Chemical Deposition From Liquid Contiguous With Substrate Via Electron Beam Or Light (e.g., Photochemical Liquid Deposition, Etc.) Patents (Class 427/581)
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Patent number: 6368658Abstract: Methods and apparatuses for coating medical devices and the devices thereby produced are disclosed. In one embodiment, the invention includes a method comprising the steps of suspending the medical device in an air stream and introducing a coating material into the air stream such that the coating material is dispersed therein and coats at least a portion of the medical device. In another embodiment, the medical devices are suspended in an air stream and a coating apparatus coats at least a portion of the medical device with a coating material. The coating apparatus may include a device that utilizes any number of alternative coating techniques for coating the medical devices. This process is used to apply one or more coating materials, simultaneously or in sequence. In certain embodiments of the invention, the coating materials include therapeutic agents, polymers, sugars, waxes, or fats.Type: GrantFiled: April 17, 2000Date of Patent: April 9, 2002Assignee: Scimed Life Systems, Inc.Inventors: Marlene Schwarz, Kathleen Miller, Kalpana Kamath
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Patent number: 6365220Abstract: A process for production of an actively antimicrobial surface for a substrate and for use in a biologically dynamic environment, such as for treating and preventing microbial infections, including a film consisting of at least an antimicrobial element and another electrochemically nobler element and which forms multitudinous galvanic cells with electrolyte-containing biological fluids, such as body fluids from wounds, etc., for releasing the antimicrobial element at the surface.Type: GrantFiled: January 7, 2000Date of Patent: April 2, 2002Assignee: Nucryst Pharmaceuticals Corp.Inventors: Robert Edward Burrell, Aron Marcus Rosenfeld
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Patent number: 6268025Abstract: Patterned dies made of non-conductive resins may be equipped with integrated electrodes in different manners. It is proved to be difficult to produce high-quality electrodes especially in microstructured dies. A patterned plastic die arranged on a carrier plate is filled with a solution of a metal compound. This solution is irradiated through the carrier plate from the back side of the carrier plate using laser light, ultraviolet light or X-rays. The metal compound is transformed in the immediate vicinity of the base of the structure and a metal layer is deposited on the base of the structure forming the electrodes. The method is suitable for a base of the structure forming a coherent or a non-coherent area. Plastic dies containing integrated electrodes are used for electroless or electrophoretic deposition of materials and for electroplating, in all cases starting from the integrated electrodes, and for analytical methods.Type: GrantFiled: June 17, 1999Date of Patent: July 31, 2001Assignee: MicroParts Gesellschaft für Mikrostrukturtechnik mbHInventors: Holger Reinecke, Friedolin Franz Nöker
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Patent number: 6248658Abstract: Submicron-dimensioned metallization patterns are formed on a substrate surface by a photolytic process wherein portions of a metal-compound containing fluid layer on the substrate surface which are exposed through a pattern of submicron-sized openings in an overlying exposure mask are irradiated with UV to near X-ray radiation. Photo-decomposition of the metal-containing compound results in selective metal deposition on the substrate surface according to the exposure mask pattern. When liquid, the fluid layer is prevented from contacting the mask surfaces during photolysis in order to prevent closing off of the very small apertures by deposition thereon. The inventive method is of particular utility in forming multi-level, in-laid, “back-end” metallization of high density integrated circuit semiconductor devices.Type: GrantFiled: January 13, 1999Date of Patent: June 19, 2001Assignee: Advanced Micro Devices, Inc.Inventor: Matthew S. Buynoski
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Patent number: 6162745Abstract: A film forming method includes the steps of forming a solution film, by dropwise supplying a solution containing solid contents in a solvent and volatilizing the solvent, and selectively forming a film of the solid contents on a to-be-processed substrate at predetermined areas, the method comprising the steps of selectively irradiating an energy beam onto that substrate surface to allow the substrate surface to be modified and forming a filmed area having a high affinity for the solvent and a non-filmed area having a low affinity for the solvent, dropwise supplying the solution to the substrate surface and forming the solution film, and volatilizing the solvent from the solution film and, by doing so, forming a solid contents film selectively on the substrate surface selectively at filmed areas.Type: GrantFiled: August 30, 1999Date of Patent: December 19, 2000Assignee: Kabushiki Kaisha ToshibaInventors: Shinichi Ito, Katsuya Okumura, Koutarou Sho
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Patent number: 6162278Abstract: The method of the invention is based on the unique electron-carrying function of a photocatalytic unit such as the photosynthesis system I (PSI) reaction center of the protein-chlorophyll complex isolated from chloroplasts. The method employs a photo-biomolecular metal deposition technique for precisely controlled nucleation and growth of metallic clusters/particles, e.g., platinum, palladium, and their alloys, etc., as well as for thin-film formation above the surface of a solid substrate. The photochemically mediated technique offers numerous advantages over traditional deposition methods including quantitative atom deposition control, high energy efficiency, and mild operating condition requirements.Type: GrantFiled: May 12, 1999Date of Patent: December 19, 2000Assignee: UT.sub.-- Battelle, LLCInventor: Zhong-Cheng Hu
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Patent number: 6117487Abstract: A process for forming a metal oxide film by means of a chemical vapor deposition system, which comprises using a complex of a .beta.-diketone compound and a group IV metal glycolate, the complex being represented by formula (I): ##STR1## wherein M represents a metal atom of the group IV; R.sup.1 and R.sup.2 each represent a branched alkyl or cycloalkyl group having 4 to 8 carbon atoms; and R.sup.3 represents a straight-chain or branched alkylene group having 2 to 18 carbon atoms.Type: GrantFiled: March 24, 1999Date of Patent: September 12, 2000Assignee: Asahi Denka Kogyo Kabushiki KaishaInventors: Mitsuo Akutsu, Naohiro Kubota, Akifumi Masuko, Naoki Yamada
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Patent number: 6117497Abstract: A liquid compound or a compound solution is kept in contact with the surface of a solid material, such as a synthetic resin, glass, metal, or ceramic, radiation selected from ultraviolet radiation, visible radiation, and infrared radiation is irradiated on the interface between the surface of the solid material and the liquid compound or compound solution to optically excite the surface of the solid material and the liquid compound or compound solution, thereby effecting substitution with a chemical species in the liquid compound or compound solution, depositing the chemical species, or performing etching with the chemical species.Type: GrantFiled: July 7, 1997Date of Patent: September 12, 2000Assignees: Tokai University, Nitto Denko CorporationInventors: Masataka Murahara, Masakatsu Urairi
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Patent number: 6077617Abstract: Disclosed is a system made by a method for depositing rare-earth boride onto the surface of a substrate which is submerged in an organic solution of borane and a rare-earth halide. Application of electromagnetic radiation, preferably in the visible wavelength range, through a mask near the surface of the submerged substrate, drives the formation and deposition of rare-earth boride onto a substrate in desired patterns.Type: GrantFiled: November 2, 1999Date of Patent: June 20, 2000Assignee: Board of Regents of the University of NebraskaInventors: Peter A. Dowben, Zenchen Zhong, David J. Sellmyer
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Patent number: 6033784Abstract: A method of immobilizing a ligand (L) to the surface (P) of a carbon-containing substrate material; said method comprising: a photochemical step of linking of one or more photochemically reactive compounds (Q) to a carbon-containing material surface (P); wherein the photochemically reactive compound (Q) is a quinone compound containing a cyclic hydrocarbon, or from 2 to 10 fused cyclic hydrocarbons, with at least two conjugated carbonyl groups; and wherein the photochemical step comprises irradiation of the photochemically reactive compound (Q) with non-ionizing electromagnetic radiation having a wavelength in the range from UV to visible light.Type: GrantFiled: October 7, 1997Date of Patent: March 7, 2000Inventors: Mogens Havsteen Jacobsen, Troels Koch
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Patent number: 6022596Abstract: A method is provided for selectively metallizing one or more three-dimensional materials in an electronic circuit package comprising the steps of forming a layer of seeding solution on a surface of the three-dimensional material of interest, exposing this layer to light of appropriate wavelength, resulting in the formation of metal seed on regions of the three-dimensional material corresponding to the regions of the layer of seeding solution exposed to light; removing the unexposed regions of the layer of seeding solution by subjecting the exposed and unexposed regions of the layer of seeding solution to an alkaline solution. Thereafter, additional metal is deposited, e.g., plated, onto the metal seed using conventional techniques. Significantly, this method does not involve the use of a photoresist, or of a corresponding chemical developer or photoresist stripper.Type: GrantFiled: July 17, 1996Date of Patent: February 8, 2000Assignee: International Business Machines Corp.Inventors: Thomas H. Baum, Luis J. Matienzo, Cindy Reidsema Simpson, Joseph E. Varsik
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Patent number: 6013338Abstract: An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.Type: GrantFiled: November 10, 1998Date of Patent: January 11, 2000Assignee: Semiconductor Energy Laboratory Co., Ltd.Inventors: Takashi Inushima, Shigenori Hayashi, Toru Takayama, Masakazu Odaka, Naoki Hirose
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Patent number: 6007876Abstract: There is disclosed a method for producing polymer articles having highly functionalized surfaces excellent in biocompatibility, by irradiating the surfaces of a polymer article with an ultraviolet laser beam in a solution containing a biopolymer. According to this method, a polymer article that has surfaces with biocompatibility, can be produced.Type: GrantFiled: March 24, 1998Date of Patent: December 28, 1999Assignee: Director-General of Agency of Industrial Science and TechnologyInventor: Hiroyuki Niino
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Patent number: 6004633Abstract: Patterned dies made of non-conductive resins may be equipped with integrated electrodes in different manners. It is proved to be difficult to produce high-quality electrodes especially in microstructured dies. A patterned plastic die arranged on a carrier plate is filled with a solution of a metal compound. This solution is irradiated through the carrier plate from the back side of the carrier plate using laser light, ultraviolet light or X-rays. The metal compound is transformed in the immediate vicinity of the base of the structure and a metal layer is deposited on the base of the structure forming the electrodes. The method is suitable for a base of the structure forming a coherent or a non-coherent area. Plastic dies containing integrated electrodes are used for electroless or electrophoretic deposition of materials and for electroplating, in all cases starting from the integrated electrodes, and for analytical methods.Type: GrantFiled: October 3, 1996Date of Patent: December 21, 1999Assignee: Microparts GesellschaftInventors: Holger Reinecke, Friedolin Franz Noker
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Patent number: 5989653Abstract: An improved additive process for metallization of substrates is described whereby a catalyst solution is applied to a surface of a substrate. Metallic catalytic clusters can be formed in the catalyst solution on the substrate surface by irradiating the substrate. Electroless plating can then deposit metal onto the portion of the substrate surface having metallic clusters. Additional metallization thickness can be obtained by electrolytically plating the substrate surface after the electroless plating step.Type: GrantFiled: December 8, 1997Date of Patent: November 23, 1999Assignee: Sandia CorporationInventors: Ken S. Chen, William P. Morgan, John L. Zich
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Patent number: 5981094Abstract: A cubic form of C.sub.3 N.sub.4 with a zero-pressure bulk modulus exceeding that of diamond. The product is prepared by combining carbon and nitrogen at a pressure of 120,000 to 800,000 atmosphere and a temperature of 1000-3000.degree. C.Type: GrantFiled: December 17, 1996Date of Patent: November 9, 1999Assignee: The Carnegie Institution of WashingtonInventors: David M. Teter, Russell J. Hemley
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Patent number: 5980637Abstract: The present invention is generally directed to a process and a system for transforming a liquid into a solid material using light energy. In particular, a solution containing a parent material in a liquid form is atomized in a reaction vessel and directed towards a substrate. The atomized liquid is exposed to light energy which causes the parent material to form a solid coating on a substrate. The light energy can be provided from one or more lamps and preferably includes ultraviolet light. Although the process of the present invention is well suited for use in many different and various applications, one exemplary application is in depositing a dielectric material on a substrate to be used in the manufacture of integrated circuit chips.Type: GrantFiled: December 20, 1996Date of Patent: November 9, 1999Assignee: Steag RTP Systems, Inc.Inventors: Rajendra Singh, Rahul Sharangpani
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Patent number: 5932300Abstract: A process for the currentless metallization of electrically non-conductive substrates, includes providing a substrate which is electrically non-conductive; depositing on the substrate a positive lacquer comprising at least one polymer which is UV hardenable, at least one organo-metalllic compound, and a substance which is light-active to provide a positive lacquer coated substrate; irradiating the positive lacquer coated substrate with UV radiation to provide an irradiated coated substrate; and precipitating a metal layer onto the irradiated coated substrate by currentless metallization in a bath effective therefore.Type: GrantFiled: September 8, 1997Date of Patent: August 3, 1999Assignee: Robert Bosch GmbHInventors: Lothar Weber, Kurt Schmid, Ralf Haug, Dorothee Kling
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Patent number: 5894038Abstract: The present invention is directed to a process for forming a layer of palladium on a substrate, comprising:preparing a solution of a palladium precursor, wherein the palladium precursor consists ofPd(OOCR.sup.1).sub.m (OOCR.sup.2).sub.nwhereinR.sup.1 is hydrogen, alkyl, alkenyl, alkynyl, --R.sup.3 COOH, alkyl from 1 to 5 carbons substituted with one or two hydroxyl groups,R.sup.2 is hydrogen, alkyl, alkenyl, alkynyl, --R.sup.3 COOH, alkyl from 1 to 5 carbon atoms substituted with one or two hydroxyl groups, --CHO,R.sup.3 is alkyl, and alkyl groups from 1 to 5 carbon atoms substituted with one or two hydroxyl groupsm and n are real numbers or fractions, and m+n=2;applying the palladium precursor to the surface of the substrate;decomposing the palladium precursor by subjecting the precursor to heat.Type: GrantFiled: February 28, 1997Date of Patent: April 13, 1999Assignee: The Whitaker CorporationInventors: Sunity Kumar Sharma, Kuldip Kumar Bhasin, Subhash C. Narang, Asutosh Nigam
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Patent number: 5891530Abstract: Methods of producing release coatings, adhesives, primers, and other polymeric coatings are described. A method for producing a release coating on a substrate comprises the steps of applying a polymerizable composition comprising a free radically polymerizable ethylenically unsaturated polysiloxane to a surface of a substrate, and exposing the polymerizable composition to a monochromatic light source having a peak intensity at a wavelength of between about 160 nanometers to 240 nanometers to form a release coating. Methods for producing a pressure sensitive adhesive and other polymeric coatings using a monochromatic light source are also described.Type: GrantFiled: April 19, 1996Date of Patent: April 6, 1999Assignee: Minnesota Mining and Manufacturing CompanyInventor: Robin E. Wright
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Patent number: 5882435Abstract: Solar cells made of crystalline are metal coated. Combined front side and rear side metal coating based on a thick-film process is proposed, in which even very fine thick-film conductor track structures are sufficiently reinforced by photo-induced currentless deposition of a metal. Well adhering improved conductor track structures for the front side metal coating can be produced using the simplified process.Type: GrantFiled: July 7, 1997Date of Patent: March 16, 1999Assignee: Siemens Solar GmbHInventor: Konstantin Holdermann
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Patent number: 5871823Abstract: A hydrophilic coating on a polymeric substrate is prepared by subjecting at least one hydrophilic vinyl monomer to radiation-induced graft polymerization on an activated substrate surface.Type: GrantFiled: June 9, 1997Date of Patent: February 16, 1999Assignee: Huels AktiengesellschaftInventors: Christine Anders, Hartwig Hoecker, Doris Klee, Guenter Lorenz
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Patent number: 5859086Abstract: A method is disclosed for modifying a fluoropolymer including the following steps: providing a fluoropolymer surface, adding a solution including a a reactive species to the fluoropolymer surface, and exposing the reduced fluoropolymer surface to ultraviolet radiation in the presence of ozone or oxygen. The method reduces the discoloration of the fluoropolymer.Type: GrantFiled: August 7, 1997Date of Patent: January 12, 1999Assignee: Competitive Technologies of PA, Inc.Inventors: Michael S. Freund, Lisa M. Regalla, Gang Liu
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Patent number: 5834069Abstract: A semiconductor catalyst is metalized in situ on a reaction support surface by illuminating at least a portion of the catalyst in the presence of a suitable source of metal to selectively deposit the metal on the illuminated portions. The source of metal can be applied to the reaction support surface either with the catalyst or separately, but is not attached to the catalyst until the structure is illuminated. This causes the metal to be deposited where the catalyst will be illuminated during use and therefore where photopromoted catalytic degradation can occur.Type: GrantFiled: April 30, 1996Date of Patent: November 10, 1998Assignee: Zentox CorporationInventors: Elliot Berman, Anatoly Grayfer
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Patent number: 5750212Abstract: This invention relates to a process for the application of conducting metallic, structured coatings on glass substrates, for example, for the manufacture of integrated circuits. The invention relies on placing a negative mask of the structure to be applied into the beam path of an excimer laser. After leaving the mask, the laser beam is directed onto a flat silica glass slice, the back side of which is in contact with a reductive copper bath. The process according to this invention requires exposure times no longer than seconds, after which the process proceeds autocatalytically. It can be stopped as soon as the desired coating thickness has been attained.Type: GrantFiled: July 30, 1992Date of Patent: May 12, 1998Assignee: LPKF CAD/CAM Systeme GmbHInventor: Jorg Kickelhain
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Patent number: 5711999Abstract: A method is provided for modifying a photosensitive chemical material which controls exposure to make spectral intensity ratio constant, adjusts the pre-tilt angles of a liquid crystal orientation film easily and accurately, and gives desired properties to the photosensitive chemical material. A photosensitive chemical material is patterned by the photochemical reaction of a photosensitive chemical material. The photosensitive chemical material is irradiated with light emitted from a light source having a line spectrum having almost single wavelength between 200 nm and 300 nm (for example, a low pressure mercury lamp or a laser lamp) according to a pattern to control the reaction of the photosensitive chemical material. Also, the photosensitive chemical material is irradiated with light having a wavelength of 300 nm or longer to make the photosensitive chemical material cause a reaction to occur that selectively generates active oxygen.Type: GrantFiled: August 28, 1996Date of Patent: January 27, 1998Assignee: International Business Machines CorporationInventors: Fumiaki Yamada, Yoichi Taira
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Patent number: 5686150Abstract: The present invention relates to a process of depositing metals onto various substrates. Applications for which the present invention may be useful include the formation of catalysts such as those used in electrochemical applications, including fuel cells and the like, refining applications such as oil refining, automotive applications such as automotive catalytic converters, and other similar applications.Type: GrantFiled: December 15, 1994Date of Patent: November 11, 1997Assignee: Lanxide Technology Company, LPInventor: Roger Lee Ken Matsumoto
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Patent number: 5635257Abstract: The present invention relates to a process for hydrophilizing a porous material made of a fluorine resin comprising irradiating an ultraviolet laser beam on the porous material impregnated with an aqueous solution of hydrogen peroxide or water-soluble organic solvent. According to the process, the chemically and physically inactive surfaces including the inside of the micropores of the porous materials made of fluorine resins can be sufficiently hydrophilized without deteriorating the excellent heat resistance, chemical resistance and the like of the fluorine resins.Type: GrantFiled: May 5, 1995Date of Patent: June 3, 1997Assignees: Kurashiki Boseki Kabushiki Kaisha, Japan Atomic Energy, Radiation Application Development Reserch InstituteInventors: Masanobu Nishii, Shunichi Kawanishi, Shunichi Sugimoto, Tadaharu Tanaka, Mitsuru Sano
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Patent number: 5614269Abstract: A method of making a water absorptive article comprising, a fibrous substrate impregnated with a water absorptive, water insoluble polymer, wherein the polymer is intertwined and interlocked with fibers of the fibrous substrate, and the article has high water absorbing capacity.Type: GrantFiled: December 13, 1994Date of Patent: March 25, 1997Assignee: Interface, Inc.Inventors: Martin G. Hoskins, Connie Hensler
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Patent number: 5605723Abstract: A pattern of a non-volatile high-performance ferroelectric thin film memory is formed by applying a composition containing hydrolytic metal compounds, and a photosensitizer which generates water when irradiated with active rays onto a substrate. The resultant film is exposed to active rays in compliance with a prescribed pattern to form an image and developed with a solvent to remove non-exposed portions, and then the remaining exposed portions are subjected to a heat treatment to convert the exposed portions into a dielectric substance comprising a metal oxide as expressed by the following formula (I):(Bi.sub.2 O.sub.2).sup.2+ (A.sub.m-1 B.sub.m O.sub.3m+1).sup.2-(I)where A is one or more elements selected from the group consisting of Ba, Sr, Pb and Bi; B is one or more elements selected from the group consisting of Ti, Nb and Ta; and m is an integer of from 2 to 5.Type: GrantFiled: May 2, 1995Date of Patent: February 25, 1997Assignee: Mitsubishi Materials CorporationInventors: Katsumi Ogi, Tsutomu Atsuki, Hiroto Uchida, Tadashi Yonezawa, Nobuyuki Soyama
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Patent number: 5603991Abstract: This invention is in the general field of surgical instruments and, in particular, catheters. Specifically, it relates to procedures for coating the interior surfaces of surgical devices with a cross-linkable lubricious polymer, preferably one which is hydrophilic. These catheters may be variously used in cardiovascular and endovascular procedures to deliver diagnostic, therapeutic, or vaso-occlusive agents or devices to a target site within a human or animal body and to catheters used to guide other catheters to a particular site in that body. The interior of the catheters are coated using the noted procedure in such a way that the interior is exceptionally slippery and very durable.Type: GrantFiled: September 29, 1995Date of Patent: February 18, 1997Assignee: Target Therapeutics, Inc.Inventors: David Kupiecki, Thuzar K. Han
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Patent number: 5595790Abstract: An effective non-specular reflector, for use in a Liquid Crystal Display, is formed by first coating a substrate with a two component solution. One component hardens when heated or when exposed to ultraviolet light (optionally through a mask) while the other component remains liquid. The result is a solid layer in which are dispersed multiple liquid regions, some of which break the surface where they are easily removed, leaving behind a roughened surface. Once a high reflectance metal has been deposited onto this surface it becomes an effective nonspecular reflector. Examples of materials for use as the two components are given.Type: GrantFiled: June 21, 1996Date of Patent: January 21, 1997Assignee: Industrial Technology Research InstituteInventor: Chung-Kuang Wei
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Patent number: 5582955Abstract: Methods for covalently modifying surfaces of various substrates are disclosed, along with various substrates having surfaces modified by such methods. Candidate surfaces include various polymeric, siliceous, metallic, allotrophic forms of carbon, and semiconductor surfaces. The surfaces are exposed to a reagent, having molecules each comprising a nitrenogenic group and a functionalizing group, in the presence of energized charged particles such as electrons and ions, photons, or heat, which transform the nitrenogenic reagent to a nitrene intermediate. The nitrene covalently reacts with any of various chemical groups present on the substrate surface, thereby effecting nitrene addition of the functionalizing groups to the substrate surface. The functionalizing groups can then participate in downstream chemistry whereby any of a large variety of functional groups, including biological molecules, can be covalently bonded to the surface, thereby dramatically altering the chemical behavior of the surface.Type: GrantFiled: June 26, 1995Date of Patent: December 10, 1996Assignee: State of Oregon Acting by and through the State Board of Higher Education on Behalf of the University of OregonInventors: John F. W. Keana, Martin N. Wybourne, Sui X. Cai, Mingdi Yan
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Patent number: 5534312Abstract: A photoresist-free method for making patterned films of metal oxides, metals, or other metal containing compounds is described. The method involves applying an amorphous film of a metal complex to a substrate. The film may be conveniently applied by spin coating using standard industry techniques. The metal complex used is photoreactive and undergoes a low temperature chemical reaction in the presence of light of a suitable wavelength. The end product of the reactions depends upon the atmosphere in which the reactions take place. Metal oxide films may be made in air. Patterned films may be made by exposing only selected portions of the film to light. Patterns of two or more materials may be laid down from the same film by exposing different parts of the film to light in different atmospheres. The resulting patterned film is generally planar. Separate planarization steps are not generally required.Type: GrantFiled: November 14, 1994Date of Patent: July 9, 1996Assignee: Simon Fraser UniversityInventors: Ross H. Hill, Bentley J. Palmer, Alfred A. Avey, Jr., Sharon L. Blair, Chu-Hui W. Chu, Meihua Gao, Wai L. Law
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Patent number: 5534311Abstract: Structures having a controlled three-dimensional geometry are deposited by lectrostatically focused deposition using charged particle beam and gaseous precursors, or polarizable precursors with or without a charged particle beam. At least one apertured electrode is electrically biased with respect to the substrate surface. The resulting electrostatic field and field gradient focuses the charged particle beam or polarizable gaseous precursor molecules, and controls the three-dimensional geometry of the deposited structure. By this method, an array including many deposited structures may be simultaneously deposited on a single substrate. Thus, the disclosed method provides a fact and simple way of fabricating one or more arrays of three-dimensional structures. The method is particularly useful in the fabrication of arrays of sharp-tipped, cone-shaped conductive structures, such as field emitter tips and contacts.Type: GrantFiled: May 31, 1995Date of Patent: July 9, 1996Assignee: The United States of America as represented by the Secretary of the NavyInventors: Jonathan L. Shaw, Henry F. Gray
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Patent number: 5534104Abstract: In a method for producing a three-dimensional object by successive solidification of superposed layers of the object a deformation of the object caused by shrinkage during the solidification shall be reduced. To this end first of all respective partial regions (6a . . . 6k) of a layer are solidified and simultaneously connected with underlying partial regions of the previously solidified layer to form multilayered cells and thereafter adjacent partial regions of the same layer are interconnected by solidifying narrow connecting regions (8a . . . 8p). The intermediate regions (7) between the individual partial regions are solidified by post-curing.Type: GrantFiled: May 25, 1994Date of Patent: July 9, 1996Assignee: EOS GmbH Electro Optical SystemsInventors: Hans J. Langer, Johannes Reichle
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Patent number: 5525377Abstract: Doped encapsulated semiconductor nanoparticles of a size (<100 .ANG.) which exhibit quantum effects. The nanoparticles are precipitated and coated with a surfactant by precipitation in an organometallic reaction. The luminescence of the particles may be increased by a further UV curing step.Type: GrantFiled: June 7, 1995Date of Patent: June 11, 1996Assignee: U.S. Philips CorporationInventors: Dennis Gallagher, Rameshwar Bhargava, Jacqueline Racz
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Patent number: 5512162Abstract: The invention is a method for making a metal containing article, comprising the steps of: providing a layer of a porous ground in a selected area; exposing selected regions of the layer of porous ground to light, thereby metallizing the selected regions; repeating the foregoing steps a selected number of times to produce a selected number of layers; and selectively modifying the metallized regions of the layers. The initial metallization can be by electroless or semiconductor photo deposition plating. The subsequent modification of the metallized regions can be by electroless plating, electroplating or sintering. It is also possible, in some instances, to forego the second phase modification, the initial phase having provided the desired parameters. In a third preferred embodiment, the invention is a method using an initial metallization phase effected by exposure of a metal salt, such as a metal halide, to light, thereby inducing activation of the halide.Type: GrantFiled: August 13, 1992Date of Patent: April 30, 1996Assignee: Massachusetts Institute of TechnologyInventors: Emanuel Sachs, Che-Chih Tsao
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Patent number: 5506007Abstract: A process for polymerizing a free-radically polymerizable composition comprising the steps:(a) coating a coatable free-radically polymerizable mixture onto at least one major surface of a web;(b) deoxygenating a liquid inerting medium;(c) immersing the coated web into the deoxygenated liquid inerting medium; and(d) irradiating the immersed coated web with actinic radiation sufficient to effect polymerization of the free-radically polymerizable mixture, while maintaining the liquid inerting medium in an essentially oxygen-free state.Type: GrantFiled: August 2, 1995Date of Patent: April 9, 1996Assignee: Minnesota Mining and Manufacturing CompanyInventors: Jerry W. Williams, George V. D. Tiers, Jeanne M. Goetzke, Gerald L. Uhl
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Patent number: 5486384Abstract: Process for producing a multi-layer lacquer coating by the application of a coat of clear lacquer including coating agents which are curable exclusively by polymerization in radicalic and/or cationic manner to a dried or crosslinked colored and/or effect-producing basecoat film process is performed in light having a wavelength of over 550 nm or subject to the exclusion of light. The application step is followed by initiation or implementation of curing of the clear-lacquer film by high-energy radiation. The process is particularly suitable for producing multi-layer lacquer coatings in the automobile industry.Type: GrantFiled: November 5, 1993Date of Patent: January 23, 1996Assignee: Herberts GmbHInventors: Udo Bastian, Manfred Stein
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Patent number: 5470617Abstract: The present invention relates to a process for modifying the surfaces of the molded materials made of fluorine resins comprising irradiating an ultraviolet laser beam on said surfaces in the presence of an ultraviolet-absorbing compound and a fluorosurfactant. According to the process, the adhesive and wetting properties and the like of the surfaces of the molded materials made of fluorine resins can be remarkably improved.Type: GrantFiled: October 14, 1994Date of Patent: November 28, 1995Assignee: Kurashishiki Boseki Kabushiki KaishaInventors: Masanobu Nishii, Yuichi Shimizu, Shunichi Kawanishi, Shunichi Sugimoto, Masao Endo, Tomohiro Nagase
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Patent number: 5449534Abstract: An anti-reflection film is produced on the panel surface of a cathode-ray tube by:(A) preparing a solution for forming an anti-reflection film, which contains water and a metal alkoxide having the formula,M(OR).sub.nwherein M is a metal selected from the group consisting of Si, Ti, Al, Zr, Sn, In, Sb and Zn; R is an alkyl group having 1-10 carbon atoms; n is an integer of from 1 to 8; and when n is not 1, the alkyl groups represented by R may be the same or different,(B) coating the solution for forming an anti-reflection film on the outermost surface of the panel of a cathode-ray tube, and(C) applying an ultraviolet light to the solution for forming an anti-reflection film coated on said surface to cure the solution to form a transparent film with fine roughness.Type: GrantFiled: September 9, 1992Date of Patent: September 12, 1995Assignee: Hitachi, Ltd.Inventors: Tomoji Oishi, Sachiko Maekawa, Akira Kato, Masahiro Nishizawa, Yoshifumi Tomita, Kojiro Okude, Kenji Tochigi, Yutaka Misawa
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Patent number: 5443672Abstract: A process is disclosed for coating a circuit board with a photopolymerizable material which is applied by extension at temperatures of 100.degree. to 180.degree. C. followed by distributing the material under pressure by a roller.Type: GrantFiled: October 4, 1994Date of Patent: August 22, 1995Assignee: E. I. Du Pont de Nemours and CompanyInventors: Reiner Stoll, Britta Schulmeyer
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Patent number: 5429908Abstract: A method for reducing curl in three dimensional computer generated models, created by the sequential exposure of adjacent layers of a photoformable composition, comprising exposing each layer twice, the first exposure being with an image modulated exposure further modulated to produce a series of isolated, anchored islets along the imaged areas, and the second exposure also being image modulated but without the additional modulation, so as to fuse the islets into a continuous solid image.Type: GrantFiled: April 12, 1993Date of Patent: July 4, 1995Assignee: E. I. Du Pont de Nemours and CompanyInventors: Bronson R. Hokuf, John A. Lawton
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Patent number: 5424252Abstract: An electroless metal or alloy plating solution as a photo-plating solution contains at least one of copper, nickel, cobalt or tin, and a sacrificial reagent which supplies electrons as a result of irreversible oxidative decomposition. A semiconductor is supported on a substrate, and dipped in the photo-plating solution, and the surface of the semiconductor is irradiated with light having a higher level of energy than the exciting energy of the semiconductor. A thick coating containing at least one of copper, nickel, cobalt or tin can be formed on that portion of the semiconductor which has been irradiated with light.Type: GrantFiled: November 16, 1993Date of Patent: June 13, 1995Assignee: Kabushiki Kaisha Toyota Chuo KenkyushoInventor: Shinya Morishita
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Patent number: 5419968Abstract: The invention provides surface-modified hydrophilic fluororesin moldings. The surface of a fluororesin molding is at least partly hydrophilized by irradiating at least part of the fluororesin molding with ultraviolet laser light not longer than 400 nm in wavelength in a state such that the molding is in contact with gas-treated water prepared by introducing into water a gas such as hydrogen gas, nitrogen gas or a rare gas or with some other specific aqueous liquid. The thus-obtained fluororesin moldings are suited for use, for example, as materials of artificial blood vessels excellent in antithrombotic property, and contact lenses free of modification-due discoloration. Further, they are expected to find a wider range of application where their performance characteristics are to be utilized.Type: GrantFiled: February 4, 1994Date of Patent: May 30, 1995Assignees: Gunze Limited, Japan Atomic Energy Research Institute, Radiation Application Development AssociationInventors: Atsushi Okada, Yuichi Shimizu, Shunichi Kawanishi, Masanobu Nishii, Shunichi Sugimoto
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Patent number: 5411770Abstract: The surface of stainless steel can be hardened by coating a silicon nitride gel and then scanning by CO.sub.2 laser to form a surface alloy layer thereon. The thickness and hardness of the surface alloy layer are both uniform. The Vicker's hardness of the layer can be as high as 1200 Hv. This method can be operated in a common atmosphere or nitride atmosphere at normal pressure, therefore it is more economic than ion nitriding or plasma nitriding.Type: GrantFiled: June 27, 1994Date of Patent: May 2, 1995Assignee: National Science CouncilInventors: Wen-Ta Tsai, Ju-Tung Lee, Tai-Hwang Lai
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Patent number: 5405656Abstract: The present invention relates to a solution for catalytic treatment, which is effective for applying a catalyst-metal onto the surface of a substrate, which can provide a film having excellent properties such as adhesion, precision and selectivity through electroless plating or the like, and which does not cause a premature and undesirable decomposition in a bath. The solution for catalytic treatment comprises a catalyst-metal in the form of ions, which permits the deposition of the metal serving as a catalyst on a substrate by applying the solution onto the surface of the substrate and then irradiating the substrate with light rays. The present invention also relates to a method of applying a catalyst onto a substrate and a method of forming an electrical conductor in which such a solution for catalytic treatment is employed.Type: GrantFiled: December 3, 1993Date of Patent: April 11, 1995Assignee: Nippondenso Co., Ltd.Inventors: Futoshi Ishikawa, Koji Kondo, Masahiro Irie
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Patent number: 5378508Abstract: A method for providing a conductive metal deposit on the surface of a dielectric substrate by applying a composition comprising a mixture of a salt and amine or amide compound to the substrate and subjecting the composition to a continuous wavelength laser beam.Type: GrantFiled: April 1, 1992Date of Patent: January 3, 1995Assignees: Akzo Nobel N.V., Northwestern UniversityInventors: Anthony J. Castro, Richard P. Van Duyne, King C. Sheng, Robert J. Bianchini, William J. Parr, Ralph Franklin, Michael J. Natan
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Patent number: 5362525Abstract: A process for modifying surfaces of fluorine resins including irradiating an ultraviolet laser beam on the surfaces in the presence of an inorganic silicon compound. The inorganic silicon compound could be a silicate, silicon oxide, silicon nitride, or silicon carbide.Type: GrantFiled: December 7, 1993Date of Patent: November 8, 1994Assignees: Kurashiki Boseki Kabushiki Kaisha, Japan Atomic Energy Research Institute, Radiation Application Development AssociationInventors: Masanobu Nishii, Yuichi Shimizu, Shunichi Kawanishi, Shunichi Sugimoto, Tadaharu Tanaka, Yosuke Eguchi