Abstract: Provided are a donor substrate for laser induced thermal imaging (LITI) and a method of fabricating an organic light emitting diode (OLED) using the same, which can prevent a transferred emission layer from being damaged by heat and thus prevent wrinkles from forming on the surface thereof. The donor substrate includes a base layer, a light-to-heat conversion layer disposed on the base layer, a first transfer layer disposed on the light-to-heat conversion layer and including an organic layer, an inorganic layer, or a double layer thereof, and a second transfer layer disposed on the first transfer layer and including an emission layer. The first transfer layer has an absolute value of lowest unoccupied molecular orbital energy level of 2.6 to 3.0 eV and a band gap energy of 2.8 to 3.4 eV.

Abstract: According to one embodiment, a method of forming a pattern includes applying a block copolymer to a substrate, the block copolymer including a first block and a second block, the first block including polyacrylate or polymethacrylate having a side chain to which an alicyclic hydrocarbon group or a hydrocarbon group including a tertiary carbon is introduced, and the second block including polystyrene substituted with hydrocarbon or halogen at an ?-position, causing the block copolymer to be phase-separated, irradiating the block copolymer with an energy beam to decompose the second block, and removing the second block with a developer to form a pattern of the first block.

Abstract: A method of forming an etch mask includes: providing a substrate having thereon a material layer to be etched; forming a hard mask layer consisting of a radiation-sensitive, single-layer resist material on the material layer; exposing the hard mask layer to actinic energy to change solvent solubility of exposed regions of the hard mask layer; and subjecting the hard mask layer to water treatment to remove the exposed regions of the hard mask layer, thereby forming a masking pattern consisting of unexposed regions of the hard mask layer.

Abstract: A low-cost information recording medium is provided by which good recording quality can be obtained even when information is recorded thereon in a high density using a blue laser. The recording medium has a recording layer which comprises Sb, O and M. A content of O atoms is 30 atom % or more but not more than 55 atom %, a content of M atoms is 5 atom % or more but not more than 35 atom %, and a content of Sb atoms is 20 atom % or more but not more than 55 atom %. The recording layer does not contain Au, Pt and Pd.

Abstract: A method for enhancing recording yields by monitoring dye polymer formation on a glass substrate is provided. After the glass substrate is coated with a dye polymer layer and before pits are formed on the dye-polymer coated glass, the dye polymer coated glass substrate is scanned to detect defects. The dye-polymer coated glass is discarded on the one hand if the defects detected through the scanning are at or above an unacceptable threshold level, and on the other hand data is written on the dye-polymer coated glass if the defects detected through the scanning are below the unacceptable threshold level.

Abstract: The present invention relates to recording material having a laser coloring layer, wherein the laser coloring layer comprises one or more materials selected from among pigments, dyes and inorganic materials, and the laser coloring layer exhibits absorption at a wavelength within a range from 700 to 12,000 nm. The recording material of the present invention has a laser coloring layer of a desired hue, such as yellow, cyan, magenta, orange, white or black, and by conducting printing by laser irradiation, a recorded item with excellent color tone can be obtained.

Abstract: A method for erasing an image including irradiating an image formed on a thermoreversible recording medium with a laser light having a wavelength of 700 nm to 1,500 nm so as to erase the image, wherein an energy density of the laser light is in a range of the energy density which can erase the image and a center value or less of the range, wherein the thermoreversible recording medium includes a support, and a thermoreversible recording layer on the support, and wherein the thermoreversible recording layer contains a leuco dye serving as an electron-donating color-forming compound and a reversible developer serving as an electron-accepting compound, in which color tone reversibly changes by heat, and at least one of the thermoreversible recording layer and a layer adjacent to the thermoreversible recording layer contains a photothermal conversion material, which absorbs the light and converts the light into heat.

Abstract: Provided is a thin film evaluation method for a transfer mask which is adapted to be applied with ArF excimer laser exposure light and comprises a thin film formed with a pattern on a transparent substrate. The method includes intermittently irradiating pulsed laser light onto the thin film to thereby evaluate the irradiation durability of the thin film.

Abstract: Disclosed are photo sensitizers that include a polyol moiety covalently bonded to a fused aromatic moiety. Also disclosed is a method for improving UV laser ablation performance of a coating, such as a cationic UV curable coating, by incorporating an oxalyl-containing additive into the cationic UV curable or other coating. Oxalyl-containing sensitizers having the formula Q-O—C(O)—C(O)—O—R1 wherein Q represents a fused aromatic moiety and R1 is an alkyl or aryl group, are also disclosed, as are oxalyl-containing oxetane resins, oxalyl-containing polyester polyols, and cationic UV curable coating formulations that include oxalyl-containing additives.

Abstract: A method for producing a color filter, comprising: applying to a substrate at least one diacetylene capable of undergoing a light-activated color change reaction, and exposing the substrate to light thereby causing the exposed regions of the substrate to change color. The invention also provides devices comprising colored filters such as liquid crystal displays.

Abstract: A method of forming a pattern and a negative-type photoresist composition, the method including forming a photoresist film on a substrate by coating a photoresist composition thereon, the photoresist composition including a polymer, a photoacid generator, and a solvent, wherein the polymer includes an alkoxysilyl group as a side chain and is cross-linkable by an acid to be insoluble in a developer; curing a first portion of the photoresist film by exposing the first portion to light, the exposed first portion being cured by a cross-linking reaction of the alkoxysilyl groups therein; and providing a developer to the photoresist film to remove a second portion of the photoresist film that is not exposed to light, thereby forming a photoresist pattern on the substrate.

Abstract: A method in which a donor substrate is used in forming a light emitting layer by forming a transfer layer containing light emission material, irradiating a radiation ray to the transfer layer while the transfer layer and a substrate to be transferred face each other, and sublimating or vaporizing the transfer layer so that the transfer layer is transferred to the substrate to be transferred. The donor substrate includes: a base; a photothermal conversion layer arranged on the base; and a heat interfering layer arranged between the base and the photothermal conversion layer, and including two or more layers with refraction index different from each other.

Abstract: A polymer comprising a high proportion of aromatic ring structure-containing units and containing an aromatic sulfonic acid sulfonium salt on a side chain is used to form a chemically amplified positive photoresist composition which is effective in forming a resist pattern having high etch resistance. The polymer overcomes the problems of dissolution in solvents for polymerization and purification and in resist solvents.

Abstract: Disclosed is a photosensitive ink which can form a coated film that is excellent in insulation properties, heat resistance, low warping, low elasticity and adhesion with the substrate, when used as an ink for screen printing, and with which clogging of the screen, bleeding, blur, chipping and the like are unlikely to occur even when the screen printing is repeatedly carried out, so that which has an excellent ease of handling in printing. The ink composition comprises 100 parts by weight of an organic solvent-soluble polyimide block copolymer(s), and 1 to 100 parts by weight of a photoacid generator(s). The polyimide block copolymer(s) and the photoacid generator(s) are dissolved in an organic solvent. The polyimide block copolymer(s) contain(s) in its molecular skeleton a diamine having a siloxane bond, and an aromatic diamine having a hydroxyl group(s) and/or carboxyl group(s) at ortho-position with respect to an amino group.

Abstract: A method of forming a block copolymer pattern comprises providing a substrate comprising a topographic pre-pattern comprising a ridge surface separated by a height, h, greater than 0 nanometers from a trench surface; disposing a block copolymer comprising two or more block components on the topographic pre-pattern to form a layer having a thickness of more than 0 nanometers over the ridge surface and the trench surface; and annealing the layer to form a block copolymer pattern having a periodicity of the topographic pre-pattern, the block copolymer pattern comprising microdomains of self-assembled block copolymer disposed on the ridge surface and the trench surface, wherein the microdomains disposed on the ridge surface have a different orientation compared to the microdomains disposed on the trench surface.

Abstract: The present disclosure provides a resist utilized in a photolithography patterning process. The resist includes a polymeric material having a plurality of zipper molecules, each including a first zipper portion and a second zipper portion, wherein the first and second zipper portions each include a plurality of zipper branches bonded together in pairs and cleavable to one of thermal energy, radiation energy, and chemical reaction.

Abstract: A curable liquid formulation containing at least (i) one or more near-infrared absorbing triphenylamine-based dyes, and (ii) one or more casting solvents. The invention is also directed to solid near-infrared absorbing films composed of crosslinked forms of the curable liquid formulation. The invention is also directed to a microelectronic substrate containing a coating of the solid near-infrared absorbing film as well as a method for patterning a photoresist layer coated on a microelectronic substrate in the case where the near-infrared absorbing film is between the microelectronic substrate and a photoresist film.

Abstract: A laser-writable molding material containing A) at least one polymer material or at least one precursor compound which can be polymerised to give a polymer material, and B) a particulate salt-like compound or a mixture of particulate salt-like compounds, which under the influence of laser light changes its color or leads to a color change in the component A). In order to enlarge the range of matrix materials hitherto available for laser writing and to overcome the disadvantages of the previously used writing procedures for such matrix materials, the laser-writable molding material according to the invention is characterised in that the at least one polymer material of the component A) is selected from polymer compounds having siloxane crosslinking units.

Abstract: A method for erasing an image including irradiating an image formed on a thermoreversible recording medium with a laser light having a wavelength of 700 nm to 1,500 nm so as to erase the image, wherein an energy density of the laser light is in a range of the energy density which can erase the image and more than a center value of the range, wherein the thermoreversible recording medium includes a support, and a thermoreversible recording layer on the support, and wherein the thermoreversible recording layer contains a leuco dye serving as an electron-donating color-forming compound and a reversible developer serving as an electron-accepting compound, in which color tone reversibly changes by heat, and at least one of the thermoreversible recording layer and a layer adjacent to the thermoreversible recording layer contains a photothermal conversion material, which absorbs the light and converts the light into heat.

Abstract: There is herein described a method and apparatus for photoimaging. In particular, there is described a method and apparatus for photoimaging a substrate covered with a wet curable photopolymer, wherein the photoimaged substrate is used to form images such as electrical circuits.

Abstract: A method for marking an substrate, comprising coating the substrate with a white or colorless solution of a soluble alkali or alkaline earth metal salt of a weak acid and irradiating areas of the substrate to be marked such that those areas change color, wherein the substrate comprises a polysaccharide material.

Abstract: New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprises two or more distinct materials that can be substantially non-mixable with a resin component of the resist. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.

Abstract: According to one embodiment, a write-once type information storage medium comprises an organic dye based recording material having sensitivity at a wavelength of 405 nm and at a recording wavelength in the range of 600 nm to 700 nm, wherein, when absorbance of a maximum absorption wavelength in the vicinity of 405 nm is defined as 1, the absorbance is 5% or more at any wavelength in the range of 600 nm to 700 nm.

Abstract: Stop flow interference lithography system for high throughput synthesis of 3-dimensionally patterned polymer particles. The system includes a microfluidic channel containing a stationary oligomer film and a phase mask located adjacent to the microfluidic channel. A source of collimated light is provided for passing the collimated light through the phase mask and into the microfluidic channel for interaction with the oligomer. The passage of the collimated light through the phase mask generates a 3-dimensional distribution of light intensity to induce crosslinking of the oligomer in high intensity regions thereby forming 3-dimensional structures.

Abstract: Exemplary embodiments provide compositions and methods for making and using an erasable medium that can include a photochromic layer disposed over a substrate. The photochromic layer can include one or more photochromic molecule-polymer systems, wherein each of the one or more photochromic molecule-polymer systems can include a photochromic molecule covalently bonded within a polymer main chain, the photochromic molecule including one or more photochromic moieties (PM) linked together via a linker.

Abstract: Provided is a novel fluorinated compound, a fluoropolymer, and a method for producing the compound. A monomer of the compound has a formula F2?CFCF2C(X)(C(O)OZ)(CH2)nCR?CHR, wherein X is a hydrogen atom, a cyano group, or a group of formula —C(O)OZ; Z is a hydrogen atom or a C1-20 monovalent organic group, n is 0, 1, or 2; and R is a hydrogen atom or a C1-20 monovalent organic group.

Abstract: A method of correcting patterns includes attaining a correcting amount distribution map using a photo mask, the photo mask including a transparent substrate having first and second surfaces opposite to each other and a mask pattern on the first surface, attaining a plurality of shadowing maps based on the correction amount distribution map, each of the shadowing maps including a unit section having a different plane area, and forming a plurality of shadowing regions with shadowing elements in the transparent substrate of the photo mask using respective shadowing maps.

Abstract: The present invention relates to thermoplastic material comprising polymer and at least one polychromic substance, wherein the polychromic substance is a functionalised diacetylene having the formula which has the general structure: X—C?C—C?C—Y—(CO)n-QZ wherein X is H or alkyl, Y is a divalent alkylene group, Q is O, S or NR, R is H or alkyl, and Z is alkyl, and n is 0 or 1. The present invention further relates to a method of processing thermoplastic material to form a plastic article, wherein the method comprises the step of processing the thermoplastic material at a temperature greater than the melt temperature of the thermoplastic, wherein the thermoplastic material comprises polymer and at least one polychromic substance as defined above; and further comprising the step of irradiating the plastic article to color at least a region of the plastic article.

Abstract: A photosensitive resin composition comprising: (A) a binder polymer; (B) a photopolymerizable compound that has an ethylenically unsaturated bond; and (C1) a compound represented by general formula (1) below, wherein, at least one R represents a C1-10 alkoxy group or a C1-12 alkyl group; the sum of a, b, and c is 1 to 6; and when the sum of a, b, and c is 2 to 6, each R may be the same as or different from one another.

Abstract: Compositions capable of simultaneous two-photon absorption and higher order absorptivities are provided. Compounds having a donor-pi-donor or acceptor-pi-acceptor structure are of particular interest, where the donor is an electron donating group, acceptor is an electron accepting group, and pi is a pi bridge linking the donor and/or acceptor groups. The pi bridge may additionally be substituted with electron donating or withdrawing groups to alter the absorptive wavelength of the structure. Also disclosed are methods of generating an excited state of such compounds through optical stimulation with light using simultaneous absorption of photons of energies individually insufficient to achieve an excited state of the compound, but capable of doing so upon simultaneous absorption of two or more such photons. Applications employing such methods are also provided, including controlled polymerization achieved through focusing of the light source(s) used.

Abstract: A photosensitive resin composition comprising: (A) a binder polymer; (B) a photopolymerizable compound that has an ethylenically unsaturated bond; and (C1) a compound represented by general formula (1) below, wherein, at least one R represents a C1-10 alkoxy group or a C1-12 alkyl group; the sum of a, b, and c is 1 to 6; and when the sum of a, b, and c is 2 to 6, each R may be the same as or different from one another.

Abstract: A method for correcting a position error of a lithography apparatus comprises inputting position data of exposure pattern, irradiating laser light onto a position reference mask from a position measurement laser system, calculating actual position data of the laser light irradiated onto the position reference mask, and comparing the position data of the exposure pattern with the actual position data of the laser light irradiated onto the position reference mask. With this method, circuit patterns can be accurately formed at predetermined positions on a photomask, and the circuit patterns on the photomask can be accurately formed at predetermined positions on a wafer.

Abstract: The present invention provides coating compositions comprising (i) a) a compound containing a free carbonyl group and b) a nucleophile or (ii) a compound containing a free carbonyl group, which compound is substituted with one or more nucleophilic groups. The present invention also provides a process for the preparation of these compositions, substrates coated with these compositions and a process for their preparation, a process for preparing marked substrates using these compositions, and marked substrates obtainable by the latter process.

Abstract: A method of producing an image in the crystalline colloidal array is disclosed. The method includes providing an ordered array of particles received within a curable matrix composition; curing a first portion of the matrix composition, wherein the first cured portion diffracts radiation at a first wavelength; curing another portion of the matrix composition, wherein the other cured portion diffracts radiation at another wavelength; and exposing the array to radiation to exhibit an image.

Abstract: A method to enable wafer result prediction from a batch processing tool, includes collecting manufacturing data from a batch of wafers processed in batch in the batch processing tool, to form a batch processing result; defining a degree of freedom of the batch processing result based on the manufacturing data; and performing an optimal curve fitting by trial and error for an optimal function model of the batch processing result based on the batch processing result.

Abstract: According to an embodiment, a storage medium includes a transparent resin substrate having a concentric or spiral groove and a recording film formed on the groove on the transparent resin substrate, a recording mark being formed by irradiation of a laser beam, wherein a reproduction durability count in a case where reproduction is continuously carried out by a laser beam is 1,000,000 or more.

Abstract: The present invention provides an image processing method which includes at least any one of image recording and image erasing, wherein a light irradiation intensity at a center position of the laser beam irradiated in the image recording is controlled; in the image recording, a first auxiliary line extended by a predetermined distance from a start point of each of image lines constituting an image in the opposite direction from the scanning direction and a second auxiliary line extended by a predetermined distance from an end point of each of the image lines in the scanning direction are prepared, and when the first and second auxiliary lines including an image line are continuously scanned, the image line is scanned with irradiating the laser beam, and the first and the second auxiliary lines are scanned without irradiating the laser beam to thereby record the image.

Abstract: In an optical information recording medium of the present invention, at least one information layer provided on a transparent substrate includes a protective layer and a write-once recording layer that are disposed in this order from the transparent substrate side. The recording layer contains at least one selected from Cr—O, Zn—O, Ga—O, In—O, Sn—O, Sb—O, Bi—O, and Te—O. The protective layer contains at least one selected from Cr—O, Zn—O, Ga—O, In—O, Sn—O, Sb—O, Bi—O, and Te—O. When the total amount of all the atoms other than oxygen atoms contained in the protective layer is taken as 100 atom %, the total amount of atoms of Cr, Zn, Ga, In, Sn, Sb, Bi, and Te in the protective layer is at least 70 atom %.

Abstract: A method for forming a self-aligned pattern on an existing pattern on a substrate comprising applying a coating of a solution containing a masking material in a carrier, the masking material being either photo or thermally sensitive; performing a blanket exposure of the substrate; and allowing at least a portion of the masking material to preferential develop in a fashion that is replicates the existing pattern of the substrate. The existing pattern may be comprised of a first set of regions of the substrate having a first reflectivity and a second set of regions of the substrate having a second reflectivity different from the first composition. The first set of regions may include one or more metal elements and the second set of regions may include a dielectric. Structures made in accordance with the method.

Abstract: Instances of data-storage media having pits and lands, such as individual DVDs or CDs, are manufactured by selectively illuminating a light-curable material to form cured regions corresponding to the lands. The selective illumination of the light-curable material can be implemented using mask-based illumination or selective laser illumination or both. The mask used in mask-based illumination can have one or more extra opaque portions and/or one or more extra transparent portions corresponding to false pits and/or false lands, respectively, where selective laser illumination is used to convert one or more false pits/lands produced during mask-based illumination into true pits/lands for the competed medium.

Abstract: The invention provides a method for forming a selective mask on a surface of a layer of AlXGaYIn1-X-YAsZP1-Z or AlXGaYIn1-X-YNZAs1-Z (0?X?1, 0?Y?1, 0?Z?1), which is a method for forming a mask with a minute width suitable for microfabrication in nano-order. (1) An energy beam 4a, 4b is selectively irradiated onto a natural oxide layer 2 formed on the surface of the layer 1 of AlXGaYIn1-X-YAsZP1-Z or AlXGaYIn1-X-YNZAs1-Z. (2) Of the natural oxide layer 2, parts other than parts onto which the energy beam 4a, 4b has been irradiated is removed by heating. (3) The natural oxide layer 2 of the parts onto which the energy beam 4a, 4b has been irradiated is partially removed by heating while alternatively carrying out a rise and fall in heating temperature.

Abstract: A method of correcting patterns includes attaining a correcting amount distribution map using a photo mask, the photo mask including a transparent substrate having first and second surfaces opposite to each other and a mask pattern on the first surface, attaining a plurality of shadowing maps based on the correction amount distribution map, each of the shadowing maps including a unit section having a different plane area, and forming a plurality of shadowing regions with shadowing elements in the transparent substrate of the photo mask using respective shadowing maps.

Abstract: Recording and reproducing characteristics and data saving reliability are secured in a write-once two-layer recording medium. A second recording layer from a side irradiated with light for recording and reproduction includes organic dye shown by a general formula of a chemical formula 3 described below (in the formula, R1 and R2 are alkyl groups of carbon number 1 to 4; Y1, Y2 respectively are organic groups independently; and X is Cl04, BF4, PF6, SbF6), and organic dye shown by a general formula of a chemical formula 4 described below (in the formula, R1, R4 are alkyl groups of carbon number 1 to 4; R2, R3 are alkyl groups of carbon number 1 to 4 or groups forming 3 to 6 membered rings by being coupled; Y1, Y2 respectively are organic groups independently; and X is Cl04, BF4, PF6, SbF6), to secure durability.

Abstract: To provide an image processing method including at least one of recording an image onto a thermoreversible recording medium in which transparency or color tone reversibly changes depending upon temperature, by applying a laser beam with the use of a semiconductor laser device so as to heat the thermoreversible recording medium, and erasing an image recorded on the thermoreversible recording medium, by heating the thermoreversible recording medium, wherein an intensity distribution of the laser beam applied in the image recording step satisfies the relationship represented by Expression 1 shown below, 1.20?I1/I2?1.29??Expression 1 where I1 denotes an irradiation intensity of the applied laser beam in a central position of the applied laser beam, and I2 denotes an irradiation intensity of the applied laser beam on a plane corresponding to 95% of the total irradiation energy of the applied laser beam.

Abstract: Disclosed are: a material for forming a protective film to be laminated on a photoresist film, which can prevent the contamination of an exposing device with an outgas generated from the photoresist film, which has little influence on the environment, which has a high water repellent property, which sparingly causes mixing with the photoresist film, and which can form a high-resolution photoresist pattern; a method for forming a photoresist pattern; and a solution for washing/removing a protective film. Specifically disclosed are: a material for forming a protective film, which comprises (a) a non-polar polymer and (b) a non-polar solvent; a method for forming a photoresist pattern by using the material; and a solution for washing/removing a protective film, which is intended to be used in the method.

Abstract: The optical information recording medium comprises a recording layer on a surface of a support. The surface of the support has pregrooves with a track pitch ranging from 50 to 500 nm, the recording layer comprises an azo metal complex dye, the azo metal complex dye is a complex of one or more azo dye and transition metal ions of which number is equal to or greater than the number of the azo dye. The azo metal complex dye comprises two or more transition metal ions per molecule, and in a molecule of the azo metal complex dye.

Abstract: Negative lithographic printing plate having on a substrate a photosensitive layer comprising an alkaline soluble polymeric binder, an alkaline insoluble polymeric binder, a polymerizable monomer, and an initiator is described. The photosensitive layer is imagewise exposed with a radiation to cause hardening in the exposed areas, and then developed to remove the non-hardened areas. The combination of both alkaline soluble polymeric binder and alkaline insoluble polymeric binder in a photosensitive layer can give excellent combined durability, developability, and coatability.

Abstract: Provided is a positive resist composition for an electron beam, an X-ray or EUV, including: (A) a resin capable of decomposing by the action of an acid to increase the dissolution rate in an aqueous alkali solution; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, represented by the following formula (ZI) or (ZII); (C) a basic compound; and (D) an organic solvent, wherein a concentration of all solid contents in said composition is from 1.0 to 4.5 mass %, and a total amount of the compound represented by formula (ZI) or (ZII) is 12 mass % or more based on all solid contents in said composition: wherein symbols in the formulae are defined in the specification.

Abstract: A method of forming patterns includes (a) coating a substrate with a resist composition for negative development to form a resist film having a receding contact angle of 70 degrees or above with respect to water, wherein the resist composition for negative development contains a resin capable of increasing the polarity by the action of an acid and becomes more soluble in a positive developer and less soluble in a negative developer upon irradiation with an actinic ray or radiation, (b) exposing the resist film via an immersion medium, and (c) performing development with a negative developer.

Abstract: The present invention describes an aperture including: an opaque plate; two sliver openings located in the opaque plate, the two sliver openings having rectangular shapes, the two sliver openings being parallel to each other. The present invention further describes a method including: decomposing a pattern into horizontal sub-features and vertical sub-features; forming a first mask corresponding to the horizontal sub-features; forming a second mask corresponding to the vertical sub-features; forming a first aperture with two parallel horizontal sliver openings corresponding to the first mask; forming a second aperture with two parallel vertical sliver openings corresponding to the second mask; exposing a wafer using the first aperture and the first mask; exposing the wafer using the second aperture and the second mask; and exposing the wafer with the third mask.