Post Imaging Processing Patents (Class 430/401)
  • Patent number: 8971661
    Abstract: Methods are disclosed relating to the production of camouflage that include steps such as harvesting a set of objects that have a diversity of color from the environment, placing the set of objects within a scene, capturing a set of images of the scene, adjusting color in the set of images, assembling a composite image, printing the composite image, making color adjustments and reprinting the composite image.
    Type: Grant
    Filed: August 10, 2014
    Date of Patent: March 3, 2015
    Assignee: Muddy Water Camo, LLC
    Inventor: Stephen Michael Maloney
  • Patent number: 8883399
    Abstract: A photosensitive resin structure having an ablation layer for a photosensitive resin for a relief printing that is capable of being processed by infrared radiation and containing an anionic polymer, a relief printing plate is produced by drawing a pattern by irradiating the ablation layer with infrared radiation; exposing the pattern by irradiating the photosensitive resin layer with ultraviolet radiation; and removing the ablation layer and unexposed photosensitive resin layer with a developer.
    Type: Grant
    Filed: December 18, 2009
    Date of Patent: November 11, 2014
    Assignee: Asahi Kasei E-Materials Corporation
    Inventor: Chisato Iso
  • Patent number: 8865396
    Abstract: A developing method including a developing step in which, while a wafer horizontally held by a spin chuck is being rotated, the wafer is developed by supplying a developer onto a surface of the wafer, wherein provided before the developing step is a pre-wetting step in which, simultaneously with the developer being supplied from a first nozzle that is located on a position near a central part of the surface of the rotating wafer, a deionized water as a second liquid is supplied from a second nozzle that is located on a position nearer to an outer peripheral part of the wafer than the first nozzle, to thereby spread out the developer in the rotating direction of the wafer by a wall that is formed by the deionized water flowing to the outer peripheral side of the wafer with the rotation of the wafer.
    Type: Grant
    Filed: May 27, 2009
    Date of Patent: October 21, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Hirofumi Takeguchi, Taro Yamamoto, Kousuke Yoshihara
  • Patent number: 8398320
    Abstract: A non-transitory storage medium stores software for performing a rinsing process on a substrate, after a developing process is performed on a light-exposed pattern disposed thereon. The sequence includes throwing off a developing solution from the substrate after development; supplying a water-based cleaning liquid onto the substrate; supplying a surfactant-containing rinsing liquid onto the substrate to replace liquid remaining on the substrate with the surfactant-containing rinsing liquid; and rotating the substrate to expand and throw off the surfactant-containing rinsing liquid on the substrate.
    Type: Grant
    Filed: May 27, 2011
    Date of Patent: March 19, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Yasuhiro Takaki, Osamu Miyahara, Keiichi Tanaka, Shinya Wakamizu, Takashi Terada
  • Patent number: 8329382
    Abstract: Imageable elements can be imaged and then processed using a solution containing core-shell particles that are designed to complex with non-coalesced particles in the non-exposed regions of imaged element. A separate development step is not needed, but the non-coalesced particles and complexed core-shell particles can be removed from the resulting printing plate before using the resulting lithographic printing plate for printing.
    Type: Grant
    Filed: September 2, 2009
    Date of Patent: December 11, 2012
    Assignee: Eastman Kodak Company
    Inventors: Mathias Jarek, Domenico Balbinot
  • Publication number: 20120228747
    Abstract: To provide a resist pattern improving material, containing: water; and benzalkonium chloride represented by the following general formula (1): where n is an integer of 8 to 18.
    Type: Application
    Filed: January 26, 2012
    Publication date: September 13, 2012
    Applicant: FUJITSU LIMITED
    Inventors: Koji NOZAKI, Miwa Kozawa
  • Publication number: 20120189964
    Abstract: A method is provided for achieving specific magnetic states with a given vortex chirality in artificial kagome spin ice building block structures containing one or more hexagonal rings of ferromagnetic islands created with electron beam lithography, where a subgroup of the ferromagnetic islands have a smaller width and therefore higher switching field than the other normal (wider) islands and are placed at specific positions in each of the rings. The positioning of the islands determines the magnetic state of the building block structure during magnetization reversal, and determines the chirality of the magnetic vortices that occur in each ring.
    Type: Application
    Filed: February 24, 2012
    Publication date: July 26, 2012
    Applicant: PAUL SCHERRER INSTITUT
    Inventors: Laura Heyderman, Elena Mengotti, Danilo Zanin, Rajesh Chopdekar, Hans-Benjamin Braun, Remo Huegli, Gerard Duff
  • Publication number: 20110183269
    Abstract: Some embodiments include methods of forming patterns. Photoresist features may be formed over a base, with the individual photoresist features having heights and widths. The photoresist features may be exposed to a combination of chloroform, oxidant and additional carbon-containing material besides chloroform to reduce the widths of the photoresist features while substantially maintaining the heights of the photoresist features. The photoresist features may then be used as a mask to pattern the underlying base, and/or spacers may be formed to be aligned to sidewalls of the photoresist features, and the spacers may be used as the mask to pattern the underlying base.
    Type: Application
    Filed: January 25, 2010
    Publication date: July 28, 2011
    Inventor: Hongbin Zhu
  • Patent number: 7968278
    Abstract: A rinsing method for performing a rinsing process on a substrate, after a developing process is performed on a light-exposed pattern disposed thereon, includes a step (STEP 5) of throwing off a developing solution from the substrate after development; a step (STEP 6) of supplying a water-based cleaning liquid onto the substrate; a step (STEP 7) of supplying a surfactant-containing rinsing liquid onto the substrate to replace liquid remaining on the substrate with the surfactant-containing rinsing liquid; and a step (STEP 8) of rotating the substrate to expand and throw off the surfactant-containing rinsing liquid on the substrate. STEP 8 is arranged to supply the surfactant-containing rinsing liquid for a supply time of 5 seconds or less. STEP 9 is arranged to include a first period with a lower rotation number and a second period with a higher rotation number, and to set the rotation number of the substrate in the first period to be more than 300 rpm and less than 1,000 rpm.
    Type: Grant
    Filed: March 2, 2005
    Date of Patent: June 28, 2011
    Assignee: Tokyo Electron Limited
    Inventors: Yasuhiro Takaki, Osamu Miyahara, Keiichi Tanaka, Shinya Wakamizu, Takashi Terada
  • Publication number: 20110020757
    Abstract: To provide a method of preparing a lithographic printing plate which is safe, exhibits excellent developing property and processing ability, and enables processing with one solution by processing after image exposure, a negative lithographic printing plate precursor having an image-recording layer containing (i) a sensitizing dye, (ii) a photopolymerization initiator, (iii) an addition polymerizable compound having an ethylenically unsaturated double bond, and (iv) a binder polymer on a hydrophilic support with an aqueous solution containing a carbonate ion, a hydrogen carbonate ion and a water-soluble polymer compound.
    Type: Application
    Filed: March 24, 2009
    Publication date: January 27, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Ikuo Kawauchi, Mamoru Kuramoto, Keiichi Adachi, Toshifumi Inno
  • Publication number: 20100316961
    Abstract: A substrate treatment apparatus which uniformly forms a fine resist pattern with a desired dimension within a plane of a substrate is disclosed. In a solvent vapor supply unit, a solvent vapor discharge nozzle is provided which can discharge a solvent vapor for swelling a resist pattern while moving above the front surface of a wafer. The wafer for which developing treatment has been finished and on which a resist pattern has been formed is carried into the solvent vapor supply unit, and the solvent vapor discharge nozzle is moved above the front surface of the wafer, so that the solvent vapor discharge nozzle supplies the solvent vapor onto the front surface of the wafer. This uniformly supplies a predetermined amount of solvent vapor to the resist pattern on the front surface of the wafer. As a result, the solvent vapor causes the resist pattern to evenly swell by a predetermined dimension, so that a resist pattern with a desired dimension is finally uniformly formed within the plane of the wafer.
    Type: Application
    Filed: August 20, 2010
    Publication date: December 16, 2010
    Applicant: TOKYO ELECTON LIMITED
    Inventor: Yuichiro INATOMI
  • Patent number: 7841278
    Abstract: A method for treating a re-imageable printing form includes surface modifying a surface of the printing form acting as a printing area in a nanoscopic range by chemically functionalizing the surface through covering with molecules, in particular amphiphilic molecules or polymers. The printing form is subjected to a primary process of imaging by laser radiation, and subjected to a primary process of application of at least one lithographic fluid, for example dampening solution, printing ink and/or varnish. The molecules are fixed in image regions by the primary process of imaging. The molecules are removed in non-image regions substantially by at least one primary process different than the application of printing ink, in particular by imaging, application of dampening solution or chemical developing. An apparatus for treating a re-imageable printing form, a machine for processing printing material and a method for treating a surface contacting printing material, are also provided.
    Type: Grant
    Filed: December 19, 2007
    Date of Patent: November 30, 2010
    Assignee: Heidelberger Druckmaschinen AG
    Inventors: Matthias Schlörholz, Martin Gutfleisch, Harald Latzel, Michaela Hoffmann, Gerald Erik Hauptmann, Uwe Tessmann
  • Patent number: 7709185
    Abstract: In a method for imaging a lithographic printing form, subareas of a surface of the lithographic printing form which are covered by amphiphilic molecules, are exposed to electromagnetic radiation. Following the exposure and before printing from the lithographic printing form, the subareas are treated with at least one complex-forming substance, so that a lithographic printing area structured into hydrophilic and hydrophobic regions is obtained.
    Type: Grant
    Filed: March 23, 2007
    Date of Patent: May 4, 2010
    Assignee: Heidelberger Druckmaschinen AG
    Inventors: Mathias Schlörholz, Harald Latzel, Bernd Vosseler
  • Publication number: 20100075263
    Abstract: It is disclosed an over-coating agent for forming fine patterns which is applied to cover a substrate having thereon photoresist patterns and allowed to shrink under heat so that the spacing between adjacent photoresist patterns is lessened, with the applied film of the over-coating agent being removed substantially completely to form or define fine trace patterns, further characterized by containing either a water-soluble polymer and an amide group-containing monomer or a water-soluble polymer which contains at least (meth)acrylamide as a monomeric component. Also disclosed is a method of forming fine-line patterns using any one of said over-coating agents. According to the invention, the thermal shrinkage of the over-coating agent for forming fine patterns in the heat treatment can be extensively increased, and one can obtain fine-line patterns which exhibit good profiles while satisfying the characteristics required of semiconductor devices.
    Type: Application
    Filed: November 23, 2009
    Publication date: March 25, 2010
    Inventors: Yoshiki Sugeta, Fumitake Kaneko, Toshikazu Tachikawa
  • Publication number: 20100028803
    Abstract: A surface treating agent for resist pattern formation comprises a compound having two or more nucleophilic functional groups in each of the molecules thereof, or its salt, and a solvent.
    Type: Application
    Filed: July 31, 2009
    Publication date: February 4, 2010
    Applicant: FUJIFILM Corporation
    Inventors: Naoya SUGIMOTO, Shinji Tarutani, Sou Kamimura, Kazuto Shimada, Naoyuki Nishikawa, Tomotaka Tsuchimura, Yuko Tada
  • Patent number: 7648821
    Abstract: A multiple layer photosensitive element having at least three differently sensitised photosensitive layers on one side of a support, such as a, transparent flexible support, is imagewise exposed according to a desired circuit pattern and developed to form two layers of conductive track patterns from each photosensitive layer, which may then be connected together by forming vias by drilling or in situ generation. The resulting multiple layer conductive element has application in the field of printed circuit board manufacture or as the backplane electronic element of a flexible display device.
    Type: Grant
    Filed: March 24, 2006
    Date of Patent: January 19, 2010
    Assignee: Eastman Kodak Company
    Inventors: Sean D. Slater, John R. Fyson, Christopher B. Rider, David T. Clarke, Jurjen F. Winkel, Peter Hewitson
  • Patent number: 7563564
    Abstract: A multiple layer photosensitive silver halide element having at least one sensitized photosensitive layer on each side of a support, such as a transparent flexible support, is imagewise exposed according to a desired circuit pattern and developed to form a layer of conductive track patterns from each photosensitive layer. The resulting multiple layer conductive element has application in the field of printed circuit board manufacture or as the backplane electronic element of a flexible display device.
    Type: Grant
    Filed: March 24, 2006
    Date of Patent: July 21, 2009
    Assignee: Eastman Kodak Company
    Inventors: Andrew S. Brooks, Sean D. Slater, Peter Hewitson
  • Patent number: 7485397
    Abstract: A reusable printing plate, in particular for use both in wet offset printing and in dry offset printing, includes a printing area and a metal oxide surface treated with at least one fluorinated phosphonic acid. A printing press and a printing unit having the printing plate, a process for imaging the printing plate and a process for preparation of a fluorinated organic phosphonic acid are also provided.
    Type: Grant
    Filed: July 18, 2005
    Date of Patent: February 3, 2009
    Assignee: Heidelberger Druckmaschinen AG
    Inventors: Wolfgang Eck, Martin Gutfleisch, Gerhard Daniel Peiter, Matthias Schlörholz
  • Patent number: 7455959
    Abstract: The invention provides a color photographic element comprising at least one light-sensitive silver halide emulsion layer or a non silver-containing light-insensitive layer, in which at least one of these layers contains a colorless imidazole compound of formula (I) that undergoes less than 10% chemical or redox reaction with oxidized developer and which enables the photographic speed of the element to be increased by at least 0.
    Type: Grant
    Filed: October 1, 2004
    Date of Patent: November 25, 2008
    Assignee: Eastman Kodak Company
    Inventors: Bernard A. Clark, Philip A. Allway, Tania Zuberi, Stephen P. Singer, Charles E. Heckler, Louis E. Friedrich
  • Publication number: 20080206689
    Abstract: A multiple layer photosensitive silver halide element having at least one sensitised photosensitive layer on each side of a support, such as a transparent flexible support, is imagewise exposed according to a desired circuit pattern and developed to form a layer of conductive track patterns from each photosensitive layer. The resulting multiple layer conductive element has application in the field of printed circuit board manufacture or as the backplane electronic element of a flexible display device.
    Type: Application
    Filed: March 24, 2006
    Publication date: August 28, 2008
    Inventors: Andrew S. Brooks, Sean D. Slater, Peter Hewitson
  • Publication number: 20080153040
    Abstract: In a rework process for removing an organic film containing silicon formed on a semiconductor wafer substrate, silicon compound residues were generated, and it was difficult to remove them. In the present invention, the semiconductor wafer is processed by the method comprising at least: a first step of cleaning treatment, using an ammonia aqueous solution, of a surface exposed by removing an organic film containing silicon formed on the semiconductor wafer substrate; and a second step of cleaning treatment, using a diluted fluorinated acid aqueous solution. The ammonia concentration of the ammonia aqueous solution is preferably equal to or more than 0.01 weight percent and equal to or less than 30 weight percent. The fluorinated acid concentration of the diluted fluorinated acid aqueous solution is preferably equal to or more than 0.01 weight percent and equal to or less than 2.0 weight percent.
    Type: Application
    Filed: December 14, 2007
    Publication date: June 26, 2008
    Applicant: ELPIDA MEMORY, INC.
    Inventor: Nozomi Honda
  • Patent number: 7388975
    Abstract: In a method and system for post-processing at least image data acquired by an imaging modality in a post-processing procedure on an image processing station of an image processing system, the post-processing procedure is stored with all partial-procedures and/or sub-procedures upon an interruption before its regular ending with all current process data at this point in time. The image processing station thus is available for another post-processing procedure and the original post-processing procedure is continued given a recall into a process state present at the point in time of the interruption.
    Type: Grant
    Filed: October 13, 2004
    Date of Patent: June 17, 2008
    Assignee: Siemens Aktiengesellschaft
    Inventors: Roland Faber, Isabelle Janssen
  • Patent number: 7351522
    Abstract: An object of the present invention is to provide a method of processing silver halide color paper that ensures (a) promptness such that finished prints can be handed at shop to customers, (b) small installation area for mini-labs, (c) processing solution stability capable of withstanding slack seasons, (d) normal image quality, (e) small replenishment solution amount and (f) inhibition of tar generation and sulfuration phenomenon occurrence. This object can be attained by a concentrated processing composition for color paper which has a concentrated processing composition for bleach replenishment of 3.0 or less in pH containing 0.3 mol/L or more of EDTA.Fe(III) ammonium, 0.3 mol/L or more of a sulfinic acid compound of specified structure and 0.5 mol/L or more of ammonium bromide and a concentrated processing composition for fixative replenishment of 4.0 or more in pH containing 0.7 mol/L of ammonium thiosulfate and 0.
    Type: Grant
    Filed: August 15, 2005
    Date of Patent: April 1, 2008
    Assignee: Fujifilm Corporation
    Inventor: Kazuaki Yoshida
  • Patent number: 7323294
    Abstract: A color photographic material is disclosed comprising a black image forming coupler substituted in the 2, 4 and/or 6 position shown by formula (I) or formula (II), where in LINK represents a divalent linking group, BALL represents a group that prevents the coupler from diffusing away from the layer containing it. X and Y each represent a hydrogen atom or a coupling-off group capable of being released upon an oxidative coupling reaction with a developing agent. The material has a good color reproduction and excellent light stability.
    Type: Grant
    Filed: October 11, 2005
    Date of Patent: January 29, 2008
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Huibert Albertus van Boxtel, Akira Kase, Yasuo Iwasa, Yuzo Toda
  • Patent number: 7316891
    Abstract: A method of making a lithographic printing plate is disclosed which comprises the steps of providing a lithographic printing plate precursor comprising (i) a support having a hydrophilic surface or which is provided with a hydrophilic layer and (ii) a coating provided thereon which comprises hydrophobic thermoplastic polymer particles; exposing the coating to heat, thereby inducing coalescence of the thermoplastic polymer particles at exposed areas of the coating; developing the precursor by applying a gum solution to the coating, thereby removing non-exposed areas of the coating from the support. According to the above method, the plate precursor can be developed and gummed in a single step.
    Type: Grant
    Filed: March 4, 2003
    Date of Patent: January 8, 2008
    Assignee: Agfa Graphics NV
    Inventors: Joseph Vander Aa, Joan Vermeersch, Dirk Kokkelenberg, Huub Van Aert
  • Patent number: 7297462
    Abstract: A heat sensitive lithographic printing plate precursor is disclosed comprising on a support having a hydrophilic surface or which is provided with a hydrophilic layer, a coating comprising an infrared light absorbing agent and a copolymer which comprises a plurality of recurring units X having a hydrophilic polymeric pendant group and a plurality of recurring units Y having a hydrophobic polymeric pendant group. Said coating is capable of switching from a hydrophilic state into a hydrophobic state after exposure to heat and/or infrared light.
    Type: Grant
    Filed: November 12, 2004
    Date of Patent: November 20, 2007
    Assignee: AGFA Graphics NV
    Inventors: Huub Van Aert, Bert Groenendaal, Hieronymus Andriessen, Martin Moeller, Uwe Beginn, Ahmed Mourran
  • Patent number: 7205094
    Abstract: A coating fluid for printing plates which can be suitably used to make printing plates that permit images to be written in response to input digital data and that can be easily regenerated and reused. This coating fluid for printing plates comprises at least a carrier liquid, thermoplastic resin particles and an IR absorber, and the IR absorber has a decomposition starting temperature higher than the melt starting temperature of the thermoplastic resin particles.
    Type: Grant
    Filed: October 13, 2004
    Date of Patent: April 17, 2007
    Assignee: Mitsubishi Heavy Industries, Ltd.
    Inventors: Yasuharu Suda, Hideaki Sakurai, Toyoshi Ohto
  • Patent number: 7198876
    Abstract: A method for preparation of a lithographic printing plate, which comprises the steps of: imagewise recording on a lithographic printing plate precursor comprising a support having a hydrophilic surface and a thermosensitive layer, the thermosensitive layer comprising at least one of polymer particles and a microcapsule encapsulating an oleophilic compound therein; and rubbing the printing plate precursor by a rubbing member in the presence of a processing liquid to remove the thermosensitive layer of non-image portions.
    Type: Grant
    Filed: April 23, 2003
    Date of Patent: April 3, 2007
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshifumi Inno
  • Patent number: 7175971
    Abstract: The present invention provides an exposure processing method of a planographic printing plate comprising: providing an image recording layer containing a polymerizable compound which is solid at the room temperature, a polymerization initiator, and a light-to-heat converting agent, and a microcapsule encapsulating at least one of the monomer and the polymerization initiator, such that the light energy quantity absorbed in the lower part of the image recording layer is more than the light energy quantity absorbed in the upper and middle parts of the image recording layer; exposing the image recording layer, and thereafter post-heating the image recording layer at a temperature in a range equal to or above the melting point of the monomer and below the glass transition point of the wall of the microcapsule. As a result, the printing resistance of a planographic printing plate is enhanced.
    Type: Grant
    Filed: March 29, 2005
    Date of Patent: February 13, 2007
    Assignee: Fuji Photo Film Co. Ltd.
    Inventors: Ichirou Miyagawa, Akinori Kimura, Toshifumi Inno, Gaku Kumada
  • Patent number: 7122295
    Abstract: A flexographic printing plate is prepared from a photosensitive element having a photopolymerizable elastomeric layer with specific rheological properties. The element is imagewise exposed and thermally treated to form a relief structure suitable for flexographic printing.
    Type: Grant
    Filed: April 18, 2001
    Date of Patent: October 17, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Christoph Mengel, Dietmar Dudek, Mark A. Hackler, Anandkumar Ramakrishnan Kannurpatti
  • Patent number: 7049045
    Abstract: Multilayer, positive working, thermally imageable, bakeable imageable elements are disclosed. The elements have a substrate, an underlayer, and a top layer. The underlayer comprises a resin or resins having activated methylol and/or activated alkylated methylol groups, such as a resole resin, and a polymeric material that comprises, in polymerized form about 5 mol % to about 30 mol % of methacrylic acid; about 20 mol % to about 75 mol % of N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, or a mixture thereof; optionally, about 5 mol % to about 50 mol % of methacrylamide; and about 3 mol % to about 50 mol % of a compound represented by the formula: CH2C(R2)C(O)NHCH2OR1, in which R1 is C1 to C12 alkyl, phenyl, C1 to C12 substituted phenyl, C1 to C12 aralkyl, or Si(CH3)3; and R2 is H or methyl. The elements produce bakeable lithographic printing plates that are resistant to press chemistries.
    Type: Grant
    Filed: August 14, 2003
    Date of Patent: May 23, 2006
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Paul Kitson, Kevin B. Ray, S. Peter Pappas
  • Patent number: 7018777
    Abstract: A method of making a printing plate from a heat-sensitive PS plate of a positive-working mode for lithographic printing includes the steps of exposing the heat-sensitive PS plate to light and developing the PS plate using an alkaline developing solution containing at least one surfactant selected from the group consisting of anionic surfactants and ampholytic surfactants, and a salt selected from the group consisting of alkali metal salts and ammonium cation salts. The PS plate has a substrate and an image forming layer formed thereon, the image forming layer including a lower layer which is formed on the substrate and contains a water-insoluble and alkali-soluble resin and an upper heat-sensitive layer which is overlaid on the lower layer and contains a water-insoluble and alkali-soluble resin and an infrared absorption dye and exhibits an elevated solubility with respect to alkaline aqueous solutions when heated.
    Type: Grant
    Filed: September 10, 2003
    Date of Patent: March 28, 2006
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Hironori Ohnishi
  • Patent number: 7018784
    Abstract: The invention relates to a process for amplifying structured resists. The process permits a subsequent increase in the etch resistance and a change in the structure size of the resist even in the case of ultrathin layers. The chemical amplification is carried out in a solvent that is so nonpolar that it does not dissolve the structured resist or dissolves it only to an insignificant extent. Because of the lower surface tension of these solvents, the danger of a collapse of these structures is additionally avoided.
    Type: Grant
    Filed: February 27, 2003
    Date of Patent: March 28, 2006
    Assignee: Infineon Technologies AG
    Inventors: Jörg Rottstegge, Waltraud Herbst, Gertrud Falk, Eberhard Kühn
  • Patent number: 6939663
    Abstract: The present invention provides a thermally sensitive composition that may be coated as a water-borne material onto a substrate to yield a printing plate precursor having an imageable coating. The thermally sensitive composition comprises a sulfated phenolic resin. The sulfated phenolic resin may be a sulfated novolak resin or a sulfated resole resin, for example. The thermally sensitive composition may include a water-soluble binder, such as polyvinyl pyrrolidone, and a radiation-absorbing component. The invention also provides a printing plate precursor that is developed in water after imaging. The precursor does not require chemical development with a developing solution containing organic solvents or inorganic additives. The imaged precursor is on-press-developable when used with a fountain solution. Methods for making and using the precursor are also provided.
    Type: Grant
    Filed: July 8, 2003
    Date of Patent: September 6, 2005
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Ting Tao, Scott A. Beckley, John Kalamen, Kevin Barry Ray
  • Patent number: 6908726
    Abstract: Infrared absorbing compounds that absorb at 800 nm±50 nm and at 1050 nm±50 nm, the two different regions of the infrared spectrum typically used for imaging, are disclosed. Thermally imageable elements that comprise these infrared absorbing compounds can be imaged with radiation in either of these two regions of the infrared spectrum. The elements are especially useful as lithographic printing plate precursors.
    Type: Grant
    Filed: April 7, 2003
    Date of Patent: June 21, 2005
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Lee Korionoff, Ting Tao, Kevin B. Ray
  • Patent number: 6905812
    Abstract: A positive working printing form precursor comprises a thermally imagable composition which includes a hydroxyl group-containing polymer, for example a novolak resin. The composition has a weight of less than 1.1 gm?2. It has been found that using a low weight of the composition on the precursor improves the properties of the precursor, in particular by rendering the sensitivity of the precursor to imaging radiation less variable over time.
    Type: Grant
    Filed: November 7, 2002
    Date of Patent: June 14, 2005
    Assignee: Kodak Polychrome Graphics LLC
    Inventors: Kevin Barry Ray, Peter Andrew Reath Bennett, Martyn Lott
  • Patent number: 6902861
    Abstract: Infrared absorbing compounds in which the anion is selected from the group consisting of 5-isatinsulfonate, 10-camphorsulfonate, and 4,5-dihydroxy-1,3-benzenedisulfonate are disclosed. Negative-working imageable elements containing these compounds have improved dot stability.
    Type: Grant
    Filed: March 10, 2003
    Date of Patent: June 7, 2005
    Assignee: Kodak Polychrome Graphics, LLC
    Inventors: Ting Tao, Kevin B. Ray, Jianbing Huang, Jeffrey James Collins, Thomas Jordan, Scott A. Beckley
  • Patent number: 6893798
    Abstract: A method for treating a micro-emulsion that can be used for removing the ink-accepting areas of a lithographic printing master is disclosed, which enables to recycle the water from the used micro-emulsion. The method comprises the heating of the micro-emulsion to a temperature above 50° C. thereby obtaining an aqueous phase and an organic phase and separating the aqueous phase from the organic phase.
    Type: Grant
    Filed: November 2, 2001
    Date of Patent: May 17, 2005
    Assignee: Agfa-Gevaert
    Inventors: Eric Verschueren, Peter Geerts
  • Patent number: 6861202
    Abstract: A method for treating a photosensitive lithographic printing plate, which comprises exposing the photosensitive lithographic printing plate to laser light, developing with a developer containing an alkali metal silicate and then carrying out post-exposure treatment, said photosensitive lithographic printing plate being prepared by forming a photopolymerizable photosensitive layer having a film thickness of from 1.2 to 4 g/m2 and further forming a protective layer having a film thickness of from 2 to 8 g/m2 on a support having a centerline average height (Ra) of at least 0.35 ?m.
    Type: Grant
    Filed: March 5, 2003
    Date of Patent: March 1, 2005
    Assignee: Lastra S.p.A.
    Inventors: Eriko Toshimitsu, Hideaki Okamoto
  • Patent number: 6846615
    Abstract: The present invention provides a method for making a lithographic printing plate, which comprises imagewise exposing a presensitized plate having a photopolymerizable layer on a substrate having a hydrophilic surface by scanning the plate with laser light having a wavelength of 450 nm or shorter, developing the exposed plate with a developer and further exposing the whole surface of the developed plate to light having a wavelength of 450 nm or shorter. The method provides a lithographic printing plate by which a fog of reflection that is easily occurred in an inner drum-type exposing device during a direct process can be reduced to provide a clear image as well as a high printing durability.
    Type: Grant
    Filed: July 23, 2002
    Date of Patent: January 25, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Yasuo Okamoto
  • Patent number: 6841336
    Abstract: A plate-making method of a lithographic printing plate comprising exposing imagewise a photosensitive lithographic printing plate comprising an aluminum support and a photosensitive layer comprising a photosensitive composition of photopolymerization type, which contains a compound having a nitrogen atom and an ethylenically unsaturated double bond, a photopolymerization initiator and a polymer binder, and developing the exposed printing plate with a developing solution containing (1) an inorganic alkali agent and (2) a nonionic surface active agent having a polyoxyalkylene ether group.
    Type: Grant
    Filed: October 16, 2001
    Date of Patent: January 11, 2005
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Shunichi Kondo
  • Patent number: 6828084
    Abstract: A photographic bleaching composition has reduced odor and acceptable storage stability. It comprises an iron-ligand complex bleaching agent, a rehalogenating agent, and a phthalic acid or salt thereof. This bleaching composition can be used in various photographic processing protocols to provide color images from color photographic silver halide materials, especially photographic color papers. The bleaching step can also be preceded by an acidic stop that also includes a phthalic acid or salt thereof.
    Type: Grant
    Filed: October 27, 2003
    Date of Patent: December 7, 2004
    Assignee: Eastman Kodak Company
    Inventors: Shirleyanne E. Haye, Janet M. Huston, Eric R. Schmittou, Therese M. Feller
  • Patent number: 6824963
    Abstract: A method of chemically marking photosensitive material that needs to be digitally scanned and adjusted rather than optically printed to produce a satisfactory hardcopy.
    Type: Grant
    Filed: September 30, 2003
    Date of Patent: November 30, 2004
    Assignee: Eastman Kodak Company
    Inventors: John R. Fyson, Peter J. Twist
  • Publication number: 20040197697
    Abstract: Infrared absorbing compounds that absorb at 800 nm±50 nm and at 1050 nm±50 nm, the two different regions of the infrared spectrum typically used for imaging, are disclosed. Thermally imageable elements that comprise these infrared absorbing compounds can be imaged with radiation in either of these two regions of the infrared spectrum. The elements are especially useful as lithographic printing plate precursors.
    Type: Application
    Filed: April 7, 2003
    Publication date: October 7, 2004
    Inventors: Lee Korionoff, Ting Tao, Kevin B. Ray
  • Publication number: 20040185376
    Abstract: A copper clad metal printing plate can be coated with an azide-containing photoresist comprising a polyformal resin together with a modified polyformal resin that has up to 100% of its hydroxyl groups converted to carboxyl groups, an organo azide and a photosensitive dye that absorbs light at the frequency of a patterning laser and converts it to heat energy. This de-crosslinks the resin that has been exposed to the laser light. Preferably the photoresist is flood exposed with ultraviolet light prior to laser exposure. The photoresist becomes soluble in the laser-exposed areas, exposing the underlying copper after development. The printing plates are completed by etching away the copper in the exposed areas, removing the remaining photoresist, thereby providing a patterned copper layer on the printing plate.
    Type: Application
    Filed: March 18, 2003
    Publication date: September 23, 2004
    Inventors: Jeffrey George Zaloom, Zhengzhe Song
  • Patent number: 6780567
    Abstract: A lithographic process comprises the steps of imagewise heating a presensitized lithographic printing plate and removing an unheated area of an image-forming layer to form a lithographic printing plate. The presensitized lithographic printing plate comprises a hydrophilic support and the image-forming layer. The image-forming layer contains a compound or a polymer having o-quinodimethane structures or precursor structures thereof. The lithographic printing plate is prepared by a reaction of the o-quinodimethane structures.
    Type: Grant
    Filed: July 8, 2002
    Date of Patent: August 24, 2004
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Naonori Makino, Hidekazu Oohashi
  • Patent number: 6759184
    Abstract: A process for the post-exposure amplification of resist structures uses amplification of resist structures of fluorinated resist polymers by structural growth of the structures by targeted chemical bonding of fluorinated oligomers. In the first step, a fluorine-containing resist is applied to a substrate. After exposure and development of the resist, bonding of an amplification agent chemically amplifies the resist structures. A fluorine-containing amplification agent is preferably used to achieve an improved reaction between polymer and amplification agent due to the improved miscibility of the molecular chains.
    Type: Grant
    Filed: June 28, 2002
    Date of Patent: July 6, 2004
    Assignee: Infineon Technologies AG
    Inventors: Jörg Rottstegge, Christian Eschbaumer, Christoph Hohle, Waltraud Herbst, Michael Sebald
  • Patent number: 6737220
    Abstract: A method of printing an image with a printing plate prepared from a printing plate precursor, which comprises a support having thereon an image forming layer A containing a water-soluble material, the method comprising the steps of: (a) imagewise exposing the layer A of the printing plate precursor so as to form an unexposed portion and an exposed portion; (b) supplying an emulsion ink containing an oil-based ink and water onto the layer A so that the unexposed portion is removed from the layer A so as to form a non image portion and the exposed portion remains in the layer A so as to form an image portion to give the printing plate, wherein the image portion is lyophilic and the non image portion is hydrophilic; and (c) printing the image on the printing plate to an image receiving material while further supplying the emulsion ink.
    Type: Grant
    Filed: January 24, 2002
    Date of Patent: May 18, 2004
    Assignee: Konica Corporation
    Inventor: Takahiro Mori
  • Publication number: 20040063036
    Abstract: A method of making a printing plate from a heat-sensitive PS plate of a positive-working mode for lithographic printing includes the steps of exposing the heat-sensitive PS plate to light and developing the PS plate using an alkaline developing solution containing at least one compound selected from the group consisting of cationic surfactants and compounds having three or more of an ethylene oxide-terminal group in the molecule thereof. The PS plate has a substrate and an image forming layer formed thereon, said image forming layer comprising a lower layer which is formed on the substrate and contains a water-insoluble and alkali-soluble resin and an upper heat-sensitive layer which is overlaid on the lower layer and contains a water-insoluble and alkali-soluble resin and an infrared absorption dye and exhibits an elevated solubility with respect to alkaline aqueous solutions when heated.
    Type: Application
    Filed: September 17, 2003
    Publication date: April 1, 2004
    Applicant: FUJI PHOTO FILM CO., LTD.
    Inventor: Shuichi Takamiya
  • Patent number: 6713242
    Abstract: A processing method has been provided for an exposed silver halide black-and-white negative working sound recording film element, said processing method comprising the steps of processing said sound recording film element in a processing apparatus providing processing ability in a daylight environment, said processing method comprising the steps of developing in a time of less than 20 seconds; fixing in a fixer; rinsing and drying; making use of an automatic processing machine, the mentioned processing steps being followed by a step of controlling black-and-white densitometry, therefor providing the processing machine with a densitometer; further recording in a motion picture color print film and processing therein image area frames originating from an exposed and processed color negative recording film and from (an) optical soundtrack(s) originating from a silver halide black-and-white negative working sound recording film element, wherein said film element has been processed, after having been exposed, by t
    Type: Grant
    Filed: January 13, 2003
    Date of Patent: March 30, 2004
    Assignee: Agfa-Gevaert
    Inventor: Jean Burtin