Abstract: A novel photosensitive composition for dry development in the ultra-fine pattern formation of the semiconductor industry, which is composed of at least one of acrylic and vinyl ketone polymers and a specified subliming hisazide compound as a photocuring agent, is disclosed.The use of the photosensitive composition provides a very effective ultra-fine pattern formation process in the semiconductor industry with such advantages that unexposed areas are selectively removable by treating with a plasma, and consequently plasma development becomes available so that high resolution may easily be obtained. Automating and dry processing of all the stages ranging from development processing to stripping processing become available when using the photosensitive composition of this invention. No expensive treating reagents are needed and environmental pollution is eliminated.

Abstract: A photo-curable resin composition is disclosed comprising (i) a mixture and/or a preliminary reaction product of (a) at least one cyanate compound selected from the group consisting of polyfunctional cyanate esters, prepolymers of the cyanate esters, coprepolymers of the cyanate esters and an amine and mixtures thereof, (b) at least one compound selected from the group consisting of monomers having at least one olefinically double bond prepolymers of the monomers, liquid rubbers having one or more acryloyl or methacryloyl groups and mixtures thereof and optionally (c) at least one maleimide compound selected from the group consisting of polyfunctional maleimides, prepolymers of the maleimides, coprepolymers of the maleimides and an amine and mixtures thereof and (ii) a photo polymerization initiator or a photo sensitizer.

Abstract: Method of photopolymerization to produce vinyl based polymers and copolymers in the presence of a catalyst in the form of complex metal chelates.

Abstract: A light-sensitive composition particularly suitable for making light-sensitive lithographic printing plates is described composed of a mixture of a sensitizer and a photo-crosslinkable polymer, or a mixture of a sensitizer, a compound including a light-sensitive azido group and a polymer reactive with a decomposate of azido groups to be formed upon exposure to light, and a sensitizer represented by the formula (I) ##STR1## wherein A represents a non-metallic atomic group necessary for forming a heterocyclic ring containing nitrogen; R.sub.1 represents an alkyl group or a substituted alkyl group; R.sub.2 represents hydrogen, an alkyl group, a substituted alkyl group, an aryl group, or a substituted aryl group; and Y and Z each represents an oxygen atom or a sulfur atom.

Abstract: By adding a compound represented by the following general formulas: ##STR1## to a conventional photoresist composition comprising a cyclized product of conjugated diene polymer or copolymer and a photo-crosslinking agent soluble in an organic solvent, an image having a high degree of resolution and only a small number of pinholes can be obtained even when a base board having a surface of a high reflectance is used.

Abstract: A method of providing a negative electron and/or X-ray resist material on a substrate comprising applying a layer of resist material to the substrate, exposing the layer to a pattern of electrons and/or X-rays and removing the unexposed portions of the layer of resist material in which method the resist material comprises a polyvinylcarbazole compound which (a) contains a polymer and/or a copolymer of the formula ##STR1## in which n exceeds 30 which is halogenated in the nucleus or (b) contains a mixture of the copolymer optionally halogenated in the nucleus with a bisazide of the formulaN.sub.3 RN.sub.3in which R represents an organic residue.

Abstract: An elastomeric article suitable for flexographic printing comprising an elastomeric natural or synthetic dienoid polymer or copolymer, a photopolymerizable, ethylenically unsaturated crosslinking agent and a photoinitiator, portions of said article having been exposed to a photopolymerizable-effective amount of actinic radiation through an image bearing transparency having clear and opaque areas, and processed to remove the soluble portion of said plate situated beneath the opaque areas of the transparency during exposure, and said processed plate having been treated with iodine so as to render its printing surface tack-free and resistant to hardening when further exposed to actinic radiation.

Abstract: To accelerate printing of resist materials on a CRT color panel, an additive is incorporated into the resist to enhance cross-linking upon exposure to actinic radiation.

Abstract: A novel photoresist composition is proposed which is very advantageously employed in the photoetching process for the manufacture of various kinds of electronic devices such as transistors, ICs, LSIs and the like. The photoresist composition of the invention comprises a cyclized rubber as the base component and a specified azobenzene compound as a photoextinction agent for preventing halation in the exposure of the photoresist films to ultraviolet light. The advantages of the inventive photoresist composition over the conventional ones are obtained in the remarkable stability of the halation preventing effect even after a prebaking treatment of the photoresist films at an elevated temperature to remove the solvent from the photoresist films applied on to the substrate surfaces owing to the unexpectedly small sublimation of the azobenzene compound contained in the photoresist films.

Abstract: Screen printing stencils are prepared by afixing to a printing screen substrate an indicia-defining, ultraviolet-sensitive film and cross-linking the film by exposure to ultraviolet radiation. The coating compositions used to form the film comprise copolyacrylate/polyurethane block copolymers, in which the copolyacrylate blocks are copolymers of at least one hydroxy-containing acrylate and at least one acrylate or methacrylate which may be partially substituted with bromine, ultraviolet initiators and cross-linking monomers. Screen printing stencils are provided which are compatible with both water-based and oil-based inks. The disclosed screen printing stencils are used in improved screen-printing methods.

Abstract: A photocurable composition comprising a first copolymer having a recurring unit of general formula (I): ##STR1## wherein Ar represents a substituted or unsubstituted phenyl group, R.sub.1 represents a lower alkyl group, and m.sub.1 and m.sub.2 are positive numbers with m.sub.1 being greater than or equal to m.sub.2 ;and a second copolymer having a recurring unit of general formula (II): ##STR2## wherein R.sub.2 represents a lower alkyl group, X represents a hydrogen atom or a methyl group, and R.sub.3 represents an isobutyl group, a t-butyl group or a --CH.sub.2 Ar group where Ar represents a substituted or unsubstituted phenyl group and when R.sub.3 is --CH.sub.2 Ar, R.sub.2 can also be t-butyl and isobutyl, and n.sub.1, n.sub.2 and n.sub.3 are positive numbers but n.sub.1 can be zero and (n.sub.1 +n.sub.2)/n.sub.3 equals to about 0.5 to 20; and containing suitable amounts of a cross-linking agent and a photoactivator.

Abstract: A photosensitive composition is prepared comprising a diazonium compound and a polymer containing at least 50% by weight of the recurring unit represented by the following general formula (I): ##STR1## wherein R.sub.1 represents hydrogen atom or methyl group, R.sub.2 represents hydrogen atom or a methyl, ethyl or chloromethyl group and n is an integer of 1 to 10.

Abstract: A hologram is produced by causing a crosslinking reaction in accordance with an interference pattern in a recording carrier composed of a polymer containing in its unit structure an aromatic or hereto cyclic ring having a reactive position capable of being substituted by radical.

Abstract: A lithographic printing plate in which the oleophilic imaging areas are formed as a thin cross-linked block copolymer film adhered to the hydrophilic surface of a backing plate. The block copolymer comprises blocks of copolylacrylate and polyurethane wherein the copolyacrylate blocks are a copolymer of a hydroxy-containing acrylate and a second acrylate component comprising one or more esters of acrylic acid or methacrylic acid or mixtures thereof and the polyurethane blocks are formed of polyoxybutylene as the prepolymer component. In forming the printing plate the block copolymer is deposited as a thin film containing an ultraviolet initiator and a cross linking promoter and the cross-linked imaging areas are formed by exposure to ultraviolet radiation.

Abstract: The subject invention relates to photopolymerizable compositions useful for making plastic printing elements for use in photolithography and other photomechanical processes. The photopolymerizable compositions comprise an aqueous mixture of a water-insoluble resin, a water-soluble binder, a crosslinking agent, and a photopolymerization initiator having an alpha-keto ester linkage. In particular, photopolymerization initiators include oxalic acid, sodium oxalate, potassium oxalate, lithium oxalate and urea oxalate. The printing plates prepared from the compositions herein disclosed have improved ink receptivity, good retention of such ink, receptivity even after long continued use, greater durability and excellent binding qualities.

Abstract: An epoxy resin composition comprising an epoxy compound having an average of one or more epoxy groups per molecule, an amine curing agent and a reductive metal compound or complex can produce excellent developed color images, and concave-convex images by energy irradiation. The epoxy resin composition can give excellent physical, chemical and electrical properties to the formed images and various inorganic and organic materials can be used as substrate.