Abstract: A method and an apparatus for direct writing photoetching by parallel interpenetrating super-resolution high-speed laser. The method of the present application uses a parallel interpenetrating algorithm. Firstly, a multi-beam solid light spot for writing is generated based on a writing light spatial light modulator; a multi-beam hollow light spot for inhibition is generated based on an inhibition optical spatial light modulator; the multi-beam solid light spot is combined with the multi-beam hollow light spot to generate a modulated multi-beam light spot; a writing waveform is output based on a multichannel acousto-optic modulator, a displacement stage moves at a constant speed until writing of a whole column of areas is completed, an optical switch is turned off, and the displacement stage conducts one-time stepping movement; the process is not stopped until all patterns are written.

Abstract: A production method to fabricate precision micro-mask for the production of ultra-high resolution Active-Matrix Organic Light Emitting Diode (AMOLED) display is disclosed. The production process of the micro-mask includes the following processes: S1, select the substrate and cleaning. S2, fabricate the main body of micro-mask on the substrate. The main body of micro-mask includes sequentially preparation of debonding layer, the first metal layer and the second metal layer; or sequentially preparation of organic polymer layer, the first metal layer and the second metal layer. S3, welding the mask frame to the second metal layer after alignment, fabricate perforation through holes in the main body of the micro-mask based on the requirement of the display subpixel design; or fabricate perforation through holes in the micro-mask based on the requirement of the display subpixel design, then welding the mask frame to the second metal of the main body of the micro-mask.

Abstract: The present disclosure relates to optical systems and vehicles, which may incorporate lidar sensors. An example optical system includes a light-emitter device configured to emit emission light. The optical system also includes an optical element including a first surface and an opposing second surface. The first surface includes a diffusing surface configured to diffuse the emission light to form diffused light. The second surface includes a focusing surface configured to focus the diffused light to provide an intensity profile of light emitted within a field of view of the optical system.

Abstract: In one embodiment, the method serves for producing semiconductor lasers and includes the following steps in the order indicated: A) applying a multiplicity of edge emitting laser diodes on a mounting substrate, B) applying an encapsulation element, such that the laser diodes are applied in each case in a cavity between the mounting substrate and the associated encapsulation element, C) operating the laser diodes and determining emission directions of the laser diodes, D) producing material damage in partial regions of the encapsulation element, wherein the partial regions are uniquely assigned to the laser diodes, E) collectively removing material of the encapsulation element, said material being affected by the material damage, with the result that individual optical surfaces for beam shaping arise for the laser diodes in the partial regions, and F) singulating to form the semiconductor lasers.

Abstract: Provided is a laminate and label for laser printing which are capable of preventing or reducing the occurrence of failure in printing by laser light irradiation. A laminate (1) is at least a laminate for laser printing, including a first layer (31) having a property of shielding against laser light, a second layer (32) having a property of absorbing the laser light, and a base material layer (33) which is optically transparent, which are stacked in the order named. The second layer (32) may have a thickness of not more than 15 ?m, and may have a specific composition.

Abstract: A tattoo arts practice pad is made by forming an otherwise-blank silicone pad having distributed pigment from a color dye, then lasering imagery onto the pad to result in traceable line images corresponding to areas that discolor the ink, so that discoloration in the shape of the line image on the pigment results without covering silicone with another material and without altering smoothness or silicone-tattoo needle interactions.

Abstract: The present invention is a resist composition comprises a polymer compound having one or two repeating units selected from repeating units represented by the following general formulae (p-1), (p-2) and (p-3), a repeating unit represented by the following formula (a-1) and the formula (a-2) polarities of which are changed by an action of an acid, and a repeating unit represented by the following formula (b-1); a salt represented by the following general formula (B); and a solvent, wherein a difference of a C log P of the repeating unit (a-1) before and after changing the polarity is 3.0 to 4.5, and a difference of a C log P of the repeating unit (a-2) before and after changing the polarity is 2.5 to 3.2. This provides a resist composition which has high sensitivity, wide DOF and high resolution, reduces LER, LWR and CDU, and has good pattern shape after exposure and excellent etching resistance.

Abstract: A welding method according to an embodiment includes a preparation process and a welding process. A first welding material and a second welding material are prepared in the preparation process. The first welding material and the second welding material are welded in the welding process by irradiating a laser beam on at least one of the first welding material or the second welding material. At least one of the first welding material or the second welding material includes a first portion and a second portion. A laser absorptance of the second portion is higher than a laser absorptance of the first portion. The first welding material and the second welding material are welded in the welding process by irradiating the laser beam on the second portion.

Abstract: A security document precursor including, in order, at least: a) a transparent biaxially stretched polyethylene terephthalate foil; b) a colorless color forming layer containing at least an infrared absorber, a color forming component and a polymeric binder; and c) a polymeric support; wherein the colorless color forming layer contains at least one component forming a compound having a melting temperature of less than 20° C. upon laser marking the colorless color forming layer with an infrared laser. Methods for securing a security document using the security document precursor are also disclosed.

Abstract: A laser-markable composition comprises a binder and an oxyanion of a multivalent metal.

Abstract: A security document precursor including, in order: a) at least one transparent biaxially stretched polyester foil; b) one colorless color forming layer containing at least an infrared absorber, a colorless dye-precursor and a polymeric binder; and c) a polymeric support; wherein the polymeric binder is copolymer including at least 90 wt % of a chlorinated ethylene and 1 wt % to 10 wt % of vinyl acetate both based on the total weight of the binder. Methods for making the security document precursor are also disclosed.

Abstract: A method for preparing a color laser marked article comprising the steps of: a) infrared laser marking a security element including a polymeric support and a color forming layer comprising a color forming compound, an infrared dye and a polymeric binder comprising vinyl acetate and at least 85 wt % of vinyl chloride based on the total weight of the binder; and b) exposing the laser marked security element with light having a wavelength higher than 440 nm. The light exposure of step b) hinders the falsification of an issued security document without significant increase of background density.

Abstract: An aqueous solution containing 0.1-10 wt % of a guanidine is a useful developer for photosensitive resist materials. A resist pattern is formed by applying a chemically amplified positive resist composition onto a substrate to form a coating, baking, exposing the coating to high-energy radiation, and developing the exposed coating in a guanidine-containing aqueous solution.

Abstract: A method of color laser marking an article having a polymeric foil with at least one colorless layer containing an infrared absorber, a polymeric binder and a color forming compound; including the steps of:—laser marking the colorless layer with an infrared laser using a first laser operation mode to generate a blue or cyan color; and—laser marking the same colorless layer with an infrared laser using a second laser operation mode to generate a black color, wherein the first laser operation mode applies less energy to the colorless layer than the second laser operation mode. Also disclosed is an article, such as a security document, including a polymeric foil and a colorless layer containing laser marked graphical data having a blue or cyan color and laser marked information having a black color.

Abstract: A radiation source for generating EUV from a stream of molten metal fuel droplets by LPP (Laser Produced Plasma) or (Dual Laser Plasma) has a fuel droplet generator arranged to provide a stream of droplets of fuel and at least one laser configured to vaporise at least some of said droplets of fuel, whereby radiation is generated. The fuel droplet generator has nozzle, fuel supply line, and reservoir, with a pumping device arranged to supply a flow of molten metal fuel from the reservoir through the fuel feed line and out of the nozzle as a stream of droplets. The fuel droplet generator has a replaceable filter assembly in the fuel feed line, arranged to filter the molten metal fuel in use, to deter nozzle blockage by solid particulate impurities in the fuel.

Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Abstract: On a film where an exposure material coating has been formed in a exposure pattern formation region on a film base material, a colored firing material, colored light-curable material, or colored ink is applied to at least one of two widthwise side edges to form a side part application coating, which is irradiated with laser light by an alignment mark formation unit to form an alignment mark. The alignment mark is then used to detect film meandering and adjust the positions of masks. This makes it easy to form the alignment mark and detect the alignment mark thus formed and makes it possible to accurately correct for meandering of a film and stably expose the film in the process of continuous exposure of a film where an exposure material coating has been formed in a exposure pattern formation region on a film base material.

Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be substantially non-mixable with a resin component of the resist. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.

Abstract: The presently disclosed subject matter is directed generally to a polymeric film that comprises at least one laser imageable marking layer. The marking layer comprises a polyolefin, a photochromatic pigment, and an additive. It has been surprisingly discovered that a polyolefin film comprising a marking layer formulated with a photochromatic pigment and an additive offers a substantial advantage over prior art methods of laser imaging polyolefin films.

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition, including a resin comprising a repeating unit (A), the a repeating unit (A) containing a structural moiety (S1) that when acted on by an acid, is decomposed to thereby generate an alkali-soluble group and a structural moiety (S2) that when acted on by an alkali developer, is decomposed to thereby increase its rate of dissolution in the alkali developer, and a repeating unit (B) that when exposed to actinic rays or radiation, generates an acid.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes: (A) a resin capable of increasing a solubility of the resin (A) in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, wherein (B) the compound capable of generating an acid upon irradiation with an actinic ray or radiation is contained in an amount of 10 to 30 mass % based on the entire solid content of the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method uses the composition.

Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an electron beam-sensitive or extreme ultraviolet-sensitive resin composition containing (A) a resin that contains a repeating unit having a partial structure represented by the specific formula and can decrease the solubility for a developer containing an organic solvent by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an electron beam or an extreme ultraviolet ray, (2) a step of exposing the film by using an electron beam or an extreme ultraviolet ray, and (4) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.

Abstract: A process for preparing a subassembly, the process comprising: (a) defining the location of one or more grooves for receiving optical conduits on the top planar surface of a wafer or panel, the grooves corresponding to multiple interposers on the wafer or panel; and (b) etching the grooves into the wafer or panel, each groove having sidewalls and first and second terminal ends and a first facet at each terminal end perpendicular to the side walls, each first facet having a first angle relative to the top planar surface, each groove being shared by a pair of transmitting and receiving interposers on the wafer or panel prior to being diced such that the first and second terminal ends of each groove correspond to transmitting and receiving interposers, respectively.

Abstract: A color filter manufacturing method for forming a filter segment and a black matrix by repeating at least a coating step of coating a substrate with a photosensitive resin layer, a pattern exposure step of curing the photosensitive resin layer by pattern exposure, a developing step of developing the exposed photosensitive resin layer, and a sintering step of thermosetting the developed photosensitive resin layer, in this order a plurality of number of times, characterized in that in the exposure step, a laser is used as a light source, and proximity exposure is performed by repetitively emitting the laser via photomask such that a cumulative exposure amount is 1 to 150 mJ/cm2.

Abstract: A process to mark a multilayered article with a laser (20). The multilayered article (10) includes a laser-markable layer (14) having at least one organic polymer and at least one light-sensitive pigment therein, and including at least one release agent associated with the laser-markable layer. Laser-marking of the laser-markable layer is accomplished by directing laser radiation (22) into the multilayered article through the release agent (12) to induce an interaction between the light-sensitive pigment and the organic polymer. As a result of the interaction, a visually perceptible marking (16) is formed in the article. The laser-marked article includes a laser-markable layer and a first release agent associated with a surface of the laser-markable layer. The marking(s) in the laser-markable layer is visible through the layer of release agent, and the marking is a result of the laser-induced interaction between the light-sensitive pigment and the organic polymer.

Abstract: Provided is an apparatus and method of manufacturing a color filter adsorbing toner nano-particles by using electrostatic force. In the apparatus for manufacturing the color filter, a laser driver generates at least one laser control signal according to electrification data, at least one laser device forming a laser irradiation unit which irradiates a laser for a predetermined time according to the at least one laser control signal. According to the irradiated laser, electrostatic latent images are formed in positions of color filter cells having a predetermined resolution standard requirements in a glass substrate, and toner nano-particles are electrostatically adsorbed to the formed electrostatic latent images.

Abstract: Methods, algorithms, processes, circuits, and/or structures for laser patterning suitable for customized RFID designs are disclosed. In one embodiment, a method of laser patterning of an identification device can include the steps of: (i) depositing a patternable resist formulation on a substrate having configurable elements and/or materials thereon; (ii) irradiating the resist formulation with a laser tool sufficiently to change the solubility characteristics of the resist in a developer; and (iii) developing exposed areas of the resist using the developer. Embodiments of the present invention can advantageously provide a relatively low cost and high throughput approach for customized RFID devices.

Abstract: A laser-markable composition comprises a binder and an oxyanion of a multivalent metal.

Abstract: The present invention relates to a CO2 laser-transparent material having a mark on the surface thereof and the method for making the same. The method includes the following steps: providing a first substrate, which has a top surface and a bottom surface; providing a second substrate which has a top surface; putting the bottom surface of the first substrate on the top surface of the second substrate; irradiating a CO2 laser beam to the top surface of the second substrate by passing through the top surface and the bottom surface of the first substrate; and forming a mark on the bottom surface of the first substrate. The material of the mark is oxide of the second substrate or the same as the material of the second substrate. Whereby the cheap CO2 laser is utilized to form the mark on the first substrate, and the mark can be erased easily by a proper chemical for recycling the first substrate.

Abstract: A method for repairing a defect, such as a pinhole, on a photomask is described. In an example, a laser beam is used to form a matrix of laser burn spots in a substrate of the photomask proximate a defect, such as a pinhole, of the photomask. Each laser burn spot is formed at a focal point of the laser beam inside the substrate by melting a material of the substrate proximate to the defect. In an example, the defect is surrounded and covered by the matrix of laser burn spots. The matrix of laser burn spots can attenuate or block light from passing through the defect, such as the pinhole. The matrix of laser burn spots may repair the defect of the photomask without removing a pellicle and pellicle frame mounted on the photomask.

Abstract: A method of pulsed laser intrinsic marking can provide a unique identifier to detect tampering or counterfeiting.

Abstract: A method to enable wafer result prediction includes collecting manufacturing data from various semiconductor manufacturing tools and metrology tools; choosing key parameters using an autokey method based on the manufacturing data; building a virtual metrology based on the key parameters; and predicting wafer results using the virtual metrology.

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) which contains at least one phenolic hydroxyl group and at least one group where a hydrogen atom in a phenolic hydroxyl group is substituted by a group represented by the following General Formula (1) (in the formula, each of R11 and R12 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group; X11 represents an aryl group; M11 represents a single bond or a divalent linking group; and Q11 represents an alkyl group, a cycloalkyl group or an aryl group, wherein the number of carbon atoms which are included in the group represented by -M11-Q11 is 3 or more, and at least two of R11, R12, Q11, and X11 may form a ring by bonding to each other).

Abstract: A lithographic apparatus includes an illuminator for receiving a beam of EUV radiation from a radiation source apparatus and for conditioning the beam to illuminate a target area of a patterning device, such as a reticle. The reticle forms a patterned radiation beam. A projection system transfers the pattern from said patterning device to a substrate by EUV lithography. Sensors are provided for detecting a residual asymmetry in the conditioned beam as the beam approaches the reticle, particularly in a non-scanning direction. A feedback control signal is generated to adjust a parameter of said radiation source in response to detected asymmetry. The feedback is based on a ratio of intensities measured by two sensors at opposite ends of an illumination slit, and adjusts the timing of laser pulses generating an EUV-emitting plasma.

Abstract: A method of forming an image having multiple phases is disclosed herein. The method includes forming exposed and unexposed areas, the exposed areas comprising a first polymer network exhibiting first and second phases that are chemically connected and have different refractive indices, the first phase being continuous, and the second phase comprising a plurality of structures dispersed within the first phase, and the unexposed areas comprising a second polymer network comprising third and fourth phases that are chemically connected and have different refractive indices, the third phase being continuous, and the fourth phase comprising a plurality of structures dispersed within the third phase. The first and second polymer networks are chemically connected, and morphology formed by the first and second phases is different than that formed by the third and fourth phases.

Abstract: A method of manufacturing a paper substrate comprising a color former which is capable undergoing a light activated color change reaction, wherein the color former is applied to the paper substrate during the manufacture of said paper substrate, and the color former is a metal oxyanion or a molecular organic. A paper substrate obtainable by this method is also provided.

Abstract: The invention relates to a method of marking a substrate comprising treating the substrate with a boron compound and a charrable agent, and, irradiating the areas of the substrate to be marked such that those areas change colour. Marked substrates obtainable by this method are also provided.

Abstract: A lithographic printing plate precursor includes a cyanine dye, characterized in that the cyanine dye includes two different chromophoric groups, a chromophoric group that has its main absorption in the infrared region and another chromophoric group that has its main absorption in the visible light region.

Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with respect to water, wherein the resist composition for negative development contains a resin capable of increasing the polarity by the action of an acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) exposing the resist film via an immersion medium, and (c) performing development with a negative developer.

Abstract: The present invention provides an image processing method which includes any one of recording an image on a thermally reversible recording medium that can reversibly change any one of its transparency and color tone depending on temperature by irradiating and heating the thermally reversible recording medium with a laser beam, and erasing the image recorded on the thermally reversible recording medium by heating the thermally reversible recording medium, wherein in any one of the image recording and the image erasing, the thermally reversible recording medium is located at a position farther than a focal position of the laser beam, and at least any one of the image recording and the image erasing is performed.

Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film, wherein the resist composition contains a resin capable of increasing the polarity by the action of the acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) forming a protective film on the resist film with a protective film composition after forming the resist film and before exposing the resist film, (c) exposing the resist film via an immersion medium, and (d) performing development with a negative developer.

Abstract: Provided is a thin film evaluation method for a transfer mask which is adapted to be applied with ArF excimer laser exposure light and comprises a thin film formed with a pattern on a transparent substrate. The method includes intermittently irradiating pulsed laser light onto the thin film to thereby evaluate the irradiation durability of the thin film.

Abstract: A laser-markable, acrylic resin-based laminate having a thickness of 100 to 200 ?m and including (A3) a pigmented layer made of a crosslinked acrylic resin obtained by crosslinking an acrylic resin composition having a hydroxyl value of 10 to 100 mg KOH/g, (B3) a base layer made of a crosslinked acrylic resin obtained by crosslinking an acrylic resin composition having a hydroxyl value of 18 to 40 mg KOH/g, and (C3) a destructible layer made of a crosslinked acrylic resin obtained by crosslinking a mixture of an acrylic resin composition having a hydroxyl value of 20 to 35 mg KOH/g and polymer beads.

Abstract: The invention relates to an optical element for guiding and forming a laser beam, and to a method for recording beam parameters, particularly in a laser system, comprising a carrier substrate (40) and a coating (39), which is applied to at least one side of the carrier substrate (40), and comprising at least one temperature sensor (38). The temperature sensor (38) is comprised of a number of pixels arranged in a matrix, and each respective pixel has at least one temperature-sensitive element (39). The at least one temperature-sensitive element (39) of the pixel is constructed inside the carrier substrate (40) made of silicon.

Abstract: The present invention relates to: a resist composition such as a chemically amplified resist composition for providing an excellent pattern profile even at a substrate-side boundary face of resist, in addition to a higher resolution in photolithography for micro-fabrication, and particularly in photolithography adopting, as an exposure source, KrF laser, ArF laser, F2 laser, ultra-short ultraviolet light, electron beam, X-rays, or the like; and a patterning process utilizing the resist composition. The present invention provides a chemically amplified resist composition comprising one or more kinds of amine compounds or amine oxide compounds (except for those having a nitrogen atom of amine or amine oxide included in a ring structure of an aromatic ring) at least having a carboxyl group and having no hydrogen atoms covalently bonded to a nitrogen atom as a basic center.

Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition that can form independent line patterns with high resolution and excellent shapes and shows excellent resist performances including roughness characteristics, and to provide an actinic ray-sensitive or radiation-sensitive film and a pattern forming method using the composition. The actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group is substituted with a group represented by the following General Formula (1) (the respective symbols in the formula represent the same definitions as in the claims and the specification).

Abstract: The invention provides a positive resist composition comprising, as base resins contained therein, (A) a polymer having a weight-average molecular weight of 1000 to 500000 and containing a repeating unit which contains a structure having a hydrogen atom of a carboxyl group thereof substituted with an acid-labile group having a cyclic structure and (B) a novolak resin of a substituted or an unsubstituted naphtholphthalein, and in addition, a photo acid generator. There can be provided a positive resist composition having an appropriate absorption to form a pattern on a highly reflective substrate, excellent characteristics in adhesion and implantation onto a non-planar substrate, a good pattern profile after light exposure, and an ion implantation resistance at the time of ion implantation; and a patterning process.

Abstract: A method of manufacturing a mask for depositing a thin film is disclosed. In one embodiment, the method includes i) providing a raw material substrate for a deposition mask; ii) removing a portion of the raw material substrate to form a pattern, wherein a plurality of openings are defined in the pattern; and iii) irradiating at least a laser beam onto the openings of the pattern at an inclination angle with respect to the raw material substrate such that inclined portions are formed at the side surfaces of each of the openings of the pattern.

Abstract: Provided are ink compositions, methods for making photochromic inks, and methods of using the photochromic inks for erasable media annotation. In accordance with various embodiments, there is an ink composition including a carrier medium and one or more photochromic species in the carrier medium, wherein each of the one or more photochromic species can be selected from the group consisting of monomeric photochromic molecules, photochromic oligomers, and photochromic polymers, and wherein each one of the one or more photochromic species exhibits a reversible transition from a colorless state to a colored state upon exposure to a radiant condition wherein the radiant condition can be selected from the group consisting of a radiant energy and a combination of a radiant energy and thermal energy.

Abstract: A manufacturing method of a polymer film with the photonic crystal structure includes a mixing step for at least mixing an achiral liquid crystal (LC), a chiral dopant, a monomer and a photo initiator together to form an LC-monomer mixture, at least one exposure step for exposing the LC-monomer mixture through a mask, at least one diffusion step for diffusing the monomer from the area around one of the exposure areas to the exposure area, and a LC removing step for removing the achiral LC to form the polymer film. By implementing the diffusion step after the exposure step, the polymerization rate of the monomers is enhanced so as to increase the proportion of the polymer in the polymer film and raise the imprint rate of chirality. Therefore, the polymer film can reveal stronger photonic crystal structure and property of Bragg reflection when it is not filled with any fluid.