Abstract: A method of forming an image having multiple phases is disclosed herein. The method includes forming exposed and unexposed areas, the exposed areas comprising a first polymer network exhibiting first and second phases that are chemically connected and have different refractive indices, the first phase being continuous, and the second phase comprising a plurality of structures dispersed within the first phase, and the unexposed areas comprising a second polymer network comprising third and fourth phases that are chemically connected and have different refractive indices, the third phase being continuous, and the fourth phase comprising a plurality of structures dispersed within the third phase. The first and second polymer networks are chemically connected, and morphology formed by the first and second phases is different than that formed by the third and fourth phases.

Abstract: Improved photo-masks for use in fabricating photonic crystal devices are disclosed herein. Methods of making photonic crystal devices, as well as the photonic crystal devices fabricated therefrom, are also disclosed. The photo-mask can include a body element and one or more sets of diffractive elements and/or refractive elements disposed on the body element or within the body element. Each set of diffractive elements and/or refractive elements can be configured to produce four non-coplanar beams of light when a beam of light is passed through it. Each set of four non-coplanar beams of light can be used to interferometrically produce a specific photonic crystal structure at a specific location within a photosensitive recording material.

Abstract: A non-transparent microvoided biaxially stretched self-supporting non-laminated polymeric film, the film comprising linear polyester as a continuous phase and dispersed uniformly therein an amorphous high polymer with a higher glass transition temperature than the glass transition temperature of the continuous phase and/or a crystalline high polymer having a higher melting point than the glass transition temperature of said continuous phase, wherein said linear polyester consists essentially of aromatic dicarboxylate and aliphatic dimethylene monomer units; the polymeric film has an optical density measured in transmission with a visible filter; and at least 50% of the optical density is due to microvoids; the use of the non-transparent microvoided biaxially stretched film as a synthetic paper; an image recording element comprising the non-transparent microvoided biaxially stretched film; and a process for obtaining a transparent pattern therewith.

Abstract: To make high quality long-range periodic nanostructures in a transparent or semi-transparent substrate, the transparent or semi-transparent substrate is scanned with a linearly polarized laser beam generated by a femtosecond laser and exceeding a predetermined energy/pulse threshold along a scanning path. Sub-diffraction limit structures are formed as periodic planes of modified material in the transparent or semi-transparent substrate extending along the scanning path. The modified material can then be chemically etched to form cavities.

Abstract: A transparent vessel is filled with a mixture solution containing a first photo-curable resin of a low refractive index and a second photo-curable resin of a high refractive index different in curing mechanism. When light at a wavelength capable of curing the first photo-curable resin but incapable of curing the second photo-curable resin is applied to the mixture solution through an optical fiber, the first photo-curable resin can be cured in a state in which the second photo-curable resin is enclosed in the cured first photo-curable resin. Because the refractive index increases according to curing, a self-condensing phenomenon can be generated so that an optical path portion is formed. The optical path portion emits leakage light to its surroundings to thereby form an outer circumferential portion. Then, all uncured resins in the mixture solution are cured.

Abstract: A method for recording on an optical recording medium having a visible information recording layer comprises irradiating the visible information recording layer with a laser light to change a refractive index of the layer, thereby changing the wavelength of an interfering light to generate an interference color. The refractive index is changed by controlling a stored laser power of the laser light. Specifically, the laser light applied to the visible information recording layer is a continuous laser light or a pulsed laser light, and the stored laser power is controlled by changing the laser power of the continuous laser light or the pulse period of the pulsed laser light.

Abstract: A method and system of creating one or more waveguides and/or patterning these waveguides to form a 3D microstructure that uses mask and collimated light. In one embodiment, the system includes at least one collimated light source selected to produce a collimated light beam; a reservoir having a photo-monomer adapted to polymerize by the collimated light beam; and a mask having at least one aperture and positioned between the at least one collimated light source and the reservoir. Here, the at least one aperture is adapted to guide a portion of the collimated light beam into the photo-monomer to form the at least one polymer waveguide through a portion of a volume of the photo-monomer.

Abstract: There is provided a method for forming a pattern comprising two regions of different refractive indices easily, that is, a method comprising the steps of forming a pattern having a water-shedding oil-shedding region by use of a radiation sensitive resin composition and coating the pattern with a high refractive index resin solution using a solvent having low wettability to the water-shedding oil-shedding region so as to form two regions of different refractive indices.

Abstract: An information storage element has a carbon storage material including hexagonally bonded carbon and tetrahedrally bonded carbon. The information is formed by a changeable ratio of hexagonally bonded carbon and tetrahedrally bonded carbon.

Abstract: A photosensitive composition and A photosensitive medium for volume hologram recording comprises a photopolymerization reactive compound (a monomer) and any one of the following binder: (a) an organic-inorganic hybrid polymer obtainable by copolymerizing an organometallic compound of the formula 1 “R1m M1 (OR2)” and an ethylenic monomer and/or its hydrolyzed polycondensate; (b) an organic-inorganic hybrid polymer obtainable by copolymerizing an organometallic compound of the formula 3 “R4m Si (OR5)n” and an ethylenic monomer and/or its hydrolyzed polycondensate; and (c) a binder resin bonded to a metal or a combination use of a binder resin containing a hydroxyl group and/or carboxyl group and a metal chelate compound.

Abstract: Disclosed is a recording medium comprising a recording layer including a photo-acid generating agent that generates an acid upon irradiation with an actinic radiation and a polymer having a polymerizable substituent group bonded to a main chain of the polymer via a functional group that cleaves in the presence of the acid.

Abstract: A method and a medium for laser imaging is herein disclosed. The medium incorporates one or more types of microstructures having a predetermined heat or radiation modifiable optical characteristic such as color, scattering, diffusion, diffraction, interference and iridescence. Associated intimately with the microstructures is a radiation antenna that acts to absorb radiation from a radiation source. The radiation antenna and source are attuned to one another to efficiently transfer energy therebetween and subsequently to the microstructures; this transfer of energy results in the modification of an optical characteristic of the microstructures to form an image on the medium. The medium has one or more layers that may include both the radiation antenna and the microstructures. Alternatively, the microstructures and radiation antenna may be included in separate layers. Coatings that incorporate one or more layers that include distinct microstructures and radiation antennae are also contemplated.

Abstract: The invention provides a method for processing a transparent material, which is applicable to universal materials and by which the propagation loss of an optical function device produced by changing the refractive index is slight. Femtosecond laser pulses are condensed by a lens, and a glass material being fused quartz is relatively moved, wherein a waveguide is formed by forming a continuous high refractive index area. Prior art optical pulses depicted in FIG. 1(a) are one-by-one femtosecond laser pulses at a pulse interval which is slightly shorter or longer than a thermal diffusion time (1 ?s) of a substance. Optical pulses according to the invention, which are depicted in FIG. 1(b) are irradiated while using, as a set, two femtosecond laser pulses with a pulse interval which is around the electron lattice energy relaxation time (1 through 100 ps) of a substance.

Abstract: Method for producing an exposed substrate, which has at least two different image areas. The substrate is provided with at least two photoresist layers, which are adjusted to the type of image areas to be produced.

Abstract: A polycyclic or monocyclic perfluorovinyl compound comprising at least one structural unit selected from the group consisting of formula I and formula II wherein M is independently at each occurrence a metal selected from group 14 of the periodic table of the elements; and R is independently at each occurrence a bond, a hydrogen, an aliphatic group, a cycloaliphatic group, or an aromatic group. The polycyclic or monocyclic compound comprises at least two perfluorovinyl groups. A method for making an optical film of the disclosed compound, an electro-optical device comprising a polymer fabricated from the disclosed compound and a polymer fabricated from the disclosed compound are also provided.

Abstract: A photolithography and etch process sequence includes a photomask having a pattern with compensation features that alleviate patterning variations due to the proximity effect and depth of focus concerns during photolithography. The compensation features may be disposed near isolated or outermost lines of a device pattern. A photoresist pattern is formed to include the compensation features and the pattern etched to form a corresponding etched pattern including the compensation features. After etching, a protection material is formed over the layer and a trim mask is used to form a further photoresist pattern over the protection material. A subsequent etching pattern etches the protection material and removes the compensation features and results in the device lines being formed unaffected by proximity effects. Flare dummies may additionally be added to the mask pattern to increase pattern density and assist in endpoint detection.

Abstract: Multiple Bragg gratings are fabricated in a single planar lightwave circuit platform. The gratings have nominally identical grating spacing but different center wavelengths, which are produced using controlled photolithographic processes and/or controlled doping to control the effective refractive index of the gratings. The gratings may be spaced closer together than the height of the UV light pattern used to write the gratings.

Abstract: Provided are methods of forming optical components. The methods involves (a) forming over a substrate a layer of a photoimageable composition that includes a hybrid organic-inorganic polymer and a photoactive component, wherein the layer has a first index of refraction and a first dissolution rate; and (b) exposing by multi-photon absorption using actinic radiation a predefined volume of the layer. The volume is caused to have: (i) a second index of refraction which is different than the first index of refraction and/or (ii) a second dissolution rate which is different than the first dissolution rate. The methods have particular applicability in the formation of optical waveguides and other optical components.

Abstract: A method of determining temperatures at localized regions of a substrate during processing of the substrate in a photolithography process includes the following steps: independently illuminating a photoresist layer including a photoresist pattern at a plurality of locations on the substrate with a light source, so that light is diffracted off the plurality of locations of the photoresist pattern; measuring the diffracted light from the plurality of locations to determine measured diffracted values associated with respective locations from the plurality of locations; and comparing the measured diffracted values against a library to determine a pre-illumination process temperature of the photoresist layer at the plurality of locations.

Abstract: High-energy pulses of femtosecond lasers form cladding portions of waveguides in bulk glass by producing localized reductions in refractive index. The cladding portions written by the high-energy pulses circumscribe unexposed core portions for defining light-guiding pathways in the bulk glass.

Abstract: Fiber optic devices including volume Bragg grating (VBG) elements are disclosed. A fiber optic device may include one or more optical inputs, one or more VBG elements, and one or more optical receivers. Methods for manufacturing VBG elements and for controlling filter response are also disclosed. A VBG chip, and fiber optic devices using such a chip, are also provided. A VBG chip includes a monolithic glass structure onto which a plurality of VBGs have been recorded.

Abstract: To provide a refractive index pattern and an optical material whose refractive indices are changed by a simple method, which have a sufficiently large refractive index difference and which are stable irrespective of their use conditions, and a method of forming these. A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a hydrolyzate of an alkoxide such as tetrabutoxytitanium, tetramethoxyzirconium, tetramethoxygermanium or tetramethoxysilane, or a halogen compound such as tetrachlorosilane and (C) a radiation sensitive decomposer; and a method of producing a refractive index pattern and an optical material, using the above radiation sensitive refractive index changing composition.

Abstract: There is provided a material which can give a high elasticity and heat resistance to an optical waveguide member by photo-curing while maintaining transparency in a near infrared region and further makes it possible to use a film forming process by a spin coating method and a process for producing a waveguide by photolithograph, to obtain a waveguide having a large area and to produce an optical waveguide having reduced water absorption, and further there can be provided an optical waveguide member and an optical waveguide device. Namely, there are provided a fluorine-containing optical waveguide material comprising a curable fluorine-containing prepolymer (I) which is a non-crystalline polymer having a fluorine content of not less than 25% by weight and has a carbon-carbon double bond in a polymer side chain and/or at an end of a polymer trunk chain, an optical waveguide member which is a cured article of the optical waveguide material and an optical waveguide device comprising the optical waveguide member.

Abstract: Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of ? 2 ? n wherein ? is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.

Abstract: A method of writing an extended grating structure in a photosensitive waveguide comprising the steps of utilizing at least two overlapping beams of light to form an interference pattern, moving the waveguide through said overlapping beams, simultaneously controlling a relative phase delay between the beams utilising a phase modulator, thereby controlling the positions of maxima within said interference pattern to move at approximately the same velocity as the photosensitive waveguide, wherein the phase modulator does not comprise a mechanical means for effecting the phase modulation, and modifying the relative phase delay between the beams during the writing of the grating structure, whereby a deliberate detuning of the velocity of the positions of maxima within said interference pattern and the velocity of the photosensitive waveguide is utilized to vary a period of the written grating structure in the photosensitive waveguide.

Abstract: Methods of fabricating optical elements that are encapsulated in monolithic matrices. The present invention is based, at least in one aspect, upon the concept of using multiphoton, multi-step photocuring to fabricate encapsulated optical element(s) within a body of a photopolymerizable composition. Imagewise, multi-photon polymerization techniques are used to form the optical element. The body surrounding the optical element is also photohardened by blanket irradiation and/or thermal curing to help form an encapsulating structure. In addition, the composition also incorporates one or more other, non-diffusing binder components that may be thermosetting or thermoplastic. The end result is an encapsulated structure with good hardness, durability, dimensional stability, resilience, and toughness.

Abstract: The present invention relates to fluorinated polyethers having a fluorinated aliphatic group at a main chain as represented by the formula (1), as well as a waveguide fabricated using the same: where RF represents OCH2(CF2)nCH2O, or OCH2CF2O(CF2CF2O)nCF2CH2O, where n is a natural number ranging from 1 to 12; Ar1 represents ?where B is not present or a C?O group, or Ar1 represents ?where Hal is one selected from F, Cl, Br and I; Ar2 represents ?where D is one selected from —C(CF3)2, —C(CH3)2, —CO—, —SO2—, —O— and —S—, or Ar2 represents ?where R1 and R2 are the same or different and each independently represents a halogen atom selected from F, Cl, Br and I, and m is a natural number of 1-3, or Ar2 represents E represents H, or ?where P is H or a substituted or unsubstituted phenyl group; x is a number ranging from 0.1 to 1.0; y is 1.0?x.

Abstract: The optical article of the invention, e.g., holographic recording medium or polymeric waveguide, is formed by mixing a matrix precursor and a photoactive monomer, and curing the mixture to form the matrix in situ. The reaction by which the matrix precursor is polymerized during the cure is independent from the reaction by which the photoactive monomer is polymerized during writing of data. In addition, the matrix polymer and the polymer resulting from polymerization of the photoactive monomer are compatible with each other. Use of a matrix precursor and photoactive monomer that polymerize by independent reactions substantially prevents cross-reaction between the photoactive monomer and the matrix precursor during the cure and inhibition of subsequent monomer polymerization. Use of a matrix precursor and photoactive monomer that result in compatible polymers substantially avoids phase separation. And in situ formation allows fabrication of articles with desirable thicknesses.

Abstract: Reticles and apparatus for performing charged-particle-beam microlithography, and associated methods, are disclosed, in which the pattern to be transferred to a sensitive substrate is divided according to any of various schemes serving to improve throughput and pattern-transfer accuracy. The methods and apparatus are especially useful whenever a divided stencil reticle is used that includes complementary pattern portions.

Abstract: Method and structure for masking are disclosed. In one embodiment, a thin layer of radiation sensitive material is combined with another layer of radiation opaque material with different etch selectivity to facilitate a multi-stage patterning treatment of an underlying mask layer and a resultant critical dimension in the patterned mask which may be less than that available using conventional patterning techniques.

Abstract: The present application describes a method for information storage and data processing comprising the steps of thermo inducing or photo inducing double-bond shifts (DBS) in substituted (4n)-annulenes thus generating transitions between two different conjugation states with at least one substituent. The two different conjugation states are the conjugation on-state and conjugation off-state of the annulene core ?-electrons with the substituent ?-electrons. The present invention is furthermore related to novel substituted (4n)-heptalenes being optically and/or thermally switchable, based on thermal or photochemical double-bond shifts (DBS) as well as methods for their preparation. The (4n)-heptalenes can be used for information storage and data processing devices.

Abstract: A phase volume hologram and a method for producing the phase volume hologram are described herein. The phase volume hologram is made by filling the microcavities of a porous transparent siliceous body with a polymerisable composition (e.g., liquid monomer or monomer/oligomer mixture). The filled siliceous body then has a hologram interference pattern recorded therein using a laser light that in conformity with the hologram interference pattern converts the polymerisable composition into a polymerized material (solid-phase polymer) and a non-polymerized material. In particular, the polymerized material has a volume fraction in the microcavities that is close to 1 in the vicinity of a maxima of the recorded interference pattern and close to 0 in the vicinity of a minima of the recorded interference pattern. Thereafter, the non-polymerized material is removed from the siliceous body which now resembles the phase volume hologram.

Abstract: An improved method for applying organic antireflective coatings to substrate surfaces and the resulting precursor structures are provided. Broadly, the methods comprise chemical vapor depositing (CVD) an antireflective compound on the substrate surface. In one embodiment, the compound is highly strained (e.g., having a strain energy of at least about 10 kcal/mol) and comprises two cyclic moieties joined to one another via a linkage group. The most preferred monomers are [2.2](1,4)-naphthalenophane and [2.2](9,10)-anthracenophane. The CVD processes comprise heating the antireflective compound so as to vaporize it, and then pyrolizing the vaporized compound to form stable diradicals which are subsequently polymerized on a substrate surface in a deposition chamber. The inventive methods are useful for providing highly conformal antireflective coatings on large substrate surfaces having super submicron (0.25 ?m or smaller) features.

Abstract: A marking method is provided which permits an easy detecting of the presence of a mark without using a specific reading apparatus, and is capable of avoiding a damage as well as a strength deterioration of an object material. The marking method comprises: preparing a marking object; converging, into the marking object, a laser beam having a wave length range so chosen that the laser beam can transmit through a material forming the marking object, and then effecting a multiple photon absorption; and moving a converging position of the laser beam, in a manner such that an area, whose refractive index is changed due to the multiple photon absorption, can form a diffraction pattern capable of diffracting a visible light.

Abstract: The present invention provides new light absorbing compositions suitable for use as antireflective coating compositions (“ARCs”), including for deep UV applications. The antireflective compositions of the invention are particularly useful where a planarizing coating layer is required. ARCs of the invention contain a low molecular weight resin, a plasticizer compound and/or a low Tg resin. The invention also includes methods for applying forming planarizing ARC coating layers.

Abstract: A phase shift mask having transmission properties that are dependent at least in part on an intensity of an incident light beam. The phase shift mask has a mask substrate that is substantially transparent to the incident light beam. A first phase shift layer is disposed on the mask substrate. The first phase shift layer has a refractive index that is nonlinear with the intensity of the incident light beam. The refractive index of the first phase shift layer changes with the intensity of the incident light beam on the phase shift mask. By using a first phase shift layer on the phase shift mask that has a refractive index that is non linear with the intensity of the incident light beam, properties of a light beam transmitted through the first phase shift layer, such as interference patterns in the transmitted light beam, can be adjusted by adjusting the intensity of the incident light beam.

Abstract: A method for making an apodized Bragg grating in a photosensitive, planar, linear waveguide. A photosensitive, planar, linear waveguide is provided on a surface of a substrate. A patterned phase mask is placed between the waveguide and a laser beam. The waveguide is exposed through the phase mask to the laser beam wherein either the laser beam is moving at a substantially constant velocity with respect to the substrate and phase mask, or the substrate and phase mask are moving at a substantially constant velocity with respect to the laser beam. The beam has a smoothly varying intensity profile, and the exposure is conducted at an angle of more than 0° and less than 90° to the longitudinal axis of the waveguide under conditions sufficient to induce a modulation in the index of refraction of the waveguide and impart an apodized Bragg grating in the waveguide corresponding to the phase mask pattern.

Abstract: In a method of making a diffraction grating device, an optical waveguide is irradiated, by way of a phase grating mask, with refractive index modulation inducing light so as to form a diffraction grating in the predetermined region. This method comprises (1) a step of measuring a diffraction efficiency distribution of the phase grating mask; and (2) a step of longitudinally scanning the optical waveguide with the refractive index modulation inducing light by way of the phase grating mask and irradiating the optical waveguide with the refractive index modulation inducing light so as to modulate a refractive index of the predetermined region. Upon scanning with the refractive index modulation inducing light, longitudinal relative positions of the phase grating mask and optical waveguide are changed according to the diffraction efficiency distribution of the phase grating mask.

Abstract: There is provided a slant short-period grating which is obtainable by irradiating light onto an optical fiber whose core is formed from quartz glass to which has been doped a photosensitive dopant that changes a refractive index of the quartz glass by light irradiation, and whose clad has one or two or more layers with at least the layer that is adjacent to the core being a photosensitive layer formed from quartz glass to which has been doped a photosensitive dopant that changes a refractive index of the quartz glass by light irradiation. In this slant short-period grating a grating portion is formed by changing the refractive index of the photosensitive layer of the clad and the core at a predetermined grating period along a longitudinal direction of the optical fiber by a predetermined slant angle.

Abstract: A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.

Abstract: A method for adjusting a photosensitive optical waveguide having an optical path length to a stabilized desired optical path length. The method includes the step of changing the optical path length of the photosensitive optical waveguide by exposing at least a first portion of the waveguide to actinic radiation and creating an induced index change in the exposed first portion. The waveguide then is subjected to an annealing cycle that stabilizes the waveguide. After the step of stabilizing the waveguide, the optical path length is adjusted by subjecting at least a selected part of the exposed first portion of the waveguide to a localized heating sufficient to change the refractive index at the selected part until the desired optical path length is achieved.

Abstract: Methods of forming a resist pattern, of forming an electrode pattern, and of manufacturing a surface acoustic wave device are provided. The resist-pattern- and the electrode-pattern-forming methods each comprise a step of forming an antireflection film for preventing ultraviolet light from diffusely reflecting to a transparent substrate. The antireflection film is formed with a semiconductor having a band gap energy of 3.4 eV or less. The reflectance is expressed by (n1−n2)2/(n1+n2)2 is 0.15 or less, wherein n1 and n2 is the refractive indexes of the substrate and the antireflection film, respectively. The resist-pattern- and the electrode-pattern-forming methods with simple processes can achieve high-quality, reliable resist patterns and electrode patterns.

Abstract: A photopolymerisable system is disclosed which can be polymerised by exposure to UV light, for example, to form a solid, light-transmitting sheet material having volume refractive index variations defining an optical diffuser or a hologram, for example. The system includes a silicone monomer, prepolymer, macromonomer or co-monomer capable of undergoing free radical initiated polymerization and further includes a photoinitiator.

Abstract: A post-exposure treatment method of a silver halide emulsion layer in the manufacture of a hologram, a hologram manufacturing using the post-exposure treatment method, and a holographic optical element including the hologram are provided. The post-exposure treatment method of a silver halide emulsion layer involves: pre-hardening the silver halide emulsion layer after exposure; developing the pre-hardened silver halide emulsion layer using a developer solution; bleaching the developed silver halide emulsion layer; hardening the bleached silver halide emulsion layer; drying the hardened silver halide emulsion layer; surface-hardening the dried silver halide emulsion layer; fixing the hardened silver halide emulsion layer; treating the fixed silver halide emulsion layer using warm water; and drying the silver halide emulsion layer which has been treated using warm water.

Abstract: The invention provides organic optical waveguide devices which employ perfluoropolymeric materials having low optical loss and low birefringence. An optical element has a substrate; a patterned, light transmissive perfluoropolymer core composition; and a light reflecting cladding composition on the pattern of the core. Writing of high-efficiency waveguide gratings is also disclosed.

Abstract: A method of writing a light guiding structure in a bulk glass substrate including selecting a bulk glass substrate made from a soft silica-based material; and focusing an excimer laser beam at a focus within said substrate while translating the focus relative to the substrate along a scan path at a scan speed effective to induce an increase in the refractive index of the material along the scan path relative to that of the unexposed material while incurring substantially no laser induced breakdown of the material along the scan path. Various optical devices, including waveguides can be made in this way.

Abstract: Method and structure for masking are disclosed. In one embodiment, a thin layer of radiation sensitive material is combined with another layer of radiation opaque material with different etch selectivity to facilitate a multi-stage patterning treatment of an underlying mask layer and a resultant critical dimension in the patterned mask which may be less than that available using conventional patterning techniques.

Abstract: The present invention relates to a method of producing an optical fiber-processing phase mask having minimized connection errors that may degrade the spectral line shape and group delay characteristics of an optical fiber diffraction grating fabricated by using the phase mask. The present invention provides a method of producing an optical fiber-processing phase mask having a repeating pattern of grating-shaped grooves and strips provided on one surface of a transparent substrate, so that diffracted light produced by the repeating pattern is applied to an optical fiber to fabricate a diffraction grating in the optical fiber by interference fringes of diffracted light of different orders.

Abstract: Light-reflecting multilayer polymer films that irreversibly change their optical characteristics upon exposure to suitable, high-intensity irradiation.

Abstract: Blue-sensitized holographic media suitable for recording with a blue laser is disclosed. The blue-sensitized holographic media provides greater dynamic range and a higher sensitivity than a green-sensitized holographic media, thereby providing more rapid hologram writing times.