Abstract: Provided is a method for developing positive-tone chemically amplified resists with an organic developer solvent having at least one polyhydric alcohol, such as ethylene glycol and/or glycerol, alone or in combination with an additional organic solvent, such as isopropyl alcohol, and/or water. The organic solvent developed positive tone resists described herein are useful for lithography pattern forming processes; for producing semiconductor devices, such as integrated circuits (IC); and for applications where basic solvents are not suitable, such as the fabrication of chips patterned with arrays of biomolecules or deprotection applications that do not require the presence of acid moieties.
Type:
Application
Filed:
February 23, 2013
Publication date:
August 28, 2014
Applicants:
JSR CORPORATION, INTERNATIONAL BUSINESS MACHINES CORPORATION
Inventors:
Robert D. Allen, Ramakrishnan Ayothi, Luisa D. Bozano, William D. Hinsberg, Linda K. Sundberg, Sally A. Swanson, Hoa D. Truong, Gregory M. Wallraff
Abstract: In forming a resist pattern by forming a resist film containing an acid generator on a spin on glass film or a silicon resin film and subsequent exposure of light, an inhomogeneous distribution of an acid in the resist film caused by the spin on glass film or the silicon resin film is remedied by adding an acid generator beforehand into the spin on glass film or the silicon resin film or by using an organic polymer containing an acid generator. As a result, a profile defect in a cross section of the resist pattern caused by inhomogeneous acid distribution is prevented and the resist pattern has a rectangular cross-sectional shape.
Abstract: Silver halide photographic material for radiography comprising a transparent support having a hydrophilic colloid layer coated on each side thereof said layer comprising (a) photosensitive silver halide grains, (b) silver halide grains having surfaces covered with a solubility reducing agent and which, in the absence of said solubility reducing agent, are more soluble in a material capable of dissolving silver halide than said (a), said (b) having a sensitivity to light generally less than 1/10 that of said (a), and (c) physical development nuclei, wherein the molar ratio of (a) to (b), based on the silver content of each, is between 1:0.1 to 1:0.8 on each side of said support and the total silver content of (a) and (b) is from 1 to 8 g/m.sup.2.