Heat Applied Before Imaging Patents (Class 430/349)
  • Publication number: 20140054827
    Abstract: The present invention relates to a method of producing color change in a substrate. The substrate includes an activatable colorant and a region that is heated prior to activating the activatable colorant. The substrate is exposed to electromagnetic radiation producing a first activated color region in the heated region and a second activated color region in a non heated region. The first activated color region appears in a different shade than the second activated color region.
    Type: Application
    Filed: September 20, 2013
    Publication date: February 27, 2014
    Applicant: The Procter & Gamble Company
    Inventors: Timothy Ian MULLANE, Kelyn Anne ARORA
  • Publication number: 20120242009
    Abstract: The present invention relates to a method of producing color change in a substrate. The substrate includes an activatable colorant and a region that is heated prior to activating the activatable colorant. The substrate is exposed to electromagnetic radiation producing a first activated color region in the heated region and a second activated color region in a non heated region. The first activated color region appears in a different shade than the second activated color region.
    Type: Application
    Filed: March 22, 2011
    Publication date: September 27, 2012
    Inventors: Timothy Ian Mullane, Kelyn Anne Arora
  • Patent number: 7887998
    Abstract: Disclosed is a silver halide photographic light-sensitive material comprising at least one silver halide emulsion layer and at least one hydrophilic colloid layer on a support, wherein silver halide in the silver halide emulsion layer has a silver bromide content of 40 to 90 mol %, and the silver halide emulsion layer is spectrally sensitized with a specific dye.
    Type: Grant
    Filed: June 4, 2007
    Date of Patent: February 15, 2011
    Assignee: Fujifilm Corporation
    Inventors: Mitsunori Hirano, Kunio Ishigaki
  • Patent number: 7498122
    Abstract: A solvent-less process for producing a transient document which is capable of self-erasing, wherein the solvent-less process includes a) heating and reacting a photochromic compound and a polymer to form a coating composition, and b) coating the coating composition onto an image-receiving side of a transient document substrate, and further an image forming method using the same solvent-less process and including (i) providing a reimageable medium of a substrate and a photochromic material, wherein the medium is capable of exhibiting a color contrast and an absence of the color contrast; (ii) exposing the medium to an imaging light corresponding to a predetermined image to result in an exposed region and a non-exposed region, wherein the color contrast is present between the exposed region and the non-exposed region to allow a temporary image corresponding to the predetermined image to be visible for a visible time; (iii) subjecting the temporary image to an indoor ambient condition for an image erasing time t
    Type: Grant
    Filed: August 30, 2005
    Date of Patent: March 3, 2009
    Assignee: Xerox Corporation
    Inventors: Gabriel Iftime, Peter M. Kazmaier, Naveen Chopra, San-Ming Yang, Raymond W. Wong
  • Patent number: 7468241
    Abstract: Use of certain compounds in black-and-white photothermographic materials improves processing latitude particularly under conditions of high humidity.
    Type: Grant
    Filed: September 21, 2007
    Date of Patent: December 23, 2008
    Assignee: Carestream Health, Inc.
    Inventors: Doreen C. Lynch, William D. Ramsden, Sharon M. Simpson, Chaofeng Zou
  • Patent number: 7465533
    Abstract: A photothermographic material having a support, an image forming layer which is disposed on the support and contains at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder, at least one non-photosensitive layer which is disposed on the same side of the support as the image forming layer and farther from the support than the image forming layer, and a back layer which includes at least another non-photosensitive layer and is disposed on the opposite side of the support from the image forming layer, wherein the back layer contains a fluorocarbon polymer having a monomer component represented by the following (M2): (M2) a monomer containing a fluorine atom and having an unsaturated bond capable of radical polymerization. An image forming method is also provided.
    Type: Grant
    Filed: March 26, 2007
    Date of Patent: December 16, 2008
    Assignee: FUJIFILM Corporporation
    Inventors: Minoru Sakai, Yoshihisa Tsukada
  • Publication number: 20080241769
    Abstract: A film consisting essentially of a continuous phase linear polyester matrix having dispersed therein a non-crosslinked random SAN-polymer and dispersed or dissolved therein at least one ingredient from the group of ingredients consisting of inorganic opacifying pigments, whitening agents, colorants, UV-absorbers, light stabilizers, antioxidants and flame retardants, wherein the film is white, microvoided, non-transparent and axially stretched; the linear polyester matrix has monomer units consisting essentially of at least one aromatic dicarboxylic acid, at least one aliphatic diol and optionally at least one aliphatic dicarboxylic acid; and the weight ratio of the linear polyester to the non-crosslinked SAN-polymer is in the range of 2.0:1 to 19.
    Type: Application
    Filed: March 26, 2008
    Publication date: October 2, 2008
    Inventors: Dirk QUINTENS, Peter Bries
  • Publication number: 20080020290
    Abstract: There is disclosed a negative resist composition comprising, at least, a polymer comprising a repeating unit of hydroxy vinylnaphthalene represented by the following general formula (1). There can be provided a negative resist composition, in particular, a chemically amplified negative resist composition that can exhibit higher resolution than conventional hydroxy styrene or novolac negative resist compositions, that provides excellent pattern profiles after being exposed and that exhibits excellent etching resistance; and a patterning process that uses the resist composition.
    Type: Application
    Filed: June 12, 2007
    Publication date: January 24, 2008
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takanobu Takeda
  • Publication number: 20080020289
    Abstract: There is disclosed a polymer comprising: at least, a repeating unit of substitutable hydroxy styrene and a repeating unit of substitutable hydroxy vinylnaphthalene which are represented by the following general formula (1). There can be provided a polymer suitable as a base resin of a positive resist composition, in particular, a chemically amplified positive resist composition that can exhibit higher resolution than conventional positive resist compositions, that provides excellent pattern profiles after being exposed and that exhibits excellent etching resistance; a positive resist composition and a patterning process that use the polymer.
    Type: Application
    Filed: June 12, 2007
    Publication date: January 24, 2008
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Takanobu Takeda
  • Patent number: 7314705
    Abstract: A composition, method, and system for recording an image. The system includes an imaging material in which radiation energy is absorbed by an antenna material. The antenna material may be chosen from the group consisting of phthalocyanines and naphthalocyanines.
    Type: Grant
    Filed: June 2, 2006
    Date of Patent: January 1, 2008
    Assignee: Hewlett-Packard Development Company, L.P.
    Inventor: Makarand P. Gore
  • Patent number: 7309564
    Abstract: A photothermographic material including, on at least one surface of a support, at least a photosensitive silver halide containing a silver iodide at 40 mol % or more, a non-photosensitive organic silver salt, and a reducing agent, wherein the photothermographic material contains two or more kinds of the reducing agent at the mixing ratio to satisfy at least one of a), b), c) and d): a) a difference between a sensitivity or b) a difference between a maximum density is 0.10 or less, when developed at 120° C. for 10 sec and a sensitivity when developed at 120° C. for 14 sec; c) a difference between a sensitivity or d) a difference between a maximum density is 0.10 or less, when developed at 117° C. for 12 sec and a sensitivity when developed at 123° C. for 12 sec. An image forming method using the photothermographic material is also provided.
    Type: Grant
    Filed: November 9, 2005
    Date of Patent: December 18, 2007
    Assignee: Fujifilm Corporation
    Inventors: Yasuhiro Yoshioka, Katsutoshi Yamane, Yasuhiko Goto
  • Patent number: 7270933
    Abstract: An organic anti-reflective coating composition and a method for forming a photoresist pattern using the same in order to improve uniformity of the pattern in an ultra-fine pattern formation process of the photoresist. In one aspect, organic anti-reflective coating composition contains a light absorbent agent, a cross-linking agent, a thermal acid generator, and a formanilide photo-base generator.
    Type: Grant
    Filed: November 2, 2004
    Date of Patent: September 18, 2007
    Assignee: Hynix Semiconductor Inc.
    Inventor: Jae Chang Jung
  • Patent number: 7220536
    Abstract: A photothermographic imaging material comprising a support having thereon, (a) a photosensitive layer containing an organic silver salt, photosensitive silver halide grains, a reducing agent and a binder, (b) a light-insensitive layer, and (c) a protective layer, wherein a weight reducing value from 25° C. to 100° C. by a heat drying weight measurement of the photographic imaging material is not more than 0.4% based on a weight value at 25° C.
    Type: Grant
    Filed: October 17, 2005
    Date of Patent: May 22, 2007
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventors: Koji Kuwano, Takayuki Sasaki, Kazuhiro Kido
  • Patent number: 7205093
    Abstract: A method of forming a top coat layer and a topcoat material for use in immersion lithography. A topcoat layer is formed on a photoresist layer from an aqueous solution that is immiscible with the photoresist layer. The topcoat layer is then rendered insoluble in neutral water but remains soluble in aqueous-base developer solutions so the photoresist may be exposed in a immersion lithographic system using water as the immersion fluid, but is removed during photoresist development. The topcoat materials are suitable for use with positive, negative, dual tone and chemically amplified (CA) photoresist.
    Type: Grant
    Filed: June 3, 2005
    Date of Patent: April 17, 2007
    Assignee: International Business Machines Corporation
    Inventor: William Dinan Hinsberg, III
  • Patent number: 7175978
    Abstract: A photothermographic imaging material packed in a packaging material, the imaging material including a support having thereon light-insensitive organic silver salt grains, photosensitive silver halide grains, a reducing agent for silver ions and a binder, wherein the packaging material has a water permeability of not less than 5.0 g/m2 measured at a temperature of 40° C. with a relative humidity of 90% for 24 hours; and the imaging material has a first photographic speed and a second photographic speed and the second photographic speed is not more than 1/10 of the first photographic speed, the measuring methods of the first and the second photographic speeds being defined in the specification.
    Type: Grant
    Filed: January 14, 2005
    Date of Patent: February 13, 2007
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventor: Keiko Maeda
  • Patent number: 7175967
    Abstract: Positive-working imageable elements are prepared by providing a first layer and second layers onto a substrate. Both layers include the same or different radiation absorbing compounds dispersed within different polymeric binders. After both layers are dried, they are heat treated at from about 40 to about 90° C. for at least 4 hours under conditions that inhibit the removal of moisture from the dried first and second layers. This method of preparation provides elements with improved imaging speed and good shelf life.
    Type: Grant
    Filed: March 2, 2006
    Date of Patent: February 13, 2007
    Assignee: Eastman Kodak Company
    Inventors: James L. Mulligan, Eric Clark, Kevin B. Ray
  • Patent number: 7132226
    Abstract: A photothermographic material comprising a support, and an image-forming layer and a non-image-forming layer provided on the support, wherein the image-forming layer comprises a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent, and a binder; the non-image-forming layer includes a slipping agent having a melting point of 80° C. to 120° C.; the coefficient (K1) of dynamic friction measured at a velocity of 0.1 cm/sec and the coefficient (K2) of dynamic friction measured at a velocity of 10 cm/sec have a relation represented by formula (1): Formula (1) 1.20>K1/K2>0.90. Also provided is an image-forming method using the photothermographic material.
    Type: Grant
    Filed: September 22, 2005
    Date of Patent: November 7, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Katsutoshi Yamane
  • Patent number: 7115358
    Abstract: The present invention provides a black and white photothermographic material having, on at least one side of a support, an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for silver ions, and a binder, as well as an image forming method. The black and white photothermographic material is characterized in that 1) the non-photosensitive organic silver salt includes at least one compound selected from the group consisting of a silver salt of an azole compound and a silver salt of a mercapto compound, and 2) the photosensitive silver halide has a spectral sensitizing dye in the form of a multilayer adsorbed on its surface. According to the invention, an improved black and white photothermographic material and image forming method realizing high sensitivity, favorable gradation, and less dependence on developing process conditions are provided.
    Type: Grant
    Filed: May 20, 2005
    Date of Patent: October 3, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Takeshi Funakubo, Takeshi Suzumoto
  • Patent number: 7101653
    Abstract: A laser-engravable flexographic printing element comprising an elastomeric, relief-forming, laser-engravable, thermally and/or photochemically crosslinkable layer comprising, as binder, at least 5% by weight of syndiotactic 1,2-polybutadiene having a content of 1,2-linked butadiene units of from 80 to 100%, a degree of crystallinity of from 5 to 30% and a mean molecular weight of from 20,000 to 300,000 g/mol on a flexible, dimensionally stable support. The elastomeric, relief-forming, laser-engravable layer preferably comprises: (a) from 50 to 99.9% by weight of one or more binders as component A consisting of (a1) from 5 to 100% by weight of syndiotactic 1,2-polybutadiene having a content of 1,2-linked butadiene units of from 80 to 100%, a degree of crystallinity of from 5 to 30% and a mean molecular weight of from 20,000 to 300,000 g/mol as component A1, and (a2) from 0 to 95% by weight of further binders as component A2, (b) from 0.
    Type: Grant
    Filed: April 15, 2002
    Date of Patent: September 5, 2006
    Assignee: XSYS Print Solutions Deutschland GmbH
    Inventors: Jürgen Kaczun, Jens Schadebrodt, Margit Hiller
  • Patent number: 7037791
    Abstract: In accordance with the objects of this invention, a new method of fabricating a polysilicon gate transistor is achieved. An alternating aperture phase shift mask (AAPSM) is used to pattern polysilicon gates in a single exposure without a trim mask. A semiconductor substrate is provided. A gate dielectric layer is deposited. A polysilicon layer is deposited. The polysilicon layer, the gate dielectric layer and the semiconductor substrate are patterned to form trenches for planned shallow trench isolations (STI). A trench oxide layer is deposited filling the trenches. The trench oxide layer is polished down to the top surface of the polysilicon layer to complete the STI. A photoresist layer is deposited and patterned to form a feature mask for planned polysilicon gates. The patterning is by a single exposure using an AAPSM mask. Unwanted features in the photoresist pattern that are caused by phase conflicts overlie the STI. The polysilicon layer is etched to form the polysilicon gates.
    Type: Grant
    Filed: April 30, 2002
    Date of Patent: May 2, 2006
    Assignee: Chartered Semiconductor Manufacturing Ltd.
    Inventors: Lay Cheng Choo, James Yong Meng Lee, Lap Chan
  • Patent number: 6824961
    Abstract: A heat developing method having the steps of: initially making the overall surface of a heat developing photosensitive material or a photosensitive and thermosensitive recording material (hereinafter called a “heat developing recording material”) to a predetermined temperature not lower than a glass transition temperature and not higher than heat development start temperature; and performing heat development.
    Type: Grant
    Filed: May 16, 2002
    Date of Patent: November 30, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Masaharu Ogawa, Toshitaka Agano
  • Publication number: 20040121263
    Abstract: A process for producing a heat mode-compatible positive planographic printing plate precursor comprising a support and a photosensitive layer whose solubility in an aqueous alkali solution increases upon heat-mode exposure, which includes: applying a photosensitive layer coating solution onto the support, and drying the photosensitive layer coating solution at a drying temperature not less than 150° C. and not greater than 200° C. and for a drying time of 110 seconds or less.
    Type: Application
    Filed: December 12, 2003
    Publication date: June 24, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventors: Kazuto Shimada, Kazuto Kunita, Ippei Nakamura, Ikuo Kawauchi
  • Patent number: 6746829
    Abstract: In a thermal developing method for continuously and thermally developing thermal developing sheets which have a latent image formed thereon by exposure and various sizes, a minimum temperature recovery time required for thermally developing a next thermal developing sheet is determined from physical information about a thermally developed sheet, and the next thermal developing sheet is started to be developed after the minimum temperature recovery time passes.
    Type: Grant
    Filed: February 19, 2002
    Date of Patent: June 8, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Akihiro Hashiguchi
  • Patent number: 6737226
    Abstract: A process for making polyester film base material comprising more than 65 mol % of 1,4-cyclohexanedimethanol (CHDM) of the total glycol component in the polyester material. The film base is prepared by sequentially carrying out the following steps: (a) casting a molten polyester resin in a machine direction onto a casting surface to form a continuous sheet, (b) drafting the sheet by stretching in the machine direction at a stretch ratio of from 2 to 4, and at a temperature ranging from 70° C. to 130° C., (c) tentering the sheet in the transverse direction by stretching at a stretch ratio of from 2 to 4, and at a temperature ranging from 70° C. to 130° C. to obtain a biaxially oriented film, (d) heat-setting the oriented film at an actual temperature of from 160° C. to 200° C., and (e) cooling the heat-set film without substantial detentering to obtain a biaxially oriented, heat-set polyester-based film having a cutting index of 1 to 1.
    Type: Grant
    Filed: October 24, 2002
    Date of Patent: May 18, 2004
    Assignee: Eastman Kodak Company
    Inventors: Yuanqiao Rao, Jehuda Greener, Michael R. Brickey
  • Publication number: 20040067438
    Abstract: The invention relates to a process and apparatus for forming a photopolymerizable element useful as a flexographic printing plate having at least one layer of particulate material. The process includes forming a layer of a molten photopolymerizable material onto a support; and applying the particulate material onto an exterior surface of the photopolymerizable layer opposite the support within 48 hours of forming the layer of photopolymerizable material. The process optionally includes heating of the surface of the photopolymerizable layer.
    Type: Application
    Filed: October 2, 2002
    Publication date: April 8, 2004
    Inventors: Roxy Ni Fan, William John Hommes
  • Publication number: 20040023151
    Abstract: A negative resist material, which comprises at least a high polymer containing repeating units represented by the following general formula (1) and having a weight average molecular weight of 1,000 to 500,000. There is provided a negative resist material, in particular, a negative resist material of chemical amplification type, which shows high sensitivity, resolution, exposure latitude and process adaptability as well as good pattern shape after light exposure, and further shows superior etching resistance.
    Type: Application
    Filed: January 23, 2003
    Publication date: February 5, 2004
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takanobu Takeda, Osamu Watanabe, Wataru Kusaki, Ryuji Koitabashi
  • Patent number: 6670978
    Abstract: A recording apparatus for recording on a recording medium in a heated mode includes a first emitting portion and a second emitting portion. The first emitting portion emits writing light for providing recording spots on the recording medium. The second emitting portion emits sub-heating light for providing heating spots on the recording medium. A distance between the heating spot and the recording spot is substantially constant in a main scanning direction. The recording spots are arranged in a two-dimensional pattern including columns in the main scanning direction and rows in an auxiliary scanning direction. The recording spots aligned in the columns are inclined at a predetermined angle with respect to the main scanning direction. The same number of heating spots as the columns of the recording spots is provided in parallel to the columns and inclined at the predetermined angle with respect to the main scanning direction.
    Type: Grant
    Filed: January 12, 2001
    Date of Patent: December 30, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Yoshiharu Sasaki
  • Patent number: 6645704
    Abstract: The present invention is related to a method of making a color photothermographic element such as a capture film intended to be developed to yield an image by the application of heat, preferably without the addition of processing solutions. In particular, this invention relates to the annealing of a photothermographic imaging element prior to storage and use. It has been found that the use of such an annealing process improves raw stock storage and hence, the performance of color photothermographic systems.
    Type: Grant
    Filed: November 26, 2002
    Date of Patent: November 11, 2003
    Assignee: Eastman Kodak Company
    Inventor: David H. Levy
  • Patent number: 6613502
    Abstract: A silver halide color photographic light-sensitive material having at least one blue-sensitive emulsion layer, at least one green-sensitive emulsion layer, and at least one red-sensitive emulsion layer on a transparent support, wherein the transparent support is a plastic support having two surfaces undercoated with an undercoat solution containing at least one compound selected from the group consisting of a water-miscible organic solvent except for alcohols, a substituted phenol having a molecular weight of 200 or less, and a substituted acetic acid in which at least one hydrogen atom on a methyl group of acetic acid is substituted with a halogen atom, and at least one photosensitive emulsion layer contains a specific coupler.
    Type: Grant
    Filed: December 17, 2002
    Date of Patent: September 2, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Naoto Matsuda, Hisashi Mikoshiba
  • Patent number: 6544722
    Abstract: The invention is directed to a process for the preparation of polymer laminated base paper, said process comprising laminating a base paper web on at least one side thereof with at least one polymer layer by extrusion-coating at a coating speed of 300 m/min or more, wherein the said base paper web is heated prior to laminating.
    Type: Grant
    Filed: March 2, 2001
    Date of Patent: April 8, 2003
    Assignee: Fuji Photo Film B.V.
    Inventors: Jan Bastiaan Bouwstra, Ieke de Vries
  • Patent number: 6485896
    Abstract: A photographic film comprising a base layer and at least one emulsion layer, the emulsion layer having a melting temperature that is within 4 degrees centigrade of the incubation temperature used in an accelerated core-set test.
    Type: Grant
    Filed: December 6, 2000
    Date of Patent: November 26, 2002
    Assignee: Eastman Kodak Company
    Inventors: Jehuda Greener, Yongcai Wang, Gary W. Visconte
  • Patent number: 6448183
    Abstract: Disclosed is a method for forming a contact portion of a semiconductor element. An exemplary method includes the steps of depositing an insulation layer on a lower thin film on which there is formed a semiconductor element electrode or a metal wiring pattern, and then realizing an even upper surface of the insulation layer; forming a photosensitive film pattern thereon having a contact or via hole pattern in which inner walls of the contact holes or via holes smoothly curve downward to reach an upper surface of the insulation layer; dry-etching the insulation layer using a mask following the photosensitive film pattern to form contact holes or via holes; removing the photosensitive film pattern, then depositing a barrier metal and tungsten to fill the contact holes or the via holes; and performing a chemical mechanical polishing process to remove the barrier metal and the tungsten from the upper surface of the semiconductor element until the insulation layer is exposed and a flat surface is realized.
    Type: Grant
    Filed: November 11, 2000
    Date of Patent: September 10, 2002
    Assignees: Anam Semiconductor Inc., Ankor Technology, Inc.
    Inventor: Byung-Chul Lee
  • Publication number: 20020123014
    Abstract: A photographic element comprising a polyester support; an antistatic layer; and a transparent magnetic layer comprising a cellulose binder, ferromagnetic particles and a blocked isocyanate.
    Type: Application
    Filed: May 14, 2001
    Publication date: September 5, 2002
    Inventors: Brian K. Brady, Charles L. Bauer, Dennis J. Eichorst
  • Patent number: 6423483
    Abstract: A photographic element comprising a polyester support; an antistatic layer; and a transparent magnetic layer comprising a cellulose binder, ferromagnetic particles and a blocked isocyanate.
    Type: Grant
    Filed: May 14, 2001
    Date of Patent: July 23, 2002
    Assignee: Eastman Kodak Company
    Inventors: Brian K. Brady, Charles L. Bauer, Dennis J. Eichorst
  • Patent number: 6403287
    Abstract: The present invention relates to a process for forming a photoresist pattern which improves its resistance to the harmful effects of post exposure delay. More specifically, it relates to an improved process for forming a photoresist pattern comprising the steps of (a) coating a photoresist composition on a wafer, (b) exposing the coated wafer to patterned light by employing an exposer, and (c) developing the exposed wafer, wherein the improvement comprises raising the temperature of the photoresist to above room temperature when it is coated on the wafer.
    Type: Grant
    Filed: March 10, 2000
    Date of Patent: June 11, 2002
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Jae Chang Jung, Jin Soo Kim, Hyoung Gi Kim
  • Patent number: 6383729
    Abstract: A polyester film is disclosed, exhibiting a minimum value of not more than 0.15 with respect to the tan &dgr; value obtained at a frequency of 0.01 Hz within the range of 100 to 160° C., the tan &dgr; being determined in a tensile viscoelasticity measurement. A photographic support and photothermographic material using this polyester film are also disclosed, which exhibits superior dimensional stability even when subjected to thermal development at a high temperature and little roll set curl when used in a roll form.
    Type: Grant
    Filed: October 13, 2000
    Date of Patent: May 7, 2002
    Assignee: Konica Corporation
    Inventors: Kenji Ohnuma, Hidetoshi Ezure, Yuji Hosoi
  • Publication number: 20020015925
    Abstract: An image forming material comprising a support is disclosed. The support has, on at least one surface, a sublayer comprised of a styrenes-diolefin based copolymer, thereon an antistatic layer comprised of an electrically conductive composition prepared by mixing polymer particles having a functional group on the side chain with a water-soluble polymer, which interacts with said functional group, and thermally treating the resulting mixture at 50 to 90° C., and further having, on said antistatic layer, a layer comprised of a hydrophilic resin.
    Type: Application
    Filed: March 2, 2001
    Publication date: February 7, 2002
    Applicant: KONICA CORPORATION
    Inventors: Tadashi Arimoto, Takayuki Sasaki, Eiichi Ueda, Yasuo Kurachi
  • Publication number: 20020012889
    Abstract: A surface treatment method for enhancing hydrophobicity of the surface of a film support is disclosed, comprising subjecting at least one side of the surface to a gas-discharge plasma treatment in a gas phase atmosphere comprising (a) an inert gas comprising argon or helium and (b) a reactive gas comprising a hydrocarbon gas or fluorinated hydrocarbon gas. There is also disclosed a photothermographic material by the use of the support having been subjected to the surface treatment.
    Type: Application
    Filed: March 6, 2001
    Publication date: January 31, 2002
    Inventors: Kiyoshi Oishi, Kazuhiro Fukuda
  • Patent number: 6329113
    Abstract: The invention relates to an imaging member comprising a base wherein said base comprises at least one layer of heat shrinkable sheet and at least one strength layer.
    Type: Grant
    Filed: June 5, 2000
    Date of Patent: December 11, 2001
    Assignee: Eastman Kodak Company
    Inventors: Robert P. Bourdelais, Peter T. Aylward, Alphonse D. Camp, Geoffrey Mruk
  • Patent number: 6306568
    Abstract: A photographic element comprising a polyester support; an antistatic layer; and a transparent magnetic layer comprising a cellulose binder, ferromagnetic particles and a blocked isocyanate.
    Type: Grant
    Filed: December 29, 2000
    Date of Patent: October 23, 2001
    Assignee: Eastman Kodak Company
    Inventors: Brian K. Brady, Charles L. Bauer, Dennis J. Eichorst
  • Patent number: 6306565
    Abstract: A laser beam is applied to a thermosensitive recording medium including a thermosensitive recording layer disposed on a support base and made of an organic material capable of locally causing a density change commensurate with a change in thermal energy, at a scanning speed of at least 5 m/s for increasing the temperature in the thermosensitive recording layer to record a gradation image thereon with high sensitivity. A sharp temperature gradient is produced along the thickness of the thermosensitive recording layer, so that a density distribution along the depth of the thermosensitive recording layer is developed. Therefore, a high-quality gradation image can be formed without producing any density irregularities caused by thickness irregularities of the thermosensitive recording layer.
    Type: Grant
    Filed: November 2, 1999
    Date of Patent: October 23, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Shinji Imai
  • Publication number: 20010028995
    Abstract: The invention is directed to a process for the preparation of polymer laminated base paper, said process comprising laminating a base paper web on at least one side thereof with at least one polymer layer by extrusion-coating at a coating speed of 300 m/min or more, wherein the said base paper web is heated prior to laminating.
    Type: Application
    Filed: March 2, 2001
    Publication date: October 11, 2001
    Inventors: Jan Bastiaan Bouwstra, Ieke De Vries
  • Patent number: 6228569
    Abstract: A silver halide light sensitive photographic element is disclosed comprising a polyethylene terephthalate film base, at least one light sensitive silver halide-containing emulsion layer, an antihalation undercoat layer, and a process-surviving antistatic backcoat, wherein the polyethylene terephthalate film base has been formed by drafting a cast resin at a stretch ratio of at least 3.4, tentering at a stretch ratio of at least 3.4, and heat-setting at an actual heat-set temperature of at least 216° C. In accordance with preferred embodiments of the invention, the polyethylene terephthalate film base of the photographic element is formed by: (a) casting a molten polyethylene terephthalate resin in a machine direction onto a casting surface to form a continuous sheet, (b) drafting the sheet by stretching in the machine direction at a stretch ratio of from 3.4 to 4, and at a temperature ranging from 70 to 130° C.
    Type: Grant
    Filed: May 20, 1999
    Date of Patent: May 8, 2001
    Assignee: Eastman Kodak Company
    Inventors: Larry K. Maier, Timothy F. Cilano, Fred D. Kelley, Frank D. Manioci, Diana C. Petranek, Michael Schild
  • Patent number: 6218088
    Abstract: An image formation method for forming a color image by imagewise exposing a color negative type silver halide photographic material comprising a transparent support having provided thereon at least three kinds of light-sensitive layers, followed by development processing at a temperature of 50° C. or more, which comprises the steps of reading with an imaging apparatus an image obtained from the color negative type silver halide photographic material whose sensitivity and gradient satisfy the following relationship, applying digital image processing thereto, and then, obtaining output signals of three or more colors: 1.0≦(log10S)·&ggr;≦2.5 S≧800 wherein S represents an ISO sensitivity, and &ggr; represents an average gradient of the three kinds of light-sensitive layers, thereby inviting no failure in shooting due to insufficient exposure in a compact camera or a film with lens, and forming a color image of high quality.
    Type: Grant
    Filed: September 10, 1999
    Date of Patent: April 17, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Jun Arakawa
  • Patent number: 6200738
    Abstract: An image forming method is disclosed, wherein a photographic element comprising a support having on at least one side thereof at least a photographic component layer containing light sensitive silver halide is subjected to exposure and photographic processing to form a dye image, in which the photographic processing is allowed to be completed, while the residual silver content in the photographic element is 5% or more; image information in the visible light wavelength region, in which the dye image has absorption, and image information in the invisible light wavelength region are read, and the obtained image information is further subjected to image processing to reduce noise due to the residual silver.
    Type: Grant
    Filed: October 28, 1999
    Date of Patent: March 13, 2001
    Assignee: Konica Corporation
    Inventors: Hiroaki Takano, Hideaki Haraga, Kouji Tashiro
  • Patent number: 6190842
    Abstract: An imaging support element comprising a polymeric film support and a thermally stable single subbing layer is made by forming a coating over the polymeric film support, the coating having a surface including amine reactive groups in a density of at least 1010 per cm2 and then heat treating the polymeric film support with the coating thereon at a temperature in the range of from about 50° C. below the glass transition temperature (Tg) of the polymeric support up to the glass transition temperature (Tg) of the polymeric support. The polymeric film support is nitrogen plasma treated. The layer is formed by applying to the polymeric support web a coating including at least one non-amine reactive comonomer and at least one comonomer having amine reactive side groups.
    Type: Grant
    Filed: December 20, 1999
    Date of Patent: February 20, 2001
    Assignee: Eastman Kodak Company
    Inventors: Jeremy M. Grace, Louis J. Gerenser, Wayne A. Bowman, Elizabeth G. Burns, Richard A. Castle, David M. Teegarden
  • Patent number: 6165699
    Abstract: A photographic polyester support having an adjacent subbing layer which comprises a polymer or copolymer of glycidyl acrylate and/or glycidyl methacrylate followed by a gelatin layer and which is annealed. Such a composite has been found to provide improved adhesion properties without chemical degradation of the subbing layer under annealing conditions.
    Type: Grant
    Filed: December 17, 1999
    Date of Patent: December 26, 2000
    Assignee: Eastman Kodak Company
    Inventors: Charles L. Bauer, Cathy A. Fleischer
  • Patent number: 6143478
    Abstract: A resist processing method includes (a), to a substrate having a circuit pattern with an uneven surface formed thereon, coating a photoresist solution to, by doing so, form a photoresist film, (b) subjecting the substrate to heat processing to cause a portion of the photoresist film to be chemically modified to create a modified resist layer of a substantially uniform thickness from the uneven surface of the circuit pattern, and (c) selectively removing only a resist portion unmodified at the step (b) to leave a modified resist layer on the uneven surface of the circuit pattern.
    Type: Grant
    Filed: May 19, 1998
    Date of Patent: November 7, 2000
    Assignee: Tokyo Electron Limited
    Inventors: Takayuki Toshima, Nobuo Konishi
  • Patent number: 6140034
    Abstract: The present invention provides a heat development light-sensitive material which shows good discrimination of an image.
    Type: Grant
    Filed: March 8, 1999
    Date of Patent: October 31, 2000
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hideaki Naruse, Tetsuro Kojima
  • Patent number: 6124081
    Abstract: A negative type resist in which an alkali-soluble base resin, a crosslinking agent and an acid generating agent are dissolved in a solvent, wherein 10 through 50 wt % of the crosslinking agent and 0.5 through 20 wt % of the acid generating agent on the basis of 100 wt % of the alkali-soluble base resin are dissolved in the solvent.
    Type: Grant
    Filed: October 7, 1997
    Date of Patent: September 26, 2000
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventor: Shinji Kishimura