Prehardening Patents (Class 430/426)
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Patent number: 9411225Abstract: A photo acid generator represented (1a), wherein R01 and R02 each independently represent a linear monovalent hydrocarbon group having 1 to 20 carbon atoms or a branched or cyclic monovalent hydrocarbon group having 3 to 20 carbon atoms which may be substituted with or interposed by a heteroatom; R03 represents a linear divalent hydrocarbon group having 1 to 30 carbon atoms or a branched or cyclic divalent hydrocarbon group having 3 to 30 carbon atoms which may be substituted with a heteroatom, or interposed by a heteroatom; and R01 and R02 may be mutually bonded to form a ring together with the sulfur atom in the formula. A photo acid generator can give a pattern excellent in resolution and LER and having a rectangular profile in the photolithography using a high energy beam like ArF excimer laser light, EUV, and electron beam as a light source.Type: GrantFiled: June 2, 2015Date of Patent: August 9, 2016Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Masaki Ohashi, Masahiro Fukushima, Kenichi Oikawa, Koji Hasegawa
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Patent number: 7479463Abstract: Embodiments of an apparatus and methods for heating a substrate and a sacrificial layer are generally described herein. Other embodiments may be described and claimed.Type: GrantFiled: March 9, 2007Date of Patent: January 20, 2009Assignee: Tokyo Electron LimitedInventors: John Kulp, Michael Carcasi, Merritt Funk
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Patent number: 6811930Abstract: A post-exposure treatment method of a silver halide emulsion layer in the manufacture of a hologram, a hologram manufacturing using the post-exposure treatment method, and a holographic optical element including the hologram are provided. The post-exposure treatment method of a silver halide emulsion layer involves: pre-hardening the silver halide emulsion layer after exposure; developing the pre-hardened silver halide emulsion layer using a developer solution; bleaching the developed silver halide emulsion layer; hardening the bleached silver halide emulsion layer; drying the hardened silver halide emulsion layer; surface-hardening the dried silver halide emulsion layer; fixing the hardened silver halide emulsion layer; treating the fixed silver halide emulsion layer using warm water; and drying the silver halide emulsion layer which has been treated using warm water.Type: GrantFiled: May 28, 2002Date of Patent: November 2, 2004Assignee: Samsung Electronics Co., Ltd.Inventor: Jong-man Kim
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Publication number: 20020192567Abstract: A post-exposure treatment method of a silver halide emulsion layer in the manufacture of a hologram, a hologram manufacturing using the post-exposure treatment method, and a holographic optical element including the hologram are provided. The post-exposure treatment method of a silver halide emulsion layer involves: pre-hardening the silver halide emulsion layer after exposure; developing the pre-hardened silver halide emulsion layer using a developer solution; bleaching the developed silver halide emulsion layer; hardening the bleached silver halide emulsion layer; drying the hardened silver halide emulsion layer; surface-hardening the dried silver halide emulsion layer; fixing the hardened silver halide emulsion layer; treating the fixed silver halide emulsion layer using warm water; and drying the silver halide emulsion layer which has been treated using warm water.Type: ApplicationFiled: May 28, 2002Publication date: December 19, 2002Applicant: Samsung Electronics Co., Ltd.Inventor: Jong-Man Kim
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Patent number: 6218674Abstract: The electron beam projection exposure apparatus of the present invention reduces the incidence of defects in patterns formed by exposure on a substrate and includes an illumination optical system for generating an electron beam, a mask placed in a prescribed location including a mask stage for aligning and scanning the mask, a projection-imaging optical system for projecting an image of a pattern formed on the mask onto a substrate with the substrate including a substrate stage for positioning and scanning the substrate. The electron beam projection exposure apparatus further includes at least one filter placed in the proximity of the mask for filtering dust and for preventing dust particles from inhibiting the passage of the electron beam to said substrate.Type: GrantFiled: September 11, 1998Date of Patent: April 17, 2001Assignee: Nikon CorporationInventor: Tetsuya Oshino
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Patent number: 5776643Abstract: A light-sensitive material for a color filter is described, which comprises a support having provided thereon a peeling layer and further provided thereon at least three silver halide emulsion layers which are different in color sensitivity. A process for producing a color filter is also described, which comprises the steps of adhering an emulsion side of the light-sensitive material to a light-transmitting substrate, peeling the support off the light-sensitive material, pattern-exposing the emulsion side, and subjecting the material to development processing and desilvering processing.Type: GrantFiled: May 6, 1997Date of Patent: July 7, 1998Assignee: Fuji Photo Film Co., Ltd.Inventor: Hiroyuki Hirai
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Patent number: 4751173Abstract: A process for hardening gelatin, which comprises incorporating in a gelatin-containing material at least one hardening compound represented by formula (I) ##STR1## wherein R.sup.1 represents a substituted or unsubstituted aryl group, Z represents non-metallic atoms necessary for the formation of a nitrogen-containing heteroaromatic ring which may optionally be substituted, X.sup..crclbar. represents an anion, and n represents 0 or 1 provided that when n represents 0, the compound forms an inner salt. The gelatin hardeners can rapidly harden gelatin with little or no post-hardening and react with reactive groups of gelatin with high selectivity.Type: GrantFiled: December 29, 1986Date of Patent: June 14, 1988Assignee: Fuji Photo Film Co., Ltd.Inventors: Hisashi Okamura, Hiroshi Kawamoto
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Patent number: 4588678Abstract: A silver halide photographic material and a photographic development method are described, wherein the development method is carried out using a processing liquid containing a dialdehyde series hardening agent, and the photographic material comprises a support having thereon at least a silver halide emulsion layer containing silver halide grains having a silver iodide content higher than 1.5 mole %, with the silver iodide distribution in the silver halide grains being homogeneous throughout the grains or the silver iodide content being higher in the internal portion than in the surface portion of the silver halide grains.Type: GrantFiled: October 4, 1984Date of Patent: May 13, 1986Assignee: Fuji Photo Film Co., Ltd.Inventor: Hideo Ikeda