Sensitizing Patents (Class 430/425)
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Patent number: 8968586Abstract: A pattern-forming method includes forming a prepattern on a substrate. A space other than a space in which the prepattern is formed on the substrate is filled with a resin composition containing a compound which is diffusible into the prepattern. The compound is diffused into a part of the prepattern. Portions in which the compound is undiffused in the prepattern are removed using a removing liquid.Type: GrantFiled: February 15, 2012Date of Patent: March 3, 2015Assignee: JSR CorporationInventor: Hayato Namai
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Patent number: 5952416Abstract: An object of the present invention is to provide a thermosetting resin composition which can impart high slidability and great abrasion resistance while maintaining the excellent properties of thermosetting resins such as outstanding heat resistance, high-precision moldability, long-term durability, great mechanical strength, etc. The thermosetting resin composition for a sliding member according to the present invention comprises 100 parts by weight of a thermosetting resin, 50 to 600 parts by weight of an inorganic filler and 2 to 20 parts by weight of polyolefin powder having a particle size of up to 200 .mu.m, the inorganic filler containing potassium titanate fibers in an amount of 2 to 35 parts by weight per 100 parts by weight of the thermosetting resin.Type: GrantFiled: August 16, 1996Date of Patent: September 14, 1999Assignee: Otsuka Kagaku Kabushiki KaishaInventors: Kiyozumi Tani, Akira Matsubara
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Patent number: 4868089Abstract: A positive image forming method is disclosed. Said method comprises in sequence the steps of subjecting to imagewise exposure a silver halide photographic material having a silver halide emulsion layer containing a non-prefogged internal image forming silver halide, increasing the surface sensitivity of said silver halide in the substantial absence of water and performing development.Type: GrantFiled: April 13, 1988Date of Patent: September 19, 1989Assignee: Konishiroku Photo Industry Co., Ltd.Inventors: Tatsuhiko Kobayashi, Sohei Goto, Ken Okauchi
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Patent number: 4812390Abstract: A photographic image is formed with silver halide emulsions by using optically unsensitized light sensitive (coarse) silver halide grains. Optically (or spectrally) sensitized fine grains (or crystals or particles),--especially light insensitive or Lippmann silver halide grains--, can be reactively associated with optically (or spectrally) unsensitized light sensitive (coarse) silver halide grains to get a combination of Spectrally Sensitized Fine Grains with Spectrally Unsensitized Light Sensitive or Coarse Grains, --especially Tabular Grains--, which can be imagewise exposed (to the light absorbed by the dye sensitizer adsorbed on the surface of such fine grains) and developed with substantially the same sensitivity of the light sensitive optically sensitized (coarse) silver halide grains.Type: GrantFiled: October 30, 1987Date of Patent: March 14, 1989Assignee: Minnesota Mining and Manufacturing CompanyInventor: Pier G. Giannesi
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Patent number: 4272606Abstract: A method of forming an extremely high-contrast negative photographic image which comprises image-wise exposing a photographic light-sensitive material comprising a support having thereon a mono-disperse silver halide emulsion layer containing surface latent image type silver halide grains and also containing a compound represented by the following general formula (1):R.sup.1 NHNHCOR.sup.2 (I)wherein R.sup.1 represents an aryl group, R.sup.2 represents a hydrogen atom, a phenyl group or an unsubstituted alkyl group having 1 to 3 carbon atoms, and then processing the exposed light-sensitive material in the presence of a compound having a thioamido moiety in the molecule thereof.Type: GrantFiled: February 1, 1980Date of Patent: June 9, 1981Assignee: Fuji Photo Film Co., Ltd.Inventors: Hiroyuki Mifune, Shunji Takada, Yoshitaka Akimura, Yoshiharu Fuseya
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Patent number: 4250249Abstract: For developing residual-moisture photographs according to the wet-film technique, a pre-treatment with a first solution of about 5% ethanolic NaOH is performed first at about 13.degree. C. After the alkali exchange, the exposed film passes through a bath at a bath temperature of 50.degree. C. with a hydroquinone-containing photographic developer. This "Two-bath wet developing method" takes place in daylight. The developed, fixed, rinsed and dried film can be evaluated directly.Type: GrantFiled: August 25, 1978Date of Patent: February 10, 1981Assignee: Siemens AktiengesellschaftInventor: Bernhard Montag