Rotating Or Inverting Patents (Class 427/425)
  • Patent number: 10128136
    Abstract: There is provided a guide member 3 in which an inclined surface 32 thereof is inclined downwardly outwards from an edge portion of a rear surface of a horizontally held wafer W; and a cylindrical surrounding member 2 which surrounds the wafer W and in which an upper peripheral portion thereof is inwardly extended obliquely upwards. Further, the surrounding member 2 has, at an inner surface side thereof, two groove portions 23 extended along an entire circumference and located above a height position of the horizontally held wafer W. If an air flow flows along the surrounding member 2, a vortex flow is formed within the groove portions 23 and stays therein. Thus, mist can be captured, so that the flow of the mist to the outside of a cup body 1 can be suppressed. Accordingly, the adhesion of the mist to the wafer W can be suppressed.
    Type: Grant
    Filed: August 8, 2017
    Date of Patent: November 13, 2018
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Masahiro Fukuda, Hiroshi Ichinomiya, Koichi Obata, Taro Yamamoto, Kouichirou Tanaka
  • Patent number: 9536759
    Abstract: A baking apparatus for baking a wafer is provided. The baking apparatus includes a wafer chuck configured to hold the wafer, and a heating device disposed over the wafer chuck and configured to heat the wafer. The baking apparatus also includes a carrying arm configured to transport the wafer over the wafer chuck. The wafer chuck is in physical contact with the center area of the bottom surface of the wafer when the wafer is held by the wafer chuck.
    Type: Grant
    Filed: May 29, 2015
    Date of Patent: January 3, 2017
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD
    Inventors: Ching-Hai Yang, Shang-Sheng Li, Yao-Hwan Kao
  • Patent number: 9327304
    Abstract: An installation for dip coating articles, which are movable up to and away from at least one dip tank with the aid of a transport system. In order to be dipped and removed, they are moved onto a rotary platform of at least one stationary rotary station and are dipped into and removed from the treatment liquid by rotation of the rotary platform. Each article is fastened with the aid of a fastening device to a skid which interacts with the transport system. The fastening device has a holding structure for the article and at least two rockers which are U- or V-shaped and are fastened in a pivotable manner to the holding structure at their vertex. The two arms of the U or V have a slot into which one guide pin fastened to the skid engages and slides in the corresponding slot upon rotation of the skid.
    Type: Grant
    Filed: March 9, 2013
    Date of Patent: May 3, 2016
    Assignee: EISENMANN SE
    Inventor: Apostolos Katefidis
  • Patent number: 9156079
    Abstract: The invention is directed to a system and method of applying a coating of lubricant material to the surface of a sheet metal blank in a controlled manner such that some areas of the blank have uniform thickness of lubricant while other areas have no lubricant at all or have a variable amount (progressively increasing or decreasing) of lubricant. This is achieved through the use of a mask template that comprises an overspray fence and at least one contact element. The lubricated coated sheet metal blank is utile for superplastic forming to produce specialized complex shaped parts. The invention advantageously lessens the possibility of skid or slip lines appearing in the finished product as well as lessens the likely build-up of lubricant in forming dies—easing maintenance requirements.
    Type: Grant
    Filed: December 16, 2011
    Date of Patent: October 13, 2015
    Assignee: MAGNA INTERNATIONAL INC.
    Inventors: Boris Shulkin, William A. Kokosza, Maximillian Amtmann
  • Patent number: 9028915
    Abstract: A method for forming a photoresist layer on a semiconductor device is disclosed. An exemplary includes providing a wafer. The method further includes spinning the wafer during a first cycle at a first speed, while a pre-wet material is dispensed over the wafer and spinning the wafer during the first cycle at a second speed, while the pre-wet material continues to be dispensed over the wafer. The method further includes spinning the wafer during a second cycle at the first speed, while the pre-wet material continues to be dispensed over the wafer and spinning the wafer during the second cycle at the second speed, while the pre-wet material continues to be dispensed over the wafer. The method further includes spinning the wafer at a third speed, while a photoresist material is dispensed over the wafer including the pre-wet material.
    Type: Grant
    Filed: September 4, 2012
    Date of Patent: May 12, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Wei Chang, Chih-Chien Wang, Wang-Pen Mo, Hung-Chang Hsieh
  • Patent number: 9029471
    Abstract: Various fluoropolymers have been proposed for imparting oil and water repellency to leather. Commonly, these fluoropolymers are amphiphilic; i.e., they are made from at least one monomer which is hydrophobic and at least one monomer which is hydrophilic. The present invention identifies and remedies disadvantages associated with the ability of amphiphilic fluoropolymers to impart oil and water repellency to leather. Contrary to conventional thinking, it has now been discovered that the incorporation of hydrophilic groups in a fluoropolymer undesirably reduces its ability to impart water resistance to leather. Correspondingly, it has also been discovered that a fluoropolymer incorporating fewer or no hydrophilic groups imparts superior oil and water repellency to leather when compared to fluoropolymers incorporating more hydrophilic groups. Therefore, this invention provides fluoropolymers which incorporate reduced levels of hydrophilic groups.
    Type: Grant
    Filed: September 30, 2008
    Date of Patent: May 12, 2015
    Assignee: E I du Pont du Nemours and Company
    Inventors: Romain Severac, Agnes Ibos, Lamia Heuze, Renaud Laloux-Walther
  • Publication number: 20150104581
    Abstract: A filter unit including a filter and a housing, in which the filter has an opening on one end side and filters a coating liquid from the outside to the inside of the filter, the housing has, on one end side, an inlet port of the coating liquid, and has, on the other end side, an outlet port of the coating liquid filtered by the filter, the filter is attached to the other end side of the housing so that the opening and the outlet port communicate with each other, and the housing has a release hole through which air is released, the release hole being formed at the other end outside the filter.
    Type: Application
    Filed: July 25, 2014
    Publication date: April 16, 2015
    Applicant: NITTO DENKO CORPORATION
    Inventors: Makoto Komatsubara, Hajime Michihira, Masashi Miyake
  • Patent number: 8980114
    Abstract: A film in a dry state is efficiently dissolved and removed. A film removing method includes steps of moving a nozzle head (10B) close to a soluble film (201) formed on a substrate (200), forming a liquid pool (302) of chemical liquid (300) between the nozzle head (10B) and the film (201) by continuously and simultaneously discharging and sucking the chemical liquid (300) from the nozzle head (10B), and horizontally moving the substrate (100) in a state in which the nozzle head (10B) and the surface of the film (201) are not contacted so as to relatively move the liquid pool (302) of the chemical liquid on the substrate (100).
    Type: Grant
    Filed: April 11, 2012
    Date of Patent: March 17, 2015
    Assignee: Tazmo Co., Ltd.
    Inventor: Yoshinori Ikagawa
  • Patent number: 8962085
    Abstract: Disclosed are pre-wetting apparatus designs and methods. These apparatus designs and methods are used to pre-wet a wafer prior to plating a metal on the surface of the wafer. Disclosed compositions of the pre-wetting fluid prevent corrosion of a seed layer on the wafer and also improve the filling rates of features on the wafer.
    Type: Grant
    Filed: January 8, 2010
    Date of Patent: February 24, 2015
    Assignee: Novellus Systems, Inc.
    Inventors: Steven T. Mayer, David W. Porter, Mark J. Willey
  • Patent number: 8956694
    Abstract: A pretreatment process, carried out prior to a developing process, spouts pure water, namely, a diffusion-assisting liquid for assisting the spread of a developer over the surface of a wafer, through a cleaning liquid spouting nozzle onto a central part of the wafer to form a puddle of pure water. The developer is spouted onto the central part of the wafer for prewetting while the wafer is rotated at a high rotating speed to spread the developer over the surface of the wafer. The developer dissolves the resist film partly and produces a solution. The rotation of the wafer is reversed, for example, within 7 s in which the solution is being produced to reduce the water-repellency of the wafer by spreading the solution over the entire surface of the wafer. Then, the developer is spouted onto the rotating wafer to spread the developer on the surface of the wafer.
    Type: Grant
    Filed: October 14, 2010
    Date of Patent: February 17, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Hirofumi Takeguchi, Tomohiro Iseki, Yuichi Yoshida, Kousuke Yoshihara
  • Patent number: 8956695
    Abstract: A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of said exhaust ports in said one direction, thereby to move said developer feeder between substantially the center and an edge of the substrate. The method further includes causing the developer discharged from said exhaust ports to impinge in separate streams on the substrate, and causing each of the separate streams to impinge spirally on the substrate, thereby to develop the substrate. At least two of loci of positions of impingement of the developer corresponding to said exhaust ports overlap each other.
    Type: Grant
    Filed: January 26, 2012
    Date of Patent: February 17, 2015
    Assignee: SCREEN Semiconductor Solutions Co., Ltd.
    Inventors: Masahiko Harumoto, Akira Yamaguchi, Akihiro Hisai, Minoru Sugiyama, Takuya Kuroda
  • Patent number: 8951609
    Abstract: A nanotube-photoresist composite is fabricated by preparing a nanotube suspension using a nanotube structure-containing raw material, dispersing the nanotube suspension in a photoresist using ultra-sonication to produce a nanotube suspension-photoresist mix, spin-coating the nanotube suspension-photoresist mix on a substrate to form a nanotube suspension-photoresist composite layer, and removing one or more solvents in the nanotube suspension-photoresist composite layer by baking.
    Type: Grant
    Filed: April 25, 2011
    Date of Patent: February 10, 2015
    Assignee: STMicroelectronics Asia Pacific Pte Ltd
    Inventors: Shanzhong Wang, Mui Hoon Nai, Zhonglin Miao
  • Patent number: 8951595
    Abstract: A drug delivery balloon is provided, the a balloon having an outer surface, and a tunable coating disposed on at least a length of the balloon surface. The tunable coating includes a first therapeutic agent and a first excipient, and can include a second therapeutic agent and a second excipient. The first and second therapeutic agents have different dissolution rates during balloon inflation and therefore provide a coating that is tunable.
    Type: Grant
    Filed: December 11, 2009
    Date of Patent: February 10, 2015
    Assignee: Abbott Cardiovascular Systems Inc.
    Inventors: John Stankus, Mikael Trollsas, Syed Hossainy, Stephen Pacetti, Michael Ngo
  • Patent number: 8940365
    Abstract: A device to form a coating film which can quickly coat a substrate of a follow-up lot after coating a preceding lot. The device is configured such that nozzles for a preceding lot and a following lot are integrated into a common movement mechanism and moved between an upper side of a liquid processing unit and a standby area. A coating method includes sucking air into the nozzle for the preceding lot to form an upper gas layer, sucking a solvent for the preceding lot in the standby area to form a thinner layer, and sucking air into the nozzle for the preceding lot to form a lower gas layer within the nozzle, and thus forming a state that a solvent layer is interposed between the upper gas layer and the lower gas layer.
    Type: Grant
    Filed: December 23, 2011
    Date of Patent: January 27, 2015
    Assignee: Tokyo Electron Limited
    Inventors: Akira Miyata, Yoshitaka Hara, Kouji Fujimura
  • Patent number: 8936832
    Abstract: A method for wet treatment of plate-like articles includes, a chuck for holding a single plate-like article having an upwardly facing surface for receiving liquid running off a plate-like article when being treated with liquid, wherein the chuck is outwardly bordered by a circumferential annular lip. The chuck has an outer diameter greater than the greatest diameter of the plate-like article to be treated, and a rotatable part with an upwardly facing ring-shaped surface for receiving liquid running off the circumferential lip of the chuck. The rotatable part is rotatable with respect to the chuck, the ring-shaped surface is coaxially arranged with respect to the circumferential annular lip, the inner diameter of the ring-shaped surface is smaller than the outer diameter of the chuck, and the distance d between the lip and the upwardly facing ring-shaped surface is in a range from 0.1 mm to 5 mm.
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: January 20, 2015
    Assignee: Lam Research AG
    Inventors: Michael Brugger, Alexander Schwarzfurtner
  • Patent number: 8936826
    Abstract: A method of coating a stent involves modifying a spray coating parameter until a target mass per coating layer is achieved. A method for coating involves spraying a batch of stents according to spraying parameters that were previously determined to provide a target mass per coating layer.
    Type: Grant
    Filed: August 22, 2011
    Date of Patent: January 20, 2015
    Assignee: Abbott Cardiovascular Systems Inc.
    Inventors: Kevin Jow, Daniel A. Castro
  • Publication number: 20150010713
    Abstract: Provided is a coating-forming apparatus. The coating-forming apparatus according to one embodiment of the present invention includes a support member rotatably supporting a tube body about the central axis thereof; a robot moving in the longitudinal direction of the tube body and spraying paint or an abrasive material on the outer circumferential surface of the tube body, a rotation-detecting device attached to the tube body and measuring the angle of rotation of the tube body, and a controller for controlling the supporting member or the robot.
    Type: Application
    Filed: November 29, 2012
    Publication date: January 8, 2015
    Inventors: Sangwhee Kim, SungJoon Kim, Eunjung Kim, Seong Ho Cho, KiSoo Cho
  • Patent number: 8927058
    Abstract: A photoresist coating process including a first step and a second step is provided. In the first step, a wafer is accelerated by a first average acceleration. In the second step, the wafer is accelerated by a second average acceleration. The first acceleration and the second acceleration are both larger than zero, and photoresist material is provided to the wafer only in the second step.
    Type: Grant
    Filed: July 7, 2008
    Date of Patent: January 6, 2015
    Assignee: United Microelectronics Corp.
    Inventors: Shou-Wan Huang, Kuan-Hua Su
  • Patent number: 8916241
    Abstract: A can coating machine control system includes a coating control signal that functions as a go/no-go signal based on a plurality of monitored conditions such as can in position, vacuum pressure, gun in position, guard in position and speed condition. Local pressure regulation of the coating material in the spray gun is provided along with optional control of the material temperature. Local pressure regulation allows for optional spray weight control based on a wrap number derived from speed and gun spray durations. A CAN to CAN network buffer is provided as well for primary network isolation. A gun control circuit may be used to select specific gun drive signals and to adjust gun drive signals based on real-time feedback of the actual spray duration.
    Type: Grant
    Filed: October 14, 2013
    Date of Patent: December 23, 2014
    Assignee: Nordson Corporation
    Inventors: James M. Khoury, Charles Nagy, Stephen G. Nemethy, Mark J. Ignatius
  • Patent number: 8906452
    Abstract: An improved technique achieves a uniform photoresist film on a wafer by controlling the volatility of the solvent in a photoresist solution during the bake process step. Because film formation takes place in the bake rather than the spin steps of the process, the improved technique involves using less viscous and therefore less costly and easier to use resists to cast relatively thick photoresist films. Such control is achieved in an enclosed chamber into which a carrier gas is introduced; the carrier gas mixes with gaseous solvent to create a saturating atmosphere in which the rate of evaporation of solvent decreases. This enables the heating of the wafer without the reduction of solvent in the film so that the photoresist can self-level. When the film has self-leveled, the solvent is then baked off as usual.
    Type: Grant
    Filed: May 24, 2012
    Date of Patent: December 9, 2014
    Inventor: Gary Hillman
  • Patent number: 8889222
    Abstract: Provided are methods and systems for distributing coating materials using simultaneous vibration and rotation. Inertial forces generated during vibration and centrifugal forces generated during rotation redistribute the coating materials previously deposited on the surface resulting in uniform and/or conformal layers. The coated surfaces may have various shapes and degrees of roughness and may be referred to as complex surfaces. An initial layer of the coating material may be deposited on a complex surface of the part using dipping, spraying, spin coating, or other like techniques. The coating material is redistributed by simultaneous rotation and vibration of the part using specifically selected process conditions, such as orientation of vibrational and rotational axes relative to the part, rotational speeds, and vibrational frequencies and amplitudes.
    Type: Grant
    Filed: December 3, 2013
    Date of Patent: November 18, 2014
    Assignee: Advenira Enterprises, Inc.
    Inventors: Elmira Ryabova, Valentin Ryabov
  • Patent number: 8883253
    Abstract: Brominated butadiene polymers are recovered from solution and formed into particles by spraying the solution onto a heated, mechanically agitated bed of seed particles. The droplets contact the seed particles in the bed and form a polymer layer on the outside of the seed particles, thereby enlarging them. The solvent is removed from the droplets after they make contact with seed particles in the bed. The process allows for the simultaneous removal of solvent and formation of somewhat large particles. The process forms at most small amounts of agglomerates and fines.
    Type: Grant
    Filed: August 18, 2009
    Date of Patent: November 11, 2014
    Assignee: Dow Global Technologies LLC
    Inventors: Douglas C. Greminger, Brian D. Scherzer
  • Patent number: 8871301
    Abstract: A coating treatment apparatus includes: a rotating and holding part; a nozzle supplying a coating solution; a moving mechanism moving the nozzle; and a control unit that controls the rotating and holding part, the nozzle, and the moving mechanism to supply the coating solution onto a central portion of the substrate and rotate the substrate at a first rotation speed, then move a supply position of the coating solution from a central position toward an eccentric position of the substrate with the substrate being rotated at a second rotation speed lower than the first rotation speed while continuing supply of the coating solution, then stop the supply of the coating solution with the rotation speed of the substrate decreased to a third rotation speed lower than the second rotation speed, and then increase the rotation speed of the substrate to be higher than the third rotation speed.
    Type: Grant
    Filed: January 6, 2012
    Date of Patent: October 28, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Kouzou Tachibana, Takahisa Otsuka, Akira Nishiya
  • Patent number: 8865256
    Abstract: A tire printing device includes a printer head (2), positioned near a rotating tire (1), that ejects and applies coating material, an unevenness detection sensor (3) that detects a predetermined raised/recessed character on the surface of the rotating tire (1) and a PC (10) that sets the origin of rotation of the tire (1) based on a signal detected by the unevenness detection sensor (3) and synchronizes the operation start time of the printer head (2) with the origin of rotation in order to maintain a constant relationship between the position of the raised/recessed character and the position of application of the coating material. Desired printing is performed by the printer head (2) ejecting and applying the coating material onto a surface of the rotating tire (1) after the rotating tire is mounted on a rim and inflated to a regular shape by being applied with an internal pressure.
    Type: Grant
    Filed: October 7, 2011
    Date of Patent: October 21, 2014
    Assignee: Bridgestone Corporation
    Inventor: Yuichiro Ogawa
  • Patent number: 8865263
    Abstract: Compositions and methods for reduction in adhesion between wet paper web and roll surfaces in papermaking process are disclosed. The method is particularly useful for improvements in press section roll release.
    Type: Grant
    Filed: August 22, 2011
    Date of Patent: October 21, 2014
    Assignee: Solenis Technologies, L.P.
    Inventors: Davit E. Sharoyan, Tien-Feng Ling, Scott T. Schnelle
  • Publication number: 20140302242
    Abstract: A plating apparatus 1 can perform plating processes by supplying plating liquids onto a surface of a substrate 2. The plating apparatus 1 includes a substrate rotating holder configured to hold and rotate the substrate 2; plating liquid supply units 29 and 30 configured to supply different kinds of plating liquids onto the surface of the substrate 2; a plating liquid drain unit 31 configured to drain out the plating liquids dispersed from the substrate 2 depending on the kinds of the plating liquids; and a controller 32 configured to control the substrate rotating holder 25, the plating liquid supply units 29 and 30, the plating liquid drain unit 31. While the substrate 2 is held and rotated, the plating processes are performed on the surface of the substrate 2 in sequence by supplying the different kinds of the plating liquids onto the surface of the substrate 2.
    Type: Application
    Filed: August 24, 2011
    Publication date: October 9, 2014
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Takashi Tanaka, Yusuke Saito, Mitsuaki Iwashita, Takayuki Toshima
  • Patent number: 8846145
    Abstract: A liquid processing method forms a coating film by supplying and pouring a coating solution from a coating solution nozzle onto a surface of a substrate held substantially horizontally by a substrate holder. In the liquid processing method, a process for photographing a leading end portion of a coating solution nozzle is provided. When performing a process for anti-drying of the coating solution for a long period of time in advance, a position of the coating solution and a position of an anti-drying liquid are set by using a soft scale displayed on a screen where the photographed image is displayed. Therefore, a dispense control is performed based on a set value without depending on the naked eyes and a control for suppressing the drying of the coating solution in the leading end portion of the coating solution nozzle is performed.
    Type: Grant
    Filed: October 22, 2012
    Date of Patent: September 30, 2014
    Assignee: Tokyo Electron Limited
    Inventor: Michio Kinoshita
  • Patent number: 8828488
    Abstract: To provide a method for producing a thin film consisting of nanosheet monolayer film(s) and use of the thin film obtained thereby. The method for producing a thin film consisting of nanosheet monolayer film(s) by a spin coat method according to the invention comprises a step for preparing an organic solvent sol formed by allowing nanosheets obtained by the exfoliation of an inorganic layered compound to be dispersed in an organic solvent; and a step for dropping the organic solvent sol onto a substrate and rotating the substrate using a spin coater. Preferably, the nanosheet size, the organic solvent sol concentration and the spin coater rotation speed are controlled.
    Type: Grant
    Filed: August 22, 2012
    Date of Patent: September 9, 2014
    Assignee: National Institute For Materials Science
    Inventors: Takayoshi Sasaki, Kazuko Saruwatari, Kazuaki Matsuba, Kousyo Akatsuka, Yasuo Ebina, Minoru Osada
  • Patent number: 8808798
    Abstract: A coating method includes supplying a coating liquid from a coating nozzle onto a front side central portion of a substrate held on a substrate holding member, rotating the substrate holding member about a vertical axis to spread the coating liquid toward a peripheral portion of the substrate by a centrifugal force and thereby form a film of the coating liquid, forming a liquid film of a process liquid for preventing a contaminant derived from the coating liquid from being deposited or left on a back side peripheral portion of the substrate, and damping a vertical wobble of the peripheral portion of the substrate being rotated, by a posture regulating mechanism, while delivering a gas from delivery holes onto a back side region of the substrate on an inner side of the peripheral portion on which the liquid film is formed.
    Type: Grant
    Filed: August 8, 2012
    Date of Patent: August 19, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Takahiro Kitano, Koichi Obata, Hiroichi Inada, Nobuhiro Ogata
  • Patent number: 8758855
    Abstract: A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.
    Type: Grant
    Filed: March 19, 2012
    Date of Patent: June 24, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Nobuhiro Ogata, Hiroichi Inada, Taro Yamamoto, Akihiro Fujimoto
  • Publication number: 20140162006
    Abstract: The invention relates to a method for producing a water-blown polyurethane/polyisocyanurate rigid foam material that can be sprayed, by reacting a mixture comprising an aromatic polyester polyol, a first, comparatively short-chain aliphatic polyether polyol, a second, comparatively long-chain aliphatic polyether polyol, an isocyanate component, a blowing agent having water at least as a main component, and a catalyst component. The invention further relates to a rigid foam produced according to the method according to the invention, a composite material composed of said rigid foam and a pipe, and to the use of such a composite material for transporting liquid or gaseous media.
    Type: Application
    Filed: July 16, 2012
    Publication date: June 12, 2014
    Applicant: Bayer Intellectual Property GmbH
    Inventors: Reinhard Albers, Patrick Klasen, Horst-Heinrich Schneider, Stephanie Vogel
  • Patent number: 8715785
    Abstract: The invention relates to: 1) a process for the mass production of hollow glass articles which, when positioned beside one another with the same orientation in one and the same plane, are liable to come into mutual contact along a surface of revolution, characterized in that after they have left the annealing lehr, they are rotated through one turn at least along the axis of said surface of revolution, this surface then being coated, by a process without any solid contact, with an additional layer which reduces the coefficient of friction; 2) a hollow glass article as obtained by this process; and 3) a packaging assembly of such articles.
    Type: Grant
    Filed: November 8, 2006
    Date of Patent: May 6, 2014
    Assignee: Saint-Gobain Emballage
    Inventors: Eric Martin, Jean-Michel Munos, Frederic Mertz
  • Patent number: 8691336
    Abstract: A coating treatment method includes: a first step of discharging a coating solution from a nozzle to a central portion of a substrate while acceleratingly rotating the substrate, to apply the coating solution over the substrate; a second step of then decelerating the rotation of the substrate and continuously rotating the substrate; and a third step of then accelerating the rotation of the substrate to dry the coating solution on the substrate. In the first step, the acceleration of the rotation of the substrate is changed in the order of a first acceleration, a second acceleration higher than the first acceleration, and a third acceleration lower than the second acceleration to acceleratingly rotate the substrate at all times.
    Type: Grant
    Filed: March 23, 2011
    Date of Patent: April 8, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Kousuke Yoshihara, Katsunori Ichino
  • Patent number: 8691320
    Abstract: A method for coating a stent can involve a device having a drying zone, a spray zone, and movable member for positioning a stent in the drying zone and another stent in the spray zone. Each stent can be on a support. A force can be applied to the outside surface of a stent to prevent rotation of the stent with respect to the support.
    Type: Grant
    Filed: February 28, 2011
    Date of Patent: April 8, 2014
    Assignees: Abbott Cardiovascular Systems Inc., ATS Automation Tooling Systems Inc.
    Inventors: David Rego, Kurt Kilchenmann, Sang joon Park, Mark Haight, Anthony S. Andreacchi, Yung-Ming Chen, Arnoldo M. Currlin, Antonio Garcia, Jason Van Sciver, Thomas David Esbeck, Bryan D. Glenn, Patrick A. Tuohy, Richard Baillargeon, Edward P. Garcia, Steven E. Lehner, Ian Coulson
  • Patent number: 8663534
    Abstract: Method of manufacturing a large-scale shell construction, wherein a form is sprayed with a setting construction material, such as concrete. The method comprises rotating the form about a rotation axis while applying said construction material. Preferably it also comprises suspending the form from above in a point through which the rotation axis runs. Furthermore, the method can comprise floating the form on a body of water.
    Type: Grant
    Filed: September 8, 2010
    Date of Patent: March 4, 2014
    Assignee: Hogskolen i Vestfold
    Inventor: Jan Capjon
  • Patent number: 8658245
    Abstract: A method for manufacturing a z-directed component for insertion into a mounting hole in a printed circuit board according to one example embodiment includes depositing a liquid based material onto a top surface of a rotatable plate. The top surface of the rotatable plate has at least one cavity formed thereon that defines the shape of a layer of the z-directed component. The rotatable plate is spun to level a top surface of the liquid based material in the at least one cavity. The liquid based material is cured to form the layer of the z-directed component. A conductive material is applied to at least one surface of the formed layer. The z-directed component is formed including a stack of component layers that includes the formed layer.
    Type: Grant
    Filed: August 31, 2011
    Date of Patent: February 25, 2014
    Assignee: Lexmark International, Inc.
    Inventors: Paul Kevin Hall, Keith Bryan Hardin, Zachary Charles Nathan Kratzer, Qing Zhang
  • Patent number: 8656936
    Abstract: Apparatuses, and related methods, for processing a workpiece that include a particular barrier structure that can overlie and cover a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular movable member that can be positioned over and moved relative to a workpiece. Apparatuses, and related methods, for processing a workpiece that include a particular ceiling structure that can overlie a processing chamber. Nozzle devices, and related methods, that include a particular annular body. Nozzle devices, and related methods, that include a particular first, second, and third nozzle structure.
    Type: Grant
    Filed: July 9, 2008
    Date of Patent: February 25, 2014
    Assignee: Tel FSI, Inc.
    Inventors: Jimmy D. Collins, Samuel A. Cooper, James M. Eppes, Alan D. Rose, Kader Mekias
  • Patent number: 8652571
    Abstract: A spin coating apparatus that supplies a coating liquid to a substrate and rotating the substrate to form a coating film, has a holding part that holds the substrate mounted thereon in a horizontal position; a rotationally driving source that rotationally drives the holding part about a rotational axis parallel with the vertical direction, thereby rotating the substrate; and a coating liquid supplying part that supplies the coating liquid to the substrate held by the holding part.
    Type: Grant
    Filed: March 3, 2009
    Date of Patent: February 18, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Keisuke Nakazawa
  • Patent number: 8632843
    Abstract: The invention provides methods and systems that control the application of a material onto micro-rough implant surfaces. Thus, the present invention provides method of applying crystalline nanoparticles onto the surface of an implant to produce an implant with a crystalline nanoparticle layer on its surface, the method comprising: providing an implant substrate body; applying crystalline nanoparticles onto the surface of the implant; and rotating the implant, to produce an implant with a crystalline nanoparticle layer on its surface. This method of nanoparticle application is designed to promote the integration of implants, such as dental and orthopedic screws, into living tissue, and offers the ability to control the thickness and uniformity of the nanoparticle layer, in one or several layers, while simultaneously retaining the microroughness of the implant.
    Type: Grant
    Filed: November 24, 2008
    Date of Patent: January 21, 2014
    Assignee: Promimic AB
    Inventors: Martin Andersson, Fredrik Currie, Per Kjellin
  • Patent number: 8617658
    Abstract: This invention relates to a method for conducting film coating on the surface of spinning circular workpiece under action of gas pressure, and nozzle utilized in the same. Circular workpiece to be coated is held on a rotating mechanism, and a feedstock loading machine having a nozzle, which is capable of guiding redundant feedstock and overflowing in a specific direction, is set to have a 100 ?m gap with the circular workpiece. When the rotating mechanism is rotated, the polymer solution is precoated on the surface of the circular workpiece, and when gas valve is opened, the polymer solution is squeezed to a predetermined thickness by an annular high pressure gas-stream formed on the periphery of a cylinder, produced from the high pressure gas released.
    Type: Grant
    Filed: March 26, 2010
    Date of Patent: December 31, 2013
    Assignee: National Cheng Kung University
    Inventors: Yung-Chun Lee, Chuan-Hsiang Lee, Shou-Chi Cho
  • Patent number: 8617659
    Abstract: Methods are provided for applying a layer to a honeycomb body. The methods include the steps of applying a cement mixture to a cylindrical surface of the honeycomb body and rotating the honeycomb body and a blade relative to one another about a longitudinal axis of the honeycomb body. The methods further include the steps of holding the blade at a first interior angle during a relative rotation of the honeycomb body and the blade about the longitudinal axis. The methods then include the step of moving the blade from the first interior angle to a second interior angle greater than the first interior angle. The methods still further include the step of rotating of the honeycomb body and the blade relative to one another about the longitudinal axis after the blade begins to move from the first interior angle toward the second interior angle.
    Type: Grant
    Filed: August 29, 2008
    Date of Patent: December 31, 2013
    Assignee: Corning Incorporated
    Inventors: Jeffrey John Domey, John Edmond Graham
  • Publication number: 20130327982
    Abstract: A seamless belt formed of a polyimide including a repeating unit represented by the formula (1): in which 25 mol % to 95 mol % of A is a tetravalent unit represented by the formula (2): 75 mol % to 5 mol % of A is a tetravalent unit represented by the formula (3): 15 mol % to 95 mol % of B is a divalent unit represented by the formula (4): and 85 mol % to 5 mol % of B is a divalent unit represented by the formula (5):
    Type: Application
    Filed: December 14, 2011
    Publication date: December 12, 2013
    Applicant: UBE INDUSTRIES, LTD.
    Inventors: Takeshige Nakayama, Tomonori Nakayama, Akira Kawabata, Susumu Takasaki, Kensuke Hiroshige
  • Patent number: 8601974
    Abstract: A conveying device for a deposition device includes a transport device and a carrier. The transport device includes a main body, two wheels, a connection shaft, and a first bevel gear. The connection shaft is mounted on the main body. The two wheels are mounted on two opposite ends of the connection shaft. The first bevel gear is sleeved on the connection shaft. The carrier includes a revolving frame, a rotating shaft, a second bevel gear, and at least one carrying bar. The rotating shaft is mounted on the revolving frame. The second bevel gear is sleeved on one end of the rotating shaft and meshed with the first bevel gear. The revolving frame rotates relative to the rotating shaft. The at least one carrying bar is mounted on the revolving frame and driven by the rotating shaft to rotate. Each carrying bar includes supporting elements for carrying workpieces.
    Type: Grant
    Filed: May 20, 2011
    Date of Patent: December 10, 2013
    Assignee: Hon Hai Precision Industry Co., Ltd.
    Inventor: Chung-Pei Wang
  • Patent number: 8591987
    Abstract: Methods of producing a multiferroic thin film material. The method includes the steps of providing a multiferroic precursor solution, subjecting the precursor solution to spin casting to produce a spin cast film, and heating the spin cast film. The precursor solution may include Bi(NO3)3.5H2O and Fe(NO3)3.9H2O in ethylene glycol to produce a bismuth ferrite film. Further, the thin film may be utilized in varied technological areas, including memory devices for information storage.
    Type: Grant
    Filed: May 10, 2010
    Date of Patent: November 26, 2013
    Assignee: Northrop Grumman Systems Corporation
    Inventors: Ronald Pirich, Nan-Loh Yang, Kai Su, I-Wei Chu
  • Patent number: 8586138
    Abstract: A method of coating a first porous substrate with a thermoplastic material comprises the steps of: rotating the substrate about an axis of the substrate; and applying the material in a liquefied state onto the substrate, wherein the step of applying is performed from the outside of the substrate. According to another embodiment, a method of coating a porous substrate with a thermoplastic material comprises the steps of: connecting a first porous substrate to a rotator; rotating the substrate about an axis of the substrate; pumping the material in a liquefied state from a receptacle to an application head; and applying the material in a liquefied state onto the substrate, wherein the step of applying is performed from the outside of the substrate. In certain embodiments, the material coated on the substrate is used to help remove at least a portion of a filtercake.
    Type: Grant
    Filed: January 19, 2011
    Date of Patent: November 19, 2013
    Assignee: Halliburton Energy Services, Inc.
    Inventors: Luke W. Holderman, Jacob R. Shoemate
  • Patent number: 8586132
    Abstract: The present invention relates to a device and a method for coating a microstructured and/or nanostructured structured substrate. According to the present invention, the coating is performed in a vacuum chamber. The pressure level in the vacuum chamber is elevated during or after the charging of the vacuum chamber with coating substance.
    Type: Grant
    Filed: February 7, 2012
    Date of Patent: November 19, 2013
    Inventor: Erich Thallner
  • Publication number: 20130302200
    Abstract: A coating solution that contains 10 to 20% by weight of epoxy resin serving as a thermosetting resin, 20 to 30% by weight of MoS2, and 5 to 10% by weight of graphite, with a remainder thereof constituted by an organic solvent, is sprayed onto a wrap portion side face of an orbiting scroll from a spray nozzle . While spraying the coating solution, the orbiting scroll is rotated on a rotating table and the spray nozzle is moved along a rectilinear movement path toward a radial direction outer side of the orbiting scroll while maintaining an attitude thereof from the start of the spraying process. After applying the coating solution, the coating solution is dried by baking, whereupon a break-in operation is performed. As a result, an elastic coating is formed at a coating thickness that enables elastic deformation in accordance with a clearance between the wrap portion side faces.
    Type: Application
    Filed: July 12, 2013
    Publication date: November 14, 2013
    Inventors: Junichi ASAMI, Toru SATO
  • Patent number: 8578877
    Abstract: The present invention provides a spin coater including a rotation table that rotatably holds the disc substrate, a spin-cup that surrounds the outer circumference of a disc substrate held on the rotation table, a dripping unit configured to drip an ultraviolet-curable resin composition onto the surface of the disc substrate, a rotating unit configured to rotate the disc substrate via the rotation table to spread the ultraviolet-curable resin composition over the surface of the disc substrate, a heating unit configured to heat the ultraviolet-curable resin composition on the disc substrate, and a temperature controlling unit configured to control a reaching temperature of the spin cup which is increased by the heating unit each time the ultraviolet-curable resin composition is spread, so as to be constant over multiple spin coating processes.
    Type: Grant
    Filed: April 1, 2008
    Date of Patent: November 12, 2013
    Assignee: Ricoh Company, Ltd.
    Inventor: Yukitoshi Tajima
  • Patent number: 8580340
    Abstract: After a solvent is discharged onto a substrate in a period from a time point t0 to a time point t1, rotation of the substrate is started at a time point t2. A resist liquid is discharged onto a center portion of a target surface of the substrate at a time point t3. A rotation speed of the substrate starts to decrease at a time point t4, and attains a first speed after a certain period of time. The discharge of the resist liquid is stopped at a time point t5. The rotation of the substrate is accelerated in a period from a time point t6 to a time point t7, and the rotation speed of the substrate attains a second speed at the time point t7. The rotation of the substrate is decelerated in a period from the time point t7 to a time point t8, and the rotation speed of the substrate attains a third speed at the time point t8.
    Type: Grant
    Filed: October 6, 2010
    Date of Patent: November 12, 2013
    Assignee: Sokudo Co., Ltd.
    Inventors: Masanori Imamura, Akihiro Hisai, Hidetoshi Sagawa
  • Patent number: 8574674
    Abstract: A substrate is first rotated at a first rotation speed, and a resist solution is applied. Rotation of the substrate is decelerated to a second rotation speed lower than the first rotation speed so that the substrate is rotated at the low speed to smooth the resist solution on the substrate. Rotation of the substrate is then accelerated to a third rotation speed higher than the second rotation speed, and a solvent for the coating solution and/or a dry gas are/is supplied to the resist solution on the substrate. The solvent gas is supplied to a portion of the resist solution on the substrate thicker than a set thickness, and the dry gas is supplied to a portion of the coating solution on the substrate thinner than the set thickness. This thins the thicker portion of the resist solution and thickens the thinner portion to uniform the resist solution.
    Type: Grant
    Filed: December 20, 2011
    Date of Patent: November 5, 2013
    Assignee: Tokyo Electron Limited
    Inventor: Takashi Tanaka