Abstract: An image formation process comprising image exposing a photosensitive element which contains at least a photosensitive silver halide, a binder and a dye donating compound which forms or releases a diffusive dye corresponding or inversely corresponding to an exposure amount, and transferring the diffusive dye formed or released to a dye fixing element by heat development in the presence of a base and/or a precursor thereof, wherein the process further comprises the step of feeding water to said photosensitive element after image exposure, and the photosensitive element is maintained at a temperature of 40.degree. to 90.degree. on undergoing exposure, whereby photographic performance of the heat development photosensitive material exhibits good stability to changes in ambient temperature on undergoing exposure.

Abstract: There is provided a silver halide photographic, black-and-white medical hard copy material, comprising an opaque reflecting polymeric support and at least one hydrophilic colloid outermost layer, characterized in that:(i) the material comprises a silver halide emulsion layer A and a silver halide emulsion layer B, coated on the same side of said support, the emulsion layer B being closest to said support and(ii) the silver halide emulsion layer A is faster than the silver halide emulsion layer B.Emulsion layer A is preferably between 1.25 and 3.20 times faster than emulsion layer B.A method is also provided for printing radiological images in combination with the protocol describing said radiological images onto a single sheet of hard-copy film.

Abstract: The present invention provides a method for making a lithographic printing plate from an original containing continuous tones comprising the steps of:frequency modulation screening said original to obtain screened dataimage-wise exposing according to said screened data an imaging element comprising in the order given on a hydrophilic surface of a support (i) an image receiving layer containing physical development nuclei, (ii) a photosensitive layer containing one or more silver halide emulsions being in water permeable relationship with said image receiving layerapplying an aqueous alkaline solution to the imaging element in the presence of (a) developing agent(s) and (a) silver halide solvent(s),treating the imaging element to remove the layer(s) on top of said image receiving layer, thereby uncovering said silver image formed in said image receiving layer,characterized in that said aqueous alkaline solution is substantially free from thiosulphate ions and bromide ions and contains an aminoalcohol in an amo

Abstract: A method for generating a screened reproduction of a multiple tone image comprising the steps of frequency modulation screening the multiple tone image to obtain screened data representing tones of the multiple tone image in terms of halftone dots, reproducing the halftone dots on an imaging element by means of a scanwise exposure, characterized in that the scanwise exposure for rendering a halftone dot is time modulated.

Abstract: The invention is directed to a method and apparatus of projection lithography in which the contrast introduced into a radiation sensitive material caused by the proximity effect is effectively removed in a single exposure. Patterned radiation is transmitted through a lens system with at least one lens and a back focal plane filter. The back focal plane filter has at least two apertures, an image aperture and a proximity effect correction aperture. Patterned radiation is transmitted through the image aperture and introduces the desired image into the energy sensitive resist material. A portion of the inverse pattern radiation is transmitted through the proximity effect correction aperture and onto the energy sensitive resist material to effectively remove the contrast therein caused by the proximity effect.

Abstract: The invention provides a method of treating silver chloride emulsions comprising providing a silver chloride emulsion, adding gold and sulfur chemical sensitizers, heating to chemically sensitize said emulsion, cooling to below about 50.degree. C., adding bromide to the emulsion and then after bromide addition adding spectral sensitizing dye.

Abstract: A method for generating a screened reproduction of a multiple tone image comprises the steps of frequency modulation or stochastic screening the multiple image to obtain screened data representing tones of the multiple tone image in terms of halftone dots; reproducing the halftone dots on an imaging element by means of a scanwise exposure, wherein the size or composition of the halftone dot is modulated, by varying the number of microdots (or rels) composing a halftone dot.

Abstract: A dye image forming photographic element is disclosed containing at least one green or red sensitized silver halide emulsion layer containing a dye-forming coupler and silver halide grains. At least 50 percent of the projected area of the silver halide grains is accounted for by grains (a) containing greater than 50 mole percent chloride, based on silver, (b) having {100} major faces, (c) exhibiting a thickness of 0.2 .mu.m or less, (d) exhibiting a mean equivalent lent circular diameter in the range of from 3 to 6 .mu.m, and (e) including a core and a surrounding band containing a higher level of iodide ions than the core and up to 30 percent of the silver forming the grains. The photographic element exhibits a sensitivity of greater than 750, where sensitivity is measured as the reciprocal of the exposure in lux-seconds required to produce a density of 0.15 above fog when the photographic element is exposed to a 3000.degree. K.

Abstract: A satisfactory resist pattern can be formed, by focusing detection at a high accuracy, from a photoresist containing an infrared absorption dye and by an exposure method of determining focusing by an infrared light and using a photoresist containing the infrared absorption dye as the photoresist, whereby the focusing detection system is free from the effect of the secondary reflection or the like, that is, the focusing detection system is free from the effect of light transmitted or reflected in the substrate, whether the substrate is infrared light reflecting or permeating.

Abstract: A modulated writing light beam (18) having a wavelength to which an imaging element (33) is sensitive and a reference light beam (46) having a wavelength to which the imaging element (33) is insensitive are generated and simultaneously directed to a moving optical device (22) to cause the writing light beam (18) to scan across the surface of the imaging element (33) in a first scanning direction (C) and the reference light beam (46) to scan across the surface of a light detecting element (50) in the first scanning direction (C) to generate signals indicative of the position of the writing light beam (18) on the surface of the imaging element (33). The writing light beam (18) is modulated and the imaging element (33) is moved in a second scanning direction (B) in response to the signals generated by the light detecting element (50). Thereafter the exposed imaging element (33) is processed to prepare a lithographic printing plate.

Abstract: There is provided a method for making a lithographic printing plate according to the DTR-process from a printing plate precursor comprising on a hydrophilic surface of a support in the order given a layer of physical development nuclei and a silver halide emulsion layer from an original containing continuous tones comprising the steps of:frequency modulation screening said original to obtain screened data,image-wise exposing said printing plate precursor according to said screened data,developing a thus obtained image-wise exposed lithographic printing plate precursor by means of an alkaline processing solution in the presence of a developing agent and a silver halide solvent yielding a lithographic printing plate, characterized in that the frequency modulated halftone dot with the greatest main dimension on said lithographic printing plate has a main dimension of more than 21 .mu.m.

Abstract: A method for exposing a radiation sensitive material is disclosed comprising a double-sided laser exposure of the same information in register on both sides. In a preferred embodiment this material is a thermal imaging medium comprising a support, an image forming layer preferably containing carbon black, a release layer and an adhesive layer. By laser exposing this medium in register on both sides a heat mode image can be obtained after lamination and delamination which shows practically no pinhole defects.

Abstract: A method for making a lithographic printing plate according to the silver salt diffusion transfer process image-wise exposes an imaging element with a high intensity short time scanning exposure. The imaging element comprises on a support in the order given a silver halide emulsion layer and a layer containing physical development nuclei. A thus obtained image-wise exposed imaging element is subsequently developed in the presence of a developing agent and silver halide solvent. The image-wise exposure is focused substantially within the silver halide emulsion layer of the imaging element. The present invention further provides an apparatus for carrying out the above method.

Abstract: An electron beam shaping mask for an electron beam with pattern writing capability, includes a substrate with various opening patterns and metallic films, which are respectively formed on top- and bottom-surfaces of the substrate. The metallic films serve as foundation metallic layers. According to the structure, a total thickness of the metallic layer is divided into the two thin metallic films. Since the substrate is protected from both sides by the metallic films, its thickness can be made to be thin. Therefore, a highly accurate patterning can be easily performed, and thermal stresses can be decreased and exfoliations of the metallic films can be avoided.

Abstract: A method of imagewise exposing and processing a photographic silver halide color material in a machine containing a number of non-replenished processing tanks or processing tanks that are supplied from a non-replenished source,the method comprising increasing the exposure time automatically by a predetermined factor related to the area of photographic material already processed and the volume of the non-replenished processing solution.

Abstract: An improved image display material comprising a light sensitive tabular grain silver chloride emulsion spectrally sensitized to a peak wavelength of less than about 475 nm, and a method of use comprising the step of optically printing a color image onto the improved color photographic display material is provided. The material and method enable reduced printing times, improved color reproduction and lowered image granularity.

Abstract: The invention is directed to a method and apparatus of projection lithography in which the contrast introduced into a radiation sensitive material caused by the proximity effect is effectively removed in a single exposure. Patterned radiation is transmitted through a lens system with at least one lens and a back focal plane filter. The back focal plane filter has at least two apertures, an image aperture and a proximity effect correction aperture. Patterned radiation is transmitted through the image aperture and introduces the desired image into the energy sensitive resist material. A portion of the inverse pattern radiation is transmitted through the proximity effect correction aperture and onto the energy sensitive resist material to effectively remove the contrast therein caused by the proximity effect.

Abstract: Sensitometers are used for monitoring photographic and radiographic processes, and then making it possible to control these processes. However, although it is relatively straightforward to obtain control strips for individual sensitometers, it is often difficult to compare the results of control strips which have been exposed using different sensitometers. Described herein is a method for calibrating or cross-referencing sensitometers. The method comprises exposing a first control strip to a step wedge in the first sensitometer, and a second control strip-to a step wedge in the second sensitometer, the first and second control strips being formed on the same photographic material. The material is then processed and the characteristics of the material is determined using the known exposures given to the material by the second sensitometer and the density values obtained corresponding to those exposures.

Abstract: In a first processing step, whether a first photosensitive material is a particular photosensitive material is detected. If it is detected at least that the first photosensitive material is the particular photosensitive material, processing conditions in the first processing step are recorded in a predetermined position on the first photosensitive material. Exposure conditions in the exposure step are set in accordance with one of the result of the detection and the processing conditions recorded on the first photosensitive material. The second photosensitive material is exposed under the set exposure conditions. If the first photosensitive material is detected to be a particular photosensitive material, the setting of the exposure conditions is changed in the exposure step, and the exposure conditions are set in such a manner as to compensate the difference in the characteristic occurring in the image of the particular first photosensitive material depending on standard processing and particular processing.

Abstract: The present invention relates to a resist processing device and resist processing method that enable resist pattern formation with a high degree of accuracy, and furthermore, enable in continuous dry etching, an isotropic etching possessing extremely high selectivity. The resist processing device is provided with at least a mechanism for the radiation of ultraviolet rays onto a substrate having a resist formed thereon, and a mechanism for the introduction of inert gas into the device. The resist processing method is characterized in that the radiation of ultraviolet rays onto a substrate which has a resist form thereon is conducted in an inert gas atmosphere.

Abstract: An electron beam exposure method for controlling the solubility of resist layers used in a variety of lithography processes, to permit removal of the resist material from selected positions and depths in the resist. By controlling the energy of a uniform electron beam impinging on the resist, the method selects a resist depth for applying a dose of electrons, the effect of which is to change the solubility properties of the resist material at the selected positions and depths. Subsequent removal of unwanted portions of the resist produces desired resist wall slope and edge profiles in the developed patterns in photoresist. One embodiment of the invention uses the same basic method to produce three-dimensional structures in the resist material, including bridge-like structures in which lower layers are removed from beneath intact upper layers.

Abstract: A photographic optical system for substantially eliminating non-contact interference fringes in a photographic film comprises: (a) a source of polarized electromagnetic radiation, the radiation being characterized by a wavelength and an incident polarization angle; and (b) a photographic film capable of optical communication with the source and serving to transmit or reflect a portion of the radiation, the film comprising a silver halide emulsion layer on a birefringent support, the support being characterized by a thickness, an emulsion layer interface, an air interface, and birefringence that is dependent on the wavelength of the radiation; wherein the radiation wavelength and incident polarization angle and the support thickness and birefringence are selected such that radiation which penetrates the film and reflects from the air interface exits the support at the emulsion layer interface polarized at an angle substantially perpendicular to the incident polarization angle; whereby the photographic film may

Abstract: An electronic printing method which comprises subjecting a radiation sensitive silver halide emulsion layer of a recording element to actinic radiation of at least 10.sup.-4 ergs/cm.sup.2 for up to 100 microseconds duration in a pixel-by-pixel mode is disclosed. The radiation sensitive silver halide emulsion layer contains a silver halide grain population comprising at least 50 mole percent chloride, based on silver, forming the grain population projected area. At least 50 percent of the grain population projected area is accounted for by tabular grains that are bounded by {100} major faces having adjacent edge ratios of less than 10, each having an aspect ratio of at least 2.

Abstract: An image is formed in a color photosensitive material through scanning exposure by using at least one semiconductor laser excited solid laser including a semiconductor laser, a non-linear optical element and means for controlling the temperature thereof as a light source for producing a laser beam. The laser beam is modulated by an external modulator in accordance with the image to be formed. Among the combinations of photosensitive layers and laser beams, at least two laser beam light sources are such that a laser beam has a wavelength falling within .+-.20 nm from the maximum wavelength in the spectral sensitivity distribution of the corresponding photosensitive layer. Each photosensitive layer has a spectral sensitivity distribution with a peak width of up to 40 nm.

Abstract: Fabrication of 0.25 gm design rule or smaller devices on chips, that may attain levels of 256 megabit or higher depends upon lithographic patterning by use of accelerated charged particle beams. Fabrication is expedited by acceleration values resulting in deBroglie wavelengths at least in order of magnitude smaller than such design rule to permit cost saving both in fabricating apparatus and resulting devices. Most importantly, such wavelength values permit significant variation in spatial angle of incidence of beam to wafer to permit both large instantaneous exposure areas and in temporal angle of incidence to expedite beam scanning as emitted from a fixed particle source.

Abstract: Photoactive cationic organic polymers are provided which are electrically insulating and which are capable of photolysis to an electrically conductive form. The organic polymer includes a C-A linkage, wherein C is a chalcogenide-sulfide, selenide or telluride-in the polymer backbone chain and A is in aryl or alkyl group. The C-A linkage is capable of being cleaved in the presence of ultraviolet light to release A as a free radical and cause the polymer to become electrically conducting in the presence of the light while the remainder of the polymer remains electrically non-conducting. A thin film of such a polymer containing an electrically insulating region and a photolysed electrically conductive region may be used as a semiconductor. Methods for forming photoactive arylated or alkylated poly(phenylene chalcogenide) polymers involving the step of direct arylation or alkylation of a poly(phenylene chalcogenide) polymer are also provided. In addition, a method is provided for forming a semiconductor.

Abstract: In accordance with a proposed resist pattern forming method, contact angles between the surface of a resist and a rinse is adjusted within a predetermined range, a volatil surfactant which does not remain by drying is mixed in the rinse so as to reduce a surface tension, the rinse is dried under a critical condition of the rinse in order not to cause the surface tension to exert. The occurrence of an attractive force between the resist patterns may be thereby weakened or nullified, so that falling of the patterns can be effectively prevented which very often happened at forming fine resist patterns or resist patterns of high aspect. On the other hand, depending upon structure of said resist pattern, it is possible to effectively prevent outermost main patterns of gathering resist patterns from falling down. By providing such effects, yieldings of products are increased. Further, the present invention may be also applied to a lithography illumination sources of which are light, electron, X-ray, ion beam, etc.

Abstract: In accordance with a proposed resist pattern forming method, contact angles between the surface of a resist and a rinse is adjusted within a predetermined range, a volatil surfactant which does not remain by drying is mixed in the rinse so as to reduce a surface tension, the rinse is dried under a critical condition of the rinse in order not to cause the surface tension to exert. The occurrence of an attractive force between the resist patterns may be thereby weakened or nullified, so that falling of the patterns can be effectively prevented which very often happened at forming fine resist patterns or resist patterns of high aspect. On the other hand, depending upon structure of said resist pattern, it is possible to effectively prevent outermost main patterns of gathering resist patterns from falling down. By providing such effects, yielding of products are increased. Further, the present invention may be also applied to a lithography illumination sources of which are light, electron, X-ray, ion beam, etc.

Abstract: A method of adjusting exposure of an energy beam to a lithographic resist sensitive to the energy beam, which method comprises determining where in a pattern to be exposed the energy level will exceed a critical thermal level, and adjusting the pattern and kind of exposure of the resist where the critical level is exceeded. One technique is to adjust the level exposure of the resist to a lower level equal to or less than the critical level with repeated exposures of the pattern in areas where the critical level is exceeded. The energy level monitored can be a thermal level measured as a temperature of the resist. A second technique is to adjust the exposure level by modifying the pattern and duration of exposure of the resist to a longer duration providing exposures equal to or less than the critical level with the modified pattern of exposures of the pattern in areas where the critical level is exceeded.

Abstract: It has been found that for a SCALPEL lithographic system thermal effects dictate that the acceleration voltage for the exposing electrons be maintained within a specific range. This range depends on a variety of factors but is generally in the 50 to 150 KeV region. Additionally, thermal considerations also dictate the method of scanning the mask to print an entire wafer.

Abstract: Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on discrimination as between scattered and unscattered radiation by accelerated electrons. Use of such masks is of value as applied to scanning systems providing for dynamic correction of aberrations by physical movement of or field shaping of the objective lens to maintain the optical axis coincident with the scanning information-scanning beam.

Abstract: A process of radiation-induced formation of a uniform metal or metal oxide region suitable for device application or for repairing transparent defects in pattern metal films of lithographic masks has been found. The process requires that the heat evolved during the radiation-induced reactions be carefully limited to produce the desired uniformity.

Abstract: A process of producing an exposure mask by which the accuracy of a pattern of a mask film to be formed on a surface of a transparent substrate is improved and also the accuracy in registration between layers is improved. The process comprises the step of correcting, upon exposure for the formation of a mask pattern, the position of a mask pattern by a different correction amount in accordance with a ratio at which the area of the mask film which remains after etching occupies in the entire area of a transparent substrate on which the mask film is formed.

Abstract: An emulsion covered photo printing plate for use in printing an echant resist pattern on a light sensitive etchant resist located on a metal web covered with an etchant resist wherein the emulsion layer contains an exterior master pattern separated from an interior master pattern by a strip line with the interior master pattern having optically clear spacers located on top of the emulsion layer opaque projections and the nonopaque emulsion layer and the exterior emulsion layer having clear spacers located on top of the exterior emulsion layer with the area of the strip line being substantially devoid of spacers to provide evacuation channel past the strip line between the exterior master pattern and the interior master pattern.

Abstract: Colored copies of outstanding quality are obtained from half tone originals by means of a color paper of extremely hard gradation if the silver halide emulsions of the color paper consists substantially of silver chloride and if, before the material is processed, a filtered, homogeneous exposure is carried out, extending from sub-threshold pre-exposure to an exposure which reduces the maximum color densities by 0.4 density units.

Abstract: The present invention relates to a method for exposing a photosensitive imaging sheet using a low temperature exposure step. The method includes the steps of:providing an imaging sheet including a substrate having provided on one of its surfaces a layer of microcapsules, said microcapsules containing an image-forming agent and a photohardenable composition comprising a free radical addition polymerizable or cross-linkable compound and a photoinitiator, said photoinitiator being capable of absorbing actinic radiation and producing free radicals which initiate free radical polymerization or cross-linking of said polymerizable or cross-linkable compound;cooling said imaging sheet to a temperature below ambient temperature; andimage-wise exposing said imaging sheet to actinic radiation while said imaging sheet is at said below ambient temperature.

Abstract: An image recording method, where the image is transferred by superposing an exposed light-sensitive material and an image receiving material on the surface of a drum.Before superposing, in circumferential direction with respect to the axial direction of the drum reduced or magnified image is exposed onto the light-sensitive material.When a reduced image has been exposed, the exposed light-sensitive material will be positioned between the image receiving material and the surface of the drum. When a magnified image has been exposed, the image receiving material will be positioned between the exposed light-sensitive material and the surface of the drum. In this way an image without distortions will be transferred.

Abstract: An electron beam lithography method with multiple low-dose scans by an electron beam (320) exposes a resist (402) pattern.

Abstract: To achieve higher resolution integration in semiconductor device fabrication using electron beam (EB) or X-ray lithography or a method of lithography is disclosed in which: (1) an EB or X-ray resist material is mixed with an absorbing material for ultraviolet (UV)-rays; (2) the resist layer is selectively exposed to the EB or X-ray with the total irradiation density less than applied in a conventional EB or X-ray exposure; and (3) the entire surface of the resist layer is further exposed to the UV-ray for a total irradiation period less than a minimum level required to induce a reaction in said resist layer. Resist materials such as chloromethylated polystyrene (CMS), polydiarylorthophtalate (PDOP), and polymethylmethacrylate (PMMA), each mixed with p-azido acetophenone as the UV-ray absorbing material improve contrast and resolution of the resist layer. Other UV-ray absorbing materials such as p-azido benzoic acid and 3-sulfonylazido benzoic acid achieve the same result.

Abstract: A method for forming an image is disclosed which comprises providing a photosensitive material comprising at least one light-sensitive layer and having a gamma value of not less than 10 and a capability of being handled under bright light, subjecting said light-sensitive layer image-wise exposure to light having substantially exclusive of wavelengths of 370 nm or shorter through originals, for example, a line original and a halftone original arranged in a superposed condition, followed by contrast development processing, whereby excellent quality of images, for example, letter images, can be obtained.

Abstract: Fabrication of devices of micron and submicron minimum feature size is accomplished by lithographic processing involving a back focal plane filter. A particularly important fabrication approach depends upon mask patterns which produce images based on descrimination as between scattered and unscattered radiation.

Abstract: A soft edge mask comprises a panel having an opaque area forming a mask portion and defined by a clearly focussed edge of a predetermined shape, a transparent area forming a clear portion defined by a clearly focussed edge of the same said predetermined shape, and a margin portion extending between the opaque portion and the clear portion, the margin portion having a light transmissability varying progressively from the edge of the mask portion to the edge of the clear portion, and, at each position between the mask portion and the clear portion, being clearly focussed and having the same said predetermined shape.

Abstract: The invention relates to a method of forming of a patterned photopolymer coating on a printing roller in which a photopolymer coating, present on said roller, and covered by a light-sensitive intermediate layer is exposed in a first stage to form an image of opaque and translucent parts in said intermediate layer.Subsequently the photopolymer layer is exposed via the image formed in the intermediate layer, after which the photopolymer layer is developed.Between abovementioned exposures, in case of a relatively thick, flexible, photopolymer, a period is waited to ensure that depressed parts of the photopolymer layer have returned to their original state.The invention also relates to a printing roller thus obtained.

Abstract: Disclosed herein is an electrophotographic apparatus and method which repeatedly use an electrophotographic photoreceptor having on an electroconductive support a photosensitive layer formed by dispersing a charge-generating substance in a binder containing a charge-transporting substance and a binder resin and a means or step for optically erasing the residual charges on the photoreceptor after transfer, the main component of a light used in the means for optically erasing the residual charges having the wavelength range which satisfies the condition defined in the formula (1):l/d.ltoreq.0.5 (1)ps wherein l is the distance of penetration of the light, i.e. the distance in the direction of depth in which the light incident on the photosensitive layer is attenuated to one tenth in intensity, and d is the thickness of the photosensitive layer.

Abstract: An article and method for its perparation is disclosed wherein the article comprises a substrate having at least one planar surface on which is disposed a thermally decomposable metallo-organic compound in active association with a photosensitive dye. The article can be easily processed with, for example, a source of energy such as a laser beam to encode information or produce electroconductive lines.

Abstract: A photographic element is disclosed for handling under a first radiation source and imagewise exposure to a second radiation source having a solid particle dispersion filter dye layer that absorbs radiation emitted to which the element is sensitive emitted by the first source.

Abstract: In a patterning method according to this invention, a surface region of a resist layer is solution-retarded by a developer, and, then, the resist layer is patterned. Therefore, a desired shape of a side wall of the resist layer may be obtained by varying a solubility of the resist layer, with the result that a resist pattern with the side wall orthogonal to a surface of the substrate or the overhung side may be formed.

Abstract: A radiation beam used for selectively exposing a surface is moved in a helical path by means of two oscillating mirrors vibrating about axes that are mutually perpendicular. By maintaining a constant product for oscillating frequency and rotational oscillatory mirror deflection, the level of exposure can be made substantially constant.

Abstract: A process for the formation of an image comprises(i) applying to a substrate a layer of a liquid composition which comprises(A) a polymerizable material having, on average, more than one polymerizable acrylic group per molecule,(B) a first radiation-activated polymerization initiator for (A) and(C) a second radiation-activated polymerization initiator for (A), the initiator (B) being activatable by radiation of longer wavelength than that of radiation by which (C) is activatable,the composition being substantially free from polymerizable epoxide or vinyl ether groups when (B) or (C) is an aromatic onium salt,(ii) subjecting the composition to radiation having a wavelength at which one of (B) and (C) is activated but the other is not substantially activated, thereby polymerizing (A) such that the layer of liquid composition is solidified but remains curable,(iii) subjecting the solidified layer in a predetermined pattern to radiation having a wavelength at which the initiator not activated in stage (ii) is act

Abstract: A method for preparing a shadow mask with a plurality of apertures for a color picture tube from a metal shadow mask sheet includes the step of exposing the entire surface of the photosensitive layers provided on the both surfaces of the metal sheet to an unpatterned light before or after the step of exposing the photosensitive layers to patterned light in order to form resist films.