Abstract: A method of purifying bleed air from an engine heats the bleed air only to an extent necessary for the bleed air to react under catalysis from a noble-metal-based reactor bed, converting the contaminants to filterable form. The contaminants are then removed with a post-treatment filter. A purifier functioning according to the present invention, which heats the bleed air to a temperature no greater than 450° F. which it attains without a combustor, thus releases less heat to adjoining components than a prior-art purifier, and outputs, purified air at a lower temperature than does a prior-art purifier, which typically needs to include a combustor. The purified air is sufficiently-cool as to be suitable for immediate release into interior compartments occupied by humans or the air conditioning system.

Abstract: A method for removing fluorine gas from a selected environment comprises contacting the fluorine gas with water to generate a solution of hydrofluoric acid and contacting the solution of hydrofluoric acid with an ion exchange resin having an active state operative to exchange selected ions therein for fluoride ions in the solution. The apparatus (200) may include a dual resin setup (222, 223) such that one of the ion-exchange resin can be in the service cycle while the other of the ion-exchange resins undergoes the regeneration and rinse/refill cycles.

Abstract: The invention relates to a method of treating a substantially gaseous halo-containing compound of an effluent of a glass manufacturing facility and a system for such method. The method includes the step of oxidizing the halo-containing compound to form a hydrogen and halo-containing compound. The method also includes the step of adsorbing a halogen of the hydrogen and halo-containing compound on a surface. The system includes at least one glass manufacturing apparatus which the operation of the apparatus in glass manufacturing generates an effluent which comprises a substantially gaseous halo-containing compound. The system also includes an oxidizer in fluid communication to receive the halo-containing compound and oxidize the compound to transform the halo-containing compound into a hydrogen and halo-containing compound. The system further includes a scrubber for receiving said hydrogen and halo-containing compound and absorbing the halogen from the hydrogen and halo-containing compound.

Abstract: The present invention provides a process for eliminating halogen-containing compounds contained in a gas or a liquid, characterized in that the gas or liquid is brought into contact with a composition based on an alumina and/or a hydrated alumina and at least one compound (A) comprising at least one metallic element selected from metals from groups VIII, IB and/or IIB of the periodic table, and in that the total metallic element(s) content is at most 45% by weight with respect to the total composition weight, the complement by weight preferably comprising in a major part alumina and/or hydrated alumina.

Abstract: The present invention provides a method for separating each substance from a mixed gas containing a plurality of substances comprising the steps of: liquefying the mixed gas by cooling; and separating the plural substances transferred into a liquid generated by the liquefying step into the substances of one group and the substances of the other group, wherein the substances of one group substantially remain to present in the liquid and the substances of the other group are separated from the liquid by evaporation.

Abstract: The invention provides a method for removing the harmful effects of organic halogen compound gas, in which an organic halogen compound gas (20) discharged by a production unit (8) is transferred into an organic halogen compound-decomposing unit (4) via an adsorbing part (6) that contains an adsorbent (60), followed by decomposing the organic halogen compound gas (20) in the organic halogen compound-decomposing unit (4), and provides an apparatus for removing the harmful effects of organic halogen compound gas, a system for fabricating semiconductor devices, and a method for fabricating semiconductor devices.

Abstract: The invention relates to a method for reducing the elementary halogen contained in a gaseous effluent from a combustion furnace for combusting halogenated residues, comprising the bringing of said effluent into contact with hydrazine. The invention also relates to a device or an installation for treating a gaseous effluent from a combustion furnace (1) for combusting halogenated residues, comprising a unit (6, 10, 14) in which the gases are brought into contact with an aqueous solution of hydrazine. Finally, the invention relates to a solution of halohydric acid containing hydrazine.

Abstract: An apparatus and method are provided for treating pollutants in a gaseous stream. The apparatus comprises tubular inlets for mixing a gas stream with other oxidative and inert gases for mixture within a reaction chamber. The reaction chamber is heated by heating elements and has orifices through which cool or heated air enters into the central reaction chamber. A process is also provided whereby additional gases are added to the gaseous stream preferably within the temperature range of 650 C-950 C which minimizes or alleviates the production of NOx.

Abstract: Method and apparatus for abating F2 from byproducts generated during cleaning of a processing chamber. F2 abatement is efficiently performed by directly injecting H2 in line with a foreline exiting the processing chamber. A tube which is highly resistant to oxidation and corrosive gases, even at high temperature, is connected in line with the foreline as part of the exhaust line of the processing chamber. A cooling jacket may be provided for cooling the tube, since the reaction between F2 and H2 is exothermic. A pressure monitoring arrangement may also be employed to insure that pressure within a hydrogen line, that feed the injection of H2 into the tube, does not exceed a predetermined pressure value.

Abstract: There are disclosed various processes, apparatuses and systems for treating a halogen-containing gas such as F2 that involve generating a plasma in order to reduce chemically the halogen-containing gas into products that are more environmentally manageable. According to a particular embodiment, a reducing agent is mixed with the halogen-containing gas to produce a feed gas mixture and a non-thermal plasma is generated in the feed gas mixture in the presence of liquid water.

Abstract: An effluent abatement system 200 that may be used to abate F2 gas content of effluent exhausted from a process chamber 35, such as effluent from a CVD chamber cleaning process includes a catalytic reactor 250 to reduce the content of F2 in the effluent 100. The system may further include a prescrubber 230 to add reactive gases to the effluent 100 and/or to treat the effluent 100 prior to treatment in the catalytic reactor 250. Alternatively reactive gases can be added to the effluent 100 by a gas source 220.

Abstract: A process for the scrubbing of chlorine is scrubbed from a chlorine-containing gas using an aqueous feed liquor containing an excess of alkali to give an effluent liquor containing chloride and hypochlorite ions is disclosed. The effluent liquor is recycled as part or all of the aqueous feed liquor. For at least part of the time, at least part of the effluent liquor is passed through a fixed bed of a catalyst for the decomposition of hypochlorite ions whereby hypochlorite ions are decomposed to oxygen gas and chloride ions. The resultant catalyst-treated liquor is mixed with the remainder, if any, of the effluent liquor and recycled, optionally together with added fresh alkali solution, as the aqueous feed liquor. Part of the effluent liquor is optionally discharged as a purge stream before or after passage through catalyst bed.

Abstract: A method for removing a halogen series gas, which comprises bringing a halogen series gas comprising a halogen element or a halogen compound into contact with a granulated product, wherein the granulated product is obtained by granulating a powder of a hydrogencarbonate having a mean particle diameter of primary particles of from 10 to 500 &mgr;m, and has a mean particle diameter of from 0.

Abstract: Compounds having the formula A2B3O6±d wherein A is an alkaline-earth metal, an alkaline metal, a lanthanide, or a solid solution thereof, B is a transition metal, an element of group III, or a solid solution thereof, and d has a value between 0 and 1; a method for preparing the compounds; a method for producing composite materials on various matrices and thin or thick films deposited on various substrates which contain the compounds; their use; and a method for eliminating certain gases from a mixture that includes them by using the compounds.

Abstract: A method for oxidizing HCl to produce pure chlorine gas by reacting HCl with a mixture of sulfuric and nitric acids. Chlorine gas is evolved. Spent nitric and sulfuric acids are first regenerated by contact with air or oxygen. After regeneration, the entire stream of regenerated acid, or major portion thereof, is reconcentrated. The concentration of sulfuric acid occurs at lower strengths (60%-80%) and temperatures. The concentrated acid may be used to oxidize more HCl. Heat evolved by the regeneration of the spent acids is carried into the acid concentration stage.

Abstract: A process for destroying fluorine in a gas containing such fluorine by contacting the gas with a fluidized bed of metal particles capable of reacting with such fluorine wherein the metal particles have a particle size essentially no greater than approximately 300 microns. The process can be conducted in parallel connected switching fluidized beds wherein the beds are switched based upon achieving a predetermined bed height expansion based upon the reaction of the metal particles with such fluorine.

Abstract: A system and method processed gases from an exhaust stream using by pulsing energy through a corona wire near the exhaust stream and adding a reagent gas to combine with the exhaust when the exhaust and reagent gas receives the energy.

Abstract: A system for abating fluorocompound, e.g., fluorine or gaseous fluorine-containing compounds, in an effluent gas stream containing same, by scrubbing of the effluent gas stream with an aqueous scrubbing medium in the presence of a reducing agent, e.g., sodium thiosulfate, ammonium hydroxide, or potassium iodide. The abatement system of the invention has utility in the treatment of semiconductor manufacturing process effluents containing fluorine and/or fluorocarbon gas species.

Abstract: Processes are disclosed for increasing the condensed phase production of BCl3 comprising less than about 10 ppm phosgene, less than 10 ppm chlorine, and less than 10 ppm HCl. In one embodiment the process comprises injecting an inert gas into a container having condensed BCl3 therein, the condensed BCl3 having therein a minor portion of phosgene impurity. A major portion of the phosgene in the condensed BCl3 is decomposed to carbon monoxide and chlorine by increasing temperature to produce a phosgene deficient stream. The temperature of the phosgene deficient stream is then decreased, and contacted with an adsorbent to remove the chlorine in the stream by adsorption to form a chlorine and phosgene free condensed stream. The chlorine and phosgene free stream is stripped using an inert gas to form a BCl3 product condensed stream, and an inert gas is used to pump the BCl3 product condensed stream to a product receiver.

Abstract: Processes are disclosed for increasing the condensed phase production of BCl3 comprising less than about 10 ppm phosgene, less than 10 ppm chlorine, and less than 10 ppm HCl. In one embodiment the process comprises injecting an inert gas into a container having condensed BCl3 therein, the condensed BCl3 having therein a minor portion of phosgene impurity. A major portion of the phosgene in the condensed BCl3 is decomposed to carbon monoxide and chlorine by increasing temperature to produce a phosgene deficient stream. The temperature of the phosgene deficient stream is then decreased, and contacted with an adsorbent to remove the chlorine in the stream by adsorption to form a chlorine and phosgene free condensed stream. The chlorine and phosgene free stream is stripped using an inert gas to form a BCl3 product condensed stream, and an inert gas is used to pump the BCl3 product condensed stream to a product receiver.

Abstract: In order to reduce pollutants in the waste gas of regeneration plants for spent hydrochloric acid from pickling plants a process is provided, comprising the thermal decomposition of iron chloride in the spent pickling acid to iron oxide and gaseous hydrochloric acid, wherein to the spent pickling acid at least one compound is admixed which contains nitrogen having a low oxidation number, for example ammonium compounds, ammonia, urea or amides.

Abstract: A process for the purification of SiO2 granulate is provided, where the SiO2 granulate is supplied into a reaction zone, heated therein and exposed to a treatment gas which comprises a halogen-containing component. The treatment gas comprises a fuel gas with hydrogen-containing component, which component is combusted in the reaction zone, forming a fuel gas flame to which the SiO2 granulate is exposed. The treatment gas reacts with contaminants in the SiO2 granulate to create volatile reaction products which are removed from the reaction zone. The process produce SiO2 granulates of high purity in a reproducible manner, while incurring relatively low expenditures in time, material and money. The apparatus for implementation of the process comprises a burner supplied with a fuel gas for generating a fuel gas flame and a with halogen-containing component, a supply device which feeds the SiO2 granulate to the fuel gas flame, and a separating device for separating the SiO2 granulate from a waste gas.

Abstract: Water present in a hot gaseous product stream from a reactor system A.B (FIG. 1) containing hydrogen fluoride is separated from the stream in order to eliminate a potentially corrosive combination of water and HF. The water is removed by contacting the gaseous product stream with liquid HF in a distillation column so as to obtain a bottoms product containing liquid HF and water and a top product containing dry HF and the product to be recovered. The invention encompasses the separation process, a vessel for carrying out the process (FIGS. 2 to 4), a control system for the liquid HF supply to the distillation column (FIGS. 5 and 6) and a recovery system for recovering HF employed during operation of the reactor system in different regimes employing HF as a fluorination agent, as a diluent during catalyst regeneration and/or catalyst prefluorination (FIG. 7).

Abstract: A process for recovering SF.sub.6 from a gas is provided. The process includes the step of contacting a gas stream comprising SF.sub.6 and at least one of N.sub.2, O.sub.2, CO.sub.2, and H.sub.2 O with a membrane in at least one membrane separation unit at conditions effective to obtain a retentate stream rich in SF.sub.6 and a permeate stream rich in at least one of N.sub.2, O.sub.2, CO.sub.2, and H.sub.2 O. A process for forming solidified Mg metal is also provided. The process includes recovering and/or recycling of SF.sub.6 and/or CO.sub.2.

Abstract: An electrolysis cell with a fixed-bed electrode and its use for the purification of waste gases. The electrolysis cell includes a fixed-bed electrode, a counterelectrode which is separated from it and designed as a gas diffusion electrode, devices for the supply and flow-off of an electrolyte as well as for the inlet and outlet of the gas to be purified and a space associated with the counterelectrode with devices for the supply and the removal of a gas. In order to purify gas the fixed-bed electrode is operated as a trickle bed and the gas to be purified flows in cocurrent or countercurrent flow to the electrolyte. In reductive purification hydrogen is supplied to the gas diffusion electrode and in oxidative purification oxygen is used.

Abstract: A process for the abatement of a ClF.sub.x containing gas such as exhaust gases from a reactor wherein at least one step of the manufacture of integrated circuit is carried out, wherein the ClF.sub.x containing gas is passed through a bed of adsorbent comprising sodalime having a moisture content of less than 3% by weight, to substantially remove all of the ClF.sub.x compound from the ClF.sub.x containing gas with substantially no generation of byproducts.

Abstract: A process for recovery of fluorocompound gas from an effluent gas stream containing the fluorocompound gas and other gas components, in which at least one of the other gas components is removed, e.g., by oxidation or contacting of the effluent stream with a dry material such as an adsorbent or scrubber medium, to yield a first effluent gas mixture containing the fluorocompound gas. The fluorocompound gas is removed from the first effluent gas mixture and recovered as a concentrated fluorocompound gas, by a process such as cryogenic processing, membrane separation, and/or adsorption.

Abstract: There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gas containing at least one member selected from the group consisting of nitrogen fluorides, tungsten fluorides, silicon fluorides, hydrogen fluoride and fluorine, especially nitrogen trifluoride into contact with a cleaning agent comprising stannous oxide as an effective ingredient at a temperature of 200.degree. C. at the lowest. The above process makes it possible to clean the harmful gas in a high performance at a relatively low temperature without by-producing a harmful gas or a gas with a fear of causing environmental pollution.

Abstract: A process for the electrolytic removal of contaminants from gases, wherein a gas and a liquid electrolyte are passed co- or counter-currently through a fixed bed electrode of an electrolysis cell which has a counterelectrode separated from the fixed bed electrode by a separator and the contaminant is electrochemically converted at an effective cell voltage. Such cells have hitherto been operated in a flooded state. The degree of purification may be substantially increased if the fixed bed electrode is operated as a trickle bed reactor.

Abstract: This invention relates to a process for thermally cracking waste polymer(s) comprising chlorinated polymers in a reactor in the presence of a fluidizing gas and a fluidized bed of solid, particulate fluidizable material at a temperature from 350.degree.-600.degree. C. to cracked products comprising a mixed vapor of lower hydrocarbons which have a chlorine content of less than 50 ppm. In the process, the cracked products emerging from the fluidized bed are passed through one or more guard beds comprising calcium oxide or a compound capable of giving rise to calcium oxide under the reaction conditions maintained at a temperature in the range from 400.degree.-600.degree. C. in such a way that the chlorine content of the product is less than 50 ppm.

Abstract: A process for cleaning a harmful gas which comprises bringing a harmful gas containing a halogen gas and/or a halogen compound gas such as hydrogen fluoride, hydrogen chloride, tungsten hexafluoride, silicon tetrafluoride and boron trifluoride into contact with a cleaning agent comprising metal oxides composed principally of copper (II) oxide and manganese (IV) oxide that are spreadingly and adhesively incorporated with sodium formate so as to remove a harmful component from the harmful gas. According to the cleaning process of the present invention, it is possible to remove harmful components from the harmful gas in extremely high efficiency at ordinary temperature, dispensing with heating or cooling irrespective of the concentration of the harmful components. The cleaning capacity of the cleaning agent is favorably maintained without deterioration even when the harmful gas is in a dry state.

Abstract: Impurities such as halides and ammonia are efficiently removed from a gas containing Sox at a high concentration without any substantial addition of fresh water in a process for purifying a sulfur oxides-containing gas. The process involves passing a gas containing sulfur oxides and impurities at a high concentration successively through a first washing column and thence through a second washing column, thereby water washing the gas through the two washing columns to remove the impurities from the gas. The first washing column is operated so that the outlet temperature of the gas from the first washing column is at a temperature at which the gas can have a maximum water content or a temperature near this temperature, and the second washing column is operated such that the outlet temperature of the gas from the second washing column at least 20.degree. C. lower than the outlet temperature of the gas from the first washing column.

Abstract: The present invention relates to a process for the removal of sulphur dioxide from waste gases which process comprises contacting a waste gas containing sulphur dioxide with an aqueous solution containing sulphuric acid, hydrogen bromide and bromide to form sulphuric acid and hydrogen bromide; catalytically oxidizing in the vapor phase the hydrogen bromide formed to bromine and thereafter recycling the bromine to the first step of the process.

Abstract: There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gaseous halogenide such as chlorine, hydrogen chloride, dichlorosilane, silicon tetrachloride, phosphorus trichloride, chlorine trifluoride, boron trichloride, boron trifluoride, tungsten hexafluoride, silicon tetrafluoride, fluorine, hydrogen fluoride and hydrogen bromide into contact with a cleaning agent comprising zinc oxide, aluminum oxide and an alkali compound to remove the above halogenide. The above process is extremely effective for promptly and efficiently removing the above gaseous halogenide that is contained in the gas discharged from semiconductor manufacturing process.

Abstract: Gas reacting apparatus and method are described for wet mass transfer of solute gases from a gas stream with a liquid or slurry reacting medium capable of chemisorption of solute gases in the gas stream. The apparatus comprises an elongated conduit means and plurality of dual-fluid spray means coaxially spaced in series within the conduit means and countercurrently or cocurrently directed to the gas stream for spraying the liquid or slurry reacting medium into the conduit means to form a plurality of spray contact zones of uniformly-distributed fine droplets, which may be in individual gas-liquid contact zones, wherein intimate contact of high interfacial surface area between the sprayed liquid or slurry and the gas stream is effected to remove solute gases from the gas stream. Such individual gas-liquid contact zones may be separated by demisters which agglomerate and remove liquid droplets from the gas stream before it passes to the next zone, with a demister also being provided at the outlet.

Abstract: A separator plate for a chemical oxygen generator candle includes an elongate rigid thermal insulating section; and at least a first conduit section on one side of the rigid section having a multiplicity of gas flow paths for conducting released oxygen from a burning candle longitudinally along the plate for increasing the burning action of the burning portion of the candle and pre-heating the unburned portion of the candle, and for retaining gas to act as a thermal insulator when the candle is not burning. A plurality of such plates are combined to form a separator assembly for surrounding a candle and a number of such separator assemblies are combined to form a multi-candle oxygen generator.

Abstract: An improvement is provided in a process for the preferential removal of chlorine from an aqueous solution of chlorine dioxide and chlorine which has been prepared by the process of reducing a chlorate with a reducing agent in a strong acid, and wherein the gases produced thereby are dissolved in water. The improvement comprises the step of adding hydrogen peroxide, oxalic acid or a salt of oxalic acid, to a cool (i.e. at a temperature of about 0.degree. C. to about 25.degree. C.) aqueous solution of the chlorine within a period of less than 2.5 hours dioxide and chlorine. Substantially all of the chlorine is destroyed with almost no destruction of the chlorine dioxide.

Abstract: A gas treatment method and apparatus for use in connection with processes of etching semiconductor devices or of plasma enhanced chemical vapor deposition onto semiconductor materials. In accordance with the method and apparatus, the exhaust gases are introduced into first and second stages while heating the first and second stages. The stages can be contained within a heated cartridge. The first stage contains silicon or a silicon-rich alloy or a silicon-rich substance in a particulate form and a partial coating of copper or a copper rich substance in intimate contact with the silicon, the silicon-rich alloy or the silicon-rich substance. The second stage contains calcium oxide, a calcium oxide containing material, or a soda lime containing medium.

Abstract: There is disclosed a process for cleaning a harmful gas which comprises bringing a harmful gaseous halogenide such as chlorine, hydrogen chloride, dichlorosilane, silicon tetrachloride, phosphorus trichloride, chlorine trifluoride, boron trichloride, boron trifluoride, tungsten hexafluoride, silicon tetrafluoride, fluorine, hydrogen fluoride and hydrogen bromide into contact with a cleaning agent comprising zinc oxide, aluminum oxide and an alkali compound to remove the above halogenide. The above process is extremely effective for promptly and efficiently removing the above gaseous halogenide that is contained in the gas discharged from semiconductor manufacturing process or leaked suddenly from a gas bomb in an emergency.

Abstract: By reaction of Cl and ClO radicals with alkaline cations, such as K.sub.2 O.sub.2, Na.sub.2 O.sub.2, CaO, CaO . MgO, Ca(OH).sub.2, CaCO.sub.3, (Ca Mg) (CO.sub.3).sub.3, Na.sub.2 CO.sub.3, NaHCO.sub.3 and NaHCO.sub.3 . Na.sub.2 CO.sub.3 . 2 H.sub.2 O, these radicals are either bound in ultraviolet radiation stable crystalline inorganic lattices or in high stability alkaline salt solutions. Since most of these salts are hygroscopic, they are able to pick up water vapor from the atmosphere, increase in size, and fall through the stratosphere and troposphere resulting in a faster removal rate than would otherwise occur.

Abstract: A solute gas absorbing procedure employs a parallel flow of liquid absorbing medium to dual-fluid spray nozzles from which are formed fine droplet sprays in which the solute gas is absorbed. The invention is particularly applicable to the removal of acid gases, such as SO.sub.2, using regenerable aqueous alkaline absorbing media, such as amines or amine salts.

Abstract: A method and apparatus for the generation, use, and disposal of chlorine dioxide is disclosed. A solid sodium chlorite composition having impurities, at least one of which is sodium hydroxide, is contacted with an agent to consume essentially all of the sodium hydroxide. Chlorine dioxide gas is then generated by contacting the resultant composition with chlorine in a humidified inert carrier gas. The resultant chlorine dioxide gas mixture may then be treated to remove chlorine gas present therein by contacting the same with soda-lime in particulate form. After using the chlorine dioxide gas mixture in the desired manner, chlorine dioxide present in the spent effluent gas may be substantially removed via the introduction of the effluent gas into an aqueous solution of sodium thiosulfate having a sufficient amount of an inorganic base to maintain the alkalinity of the solution during consumption of thiosulfate by chlorine dioxide.

Abstract: A gaseous mixture containing chlorine, carbon dioxide and non-condensable gas is compressed and cooled to separate it into a residual gas formed principally of a major portion of the non-condensable gas and a condensate formed primarily of chlorine. The condensate is fed to a stripping column to desorb carbon dioxide and a minor portion of the non-condensable gas dissolved in the condensate. The stripped gas formed primarily of chlorine and carbon dioxide may be treated further. Namely, the stripped gas is mixed with the residual gas. At least a portion of the mixed gas is fed into an absorption column, whereby a major portion of remaining chlorine is absorbed to lower the chlorine content Removal of chlorine from such a gaseous mixture or an off-gas from the above process can be achieved by washing it with an aqueous solution or suspension containing an alkali metal sulfite and/or an alkaline earth metal sulfite while controlling the pH of the solution or suspension within a range of 1.9-6.3.

Abstract: An improved process and device for removing free halogen from residual gasses containing up to 15% by volume oxygen. Gaseous hydrocarbons and hydrogen are uniformly dispersed in the residual gasses either simultaneously or sequentially and preferentially reacted with the free halogen present before a competing reaction with oxygen can occur. The dispersion device includes an outer housing member, a centrally disposed second member which transports the residual gas from the burner through the cooling zone, and means for transporting gaseous hydrocarbons and hydrogen from the housing member to the second member for rapid and uniform dispersion in the residual gas stream.

Abstract: This invention relates to gas treatment apparatus and methods and particularly, but not exclusively, to such apparatus and methods for use with exhaust products from semi-conductor manufacturing process.A reactor column 10 has an inlet 11 at the bottom and an outlet 12. Between the inlet and outlet it is divided into three sequential stages containing: silicon or silicon containing materials; lime or soda lime and copper oxide or copper oxide reagents.

Abstract: A waste disposal site, such as an ultimate disposal site for radioactive substances, includes installed waste having hollow spaces remaining therebetween. Packing material fills the remaining spaces. At least one substance to which gaseous toxic substances such as radioactive gases adhere, is admixed with the packing material.

Abstract: Process for the combustion of toxic gaseous effluents bereft of oxygen in a flame, comprising an inner cone (8) supplied with combustible gas (6) and with so-called primary combustion-suppporting gas (7). Said gaseous effluent (10) and a so-called secondary combustion-supporting gas (9) are introduced separately at the level of said inner cone, said secondary combustion-supporting gas being introduced in the form of at least one jet directed towards the axis (D) of said inner cone at a flowrate and speed sufficient to ensure an excess of combustion-supporting gas, the maintenance of temperature and to create a turbulent gaseous mass at the level of said inner cone; the toxic gaseous effluent (10) being introduced into said turbulent gaseous mass. Said process is carried out under a depression. It also relates to an installation for carrying out said process.

Abstract: An apparatus and method for eliminating unwanted materials, such as corrosive gases, from an effluent gas flow line includes a reactive trap wherein chemical reaction between the unwanted material, a reactant gas and a reactive element takes place under induced plasma conditions. A ballast gas may be added to adjust operating pressures and to aid in creating the plasma. The reactant gas and the reactive element are selected so that relative harmless by-products are produced. The reactive element is preferably maintained at a temperature of approximately 400.degree. C. and the chemical by-products are passed through a condensation element in the reactive trap which element is maintained at approximately 30.degree. C. Preferably, the plasma is induced by a microwave transmitter in conjunction with a waveguide inserted into a reactive trap, and a control system automatically monitors and adjusts the temperature and pressure of the reaction as well as controls the ratio of effluent gas and ballast gas.

Abstract: A process for producing a chlorine-free hydrochloric acid low in AOX from crude gases containing hydrogen chloride and organic impurities has been found. The crude gases wer subjected to a thermal treatment at 800.degree. to 1600.degree. in a reducing atmosphere. The hydrochloric acid obtained after absorption of the hydrogen chloride is chlorine-free and contains virtually no organic impurities. The waste gas is also chlorine-free.

Abstract: The invention provides a process for the selective absorption of chlorine and/or bromine from CO.sub.2 -containing off-gases. The off-gas must contain at least 1 mol of SO.sub.2 per mol of Cl.sub.2 and/or per mol of Br.sub.2 ; if necessary sufficient SO.sub.2 is added to the off-gas to give the above-mentioned relative amount. Chlorine and/or bromine is absorbed by mixing the off-gas with steam and then cooling the mixture until the steam condenses. An example of a suitable apparatus is a vertical tube having an internal cooling coil.