Laser Beam Patents (Class 430/945)
  • Patent number: 8975211
    Abstract: A security document precursor including, in order, at least: a) a transparent biaxially stretched polyethylene terephthalate foil; b) a colorless color forming layer containing at least an infrared absorber, a color forming component and a polymeric binder; and c) a polymeric support; wherein the colorless color forming layer contains at least one component forming a compound having a melting temperature of less than 20° C. upon laser marking the colorless color forming layer with an infrared laser. Methods for securing a security document using the security document precursor are also disclosed.
    Type: Grant
    Filed: December 2, 2011
    Date of Patent: March 10, 2015
    Assignee: Agfa-Gevaert N.V.
    Inventors: Bart Waumans, Ingrid Geuens, Paul Callant, Hubertus Van Aert
  • Patent number: 8936901
    Abstract: A laser-markable composition comprises a binder and an oxyanion of a multivalent metal.
    Type: Grant
    Filed: May 6, 2014
    Date of Patent: January 20, 2015
    Assignee: DataLase Ltd.
    Inventor: Nazir Khan
  • Patent number: 8921265
    Abstract: A security document precursor including, in order: a) at least one transparent biaxially stretched polyester foil; b) one colorless color forming layer containing at least an infrared absorber, a colorless dye-precursor and a polymeric binder; and c) a polymeric support; wherein the polymeric binder is copolymer including at least 90 wt % of a chlorinated ethylene and 1 wt % to 10 wt % of vinyl acetate both based on the total weight of the binder. Methods for making the security document precursor are also disclosed.
    Type: Grant
    Filed: December 6, 2011
    Date of Patent: December 30, 2014
    Assignee: Agfa-Gevaert N.V.
    Inventors: Hubertus Van Aert, Ingrid Geuens, Paul Callant, Bart Waumans
  • Patent number: 8921266
    Abstract: A method for preparing a color laser marked article comprising the steps of: a) infrared laser marking a security element including a polymeric support and a color forming layer comprising a color forming compound, an infrared dye and a polymeric binder comprising vinyl acetate and at least 85 wt % of vinyl chloride based on the total weight of the binder; and b) exposing the laser marked security element with light having a wavelength higher than 440 nm. The light exposure of step b) hinders the falsification of an issued security document without significant increase of background density.
    Type: Grant
    Filed: May 10, 2012
    Date of Patent: December 30, 2014
    Assignee: Agfa-Gevaert N.V.
    Inventors: Bart Waumans, Paul Callant
  • Patent number: 8911929
    Abstract: An aqueous solution containing 0.1-10 wt % of a guanidine is a useful developer for photosensitive resist materials. A resist pattern is formed by applying a chemically amplified positive resist composition onto a substrate to form a coating, baking, exposing the coating to high-energy radiation, and developing the exposed coating in a guanidine-containing aqueous solution.
    Type: Grant
    Filed: November 20, 2013
    Date of Patent: December 16, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Jun Hatakeyama
  • Patent number: 8912118
    Abstract: A method of color laser marking an article having a polymeric foil with at least one colorless layer containing an infrared absorber, a polymeric binder and a color forming compound; including the steps of:—laser marking the colorless layer with an infrared laser using a first laser operation mode to generate a blue or cyan color; and—laser marking the same colorless layer with an infrared laser using a second laser operation mode to generate a black color, wherein the first laser operation mode applies less energy to the colorless layer than the second laser operation mode. Also disclosed is an article, such as a security document, including a polymeric foil and a colorless layer containing laser marked graphical data having a blue or cyan color and laser marked information having a black color.
    Type: Grant
    Filed: December 6, 2011
    Date of Patent: December 16, 2014
    Assignee: Agfa-Gevaert N.V.
    Inventors: Paul Callant, Ingrid Geuens, Bart Waumans, Hubertus Van Aert
  • Patent number: 8890099
    Abstract: A radiation source for generating EUV from a stream of molten metal fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporise at least some of said droplets of fuel, whereby radiation is generated. The fuel droplet generator has nozzle, fuel supply line, and reservoir, with a pumping device arranged to supply a flow of molten metal fuel from the reservoir through the fuel feed line and out of the nozzle as a stream of droplets. The fuel droplet generator has a replaceable filter assembly in the fuel feed line, arranged to filter the molten metal fuel in use, to deter nozzle blockage by solid particulate impurities in the fuel.
    Type: Grant
    Filed: July 27, 2012
    Date of Patent: November 18, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Ronald Johannes Hultermans, Antonius Theodorus Wilhelmus Kempen, Bernard Van Essen
  • Patent number: 8889919
    Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: November 18, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masatoshi Echigo, Hiromi Hayashi
  • Patent number: 8883380
    Abstract: On a film where an exposure material coating has been formed in a exposure pattern formation region on a film base material, a colored firing material, colored light-curable material, or colored ink is applied to at least one of two widthwise side edges to form a side part application coating, which is irradiated with laser light by an alignment mark formation unit to form an alignment mark. The alignment mark is then used to detect film meandering and adjust the positions of masks. This makes it easy to form the alignment mark and detect the alignment mark thus formed and makes it possible to accurately correct for meandering of a film and stably expose the film in the process of continuous exposure of a film where an exposure material coating has been formed in a exposure pattern formation region on a film base material.
    Type: Grant
    Filed: October 24, 2011
    Date of Patent: November 11, 2014
    Assignee: V Technology Co., Ltd.
    Inventors: Toshinari Arai, Kazushige Hashimoto
  • Patent number: 8871428
    Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be substantially non-mixable with a resin component of the resist. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
    Type: Grant
    Filed: September 3, 2012
    Date of Patent: October 28, 2014
    Assignee: Rohm and Haas Electronics Materials LLC
    Inventors: Deyan Wang, Cheng-Bai Xu, George G. Barclay
  • Patent number: 8871424
    Abstract: The presently disclosed subject matter is directed generally to a polymeric film that comprises at least one laser imageable marking layer. The marking layer comprises a polyolefin, a photochromatic pigment, and an additive. It has been surprisingly discovered that a polyolefin film comprising a marking layer formulated with a photochromatic pigment and an additive offers a substantial advantage over prior art methods of laser imaging polyolefin films.
    Type: Grant
    Filed: January 20, 2012
    Date of Patent: October 28, 2014
    Assignee: Cryovac, Inc.
    Inventors: Rick Merical, Russell Darley, Patrick R. Thomas
  • Patent number: 8865389
    Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition, including a resin comprising a repeating unit (A), the a repeating unit (A) containing a structural moiety (S1) that when acted on by an acid, is decomposed to thereby generate an alkali-soluble group and a structural moiety (S2) that when acted on by an alkali developer, is decomposed to thereby increase its rate of dissolution in the alkali developer, and a repeating unit (B) that when exposed to actinic rays or radiation, generates an acid.
    Type: Grant
    Filed: September 27, 2011
    Date of Patent: October 21, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Shuji Hirano, Hidenori Takahashi, Hideaki Tsubaki
  • Patent number: 8846290
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.
    Type: Grant
    Filed: March 26, 2010
    Date of Patent: September 30, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Naohiro Tango, Michihiro Shirakawa, Mitsuhiro Fujita, Shuhei Yamaguchi, Akinori Shibuya, Shohei Kataoka
  • Patent number: 8822129
    Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an electron beam-sensitive or extreme ultraviolet-sensitive resin composition containing (A) a resin that contains a repeating unit having a partial structure represented by the specific formula and can decrease the solubility for a developer containing an organic solvent by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an electron beam or an extreme ultraviolet ray, (2) a step of exposing the film by using an electron beam or an extreme ultraviolet ray, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: September 2, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Kaoru Iwato, Hideaki Tsubaki, Shuji Hirano
  • Patent number: 8815477
    Abstract: A color filter manufacturing method for forming a filter segment and a black matrix by repeating at least a coating step of coating a substrate with a photosensitive resin layer, a pattern exposure step of curing the photosensitive resin layer by pattern exposure, a developing step of developing the exposed photosensitive resin layer, and a sintering step of thermosetting the developed photosensitive resin layer, in this order a plurality of number of times, characterized in that in the exposure step, a laser is used as a light source, and proximity exposure is performed by repetitively emitting the laser via photomask such that a cumulative exposure amount is 1 to 150 mJ/cm2.
    Type: Grant
    Filed: November 17, 2010
    Date of Patent: August 26, 2014
    Assignee: Toppan Printing Co., Ltd.
    Inventors: Takeshi Ikeda, Eishi Aoki, Genki Harada
  • Patent number: 8818144
    Abstract: A process for preparing a subassembly, the process comprising: (a) defining the location of one or more grooves for receiving optical conduits on the top planar surface of a wafer or panel, the grooves corresponding to multiple interposers on the wafer or panel; and (b) etching the grooves into the wafer or panel, each groove having sidewalls and first and second terminal ends and a first facet at each terminal end perpendicular to the side walls, each first facet having a first angle relative to the top planar surface, each groove being shared by a pair of transmitting and receiving interposers on the wafer or panel prior to being diced such that the first and second terminal ends of each groove correspond to transmitting and receiving interposers, respectively.
    Type: Grant
    Filed: January 31, 2011
    Date of Patent: August 26, 2014
    Assignees: Tyco Electronics Corporation, Tyco Electronics Nederland B.V.
    Inventors: Terry Patrick Bowen, Jan Willem Rietveld
  • Patent number: 8771919
    Abstract: A process to mark a multilayered article with a laser (20). The multilayered article (10) includes a laser-markable layer (14) having at least one organic polymer and at least one light-sensitive pigment therein, and including at least one release agent associated with the laser-markable layer. Laser-marking of the laser-markable layer is accomplished by directing laser radiation (22) into the multilayered article through the release agent (12) to induce an interaction between the light-sensitive pigment and the organic polymer. As a result of the interaction, a visually perceptible marking (16) is formed in the article. The laser-marked article includes a laser-markable layer and a first release agent associated with a surface of the laser-markable layer. The marking(s) in the laser-markable layer is visible through the layer of release agent, and the marking is a result of the laser-induced interaction between the light-sensitive pigment and the organic polymer.
    Type: Grant
    Filed: August 31, 2010
    Date of Patent: July 8, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Pingfan Wu, Junkang Jacob Lui, Robert L. W. Smithson, Rachel M. Lucking, Panu K. Zoller, Jeffrey O. Emslander, Kanta Kumar
  • Patent number: 8758982
    Abstract: Methods, algorithms, processes, circuits, and/or structures for laser patterning suitable for customized RFID designs are disclosed. In one embodiment, a method of laser patterning of an identification device can include the steps of: (i) depositing a patternable resist formulation on a substrate having configurable elements and/or materials thereon; (ii) irradiating the resist formulation with a laser tool sufficiently to change the solubility characteristics of the resist in a developer; and (iii) developing exposed areas of the resist using the developer. Embodiments of the present invention can advantageously provide a relatively low cost and high throughput approach for customized RFID devices.
    Type: Grant
    Filed: November 8, 2006
    Date of Patent: June 24, 2014
    Assignee: Thin Film Electronics ASA
    Inventors: Criswell Choi, Patrick Smith, James Montague Cleeves, Joerg Rockenberger, Christopher Gudeman, J. Devin MacKenzie
  • Patent number: 8758965
    Abstract: Provided is an apparatus and method of manufacturing a color filter adsorbing toner nano-particles by using electrostatic force. In the apparatus for manufacturing the color filter, a laser driver generates at least one laser control signal according to electrification data, at least one laser device forming a laser irradiation unit which irradiates a laser for a predetermined time according to the at least one laser control signal. According to the irradiated laser, electrostatic latent images are formed in positions of color filter cells having a predetermined resolution standard requirements in a glass substrate, and toner nano-particles are electrostatically adsorbed to the formed electrostatic latent images.
    Type: Grant
    Filed: May 25, 2006
    Date of Patent: June 24, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Tae Gyu Kim
  • Patent number: 8753791
    Abstract: A laser-markable composition comprises a binder and an oxyanion of a multivalent metal.
    Type: Grant
    Filed: February 28, 2006
    Date of Patent: June 17, 2014
    Assignee: Datalase Ltd.
    Inventor: Nazir Khan
  • Patent number: 8703410
    Abstract: The present invention relates to a CO2 laser-transparent material having a mark on the surface thereof and the method for making the same. The method includes the following steps: providing a first substrate, which has a top surface and a bottom surface; providing a second substrate which has a top surface; putting the bottom surface of the first substrate on the top surface of the second substrate; irradiating a CO2 laser beam to the top surface of the second substrate by passing through the top surface and the bottom surface of the first substrate; and forming a mark on the bottom surface of the first substrate. The material of the mark is oxide of the second substrate or the same as the material of the second substrate. Whereby the cheap CO2 laser is utilized to form the mark on the first substrate, and the mark can be erased easily by a proper chemical for recycling the first substrate.
    Type: Grant
    Filed: September 11, 2013
    Date of Patent: April 22, 2014
    Assignee: National Cheng Kung University
    Inventors: Chen-Kuei Chung, Meng-Yu Wu, En-Jou Hsiao, Shih-Lung Lin
  • Patent number: 8703364
    Abstract: A method for repairing a defect, such as a pinhole, on a photomask is described. In an example, a laser beam is used to form a matrix of laser burn spots in a substrate of the photomask proximate a defect, such as a pinhole, of the photomask. Each laser burn spot is formed at a focal point of the laser beam inside the substrate by melting a material of the substrate proximate to the defect. In an example, the defect is surrounded and covered by the matrix of laser burn spots. The matrix of laser burn spots can attenuate or block light from passing through the defect, such as the pinhole. The matrix of laser burn spots may repair the defect of the photomask without removing a pellicle and pellicle frame mounted on the photomask.
    Type: Grant
    Filed: May 7, 2012
    Date of Patent: April 22, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Kun-Lung Hsieh, Chung-Hung Lin, Min-An Yang, Chih Wei Wen, Wu Hung Ko
  • Patent number: 8685599
    Abstract: A method of pulsed laser intrinsic marking can provide a unique identifier to detect tampering or counterfeiting.
    Type: Grant
    Filed: February 23, 2012
    Date of Patent: April 1, 2014
    Assignee: Sandia Corporation
    Inventors: David P. Adams, Joel Patrick McDonald, Bradley Howell Jared, V. Carter Hodges, Deidre Hirschfeld, Dianna S. Blair
  • Patent number: 8682466
    Abstract: A method to enable wafer result prediction includes collecting manufacturing data from various semiconductor manufacturing tools and metrology tools; choosing key parameters using an autokey method based on the manufacturing data; building a virtual metrology based on the key parameters; and predicting wafer results using the virtual metrology.
    Type: Grant
    Filed: February 5, 2008
    Date of Patent: March 25, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Francis Ko, Chih-Wei Lai, Kewei Zuo, Henry Lo, Jean Wang, Ping-Hsu Chen, Chun-Hsien Lim, Chen-Hua Yu
  • Patent number: 8673538
    Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) which contains at least one phenolic hydroxyl group and at least one group where a hydrogen atom in a phenolic hydroxyl group is substituted by a group represented by the following General Formula (1) (in the formula, each of R11 and R12 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group; X11 represents an aryl group; M11 represents a single bond or a divalent linking group; and Q11 represents an alkyl group, a cycloalkyl group or an aryl group, wherein the number of carbon atoms which are included in the group represented by -M11-Q11 is 3 or more, and at least two of R11, R12, Q11, and X11 may form a ring by bonding to each other).
    Type: Grant
    Filed: July 26, 2012
    Date of Patent: March 18, 2014
    Assignee: FUJIFILM Corporation
    Inventors: Takeshi Inasaki, Tomotaka Tsuchimura
  • Patent number: 8663881
    Abstract: A lithographic apparatus includes an illuminator for receiving a beam of EUV radiation from a radiation source apparatus and for conditioning the beam to illuminate a target area of a patterning device, such as a reticle. The reticle forms a patterned radiation beam. A projection system transfers the pattern from said patterning device to a substrate by EUV lithography. Sensors are provided for detecting a residual asymmetry in the conditioned beam as the beam approaches the reticle, particularly in a non-scanning direction. A feedback control signal is generated to adjust a parameter of said radiation source in response to detected asymmetry. The feedback is based on a ratio of intensities measured by two sensors at opposite ends of an illumination slit, and adjusts the timing of laser pulses generating an EUV-emitting plasma.
    Type: Grant
    Filed: July 20, 2012
    Date of Patent: March 4, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Petrus Buurman, Szilard Istvan Csiszar
  • Patent number: 8637226
    Abstract: A method of forming an image having multiple phases is disclosed herein. The method includes forming exposed and unexposed areas, the exposed areas comprising a first polymer network exhibiting first and second phases that are chemically connected and have different refractive indices, the first phase being continuous, and the second phase comprising a plurality of structures dispersed within the first phase, and the unexposed areas comprising a second polymer network comprising third and fourth phases that are chemically connected and have different refractive indices, the third phase being continuous, and the fourth phase comprising a plurality of structures dispersed within the third phase. The first and second polymer networks are chemically connected, and morphology formed by the first and second phases is different than that formed by the third and fourth phases.
    Type: Grant
    Filed: February 8, 2012
    Date of Patent: January 28, 2014
    Assignee: 3M Innovative Properties Company
    Inventors: Mieczyslaw H. Mazurek, Raymond P. Johnston, John E. Potts, Marc D. Radcliffe, Kevin R. Schaffer, Audrey A. Sherman, Wendi J. Winkler
  • Patent number: 8637114
    Abstract: A method of manufacturing a paper substrate comprising a color former which is capable undergoing a light activated color change reaction, wherein the color former is applied to the paper substrate during the manufacture of said paper substrate, and the color former is a metal oxyanion or a molecular organic. A paper substrate obtainable by this method is also provided.
    Type: Grant
    Filed: August 26, 2009
    Date of Patent: January 28, 2014
    Assignee: Datalase Ltd
    Inventors: Christopher Wyres, Anthony Jarvis, Martin Walker, William Green
  • Patent number: 8637429
    Abstract: The invention relates to a method of marking a substrate comprising treating the substrate with a boron compound and a charrable agent, and, irradiating the areas of the substrate to be marked such that those areas change colour. Marked substrates obtainable by this method are also provided.
    Type: Grant
    Filed: August 26, 2009
    Date of Patent: January 28, 2014
    Assignee: Datalase Ltd
    Inventors: Martin Walker, Anthony Jarvis, Christopher Wyres, William Green
  • Patent number: 8632942
    Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with respect to water, wherein the resist composition for negative development contains a resin capable of increasing the polarity by the action of an acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) exposing the resist film via an immersion medium, and (c) performing development with a negative developer.
    Type: Grant
    Filed: November 29, 2011
    Date of Patent: January 21, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Hideaki Tsubaki
  • Patent number: 8632950
    Abstract: A lithographic printing plate precursor includes a cyanine dye, characterized in that the cyanine dye includes two different chromophoric groups, a chromophoric group that has its main absorption in the infrared region and another chromophoric group that has its main absorption in the visible light region.
    Type: Grant
    Filed: October 15, 2010
    Date of Patent: January 21, 2014
    Assignee: Agfa Graphics NV
    Inventor: Paul Callant
  • Patent number: 8628898
    Abstract: The present invention provides an image processing method which includes any one of recording an image on a thermally reversible recording medium that can reversibly change any one of its transparency and color tone depending on temperature by irradiating and heating the thermally reversible recording medium with a laser beam, and erasing the image recorded on the thermally reversible recording medium by heating the thermally reversible recording medium, wherein in any one of the image recording and the image erasing, the thermally reversible recording medium is located at a position farther than a focal position of the laser beam, and at least any one of the image recording and the image erasing is performed.
    Type: Grant
    Filed: December 21, 2007
    Date of Patent: January 14, 2014
    Assignee: Ricoh Company, Ltd.
    Inventors: Shinya Kawahara, Yoshihiko Hotta, Tomomi Ishimi
  • Patent number: 8617794
    Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of increasing the polarity by the action of the acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) forming a protective film on the resist film with a protective film composition after forming the resist film and before exposing the resist film, (c) exposing the resist film via an immersion medium, and (d) performing development with a negative developer.
    Type: Grant
    Filed: October 27, 2011
    Date of Patent: December 31, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Hideaki Tsubaki
  • Patent number: 8609307
    Abstract: Provided is a thin film evaluation method for a transfer mask which is adapted to be applied with ArF excimer laser exposure light and comprises a thin film formed with a pattern on a transparent substrate. The method includes intermittently irradiating pulsed laser light onto the thin film to thereby evaluate the irradiation durability of the thin film.
    Type: Grant
    Filed: April 26, 2013
    Date of Patent: December 17, 2013
    Assignee: Hoya Corporation
    Inventors: Kazuya Sakai, Masaru Tanabe
  • Patent number: 8603619
    Abstract: A laser-markable, acrylic resin-based laminate having a thickness of 100 to 200 ?m and including (A3) a pigmented layer made of a crosslinked acrylic resin obtained by crosslinking an acrylic resin composition having a hydroxyl value of 10 to 100 mg KOH/g, (B3) a base layer made of a crosslinked acrylic resin obtained by crosslinking an acrylic resin composition having a hydroxyl value of 18 to 40 mg KOH/g, and (C3) a destructible layer made of a crosslinked acrylic resin obtained by crosslinking a mixture of an acrylic resin composition having a hydroxyl value of 20 to 35 mg KOH/g and polymer beads.
    Type: Grant
    Filed: July 6, 2012
    Date of Patent: December 10, 2013
    Assignee: Nippon Carbide Kogyo Kabushiki Kaisha
    Inventors: Koudai Takeda, Osamu Tanaka
  • Patent number: 8591105
    Abstract: The invention relates to an optical element for guiding and forming a laser beam, and to a method for recording beam parameters, particularly in a laser system, comprising a carrier substrate (40) and a coating (39), which is applied to at least one side of the carrier substrate (40), and comprising at least one temperature sensor (38). The temperature sensor (38) is comprised of a number of pixels arranged in a matrix, and each respective pixel has at least one temperature-sensitive element (39). The at least one temperature-sensitive element (39) of the pixel is constructed inside the carrier substrate (40) made of silicon.
    Type: Grant
    Filed: April 3, 2006
    Date of Patent: November 26, 2013
    Assignee: TRUMPF Werkzeugmaschinen GmbH + Co. KG
    Inventors: Jürgen-Michael Weick, Armin Horn, Gerhard Hammann, Peter Laitenberger, Nick Collier, Ross Peter Jones
  • Patent number: 8592133
    Abstract: The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F2 laser, ultra-short ultraviolet light, electron beam, X-rays, or the like; and a patterning process utilizing the resist composition. The present invention provides a chemically amplified resist composition comprising one or more kinds of amine compounds or amine oxide compounds (except for those having a nitrogen atom of amine or amine oxide included in a ring structure of an aromatic ring) at least having a carboxyl group and having no hydrogen atoms covalently bonded to a nitrogen atom as a basic center.
    Type: Grant
    Filed: March 22, 2012
    Date of Patent: November 26, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Satoshi Watanabe, Akinobu Tanaka, Takeru Watanabe, Takeshi Kinsho
  • Patent number: 8574814
    Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that can form independent line patterns with high resolution and excellent shapes and shows excellent resist performances including roughness characteristics, and to provide an actinic ray-sensitive or radiation-sensitive film and a pattern forming method using the composition. The actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group is substituted with a group represented by the following General Formula (1) (the respective symbols in the formula represent the same definitions as in the claims and the specification).
    Type: Grant
    Filed: June 20, 2012
    Date of Patent: November 5, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Takeshi Inasaki, Tomotaka Tsuchimura
  • Patent number: 8574816
    Abstract: The invention provides a positive resist composition comprising, as base resins contained therein, (A) a polymer having a weight-average molecular weight of 1000 to 500000 and containing a repeating unit which contains a structure having a hydrogen atom of a carboxyl group thereof substituted with an acid-labile group having a cyclic structure and (B) a novolak resin of a substituted or an unsubstituted naphtholphthalein, and in addition, a photo acid generator. There can be provided a positive resist composition having an appropriate absorption to form a pattern on a highly reflective substrate, excellent characteristics in adhesion and implantation onto a non-planar substrate, a good pattern profile after light exposure, and an ion implantation resistance at the time of ion implantation; and a patterning process.
    Type: Grant
    Filed: August 13, 2012
    Date of Patent: November 5, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Daisuke Kori
  • Patent number: 8568963
    Abstract: A method of manufacturing a mask for depositing a thin film is disclosed. In one embodiment, the method includes i) providing a raw material substrate for a deposition mask; ii) removing a portion of the raw material substrate to form a pattern, wherein a plurality of openings are defined in the pattern; and iii) irradiating at least a laser beam onto the openings of the pattern at an inclination angle with respect to the raw material substrate such that inclined portions are formed at the side surfaces of each of the openings of the pattern.
    Type: Grant
    Filed: January 27, 2011
    Date of Patent: October 29, 2013
    Assignee: Samsung Display Co., Ltd.
    Inventors: Sang-Shin Lee, Jung-Woo Ko
  • Patent number: 8545738
    Abstract: Provided are ink compositions, methods for making photochromic inks, and methods of using the photochromic inks for erasable media annotation. In accordance with various embodiments, there is an ink composition including a carrier medium and one or more photochromic species in the carrier medium, wherein each of the one or more photochromic species can be selected from the group consisting of monomeric photochromic molecules, photochromic oligomers, and photochromic polymers, and wherein each one of the one or more photochromic species exhibits a reversible transition from a colorless state to a colored state upon exposure to a radiant condition wherein the radiant condition can be selected from the group consisting of a radiant energy and a combination of a radiant energy and thermal energy.
    Type: Grant
    Filed: August 11, 2010
    Date of Patent: October 1, 2013
    Assignee: Xerox Corporation
    Inventors: Peter M. Kazmaier, Gabriel Iftime, Kentaro Morimitsu, Adela Goredema
  • Patent number: 8541150
    Abstract: A manufacturing method of a polymer film with the photonic crystal structure includes a mixing step for at least mixing an achiral liquid crystal (LC), a chiral dopant, a monomer and a photo initiator together to form an LC-monomer mixture, at least one exposure step for exposing the LC-monomer mixture through a mask, at least one diffusion step for diffusing the monomer from the area around one of the exposure areas to the exposure area, and a LC removing step for removing the achiral LC to form the polymer film. By implementing the diffusion step after the exposure step, the polymerization rate of the monomers is enhanced so as to increase the proportion of the polymer in the polymer film and raise the imprint rate of chirality. Therefore, the polymer film can reveal stronger photonic crystal structure and property of Bragg reflection when it is not filled with any fluid.
    Type: Grant
    Filed: March 16, 2011
    Date of Patent: September 24, 2013
    Assignee: National Cheng Kung University
    Inventor: Jui-Hsiang Liu
  • Patent number: 8524426
    Abstract: A method for correcting a position error of a lithography apparatus comprises inputting position data of exposure pattern, irradiating laser light onto a position reference mask from a position measurement laser system, calculating actual position data of the laser light irradiated onto the position reference mask, and comparing the position data of the exposure pattern with the actual position data of the laser light irradiated onto the position reference mask. With this method, circuit patterns can be accurately formed at predetermined positions on a photomask, and the circuit patterns on the photomask can be accurately formed at predetermined positions on a wafer.
    Type: Grant
    Filed: April 27, 2012
    Date of Patent: September 3, 2013
    Assignee: Samsung Electronics Co. Ltd.
    Inventors: Jin Choi, Dong-Seok Nam
  • Patent number: 8524442
    Abstract: A combined laminating and exposing apparatus for exposing a photosensitive printing blank to actinic radiation in a printing plate manufacturing system and a method of using the same are disclosed. The photosensitive printing blank comprises a backing layer, at least one photocurable layer disposed on the backing layer, and a laser ablatable mask layer disposed on the at least one photocurable layer, wherein the laser ablatable mask layer is laser ablated to create an in situ negative in the laser ablatable mask layer. The exposing apparatus comprises: (a) a laminating apparatus for laminating an oxygen barrier layer to a top of the laser ablated mask layer; (b) a conveyor; (c) a first exposing device for imagewise exposing the at least one photocurable layer to actinic radiation, and (d) a second exposing device for exposing the at least one photocurable layer to actinic radiation through the backing layer.
    Type: Grant
    Filed: February 13, 2012
    Date of Patent: September 3, 2013
    Inventors: David A. Recchia, Kyle P. Baldwin, Timothy Gotsick
  • Patent number: 8507173
    Abstract: A pattern is formed by applying a first positive resist composition onto a substrate, heat treatment, exposure, heat treatment and development to form a first resist pattern; causing the first resist pattern to crosslink and cure by irradiation of high-energy radiation of 200-320 nm wavelength; further applying a second positive resist composition onto the substrate, heat treatment, exposure, heat treatment and development to form a second resist pattern. The double patterning process reduces the pitch between patterns to one half.
    Type: Grant
    Filed: December 8, 2009
    Date of Patent: August 13, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Kazuhiro Katayama
  • Patent number: 8502850
    Abstract: A method, an apparatus and/or a system of laser marking of an interior cavity of a securing means of a substance container is disclosed. In one embodiment, a solid-state laser marking system to mark a securing means of a substance container includes a semiconductor laser to emit a pumping laser beam. The solid-state laser marking system also includes a resonator to create the laser beam that is then focused through a lens to mark the securing means of the substance container having a maximum diameter of 5 cm. Further, the solid-state laser marking system includes a solid-state laser crystal doped with a rare-earth element, to produce a laser beam in response to being pumped by the pumping laser beam and a laser resonator. The laser resonator is configured to focus the laser beam of a spot size of less than 150 microns and a beam quality of M2 less than 1.3.
    Type: Grant
    Filed: November 4, 2010
    Date of Patent: August 6, 2013
    Assignee: Telesis Technologies, Inc.
    Inventors: Ashot Mesropyan, Michael Lloyd Watts
  • Patent number: 8501392
    Abstract: A photosensitive element comprises a support, a photosensitive layer and a protective film laminated in that order, wherein the photosensitive layer is composed of a photosensitive resin composition containing a binder polymer, a photopolymerizing compound, a photopolymerization initiator and a compound with a maximum absorption wavelength of 370-420 nm, and the protective film is composed mainly of polypropylene.
    Type: Grant
    Filed: April 13, 2007
    Date of Patent: August 6, 2013
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Manabu Saitou, Junichi Iso, Tatsuya Ichikawa, Takeshi Ohashi, Hanako Yori, Masahiro Miyasaka, Takashi Kumaki
  • Patent number: 8486857
    Abstract: Provided are a donor substrate for laser induced thermal imaging (LITI) and a method of fabricating an organic light emitting diode (OLED) using the same, which can prevent a transferred emission layer from being damaged by heat and thus prevent wrinkles from forming on the surface thereof. The donor substrate includes a base layer, a light-to-heat conversion layer disposed on the base layer, a first transfer layer disposed on the light-to-heat conversion layer and including an organic layer, an inorganic layer, or a double layer thereof, and a second transfer layer disposed on the first transfer layer and including an emission layer. The first transfer layer has an absolute value of lowest unoccupied molecular orbital energy level of 2.6 to 3.0 eV and a band gap energy of 2.8 to 3.4 eV.
    Type: Grant
    Filed: August 26, 2009
    Date of Patent: July 16, 2013
    Assignee: Samsung Display Co., Ltd.
    Inventors: Seung-Mook Lee, Jin-Woo Park, Sang-Woo Pyo, Myung-Jong Jung, Do-Young Kim, Dae-Hoon Kim, Hyo-Yeon Kim
  • Patent number: 8481246
    Abstract: According to one embodiment, a method of forming a pattern includes applying a block copolymer to a substrate, the block copolymer including a first block and a second block, the first block including polyacrylate or polymethacrylate having a side chain to which an alicyclic hydrocarbon group or a hydrocarbon group including a tertiary carbon is introduced, and the second block including polystyrene substituted with hydrocarbon or halogen at an ?-position, causing the block copolymer to be phase-separated, irradiating the block copolymer with an energy beam to decompose the second block, and removing the second block with a developer to form a pattern of the first block.
    Type: Grant
    Filed: March 26, 2012
    Date of Patent: July 9, 2013
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Koji Asakawa, Shigeki Hattori, Ryota Kitagawa
  • Patent number: 8470514
    Abstract: A low-cost information recording medium is provided by which good recording quality can be obtained even when information is recorded thereon in a high density using a blue laser. The recording medium has a recording layer which comprises Sb, O and M. A content of O atoms is 30 atom % or more but not more than 55 atom %, a content of M atoms is 5 atom % or more but not more than 35 atom %, and a content of Sb atoms is 20 atom % or more but not more than 55 atom %. The recording layer does not contain Au, Pt and Pd.
    Type: Grant
    Filed: March 25, 2008
    Date of Patent: June 25, 2013
    Assignee: Panasonic Corporation
    Inventors: Haruhiko Habuta, Noboru Yamada