Prehardening Patents (Class 430/426)
  • Patent number: 9411225
    Abstract: A photo acid generator represented (1a), wherein R01 and R02 each independently represent a linear monovalent hydrocarbon group having 1 to 20 carbon atoms or a branched or cyclic monovalent hydrocarbon group having 3 to 20 carbon atoms which may be substituted with or interposed by a heteroatom; R03 represents a linear divalent hydrocarbon group having 1 to 30 carbon atoms or a branched or cyclic divalent hydrocarbon group having 3 to 30 carbon atoms which may be substituted with a heteroatom, or interposed by a heteroatom; and R01 and R02 may be mutually bonded to form a ring together with the sulfur atom in the formula. A photo acid generator can give a pattern excellent in resolution and LER and having a rectangular profile in the photolithography using a high energy beam like ArF excimer laser light, EUV, and electron beam as a light source.
    Type: Grant
    Filed: June 2, 2015
    Date of Patent: August 9, 2016
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaki Ohashi, Masahiro Fukushima, Kenichi Oikawa, Koji Hasegawa
  • Patent number: 7479463
    Abstract: Embodiments of an apparatus and methods for heating a substrate and a sacrificial layer are generally described herein. Other embodiments may be described and claimed.
    Type: Grant
    Filed: March 9, 2007
    Date of Patent: January 20, 2009
    Assignee: Tokyo Electron Limited
    Inventors: John Kulp, Michael Carcasi, Merritt Funk
  • Patent number: 6811930
    Abstract: A post-exposure treatment method of a silver halide emulsion layer in the manufacture of a hologram, a hologram manufacturing using the post-exposure treatment method, and a holographic optical element including the hologram are provided. The post-exposure treatment method of a silver halide emulsion layer involves: pre-hardening the silver halide emulsion layer after exposure; developing the pre-hardened silver halide emulsion layer using a developer solution; bleaching the developed silver halide emulsion layer; hardening the bleached silver halide emulsion layer; drying the hardened silver halide emulsion layer; surface-hardening the dried silver halide emulsion layer; fixing the hardened silver halide emulsion layer; treating the fixed silver halide emulsion layer using warm water; and drying the silver halide emulsion layer which has been treated using warm water.
    Type: Grant
    Filed: May 28, 2002
    Date of Patent: November 2, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Jong-man Kim
  • Publication number: 20020192567
    Abstract: A post-exposure treatment method of a silver halide emulsion layer in the manufacture of a hologram, a hologram manufacturing using the post-exposure treatment method, and a holographic optical element including the hologram are provided. The post-exposure treatment method of a silver halide emulsion layer involves: pre-hardening the silver halide emulsion layer after exposure; developing the pre-hardened silver halide emulsion layer using a developer solution; bleaching the developed silver halide emulsion layer; hardening the bleached silver halide emulsion layer; drying the hardened silver halide emulsion layer; surface-hardening the dried silver halide emulsion layer; fixing the hardened silver halide emulsion layer; treating the fixed silver halide emulsion layer using warm water; and drying the silver halide emulsion layer which has been treated using warm water.
    Type: Application
    Filed: May 28, 2002
    Publication date: December 19, 2002
    Applicant: Samsung Electronics Co., Ltd.
    Inventor: Jong-Man Kim
  • Patent number: 6218674
    Abstract: The electron beam projection exposure apparatus of the present invention reduces the incidence of defects in patterns formed by exposure on a substrate and includes an illumination optical system for generating an electron beam, a mask placed in a prescribed location including a mask stage for aligning and scanning the mask, a projection-imaging optical system for projecting an image of a pattern formed on the mask onto a substrate with the substrate including a substrate stage for positioning and scanning the substrate. The electron beam projection exposure apparatus further includes at least one filter placed in the proximity of the mask for filtering dust and for preventing dust particles from inhibiting the passage of the electron beam to said substrate.
    Type: Grant
    Filed: September 11, 1998
    Date of Patent: April 17, 2001
    Assignee: Nikon Corporation
    Inventor: Tetsuya Oshino
  • Patent number: 5776643
    Abstract: A light-sensitive material for a color filter is described, which comprises a support having provided thereon a peeling layer and further provided thereon at least three silver halide emulsion layers which are different in color sensitivity. A process for producing a color filter is also described, which comprises the steps of adhering an emulsion side of the light-sensitive material to a light-transmitting substrate, peeling the support off the light-sensitive material, pattern-exposing the emulsion side, and subjecting the material to development processing and desilvering processing.
    Type: Grant
    Filed: May 6, 1997
    Date of Patent: July 7, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Hiroyuki Hirai
  • Patent number: 4751173
    Abstract: A process for hardening gelatin, which comprises incorporating in a gelatin-containing material at least one hardening compound represented by formula (I) ##STR1## wherein R.sup.1 represents a substituted or unsubstituted aryl group, Z represents non-metallic atoms necessary for the formation of a nitrogen-containing heteroaromatic ring which may optionally be substituted, X.sup..crclbar. represents an anion, and n represents 0 or 1 provided that when n represents 0, the compound forms an inner salt. The gelatin hardeners can rapidly harden gelatin with little or no post-hardening and react with reactive groups of gelatin with high selectivity.
    Type: Grant
    Filed: December 29, 1986
    Date of Patent: June 14, 1988
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hisashi Okamura, Hiroshi Kawamoto
  • Patent number: 4588678
    Abstract: A silver halide photographic material and a photographic development method are described, wherein the development method is carried out using a processing liquid containing a dialdehyde series hardening agent, and the photographic material comprises a support having thereon at least a silver halide emulsion layer containing silver halide grains having a silver iodide content higher than 1.5 mole %, with the silver iodide distribution in the silver halide grains being homogeneous throughout the grains or the silver iodide content being higher in the internal portion than in the surface portion of the silver halide grains.
    Type: Grant
    Filed: October 4, 1984
    Date of Patent: May 13, 1986
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Hideo Ikeda