Liquid Developer Recycling Patents (Class 430/117.32)
  • Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
    Publication number: 20080233512
    Abstract: A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system comprises: a plate that has a first surface and a second surface on the side opposite the first surface; and a liquid recovery part, at least part of which opposes the second surface with a first gap interposed therebetween. The liquid recovery system recovers the liquid on a movable object that opposes the first surface of the plate via the liquid recovery part.
    Type: Application
    Filed: March 17, 2008
    Publication date: September 25, 2008
    Applicant: NIKON CORPORATION
    Inventors: Yasufumi Nishii, Hiroyuki Nagasaka, Takeshi Okuyama