Abstract: An optical illusion device such as a drinking glass/cup for providing a multi-dimensional visual display. The device includes a body with tubular sidewalls extending from an opening at a first end to an opening at a second end. A base assembly is provided at the second end. The base assembly includes a top wall, a bottom wall, and a sidewall that together form or define an inner chamber. A visual display assembly is provided with a mirror element with a convex reflective surface or mirror positioned within the chamber with the reflective surface facing the top wall of the base assembly. A primary image element is provided proximate to the reflective surface such that the primary image and mirror element can be observed via the opening in the body. A framing element is included proximate to the top wall of the base assembly including background images facing the reflective surface.

Abstract: A silicon single crystal film having a crystal plane as its principal plane, the crystal plane being inclined at 3 to 5° from any lattice plane belonging to {100} planes or {111} planes is used as a pellicle film. The silicon single crystal having such a crystal plane as its principal plane has effective bond density and Young's modulus thereof which are about 40% to about 50% higher than those of a silicon single crystal with <100> orientation, and therefore a cleavage and crack do not easily occur. Moreover, the silicon single crystal has a high chemical resistance such as hydrofluoric acid resistance, and hardly causes an etch pit and void. Accordingly, the present invention can provide a pellicle comprising a pellicle film for EUV having high transmission, and excellent mechanical and chemical stability, as well as having a high yield, and being practical also in cost.

Abstract: There is disclosed a pellicle 1 for photolithography comprising, a pellicle frame 2 for constituting a pellicle for photolithography, wherein the frame is made of an aluminum alloy whose surface is anodized, and each content of sulfate ion, nitrate ion, chlorine ion, and organic acid (total of oxalic acid, formic acid, and acetic acid) is 1.1 ppm or less in elution concentration after immersed in 100 ml of pure water at 25° C. for 168 hours, per 100 cm2 of a surface area of the frame, and a pellicle film 3 that is adhered to one end face of the frame. Thereby, there can be provided a pellicle that can effectively prevent haze from being generated on a mask substrate even in a photolithography process with a wavelength being shorter.

Abstract: A method for passivating short circuit defects in a thin film large area photovoltaic device in accordance with an exemplary embodiment is provided. The method employs a passivation agent and a counter electrode disposed in said passivation agent. The method includes controlling an application of current between the substrate of said photovoltaic device and said counter electrode so as to ensure high selectivity of modification of a transparent conductive oxide material of said photovoltaic module adjacent said short circuit defect, while leaving the transparent conductive oxide material of said photovoltaic module of non-defect areas in its unmodified form.

Abstract: A pellicle film of a silicon single crystal film and a base substrate supporting the pellicle film are formed of a single substrate using an SOI substrate. The base substrate is provided with an opening whose ratio in area to an exposure region when a pellicle is used on a photomask (an open area ratio) is 60% or more, and provided with a reinforcing frame in a non-exposure region of the base substrate. Since the pellicle film and the base substrate supporting the pellicle film are formed of the single substrate (an integrated structure), and the base substrate is provided with the reinforcing frame, the effect of increased strength is obtained. Moreover, a principal plane of a silicon single crystal film is a crystal plane inclined at 3 to 5° from any lattice plane belonging to {100} planes or {111} planes.

Abstract: A mat, and a method for making a mat, having a textured surface optionally colored and optionally laminated to a substrate. A mold containing relief characteristics is used to form a flat thermoformable layer into a thermoformed layer with the same relief characteristics as the mold. The mold is subsequently used to create a plurality of thermoforms, all of which, have the same relief characteristics, and may be colored or finished with or without patterns prior to forming the thermoformable layer or after forming the thermoformable layer. The process allows for the making of mats comprised of the same texture and unlimited variable colored finishes. The mats of the invention are useful for a variety of applications including, but not limited to, wall tile, floor tile, ceiling tile and mats used as a background or perimeter surround for image displays. Additionally, the invention provides for a decorative frame molding comprised of a rigid member covered with textured mats of the invention.

Abstract: A pellicle of the present invention is provided with a silicon crystal film, the absorption coefficient of which is 0.005/nm or lower with respect to light having a wavelength of 13.5 nm, as a pellicle film. The silicon crystal film is an indirect transition type semiconductor film and, therefore, the optical absorption coefficient thereof is relatively low. In particular, a single-crystal silicon film has a lower absorption coefficient than an amorphous silicon film and a polysilicon film. Thus, it is easy to obtain desired transmissivity required of a pellicle film for EUV from the single-crystal silicon film. Such a pellicle film as described above can be fabricated from an SOI film obtained by thin-filming an SOI substrate (including an SOQ substrate and an SOG substrate).

Abstract: An optical illusion device such as a drinking glass/cup for providing a multi-dimensional visual display. The device includes a body with tubular sidewalls extending from an opening at a first end to an opening at a second end. A base assembly is provided at the second end. The base assembly includes a top wall, a bottom wall, and a sidewall that together form or define an inner chamber. A visual display assembly is provided with a mirror element with a convex reflective surface or mirror positioned within the chamber with the reflective surface facing the top wall of the base assembly. A primary image element is provided proximate to the reflective surface such that the primary image and mirror element can be observed via the opening in the body. A framing element is included proximate to the top wall of the base assembly including background images facing the reflective surface.

Abstract: Diorama made from a two-dimensional image having a background panel in which a background section of the image appears and a plurality of additional panels on which additional sections of the image appear. The additional panels extend forwardly from the background panel, with edges of adjacent ones of the panels coming together and the image flowing continuously between the panels.

Abstract: A display apparatus is provided for displaying commemorative items such as medallions. The apparatus includes a framework (30) that forms part of an album and one or more capsules (10) for receiving the commemorative items (20). Each capsules (10) has a resiliently deformable rim (16) and is locatable within a smaller aperture (37) in an upper layer (36) of the framework (30) by deforming the rim (16) and passing the rim (16) through the aperture (37) so that the rim (16) seats in a slightly larger aperture (35) in an intermediate layer (34) to be retained between the upper and lower layers (36, 32) of the framework (30).

Abstract: Disclosed herein are an injection molded product and a manufacturing method thereof. In the injection molded product, an insert defining a predetermined pattern may be injection molded to be enclosed by a transparent preform, thus appearing to float slightly above the bottom of the preform.

Abstract: According to one exemplary embodiment, an extreme ultraviolet (EUV) pellicle for use with a lithographic mask comprises a carbon nanotube film. The carbon nanotube EUV pellicle can be mounted on the lithographic mask. The carbon nanotube EUV pellicle protects the lithographic mask from contamination by undesirable particles and also prevents the undesirable particles from forming a focused image on the surface of a semiconductor wafer during fabrication; while advantageously, the carbon nanotube pellicle has a high level of EUV light transmittance.

Abstract: A modular display system including a plurality of display tiles insertable into slideways in a display tile holder. Each display tile includes a display panel, a slide panel, and a spacer extending therebetween. The display tile holder includes a base panel and a plurality of first slideways and a plurality of second slideways orthogonal to the first. The display tile holder includes a plurality of retainers each supported in spaced relation from the base panel and arranged in an array to define the slideways. Multiple display tile holders are joined together with a connector that engages connector sockets disposed on the base panel. Preferably, the display tile holders are connected together such that at least one slideway from each of the display tile holders is aligned with another slideway. The modular display system may include mounts attachable to a vertical surface and operative to support the display tile holders.

Abstract: According to one exemplary embodiment, an extreme ultraviolet (EUV) pellicle for protecting a lithographic mask includes an aerogel film. The pellicle further includes a frame for mounting the aerogel film over the lithographic mask. The aerogel film causes the pellicle to have increased EUV light transmittance.

Abstract: A jewelry article having one or more interchangeable inserts removably attached thereto. In an aspect, the article comprises an assembly having an opening and one or more recessed portions, wherein one or more interchangeable inserts are removably attached therein. The one or more inserts comprise a top portion having a recessed housing to house one or more decorative ornaments, and a base portion having one or more cavities wherein one or more magnets are adhesively affixed therein.

Abstract: Embodiments of a pellicle, methods of fabrication and methods of use in extreme ultraviolet (EUV) photolithography are disclosed. The pellicle may include a wire mesh with a square or hexagonal geometric configuration. A thin film of a material with a high Young's modulus may be coated on at least one surface of the wire mesh. A method of fabrication may include forming at least one sacrificial layer on a surface of the wire mesh, forming a thin film on another surface of the wire mesh, and removing the sacrificial layer to form a pellicle. A method of use may include positioning a pellicle relative to a photomask to protect the photomask from particulate accumulation during an EUV photolithography process.

Abstract: A plaque having the ability to hold a three dimensional item for display, and in particular to a plaque with one or more display features for holding the item and permitting display of more than one surfaces of such a three dimensional item. In another aspect, plaque designs related to a specific type of event are combined with items of the same event.

Abstract: A self standing achievement medal that can be worn about the neck of the user in a conventional manner, or alternatively, when not being worn, can be conveniently and attractively displayed on a flat surface, such as found on a desk or bookshelf. The achievement medal includes a plate-like display surface upon which various decorations and indicia can be conveniently imprinted or engraved and a pivotally mounted, generally U-shaped support that can be conveniently moved from a stowed configuration to an extended configuration wherein the medal can be supported on a flat surface in a manner such that the indicia provided on the display surface of the medal is readily visible.

Abstract: A reticle and a method of producing the same are disclosed. The reticle includes a medium layer formed on a transparent substrate, chrome layer patterns spaced apart from each other at predetermined intervals on the medium layer, and a frame and a pellicle formed to enclose the resulting structure. The method of manufacturing a reticle includes the steps of forming a medium layer on a transparent substrate, forming chrome layers on the medium layer, patterning the chrome layers so that the chrome layers are spaced apart from each other at predetermined intervals, and attaching a frame and a pellicle to surround the result. The resolution and focus of light output from the reticle is improved.

Abstract: A sculpture device may comprise a base, at least one figure, a cover and a control element. The base may have upper and lower surfaces. The figure may be movable along the upper surface. The cover may be coupled to the base and may have a lens mounted therein to which an operator may view the figure. The control element may include a magnetic mechanism for magnetically attracting the figure such that movement of the control element along the lower surface causes corresponding movement of the figure along the upper surface.

Abstract: A display assembly with a plurality of rolled paper products having: a plurality of folded implements convolutely wound about a core or a void area, capable of being dispensed from the rolled paper product, comprising a fibrous structure having a first flap with a first edge; a second flap with a second edge; and a body, between the first flap and the second flap, the body having a first surface and a second surface; wherein the first flap and the second flap are folded against and overlap either the first surface or the second surface of the body.

Abstract: The present invention is a system and related device for an easy and simple hooking of graphic representations, for example paintings and prints. The representations are made on a support of thin and soft material, for example cloth or leather goods, which can be applied, in an interchangeable way, on any kind of clothes, fittings for clothes, furnishings and interior decorations.

Abstract: A photo mount system is formed from a pressure sensitive adhesive laminate, in which a center carrier sheet has a low tack low residue pressure sensitive adhesive on both sides thereof. A face sheet is decorative on one surface thereof and has a release liner on the other, and is further characterized by a removable portion that allows for exposure of a part of the pressure sensitive adhesive. The removable portion and exposure of the pressure sensitive adhesive accommodates the placement of a photograph or other memorabilia thereon. A backing sheet is removably received by the adhesive attached to the opposite side of the carrier sheet, and is removable to expose the adhesive for attachment to an appliance, wall, furniture of the like.

Abstract: The present invention describes a structure and method for reducing or eliminating the flatness distortion effects of a photomask assembly which occurs when a pellicle is mounted to the photomask. The invention is to perform a partial disconnection of the mounting area of the pellicle frame from the print area of the mask. An exemplary embodiment of the present invention achieves the distortion reduction or elimination using a trench in the photomask as the partial disconnection.

Abstract: A snow globe comprises a holder and a photo frame. The holder comprises a globe, a stand and a base. The globe is transparent and comprises a slot, a frame mount and decoration comprising particles. The frame mount is mounted in the globe and the slot is formed through an outer surface of the globe. The photo frame is mounted slidably in the globe, on the frame mount and has a openable backing and a window. Therefore, the snow globe provides visual entertainment while being personalized to increase sentiments of gifts or souvenirs.

Abstract: There is provided a pellicle for lithography which has at least, a pellicle film for dustproof protection, a pellicle frame to which the pellicle film is adhered, an adhesive layer provided on one end face of the pellicle frame in order to adhere the pellicle film, and a sticking layer formed on another end face of the pellicle frame, wherein the pellicle film is formed by a die coating machine and a method for producing it. There can be provided a relatively large-sized pellicle for lithography which has a pellicle film with little unevenness of film thickness and with a uniform and high light transmission can be produced easily and at low cost, compared with those using the conventional spin coater.

Abstract: A wallpaper border display apparatus having a wallpaper border, a blank region on the wallpaper border which is separately identifiable and distinguishable from the wallpaper border, and a receptacle attached to the blank region, the receptacle configured to receive therein an item and having a surface through which said item can be viewed.

Abstract: The present invention relates to a fabric having a three-layered structure: a fiber substrate, a parylene layer, and an antibacterial layer. The fiber substrate is the fiber part of the fabric; the parylene layer is capable of providing a moistureproof and dustproof effect as well as preventing the fiber substrate from being catalyzed by photocatalyst and decomposed thereby; the antibacterial layer, which comprises nano-photocatalyst and/or nano-silver particles, is used to kill pathogenic germs.

Abstract: Amorphous perfluorinated homopolymers and copolymers of perfluorodioxoles of formula (IA): wherein R?F is equal to RF or ORF wherein RF is a linear or branched perfluoroalkyl radical having 1-5 carbon atoms; X1 and X2, equal to or different from each other, are F, CF3; said polymers having a dioxole content?95% by moles, having the following property combination: Tg, measured according to the ASTM 3418 (DSC) method, from 180° C. to 195° C.; intrinsic viscosity, measured at the temperature of 30° C. in perfluoroheptane (Galden® D80) according to the ASTM D 2857-87 method, from 13 cc/g to 100 cc/g.

Abstract: A pushpin bulletin board with a decorative surface to look like a framed artwork. The pushpin bulletin board includes a panel of fiberboard having an upper surface and an embossed vinyl canvas sheet adhered to the upper surface of the fiberboard panel. A painting is applied to the embossed vinyl canvas sheet by a solvent inkjet printer to provide a painting having texture and a 3-dimensional appearance for forming a decorative surface. The pushpin bulletin board also includes a frame surrounding the painting to provide the appearance of a framed piece of artwork, such as a three-dimensional oil painting.

Abstract: The invention provides a method and apparatus for spacing artwork from a transparent covering in a picture frame that addresses production problems encountered by large chain stores and high volume framers that use current spacer designs. The spacer herein disclosed is generally rectangular in shape with a protrusion extending from one side.

Abstract: A fused silica pellicle for use on photomasks having increased durability and improved transmission uniformity and birefringence properties. The pellicle is to be intimately secured to the patterned surface of a photomask.

Abstract: A method for removing impurities (e.g., atomic sulfur) from a reticle for use in photolithography is provided. In one embodiment, a reticle (or photomask) comprising a plate, a first layer over the plate, and a photoresist layer over the first layer is provided. The photoresist layer is removed with a first chemistry comprising a sulfur-containing compound. At least a portion of the first layer is removed with a second chemistry comprising a sulfur-containing etchant, thereby exposing portions of the plate. Removing the photoresist layer and/or at least a portion of the first layer leaves sulfur on at least portions of the reticle. In a cleaning step, the reticle is contacted with one or more excited species of oxygen to remove residual sulfur and other contaminants, such as carbon, sulfur and oxygen-containing species. Methods of embodiments can be used to clean, e.g., binary photomasks, attenuated phase shift masks (APSMs) and high transmission attenuated photomasks.

Abstract: A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.

Abstract: This invention provides a fluorine-containing copolymer having a repeat unit derived from at least one fluorinated olefin and a repeat unit derived from at least one polycyclic ethylenically unsaturated monomer having pendant hydroxyl or esterified hydroxyl groups, and optionally other repeat units, typically derived from an acrylate. These polymers have high transparency at short wavelengths such as 193 nm and 157 nm, and provide good plasma etch resistance and adhesive properties. Also provided are photoresist compositions and substrates coated therewith.

Abstract: Embodiments provide a system and a method to control the gas ambient in a reticle frame system. The reticle frame system can include a first cross structure including a pellicle, a second cross structure substantially parallel to the first cross structure, a first side structure, and a second side structure. The second cross structure can include a reticle. An inlet frame can be coupled in one of the first and second side structures. At least one inlet passage can be configured through the inlet frame. An outlet frame can be coupled in the other of the first and second side structures. At least one outlet passage can be configured through the outlet frame. A frame filter can be positioned to cover one end of the outlet passage.

Abstract: A pellicle made of a polymer material contains fullerenes within the polymer material to reduce the damaging effects of radiation that is transmitted through the pellicle during an exposure operation. The fullerenes may comprise nanotubes and/or buckyballs. The buckyballs may also enclose molecules of a gas that further reduce the damaging effects of the radiation on the polymer material.

Abstract: A pellicle made of a polymer material contains fullerenes within the polymer material to reduce the damaging effects of radiation that is transmitted through the pellicle during an exposure operation. The fullerenes may comprise nanotubes and/or buckyballs. The buckyballs may also enclose molecules of a gas that further reduce the damaging effects of the radiation on the polymer material.

Abstract: A pellicle comprises a pellicle film and a pellicle frame for supporting the pellicle film, wherein the pellicle film is adhered to the pellicle frame through an adhesive layer comprising a fluorine-containing polymer and a substance resulting from curing of an ultraviolet-curing fluorine-containing monomer. A producing method of a pellicle including a pellicle film and a pellicle frame for supporting the pellicle film, comprises a step of adhering the pellicle film to the pellicle frame through an adhesive comprising a fluorine-containing polymer and an ultraviolet-curing fluorine-containing monomer.

Abstract: The invention provides a pellicle for lithography used in the photolithography, affording a wider range of transmissivity to inclinedly incident beams that can be used in a photolithographic procedure. The pellicle used in the photolithography using ArF excimer laser beams is characterized in that the pellicle has a pellicle membrane having a thickness which is 400 nm or smaller and at which the membrane exhibits a local maximum transmissivity to a vertically incident ArF excimer laser beam. Also, the pellicle is characterized by having a pellicle membrane having a thickness at which the membrane exhibits a local maximum transmissivity to an inclinedly incident ArF excimer laser beam. Herein, the angle of inclined incidence is preferably 13.4 degrees, and the pellicle membrane has preferably a thickness of 600 nm or smaller, in particular in a range selected from 560 to 563 nm and 489 to 494 nm and 418 to 425 nm and 346 to 355 nm and 275 to 286 nm and 204 to 217 nm.

Abstract: A pellicle membrane is mounted between an outer frame and an inner frame. At least one of the frames is attached to the reticle without using conventional adhesives. The pellicle and reticle may be used in a lithography system. The pellicle allows radiation to pass through the pellicle to the reticle and may prevent particles from passing through the pellicle.

Abstract: An insert film having a printed part is integrally molded to a surface of a panel body made of a resin by an insert molding. The printed part is printed on a first binder layer applied to a resin film and also is formed on the resin film in a state such of being sealed with the first binder layer and a second binder layer applied on the printed part. The printed part is formed as a trimming portion (blackout) along a peripheral portion of the resin film, and an area is formed between the peripheries of the first binder layer and the second binder layer and the periphery of the resin film.

Abstract: Exposure systems may use pellicles made of perfluoropoly-ether. These materials may exhibit reduced darkening upon repeated exposures compared to other materials.

Abstract: The present invention describes a method of providing a substrate, the substrate being transparent to radiation at an actinic wavelength; forming an absorber layer over the substrate, the absorber layer including an active area and a peripheral area; removing the absorber layer from a portion of the peripheral area; and forming a trench in the substrate in the portion of the peripheral area. The present invention further describes a mask including an active area; and a peripheral area located around the active area, the peripheral area including vent channels.

Abstract: Amorphous perfluorinated homopolymers and copolymers of perfluorodioxoles of formula (IA): wherein R?F is equal to RF or ORF wherein RF is a linear or branched perfluoroalkyl radical having 1–5 carbon atoms; X1 and X2, equal to or different from each other, are F, CF3; said polymers having a dioxole content ?95% by moles, having the following property combination: Tg, measured according to the ASTM 3418 (DSC) method, from 180° C. to 195° C.; intrinsic viscosity, measured at the temperature of 30° C. in perfluoroheptane (Galden® D80) according to the ASTM D2857-87 method, from 13 cc/g to 100 cc/g.

Abstract: A static resistant reticle comprises a substrate and a patterning layer and is covered by an antistatic conductive film of quaternary amine (R4N)+Cl?. A pellicle structure comprising an optically transparent membrane tightly stretched on a frame is also coated by an antistatic electro conductive film of a similar material. The reticle with the pellicle form a shielded structure isolating the reticle from ESD.

Abstract: A display package for displaying merchandise includes a base, at least one merchandise receptacle located in the base and a cover. Merchandise to be packaged or displayed is inserted into the receptacle in the base. The cover is slipped over the base to enclose an interior which holds the merchandise. Information medium is also placed within the interior of the package and is held in place by a holder in the base. The information medium may extend to the upper portion of the cover farthest from the base, in which case, the cover may include anti-tipping measures which support the upper edge of the information medium in at least one direction to prevent tipping of the medium.

Abstract: A mechanism and a method for framing a low-distortion flexible dielectric substrate during subsequent flex circuit processing. The processing method comprising the following steps: making a flexible dielectric substrate having an outer periphery; joining a continuous portion of the flexible dielectric substrate near the outer periphery to a rigid open frame, the flexible dielectric substrate being in a state other than a state of substantially uniform tension as a result of the joinder; causing the joined flexible dielectric substrate to undergo a change to the state of substantially uniform tension; and printing an electrical conductor on the flexible dielectric substrate while the flexible dielectric substrate is joined to the frame and in the state of substantially uniform tension. The frame is in the shape of a polygon (e.g., a rectangle) with rounded vertices.

Abstract: The present invention relates to an article for association with a motor vehicle. The article may include a base, and a plurality of inserts received in the base. Each insert has at least two characteristics. The at least two characteristics of each insert causes the plurality of inserts to form a substantially unique article profile.

Abstract: The present invention is directed to a reticle barrier system that prevents contaminants from landing on a mask within lithographic systems using extreme ultra violet light. In particular, a reticle barrier system is provided that consists of a mask barrier and a set of contact barriers. The mask barrier surrounds a mask formed on a reticle, while the contact barriers are affixed between the mask and contact spots on a reticle. The barriers have a height relative to the mask, and different geometries are provided. Collectively, the mask and contact barriers reduce the number of contaminants landing on a mask surface without the use of a pellicle. In an alternate embodiment, the reticle barrier system includes only a mask barrier. Similarly, in another alternate embodiment, the reticle barrier system includes only contact barriers.