Abstract: A developer for PS plates requiring no dampening water which comprise a substrate provided thereon with a primer layer, photopolymerizable light-sensitive layer and a silicone rubber layer in this order, comprises: (i) an organic solvent which can dissolve or swell non-exposed portions of the photopolymerizable light-sensitive layer and whose solubility in water at ordinary temperature is not more than 20% by weight; (ii) a surfactant; and (iii) water. The developer is excellent in developing properties and dot reproduction, shows high stability and does not cause scratches on the silicone rubber layer during development.

Abstract: A developing fluid for positive-acting, negative-acting and reversible lithographic printing plates comprises a metasilicate as alkali together with an ethylene oxide/propylene oxide block copolymer and, optionally, sodium tetraborate, a phosphate ester, and anti-foaming agent and a water-softening or sequestering agent. The fluid has a high alkali content for reducing the need for frequent replenishment while at the same time minimizing damage to the image particularly in negative and reversed plates and avoiding unacceptable foaming and turbidity.

Abstract: An improved developer for PMMA, electron resist comprising an effective amount of MEK in combination with MIBK or CS alone or a mixture thereof and a process of obtaining improved contrast in electron beam lithography therewith.

Abstract: A relief flexographic printing plate is prepared by image-wise exposure of the "printing face" of a layer of photocurable polymer through a negative 7 and image-wise back exposure of the layer 4 through a support sheet 3 and a positive 6 of the image to be printed, thereby selectively curing the floor regions 9 of the printing plate in register with the uncured areas 8 left in the printing face of said layer.Preferably a further non-selective back exposure operation is carried out for additionally curing the floor regions.

Abstract: Orifices, cavities or spaces which are formed when printing plates are mounted on a plate cylinder are closed and/or sealed by means of a pasty, photocurable sealing or closing compound consisting of one or more photopolymerizable, ethylenically unsaturated low molecular weight compounds (a), one or more polymeric binder (b) which are compatible with the said compounds of component (a), one or more photopolymerization initiators (c) and one or more finely divided oxidic fillers (d) which, when mixed with components (a) to (c), give mixtures which are transparent to long-wavelength UV light. After it has been applied, this sealing or closing compound is cured by exposure and can then be mechanically processed. The process is particularly suitable for closing and/or sealing orifices, cavities or spaces in gravure printing plates mounted on plate cylinders.

Abstract: The invention relates to an automatic machine for the reversal processing of lithographic printing plates which are required to be exposed overall after heating. The method and apparatus of the invention provide that the exposure be effected while the plates are being conveyed through water in a shallow bath.

Abstract: A developing and finishing composition for lithographic printing plates containing:a. a mono-, di-, or tri-sodium potassium or lithium phosphate; andb. benzyl alcohol, phenoxyethanol or phenoxypropanol; andc. polyvinyl pyrrolidone, dextrin, poly (methyl vinyl ether/maleic acid) or gum arabic; andd. citric acid or benzoic acid; ande. sodium or potassium octyl sulfate; andf. sodium, potassium or lithium benzoate; andg. sodium, potassium or ammonium citrate; andh. sodium, potassium or ammonium sorbate; andi. sufficient water to formulate an effective developer.

Abstract: The invention describes a process for the post-treatment of developed relief printing forms for use in flexographic printing. The relief printing forms are reexposed in a customary manner and thereafter treated according to the invention, using a solution which comprises an organic solvent and, dissolved therein, an aryl- or hetaryl-bis(trihalogenomethyl)-s-triazine; they are then dried and briefly reexposed to UV light. The process of the invention eliminates the tackiness of the surfaces of light-hardened flexographic printing forms comprising a photopolymer and it also considerably enhances the resistance of these printing forms to air containing ozone.

Abstract: Method of preparing a contoured plate by selectively hardening a photopolymer plate in a zone which is adjacent the lower surface of the plate and increases continuously in thickness from one portion of the plate to another by a first exposure of the upper surface of the plate to a quantity of light energy which increases continuously per unit area of the surface from said one portion of the plate to the other. Discrete portions of the upper surface of the plate are masked in the portions on which it is desired to form a recessed design, and the non-masked portions of the plate are hardened by a second exposure of its upper surface to light energy, so that the masked portions remain unhardened from their upper surface to the upper region of said hardened zone. The unhardened portions are removed to provide a recessed design in the upper surface of the plate. The design varies continuously in depth independently of the width of the design.

Abstract: A continuous plate making method for a photosensitive resin plate which comprises setting the photosensitive resin plate on a surface of an endless belt or a setting plate which moves on a substantially circular orbit, and continuously subjecting the plate to, at least, washing out, drying and then post light exposure steps as the belt or the setting plate moves continuously. A device for carrying out this method is also disclosed.

Abstract: A burn-in gumming composition for irradiated and developed offset printing plates comprises water and a water-soluble polymer or copolymer for protecting the plate surface during the burning-in step and during long-term storage. The polymer or copolymer used contains sulfonic acid groups and/or alkali metal sulfonate or ammonium sulfonate groups.

Abstract: A method for supplementing a replenisher for developer which comprises developing a large number of PS plates imagewise exposed to light with a developer composed of an aqueous solution containing electrolytes in an automatic developing machine, characterized by determining an AC impedance of the developer contained in the automatic developing machine, obtaining a correction impedance from the measured impedance value and rate of replacement and supplementing a desired amount of the replenisher to the developer when the correction impedance reaches a predetermined value. This method makes it possible to maintain a desired activity of the developer even when a large number of PS plates are processed and to relax the restriction on the incorporation of optional devices such as an autofeeder into the automatic developing machine.

Abstract: Disclosed is a method for the manufacture of a lithographic printing plate where a photosensitive lithographic printing plate precursor is imagewise exposed, a determined about of a developer is supplied to the exposed surface and the developer is the disposed of. A surfactant is added to the developer so that the surface tension of the developer is about 50 dyne/cm or less at 25.degree. C. By the addition of the surfactant, a stable and economical development of an exposed plate is possible with a small amount of the surfactant-containing developer.

Abstract: Disclosed is a process for preparing an image-bearing plate for use in a lithographic printing plate, a photoresist or the like. The process comprises, after imagewise exposing a light-sensitive plate comprising a support having provided thereon a light-sensitive layer comprising a compound capable of producing an acid upon irradiation with actinic rays, a compound having at least one acid-decomposable group, and an alkali-soluble resin, treating the exposed plate with hot water of at least 25.degree. C. for a period of at least 10 seconds, prior to development. It is possible to achieve high sensitivity regardless of the interval between the exposure and the development.

Abstract: An improved developer for PMMA electron resist comprising an effective amount of MEK in combination with MIBK or CS alone or a mixture thereof.

Abstract: The pattern-wise photoresist layer formed on the surface of a substrate according to the inventive method is imparted with a greatly improved resolving power as a result of complete removal of the scum residua left after the development treatment. Namely, the positive-working photoresist layer formed on the substrate surface is exposed pattern-wise to actinic rays, developed with a developer solution which is typically a 2-7% aqueous solution of a quaternary ammonium hydroxide and then rinsed with a scum-remover solution which is a mixture of 100 parts of a 0.1-1.5% aqueous solution of a quaternary ammonium hydroxide and 1-30 parts of a water-miscible organic solvent and capable of dissolving away the scum residua in the pattern-wise photoresist layer without affecting the quality of the photoresist pattern reproduction.

Abstract: A developing and finishing composition for lithographic printing plates containing:a. a mono-, di-, or tri-sodium, potassium or lithium phosphate; andb. benzyl alcohol, phenoxyethanol or phenoxypropanol; andc. polyvinyl pyrrolidone, dextrin, poly (methyl vinyl ether/maleic acid) or gum arabic; andd. citric acid or benzoic acid; ande. sodium or potassium octyl sulfate; andf. sodium, potassium or lithium benzoate; andg. sodium, potassium or ammonium citrate; andh. sodium, potassium or ammonium sorbate; andi. sufficient water to formulate an effective developer.

Abstract: A liquid photosensitive composition is introduced into a hollow cylindrical element and the latter is spun at a high speed to centrifugally deposit the liquid photosensitive composition uniformly on the inner surface of the hollow cylindrical element and cause the resin composition to cure in situ. The above process provides a seamless cylindrical photosensitive resin structure. After the centrifugal formation of a photosensitive resin layer on the inner surface of the hollow cylindrical element, the photosensitive resin may be back-exposed from within the hollow cylindrical element and relief-exposed from outside of the hollow cylindrical element though an image carrier.By the above method, resin plates and particularly those suited for flexographic printing can be manufactured, and using these resin plates, seamless image printing can be performed.

Abstract: A developer composition for a lithographic printing plate provided with a coated layer composed of a photosensitive polymer having in the main chain thereof groups of formula (I) ##STR1## wherein X and Y independently represent hydrogen, halogen, cyano or nitro and n is an integer of 1 or 2, comprising:(A) benzyl alcohol,(B) tetrahydrofurfuryl alcohol and(C) at least one acid selected from the group consisting of a mineral acid, an organic carboxylic acid and an organic sulfonic acid.

Abstract: Process for producing negative or positive images from a photohardenable electrostatic master comprising an electrically conductive substrate bearing a photohardenable layer containing a photoinhibitor and a visible light sensitizer wherein the negative image (1) is prepared by (a) imagewise exposing to visible radiation, (b) charging electrostatically the master, (c) developing the charged image with an electrostatic toner, e.g., liquid electrostatic developer, and (d) transferring the toner image to a surface, e.g., paper. The positive image (2) is prepared by (a) imagewise exposing to ultraviolet radiation. (b) exposing overall to visible radiation followed by steps (b), (c) and (d) above. Multiple images can be prepared from the same master as well as color proofs using different color toners or developers and transferring in register over the original image.

Abstract: A developer composition having a pH in the range of from about 6.5 to about 7.5 comprising in admixture:(a) from about 0.1% to about 20% by weight of the developer of one or more compounds selected from the group consisting of sodium octyl sulfate, sodium tetradecyl sulfate, sodium 2-ethyl hexyl sulfate and ammonium lauryl sulfate; and(b) from about 0.1% to about 30% by weight of the developer of one or more components selected from the group consisting of lithium salts of hydroxy, aryl and alkyl carboxylic acids; and(c) from about 0.1% to about 30% by weight of the developer of one or more compounds selected from the group consisting of potassium salts of hydroxy, aryl and alkyl carboxylic acids; and(d) from about 0.5% to about 3.

Abstract: This invention presents terpene-based solvents suitable for use in the processing of a wide variety of photopolymer printing plates. The solvents, which may be terpenes alone, terpenes mixed with organic non-solvents, or terpenes emulsified with water are effective in developing a wide variety of photopolymer printing plates and can produce images superior to those obtained with commercially available solvents currently used in such applications.

Abstract: Relief plates which are produced by imagewise photopolymerization of layers which contain, as binders, block copolymers of conjugated dienes and vinylaromatics are aftertreated with an aqueous solution of a mixture of bromates, bromides and acids by a process in which amidosulfonic acid and/or aliphatic di-, tri- and/or tetracarboxylic acids are used as the acids.

Abstract: A radiation-sensitive recording material comprising a support and first and second radiation-sensitive layers is disclosed. The first radiation-sensitive layer comprises a 1,2-quinone diazide as the radiation-sensitive compound and the second radiation-sensitive layer comprises (a) a compound which forms a strong acid under the action of actinic radiation, (b) a compound which has at least one acid-cleavable C-O-C bond and (c) a polymeric binder. The recording material has an improved storage stability as compared with materials which comprise only radiation-sensitive layers based on acid-cleavable compounds.

Abstract: An emulsion type desensitizing gum comprises at least one polybasic acid monoester derivative of polysaccharide. The desensitizing gum exhibits high shelf stability and the lithographic printing plate to which the desensitizing gum has been applied hardly causes the background contamination of printed matters and is excellent in both the ink receptivity of the image areas and the desensitizing ability of the non-image areas.

Abstract: This invention provides a developing method for photosensitive materials, in particlar for a positive photosensitive lithographic printing plate, which enables an efficient development with minimum consumption of the developing liquid. The developing method of the present invention comprises the steps of: conducting a preparatory development by applying a developing liquid to an exposed photosensitive layer of a photosensitive material, the developing liquid being supplied in an amount of necessary for each developing cycle; removing the developing liquid; discarding the developing liquid; and again applying a developing liquid to the photosensitive material to complete the development.

Abstract: This invention provides a method for deleting images formed on offset printing plates which comprises treating the surface of undesired portion of the images formed by exposure and development with a deletion fluid which contains a ferric complex salt of an organic acid and 0.3 mol/liter or more of at least one compound selected from the group consisting of a soluble bromide and a soluble iodide. Preferred ferric complex salt is a ferric complex salt of aminopolycarboxylic acid.

Abstract: The aqueous developing solution of the invention for positive-working photoresist compositions contains, in addition to an organic basic compound free from metallic ions, such as tetramethyl ammonium hydroxide and choline, as the principal ingredient, from 50 to 5000 ppm of an acetylene alcohol. In comparison with conventional developing solutions, the inventive developing solution is advantageous in the uniformity of the patterned photoresist layer, higher sensitivity and smaller temperature dependency of development and less drawbacks due to foaming of the solution.

Abstract: A light-sensitive mixture that contains a diazonium salt polycondensation product, a polymeric binder and an organic peroxide which has a scorch temperature of at least 100.degree. C. and, above this temperaure, is capable of forming free radicals is especially useful for the preparation of planographic printing plates, the print run of which can be extended by burning-in the exposed and developed plate. The light-sensitive mixture has a long storage life in the dark.

Abstract: An aqueous developing solution useful in developing positive-working photoresists comprising:______________________________________ A. Soluble Alkali Metal Phosphate 1.50-3.00% by weight B. Soluble Alkali Metal Silicate 1.00-2.00% by weight C. Mono (lower alkanol) amine 0.40-5.00% by weight D. Soluble Alkylene Glycol 0.25-3.00% by weight E. Lower Alkanol 0.05-1.00% by weight F.

Abstract: A positive photoresist metal ion aqueous developer is provided that gives a high contrast to the photoresist.The developer disclosed comprises a formulation of aqueous alkali-base such as potassium hydroxide and a carboxylated surfactant. The incorporation of the carboxylated surfactant provides the unexpected increase in the contrast of the photoresist. The addition of the carboxylated surfactant increases the gamma from a typical photoresist gamma (.gamma.) of 3 or less to a gamma greater than 5.The high contrast photoresist provides linewidth control and affords improved process latitude in photoresist imaging. The linewidth control is particularly critical in cases where fine lines are to be defined in the resist that covers steps of topography on the coated substrate. The higher the contrast, the less affected the resist by the topography, provided the exposure is adequate to expose the resist.

Abstract: A developer composition for heavy duty printing plates which comprises in admixture:(a) propylene glycol monomethyl ether or dipropylene glycol monomethyl ether; and(b) benzyl alcohol and/or phenoxyethanol; and(c) ethylene carbonate and/or propylene carbonate; and(d) ethylene glycol diacetate; and(e) sodium benzoate and/or lithium benzoate; and(f) benzoic acid and/or citric acid; and(g) ethylene glycol, propylene glycol and/or glycerin; and(h) sufficient water to formulate an effective developer;wherein the percentages are based on the weight of the developer composition.

Abstract: High contrast, sensitivity and bath life is obtainable by the addition of inorganic salts, preferably a carbonate, to an aqueous alkali metal base containing a carboxylated surfactant. The preferred alkali metal bases are potassium hydroxide or sodium hydroxide. The carboxylated surfactants contemplated by the invention are those encompassed with the formula:R--O--(CH.sub.2 H.sub.4 O).sub.n --CH.sub.2 --COOXwherein R is a hydrocarbon radical of 6-18 carbon atoms alkyl radical, n has a value of 1-24 and X is a cation such as K.sup.+, Na.sup.+, or H.sup.+. The gain in sensitivity with the incorporation of an inorganic compound furnishing ions, typically an inorganic salt, to the developer with the carboxylated surfactant compared to the sensitivity obtained with developers with carboxylated surfactant and inorganic salts omitted was typically two fold and greater without a corresponding film loss. Examples of salts are those that contain the anions SO.sub.4.sup.2-, CO.sub.3.sup.2-, Cl.sup.-, PO.sub.4.sup.

Abstract: The aqueous developer solution for a positive-working photoresist composition comprises, as dissolved in an aqueous solvent, a water-soluble organic basic compound and a specific non-ionic surface active agent which may be an alkyl-substituted phenyl or naphthyl ether of polyoxyethyleneglycol in a specified concentration. The developer solution is advantageous in respect of the completeness of removal of film residua and scums from the substrate surface after development so that the patterned photoresist layer is imparted with greatly increased accuracy and fidelity of the pattern reproduction.

Abstract: Compositions and methods for developing quinone diazide positive-working photoresists. The compositions consist essentially of an aqueous solution of a tetraalkylammonium hydroxide primary alkali and an alkanolamine having the following structure: ##STR1## wherein n is zero or 1, and each R is independently selected from hydrogen, methyl, or ethyl. The methods involve use of this composition to develop the indicated photoresists. The addition of an alkanolamine of the indicated type prevents the formation of irregular deposits on the edges of unexposed portions of the photoresist lines when the photoresist is developed. Selection of these alkanolamines also increases the uniformity of line widths of photoresist lines developed according to the present invention, and increases the process latitude of the developer.

Abstract: The invention provides a composition which comprises from about 3 to about 50% by weight of a hexa-alkyl disilazane and a solvent composition which comprises one or more compounds selected from the group consisting of a propylene glycol alkyl ether and a propylene glycol alkyl ether acetate.

Abstract: An improved process for detackifying imagewise exposed and solvent-developed photopolymeric flexographic relief printing plates wherein an aprotic organic solvent is applied to the surface of the printing plate prior to irradiation with wavelengths in the 200 to 300 nm range.

Abstract: An organic solvent free developing composition which comprises an aqueous admixture having a pH of from about 6.8 to about 7.2 of(a) one or more components selected from the group consisting of tri-sodium, -lithium, or -potassium phosphate, or sodium, lithium or potassium carbonate; and(b) one or more components selected from the group consisting of sodium, lithium, or potassium benzoate or salicylate; and(c) one or more components selected from the group consisting of sodium, lithium, potassium, magnesium or calcium octyl, decyl or dodecyl sulfate; and(d) one or more components selected from the group consisting of mono-sodium, -lithium, or -potassium phosphates and carbonates, and(e) sufficient water to formulate an effective developer.

Abstract: A gumming solution is disclosed for use in the burning-in of irradiated and developed offset-printing plates. The gumming solution contains (a) water, (b) at least one hydrophilic polymer, and (c) at least one component derived from an organic acid. Component (b) comprises, for example, N-polyvinyl-pyrrolidone-(2) or polyacrylic acid, and component (c) comprises a water-soluble organic carboxylic acid, sulfonic acid, or phosphonic acid which has at least two acid functions and which is selected from the group consisting of benzene carboxylic acids, benzene sulfonic acids, benzene phosphonic acids, and alkane phosphonic acids, or one of the salts thereof (for example, disodium-benzene-1,3-disulfonate, mellitic acid, or methane-diphosphonic acid.) A process for the production of an offset-printing plate, using the aforesaid gumming solution in the burning-in of the plate, is also disclosed.

Abstract: The invention provides a method for developing negative working photographic elements using an aqueous developer comprising(a) a solvent composition consisting essentially of(i) n-propanol or isopropanol; and(ii) a glycol ether or acetate(b) a salt which is preferably magnesium sulfate; and(c) an ethoxylated alkyl phenol type non-ionic surfactant.

Abstract: The aqueous developing solution of the invention for positive-working photoresist compositions contains, in addition to an organic basic compound free from metal ions, such as tetramethyl ammonium hydroxide and choline, as the principal ingredient, from 50 to 5000 ppm of an anionic or non-ionic fluorine-containing surface active agent of specific types. In comparison with conventional developing solutions without such a surface active agent, the inventive developing solution is advantageous in the uniformity of the patterned photoresist layer and higher sensitivity and smaller temperature dependency of development.

Abstract: The invention provides an organic solvent free, phosphate free, lithographic desensitizing composition which comprises:(a) from about 0.1% to about 20.0% by weight of the composition of a copolymer of polymethyl vinyl ether and maleic acid having the formula ##STR1## which has a molecular weight in an amount of from about 20,000 to about 70,000; and(b) from about 0.1% to about 20.0% by weight of the composition of a desensitizing component comprising one or more hydroxy carboxylic acids or salts; and(c) sufficient water to formulate a desensitizing composition; and(d) sufficient base to adjust the pH of the composition into the range of from about 6.5 to about 7.5.

Abstract: An organic solvent free developer composition having a pH in the range of from about 6.5 to about 7.5 comprising in admixture:(a) from about 0.1% to about 20% by weight of the developer of one or more compounds selected from the group consisting of sodium octyl sulfate, sodium tetradecyl sulfate, sodium 2-ethyl hexyl sulfate and ammonium lauryl sulfate; and(b) from about 0.1% to about 30% by weight of the developer of one or more components selected from the group consisting of lithium salts of hydroxy, aryl and alkyl carboxylic acids; and(c) from about 0.1% to about 30% by weight of the developer of one or more compounds selected from the group consisting of potassium salts of hydroxy, aryl and alkyl carboxylic acids; and(d) an optional compatible organic or inorganic acid or base in an amount sufficient to adjust the pH of the developer composition into the range of from about 6.5 to about 7.5; and(e) an optional anti-foam component in an amount of from about 0.02 to about 0.

Abstract: This invention is a method for preventing sticking of a resin plate surface by coating the solution of binder and photopolymerizable monomer on the surface of a photosensitive resin composed of binder, photopolymerizable monomer, and photopolymerization initiator, developing relief images by a photomechanical process, and then by drying the coating solution.

Abstract: A desensitizing gum comprising an aqueous solution of water-soluble and film-forming hydroxyalkylated starch, characterized in that the degree of etherification of the hydroxyalkylated starch is 0.03 to 0.08 and the gum further contains at least one member selected from the group consisting of anionic and nonionic surfactants.

Abstract: The present invention provides a method of treating photosensitive printing plate, which comprises subjecting a photosensitive lithographic plate to exposure, development and burning-in treatment, characterized in that an aqueous solution containing phytic acid and aminobenzenesulfonic acid is applied to the lithographic plate after the development but prior to the burning-in treatment and then the burning-in treatment is conducted in the presence of these compounds.According to the invention, there can be prepared a lithographic plate free from background stain and having an excellent ink-receptive property in its image-forming area.

Abstract: Screen printing stencil for making sealing layers of elastomer material on a flat gasket. A screen carrying a photoresist layer exhibits areas of increased height on the side with which it is made to contact the flat gasket, in order to simultaneously produce sealing layer areas of different thicknesses. To make such a screen printing stencil, its screen is first provided with a first photoresist layer in which areas are then delimited by means of adhesive tapes, following which these areas may be coated with a second photoresist layer. The desired screen printing stencil is then obtained by both photoresist layers being jointly exposed and the non-exposed areas of the photoresist material being washed out.

Abstract: A process is described for cementing together the edges of photopolymerizable flexographic printing elements for printing plates that contain as an elastomeric binder a block copolymer whose polymer blocks are polystyrene and polyisoprene and/or polybutadiene or their copolymers.

Abstract: A developer for lithographic proof films is described. The developer composition contains a glycol acetate, a cyclic alkyl glycol, a surfactant and a cosolvent, all present in a water base. No nonaqueous component of the composition exceeds 30 weight percent of the composition. The compositions are nontoxic, nonflammable and have good odor characteristics while providing developer properties equal or superior to the high solvent content developers of the prior art. The developers may be used to develop both process color films and opaque films.

Abstract: A developer for positive photoresists which can improve the sensitivity and resolution of the resist is disclosed. The developer comprises an aqueous solution of a quaternary ammonium hydroxide represented by the formula (I): ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, and R.sub.4 are each an alkyl group having 1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 5 carbon atoms, and at least one development modifier selected from the group consisting of water-soluble aliphatic ketones, cyclic ethers, and tertiary amines, and optionally, at least one another development modifier selected from the group consisting of water-soluble primary amines and secondary amines.