Halogen Compound Containing Patents (Class 430/925)
  • Patent number: 4518676
    Abstract: Photopolymerizable compositions contain a cationically polymerizable material, such as an epoxide resin, a phenoplast, or an aminoplast, and, as photoinitiator, a diaryliodosyl salt of formula ##STR1## where R.sup.9 and R.sup.10 are the same or different and each represents a monovalent aromatic radical,x represents 1, 2, or 3, andZ.sup.x- is an anion of a protic acid.Suitable diaryliodosyl salts of formula V include diphenyliodosyl hexafluorophosphate, hexafluoroantimonate, tetrafluoroborate, toluene-p-sulfonate, and chloride.The compositions may be used as surface coatings and adhesives, and in the preparation of reinforced composites and printed circuits.
    Type: Grant
    Filed: September 9, 1983
    Date of Patent: May 21, 1985
    Assignee: Ciba Geigy Corporation
    Inventor: Edward Irving
  • Patent number: 4457971
    Abstract: Lithographic printing substrates ordinarily require a mechanical or chemical graining of aluminum surfaces. Such substrates are difficult and expensive to make. It has been found that lithographically suitable substrates can be prepared by the firing of monobasic phosphate solutions with dispersed particles therein. The presence of reactive metallic oxides enhances the properties of the surface.
    Type: Grant
    Filed: August 26, 1982
    Date of Patent: July 3, 1984
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Donald E. Cadwell, Larry A. Brey
  • Patent number: 4454219
    Abstract: A photosensitive resin composition comprising (a) a polymer obtained by using an aliphatic amino group-containing monomer as a comonomer, (b) an ethylenic unsaturated compound, (c) a photosensitizer and/or a photosensitizer system and (d) an organic halogen compound shows high photosensitivity and excellent resistance to plating and is usable as plating resists or etching resists.
    Type: Grant
    Filed: April 20, 1982
    Date of Patent: June 12, 1984
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Takashi Yamadera, Nobuyuki Hayashi
  • Patent number: 4439517
    Abstract: A layer of a photoresist composition on a substrate is exposed imagewise to actinic radiation, as through a negative, the photoresist composition comprising an epoxide resin, a benzenoid polyamine, and an aromatic compound which liberates an acid on exposure to actinic radiation. The composition is then heated such that where the radiation has struck the composition local curing of the epoxide resin takes place, the liberated acid acting as accelerator in the curing by the benzenoid polyamine. In parts not struck by radiation the acid accelerator is not liberated and so curing (and insolubilization of the epoxide resin in solvents) takes place much more slowly. By treatment with a suitable solvent unirradiated (and hence uncured) portions of the compositions are dissolved away, an image being formed on the substrate.
    Type: Grant
    Filed: January 10, 1983
    Date of Patent: March 27, 1984
    Assignee: Ciba-Geigy Corporation
    Inventor: Edward Irving
  • Patent number: 4371607
    Abstract: This invention relates to a novel 4-halogeno-5-(halogenomethyl-phenyl)-oxazole derivative; to a radiation-sensitive composition which, as the radiation-sensitive compound, contains a 4-halogeno-5-(halogenomethyl-phenyl)-oxazole derivative; and to a process for the preparation of the novel 4-halogeno-5-(halogenomethyl-phenyl)-oxazole derivatives.
    Type: Grant
    Filed: June 9, 1981
    Date of Patent: February 1, 1983
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Reinhard Donges
  • Patent number: 4371606
    Abstract: This invention relates to a novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivative; to a radiation-sensitive composition which, as the radiation-sensitive compound, contains a 2-halogenomethyl-phenyl)-4-halogeno-oxazole derivative; and to a process for the preparation of the novel 2-(halogenomethyl-phenyl)-4-halogeno-oxazole derivatives.
    Type: Grant
    Filed: June 9, 1981
    Date of Patent: February 1, 1983
    Assignee: Hoechst Aktiengesellschaft
    Inventor: Reinhard Donges
  • Patent number: 4360583
    Abstract: The invention relates to high resolution video storage disks comprising a substrate having disposed thereon a film of a monofunctionalized substituted tetraheterofulvalene compound and a halocarbon. The tetraheterofulvalene compound can have the molecular formula ##STR1## where X can be S and/or Se R can be an alkyl group having from about 1 to about 8 carbon atoms or a benzyl group wherein said benzyl group can be a part of a polymer chain;and Y can be either an ester or an ether.
    Type: Grant
    Filed: December 15, 1980
    Date of Patent: November 23, 1982
    Assignee: International Business Machines Corporation
    Inventors: Edward M. Engler, Frank B. Kaufman, Steven R. Kramer, Bruce A. Scott
  • Patent number: 4341860
    Abstract: Photoimaging compositions comprising (A) a cyclohexadienone compound as defined, and at least one of (B.sub.1) a leuco dye or (B.sub.2) addition polymerizable ethylenically unsaturated monomer. A polymer binder can be present in the compositions. The new imaging compositions are useful in photoimaging products such as proofing papers, printout papers, overlay films and photopolymerizable elements useful for printing and photoresist purposes. The compositions have improved thermal stability.
    Type: Grant
    Filed: June 8, 1981
    Date of Patent: July 27, 1982
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: Peter K. Sysak
  • Patent number: 4341859
    Abstract: A resist film composed of a water-soluble polyvinyl alcohol, a water-soluble thermosetting polymethylol cross-linking agent and a polyaryl iodonium or sulfonium salt of a complex halogenide as catalyst, when irradiated with ultraviolet light and then heated, or when heated and irradiated with ultraviolet light, under a circuit mask, provides a latent image which is developable by water alone.
    Type: Grant
    Filed: September 23, 1980
    Date of Patent: July 27, 1982
    Assignee: General Electric Company
    Inventors: John J. Keane, Richard F. Zopf
  • Patent number: 4297435
    Abstract: Stable print-out dye systems are provided for photopolymerizable compositions, finding particular use as photoresists. The dye compositions comprise a triarylmethane leuco dye in combination with a high-boiling, relatively thermally-insensitive polyhalo alicyclic compound having at least five bromines. The print-out dye system is incorporated with an addition polymerizable composition, a light-sensitive initiator, and minor amounts of other additives.
    Type: Grant
    Filed: August 18, 1980
    Date of Patent: October 27, 1981
    Assignee: Hercules Incorporated
    Inventors: Jennings L. Jolly, Leo Roos
  • Patent number: 4297433
    Abstract: The present invention relates to a method for forming ultra fine patterns on films of polymethyl isopropenyl ketone or a mixture of polymethyl isopropenyl ketone and a benzophenone compound by exposing such films to ultra violet rays in the range of from 1,000 to 3,500 A. The present invention is particularly useful for providing semiconductors having ultra fine patterns and ultra LSI's. The electric or electronic circuits for electronic or electric apparatus and equipment have been produced by wiring resistors, condensers, coils, vacuum tubes and the like necessary components. However, because of various disadvantages such as assembly requiring much time, complication of work, necessity of using large equipment, reasons or causes for errors, limitation of productivity, impossibility of reducing price or cost and the like, the present invention has been developed for printed circuit boards.
    Type: Grant
    Filed: November 16, 1978
    Date of Patent: October 27, 1981
    Assignee: Tokyo Ohka Kogyo Kabushiki Kaisha
    Inventors: Minoru Tsuda, Yoichi Nakamura
  • Patent number: 4287277
    Abstract: A hologram is produced by causing a crosslinking reaction in accordance with an interference pattern in a recording carrier composed of a polymer containing in its unit structure an aromatic or hetero cyclic ring having a reactive position capable of being substituted by radical.
    Type: Grant
    Filed: May 29, 1979
    Date of Patent: September 1, 1981
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masakazu Matsumoto, Katsuhiko Nishide
  • Patent number: 4278753
    Abstract: A photosensitive composition useful as a photoresist which may be completely processed by dry techniques, especially by means of an oxygen plasma.The composition includes an N-vinylmonomer and an organic hydrogen compound in a binder which contributes significantly to the utility of the composition in the fabrication of micro-electronic devices.
    Type: Grant
    Filed: February 25, 1980
    Date of Patent: July 14, 1981
    Assignee: Horizons Research Incorporated
    Inventors: James M. Lewis, Eugene F. McInerney
  • Patent number: 4276369
    Abstract: The present invention relates to a method for forming ultra fine patterns on films of polymethyl isopropenyl ketone or a mixture of polymethyl isopropenyl ketone and a benzophenone compound by exposing such films to ultra violet rays in the range of from 1,000 to 3,500 A. The present invention is particularly useful for providing semiconductors having ultra fine patterns and ultra LSI's. The electric or electronic circuits for electronic or electric apparatus and equipment have been produced by wiring resistors, condensers, coils, vacuum tubes and the like necessary components. However, because of various disadvantages such as assembly requiring much time, complication of work, necessity of using large equipment, reasons or causes for errors, limitation of productivity, impossibility of reducing price or cost and the like, the present invention has been developed for printed circuit boards.
    Type: Grant
    Filed: November 6, 1978
    Date of Patent: June 30, 1981
    Assignee: Tokyo Ohka Kogyo Kabushiki Kaisha
    Inventors: Minoru Tsuda, Yoichi Nakamura
  • Patent number: 4264709
    Abstract: This invention relates to a series of photoinitiator combinations comprising mixtures of a primary photoinitiator in combination with N-halosuccinimides, N-haloacetanilides and N-halobenzanilides and photopolymerizable composition containing such combinations.
    Type: Grant
    Filed: January 18, 1979
    Date of Patent: April 28, 1981
    Assignee: Eastman Kodak Company
    Inventors: Gordon C. Newland, James G. Pacifici
  • Patent number: 4258111
    Abstract: A hologram is produced by causing a crosslinking reaction in accordance with an interference pattern in a recording carrier composed of a polymer containing in its unit structure an aromatic or hereto cyclic ring having a reactive position capable of being substituted by radical.
    Type: Grant
    Filed: May 29, 1979
    Date of Patent: March 24, 1981
    Assignee: Canon Kabushiki Kaisha
    Inventors: Masakazu Matsumoto, Katsuhiko Nishide
  • Patent number: 4258123
    Abstract: A photosensitive resin composition comprising:(a) a photopolymerizable or photocrosslinkable ethylenically unsaturated compound;(b) a compound of the formula (I): ##STR1## wherein X.sub.1, X.sub.2 and X.sub.3 may be the same or different and each represents a hydrogen atom, a chlorine atom or a bromine atom and at least one of X.sub.1, X.sub.2 and X.sub.3 representing a chlorine atom or a bromine atom; Y represents a --CX.sub.1 X.sub.2 X.sub.3 group where X.sub.1, X.sub.2 and X.sub.3 are as defined above, --NH.sub.2, --NHR', --NR'.sub.2, --SR', --OR' or --R' wherein R' is an alkyl group or an aryl group; R is an alkyl group, an aryl group or an alkenyl group, and may be substituted;(c) a compound of the formula (II): ##STR2## where Z represents the non-metallic atoms necessary to complete a nitrogen-containing heterocyclic ring; R.sub.1 is an alkyl group or a substituted alkyl group; R.sub.2 is an alkyl group, an aryl group or a substituted aryl group; and(d) a dye precursor.
    Type: Grant
    Filed: August 29, 1979
    Date of Patent: March 24, 1981
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Akira Nagashima, Shigeru Sato
  • Patent number: 4256828
    Abstract: Photocopolymerizable compositions are described which contain epoxides, organic material with hydroxyl functionality, and a photosensitive aromatic sulfonium or iodonium salt of a halogen-containing complex ion. Coated substrates are also described.
    Type: Grant
    Filed: September 2, 1975
    Date of Patent: March 17, 1981
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: George H. Smith
  • Patent number: 4247611
    Abstract: This invention relates to a radiation-sensitive copying composition which comprises (a) a compound which forms an acid under the influence of actinic radiation, and (b) an organic polymeric compound which contains recurrent acetal or ketal groupings in its main chain and whose solubility in a liquid developer is increased by the action of an acid, each .alpha.-carbon atom of the alcoholic constituent of the acetal or ketal grouping of the organic polymeric compound being aliphatic. The invention also relates to a process for the production of relief images using a radiation-sensitive copying composition.
    Type: Grant
    Filed: April 24, 1978
    Date of Patent: January 27, 1981
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Jurgen Sander, Gerhard Buhr, Hans Ruckert
  • Patent number: 4212970
    Abstract: Compounds represented by the following general formula: ##STR1## wherein W represents a phenyl group, a phenyl group substituted with a member selected from the group consisting of a halogen atom, a nitro group, a cyano group, an alkyl group containing 1 to 3 carbon atoms and an alkoxy group containing 1 to 4 carbon atoms, with the number of the substituents being 1 or 2 when said substituent is a halogen atom and 1 when said substituent is other than halogen, or an unsubstituted naphthyl group, and said phenyl group may take the form of ##STR2## X represents a hydrogen atom, an unsubstituted phenyl group or an alkyl group containing 1 to 3 carbon atoms, Y represents a halogen atom, and n represents an integer of 1 to 3. These compounds are useful as photo-initiators.
    Type: Grant
    Filed: November 22, 1978
    Date of Patent: July 15, 1980
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masayuki Iwasaki