Abstract: Disclosed are a photocurable composition which is developable with an aqueous alkaline solution and such calcined patterns as a conductor pattern, a vitreous dielectric pattern, and a fluorescent pattern which are obtained by the use of the photocurable composition.

Abstract: A negative type photoresist composition is composed of a polymer which contains a repetition unit which is expressed by a general chemical formula (1), a crosslinker composed of a compound which contains a functional group which is expressed by a general chemical formula (2), and a photo-acid generator which generates acid in response to a light. The chemical formula (1) is as follows, ##STR1## In this case, R.sup.1 is a hydrogen atom or a methyl group, R.sup.2 is an alkylene group containing carbon atoms in a range of 7 to 18 and having a bridged cyclic hydrocarbon group, and a weight average molecule weight of the polymer is in a range of 1000 to 500000. Also, the chemical formula (2) is as follows, ##STR2## In this case, R.sup.8 is a hydrogen atom, an alkyl group containing carbon atoms in a range of 1 to 6 or an oxoalkyl group containing carbon atoms in a range of 3 to 6.

Abstract: A photosensitive composition comprising, an oligomer having a backbone chain comprising an alicyclic skeleton and/or a conjugated polycondensed aromatic skeleton, the backbone chain being acid-decomposable or hydrolyzable, and a photo-acid-generating agent.

Abstract: The present invention is directed to a process for device fabrication and resist materials that are used in the process. The resist material contains a polymer that contains monomeric units that contain alicyclic formate moieties, and at least one other type of monomeric unit. The polymer may be formed by polymerization or by polymer modification of an existing polymer, and the resulting polymer either has alicyclic moieties incorporated into the polymer backbone or pendant to the polymer backbone via saturated hydrocarbon linkages. A preferred polymerization process is free radical polymerization, in which other monomers are selected for polymerization with the alicyclic moiety-containing monomer on the basis of the ability of the monomer to copolymerize by free radical polymerization.

Abstract: Thermosetting, bottom-applied polymeric anti-reflective coatings exhibiting high optical density, rapid plasma etch rates, high solubility in preferred coating solvents, excellent feature coverage, and improved stability in solution are disclosed. The principal component of these new anti-reflective coatings is a polyester resin produced by the reaction of one or more difunctional aliphatic carboxylic acids with a stoichiometric excess of a di- and/or a trifunctional aliphatic primary alcohol, wherein at least one of the dicarboxylic acids may contain a reactive methylene (--CH.sub.2 --) group. The resulting polyester resin reaction product is further modified by attaching light-absorbing groups to some or all of the reactive methylene groups (if present) and/or hydroxy groups present on the resin. The dye-attached polyester resin is combined with an aminoplast crosslinking agent and acid catalyst in a suitable solvent system to form the final anti-reflective coating.

Abstract: A printing plate material producing prints with inhibited background staining is provided by formation of a photosensitive layer comprising nitrocellulose, a black coloring agent, e.g. carbon black, and an organic binder and having (1) a surface roughness of not greater than Rmax. 2.0 .mu.m or (2) a surface tension equivalent to a wettability index of not greater than 36 dyn/cm on a support. The nitrocellulose has a nitrogen content of 11 to 12.5% and a solution viscosity of about 1 to 1/8 second. The organic binder includes polyester resins such as solvent-soluble, noncrystal-line, linear, oil-free aromatic polyesters. Based on 100 parts by weight of the organic binder, the amount of nitrocellulose is about 5 to 300 parts by weight and that of the black coloring agent is about 0.5 to 50 parts by weight. The photosensitive layer may contain a crosslinking agent, e.g. melamine resin, and/or a water repellent, e.g. a silicone compound or a fluorine-containing compound.

Abstract: A radiation sensitive resin composition useful as a chemically amplified positive tone resist is provided. The composition comprises (A) a copolymer which becomes soluble in an alkali developing solution by the action of an acid, the copolymer containing a recurring unit (I) having a structure which is decomposed by the action of an acid and increases the solubility in an alkaline developing solution and a recurring unit(II) obtained from a compound having at least two (meth)acryloyl groups in the molecule by the cleavage of the carbon-carbon double bond, and (B) a photoacid generator which produces an acid on being irradiated by a radiation. The composition exhibits high resolution, superb capability of producing superior pattern forms, and excellent resistance to PED, and high process stability, is affected by a standing wave only to a minimum extent, and possessed prominent heat resistance.

Abstract: Photopolymerizable mixtures containing a polymeric binder mixture with salt-forming groups, a photopolymerizable monomer, a photoinitiator and at least 10% by weight of a vinyl acetate homopolymer or a vinyl acetate copolymer, and photopolymerizable recording materials made of such mixtures. They exhibit less oxygen sensitivity during the production of color proofs.

Abstract: A negative type image recording material capable of processing directly from computer and other digital data, with excellent printing durability at the time of printing and lack of staining. The negative type image recording material includes (A) a polymer containing the structure represented by the following general formula (I) in the polymer side chain, (B) a compound which cross-links in the presence of acid, and (C) a compound which generates an acid in the presence of light or heat: ##STR1## wherein, Ar.sub.1 represents an arylene group having 20 or less carbon atoms which may be substituted; X.sub.1 represents NR.sub.2, O, S or SiR.sub.3 R.sub.4 ; X.sub.2 represents NR.sub.5, O, S or SiR.sub.6 R.sub.7 ; R.sub.1 represents a hydrocarbon group having 20 or less carbon atoms which may be substituted; R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6 and R.sub.

Abstract: Thermosetting, bottom-applied polymeric anti-reflective coatings exhibiting high optical density, rapid plasma etch rates, high solubility in preferred coating solvents, excellent feature coverage, and improved stability in solution are disclosed. The principal component of these new anti-reflective coatings is a polyester resin produced by the reaction of one or more difunctional aliphatic carboxylic acids with a stoichiometric excess of a di- and/or a trifunctional aliphatic primary alcohol, wherein at least one of the dicarboxylic acids may contain a reactive methylene (--CH.sub.2 --) group. The resulting polyester resin reaction product is further modified by attaching light-absorbing groups to some or all of the reactive methylene groups (if present) and/or hydroxy groups present on the resin. The dye-attached polyester resin is combined with an aminoplast crosslinking agent and acid catalyst in a suitable solvent system to form the final anti-reflective coating.

Abstract: Disclosed herein is a photosensitive resin composition comprising a photopolymerizable monomer, thermoplastic polymeric binder and photoinitiator, wherein said photopolymerizable monomer comprises as least one species of water-soluble monomer and at least one species of water-insoluble monomer, both with two or more unsaturated reactive groups and said reactive groups in total range from 0.5 to 1.5 mole per kg of the solid content when calculated in accordance with the following formula (I): ##EQU1## wherein #M represents the total amount of said reactive group per kg of the solid content of said composition; M.sub.i represents the mole number of a photo-polymerizable monomer i per kg of said composition; Ni represents the number of the reactive groups in a photo-polymerizable monomer i; and k stands for the total number of the photo-polymerizable monomer contained in said composition.

Abstract: Provided are a photosensitive resin composition having an anionic group and a cationic group, which is characterized in that it has an anionic group content of 0.15 mole/kg or more and a cationic group content of 0.15 mole/kg or more and contains a cationic group-having polymer having a number average molecular weight of 1000 or more, and also a printing plate material to be produced by applying the composition onto a support.The composition has excellent developability with water, and this gives a flexographic printing plate having excellent durability in printing in aqueous ink and having excellent image reproducibility in flexography.

Abstract: A method for making an acrylic resin photoresist characterized by polymerization of an acrylic monomer in a solvent that dissolves all monomers and resultant polymers. The use of the solvent permits formation of acrylic resins suitable for use in the preparation of photoresists without recovery from its reaction mixture. Photoresists prepared from such polymers have improved transparency, especially at exposures of 193 mn or less.

Abstract: A toner resin composition and a method of making the same are disclosed. The toner resin composition comprises a polyester resin formed from a reaction between a polybasic acid or anhydride and a polyhydric alcohol, and a polyfunctional epoxy resin which is crosslinked to the polyester resin. The crosslinking is effected in the presence of a catalyst.

Abstract: The epoxidation of alkyds containing anhydrides or diacids with cycloaliphatic unsaturation results in epoxy resins which cure rapidly in UV light to produce uniform films without the use of flow modifiers. The fatty acid portion of the alkyd functions as an internal plasticizer. Crosslinking occurs through oxirane rings in both the anhydride and fatty acid moieties of the alkyd to produce hard, but not brittle films. Excellent water resistance is obtained without thermal post curing.

Abstract: The invention relates to a process for producing microstructure elements having structure depths of from several .mu.m to the mm region by imagewise irradiation of polymers with X-rays, where the polymers employed are aliphatic polyesters.

Abstract: A negative type photosensitive electrodepositing resin composition comprising (a) a polymer obtained by neutralizing a copolymer of acrylic or methacrylic acid and having an acid number of 20 to 300 with a basic organic compound, (b) a non-water-soluble monomer having two or more photopolymerizable unsaturated bonds in the molecule, (c) a non-water-soluble photoinitiator, and (d) a benzotriazole derivative having one or more carboxyl groups, is effective for giving electrodeposited films with a low voltage or low electric current in a short time, and usable for forming resist patterns with high degree of resolution.

Abstract: An electrophotographic imaging member including a substrate, a hole blocking adhesive layer, a charge generating layer and a charge transport layer, the hole blocking adhesive layer including a polyester film forming binder having dispersed therein a particulate reaction product of metal oxide particles and a hydrolyzed reactant selected from the group consisting of a nitrogen containing organo silane, an organotitanate and an organozirconate and mixtures thereof. Preferably, the electrophotographic imaging member is free of any distinct adhesive layer in contiguous contact with the hole. blocking adhesive layer. This imaging member may be utilized in an electrophotographic imaging process.

Abstract: A low melt toner resin with low minimum fix temperature and wide fusing latitude contains a linear portion and a cross-linked portion containing high density cross-linked microgel particles, but substantially no low density cross-linked polymer. The resin may be formed by reactive melt mixing.

Abstract: A toner resin composition comprising 5 to 40% by weight of a polyester (A) having a weight average molecular weight of 3,000 to 20,000 and 50 to 95% by weight of a styrene-acrylic copolymer (B). The styrene-acrylic copolymer (B) is comprised of 10 to 25% by weight of a high molecular weight polymer (B1) having a weight average molecular weight of 500,000 to 1,100,000 and 75 to 90% by weight of a low molecular weight polymer (B2) having a weight average molecular weight of 5,000 to 100,000. The high molecular weight polymer (B1) is comprised of a styrene component (b-1) and an acrylic ester and/or methacrylic ester component (b-2). The low molecular weight polymer (B2) is comprised of a styrene component (b-1), an acrylic ester and/or methacrylic ester component (b-2), 0.3 to 3 parts by weight, per 100 parts of the total weight of said component (b-1) and component (b-2), of an .alpha.-methyl styrene dimer (b-3) and 0.

Abstract: Polymeric electrophotographic toner and developer compositions are produced by methods including conventional as well as limited coalescence manufacturing techniques. The compositions are prepared by heating a diacid and a diol under conditions effective to form a chain transfer polyester, wherein either the diacid or the diol contain a disulfide moiety. The polyester is reacted with one or more vinyl monomers to form a block copolymer having polyester blocks linked to polyvinyl blocks by sulfide groups previously constituting the disulfide moiety. The block copolymer is reduced to a particulate form to a size suitable for use as an electrophotographic toner by conventional methods, evaporation limited coalescence, and suspension limited coalescence.

Abstract: There are disclosed a plastic resin film which comprises a polyester resin composition comprising at least two components of (A) a polyester copolymer and (B) a polymer having conductivity, preferably having a number average molecular weight of 500 to 5000, being laminated on at least one surface of a plastic film support; a light-sensitive photographic material which comprises at least one silver halide emulsion layer being laminated on said film laminate or plastic film; and a method for preparing a plastic film which comprises coating an aqueous solution of the polyester resin composition on at least one surface of a non-oriented plastic film support or uniaxially oriented plastic film support, stretching the coated support to at least monoaxial direction and then completing orientation crystallization.

Abstract: Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin, an acid-substituted ternary acetal polymer, and a copolyester of an unsaturated dicarboxylic acid and an oxyalkylene ether of an alkylidene diphenol. The acid-substituted ternary acetal polymers are comprised of recurring units which include three six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group, another of which is substituted with an aromatic or heterocyclic moiety, and a third of which is substituted with an acid group, an acid-substituted alkyl group or an acid-substituted aryl group.

Abstract: A photopolymerizable recording material is diclosed comprising a base material, a photopolymerizable layer and a cover layer which comprises a water-soluble polymer which is substantially impermeable to atmospheric oxygen, and a polymer which binds atmospheric oxygen and is virtually completely soluble in water at 20.degree. C. The material displays reduced sensitivity to atmospheric oxygen, even on prolonged storage and at elevated ambient temperatures and elevated atmospheric humidity.

Abstract: Photosensitive compositions, useful in lithographic printing plates which can be developed with aqueous developing solutions, comprise a diazo resin and a binary acetal polymer which functions as a polymeric binder. The binary acetal polymers are comprised of recurring units which include two six-membered cyclic acetal groups, one of which is unsubstituted or substituted with an alkyl or hydroxyalkyl group and the other of which is substituted with an aromatic or heterocyclic moiety.

Abstract: Disclosed is a photosensitive composition comprising a diazo resin and a polymeric compound containing a structural unit represented by the following formula (I) in the molecule: ##STR1## wherein J represents a divalent linking group and n is 0 or 1. Disclosed is also a photosensitive lithographic printing using the photosensitive composition.

Abstract: A photopolymerizable mixture is disclosed that contains a polymer binder, a polymerizable compound having at least one terminal ethylene double bond and a boiling point above 100.degree. C. at normal pressure, a hexaarylbisimidazole and a 1,3-diarylpyrazoline or a 1-aryl-3-aralkenyl-pyrazoline. The mixture is suitable for the preparation of printing plates and photoresists and is distinguished by high photosensitivity and low sensitivity towards acid solutions.

Abstract: The present invention relates to photosensitive negative and positive tone compositions for imagewise deposition of polyimide on a substrate.

Abstract: A photographic recording material comprising a support, at least one photosensitive, gelatine-containing silver halide emulsion layer on one side of the support and a gelatine-containing NC layer on the other side of the support, in which the NC layer contains a certain hydrophilic polymer, is distinguished by the fact that there is relatively little E.sub.a curl during drying whereas sufficient E.sub.i curl is present after drying, so that the material is not damaged during processing.

Abstract: Photopolymerizable laminates suitable for producing flexible and resilient printing plates carry on a dimensionally stable base at least one intermediate layer and on top thereof a photopolymerizable layer which consists essentially of a mixture of a water-soluble copolymer or derivative of polyvinyl alcohol, a specific copolymerizable mono-functional (meth)acrylate, a photoinitiator and a thermal polymerization inhibitor.

Abstract: Orifices, cavities or spaces which are formed when printing plates are mounted on a plate cylinder are closed and/or sealed by means of a pasty, photocurable sealing or closing compound consisting of one or more photopolymerizable, ethylenically unsaturated low molecular weight compounds (a), one or more polymeric binder (b) which are compatible with the said compounds of component (a), one or more photopolymerization initiators (c) and one or more finely divided oxidic fillers (d) which, when mixed with components (a) to (c), give mixtures which are transparent to long-wavelength UV light. After it has been applied, this sealing or closing compound is cured by exposure and can then be mechanically processed. The process is particularly suitable for closing and/or sealing orifices, cavities or spaces in gravure printing plates mounted on plate cylinders.

Abstract: A photosensitive mixture that contains a photosensitive compound, for example, a photoinitiator or a diazo compound, and a reaction product of a polymer containing active hydrogen with an olefinically unsaturated compound represented by the formula ##STR1## wherein X and Y are the same or different and denote oxygen or sulfur,R.sub.1 is an olefinically unsaturated aliphatic radical containing 2 to 8 carbon atoms andR.sub.2 is a saturated aliphatic radical containing 1 to 8 carbon atoms or an aryl radical containing 6 to 10 carbon atoms,is suitable for producing photoresists and printing plates.

Abstract: A photosensitive mixture contains a photosensitive compound and a polymeric binder which s a reaction product of a compound represented by the formula ##STR1## wherein X and Y are the same or different, and each denotes oxygen or sulfur,R.sub.1 and R.sub.2 are the same or different, and each denotes an unsubstituted or substituted alkyl, cycloalkyl or alkoxy radical containing from 1 to 6 carbon atoms; an unsubstituted or substituted aryl or aryloxy radical containing from 6 to 10 carbon atoms; or, together with the phosphorus atom, a 5- or 6-membered heterocyclic ring which is unsubstituted or substituted or which carries a fused benzene ring,with a polymer containing active hydrogen. The novel binders used in the mixture can be easily prepared and yield photosensitive layers of good developability and developer resistance.

Abstract: For the production of printing plates, in particular lithographic printing plates by exposing a photopolymerizable recording material imagewise to actinic light and then effecting development with an aqueous alkaline developer, it is proposed to use photopolymerizable recording materials possessing a photopolymerizable copying layer (L) applied on a dimensionally stable base, where, in addition to containing ethylenically unsaturated photopolymerizable low molecular weight compounds, one or more photoinitiators, dyes and/or pigments, and, if required, further additives and/or assistants, the said copying layer (L) also contains, as a binder, one or more oligomeric and/or relatively high molecular weight copolymers which are soluble or dispersible in aqueous alkaline media and are based on cyclic dienes, in particular unsubstituted or substituted cyclopentadiene or unsubstituted or substituted di- or tricyclopentadiene.

Abstract: A solid, nonpolymeric amorphous mixture of compounds which is useful as a binder in optical recording layers and elements is disclosed. The mixture comprises at least two different compounds each having at least two linking components joining one multivalent organic nucleus with at least two organic nuclei wherein at least one of the multivalent organic nucleus and the organic nuclei is multicyclic. Methods for making such mixtures are also disclosed.

Abstract: Highly heat resistant polyimide and polyisoindoloquinazoline dione relief structures can be produced by applying radiation-sensitive soluble polymer precursors in the form of a film or foil on a substrate, irradiating the film or foil through negative patterns with actinic light or electrons or a light, electron, ion or laser beam, removing the unirradiated film or foil portions and optionally by subsequent annealing. The relief structures are produced in an inexpensive manner with high purity and in a chloride-free form as well as having economically acceptable exposure times as a result of using as polymer precursors poly-condensation products which are prepared in the presence of carbodiimides. The polycondensation products are prepared from diamino compounds or diamino compounds having at least one orthopositioned amido group and olefinically unsaturated tetracarboxylic acid diesters of aromatic and/or heterocyclic tetracarboxylic acid dianhydrides and olefinically unsaturated alcohols.

Abstract: A photosensitive material for electrophotography, which comprises an electroconductive substrate and a photosensitive layer formed on the substrate. The photosensitive layer comprising a charge transfer medium and a charge-generating pigment dispersed in the mediums. The photosensitive layer contains as the matrix resin a thermoplastic polyester consisting essentially of recurring units represented by the following general formula: ##STR1## wherein R.sup.1 stands for a phenylene group or an ethylene group, R.sup.2 stands for a group represented by the formula ##STR2## R.sup.3 stands for a direct bond or a divalent bridging atom or group, and the ring A may have a substituent not participating in the reaction.

Abstract: The invention provides a light-sensitive lithographic printing plate containing a light-sensitive composition which has a different degree of solubility in an exposed area of said printing plate than in an unexposed area of said printing plate when said printing plate is developed in a developing solution. This printing plate is produced by a process which comprises coating on a support a solution prepared by dissolving a light-sensitive composition containing a light-sensitive material and at least one fluorinated surfactant having Formula (I) in a quantity of between 0.005% by weight and 0.05% by weight based on the weight of said composition, in at least one solvent having (A) a solubility parameter of at least 8(cal/cm.sup.3)1/2, and (B) a boiling point within the range of from 100.degree. to 200.degree. C. Said Formula (I) is Rf-A-Y, wherein Rf is a partially or completely fluorinated hydrophobic alkyl moiety, A is a single bind or bivalent moiety and Y is a hydrophilic moiety.

Abstract: Resists sensitive to UV, electron beam and X-ray radiation with positive or negative tone upon proper choice of a developer are formulated from a polymer having recurrent pendant groups such as tert-butyl ester or tert-butyl carbonates that undergo efficient acidolysis with concomitant changes in polarity (solubility) together with a photoinitiator which generates acid upon radiolysis. A sensitizer component that alters wavelength sensitivity may also be added.

Abstract: A presensitized lithographic printing plate, which comprises a support having a hydrophilic surface. A non-silver light-sensitive layer capable of having formed therein a lipophilic image pattern and a direct positive light-sensitive silver halide emulsion layer are provided on the support in that sequence. The non-silver light-sensitive layer is provided with an adjacent hydrophilic colloid layer in which a resin is dispersed in fine particle form. The resin is a copolymer comprising (A) a recurring unit derived from at least one monomer of acrylic acid and methacrylic acid, and (B) a recurring unit derived from at least one monomer of an aralkyl acrylate and an aralkyl methacrylate.

Abstract: Thermally coalescible acrylic resin plastisol or organosol dispersions of reduced viscosity and thixotropy result when 0.2 to 40% by volume of the total volume of the dispersion of a volatile solvent is incorporated in compositions comprising particles of single-phase, random acrylic polymers or copolymers dispersed in nonvolatile plasticizers. Incorporation of a nonvolatile photopolymerizable component provides photosensitive dispersions useful for making relief and planographic printing plates, photoresists, and the like.

Abstract: The invention provides a positive resist comprising a copolymer of 60 to 90 mol % of phenylmethacrylate and 40 to 10 mol % of methacrylic acid.The invention also provides a method for forming a pattern of a positive resist comprising the steps of:forming on a substrate a film of a positive resist which comprises a copolymer of 60 to 90% of phenylmethacrylate and 40 to 10 mol % of methacrylic acid;pre-baking said positive resist film to cross-link said copolymer;selectively radiating said positive resist film which has been pre-baked with a high energy beam to form a latent image; anddeveloping said latent image with a developing solvent. Said positive resist has excellent resistance to dry etching and high sensitivity, and shows good adhesion to a substrate and can realize high resolution.

Abstract: Deposition of extraneous metal on the surface of an electroless or electrolytic plating resist is reduced by dispersing into the resist formulation fumed aluminum oxide microparticles.

Abstract: A novel photosensitive composition for dry development in the ultra-fine pattern formation of the semiconductor industry, which is composed of at least one of acrylic and vinyl ketone polymers and a specified subliming hisazide compound as a photocuring agent, is disclosed.The use of the photosensitive composition provides a very effective ultra-fine pattern formation process in the semiconductor industry with such advantages that unexposed areas are selectively removable by treating with a plasma, and consequently plasma development becomes available so that high resolution may easily be obtained. Automating and dry processing of all the stages ranging from development processing to stripping processing become available when using the photosensitive composition of this invention. No expensive treating reagents are needed and environmental pollution is eliminated.

Abstract: A method for forming an image by a positive resist process comprises:(1) exposing imagewise to actinic radiation a photoresist composition comprising:(a) a film-forming organic material having at least one substituted benzoin group of formula: ##STR1## where R.sup.1 denotes a hydrogen atom, an alkyl, cycloalkyl, cycloalkylalkyl, or aralkyl group or a group --(CH.sub.2).sub.b X; R.sup.2 denotes a hydrogen atom or an alkyl, cycloalkyl, cycloalkylalkyl, aryl or aralkyl group; R.sup.3 denotes a halogen atom or an alkyl, alkoxy, cycloalkyl, cycloalkylalkyl or phenyl group; X denotes a halogen atom, an alkoxy group, a phenoxy group, a group --COOR.sup.4 or a group --OOCR.sup.4, where R.sup.

Abstract: Compatible, aqueous developable photopolymerizable composition consisting essentially of (a) 22 to 32% by wt. of a monomeric compound having at least two terminal ethylenic groups, (b) 0.1 to 5.0% by wt of a photoinitiator or initiator system, (c) 40 to 80% by wt of a binder system which is the reaction product of (1) 65 to 87 parts by wt of a terpolymer of methylmethacrylate, butylmethacrylate and methacrylic acid as defined, (2) 5 to 20 parts by wt of a polyamide resin and (3) 5 to 20 parts by wt of a copolymer of vinyl pyrrolidone and vinyl acetate, (d) 0.03 to 0.10% by wt of a thermal polymerization inhibitor, and optionally up to 18% by wt of a plasticizer and up to 2.0% by wt of a tertiary amine capable of salt formation with a carboxylic acid. Aqueous developable photopolymerizable elements comprise a support bearing a layer of the composition. Relief printing plates can be prepared by imagewise exposing and developing the elements.

Abstract: A photosensitive element which comprises a support bearing a layer of negative-working tonable photoimaging composition comprising at least one organic polymeric binder (a), a photosensitizer (b) which generates an acid upon absorption of actinic radiation, and at least one compound taken from the group of ##STR1## as defined, binder (a) being plasticized by the decomposition product of either compound (c) or (d) or the combination thereof. The photosensitive element is useful in making color proofs.

Abstract: The invention relates to a method for the preparation of highly heat-resistant relief structures on the basis of polyimides, polyisoindoloquinazoline diones, polyoxazine diones and polyquinazoline diones by applying radiation-sensitive soluble polymer precursor stages to a substrate in the form of a film or a foil; irradiating the film or the foil through negative patterns with actinic light or by deflecting a light, electron or ion beam; removing the non-irradiated film or foil portions and optionally, by subsequent annealing; as well as the use of relief structures so prepared. It is an object of the invention to simplify the preparation of relief structures of the type mentioned.

Abstract: A photosensitive element which comprises a support bearing a layer of negative-working tonable photoimaging composition comprising at least one organic polymeric binder (a), a photosensitizer (b) which generates an acid upon absorption of actinic radiation, and at least one compound taken from the group of ##STR1## as defined, binder (a) being plasticized by the decomposition product of either compound (c) or (d) or the combination thereof. The photosensitive element is useful in making color proofs.

Abstract: A photosensitive composition comprising polyester, a half-esterified hydroxy alkyl acrylate (or methacrylate) of polybasic acid (or its anhydride), an ethylenic unsaturated bond-having vinyl monomer and a photo-polymerization initiator is especially useful for processing printed circuit boards.