Abstract: A stable oxidized structure and an improved method of making such a structure, including an improved method of making an interfacial template for growing a crystalline metal oxide structure, are disclosed. The improved method comprises the steps of providing a substrate with a clean surface and depositing a metal on the surface at a high temperature under a vacuum to form a metal-substrate compound layer on the surface with a thickness of less than one monolayer. The compound layer is then oxidized by exposing the compound layer to essentially oxygen at a low partial pressure and low temperature. The method may further comprise the step of annealing the surface while under a vacuum to further stabilize the oxidized film structure. A crystalline metal oxide structure may be subsequently epitaxially grown by using the oxidized film structure as an interfacial template and depositing on the interfacial template at least one layer of a crystalline metal oxide.

Abstract: A process to produce magnesium diboride objects from boron objects with a similar form is presented. Boron objects are reacted with magnesium vapor at a predetermined time and temperature to form magnesium diboride objects having a morphology similar to the boron object's original morphology.

Abstract: An epitaxial growth system is provided with a susceptor driving mechanism for rotationally driving a susceptor in a process chamber and this susceptor driving mechanism has a support shaft coupled to the susceptor, a driven portion, and an annular member with a plurality of permanent magnets arranged outside the driven portion. The driven portion is constructed in such structure that a coating for corrosion prevention consisting of a nickel coating, a chromium coating, and a metal oxide film formed by a passivation treatment with ozone is provided on a surface of a magnetic member.

Abstract: A chemical vapor deposition (CVD) system is provided for processing a substrate 110. The system 100 includes a heated muffle 115, a chamber 120 having an injector assembly 130 for introducing chemical vapor to process the substrate 110, and a belt 105 for moving the substrate through the muffle and chamber. The belt 105 has an oxidation-resistant coating 175 to reduce formation of deposits thereon. The coating 175 is particularly useful for resisting formation of chromium oxides on belts made from a chromium-containing alloy. In one embodiment, the oxidation-resistant coating 175 comprises a securely-adhered oxide layer 185 that is substantially free of transition metals. Preferably, the oxidation-resistant coating 175 comprises aluminum oxide. More preferably, the coating 175 comprises an aluminum oxide layer 185 securely adhered over a nickel aluminide layer 180.

Abstract: A method is described for reducing surface oxide growth which heating aluminum containing surfaces in a vacuum environment prior to the deposition of a ceramic coating. The method comprises flowing an inert or non reactive gas into the coating apparatus adjacent to the surface to be coated to reduce oxygen reaction with the surface.

Abstract: A heat treatment method for heat treating a thin film is a method for heat treating the thin film having a metallic silicide layer, comprising a heating step, a temperature keeping step and a cooling step. Among these steps, the thin film is heated in an atmosphere of gas which is oxidizing gas or includes oxidizing gas at least in the heating step. An oxide film is formed on the thin film in the heating step to prevent the phosphorous atoms from escaping.

Abstract: Process for selected adjustment of dropwise condensation on a surface comprising implanting nitrogen ions with a theoretically predicted minimum dose concentration of 1015 cm−2, the wetting characteristics of the surface being adjusted without cleaning or other preparation steps in such a way that stable dropwise condensation is formed on the surface and the intensity of condensation and thus heat transfer performance can be selected using the level of the dose concentration.

Abstract: A method of depositing a functional group on a surface portion of an elastic substrate comprises the steps of: (a) stretching an elastic substrate having an initial surface portion to form an enlarged surface portion from the initial surface portion; then (b) conjugating a functional group on the enlarged surface portion; and then (c) releasing the substrate to form a reduced surface portion from the enlarged surface portion, with the reduced surface portion having an area less than the enlarged surface portion, and with the reduced surface portion having the functional group deposited therein at a greater density than the enlarged surface portion.

Abstract: An apparatus for and method of developing fingerprints on an object by cyanoacrylate fuming. The apparatus includes a container having a chamber, an opening to the chamber and a mechanism for evacuating air from the chamber. The apparatus also includes a cover for hermetically sealing the opening, an exposed upper surface in the chamber for receiving drops of cyanoacrylate and an electrical heater for heating the exposed upper surface. More specifically, the electrical heater is located in the chamber and supports a receptacle which has the exposed upper surface. The electrical heater has an electrical cord that extends through an airtight fixture which is attached to the cover.

Abstract: A method of forming an oxide on a substrate. According to the method of the present invention a substrate is placed in a chamber. An oxygen containing gas and a hydrogen containing gas are then fed into the chamber. The oxygen containing gas and the hydrogen containing gas are then caused to react with one another to form water vapor in the chamber. The water vapor then oxidizes the substrate.

Abstract: A method of making a spinner disc for a rotary fiberization process, such as but not limited to a glass fiberization process, includes: forming a spinner disc from an alloy that forms a protective oxide film on surfaces of the spinner disc exposed to the atmosphere; forming fiberizing holes in an annular peripheral sidewall of the spinner disc; and applying a plasma to a surface of the spinner disc to remove hydrocarbons and sulfurous compounds from the surface of the spinner disc which would otherwise reduce and/or react with and degrade the protective oxide film forming on the surface of the spinner disc when the spinner disc is exposed to the atmosphere.

Abstract: A process is provided for producing wear-resistant boride layers on metal material surfaces. The process is characterized in that a boron halide selected from the group comprising boron trifluoride, boron tribromide, boron triiodide and their mixtures is mixed with hydrogen and optionally argon and/or nitrogen, in order to produce a reaction gas containing between 0.1 and 30 vol % boron halide. The resultant mixture is activated by a plasma discharge whereby boron is transferred from the plasma to the metal surface.

Abstract: Silicon carbide fibers having an excellent mechanical strength and a superior heat resistance can be produced by the process in which activated carbon fibers having a thickness of 1 to 30 &mgr;m and a BET specific surface area of 700 to 1500 m2/g are reacted with a silicon and/or silicon oxide gas at 1200 to 1500° C. under a reduced pressure or in an inert gas atmosphere; and the resultant SiC fibers are heat treated in the presence of a boron-containing substance and optionally a carbon-containing substance at 1700 to 2300° C. in an inert gas atmosphere, wherein the fibers may be in the form of a shaped article, for example, a sheet or honeycomb structure.

Abstract: Nanoporous silicone resins and silicone resin films having low dielectric constants and a method for preparing such nanoporous silicone resins.

Abstract: A process is provided for producing wear-resistant boride layers on metal material surfaces. The process is characterized in that a boron halide selected from the group comprising boron trifluoride, boron tribromide, boron triiodide and their mixtures is mixed with hydrogen and optionally argon and/or nitrogen, in order to produce a reaction gas containing between 0.1 and 30 vol % boron halide. The resultant mixture is activated by a plasma discharge whereby boron is transferred from the plasma to the metal surface.

Abstract: A method for surface treatment of a fibrous polyphenylene sulfide or polysulfone is based on the use of a gas mixture of 1 to 5% in volume of elemental fluorine, of nitrogen as carrier gas and of no more than 20% in volume elemental oxygen. The gas mixture affects the fibers until the total fluorine content in the fiber material is between 0.01 and 0.2 percent in weight. The fibers treated in this manner are particularly suited as separator material in electrochemical energy storage devices with an alkaline electrolyte.

Abstract: What is described here is a method of producing a wafer support having a protective layer, which, after the specifically mechanically prefabricated wafer support has been cleaned, is characterized by heating the cleaned wafer support to temperatures, by introducing coating components for conversion of the wafer support surface into the protective layer or for deposition of components supplied to a protective layer.

Abstract: Energy, such as from one or more lasers, is directed at the surface of a substrate to mobilize and vaporize a constituent element (e.g., carbide) within the substrate (e.g., steel). The vaporized constituent element is reacted by the energy to alter its physical structure (e.g., from carbon to diamond) to that of a composite material which is diffused back into the substrate as a composite material. An additional secondary element, which can be the same as or different from the constituent element, may optionally be directed (e.g., sprayed) onto the substrate to augment, enhance and/or modify the formation of the composite material, as well as to supply sufficient or additional material for fabricating one or more coatings on the surface of the substrate. The process can be carried out in an ambient environment (e.g., without a vacuum), and without pre-heating or post-cooling of the substrate.

Abstract: A conductive, non-stick coating is provided using a ceramic material which is conductive, flexible and provides a surface which exhibits the property of lubricity. A room or near room temperature manufacturing process produces a coating of titanium nitride on a substrate, where the coating is amorphous if the substrate is a solid material including plastics, composites, metals, magnets, and ceramics, enabling the substrate to bend without damaging the coating. The coating can also be applied as a conformal coating on a variety of substrate shapes, depending upon the application. The coating is bio-compatible and can be applied to a variety of medical devices.

Abstract: A low resistance magnetic tunnel junction with low resistance barrier layer and method of fabrication is disclosed. A first magnetic layer of material with a surface is provided and a continuous layer of material, e.g. aluminum, is formed on the surface of the first magnetic layer. The continuous layer of material is treated to produce a low resistance barrier layer of oxynitride material and a second magnetic layer is formed on the barrier layer of oxynitride material to complete the low resistance magnetic tunnel junction.

Abstract: A method of treating structures (and the structure formed thereby), so as to prevent or retard the oxidation of a metal film, and/or prevent its delamination a substrate, includes providing a structure including a refractory metal film formed on a substrate, placing the structure into a vessel having a base pressure below approximately 10−7 torr, exposing the structure to a silane gas at a sufficiently high predetermined temperature and predetermined pressure to cause formation of a metal silicide layer on the refractory metal film, and exposing the structure to a second gas at a sufficiently high temperature and pressure to nitride the metal silicide layer into a nitrided layer.

Abstract: The present invention provides a method of depositing an amorphous fluorocarbon film using a high bias power applied to the substrate on which the material is deposited. The invention contemplates flowing a carbon precursor at rate and at a power level so that equal same molar ratios of a carbon source is available to bind the fragmented fluorine in the film thereby improving film quality while also enabling improved gap fill performance. The invention further provides for improved adhesion of the amorphous fluorocarbon film to metal surfaces by first depositing a metal or TiN adhesion layer on the metal surfaces and then stuffing the surface of the deposited adhesion layer with nitrogen. Adhesion is further improved by coating the chamber walls with silicon nitride or silicon oxynitride.

Abstract: A method for diffusion coating workpieces of ferrous base metals such as carbon steel and cast iron includes the step of weighing and mixing the following components, in powdered form: Chromium 40-50 wt % Ferrochromium 25-37 wt % Tantalum Carbide 0.40-0.65 wt % Vanadium 0.35-0.70 wt % Ammonium Halide 4-5 wt % Aluminum Oxide Remainder The workpieces are preferably degreased and then placed in a container with the mixed components. The container is sealed and heated to a temperature of 1000°-1050° C. The workpieces and the composition are kept at that temperature for a predetermined period, on the order of forty-five minutes or longer, to permit a surface layer of desired thickness to form. The container is then cooled in a conventional cooling chamber and the workpieces are removed. The method produces coatings having good wear and corrosion resistance.

Abstract: The invention relates to a method for aluminum nitride coating of cylinder contact surfaces (ZL) of a crankcase (KG) made of an aluminum basic alloy where the aluminum nitride coating is performed by surface nitriding of the aluminum basic alloy, and the activated nitrogen is generated by a high-pressure plasma process.

Abstract: Process for the depositing, onto a substrate, of a coating essentially constituted of an electronic conductor compound, in which the said coating is formed by producing alternatively, on the one hand, in at least one depositing zone, one or several deposits of a determined thickness of an electronic conductor element on the substrate, and, on the other hand, in at least one reaction zone, one or several reactions of the element thus deposited with ions of a reactive gas which are implanted into the deposit of the above-mentioned element over approximately this entire thickness determined in a way as to form, preferably with the totality of this element, the said compound, the above-mentioned ions being submitted to a kinetic energy below 2000 V, while the aforesaid thickness of the deposit of the element is determined as a function of the kinetic energy applied in such a way as to allow the implantation of these ions over approximately this entire thickness.

Abstract: A new method for making patterned magnetic storage media with magnetic and substantially non-magnetic zones utilizes a selective oxidation processes. Selective oxidation is achieved by subjecting a magnetic layer to an oxygen plasma through voids in a patterned mask. A high resolution patterned mask is made by embossing and reactive ion etch processes. The method is used to fabricate patterned magnetic disks media with alternating magnetic and non-magnetic zones ranging from 10 to 1000 Nanometers in width. Magnetic storage disks produced by this method have high-bit densities, minimal topography and reduced signal noise.