From Nitride Of Metal Or Silicon Patents (Class 423/353)
  • Patent number: 11819827
    Abstract: Provided are a supported metal material showing high catalytic activity, a supported metal catalyst, a method of producing ammonia and a method of producing hydrogen using the supported metal catalyst, and a method of producing a cyanamide compound. The supported metal material of the present invention is a supported metal material in which a transition metal is supported on a support, and the support is a cyanamide compound represented by the following general formula (1): MCN2 (1), wherein M represents a group II element of the periodic table, and the specific surface area of the cyanamide compound is 1 m2 g?1 or more.
    Type: Grant
    Filed: March 16, 2018
    Date of Patent: November 21, 2023
    Assignees: JAPAN SCIENCE AND TECHNOLOGY AGENCY, TOKYO INSTITUTE OF TECHNOLOGY
    Inventors: Hideo Hosono, Kazuhisa Kishida, Masaaki Kitano, Toshiharu Yokoyama
  • Patent number: 11661658
    Abstract: Systems and methods for electrochemical ammonia synthesis comprise electrolytes which have greater efficiency than water, thus leading to cost reductions; and/or cathode catalysts which have lower costs and higher efficiencies in comparison to the iron/nickel catalysts noted above. The electrolyte may be composed primarily of a combination of non-aqueous hydrogen bond donors and acceptors, with high nitrogen solubility and high conductivity. The cathode catalyst may be composed of either a manganese-doped oxide or carbonate material or a two-dimensional carbide or nitride material.
    Type: Grant
    Filed: June 14, 2019
    Date of Patent: May 30, 2023
    Inventor: Benjamin Joseph Hertzberg
  • Patent number: 11498844
    Abstract: The present invention concerns an ammonia production method comprising the steps of: providing at least one rare earth nitride material or layer in a chamber; creating a vacuum or an inert atmosphere in the chamber; and providing hydrogen H2 to react with nitrogen N released at an external surface of the at least one rare earth nitride material or layer to produce ammonia.
    Type: Grant
    Filed: July 2, 2018
    Date of Patent: November 15, 2022
    Assignee: VICTORIA LINK LIMITED
    Inventors: Franck Natali, Benjamin John Ruck, Harry Joseph Trodahl
  • Patent number: 11407646
    Abstract: The purpose of the present invention is to provide a method for synthesizing ammonia and an apparatus for the method. The method for synthesizing ammonia according to the present invention comprises: a step of melting a metal containing at least an alkali metal; and a step of supplying a hydrogen gas and a nitrogen gas to the molten metal.
    Type: Grant
    Filed: June 28, 2017
    Date of Patent: August 9, 2022
    Assignee: National Institute for Materials Science
    Inventors: Fumio Kawamura, Takashi Taniguchi
  • Patent number: 9446954
    Abstract: The invention relates to a process for preparing trisilylamine and polysilazanes in the liquid phase, in which ammonia is introduced in a superstoichiometric amount relative to 5 monochlorosilane which is present in an inert solvent. Here, a reaction in which trisilylamine and polysilazanes are formed proceeds. TSA is subsequently separated off in gaseous form from the product mixture. The TSA obtained is purified by filtration and distillation and obtained in high or very high purity. The bottom product mixture is conveyed from the reactor through a filter unit in which solid ammonium chloride is separated off to give a liquid mixture of polysilazanes and solvent. This is fed to a further distillation to recover solvent. As a result of the NH3 being introduced in a superstoichiometric amount relative to monochlorosilane, monochlorosilane is completely reacted in the reactor.
    Type: Grant
    Filed: June 5, 2013
    Date of Patent: September 20, 2016
    Assignee: Evonik Degussa GmbH
    Inventors: Carl-Friedrich Hoppe, Christian Goetz, Goswin Uehlenbruck, Hartwig Rauleder
  • Patent number: 8916123
    Abstract: Ammonia is synthesized using electrochemical and non-electrochemical reactions. The electrochemical reactions occur in an electrolytic cell having a lithium ion conductive membrane that divides the electrochemical cell into an anolyte compartment and a catholyte compartment. The catholyte compartment includes a porous cathode closely associated with the lithium ion conductive membrane. The overall electrochemical reaction is: 6LiOH+N2?Li3N (s)+3H2O+3/2O2. The nitrogen may be produced by a nitrogen generator. The non-electrochemical reaction involves reacting lithium nitride with water and/or steam as follows: Li3N (s)+3H2O?3LiOH+NH3 (g). The ammonia is vented and collected. The lithium hydroxide is preferably recycled and introduced into the anolyte compartment. The electrolytic cell is shut down prior to reacting the lithium nitride with water. The cathode is preferably dried prior to start up of the electrolytic cell and electrolyzing Li+ and N2 at the cathode.
    Type: Grant
    Filed: March 23, 2012
    Date of Patent: December 23, 2014
    Assignee: Ceramatec, Inc.
    Inventors: Ashok V. Joshi, Sai Bhavaraju
  • Patent number: 8845992
    Abstract: Affords Group-III nitride single-crystal ingots and III-nitride single-crystal substrates manufactured utilizing the ingots, as well as methods of manufacturing III-nitride single-crystal ingots and methods of manufacturing III-nitride single-crystal substrates, wherein the incidence of cracking during length-extending growth is reduced. Characterized by including a step of etching the edge surface of a base substrate, and a step of epitaxially growing onto the base substrate hexagonal-system III-nitride monocrystal having crystallographic planes on its side surfaces. In order to reduce occurrences of cracking during length-extending growth of the ingot, depositing-out of polycrystal and out-of-plane oriented crystal onto the periphery of the monocrystal must be controlled.
    Type: Grant
    Filed: December 24, 2008
    Date of Patent: September 30, 2014
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Takuji Okahisa, Seiji Nakahata, Tomoki Uemura
  • Patent number: 8722573
    Abstract: The present invention relates to a novel sulfonated carbon silica (SCS) composite material and a process for the preparation thereof. The synthesized SCS composite material on calcination yields the hierarchical mesoporous silica (MS) and further finds application as catalyst in two industrially important reactions namely phenol butylation and glycerol acetalization.
    Type: Grant
    Filed: September 20, 2012
    Date of Patent: May 13, 2014
    Assignee: Council of Scientific & Industrial Research
    Inventors: Nagabhatla Viswanadham, Devaki Nandan
  • Patent number: 8586189
    Abstract: A gas-barrier film comprising at least one silicon hydronitride layer and at least one silicon nitride layer on a surface of a flexible supporting substrate. The film has an excellent gas-barrier property.
    Type: Grant
    Filed: September 16, 2008
    Date of Patent: November 19, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Shigehide Ito, Takeshi Senga
  • Publication number: 20130171053
    Abstract: The present invention relates to a method for converting nitrogen (N2) into nitrate and/or ammonia comprising the steps of compressing air and separating nitrogen (N2) and oxygen (O2) therefrom, and either reacting earth alkaline metal with oxygen to produce earth alkaline metal oxide, using the high temperatures obtained to react N2 and O2 to NO, converting the NO with O2 to NO2, followed by the reaction of NO2 with water to result in HNO3 and NO; or reacting the nitrogen obtained with earth alkaline metal to produce earth alkaline metal nitride and reacting thereof with water to result in earth alkaline metal hydroxide and ammonia.
    Type: Application
    Filed: December 27, 2012
    Publication date: July 4, 2013
    Applicant: KING SAUD UNIVERSITY
    Inventor: KING SAUD UNIVERSITY
  • Patent number: 8460834
    Abstract: A hydrogen production method includes: a first process in which nitrogen compounds of metal and water are reacted to produce ammonia and hydroxide of the metal; a second process in which hydrogen compounds of a metal and the ammonia produced in the first process are reacted; and a third process in which hydrogen compounds of a metal and the hydroxide of the metal produced in the first process are reacted.
    Type: Grant
    Filed: September 26, 2008
    Date of Patent: June 11, 2013
    Assignees: Toyota Jidosha Kabushiki Kaisha, Hiroshima University
    Inventors: Kyoichi Tange, Yoshitsugu Kojima, Takayuki Ichikawa, Chie Oomatsu, Satoshi Hino, Hironobu Fujii
  • Patent number: 8178477
    Abstract: Proppants which can be used to prop open subterranean formation fractions are described. Proppant formulations which use one or more proppants of the present invention are described, as well as methods to prop open subterranean formation fractions, and other uses for the proppants and methods of making the proppants.
    Type: Grant
    Filed: September 14, 2011
    Date of Patent: May 15, 2012
    Assignee: Oxane Materials, Inc.
    Inventors: Robert D. Skala, John R. Loscutova, Christopher E. Coker
  • Publication number: 20120070363
    Abstract: A method for producing ammonia includes reacting SiO2 and/or Al2O3, or material containing SiO2 and/or Al2O3, with addition of a carbon source, with gaseous nitrogen at elevated temperature to give silicon nitride (Si3N4) and/or aluminum nitride (AlN), or material containing silicon nitride and/or aluminum nitride, and reacting resultant silicon nitride and/or aluminum nitride, or material containing silicon nitride and/or aluminum nitride, in the presence of a basic alkali metal compound and/or alkaline earth metal compound, with water at elevated temperature to give ammonia and alkali metal silicates and/or alkaline earth metal silicates.
    Type: Application
    Filed: February 26, 2010
    Publication date: March 22, 2012
    Applicant: SPAWNT PRIVATE S.a.r.l.
    Inventors: Norbert Auner, Banibrata Pandey
  • Publication number: 20080213157
    Abstract: Systems and methods for producing ammonia. In one approach, Li3N is reacted with hydrogen to produce ammonia and is regenerated using nitrogen. Catalysts comprising selected transition metals or their nitrides can be used to promote the reactions. In another approach, supercritical anhydrous ammonia is used as a reaction medium to assist the reaction of hydrogen with nitrogen to produce ammonia, again promoted using catalysts.
    Type: Application
    Filed: January 16, 2008
    Publication date: September 4, 2008
    Applicant: HSM Systems, Inc.
    Inventors: Gerard Sean McGrady, Christopher Willson
  • Patent number: 7413721
    Abstract: A method for forming ammonia is disclosed and which includes the steps of forming a plasma; providing a source of metal particles, and supplying the metal particles to the plasma to form metal nitride particles; and providing a substance, and reacting the metal nitride particles with the substance to produce ammonia, and an oxide byproduct.
    Type: Grant
    Filed: July 28, 2005
    Date of Patent: August 19, 2008
    Assignee: Battelle Energy Alliance, LLC
    Inventors: Peter C. Kong, Robert J. Pink, Larry D. Zuck
  • Patent number: 6632379
    Abstract: A sialon type phosphor in the form of a powder comprising at least 40 wt % of &agr;-sialon represented by the formula (Cax,My)(Si,Al)12(O,N)16 (where M is at least one metal selected from the group consisting of Eu, Tb, Yb and Er, 0.05<(x+y)<0.3, 0.02<x<0.27 and 0.03<y<0.3) and having a structure such that Ca sites of Ca-&agr;-sialon are partially substituted by other metal M, at most 40 wt % of &bgr;-sialon, and at most 30 wt % of unreacted silicon nitride.
    Type: Grant
    Filed: June 6, 2002
    Date of Patent: October 14, 2003
    Assignee: National Institute for Materials Science
    Inventors: Mamoru Mitomo, Tadashi Endo, Kyouta Ueda, Masakazu Komatsu
  • Patent number: 6589448
    Abstract: A ceramic bearing ball in which at least a portion of a constituent ceramic is formed of an electrically conductive inorganic compound phase, whereby a proper electrical conductivity is imparted to the ceramic. Thus, electrifying of a bearing ball is prevented or effectively suppressed. This prevents the problem involved in production of balls of small diameter wherein such balls adhere to an apparatus (e.g., a container) during production thereof, thus hindering smooth progress of the production process. In addition, when ceramic balls are used in precision electronic equipment, such as a hard disk drive of a computer, which is operated at high rotational speed, adhesion of foreign substance due to electrification of the balls, and resultant generation of abnormal noise or vibration can be prevented or effectively suppressed.
    Type: Grant
    Filed: April 10, 2001
    Date of Patent: July 8, 2003
    Assignee: NGK Spark Plug Co., Ltd.
    Inventors: Tomonori Niwa, Tetsuji Yogo
  • Patent number: 6468486
    Abstract: An exhaust gas containing nitrides is treated by a process comprising: passing the exhaust gas containing nitrides through a microbe carrier packed layer while cyclically spraying circulating water onto the packed layer, thereby forming a water containing ammonia and conducting biological reactions in which ammonia is converted to nitrate; converting the nitrate in the water to nitrogen by a denitrification reaction; and recirculating the water which has been denitrified in the process, wherein nitration of ammonia is conducted by spraying the circulating water having a pH regulated to not more than 7.5 onto the microbe carrier packed layer.
    Type: Grant
    Filed: September 5, 2000
    Date of Patent: October 22, 2002
    Assignee: Ebara Corporation
    Inventors: Shigeki Yamashita, Masayoshi Kitagawa
  • Patent number: 6379449
    Abstract: Nitride or oxidenitride based red to yellow pigments, such as tantalum(V) nitride and oxidenitrides containing tantalum may be produced by passing ammonia over nitridable metal compounds, in particular oxide compounds, at 700 to 1250° C. According to the invention, nitriding proceeds in a rotary tube or fluidised bed reactor in the presence of an oxide from the series SiO2, ZrO2, GeO2, SnO2, TiO2 and HfO2 under conditions under which this oxide is substantially not nitrided.
    Type: Grant
    Filed: February 22, 2000
    Date of Patent: April 30, 2002
    Assignee: dmc
    Inventors: Martin Jansen, Eberhard Günther, Hans-Peter Letschert
  • Patent number: 5382554
    Abstract: High-packing silicon nitride powder having a tap density of at least about 0.9 g/cm.sup.3 is prepared by reacting a metallic silicon powder having a mean particle size of about 1 to 10 .mu.m, a BET specific surface area of about 1 to 5 m.sup.2 /g, and a purity of at least about 99% with nitrogen in a nitrogen atmosphere containing about 5 to 20% by volume of hydrogen at about 1,350 to 1,450.degree. C., and milling the resulting silicon nitride powder in a dry attritor. The powder is moldable into a compact having a density of at least about 1.70 g/cm.sup.3, from which a sintered part having improved dimensional precision and strength is obtained.
    Type: Grant
    Filed: November 10, 1993
    Date of Patent: January 17, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Haruyoshi Kuwabara, Akio Otsuka, Meguru Kashida
  • Patent number: 5344635
    Abstract: A powder mixture of aluminium nitride in the form of sintered agglomerates with fractions of different particle size, which mixture comprises (1) 80 to 50% by weight of aluminium nitride in the form of sintered agglomerates having a mean particle diameter of 30 to 50 .mu.m, and (2) 20 to 50% by weight of aluminium nitride in the form of unsintered particles and having a mean particle diameter of 0.1 to 5 .mu.m. The mixture is suitable for use as filler for polymer materials, especially for casting resins, from which moulded parts of high thermal conductivity can be fabricated, for example potted electronic components.
    Type: Grant
    Filed: February 1, 1993
    Date of Patent: September 6, 1994
    Assignee: Ciba-Geigy Corporation
    Inventors: Patrice Bujard, Ileana Cojanu
  • Patent number: 5200372
    Abstract: A sintered article is produced by mixing an intermetallic compound (binding phase) composed of at least one member selected from among carbides, nitrides, and borides of the elements of Groups 4a, 5a, and 6a in the Periodic Table of Elements and at least one element selected from among Al, Ni, Si, Co, Zr, and W with wBN, then mixing the resultant mixture with cBN and firing the produced mixture under a pressure exceeding 20 Kb at a temperature exceeding 1,000.degree. C. As a material for cutting tools, the sintered article is superior in quality to the conventional sintered article.
    Type: Grant
    Filed: December 31, 1990
    Date of Patent: April 6, 1993
    Assignee: Nippon Oil & Fats Co., Ltd.
    Inventors: Yutaka Kuroyama, Nasami Maeno
  • Patent number: 5166106
    Abstract: A process for preparing a nitridable silicon-containing material, which process includes (a) comminuting a slurry of silicon powder, water, at least one densification aid, including Al.sub.2 O.sub.3, and another densification aid, the comminuting performed to cause substantial chemical reaction between the silicon and the water; and (b) reducing the water content of the reacted slurry to form a dry mass. In another embodiment, at least one nitriding agent may be added to aid any nitridation which may be performed.
    Type: Grant
    Filed: October 8, 1991
    Date of Patent: November 24, 1992
    Assignee: Eaton Corporation
    Inventors: James P. Edler, Bohdan Lisowsky
  • Patent number: 5120686
    Abstract: A method of preparing an organosilazane including reacting a first halosilane having the formula RR.sup.1 SiX.sub.2, wherein X is F, Cl, Br, or I, and each R and R.sup.1, independently, is X, H, or a lower alkyl group; a first primary amine compound having the formula R.sup.2 NH.sub.2, wherein R.sup.2 is H or a lower alkyl group; and a second primary amine compound having the formula R.sup.3 NH.sub.2, wherein R.sup.3 is H or a lower alkyl group, R.sup.3 being different from R.sup.2, to form the organosilazane.
    Type: Grant
    Filed: January 7, 1991
    Date of Patent: June 9, 1992
    Assignee: The Dexter Corporation
    Inventor: Anthony A. Gallo
  • Patent number: 5110772
    Abstract: Ternary CaO-TiO.sub.2 -SiO.sub.2 compositions are discussed. These compositions are useful as sintering aids for silicon nitride sintering. Use of these ternary compositions allows silicon nitride to be effectively sintered at lower temperatures than when conventional yttria sintering aids are used.
    Type: Grant
    Filed: August 30, 1990
    Date of Patent: May 5, 1992
    Assignee: W. R. Grace & Co.-Conn.
    Inventor: Frederick J. Parker
  • Patent number: 5079198
    Abstract: A body of sintered silicon nitride contains new non-glassy phases which produce significant X-ray diffraction peaks at 2-theta diffraction angles corresponding to d-spacings of about 2.86 Angstroms and 3.59 Angstroms and process for making same, which process includes (a) comminuting a slurry of a silicon-containing powder, water, about 0.1 to 5 volume percent of Fe.sub.2 O.sub.3, about 0.1 to 5 volume percent Al.sub.2 O.sub.3, and about 0.5 to 10 volume percent CeO.sub.2, wherein all volume percents are based on the volume of the resultant silicon nitride, the composition of the slurry being such that about a 4 to 12 volume percent liquid phase is achieved during sintering; (b) reducing the water content of the reacted slurry to form a dry mass; (c) nitriding the dry mass by exposure to a nitriding gas at an elevated temperature to form silicon nitride; and (d) sintering the silicon nitride at about 1450.degree.-2100.degree. C.
    Type: Grant
    Filed: July 24, 1990
    Date of Patent: January 7, 1992
    Assignee: Eaton Corporation
    Inventors: James P. Edler, Bohdan Lisowsky
  • Patent number: 5055431
    Abstract: Silazanes and related compounds are prepared by providing a precursor containing one or more cyclic silazane units, causing polymerization to occur in the presence of a transition metal catalyst to form a polysilazane product. Further products may result from additional reaction. The novel compounds may be pyrolyzed to yield ceramic materials such as silicon nitride, silicon carbide and mixtures thereof. In a preferred embodiment, substantially pure silicon nitride and articles prepared therefrom are provided. Fibers, coatings, binders and the like may be prepared from the novel materials.
    Type: Grant
    Filed: April 3, 1990
    Date of Patent: October 8, 1991
    Assignee: SRI International
    Inventors: Yigal D. Blum, Edward J. Crawford
  • Patent number: 5055432
    Abstract: A process for preparing a nitridable silicon-containing material, which process includes (a) comminuting a slurry of silicon powder, water, at least one densification aid, including Al.sub.2 O.sub.3, and another densification aid, the comminuting performed to cause substantial chemical reaction between the silicon and the water; and (b) reducing the water content of the reacted slurry to form a dry mass. In another embodiment, at least one nitriding agent may be added to aid any nitridation which may be performed.
    Type: Grant
    Filed: July 24, 1990
    Date of Patent: October 8, 1991
    Assignee: Eaton Corporation
    Inventors: James P. Edler, Bohdan Lisowsky
  • Patent number: 4434142
    Abstract: There is disclosed a method for the treatment of aluminum dross oxides which contain aluminum metal, aluminum carbide, aluminum nitride and salts such as potassium and sodium chloride. The method comprises the thermal treatment of an aqueous suspension of the dross oxides with agitation in the presence of a particulate grinding medium. The method is practiced in a stirred reactor vessel which contains a bed of refractory, ceramic balls that are agitated with a slurry to provide a sufficient abrading action on the aluminum metal particles to remove the aluminum hydroxide coating and continually expose the aluminum metal for reaction with the water. This invention comprises the introduction of a purge gas into the suspension, preferably air, during its thermal treatment to reduce the formation of foam during the treatment and to assist in liberation of ammonia formed by the decomposition of the aluminum nitride.
    Type: Grant
    Filed: September 28, 1982
    Date of Patent: February 28, 1984
    Assignee: Imperial West Chemical Company
    Inventor: John A. Huckabay
  • Patent number: 4416952
    Abstract: The oxynitride film according to the present invention contains Ga and/or Al and has O/N ratio of at least 0.15. This film is obtained by relying on, for example, chemical vapor deposition technique. The O/N ratio in the film may be varied by, for example, varying the distance between the substrate and the substance-supply source, or by varying the proportion of an oxidizing gas contained in a carrier gas. This film is used either as a surface passivation film of III-V compound semiconductors such as GaAs, or as an insulating film for active surface portions of IG-FET, or as an optical anti-reflective film.This is a division of application Ser. No. 215,442 filed Dec. 11, 1980, now Pat. 4,331,737, which in turn is a continuation of application Ser.No. 23,766, filed Mar. 26, 1979.
    Type: Grant
    Filed: February 24, 1982
    Date of Patent: November 22, 1983
    Assignee: Zaidan Hojin Handotai Kenkyu Shinkokai
    Inventors: Jun-ichi Nishizawa, Ikuo Shiota