Flurocarbon Containing Coating Patents (Class 427/490)
-
Patent number: 6764809Abstract: A process of forming a resist image in a microelectronic substrate comprises the steps of contacting the substrate with a composition first comprising carbon dioxide and a component selected from the group consisting of at least one polymeric precursor, at least one monomer, at least one polymeric material, and mixtures thereof to deposit the component on the substrate and form a coating thereon; then imagewise exposing the coating to radiation such that exposed and unexposed coating portions are formed; then subjecting the coating to a second composition comprising carbon dioxide having such that either one of the exposed or the unexposed coating portions are removed from the substrate and the other coating portion is developed and remains on the coating to form an image thereon.Type: GrantFiled: October 10, 2001Date of Patent: July 20, 2004Assignees: North Carolina State University, University of North Carolina at Chapel HillInventors: Joseph M. DeSimone, Ruben G. Carbonell, Jonathan Kendall, Christopher L. McAdams
-
Patent number: 6649222Abstract: A method for treating substrates including the steps of: providing a substrate; exposing said substrate to a plasma glow discharge in the presence of a fluorocarbon gas; maintaining said gas at a pressure between about 50 mTorr and about 400 mTorr; generating said plasma as a modulated glow discharge; pulsing said discharge at an on time of 1-500 milliseconds; pulsing said glow at an off time of 1-1000 milliseconds; maintaining said plasma glow discharge at a power density of 0.02-10 watts/cm2; and applying a hydrophobic coating to said substrate.Type: GrantFiled: February 28, 2001Date of Patent: November 18, 2003Assignee: The Procter & Gamble CompanyInventors: Riccardo D'Agostino, Italo Corzani, Pietro Favia, Ritalba Lamendola, Gianfranco Palumbo
-
Patent number: 6642300Abstract: To provide the filler which is added to a composition for a sealing member, etc. for sealing of semi-conductor production equipment being apt to be damaged greatly by mixing of a foreign matter and is small in a change in weight in either of the oxygen plasma irradiation and CF4 plasma irradiation, and the crosslinkable elastomer composition. The filler is used for the crosslinkable elastomer and has an imide structure, and a change in weight of the filler is not more than 4 mg/cm2·hr in either of the oxygen plasma irradiation and CF4 plasma irradiation. The crosslinkable elastomer composition comprises the filler and the crosslinkable elastomer such as a fluorine-containing elastomer.Type: GrantFiled: October 23, 2001Date of Patent: November 4, 2003Assignee: Daikin Industries, Ltd.Inventors: Seiji Kawaguchi, Tsuyoshi Noguchi, Takafumi Yamato, Mitsuru Kishine
-
Publication number: 20030203655Abstract: A material containing, as a main component, an organic silicon compound represented by the following general formula:Type: ApplicationFiled: March 28, 2003Publication date: October 30, 2003Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.Inventors: Gaku Sugahara, Nobuo Aoi, Koji Arai, Kazuyuki Sawada
-
Patent number: 6632470Abstract: A method of modifying surfaces of a device, for example, a medical device, is disclosed. The method includes modifying a surface of a device by providing a device, exposing the device to a reactive gas and plasma energy to create a plasma deposited surface on the device, and quenching the device with the reactive gas. The device exhibits changes in its surface properties thereby making it more desirable for an intended use.Type: GrantFiled: January 31, 2001Date of Patent: October 14, 2003Assignee: PercardiaInventors: Marco Morra, Clara Cassinelli, Linda Lee Cahalan, Patrick T. Cahalan
-
Patent number: 6595623Abstract: There is provided a plastic base material having a reformed layer 2 formed on a plastic substrate 1 by reforming the surface layer thereof into a component containing fluorine at the ratio of the number of fluorine atoms to the number of carbon atoms, F/C, of 0.85 or more and 1.30 or less, and having highly durable water repellency and ink repellency. The method of manufacturing such a plastic base material comprises a step of reforming the surface of the plastic substrate 1 into a fluorine-containing carbon layer by imparting a specific energy to fluorine-containing plasma by applying an RF bias voltage to the plastic substrate 1 to form a surface having highly durable water repellency and ink repellency. A highly durable ink-jet printer that enables high-quality printing can be provided by the use of a head for an ink-jet printer fabricated by using this plastic base material.Type: GrantFiled: September 18, 2001Date of Patent: July 22, 2003Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Koichi Kotera, Hiroyoshi Tanaka, Isamu Inoue, Osamu Watanabe
-
Patent number: 6558756Abstract: A material containing, as a main component, an organic silicon compound represented by the following general formula: R1xSi(OR2)4-x (where R1 is a phenyl group or a vinyl group; R2 is an alkyl group; and x is an integer of 1 to 3) is caused to undergo plasma polymerization or react with an oxidizing agent to form an interlayer insulating film composed of a silicon oxide film containing an organic component. As the organic silicon compound where R1 is a phenyl group, there can be listed phenyltrimethoxysilane or diphenyldimethoxysilane. As the organic silicon compound where R1 is a vinyl group, there can be listed vinyltrimethoxysilane or divinyldimethoxysilane.Type: GrantFiled: July 9, 2001Date of Patent: May 6, 2003Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Gaku Sugahara, Nobuo Aoi, Koji Arai, Kazuyuki Sawada
-
Patent number: 6551950Abstract: A method of coating a surface with a polymer layer, which method comprises exposing said surface to a plasma comprising a monomeric unsaturated organic compound which comprises a chain of carbon atoms, which are optionally substituted by halogen; provided that where the compound is a perhalogenated alkene, it has a chain of at least 5 carbon atoms; so as to form an oil or water repellent coating on said substrate.Type: GrantFiled: February 11, 2000Date of Patent: April 22, 2003Assignee: The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and Northern IrelandInventors: Jas P S Badyal, Stephen R Coulson, Colin R Willis, Stuart A Brewer
-
Patent number: 6541118Abstract: An insulator with a molding made of ceramic and a hydrophobic coating applied to the surface of the molding is disclosed, the hydrophobic coating comprising a plasma polymer having been applied directly to the ceramic. The previously customary glaze on the surface of the ceramic is replaced by the plasma polymer. Such an insulator has high long-term stability with regard to its electrical insulating capability. It is possible to dispense with complicated shaping of the molding to increase the leakage path over the surface of the ceramic and with the application of a glaze, which means a considerable cost saving.Type: GrantFiled: February 7, 2001Date of Patent: April 1, 2003Assignee: Siemens AktiengesellschaftInventors: Alfred Baalmann, Otto-Diedrich Hennemann, Johannes Liebermann, Klaus Vissing
-
Publication number: 20030059619Abstract: A pressure member for use in fixing toner to a receiver comprises a support an intermediate layer disposed on the support, and an outermost layer formed from a cured composition comprising a fluorocarbon thermoplastic random copolymer, a curing agent, a particulate filler containing zinc oxide, and a curable aminosiloxane, wherein the fluorocarbon thermoplastic random copolymer has subunits of:Type: ApplicationFiled: September 21, 2001Publication date: March 27, 2003Applicant: NexPress Solutions LLCInventors: Jiann Hsing Chen, Joseph A. Pavlisko, Robert Arthur Lancaster, Charles Eugene Hewitt
-
Patent number: 6534182Abstract: A tetrafluoroethylene-ethylene copolymer (ETFE) film, wherein polar groups are present on the surface of the film after a surface treatment, and the surface roughness Ra is at most the surface roughness Ra of the surface of an untreated film; an ETFE film, wherein polar groups are present on the surface of the film after a surface treatment, and the amount of a weak boundary layer is at most one time of the amount of a weak boundary layer on the surface of an untreated film; a laminate employing such a film having an extremely excellent bonding strength; and a process for producing it with a mass production property.Type: GrantFiled: September 27, 1999Date of Patent: March 18, 2003Assignee: Asahi Glass Company Ltd.Inventors: Satoshi Oki, Atsushi Hayashi, Makoto Fukawa, Hiroshi Aruga, Yasuo Hayashi, Shigeaki Yonemori, Yukio Jitsugiri
-
Patent number: 6528170Abstract: The invention relates to a metal substrate with a corrosion-resistant coating produced by means of plasma polymerization, wherein the substrate is subjected to mechanical, chemical and/or electrochemical smoothing in a pre-treatment step and is subsequently exposed to a plasma at a temperature of less than 200° C. and at a pressure of 10−5 bis 100 mbars, whereby in a first step the surface is activated in a reducing plasma and in a second step the polymer is separated from a plasma containing at least one hydrocarbon or silico-organic compound which can be vaporized in plasma conditions, optionally contains oxygen, nitrogen or sulphur and can contain fluorine.Type: GrantFiled: May 16, 2001Date of Patent: March 4, 2003Assignee: Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e. V.Inventors: Alfred Baalmann, Henning Stuke, Klaus-Dieter Vissing, Hartmut Hufenbach, Wolfgang Semrau
-
Patent number: 6514573Abstract: A method for reducing crazing in a plastics material characterised in that it comprises the steps of: (1) cleaning the surface of the material; and (2) exposing the cleaned surface to plasma of a monomer vapour so as to produce a substantially non-oxidising plasma polymer coating on the surface.Type: GrantFiled: March 25, 1999Date of Patent: February 4, 2003Assignee: Commonwealth Scientific and Industrial Research OrganisationInventors: Jonathan Howard Hodgkin, Hans Jorg Griesser, Thomas Reinhold Gengenbach
-
Patent number: 6508416Abstract: An electromagnetic fuel injector having improved wear characteristics comprises a body having a fuel inlet and a fuel outlet. A valve seat is sealably connected to the body, and a moveable valve member positioned at the fuel outlet for controlling the flow of fuel from the outlet comprises a valve outlet element that provides a sealing interface with the valve seat. The valve member and included valve outlet element further comprise wear surfaces that are subject to repeated impact and/or sliding contact; at least a portion of these wear surfaces comprise an applied layer of diamond-like carbon (DLC) stabilized by inclusion of greater than 30 weight percent of a carbide-forming material selected from the group consisting of silicon, titanium, and tungsten.Type: GrantFiled: April 28, 2000Date of Patent: January 21, 2003Assignee: Delphi Technologies, Inc.Inventors: Noreen Louise Mastro, Jeffrey Mark Noll, David Wesley Rogers, Robert Halsall, Stephen Joel Harris, Anita Miriam Weiner
-
Patent number: 6506457Abstract: The present methods provide an amorphous, conformal, protective, abrasion-resistant, lubricious fluoropolymer coating on to a polymer substrate via a gas plasma deposition method. The coating method, according to one embodiment of the method, involves generating a gas plasma by introducing a mixture of a fluorinated gas monomer and a hydrocarbon gas into an energetic ion field, such as an ion beam or the field produced by a radio-frequency source. The fluorinated gas monomer is selected from the group consisting of CF.sub.4, C.sub.2 F.sub.4, C.sub.2 F.sub.6, CF.sub.3.sub.2CO, CH.sub.2 CF.sub.2 and mixtures of the foregoing. The hydrocarbon gas is selected from the group consisting of C.sub.2 H.sub.2, C.sub.2 H.sub.4, C.sub.2 H.sub.6, and H.sub.2 and mixtures of the foregoing. The polymer substrate is exposed to the foregoing gas plasma for sufficient time to achieve the desired coating thickness.Type: GrantFiled: March 30, 2001Date of Patent: January 14, 2003Assignee: Cardiac Pacemakers, Inc.Inventor: Larry L. Hum
-
Patent number: 6488992Abstract: Elastomeric seals, including O-rings, may have chemically resistant thin films applied by the technique of plasma polymerization to the surface of the elastomer, enhancing wear resistance and environmental resistance without changing the physical properties of the elastomer. The films may be a silane polymer applied by plasma deposition in a radio frequency/microwave dual power source reactor.Type: GrantFiled: August 18, 1999Date of Patent: December 3, 2002Assignee: University of CincinnatiInventors: F. James Boerio, Alan M. Dickey, R. Giles Dillingham, Kristy J. Johnson, David A. Penning
-
Patent number: 6444274Abstract: A process for producing antiadhesive layers on a web-form material, characterized in that the antiadhesive layers are applied to the web-form material by means of low pressure plasma polymerization by guiding the web-form material continuously through a plasma zone containing a low pressure plasma.Type: GrantFiled: February 22, 2001Date of Patent: September 3, 2002Assignee: tesa AGInventor: Olaf Görbig
-
Patent number: 6444275Abstract: A thermal ink jet printhead contains, on a front face, a remote plasma deposited fluoropolymer film. The fluoropolymer film has a high fluorine to carbon ratio. The film also possesses excellent mechanical durability.Type: GrantFiled: October 31, 2000Date of Patent: September 3, 2002Assignee: Xerox CorporationInventors: Daniel E. Kuhman, Christopher Constantine, Kevin N. Beatty
-
Publication number: 20020114954Abstract: A thin fluoropolymer film is bonded to a substrate for medical, filtration or packaging purposes by using a pulsed or combination of gas and electrical pulsed cold plasma polymerization procedures.Type: ApplicationFiled: February 20, 2002Publication date: August 22, 2002Applicant: Mupor LimitedInventors: Jas-Pal S. Badyal, Simon J. Hutton
-
Patent number: 6413630Abstract: A decorative film having an excellent decorative effect, excellent three-dimensional curvature emulating properties, three-dimensional curvature formability, long-term weather resistance and stain resistance. The decorative film comprises one or more transparent layers and a decorative metal layer. The transparent layer has an adhered side for being adhered to a substrate. The transparent layer comprises a copolymer of a tetrafluoroethylene, a hexafluoropropylene and a vinylidene fluoride. The decorative metal layer is on the adhered side of the transparent layer. A substrate can be bonded to the metal layer of the decorative film. The substrate can be a complex three-dimensional shaped substrate. The substrate can also be an injection molded substrate. An adhesive can be disposed on the metal layer of the decorative film, and the adhesive layer can be disposed between the metal layer and the substrate.Type: GrantFiled: November 4, 1999Date of Patent: July 2, 2002Assignee: 3M Innovative Properties CompanyInventor: Akihiko Nakayama
-
Patent number: 6379741Abstract: The surface of a high molecular weight polymer such as high molecular weight polyethylene is modified in a localized manner by treatment with a plasma gas. The treatment produces a variety of useful results, depending on the gas used and the treatment conditions. One such result is crosslinking of the polymer in a localized manner at the surface to improve the durability of the surface against detrimental processes such as reorientation and alignment of the crystalline lamellae parallel to the contact surface which renders the surface susceptible to disintegration into particles. Another result is the chemical transformation of the surface for purposes such as increasing the hydrophilic or hydrophobic nature of the surface or coupling functional groups to the surface.Type: GrantFiled: November 29, 1999Date of Patent: April 30, 2002Assignee: The Regents of the University of CaliforniaInventors: Kyriakos Komvopoulos, Catherine M. Klapperich, Lisa A. Pruitt, Stephen L. Kaplan
-
Patent number: 6365528Abstract: A low temperature process is described for forming a low dielectric constant (k) fluorine and carbon-containing silicon oxide dielectric material for integrated circuit structures. A reactor has a semiconductor substrate mounted on a substrate support which is maintained at a low temperature not exceeding about 25° C., preferably not exceeding about 10° C., and most preferably not exceeding about 0° C. A low k fluorine and carbon-containing silicon oxide dielectric material is formed on the surface of the substrate by reacting together a vaporous source of a mild oxidizing agent, such as a vaporized hydrogen peroxide, and a vaporous substituted silane having the formula (CFmHn)—Si—(R)xHy wherein m is 1-3; n is 3-m; R is an alkyl selected from the group consisting of ethyl (—C2H5), methyl (—CH3), and mixtures thereof; x is 1-3; and y is 3-x.Type: GrantFiled: June 7, 2000Date of Patent: April 2, 2002Assignee: LSI Logic CorporationInventors: Valeriy Sukharev, Vladimir Zubkov
-
Patent number: 6358569Abstract: A method of applying a thin film to a body comprising exposing the body to pulsed-gas cold-plasma polymerization of an unsaturated-carboxylic acid monomer thereby forming a polymer film on a surface of the body.Type: GrantFiled: January 25, 2001Date of Patent: March 19, 2002Assignee: Mupor LimitedInventors: Jas Pal S Badyal, Simon J. Hutton
-
Patent number: 6342275Abstract: Gas discharge is caused in a predetermined discharging gas at atmospheric pressure or a pressure close to atmospheric pressure, and an organic material which is liquid at room temperature and which is previously contained in the discharging gas or applied to a surface of a treated member is dissociated or excited by a plasma caused by the gas discharge to generate activated species. By using these excited activated species, a polymerized film of organic material is formed on the surface of the treated member. By variously selecting the organic material or the kind of the discharging material and variously combining them, a water repellent film, a hydrophilic film or a film having a high hardness can easily be formed on the surface of the treated member according to use, or the polymerization speed of the organic material can be increased, or the polymerization can be limited.Type: GrantFiled: December 28, 1995Date of Patent: January 29, 2002Assignee: Seiko Epson CorporationInventors: Takuya Miyakawa, Hiroaki Akiyama, Shintaro Asuke
-
Publication number: 20010051228Abstract: A material containing, as a main component, an organic silicon compound represented by the following general formula:Type: ApplicationFiled: July 9, 2001Publication date: December 13, 2001Applicant: MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD.Inventors: Gaku Sugahara, Nobuo Aoi, Koji Arai, Kazuyuki Sawada
-
Patent number: 6329023Abstract: A magnetic hard disk drive comprising a magnetic disk and a magnetic head slider, characterized in that said magnetic head slider is coated with a layer having a contact angle of 50° or more when measured by using a lubricant coated on the magnetic disk, is free from start failure due to stiction caused by adhesion of the lubricant to the slider surface.Type: GrantFiled: February 16, 2001Date of Patent: December 11, 2001Assignee: Hitachi, Ltd.Inventors: Hiromitsu Tokisue, Sunao Yonekawa, Nobuyuki Ishii, Yasuyuki Horiguchi, Yoshishige Endo, Yasuhiro Yoshimura, Yutaka Ito, Osamu Narisawa, Hiroshi Yuyama, Youichi Inoue, Yukiko Ikeda
-
Publication number: 20010029110Abstract: Fluorinated chemical precursors, methods of manufacture, polymer thin films with low dielectric constants, and integrated circuits comprising primarily of sp2C—F and some hyperconjugated sp3C—F bonds are disclosed in this invention. Precursors are disclosed for creating fluorinated silanes and siloxanes, and fluorinated hydrocarbon polymers. Thermal transport polymerization (TP), chemical vapor deposition (CVD), plasma enhanced CVD (PECVD), high density PECVD (HDPCVD), photon assisted CVD (PACVD), and plasma-photon assisted (PPE) CVD and PPETP of these chemicals provides thin films with low dielectric constants and high thermal stabilities for use in the manufacture of integrated circuits.Type: ApplicationFiled: April 17, 2001Publication date: October 11, 2001Applicant: Quester Technology, Inc.Inventors: Chung J. Lee, Hui Wang, Giovanni Antonio Foggiato
-
Patent number: 6296946Abstract: There is provided a plastic base material having a reformed layer 2 formed on a plastic substrate 1 by reforming the surface layer thereof into a component containing fluorine at the ratio of the number of fluorine atoms to the number of carbon atoms, F/C, of 0.85 or more and 1.30 or less, and having highly durable water repellency and ink repellency. The method of manufacturing such a plastic base material comprises a step of reforming the surface of the plastic substrate 1 into a fluorine-containing carbon layer by imparting a specific energy to fluorine-containing plasma by applying an RF bias voltage to the plastic substrate 1 to form a surface having highly durable water repellency and ink repellency. A highly durable ink-jet printer that enables high-quality printing can be provided by the use of a head for an ink-jet printer fabricated by using this plastic base material.Type: GrantFiled: April 1, 1999Date of Patent: October 2, 2001Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Koichi Kotera, Hiroyoshi Tanaka, Isamu Inoue, Osamu Watanabe
-
Patent number: 6258407Abstract: Fluorinated chemical precursors, methods of manufacture, polymer thin filmswith low dielectric constants, and integrated circuits comprising primarily of sp2C—F and some hyperconjugated sp3C—F bonds are disclosed in this invention. Precursors are disclosed for creating fluorinated silanes and siloxanes, and fluorinated hydrocarbon polymers. Thermal transport polymerization (TP), chemical vapor deposition (CVD), plasma enhanced CVD (PECVD), high density PECVD (HDPCVD), photon assisted CVD (PACVD), and plasma-photon assisted (PPE) CVD and PPETP of these chemicals provides thin films with low dielectric constants and high thermal stabilities for use in the manufacture of integrated circuits.Type: GrantFiled: November 15, 1999Date of Patent: July 10, 2001Assignee: Quester Technology, Inc.Inventors: Chung J. Lee, Hui Wang, Giovanni Antonio Foggiato
-
Patent number: 6255718Abstract: An integrated circuit coated with a layer of plasma deposited polymer which is ablatable by visible light laser radiation. The plasma layer is deposited on the circuit in a plasma chamber and the layer is ablated at selected locations.Type: GrantFiled: January 30, 1998Date of Patent: July 3, 2001Assignee: Chip Express CorporationInventors: Meir Janai, Yoram Cassuto, Michael Stephen Silverstein, Sharon Zehavi
-
Patent number: 6242054Abstract: The invention relates to a method for corrosion-resistant coating of metal substrates by means of plasma polymerization, wherein the substrate is subjected to mechanical, chemical and/or electrochemical smoothing in a pre-treatment step and is subsequently exposed to a plasma at a temperature of less than 200° C. and at a pressure of 10−5 bis 100 mbars, whereby in a first step the surface is activated in a reducing plasma and in a second step the polymer is separated from a plasma containing at least one hydrocarbon or silico-organic compound which can be vaporized in plasma conditions, optionally contains oxygen, nitrogen or sulphur and can contain fluorine.Type: GrantFiled: June 16, 2000Date of Patent: June 5, 2001Assignee: Fraunhofer-Gesellschaft zur Forderung der Angewandten Forschung E. V.Inventors: Alfred Baalmann, Henning Stuke, Klaus-Dieter Vissing, Hartmut Hufenbach
-
Patent number: 6211065Abstract: The present invention provides a method of depositing an amorphous fluorocarbon film using a high bias power applied to the substrate on which the material is deposited. The invention contemplates flowing a carbon precursor at rate and at a power level so that equal same molar ratios of a carbon source is available to bind the fragmented fluorine in the film thereby improving film quality while also enabling improved gap fill performance. The invention further provides for improved adhesion of the amorphous fluorocarbon film to metal surfaces by first depositing a metal or TiN adhesion layer on the metal surfaces and then stuffing the surface of the deposited adhesion layer with nitrogen. Adhesion is further improved by coating the chamber walls with silicon nitride or silicon oxynitride.Type: GrantFiled: October 10, 1997Date of Patent: April 3, 2001Assignee: Applied Materials, Inc.Inventors: Ming Xi, Eugene Tzou, Lie-Yea Cheng, Turgut Sahin, Yaxin Wang
-
Patent number: 6156434Abstract: A surface-treated PFA film, wherein hydroxyl groups and carbonyl groups are present on the surface of the surface-treated PFA film. Further, the surface state of the surface-treated surface is a surface state having no irregularities, and preferably the average surface roughness is at most 10 nm. The surface treatment is carried out by RF or DC bombardment method, preferably in an Ar gas atmosphere.Type: GrantFiled: March 12, 1998Date of Patent: December 5, 2000Assignee: Asahi Glass Company Ltd.Inventors: Atsushi Hayashi, Hiroshi Aruga, Yasuo Hayashi, Kazuo Harada, Makoto Fukawa
-
Patent number: 6153269Abstract: Provided are methods for forming a fluorocarbon polymer thin film on the surface of a structure. In one method, a monomer gas is exposed to a source of heat having a temperature sufficient to pyrolyze the monomer gas and produce a source of reactive CF.sub.2 species in the vicinity of the structure surface. The structure surface is maintained substantially at a temperature lower than that of the heat source to induce deposition and polymerization of the CF.sub.2 species on the structure surface. In another method for forming a fluorocarbon polymer thin film, the structure is exposed to a plasma environment in which a monomer gas is ionized to produce reactive CF.sub.2 species. The plasma environment is produced by application to the monomer gas of plasma excitation power characterized by an excitation duty cycle having alternating intervals in which excitation power is applied and in which no excitation power is applied to the monomer gas.Type: GrantFiled: March 29, 1999Date of Patent: November 28, 2000Assignee: Massachusetts Institute of TechnologyInventors: Karen K. Gleason, Scott J. H. Limb, Edward F. Gleason, Herbert H. Sawin, David J. Edell
-
Patent number: 6145763Abstract: An automotive fuel injector having a fluorine-coating amphorous hydronated carbon film coating to resist the formation of carbonaceous deposits thereon. The fluorine-coating amphorous hydronated carbon film is made in part form trifluoromethyltrimethylsilane. The coating helps the fuel injector resist coking or the growth of hard carbonaceous deposits. This reduction in coking and deposits improves the fuel economy and engine performance.Type: GrantFiled: December 30, 1998Date of Patent: November 14, 2000Assignee: Ford Global Technologies, Inc.Inventors: Jonathan Edward Fleming, Michael Howard Parsons, Robert Eugene Hetrick, William Martin Sheeran, Xia Zhang
-
Patent number: 6132813Abstract: A method for modifying a substrate surface, including the step of applying a high density plasma to the substrate surface in the presence of a hydrofluorocarbon gas and a carrier gas to form an antiwetting layer on the substrate surface. Optionally, the method including a cleaning step of contacting the slider surface with a carrier gas for a period of time effective to clean the surface.Type: GrantFiled: December 11, 1997Date of Patent: October 17, 2000Assignee: International Business Machines CorporationInventors: Pei C. Chen, Richard Hsiao, Son Van Nguyen, Andrew Chiuyan Ting
-
Patent number: 6107184Abstract: A method and apparatus for forming thin copolymer layers having low dielectric constants on semiconductor substrates includes in situ formation of p-xylylenes, or derivatives thereof, from solid or liquid precursors such as cyclic p-xylylene dimer, p-xylene, 1,4-bis(formatomethyl)benzene, or 1,4-bis(N-methyl-aminomethyl)benzene. P-xylylene is copolymerized with a comonomer having labile groups that are converted to dispersed gas bubbles after the copolymer layer is deposited on the substrate. Preferred comonomers comprise diazocyclopentadienyl, diazoquinoyl, formyloxy, or glyoxyloyloxy groups.Type: GrantFiled: December 9, 1998Date of Patent: August 22, 2000Assignee: Applied Materials, Inc.Inventors: Robert P. Mandal, David Cheung, Peter Wai-Man Lee, Chi-I Lang
-
Patent number: 6060129Abstract: Objects such as pharmaceutical vial stoppers are coated by treating with material such as a fluoropolymer. The objects to be coated are mixed with pieces of the treating material, and the resulting pile is tumbled in a reaction vessel containing a plasma. The treating material is transferred from the pieces onto the objects to be coated.Type: GrantFiled: March 3, 1997Date of Patent: May 9, 2000Assignee: Polar Materials, Inc.Inventors: H. Ronald Thomas, Melissa A. Baylog, Victor M. Zeeman, Jr.
-
Patent number: 6051321Abstract: Intermetal dielectric (IMD) and interlevel dielectric (ILD) that have dielectric constants (K) ranging from 2.0 to 2.6 are prepared from plasma or photon assisted CVD (PACVD) or transport polymerization (TP). The low K dielectric (LKD) materials are prepared from PACVD or TP of some selected siloxanes and F-containing aromatic compounds. The thin films combine barrier and adhesion layer functions with low dielectric constant functions, thus eliminating the necessity for separate adhesion and barrier layers, and layers of low dielectric constant. The LKD materials disclosed in this invention are particularly useful for <0.18 .mu.m ICs, or when copper is used as conductor in future ICs.Type: GrantFiled: October 24, 1997Date of Patent: April 18, 2000Assignee: Quester Technology, Inc.Inventors: Chung J. Lee, Hui Wang, Giovanni Antonio Foggiato
-
Patent number: 6022602Abstract: The lumen surface of tubing is modified by exposure to a gas plasma in a vacuum apparatus. A method and apparatus are disclosed whereby plasma treatment of the lumen surface, such as by deposition of a plasma polymerizate, may be achieved inside a continuous length of tubing. A gas such as a monomer vapor is caused to enter the lumen of the tubing through openings sequentially arranged at a periodic interval along the length of the tubing, and is excited to a plasma state concurrently as the tubing passes through a tubular reaction conduit having an inner diameter in occlusive contact with the tubing's outer diameter. Essentially crack-free plasma polymerizate coatings with thicknesses greater than 1000 angstroms are selectively deposited on the lumen wall of the continuous tubing. Plasma-modified tubing is prepared having usefulness in medical devices such as catheters, vascular grafts and enteral feeding tubes.Type: GrantFiled: September 27, 1994Date of Patent: February 8, 2000Assignee: NeoMecs IncorporatedInventor: Hiroshi Nomura
-
Patent number: 5980637Abstract: The present invention is generally directed to a process and a system for transforming a liquid into a solid material using light energy. In particular, a solution containing a parent material in a liquid form is atomized in a reaction vessel and directed towards a substrate. The atomized liquid is exposed to light energy which causes the parent material to form a solid coating on a substrate. The light energy can be provided from one or more lamps and preferably includes ultraviolet light. Although the process of the present invention is well suited for use in many different and various applications, one exemplary application is in depositing a dielectric material on a substrate to be used in the manufacture of integrated circuit chips.Type: GrantFiled: December 20, 1996Date of Patent: November 9, 1999Assignee: Steag RTP Systems, Inc.Inventors: Rajendra Singh, Rahul Sharangpani
-
Patent number: 5968609Abstract: A magnetic recording medium having at least a thin magnetic metal film and a carbon protective film formed on a non-magnetic substrate, wherein lubricating properties are afforded to a surface portion of the carbon protective film. Specifically, the carbon protective film having a lower layer exhibiting rust-proofing properties and/or an upper layer exhibiting lubricating properties is formed on the thin magnetic metal film. The magnetic recording medium has a good running performance, durability and preservability.Type: GrantFiled: April 29, 1998Date of Patent: October 19, 1999Assignee: Sony CorporationInventors: Yukari Yamada, Ryoichi Hiratsuka, Takahiro Kawana
-
Patent number: 5958509Abstract: A method of coating molded plastics articles which comprises first of all fluorinating, sulfonating, oxidizing or otherwise activating the surface of the articles and then covering them with a silane coating material.Type: GrantFiled: September 16, 1997Date of Patent: September 28, 1999Assignee: BASF AktiengesellschaftInventors: Petra Neumann, Joachim Rosch, Ulrich Buschges
-
Patent number: 5922415Abstract: The present invention provides a diamond like carbon coating comprising a surface comprising an interface and a lubricant film, said interface comprising atomic bonds between atoms in said diamond-like carbon coating and atoms in said lubricant precursor film. The invention also provides a method for producing said coating, interface, and film.Type: GrantFiled: June 18, 1997Date of Patent: July 13, 1999Assignee: Southwest Research InstituteInventors: Geoffrey Dearnaley, James Arps
-
Patent number: 5900288Abstract: A method of cleaning a substrate, in particular, the front face of a thermal ink jet printing device, to improve subsequent thin film deposition in a single chamber plasma processing system containing fluorine-containing deposits, involves treating the substrate with a hydrogen plasma. A front face coating for a thermal ink jet device may be formed by a method involving (1) treating a substrate of the thermal ink jet device with a hydrogen plasma; (2) optionally coating the cleaned substrate with an amorphous carbon layer; and (3) coating the substrate or amorphous carbon layer with a fluoropolymer layer.Type: GrantFiled: September 27, 1996Date of Patent: May 4, 1999Assignee: Xerox CorporationInventors: Daniel E. Kuhman, Thomas E. Orlowski
-
Patent number: 5888591Abstract: Provided are methods for forming a fluorocarbon polymer thin film on the surface of a structure. In one method, a monomer gas is exposed to a source of heat having a temperature sufficient to pyrolyze the monomer gas and produce a source of reactive CF.sub.2 species in the vicinity of the structure surface. The structure surface is maintained substantially at a temperature lower than that of the heat source to induce deposition and polymerization of the CF.sub.2 species on the structure surface. In another method for forming a fluorocarbon polymer thin film, the structure is exposed to a plasma environment in which a monomer gas is ionized to produce reactive CF.sub.2 species. The plasma environment is produced by application to the monomer gas of plasma excitation power characterized by an excitation duty cycle having alternating intervals in which excitation power is applied and in which no excitation power is applied to the monomer gas.Type: GrantFiled: May 6, 1996Date of Patent: March 30, 1999Assignee: Massachusetts Institute of TechnologyInventors: Karen K. Gleason, Scott J.H. Limb, Edward F. Gleason, Herbert H. Sawin, David J. Edell
-
Patent number: 5876758Abstract: The present invention relates to solid complex particles, each comprised of at least two solid substances, at least one of them being biologically active.The biologically active solid substance is comprised of at least one biologically active product and is evenly distributed at the surface of a grain consisting of the other solid core-forming substance, so-called support substance, said grain having a size comprised between 0.05 and 100 .mu.m (microns) and the weight ratio between said active substance and said core-forming substance being comprised between 10.sup.-4 and 1.5 approximately.The invention also relates to a method for the preparation of said particles, a process for the treatment of a biological surface in order to accelerate the biodisponibility of a biologically active substance.It also relates to compositions for topical application containing the particles of the invention.Type: GrantFiled: June 27, 1994Date of Patent: March 2, 1999Assignee: LVMH RechercheInventors: Alain Meybeck, Frederic Bonte
-
Patent number: 5876753Abstract: This invention describes a new approach to three-dimensional molecular tailoring of surfaces. In this process, a plasma deposition step is initially employed to deposit reactive functional groups on the surface of a solid substrate. This is then followed by immersion of the coated substrate in a solution during which time solute molecules react with the functional surface groups introduced during the plasma process. Solute molecules are attached to the surface during this second step. This simple two-step process is of general utility in that both the nature of the plasma introduced surface group and the nature of the solute molecules can be varied. Additionally it is possible to provide exact control of the surface density of reactive groups introduced during the plasma process and thus the concentration of solute molecules coupled to the solid surfaces.Type: GrantFiled: April 16, 1996Date of Patent: March 2, 1999Assignee: Board of Regents, The University of Texas SystemInventors: Richard B. Timmons, Jenn-Hann Wang
-
Patent number: 5849366Abstract: Plasma assisted polymerization and deposition of a very thin inner surface coating in a plastic or metal container without an undesirable increase in container surface temperature is provided to change the surface properties of the internal plastic surface of a container by reaction of the surface with a reactive gas which has been energized to produce a plasma or the surface is activated by a plasma of reactive gas so that it becomes receptive to a further surface reaction.Type: GrantFiled: March 19, 1996Date of Patent: December 15, 1998Assignee: The Coca-Cola CompanyInventor: George Plester
-
Patent number: 5773098Abstract: A thin fluoropolymer film is covalently bonded to a microporous ptfe film to make a bilayer for separation, filtration or reverse osmosis, by exposing the microporous film to perfluorocyclohexane under plasma. The perfluorocyclohexane molecules undergo scission and the fragments combine on the substrate to make a fluoropolymer film wherein the pores of the substrate have not been completely closed by the coating.Type: GrantFiled: November 21, 1995Date of Patent: June 30, 1998Assignee: British Technology Group, Ltd.Inventor: Thomas Ronald Thomas