Abstract: A silicon carbide material according to the present invention includes a substrate containing, as a main component, silicon carbide or containing, as main components, silicon carbide and metallic silicon, and a film covering at least a portion of the surface of the substrate. The film contains, as a main component, a phase including at least four elements: lithium (Li), aluminum (Al), silicon (Si), and oxygen (O). One example of such a silicon carbide material includes a substrate having a structure in which silicon carbide particles are bonded by metallic silicon, and a lithium aluminosilicate film covering at least a portion of the surface of the silicon carbide particles. Such a silicon carbide material can be used for a DPF, an electric heating type catalytic converter, or the like.

Abstract: A process in which a wound roll of biaxially oriented polyester film having a glass transition temperature (Tg (° C.)) is annealed at a temperature Ta (° C.) above Tg where Tg<Ta?Tg+100 (° C.) for a time t after thermal equilibrium where 1 hour?t?72 hours and cooled, for the purpose of improving the shrinkage of said polyester film.

Abstract: A method of making an article of a semiconducting material involves selecting a target thickness for the article and then submerging a mold into a molten semiconducting material for a submersion time effective to form a solid layer of semiconducting material over an external surface of the mold where the thickness of the solid layer is substantially equal to the target thickness. The submersion time is selected to be substantially equal to a transition time, which is determined from a plot of solid layer thickness versus submersion time for a mold having particular attributes, including mold composition, mold thickness and initial mold temperature. The transition time, and thus the submersion time, corresponds to a maximum in solid layer thickness in the solid layer thickness versus submersion time curve for the particular mold.

Abstract: Disclosed is a method for manufacturing a flame resistant and transparent film having a high transparency after imparting flame resistance through flame resistance treatment. The method for manufacturing the flame resistant and transparent film according to the present invention comprises the steps of: (a) preparing a transparent base film; (b) forming a flame resistant coating layer by coating a flame resistant material comprising a polysilazane onto at least one surface of the base film; (c) drying the flame-resistant coating layer so as to remove residual solvents in the flame-resistant coating layer; and (d) curing the flame-resistant coating layer under a humid environment. The present invention is characterized by the flame-resistant coating layer and a laminated body of the base film having an optical property in which a measured haze value is less than 0.3.

Abstract: A building panel structure is disclosed, in which building panels are used to form a structure. The building panel includes a core and a coating covering a portion of the core. In some embodiments the core consists of a frame and at least one insulating structural block. The insulating structural blocks can be encapsulated polystyrene (EPS) foam blocks. In some embodiments the coating includes ceramic material. In some embodiments the coating includes a scratch layer and a main brown layer. In some embodiments the scratch layer and the main brown layer are interdigitated to increase the strength and durability of the coating and the building panel. In some embodiments the building panel includes a construction board formed separate from the core. The construction board is formed of coating mixtures and applied to the core after the coating mixtures have cured.

Abstract: A composite panel useful for efficient and economic construction of a building wall or roof includes at least a first rigid structural layer and a cross-linked polymer film layer bonded to and covering a first major planar surface of the rigid structural panel. The panels integrate sheathing or decking and weatherproofing into an integrated product that may be installed on building frame members in substantially the same way that ordinary sheathing or decking is conventionally installed.

Abstract: A gas-barrier film comprising at least one silicon hydronitride layer and at least one silicon nitride layer on a surface of a flexible supporting substrate. The film has an excellent gas-barrier property.

Abstract: In one embodiment of the present invention, a monocrystal SiC epitaxial substrate is produced which includes a monocrystal SiC substrate; a buffer layer made of a first SiC epitaxial film formed on the monocrystal SiC substrate; and an active layer made of a second SiC epitaxial film formed on the buffer layer. The buffer layer is grown by heat-treating a set of the monocrystal SiC substrate, a carbon source plate, and a metal Si melt layer having a predetermined thickness and interposed between the monocrystal SiC substrate and the metal Si melt layer, so as to epitaxially grow monocrystal SiC on the monocrystal SiC substrate. The active layer is grown by epitaxially growing monocrystal SiC on the buffer layer by vapor phase growth method. This allows for production of a monocrystal SiC epitaxial substrate including a high-quality monocrystal SiC active layer being low in defects.

Abstract: A high-quality resistor pattern and conductor pattern is formed on an external surface of a multilayer ceramic substrate by an ink jet method. A composite sheet including a first ceramic green layer and a shrinkage-retardant layer is formed, and a resistor pattern and a conductor pattern are formed on the first ceramic green layer of the composite sheet by an ink jet method. Subsequently, a plurality of second ceramic green layers are stacked with the composite sheet such that the shrinkage-retardant layer of the composite sheet defines an outermost layer, thus forming a multilayer composite including an unfired multilayer ceramic substrate and the shrinkage-retardant layer. Then, the multilayer composite is fired, and the shrinkage-retardant layer is removed to obtain a sintered multilayer ceramic substrate.

Abstract: Disclosed is a mica paper composite and a process for making the mica paper composite. Articles comprising the mica paper composite are also disclosed.

Abstract: An SiC crystal has Fe concentration not higher than 0.1 ppm and Al concentration not higher than 100 ppm. A method of manufacturing an SiC crystal includes the following steps. SiC powders for polishing are prepared as a first source material. A first SiC crystal is grown by sublimating the first source material through heating and precipitating an SiC crystal. A second source material is formed by crushing the first SiC crystal. A second SiC crystal is grown by sublimating the second source material through heating and precipitating an SiC crystal. Thus, an SiC crystal and a method of manufacturing an SiC crystal capable of achieving suppressed lowering in quality can be obtained.

Abstract: The present invention is directed to a multilayer film having, as its main component, a hydroxy acid polymer with improved gas barrier and optional heat sealability. The oriented film of predominately hydroxy acid polymer having controlled shrink can be produced by melting and coextruding a hydroxy acid polymer with a much thinner layer of an amorphous aromatic copolyester to form a multilayer film that is quench cooled, then biaxially stretched at a process temperature above the glass transition and below the cold crystallization temperature of the hydroxy acid polymer. A heat-setting treatment with a controlled relaxation of the film above the hydroxy acid polymer glass transition temperature and below its melt temperature may be used to control shrinkage. The films thus obtained are vacuum metallized on the aromatic copolyester surface to produce environmentally friendly packaging from predominately renewable resources having improved gas barrier properties.

Abstract: A fire and heat resistant composition for providing or enhancing the fire resistance of a material. The composition consists of both chemical and physical integration. Physical application is a coating composition containing materials including a fire and heat resistance means, lower peak heat release means, lower heat released per unit time means, higher temperature gradient means, low flame spread means, high ignition delay means, low peak heat release means, low total heat release means, high thermal stability means, elastic and coating thickness encasement means and heat. Chemical applications consist of chemical additive which are naturally more fire safe.

Abstract: Disclosed is a wallcovering assembly consisting of a base material and at least one ceramic coating/topcoat with or without an optional ceramic interlayer.

Abstract: Disclosed is a gas-barrier film laminate having at least two gas-barrier film layers laminated via an adhesive layer, wherein the gas-barrier film layer has a substrate film, and at least one constitutive unit layer comprising an anchor coat layer and an inorganic thin film layer formed on at least one surface of the substrate film in that order, and wherein the number of the bubbles having a diameter of at least 0.5 mm and the impurities having a diameter of at least 0.5 mm existing between the gas-barrier film layers is at most 3 in total per 100 cm2.

Abstract: A surface treatment method for diamond-like carbon layer include at least the following steps: a substrate is provided; a diamond-like carbon layer is formed on the substrate by ion beam assisted magnetron sputtering deposition; fluorine ions and silicone ions is doped in the diamond-like carbon layer at a temperature of about 400° C. to about 600° C. A coated article manufactured by the method is also provided.

Abstract: Electric sintering of precursor materials to prepare phosphor ceramics is described herein. The phosphor ceramics prepared by electric sintering may be incorporated into devices such as light-emitting devices, lasers, or used for other purposes.

Abstract: There is described a method for producing a fuser member. The method includes obtaining a substrate and positioning a fluoroplastic sleeve around the substrate. The outer surface of the fluoroplastic sleeve is roughened to a surface roughness of between about 0.03 ?m Ra and about 3 ?m Ra. The outer surface is coated with a functional silicone oil.

Abstract: The present invention relates to controlled radical polymerization (CRP) initiators that include at least one radically transferable group. The CRP initiators include at least one of the following, (a) a spirooxazine compound represented by the following Formula (I), and (b) an indenonaphthopyran represented by the following Formula (II), One or more of R1, R2, R3, R4, R5, and R6 of the spirooxazine, and one or more of R7, R8, R9, R10, B, and B? independently include the radically transferable group. The present invention also relates to polymers, such as mechanochromic polymers, that are prepared from such CRP initiators, polymer compositions that include such polymers, and mechanochromic articles that include such polymer compositions.

Abstract: Building materials and methods of making a building material are disclosed. An exemplary method includes receiving algae; and subjecting the algae to an oil extraction process, in order to produce vegetable oil. The method further includes producing synthetic fibers by processing the vegetable oil from the oil extraction process; and processing the synthetic fibers to produce a tension and pressure resistant material.

Abstract: The present invention provides a method of preparing aluminum-doped zinc oxide (AZO) nanocrystals. In an exemplary embodiment, the method includes (1) injecting a precursor mixture of a zinc precursor, an aluminum precursor, an amine, and a fatty acid in a solution of a vicinal diol in a non-coordinating solvent, thereby resulting in a reaction mixture, (2) precipitating the nanocrystals from the reaction mixture, thereby resulting in a final precipitate, and (3) dissolving the final precipitate in an apolar solvent. The present invention also provides a dispersion. In an exemplary embodiment, the dispersion includes (1) nanocrystals that are well separated from each other, where the nanocrystals are coated with surfactants and (2) an apolar solvent where the nanocrystals are suspended in the apolar solvent. The present invention also provides a film. In an exemplary embodiment, the film includes (1) a substrate and (2) nanocrystals that are evenly distributed on the substrate.

Abstract: The present invention relates to compositions which comprise an olefinic component and a compound reactive or curable with the olefinic component, and which are suitable for production of release layers

Abstract: An internal member of a plasma processing vessel includes a base material and a film formed by thermal spraying of ceramic on a surface of the base material. The film is formed of ceramic which includes at least one kind of element selected from the group consisting of B, Mg, Al, Si, Ca, Cr, Y, Zr, Ta, Ce and Nd. In addition, at least a portion of the film is sealed by a resin.

Abstract: A uniform nanocrystalline diamond thin film with minimized voids is formed on a silicon oxide-coated substrate and a method for fabricating same are disclosed. The nanocrystalline diamond thin film is formed by performing hydrogen plasma treatment, hydrocarbon plasma treatment or hydrocarbon thermal treatment on the substrate surface to maximize electrostatic attraction between the substrate surface and nanodiamond particles during the following ultrasonic seeding such that the nanodiamond particles are uniformly distributed and bound on the silicon oxide on the substrate.

Abstract: A method of applying a barrier coating to a component is provided. The method includes providing the component and preparing a slurry comprising a mixture. The mixture includes about 50-90 percent by volume fraction of a barrier coating composition, the barrier coating composition and 10-50 percent by volume fraction of a plurality of short fibers. The method includes applying at least one layer of the slurry to at least a portion of the component and curing the slurry on the portion of the component to obtain a fiber-reinforced barrier coating.

Abstract: According to various aspects, exemplary embodiments are provided of thermal interface material assemblies. In one exemplary embodiment, a thermal interface material assembly generally includes a thermal interface material having a first side and a second side and a metallization layer having a layer thickness of about 0.0005 inches or less. The metallization layer is disposed along at least a portion of the first side of the thermal interface material.

Abstract: The present invention provides a low-modulus low-stress resin which has such heat resistance that cohesive force and reliability can be retained even at high temperatures and which is applicable as various functional materials. The resin is a thermoplastic resin having a modulus of elasticity at room temperature, 25° C., of 1 GPa or lower and a modulus of elasticity at 250° C. of 1 MPa or higher, or a precursor resin thereof.

Abstract: The present invention provides a gas barrier film including a base layer, and a gas barrier layer that is provided on at least one side of the base layer, the base layer including a resin having a glass transition temperature (Tg) of more than 130° C., the gas barrier layer being formed of a material that includes at least an oxygen atom and a silicon atom, a surface layer part of the gas barrier layer having an oxygen atom content rate of 60 to 75%, a nitrogen atom content rate of 0 to 10%, and a silicon atom content rate of 25 to 35%, based on a total content rate of oxygen atoms, nitrogen atoms, and silicon atoms, and the surface layer part of the gas barrier layer having a film density of 2.4 to 4.0 g/cm3. Also provided are a process for producing the same, an electronic device member that includes the gas barrier film, and an electronic device that includes the electronic device member.

Abstract: There is provided a gas barrier film which has high barrier performance and is excellent in bending resistance and smoothness as well as cutting processing suitability; a method for producing the gas barrier film; and an electronic device in which the gas barrier film is used. A gas barrier film, comprising a gas barrier layer unit on at least one surface side of a base, wherein the gas barrier layer unit comprises a first barrier layer formed by a chemical vapor deposition method, a second barrier layer obtained by performing conversion treatment to a coating film formed by coating a silicon compound onto the first barrier layer and an intermediate layer between the first barrier layer and the base.

Abstract: Certain example embodiments of this invention relate to articles including anticondensation coatings that are exposed to an external environment, and/or methods of making the same. In certain example embodiments, the anticondensation coatings may be survivable in an outside environment. The coatings also may have a sufficiently low sheet resistance and hemispherical emissivity such that the glass surface is more likely to retain heat from the interior area, thereby reducing (and sometimes completely eliminating) the presence condensation thereon. The articles of certain example embodiments may be, for example, skylights, vehicle windows or windshields, IG units, VIG units, refrigerator/freezer doors, and/or the like.

Abstract: [Object] To provide a bismuth-substituted rare-earth iron garnet crystal film (RIG) which has an insertion loss of less than 0.60 dB and which can be produced in a high yield, as well as an optical isolator. [Solving means] Provided is a bismuth-substituted rare-earth iron garnet crystal film which is grown by liquid phase epitaxy on a non-magnetic garnet substrate represented by a chemical formula of Gd3(ScGa)5O12, wherein the bismuth-substituted rare-earth iron garnet crystal film is represented by a chemical formula of La3-x-yGdxBiyFe5O12 (provided that 0<x<3 and 0<y<3), and a composition ratio between the La, Gd, and Bi falls within a numeric value range corresponding to the inside of a quadrilateral having composition points A, B, C, and D as vertices in a La—Gd—Bi ternary composition diagram: composition point A (La: 0.15, Gd: 1.66, Bi: 1.19), composition point B (La: 0.32, Gd: 1.88, Bi: 0.80), composition point C (La: 0.52, Gd: 1.68, Bi: 0.80), and composition point D (La: 0.35, Gd: 1.

Abstract: A method of manufacturing a cut-out sintered ceramic sheet including forming a ceramic green sheet, sintering the formed ceramic green sheet, adhering a plastic resin film onto which adhesive is applied on at least one surface of the sintered ceramic sheet, and shearing the sintered ceramic sheet.

Abstract: An article may include a superalloy substrate and a calcia-magnesia-alumina-silicate (CMAS)-resistant thermal barrier coating (TBC) layer overlying the superalloy substrate. In some embodiments, the CMAS-resistant TBC layer includes between about 50 wt. % and about 90 wt. % of a TBC composition and between about 10 wt. % and about 50 wt. % of a CMAS-resistant composition. In some examples, the TBC composition includes at least one of yttria-stabilized zirconia, yttria-stabilized hafnia, zirconia stabilized with at least three rare earth oxides, or hafnia stabilized with at least three rare earth oxides. In some examples, the CMAS-resistant composition includes alumina, silica, and an oxide of at least one of Sc, Y, La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Yb, Dy, Ho, Er, Tm, Tb, or Lu.

Abstract: A method for manufacturing a display substrate includes forming a plastic base substrate. A blocking layer is formed on a surface of the plastic base substrate by depositing a first material and a second material that are distinct. A substrate includes a plastic base substrate and a blocking layer formed at surfaces of the plastic base substrate and having a first layer and a second layer alternatingly. The first layer and second layer include continuously changing component ratio of a first material to a second material. The blocking layer effectively blocks moisture and/or oxygen.

Abstract: Casting preforms are provided comprising a casting preform assembly; and a plurality of geometrically shaped bodies, wherein the plurality of geometrically shaped bodies are arranged or interconnected to form the casting preform assembly. Also provided is a method of using a casting preform, comprising forming a casting preform assembly, wherein the casting preform assembly comprises a plurality of geometrically shaped bodies; anchoring the casting preform to an outer surface of a casting mold; introducing a fluid casting material into the casting mold; applying centrifugal force to the casting mold; forming a molded article, wherein at least a portion of the surface of the molded article is reinforced with the plurality of geometrically shaped bodies.

Abstract: A laminate including a supporting member which is light transmissive; a supported substrate supported by the supporting member; an adhesive layer provided on a surface of the supported substrate which surface faces toward the supporting member; and a release layer which is made of an inorganic material and is provided between the supporting member and the supported substrate, the release layer having a property that changes when the release layer absorbs light coming through the supporting layer, and the release layer having a flat surface which faces the adhesive layer.

Abstract: The present invention provides a method of processing cementitious products to substantially reduce or eliminate efflorescence. The method includes applying a protective layer to at least one surface of a slab product at the time of pouring cementitious mix into a mould and retaining the protective layer in place. The protective layer is a relatively thin sheet of plastic material.

Abstract: The invention relates to a cutting tool comprising a main part and a multilayer coating applied thereon. A first layer A made of a hard material is applied on the main part, said hard material being selected from titanium aluminum nitride (TiAlN), titanium aluminum silicon nitride (TiAlSiN), chromium nitride (CrN), aluminum chromium nitride (AlCrN), aluminum chromium silicon nitride (AlCrSiN), and zirconium nitride (ZrN), and a second layer B made of silicon nitride (Si3N4) is applied directly over the first layer A.

Abstract: A hybrid silicon wafer which is a silicon wafer having a structure wherein the main plane orientation of polycrystalline silicon that is prepared by a unidirectional solidification/melting method is (311), and monocrystalline silicon is embedded in the polycrystalline silicon. The hybrid silicon wafer according to any one of claims 1 to 6, wherein the purity of the polycrystalline silicon portion excluding gas components is 6N or higher, the total amount of metal impurities is 1 wtppm or less, and, among the metal impurities, Cu, Fe, Ni, and Al are respectively 0.1 wtppm or less. Thus, a hybrid silicon wafer having the functions of both a polycrystalline silicon wafer and a monocrystalline silicon wafer is provided and the occurrence of polish bumps and macro-sized unevenness between the polycrystalline silicon and the monocrystalline silicon are prevented.

Abstract: A workpiece, such as a turbine engine component, comprises a substrate, a thermal barrier coating on the substrate, and a hard erosion barrier deposited over the thermal barrier coating. The erosion barrier preferably has a Vickers hardness in the range of from 1300 to 2750 kg/mm2. The erosion barrier may be formed from aluminum oxide, silicon carbide, silicon nitride, or molybdenum disilicide. The erosion barrier may be formed using either an electrophoretic deposition process or a slurry process.

Abstract: A method produces a biocidal coating on a substrate, by a flame assisted chemical vapour deposition and a plasma assisted chemical vapour deposition step. In a first step, a biocidal material is deposited onto the substrate, possibly in combination with a first coating forming material. The second step provides a coating forming material onto the first layer, possibly in combination with a second biocidal material. The first step can be a flame assisted CVD step and the second step a plasma assisted CVD step or vice versa.

Abstract: The present invention describes a method for the preparation of graphene or graphenic material films by the carbonization of biopolymers. The method comprises the following stages: preparation of an aqueous solution of a non-crystallizable water-soluble biopolymer or a derivative of said biopolymer at the suitable pH, coating of the substrate with the aqueous solution of the biopolymer prepared in the previous stage by immersion of the substrate in said solution or by using the spin coating technique, conditioning of the aqueous solution of the biopolymer by means of a hydrothermal process consisting of subjecting the coated surface to a flow of nitrogen saturated with water vapor at the temperature of between 100 and 250° C. for a time between 30 minutes and several hours, thermal decomposition of the biopolymer deposited on the substrate in the absence of oxygen at temperatures below 1200° C.

Abstract: Provided is a film including: (a) an intermediate layer comprising a polymer and an antistatic agent, said intermediate layer having a first side and a second side; (b) a first layer including a polymer, said first layer being on the first side and is printed or printable; and (c) a second layer including a polymer and a non-migratory slip agent, said second layer being on the second side, wherein the film has at least one of (i) a thickness of at least about 30 ?m, (ii) a static coefficient of friction of about 0.15 to less than 0.30, and (iii) a kinetic coefficient of friction of about 0.15 to less than 0.30. Also provided are a method for producing such a film, and labels such as cut and stack labels comprising the film.

Abstract: Disclosed is a back sheet for a solar cell module for photovoltaic power generation, including a first resin layer attached to EVA under a solar cell, a heat conductive layer formed on the lower surface of the first resin layer, a lower layer formed on the lower surface of the heat conductive layer, and an adhesive layer formed between the first resin layer and the heat conductive layer, wherein the lower layer is a heat conductive coating layer using an inorganic coating or organic-inorganic hybrid coating, or a second resin layer.

Abstract: Embodiments relate to use of a particle accelerator beam to form thin layers of material from a bulk substrate. In particular embodiments, a bulk substrate (e.g. donor substrate) having a top surface is exposed to a beam of accelerated particles. In certain embodiments, this bulk substrate may comprise a core of crystalline sapphire (Al2O3) material. Then, a thin layer of the material is separated from the bulk substrate by performing a controlled cleaving process along a cleave region formed by particles implanted from the beam. Embodiments may find particular use as hard, scratch-resistant covers for personal electric device displays, or as optical surfaces for fingerprint, eye, or other biometric scanning.

Abstract: A replaceable chamber element for use in a plasma processing system, such as a plasma etching system, is described. The replaceable chamber element includes a chamber component configured to be exposed to plasma in a plasma processing system, wherein the chamber component is fabricated of a ferroelectric material.

Abstract: The invention relates to a coating composition comprising an inorganic oxide precursor AMOx based on at least one inorganic element A selected from the group consisting of aluminum, silicium, titanium, zirconium, niobium, indium, tin, antimony, tantalum, and bismuth; and an inorganic oxide precursor BMOx based on at least one inorganic element B selected from the group consisting of scandium, yttrium, lanthanum, and the lanthanoids; wherein AMOx and BMOx are capable of forming a mixed inorganic oxide. A coating made from this composition shows enhanced resistance to hydrolysis. The invention also relates to a process for applying a coating on a substrate using such composition, more specifically to a liquid coating composition for use in a process of applying an anti-reflective coating on transparent substrate; to a coated substrate obtained with such process, and to an article, like a solar panel, comprising such coated substrate.

Abstract: The invention is a formed article including a gas barrier layer, the gas barrier layer including a surface layer part that is formed of a material that includes at least a carbon atom, an oxygen atom, and a silicon atom, the surface layer part having a carbon atom content rate of more than 0 and not more than 70%, an oxygen atom content rate of 10 to 70%, a nitrogen atom content rate of 0 to 35%, and a silicon atom content rate of 20 to 55%, based on a total content rate of carbon atoms, oxygen atoms, nitrogen atoms, and silicon atoms; a method for producing the formed article; an electronic device member including the formed article; and an electronic device comprising the electronic device member. The formed article of the invention exhibits an excellent gas barrier capability, excellent transparency, and excellent bending resistance. The method for producing a formed article of the invention can efficiently, safely, and conveniently produce the formed article of the invention.

Abstract: A method of manufacture of a coated polymeric film which comprises performing in sequence the steps of: (i) forming a substrate layer comprising poly(ethylene naphthalate) having a thickness in a range from 50 ?m to 250 ?m; (ii) stretching the substrate layer in at least one direction; (iii) heat-setting the substrate layer under dimensional restraint at a tension in the range of about 19 to about 75 kg/m of film width, at a temperature above the glass transition temperature of the poly(ethylene naphthalate) but below the melting temperature thereof; (iv) heat-stabilizing the substrate layer under a tension of less than 5 kg/m of film width, and at a temperature above the glass transition temperature of the poly(ethylene naphthalate) but below the melting temperature thereof; and (v) disposing a coating layer on a surface of the substrate layer by a process comprising applying a planarizing coating composition thereto such that a surface of said coating layer exhibits an Ra value of less than 0.

Abstract: A dielectric material is provided. The dielectric material includes at least one layer of a substantially continuous phase material. The material is selected from the group consisting of an organic, organometallic, or combination thereof in which the substantially continuous phase material has delocalized electrons.