Abstract: The invention provides a novel and improved photosensitive or photocurable composition useful as a photoresist material in the manufacturing process of semiconductor devices such as LSIs by the lithographic process involving etching, in particular, with low temperature plasma in a dry process. The photoresist layer formed of the inventive composition is highly resistant against damages even by direct contacting with a photomask used in the pattern-wise exposure of the photoresist to light owing to the improved pliability thereof and good adhesion to the substrate surface in addition to the stability against the attack by the plasma. The composition comprises (a) a phenolic polymer, e.g. a novolac resin or a polymer of a hydroxystyrene, (b) an aromatic azide compound and (c) a polymer of a vinyl alkyl ether, the amounts of the compounds (b) and (c) being limited relative to the amount of the component (a).

Abstract: A light-sensitive composition comprising a phenolic resol wherein the ratio of the number of dibenzylic ether linkages to the total number of dibenzylic ether, methylene and methylol linkages linked to phenolic nucleus is 15 mol. % or more and which is obtained by a reaction between a phenol of the formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 may be the same or different and represent hydrogen, halogen, hydroxyl, nitro, alkyl, alkoxy, phenyl, or substituted phenyl, and an aldehyde or ketone.A light-sensitive composition comprising a condensate of the phenolic resol and an o-quinone diazido sulfonylhalide.A light-sensitive material comprising the above-mentioned composition.A method for making a planographic printing plate from the light-sensitive material, characterized in that burning-in process is carried out at a lower temperature or a shortened time.

Abstract: A desensitizing gum containing water-soluble carboxy alkylated starch wherein the carboxy alkyl group number of said carboxy alkylated starch is from 0.03 to 0.5. The desensitizing gum has desensitizing ability comparable to gum arabic.

Abstract: The invention provides an organic solvent free, phosphate free, lithographic desensitizing composition which comprises:(a) from about 0.1% to about 20.0% by weight of the composition of a copolymer of polymethyl vinyl ether and maleic acid having the formula ##STR1## which has a molecular weight in an amount of from about 20,000 to about 70,000; and(b) from about 0.1% to about 20.0% by weight of the composition of a desensitizing component comprising one or more hydroxy carboxylic acids or salts; and(c) sufficient water to formulate a desensitizing composition; and(d) sufficient base to adjust the pH of the composition into the range of from about 6.5 to about 7.5.

Abstract: Non-tacky, smooth, structureless surfaces of photopolymer relief printing plates for flexographic printing, whose relief layers are prepared in a conventional manner by exposing the photopolymerizable relief-forming layers of flexographic printing plates imagewise to actinic light and washing out the unpolymerized, unexposed areas with a suitable solvent, are produced by a process in which the flexographic printing plates are after-treated with a liquid medium which contains elemental bromine or is capable of forming elemental bromine, and then washed with a neutralization bath, one or more paraffinsulfonates, fatty alcohol ethersulfates or alkyl phosphates or a cationic or anionic surfactant possessing one or more perfluorinated carbon chains being employed in the bromine-containing, liquid medium.The relief printing plates obtained according to the invention are used for flexographic printing.

Abstract: A desensitizing gum comprising an aqueous solution containing at least one of film-forming starches modified with phosphoric acid or its derivatives. The desensitizing gum has good desensitizing ability and can easily be removed from a printing plate finished therewith after prolonged storage.

Abstract: A light-sensitive mixture containing a light-sensitive compound or a light-sensitive combination of compounds, the solubility of which is increased upon exposure, and a binder made from a polymer which has units of alkenylsulfonylaminocarbonyloxystyrenes or cycloalkenylsulfonylaminocarbonyloxystyrenes and which is insoluble in water and soluble in aqueous alkali. Moreover, a recording material is described which is particularly used in the production of printing plates coated with a light-sensitive layer of the indicated mixture. The printing form obtained after exposure and development of the material can be baked at temperatures ranging from 180.degree. C. to 250.degree. C. without forming difficult to remove deposits on the non-image areas of the plate. As a result, a printing form is produced, which has a particularly high resistance and yields a large print run.

Abstract: Emulsion developers for diazo-sensitized printing plates are disclosed which are characterized by an oil phase containing a partially water-soluble aliphatic cyclic carbonate having the formula: ##STR1## where n is an integar from 0-2, and Z is selected from hydrogen, C.sub.1 -C.sub.3 alkyl, hydroxyl alkyl or chloroalkyl, chlorine, hydroxy or phenyl. The preferred carbonate is propylene carbonate.

Abstract: A reducible image-containing element which comprises a support material and a photopolymerized layer provided thereon, said photopolymerized layer having an image area which is cured at the upper part and not cured at the lower part, said non-cured lower part containing at least one of polyvalent phenols and their derivatives in an amount effective in preventing said non-cured lower part from curing.

Abstract: An alkaline aqueous tanning developing solution for photographic image development comprising at least one hydroxylamine derivative. Preferred formulations may also contain at least one water-miscible polyhydroxy aliphatic organic solvent and/or a developing agent which comprises a polyhydroxybenzene compound having at least two hydroxy groups and at least one electron withdrawing and good leaving group suitable for nucleophilic addition.

Abstract: A process for the production of negative relief copies, wherein a photosensitive material comprising at least one o-quinone diazide and at least one quaternary ammonium compound is imagewise exposed, heated, and then uniformly exposed before developing, involves reduced heat-treatment temperatures and durations, and does not require the use of toxic amines.

Abstract: A method of producing a light sensitive element wherein a substrate is coated with a photosensitive layer having a particular class of diazonium salts, a colorant and a polyvinyl acetal resin. Upon imagewise exposure it is developed with an aqueous composition of salts and surfactants in the absence of organic solvents.

Abstract: The invention provides a composition which comprises from about 3 to about 50% by weight of a hexa-alkyl disilazane and a solvent composition which comprises one or more compounds selected from the group consisting of a propylene glycol alkyl ether and a propylene glycol alkyl ether acetate.

Abstract: A method for making a dry planographic printing plate, which comprises: exposing through a negative transparency a dry negative working presensitized plate comprising a base substrate having provided thereon, in order, a photosensitive layer containing an orthoquinonediazide compound and a silicone rubber layer; developing the exposed plate; exposing the developed plate to light so as to make its exposure value not less than 5% of the exposure value at the time of the exposure through the negative transparency; and then treating the exposed plate with a basic compound.

Abstract: The invention relates to a process for the ozone protection of an imagewise exposed and developed photopolymer flexographic printing plate, having an elastomeric, thermoplastic polymeric binder, which comprises applying to the exposed and developed surface of the flexographic printing plate at least one known liquid polyether of the formulas: ##STR1## wherein R.sub.1 =H, or methylR.sub.2 =H, alkyl or alkylene with C.sub.12 -C.sub.18, and saturated and unsaturated fatty acid radicals with C.sub.12 -C.sub.18.p=1-4and wherein n, m and m.sub.1-4 and x, y, and z are so selected that the molecular weight (M.sub.n) of the molecule is about 500 to 5000.

Abstract: A positive photoresist metal ion aqueous developer is provided that gives a high contrast to the photoresist.The developer disclosed comprises a formulation of aqueous alkali-base such as potassium hydroxide and a carboxylated surfactant. The incorporation of the carboxylated surfactant provides the unexpected increase in the contrast of the photoresist. The addition of the carboxylated surfactant increases the gamma from a typical photoresist gamma (.gamma.) of 3 or less to a gamma greater than 5.The high contrast photoresist provides linewidth control and affords improved process latitude in photoresist imaging. The linewidth control is particularly critical in cases where fine lines are to be defined in the resist that covers steps of topography on the coated substrate. The higher the contrast, the less affected the resist by the topography, provided the exposure is adequate to expose the resist.

Abstract: The photosensitive composition of this invention contains (1) an ethylenically unsaturated component capable of forming a high polymer by addition polymerization or crosslinking, (2) a cyclic cisoid conjugated diene as a photooxidizable component capable of reacting with singlet oxygen to form an endoperoxide, and (3) a photooxygenation sensitizer. A process for preparing a photosensitive element, such as a relief printing plate, embodying a layer of such a composition is described.

Abstract: A positive photoresist metal ion aqueous developer is provided that gives a high contrast to the photoresist.The developer disclosed comprises a formulation of aqueous alkali-base such as potassium hydroxide and a fluorocarbon surfactant. The incorporation of the fluorocarbon surfactant provides the unexpected increase in the contrast of the photoresist. The addition of the fluorocarbon surfactant increases the gamma from a typical photoresist gamma (.gamma.) of 3 or less to a gamma greater than 10.The high contrast photoresist provides linewidth control and affords improved process latitude in photoresist imaging. The linewidth control is particularly critical in cases where fine lines are to be defined in the resist that covers steps or topography on the coated substrate. The higher the contrast, the less affected the resist by the topography, provided the exposure is adequate to expose the resist.

Abstract: A light-sensitive mixture is disclosed which contains a binder comprising a polycondensation product of a phenol corresponding to the formula ##STR1## wherein R.sub.1 is a hydrogen atom, an alkyl group or a hydroxy group,R.sub.2 is a hydrogen atom, an alkyl group, a hydroxy group or an acetyl group, andR.sub.3 is a hydrogen atom or a halogen atom, an alkyl group, an alkoxy group, a carboxyl group or a carboxylic acid ester group,and a compound corresponding to the formulaROCH.sub.2 --X--CH.sub.2 OR,whereinR is a hydrogen atom, a methyl group, an ethyl group or an acetyl group andX is a phenylene group or a binuclear aromatic group.The mixture yields printing plates which have a high resistance to developing solutions and which show a low degree of soiling upon baking.

Abstract: A process for the ozone protection of photopolymer flexographic printing plates using alcohol soluble polyamides, which are applied onto the exposed and developed surface of the flexographic printing plate in a mixed solution comprising n-propanol and n-butanol, e.g., 10 to 90% and 90 to 10% by weight, respectively.

Abstract: Disclosed is a photosensitive composition which comprises a diazonium salt polycondensation product and, as the binder, a reaction product of an intramolecular anhydride of an organic polycarboxylic acid with a polymer containing hydroxyl groups, which does not contain any further functional groups which are capable of reaction with acid anhydrides. The composition is suitable for use in the production of printing plates and photoresists. It can be developed with neutral or alkaline aqueous solutions and yields printing plates having a good ink receptivity and producing large print runs.

Abstract: An aqueous metal ion-free developer composition for developing photoresists comprising a metal ion-free alkali and a metal ion-free surfactant that is a quaternary ammonium compound. The developer permits a reduction of from 20-50% in the energy necessary to expose the photoresist without deleterious effect on image quality and image resolution.

Abstract: This invention is directed to the reaction product of an O-epoxyalkylated tetrakis (hydroxyphenyl) alkane resin with a phenol, which is used either as an upper layer over a lower layer of a diazo resin in a bi-layer system or as a homogeneous mixture with a diazo resin in a mono-layer system to provide a water-developable, negative-working, lithographic printing plate.

Abstract: A process is described for improving the quality of images which have been formed by screen printing a liquid photo curable photopolymer. Images formed by screen printing, especially heavy coatings such as solder masks on printed wiring boards, inherently have indistinct boundaries, and may have feathered edges and photopolymer smears. These indistinct boundaries are removed and the resolution improved by a process which utilizes the oxygen inhibition effect characteristic of selected photopolymers. Thus, a screen printed image can be 0.001 inches thick at the center of a line, tapering off to 0.0001 inch thick smears, and these smears may be eliminated by irradiating the entire image with a moderate amount light energy, which cures the thick image portion and leaves a liquid boundary layer on the order of 0.0001 inch thick due to the oxygen effect. When washed with a mild solvent the liquid layer is removed, including the smears, leaving the thick image portion undisturbed.

Abstract: The invention provides an aqueous alkaline developer solution for a positive-type photoresist layer for pattern-wise treatment of the surface of a substrate, e.g., semiconductor wafer. The developer solution contains a tetraalkyl ammonium hydroxide, e.g., tetramethyl ammonium hydroxide, and a trialkyl hydroxyalkyl ammonium hydroxide, e.g., trimethyl hydroxyethyl ammonium hydroxide, as the essential ingredients and the temperature dependency of the development performance thereof is noticeably smaller than that of conventional developer solutions with respect to properties of the sensitivity of the photoresist and the thickness reduction of the photoresist layer in the unexposed areas, by virtue of the compensating temperature dependencies for these properties of these two ingredients for each other.

Abstract: A method of developing a positive photoresist layer which has been image-wise-exposed comprising contacting the layer with an alkaline developing composition to remove exposed areas of the layer, the developing composition comprising a solution containing a cyclic quaternary ammonium hydroxide developing agent in a sufficient concentration to remove exposed areas of the layer. The present invention also includes a developing composition for use in the method.

Abstract: A developing solution for developing a light-sensitive lithographic plate having a o-quinonediazide compound-containing light-sensitive layer is disclosed. The developing solution is comprised of an aqueous solution containing alkali silicate and an alkali aqueous solution-soluble compound of a metal selected from the group consisting of Sn, Pb, Fe, Co and Ni. The developing solution provides excellent resolving power, has excellent development stability, processing capability and adaptability with respect to automatic developing machines.

Abstract: A silver halide photographic light-sensitive material for photomechanical process is described, comprising a support, at least one photosensitive silver halide emulsion layer thereon, and at least one light-insensitive upper layer on the emulsion layer. At least one of the light-insensitive upper layers contains a compound having an electric charge and being substantially insoluble in water but soluble in a water-miscible organic solvent; a method for a reducing treatment is also described, which comprises bringing a silver image formed on the light-sensitive material into contact with a reducer through the light-insensitive upper layer containing the aforesaid compound.

Abstract: A process is described for eliminating or substantially reducing the surface tack on relief printing plates and the like articles fabricated from radiation-sensitive polymerizable resins, particularly photopolymerizable resin compositions. The process comprises immersing the article, after curing, in an aqueous solution or dispersion comprising a water-soluble or water dispersible ethylenically unsaturated monomer (acrylic, methacrylic acids and derivatives thereof preferred) and optionally a photoinitiator and exposing the immersed plate to actinic radiation.

Abstract: A desensitizing gum for a lithographic printing plate and a gumming up process thereof are disclosed. The gum is comprised of water having dispersed therein 5 to 35 wt %, based on the total weight of the gum, of a film-forming, water-soluble compound selected from the group consisting of enzyme-decomposed dextrine and enzyme-decomposed etherified dextrine. The desensitizing gum exerts a desensitizing action on non-image areas of a lithographic printing plate and does not cause image blinding of image areas even when the plate is stored for a long period of time.

Abstract: The invention provides a method for developing negative working photographic elements using an aqueous developer comprising(a) .alpha.-hydroxy toluene; and(b) C.sub.12 sodium alkyl ether sulfate.

Abstract: Disclosed is a developer composition for exposed, light-sensitive, negative-working reproduction layers, which may contain an organic binder, comprising water and a salt of a substituted aromatic carboxylic acid, in particular, from about 5 to 60% by weight of at least one salt of an aromatic carboxylic acid having substituents which are immediately adjacent to the carboxyl group and represent an amino group, a hydroxyl group, and/or chlorine or bromine. Also disclosed is a process for developing the reproduction layers utilizing the disclosed developers, wherein the reproduction layer contains, in particular, a polymeric organic binder with an acetal, anhydride, amide and/or a carboxyl group.

Abstract: A presensitized plate adapted for use in lithography comprising a support member with a metal surface, e.g. aluminum metal, and overlying layer containing a diazo compound. In accordance with this invention, the relative exposure sensitivity of the diazo compound is improved by pretreatment to accelerate its reactivity in the presence of actinic light. One method of pretreatment involves preheating the diazo compound to a temperature above about 35.degree. C. up to about 120.degree. C. The improved lithographic plate and the process of preparing plate are claimed.

Abstract: A developer suitable for use with positive photoresists is based on a buffered aqueous-alkaline solution containing non-ionic surfactants and contains in the solution 1-100 ppm of the surfactants, preferably of the ethoxylated-alkylphenol type. The resultant photoresist shows outstanding properties with respect to the resolution and edge sharpness obtainable in the developed resist image and with respect to its developing activity, developing capacity and stability.

Abstract: A process for producing negative relief copies is disclosed in which a light-sensitive material, consisting essentially of (1) a binder which is insoluble in water and soluble in aqueous-alkaline solutions and (2) a light-sensitive ester or amide of a 1,2-benzoquinone-2-diazide-4-sulfonic acid, a 1,2-benzoquinone-2-diazide-4-carboxylic acid, a 1,2-naphthoquinone-2-diazide-4-sulfonic acid, or a 1,2-naphthoquinone-2-diazide-4-carboxylic acid, is imagewise exposed, thereafter heated and, after cooling, exposed again without an original, and subsequently developed by means of an aqueous-alkaline developer. The disclosed process permits the production of negative copies with the aid of a material which yields positive copies when it is processed in a conventional manner.

Abstract: A developer is provided for lithographic plates or the like having a layer including a diazonium material, which developer enhances the effectiveness of the photolysis to which the plate had been subjected, with the result that the exposure time needed for the plate is substantially reduced. The developer, which thus enhances the apparent photospeed of the plate, includes an insolubilizing reactant that reacts with diazonium groups of diazonium materials on the plate that were not removed by photolysis during exposure in order to decrease the solubility of the diazonium material.

Abstract: A method of preparing an anodized aluminum printing plate comprising treating the aluminum support with aqueous solution of a condensed aryl sulfonic acid having a neutral pH, anodizing the support before or after the treating step, and coat, radiation expose through a mask, as well as develop a radiation-sensitive composition to produce the lithographic printing plate.

Abstract: A lithographic printing plate having metallic silver image areas is treated with a proteolytic enzyme and an oleophilizing compound to improve ink receptivity.

Abstract: A resist film comprises a dimensionally stable base (B), which is transparent to actinic light in the wavelength range from 300 to 420 nm, and a mask-forming layer (ML) which is sensitive to heat radiation and contains a thermochromic system which, when irradiated with an IR laser having a wavelength greater than 1.00 .mu.m, undergoes an irreversible change in its absorption spectrum in the wavelength range from 300 to 420 nm so that the optical density of the mask-forming layer (ML) in this wavelength range changes by not less than 1.3 units. The base of the resist film can also be applied onto the photosensitive relief-forming layer (RL) of a recording material to give a multilayer image-recording material. Imagewise irradiation with heat, for example using an IR laser, produces, in the mask-forming layer (ML) of the resist film, a UV photomask which is very useful for exposing photosensitive recording materials.

Abstract: Imagewise differential oleophilicity is formed on a planographic printing member by imagewise photoexposure, generally with a Yag laser, of an aluminium silicate image forming layer, generally of a boehmite hydrate layer such as is formed by contact of anodized or other aluminium substrate with sodium silicate. A print resistant image may be formed by applying to an image surface having imagewise differential oleophilicity a selective coating composition comprising an organic phase, generally in an amount of 90 to 75% by volume, containing film forming resin and that will preferentially wet and deposit resin on the image areas, and an aqueous phase, generally in an amount of 10 to 25% by volume, that will preferentially wet and prevent resin deposition on the background areas, and hardening the resin.

Abstract: A silver halide photographic light-sensitive material for plate making is disclosed. The material is comprised of a support base having thereon a sensitive silver halide emulsion layer and at least one upper insensitive layer having a melting time longer than the melting time of the sensitive silver halide emulsion layer. A method of reduction treatment for such silver halide light-sensitive material is also disclosed. The sensitive materials have excellent aptitude for reduction treatment and do not deteriorate even if the amount of silver per unit area is relatively small.

Abstract: The invention relates to a solution and a process for desensitizing lithographic printing forms based on light-hardened diazo compounds and which are ready for printing. The desensitizing solution of the invention is composed of a water-soluble, film-forming, high molecular weight organic compound, a compound which has a high light-absorption in the spectral region in which the photolysis of light-sensitive aromatic diazo compounds is initiated, and water as the solvent.The desensitizing solution protects the image stencil against the action of light and prevents any deterioration of the oleophilic character of the image stencil during storage.

Abstract: The aqueous-alkaline developer solution for radiation-sensitive, positive-working reproduction layers contains silicate and a quaternary ammonium base, such as tetraalkylammonium hydroxide; it may further contain a salt of an organic, optionally substituted, aromatic monocarboxylic acid, for example, a benzoate. This solution is in particular used for developing reproduction layers which contain an o-naphthoquinone diazide as the radiation-sensitive compound and an alkali-soluble resin and which are applied to a support material based on aluminum, which comprises at least one aluminum oxide layer produced by anodic oxidation.

Abstract: A process for forming photoresist images by sticking photosensitive layer formed on a film of a polyvinyl alcohol resin which is not soluble in water, but is swellable with water, to a substrate, exposing the photosensitive layer to light through the polyvinyl alcohol resin film, washing away the polyvinyl alcohol resin film with water and developing the photosensitive layer with a developer.

Abstract: It has been found that excellent quality photopolymer printing plates having resistance to alcohol-based inks can be prepared by (a) spreading a photopolymer composition comprising a chain extended, liquid, terminally olefinically unsaturated polymer; from about 1% to about 50% by weight based on the weight of the polymer of at least one ethylenically unsaturated monomer; from about 0.1% to about 10% by weight based on the weight of the polymer of photoinitiator; and from about 0.01% to about 2% by weight based on the weight of the polymer of a stabilizer on a support to form a photopolymer element, (b) exposing to actinic light selected areas of said photopolymer composition on said support until substantial cross-linking takes place in the exposed areas without significant cross-linking in the unexposed areas, and (c) removing the unexposed areas of photopolymer composition by washing the plate with an aqueous detergent solution.

Abstract: Process of enlarging image areas covered by a stencil or relief image area formed in a photopolymer mask consisting essentially of (a) contacting said image area with a swelling agent and optionally a diluent to effect enlargement, and (b) removing excess swelling agent, i.e., evaporation, air impingement including heating. Additional image enlargement is possible by further contacting the image with a more concentrated swelling agent. The process is particularly useful in enlarging halftone image dots of photopolymer litho masks wherein the halftone image areas consist of hardened upper skins which rest on softer undervolumes having a lesser degree of polymerization or hardening.

Abstract: A light-sensitive mixture is described, which is specially intended for the production of planographic printing plates and which contains, as the light-sensitive compound, a naphthoquinonediazide sulfonic acid ester of the general formula I ##STR1## in which D is the 1,2-naphthoquinone-2-diazide-5-sulfonyl radical or the 1,2-naphthoquinone-2-diazide-4-sulfonyl radical, preferably the 1,2-naphthoquinone-2-diazide-5-sulfonyl radical, R and R' are hydrogen atoms, alkyl groups having 1 to 4 carbon atoms or radicals of the formula DO, and n denotes an integer from 6 to 18, preferably from 8 to 14. The new compounds are distinguished by good solubility and produce layers which have a high resistance to alkaline developer solutions and to damping solution containing alcohol.

Abstract: A photosensitive plate suitable for preparation of a waterless lithographic printing plate, which comprises a support material and a photosensitive layer provided thereon, said photosensitive layer being made of a photosensitive composition comprising an emulsion polymerization product of an acrylic or methacrylic monomer having a perfluoroalkyl group in the side chain and a water-soluble photosensitive substance resin whose water-solubility is variable by irradiation of ultraviolet rays.

Abstract: Multilayer photosolubilizable litho element comprising (1) support, (2) photosolubilizable dye or pigment-containing layer having an optical density in the visible region of the spectrum of at least 2.0 comprising a quinone diazide and at least one acidic polymeric binder, and (3) photosolubilizable layer comprising a quinone diazide compound and at least two acidic polymeric binders having carboxylic acid substituents, one binder having an acid number below 110, preferably poly(methylmethacrylate/methacrylic acid). The element is useful as a single exposure positive contact litho film.

Abstract: A developer for a light-sensitive lithographic printing plate having an o-quinonediazide-containing light-sensitive layer is disclosed. The developer is comprised of an aqueous solution of an alkali silicate containing an organic boron compound. The organic boron compound is represented by the formula ##STR1## the substituents are defined within the specification. By utilizing the developer of the invention it is possible to provide excellent developing power, development stability, processability and preferred forming properties during development.