Patent: March 11, 2014Assignee: Applied Materials, Inc.Inventors: Ho-Man Rodney Chiu, Daniel O. Clark, Shaun W. Crawford, Jay J. Jung, Youssef A. Loldj, Robbert M. Vermeulen
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Publication number: 20140056794Abstract: A method for treating exhaust gas, comprising first contacting exhaust gas comprising inorganic halogenated gas discharged from sources of the exhaust gas with Fe2O3 or synthetic zeolite and then contacting with an anion exchange resin having water content of 5 w/w % or less and halogen content of 10 mg/g or less.Type: ApplicationFiled: August 20, 2013Publication date: February 27, 2014Applicant: EBARA CORPORATIONInventor: Yoichi MORI
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Publication number: 20130323149Abstract: An apparatus for filtering airborne radioactive iodine is provided. The apparatus includes a housing defining an interior space and comprising an inlet for receiving air and an outlet for discharging the air; and a composition placed in the interior space for trapping airborne radioactive iodine between the inlet and the outlet. The composition comprises one or more salts selected from the group consisting of an alkali metal chloride and an alkaline earth metal chloride. A method of filtering airborne radioactive iodine is further provided. The method includes providing the foregoing apparatus at a nuclear facility and blowing air to flow from the inlet to the outlet and contact the composition placed in the interior space, whereby airborne radioactive iodine is trapped in the interior space.Type: ApplicationFiled: June 5, 2013Publication date: December 5, 2013Inventors: Jei-Won YEON, Sang Hyuk JUNG, Jong-Yun KIM, Kyuseok SONG, Hee-Jung IM
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Publication number: 20130295362Abstract: Porous polymeric networks and composite materials comprising metal nanoparticles distributed in the polymeric networks are provided. Also provided are methods for using the polymeric networks and the composite materials in liquid- and vapor-phase waste remediation applications. The porous polymeric networks, are highly porous, three-dimensional structures characterized by high surface areas. The polymeric networks comprise polymers polymerized from aldehydes and phenolic molecules.Type: ApplicationFiled: May 7, 2013Publication date: November 7, 2013Inventors: Mercouri G. Kanatzidis, Alexandros Katsoulidis
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Patent number: 8303687Abstract: Chlorine is absorbed in water from gas streams of nitrogen, oxygen, argon, helium and mixtures thereof, in which process the formation of hypochlorous acid is suppressed through the regulated addition of hydrogen peroxide, and hydrochloric acid is formed.Type: GrantFiled: May 12, 2009Date of Patent: November 6, 2012Assignee: Wacker Chemie AGInventors: Wolfgang Hanke, Marcel Salamon
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Publication number: 20120183816Abstract: A quencher for a flow cell battery is described. The quencher utilizes a quench solution formed from FeCl2 in a dilute HCl solution in order to quench chlorine emissions from the flow cell battery. A quench sensor is further described. The quench sensor monitors the concentration level of FeCl2 in the quench solution and may also monitor the level of the quench solution in the quencher.Type: ApplicationFiled: January 13, 2011Publication date: July 19, 2012Applicant: Deeya Energy, IncorporatedInventors: MAJID KESHAVARZ, Saroj Kumar Sahu, Ge Zu
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Patent number: 8182775Abstract: Dry-scrubbing media compositions, methods of preparing same, and methods of use are provided. The compositions contain activated alumina and potassium carbonate. Optionally, activated carbon and other impregnates, such as sulfates of group 1A metals, are included in the compositions. The compositions exhibit improved efficiency and capacity for the removal of compounds such as chlorine or sulfur dioxide from an air-stream. The compositions are particularly useful for reducing or preventing the release of toxic gaseous compounds from the areas such as petroleum storage areas, refineries, drinking water systems, sewage treatment facilities, swimming pools, hospital morgues, animal rooms, and pulp and paper production sites.Type: GrantFiled: November 30, 2007Date of Patent: May 22, 2012Assignee: Purafil, Inc.Inventor: William G. England
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Patent number: 8048203Abstract: It is intended to provide methods of producing a chlorine gas having a small bromine content, an aqueous sodium hypochlorite solution having a small bromic acid content, and liquid chlorine having a small bromine content. More specifically, a chlorine gas is produced by a method comprising the steps of: (A) washing a chlorine gas that contains bromine, in a gas washing unit composed of a packed column or a tray tower, wherein the chlorine gas introduced via a lower part of the gas washing unit is brought into counterflow gas/liquid contact with a liquid chlorine introduced via an upper part of the gas washing unit; and (B) taking out a purified chlorine gas thus washed, via the upper part of the gas washing unit, wherein a weight ratio of the chlorine gas and the liquid chlorine introduced in the step (A) is 1/1.0 to 1/0.3.Type: GrantFiled: April 14, 2006Date of Patent: November 1, 2011Assignee: Kaneka CorporationInventors: Yusaku Ariki, Hironobu Ibaraki
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Patent number: 7976808Abstract: To provide an agent for removing a halogen series gas and a method for removing a halogen series gas which is excellent in a removing ability of removing the present halogen series gas in a low concentration area, which prevents an adsorbent from generating heat, and which is capable of reducing formation of a solid waste. A method for removing a halogen series gas, which comprises bringing a gas to be treated which contains at least one member selected from the halogen series gas group consisting of F2, Cl2, Br2, I2, and compounds which generate a hydrogen halide or hypohalogeneous acid upon hydrolysis, into contact with a granule comprising, based on the total mass of the granule, from 45 to 99.85 mass % of an alkali metal salt, from 0.1 to 40 mass % of a carbonaceous material, and from more than 0 mass % to 15 mass % of an alkaline earth metal salt, in the presence of water.Type: GrantFiled: November 19, 2008Date of Patent: July 12, 2011Assignee: Asahi Glass Company, LimitedInventors: Shigeru Sakurai, Hisakazu Arima
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Publication number: 20110081288Abstract: The invention relates to a gas liquid contactor and effluent cleaning system and method and more particularly to an array of nozzles configured to produce uniformly spaced flat liquid jets with reduced linear stability. An embodiment of the invention is directed towards a stability unit used with nozzles of a gas liquid contactor and/or an enhancer for stable jet formation, and more particularly to reducing the stability of liquid jets formed from nozzles of the gas liquid contactor. Another aspect of the invention relates to operating the apparatus at a condition that reduces the stability of liquid jets, e.g., a droplet generator apparatus. Yet another aspect of the invention relates to operation of the apparatus with an aqueous slurry. Still another aspect of the invention is directed towards to an apparatus for substantially separating at least two fluids.Type: ApplicationFiled: November 19, 2010Publication date: April 7, 2011Applicant: Neumann Systems Group, Inc.Inventors: David Kurt Neumann, Andrew R. Awtry, Jason K. Brasseur, Keith R. Hobbs, Boris R. Nizamov, Thomas Lee Henshaw
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Patent number: 7883568Abstract: A process is provided for separating one or more light gases from bromine or chlorine using one or more physical separations and contact with a chemical scrubber to recover additional halogen. In one aspect, the process comprises (a) providing a feed of halogen containing one or more light gases to a distillation column or flash vaporizer; (b) operating the distillation column or flash vaporizer to separate the feed into (i) a first liquid containing a major amount of halogen and no more than a minor amount of light gas(es), and (ii) a first vapor containing a major amount of light gas(es) and no more than a minor amount of halogen; and (c) providing the vapor to a chemical scrubber to recover halogen from the vapor.Type: GrantFiled: February 5, 2007Date of Patent: February 8, 2011Assignee: GRT, Inc.Inventors: Sagar B. Gadewar, Peter K. Stoimenov, Philip Grosso, Eric W. McFarland, Ashley W. Breed, Michael J. Weiss, Michael D. Wyrsta
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Publication number: 20100316548Abstract: Methods and apparatuses are disclosed for the continuous treatment of gas streams contaminated with one or more acid gases, for example HCl, H2S, SO2, SO3, and/or Cl2. At least primary and secondary neutralization zones are utilized, with the secondary neutralization zone being fed by a portion of the gas stream that is used to carry out essentially complete neutralization of a neutralization solution, such as aqueous sodium hydroxide, prior to its disposal (e.g., via biological treatment). The flow of this portion of the gas stream may be regulated by periodically or continuously monitoring the concentration or pH of the spent neutralization solution exiting the secondary neutralization zone. Suitable gas streams that can be treated include effluent gases comprising hydrogen chloride from hydrocarbon conversion processes, particularly paraffin isomerization processes, utilizing a chloriding agent as a catalyst promoter.Type: ApplicationFiled: June 10, 2009Publication date: December 16, 2010Inventors: Patrick J. Bullen, David J. Shecterle, Jocelyn C. Daguio
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Patent number: 7846407Abstract: An process for efficiently deacidizing a gaseous mixture is described. The process utilizes a self-concentrating absorbent that absorbs an acid gas at reduced overall energy costs for the deacidizing operation.Type: GrantFiled: April 28, 2009Date of Patent: December 7, 2010Inventor: Liang Hu
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Publication number: 20100290966Abstract: A method for the removal of a fluorinated gas from a gas stream (1) comprising the steps of: conveying the gas stream (1) containing the fluorinated gas to a combustion region (2), decomposing the fluorinated gas in the combustion region (2), entraining a calcium salt (4) capable of reacting with the fluorinated gas decomposition products into the gas stream to react with the fluorinated gas decomposition products to form calcium fluoride and then removing (10) the calcium fluoride salt from the gas stream.Type: ApplicationFiled: May 23, 2007Publication date: November 18, 2010Inventor: Andrew James Seeley
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Patent number: 7785560Abstract: Process for removing halide compounds adhering to finely divided metal oxide particles by means of steam, wherein the metal oxide particles are applied to the upper part of an upright column and migrate downwards by means of gravity, the steam is applied at the bottom end of the column, the metal oxide particles and the steam are fed counter-currently, the metal oxide particles freed of halide residues are removed at the base of the column, steam and halide residues are removed at the head of the column, wherein the column is heated in such a manner that the temperature difference Tbottom?Ttop between the lower part and the upper part of the column is at least 20° C. and a maximum temperature of 500° C. prevails in the column, and the metal oxide particles have a residence time in the column of from 1 second to 30 minutes.Type: GrantFiled: June 22, 2004Date of Patent: August 31, 2010Assignee: EVONIK DEGUSSA GmbHInventors: Kai Schumacher, Juergen Flesch, Volker Hamm
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Patent number: 7776302Abstract: Fluorine extraction systems and associated processes are described herein. In one embodiment, a fluorine extraction process can include loading a mixture containing a uranium fluoride (UxFy, where x and y are integers) and an oxidizing agent into a reaction vessel. The reaction vessel has a closed bottom section and an opening spaced apart from the bottom section. The fluorine extraction process can also include heating the mixture containing uranium fluoride and the oxidizing agent in the reaction vessel, forming at least one uranium dioxide and a non-radioactive gas product from the heated mixture, and controlling a depth of the mixture in the reaction vessel to achieve a desired reaction yield of the non-radioactive gas product.Type: GrantFiled: May 8, 2009Date of Patent: August 17, 2010Assignee: International Isotopes IncInventor: Carrie Wildman
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Publication number: 20100196239Abstract: Calcium hydroxide particles with very high reactivity exhibiting an X-ray diffraction line at d=0.49 nm obtained by the Debye-Scherrer powder method with an intensity below 50% of the intensity of a traditional hydrated lime with a specific surface area of 15.8 m2/g.Type: ApplicationFiled: April 15, 2010Publication date: August 5, 2010Applicant: LIME TECHNOLOGY CONSULTING SPRLInventor: Philippe Dumont
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Publication number: 20100099930Abstract: A method comprising: providing an alkyl halide stream; contacting at least some of the alkyl halides with a coupling catalyst to form a product stream comprising higher hydrocarbons and hydrogen halide; contacting the product stream with a solid reactant to remove at least a portion of the hydrogen halide from the product stream; and reacting the solid reactant with a source of oxygen to generate a corresponding halogen.Type: ApplicationFiled: July 17, 2009Publication date: April 22, 2010Inventors: Peter Stoimenov, Charles Ian Cutier, Jihong Cheng, Charles J. Coronelia, Krishna Janmanchi, Zachary J.A. Komon, Saydul Amin Sardar, Vivek Julka, Sagar Gadewar, Philip Grosso, Daniel J. Auerbach, Jean Wheeler
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Patent number: 7686963Abstract: In one aspect, ozone is quenched from a water stream, such as a drinking water or wastewater stream being treated with ozone, by contacting the stream with magnesium thiosulfate. In another aspect, a method of scrubbing ozone from a gaseous stream comprises contacting the gaseous stream with magnesium thiosulfate. In an alternative embodiment, chlorine is quenched from a water stream by contacting the stream with magnesium thiosulfate or potassium thiosulfate. In yet another aspect, a method of scrubbing chlorine from a gaseous stream comprises contacting the stream with magnesium thiosulfate or potassium thiosulfate. In another embodiment, a thiosulfate, such as magnesium thiosulfate, calcium thiosulfate, potassium thiosulfate, or sodium thiosulfate, is provided on an air filter for scrubbing ozone or chlorine from gaseous streams.Type: GrantFiled: November 16, 2004Date of Patent: March 30, 2010Assignee: Tessenderlo Kerley, Inc.Inventors: Michael Hojjatie, Dean Abrams
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Publication number: 20090297420Abstract: A method is described for treating a gas stream comprising fluorine (F2) gas. In a preferred embodiment, the method comprises the steps of conveying the gas stream to a reaction chamber containing a heated bed of material to react with F2 to form an inorganic fluoride, and at least partially evacuating the reaction chamber so that the gas stream is conveyed to and from the reaction chamber at a sub-atmospheric pressure.Type: ApplicationFiled: September 21, 2006Publication date: December 3, 2009Inventors: Peter Leslie Timms, Elizabeth Timms, James Robert Smith, Andrew David Wright
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Patent number: 7625540Abstract: A method for removing fluorine gas from a selected environment comprises contacting the fluorine gas with water to generate a solution of hydrofluoric acid and contacting the solution of hydrofluoric acid with an ion exchange resin having an active state operative to exchange selected ions therein for fluoride ions in the solution. The apparatus (200) may include a dual resin setup (222, 223) such that one of the ion-exchange resin can be in the service cycle while the other of the ion-exchange resins undergoes the regeneration and rinse/refill cycles.Type: GrantFiled: December 1, 2000Date of Patent: December 1, 2009Assignee: Edwards Vacuum, Inc.Inventor: Juzer Jangbarwala
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Publication number: 20090263302Abstract: An process for efficiently deacidizing a gaseous mixture is described. The process utilizes a self-concentrating absorbent that absorbs an acid gas at reduced overall energy costs for the deacidizing operation.Type: ApplicationFiled: April 28, 2009Publication date: October 22, 2009Inventor: Liang Hu
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Publication number: 20090142244Abstract: An object of the present invention is to improve the decomposition at low temperatures of perfluorocompounds containing only fluorine as a halogen, such as CF4, C2F6 and the like. In the present invention, a perfluorocompound containing only fluorine as a halogen is brought into contact with a catalyst comprising Al, Ni and W as catalytically active ingredients and comprising a mixed oxide or complex oxide of Ni and Al and a mixed oxide or complex oxide of W and Ni, in the presence of steam or a combination of steam and air at a temperature of 500 to 800° C. to convert the fluorine in the perfluorocompound to hydrogen fluoride. Employment of the catalyst of the present invention improves the decomposition at low temperatures and hence makes it possible to decompose the perfluoro-compound at a high percentage of decomposition at a lower temperature.Type: ApplicationFiled: February 6, 2009Publication date: June 4, 2009Inventors: Shuichi Kanno, Shin Tamata, Shinichi Ichikawa, Terufumi Kawasaki, Hisao Yamashita
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Publication number: 20090130012Abstract: To provide an agent for removing a halogen series gas and a method for removing a halogen series gas which is excellent in a removing ability of removing the present halogen series gas in a low concentration area, which prevents an adsorbent from generating heat, and which is capable of reducing formation of a solid waste. A method for removing a halogen series gas, which comprises bringing a gas to be treated which contains at least one member selected from the halogen series gas group consisting of F2, Cl2, Br2, I2, and compounds which generate a hydrogen halide or hypohalogeneous acid upon hydrolysis, into contact with a granule comprising, based on the total mass of the granule, from 45 to 99.85 mass % of an alkali metal salt, from 0.1 to 40 mass % of a carbonaceous material, and from more than 0 mass % to 15 mass % of an alkaline earth metal salt, in the presence of water.Type: ApplicationFiled: November 19, 2008Publication date: May 21, 2009Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Shigeru Sakurai, Hisakazu Arima
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Publication number: 20090110622Abstract: A method for abating effluent from an electronic device manufacturing process is provided, including abating the effluent in a thermal abatement tool to form abated effluent; determining whether the abated effluent contains one or more chemical species of interest; and changing one or more operating parameters of the thermal abatement tool based upon the determination. Numerous other embodiments are provided.Type: ApplicationFiled: October 25, 2008Publication date: April 30, 2009Applicant: APPLIED MATERIALS, INC.Inventors: Ho-Man Rodney Chiu, Daniel O. Clark, Shaun W. Crawford, Jay J. Jung, Youssef A. Loldj, Robbert M. Vermeulen
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Patent number: 7494633Abstract: Apparatus is described for treating an effluent fluid stream from a semiconductor manufacturing process tool. The apparatus comprises a combustion chamber, means for heating the combustion chamber, and a nozzle for injecting the effluent stream into the combustion chamber. The apparatus is configured to enable a fuel and an oxidant to be selectively injected into the effluent stream as required to optimise the combustion conditions for a particular effluent stream. In one to embodiment, a lance projecting into the nozzle selectively injects an oxidant into the effluent stream, and a sleeve surrounding the nozzle selectively injects a fuel into the effluent stream.Type: GrantFiled: August 2, 2005Date of Patent: February 24, 2009Assignee: Edwards LimitedInventors: Gareth David Stanton, Andrew James Seeley, James Robert Smith
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Patent number: 7470413Abstract: A method for removing fluorine gas from a selected environment comprises contacting the fluorine gas with water to generate a solution of hydrofluoric acid and contacting the solution of hydrofluoric acid with an ion exchange resin having an active state operative to exchange selected ions therein for fluoride ions in the solution. The apparatus (200) may include a dual resin setup (222, 223) such that one of the ion-exchange resin can be in the service cycle while the other of the ion-exchange resins undergoes the regeneration and rinse/refill cycles.Type: GrantFiled: January 16, 2004Date of Patent: December 30, 2008Assignee: Edwards Vacuum, Inc.Inventor: Juzer Jangbarwala
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Publication number: 20080050298Abstract: The present invention provides, a method of reducing fluoride emissions from aluminum smelting including the steps of providing alumina at a preselected feed rate to pots containing an aluminum producing molten electrolyte, wherein the aluminum producing molten electrolyte evolves gaseous fluoride byproducts; transporting the gaseous fluoride byproducts to alumina-based dry scrubbers, wherein the alumina scrubbers absorb at least a portion of the gaseous fluoride byproducts; determining the inlet temperature into the dry scrubber; and adjusting the alumina feed rate to the dry scrubber to optimize the capture efficiency of the gaseous fluoride byproducts, wherein adjusting the aluminum feed rate includes increasing the aluminum feed rate to correspond to a first temperature and decreasing the feed rate to correspond to a second temperature, wherein the first temperature is greater than the second temperature.Type: ApplicationFiled: August 24, 2006Publication date: February 28, 2008Inventors: Hendrik J. van der Meyden, Neal Richard Dando, Stephen Joseph Lindsay
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Publication number: 20070277551Abstract: Processes are disclosed which include: (a) providing a gas comprising chlorine, oxygen, and carbon dioxide; (b) feeding the gas to a distillation column having a head, a bottom, a rectifying section and a stripping section, wherein the gas is fed to the distillation column at an introduction point between the rectifying section and the stripping section; (c) distilling the gas in the column at a pressure of 8 to 30 bar and at a column head temperature of ?10° C. to ?60° C., to form liquid chlorine and a head mixture comprising carbon dioxide and oxygen; (d) removing the liquid chlorine from the distillation column at the bottom of the column; and (e) removing a first portion of the head mixture from the head of the distillation column, and refluxing a second portion of the head mixture in the column.Type: ApplicationFiled: May 17, 2007Publication date: December 6, 2007Applicant: Bayer Material Science AGInventor: Friedhelm Kamper
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Patent number: 7074378Abstract: This invention describes an improvement in a process for purifying a nitrogen trifluoride (NF3) stream containing unreacted F2, HF, and nitrogen oxides from an NF3 reactor wherein the F2, and HF are removed and then the nitrogen oxides removed by adsorption. The improvement in the process resides in selectively removing the F2 from said NF3 stream without generating oxygen difluoride, removing HF and then removing said nitrogen oxides by adsorption. Further purification can be effected as desired.Type: GrantFiled: January 23, 2004Date of Patent: July 11, 2006Assignee: Air Products and Chemicals, Inc.Inventors: James Joseph Hart, Philip Bruce Henderson, Howard Paul Withers, Jr., Madhukar Bhaskara Rao, Hoshang Subawalla
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Patent number: 7022296Abstract: A multiple-field precipitator, flue-gas treating device, in accordance with the principles of the invention, includes a first section having a dual-function, sensible-cooling heat exchanger/electrostatic precipitator, a second section having a wet electrostatic precipitator, and a middle section fluidly connecting the first and second sections. In the first section, the exchanger/precipitator sensibly cools the flue gas and collects most of the dust from the flue gas. In the middle section, the dust-reduced flue gas is combined with an alkaline material, thereby forming reaction products. These reaction products and several other pollutants are captured by the wet electrostatic precipitator, in the form of a pollutant-laden liquid. The pollutant-laden liquid is directed to a series of heat exchangers and settling tanks, where various pollutants such as SOx, metals, NOx, and chlorides are removed in different stages.Type: GrantFiled: November 14, 2000Date of Patent: April 4, 2006Assignee: University of CincinnatiInventors: Soon-Jai Khang, Timothy Keener
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Patent number: 7014824Abstract: The present invention relates to a method for purifying process waste gases by introducing them into a waste gas purification system that includes a reaction chamber and by post-treating the reaction products that leave the reaction chamber in a washing or sorbtion chamber with an associated washing agent circuit. The type and amount of harmful substances in the process waste gas are continuously measured before the waste gases enter the waste gas purification system. In addition, the type and amount of harmful substances in the reaction products that leave the waste gas purification system are simultaneously determined directly at the exit of the system and the measuring signals are used to regulate the operating parameters of the waste gas purification system.Type: GrantFiled: November 29, 2000Date of Patent: March 21, 2006Assignee: Centrotherm Elektrische Anlagen GmbH & Co.Inventors: Gunter Krodel, Lutz Fabian, Volkmar Hopfe
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Patent number: 6962679Abstract: There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.Type: GrantFiled: July 11, 2001Date of Patent: November 8, 2005Assignee: Battelle Memorial InstituteInventors: Gary B. Josephson, Delbert L. Lessor, Amit K. Sharma, Christopher Lyle Aardahl, Kenneth G. Rappe
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Patent number: 6953557Abstract: A process and an apparatus for treating exhaust gases, comprising an aeration stirring tank (5) employing an aqueous alkaline liquid, and, as a posterior stage, a gas-liquid contact device (7) and/or a packed column (11). The apparatus can remove at the posterior stage harmful gases that the aeration stirring tank fails to remove, for example, water-soluble organic compounds such as ethanol, halogenated silicon compounds such as SiCl4, and halogen gases such as F2 and Cl2. The process and apparatus are particularly suitable for purifying exhaust gases discharged from a semiconductor production device.Type: GrantFiled: October 15, 1998Date of Patent: October 11, 2005Assignee: Ebara CorporationInventors: Hiroshi Ikeda, Yasuhiro Kubota, Takashi Kyotani
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Patent number: 6896865Abstract: To provide a process for recovering high quality hydrogen chloride rationally with good economical efficiency, particularly hydrogen chloride with an elevated quality level to be provided as the feedstock for the oxychlorination reaction in producing dichloroethane and a vinyl chloride monomer from a hydrogen chloride gas to be generated by the combustion of chlorine based waste. To use a process for recovering hydrogen chloride from chlorine based waste comprises adding water and a reducing agent to an acid gas obtained by the combustion of chlorine based waste to effect reaction to obtain a crude hydrogen chloride aqueous solution having an oxidation-reduction potential of not higher than 900 mV and then, distilling the crude hydrogen chloride aqueous solution to obtain a purified hydrogen chloride gas.Type: GrantFiled: April 26, 2001Date of Patent: May 24, 2005Assignee: Tosoh CorporationInventors: Sadakatsu Kumoi, Kouya Honjoh, Tsugio Murakami
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Patent number: 6858194Abstract: Disclosed are a method for reducing the elementary halogen contained in a gaseous effluent from a combustion furnace by bringing the effluent into contact with hydrazine, and a device or an installation for treating a gaseous effluent from a combustion furnace, and a solution of halohydric acid containing hydrazine.Type: GrantFiled: December 1, 2000Date of Patent: February 22, 2005Assignee: ArkemaInventor: Philippe Leduc
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Publication number: 20040191148Abstract: A method for removing fluorine gas from a selected environment comprises contacting the fluorine gas with water to generate a solution of hydrofluoric acid and contacting the solution of hydrofluoric acid with an ion exchange resin having an active state operative to exchange selected ions therein for fluoride ions in the solution. The apparatus (200) may include a dual resin setup (222, 223) such that one of the ion-exchange resin can be in the service cycle while the other of the ion-exchange resins undergoes the regeneration and rinse/refill cycles.Type: ApplicationFiled: January 16, 2004Publication date: September 30, 2004Inventor: Juzer Jangbarwala
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Patent number: 6793740Abstract: The present invention relates to a method for cleaning a pressurized container having at least one chemical contained therein. The pressurized container may be any type of container able to store chemicals under pressure. Preferably, however, the container is a rail tank car. Generally, the method includes: a step of injecting the container with an input gas to create a chemical/input gas mixture; a step of removing the chemical/input gas mixture via a vacuum pump; and a step of injecting the chemical/input gas mixture into a reaction tank to neutralize the chemical. The input gas may be heated nitrogen gas or heated, dry air. The reaction tank may contain a caustic material for reacting with the chemical.Type: GrantFiled: July 9, 2001Date of Patent: September 21, 2004Assignee: General Electric CompanyInventors: Joseph P. Tunney, Paul Buchan, Thomas J. Davis, Raymond Blaine Vermette
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Publication number: 20040179987Abstract: A method for chlorine purification in which crude chlorine containing nitrogen and/or oxygen is purified to separate the nitrogen and oxygen from the chloride, characterized in that the crude chlorine containing nitrogen and/or oxygen is contacted with 1,2-dichloroethane to cause the 1,2-dichloroethane to absorb the chlorine contained in the crude chlorine, and a process for producing 1,2-dichloroethane which comprises reacting ethylene with the chlorine contained in the chlorine containing 1,2-dichloroethane.Type: ApplicationFiled: December 11, 2003Publication date: September 16, 2004Inventors: Noriaki Oku, Tateo Seo, Kiyoshi Iwanaga
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Patent number: 6773925Abstract: There are provided a detector agent which is effectively discolored at a lower concentration for various halogen compounds and a method for detecting halogen compounds by use of said detector agent. A detector agent for halogen compounds, which contains curcumin or Bromocresol Green as a discoloring component, and said discoloring component is preferably supported on granular activated alumina.Type: GrantFiled: January 24, 2001Date of Patent: August 10, 2004Assignees: L'Air Liquide Societe Anonyme a Directoire et Conseil de Surveillance Pour l'Etude et l'Exploitation des Procedes Georges Claude, Air Liquide Electronics SystemsInventors: Yoshihiro Ibaraki, Hideji Kawanaka, Hidekazu Ina, Shinichi Ando
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Patent number: 6767513Abstract: A method of treating exhaust gases containing halogen compound, the improvement in that the exhaust gases containing halogen compounds such as halogen gases and/or hydrogen halide gases (halogenated acid gases) are brought into contact with simple metals. The halogen compounds such as acid gases and halogen gases can thereby effectively be removed from the exhaust gases.Type: GrantFiled: March 2, 1999Date of Patent: July 27, 2004Assignee: Daikin Industries Ltd.Inventors: Tadahiro Omi, Yoshitaka Honda
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Publication number: 20040131524Abstract: There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.Type: ApplicationFiled: December 16, 2003Publication date: July 8, 2004Applicant: Battelle Memorial InstituteInventors: Gary B. Josephson, Delbert L. Lessor, Amit K. Sharma, Christopher Lyle Aardahl, Kenneth G. Rappe
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Patent number: 6709485Abstract: A process for removing chlorine gas from the tail gas stream of a chlor/alkali plant or other chemical processes comprising the steps of: (a) contacting a chlorine-, hydrogen-, and carbon dioxide-containing tail gas stream with a zeolite molecular sieve having a molecular pore diameter greater than the molecular diameter of the carbon dioxide and hydrogen and smaller than the molecular diameter of chlorine so that at least a portion of the carbon dioxide is absorbed onto the molecular sieve, and thereby producing a purified tail gas stream that contains substantially all of the chlorine and hydrogen values and a reduced amount or no amount of carbon dioxide values; and (b) contacting the purified tail gas stream with an aqueous sodium hydroxide scrubbing solution in order to remove substantially all of the chlorine values from the purified tail gas stream, whereby producing a purified sodium hypochlorite solution that is substantially free of sodium carbonate.Type: GrantFiled: December 4, 2002Date of Patent: March 23, 2004Assignee: Olin CorporationInventors: Sanders H. Moore, James F. Pickering, Carey O. Burger
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Patent number: 6685903Abstract: This invention is directed to a method for purifying argon from an impure argon stream. If the oxygen concentration in the impure argon is less than about 10 mole percent of oxygen, the invention is proceeded in the sequential steps of a) removing chlorine from the impure argon stream; b) adding hydrogen to the impure argon stream; c) removing carbon dioxide and water from the impure argon stream; d) removing hydrogen from the impure argon stream; and e) removing nitrogen from the impure argon stream to form a purified argon stream.Type: GrantFiled: March 1, 2001Date of Patent: February 3, 2004Assignee: Praxair Technology, Inc.Inventors: Kenneth K. Wong, Dante Patrick Bonaquist
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Patent number: H2198Abstract: A method of decontaminating solids contaminated with chlorinated hydrocarbons includes a first step of heating the contaminated solids at a temperature high enough to volatize chlorine contaminates but below a temperature range favorable to the formation of the dioxins and furans to dechlorinate the contaminated solids. Volatilized chlorine contaminates are removed from the dechlorinated contaminated solids. The dechlorinated contaminated solids are then purged with an inert gas to remove oxygen from the dechlorinated contaminated solids. Thereafter the dechlorinated contaminated solids are heated in the absence of oxygen to a temperature sufficient to crack hydrocarbons contaminating the solids to lower molecular weight hydrocarbons.Type: GrantFiled: July 30, 2002Date of Patent: August 7, 2007Assignee: CH2M Hill Inc.Inventor: Jay M. Quimby