Matting Or Other Surface Reflectivity Altering Material Patents (Class 430/950)
  • Patent number: 6043010
    Abstract: An object of the present invention is to provide a silver halide photographic material having improved antiblocking property without deterioration of film brittleness and image quality due to addition of a polymer latex.A silver halide photographic material having at least one silver halide emulsion layer and at least one nonsensitive protective layer on a support, in which the nonsensitive protective layer contains polymer grains represented by the following General Formula (1) in a proportion by weight of 5 to 300% to a hydrophilic colloid as a binder, and the polymer grains have a mean grain diameter of at most 0.1 .mu.m,--(A).sub.x --(B).sub.y --(C).sub.
    Type: Grant
    Filed: March 18, 1998
    Date of Patent: March 28, 2000
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Hirohisa Hokazono, Tomokazu Yasuda, Kentaro Shiratsuchi, Takashi Ozawa
  • Patent number: 6040124
    Abstract: The invention relates to an imaging element comprising a laminated base comprising a layer of biaxially oriented film sheet adhered to the top surface of a base wherein said biaxially oriented polyolefin contains a photographically compatible fluoropolymer processing aid.
    Type: Grant
    Filed: November 20, 1998
    Date of Patent: March 21, 2000
    Assignee: Eastman Kodak Company
    Inventors: Peter T. Aylward, Robert P. Bourdelais, Thaddeus S. Gula, Pang-Chia Lu
  • Patent number: 6033839
    Abstract: This invention comprises a thermally processable imaging element comprising:(1) a support;(2) a thermally processable imaging layer on one side of the support; and(3) a protective layer comprising:(A) a film-forming binder;(B) matte particles comprising a core surrounded by said film-forming binder.
    Type: Grant
    Filed: May 20, 1998
    Date of Patent: March 7, 2000
    Assignee: Eastman Kodak Company
    Inventors: Dennis E. Smith, Sharon M. Melpolder, John L. Muehlbauer
  • Patent number: 6030756
    Abstract: The invention relates to an photographic element comprising a transparent polymer sheet, at least one layer of biaxially oriented polyolefin sheet and at least one image layer, wherein said polymer sheet has a stiffness of between 20 and 100 millinewtons said biaxially oriented polyolefin sheet has a spectral transmission between 35% and 90%, said biaxially oriented polyolefin sheet has a reflection density less than 65%.
    Type: Grant
    Filed: September 17, 1998
    Date of Patent: February 29, 2000
    Assignee: Eastman Kodak Company
    Inventors: Robert P. Bourdelais, Peter T. Aylward, Alphonse D. Camp, Michael R. Roberts
  • Patent number: 6027869
    Abstract: A photographic element is disclosed having at least one emulsion layer comprised of (a) radiation-sensitive silver halide grains, (b) sensitizer for the radiation-sensitive silver halide grains, (c) hydrophilic colloid vehicle, including peptizer for the radiation-sensitive silver halide grains, and (d) light scattering particles, wherein (a) the radiation-sensitive silver halide grains include tabular grains (1) having an aspect ratio of at least 2.0, (2) having {111} major faces, (3) containing greater than 50 mole percent bromide, based on silver, and (4) accounting for greater than 50 percent total grain projected area, (b) the sensitizer includes a fragmentable electron donating sensitizer, (c) the peptizer is a water dispersible cationic starch, and (d) the light scattering particles have aspect ratios of less than 1.5 and can be dissolved for removal from the emulsion layer. The photographic elements exhibit enhanced imaging speed and can be employed for color or black-and-white photographic imaging.
    Type: Grant
    Filed: December 17, 1998
    Date of Patent: February 22, 2000
    Assignee: Eastman Kodak Company
    Inventors: Joe E. Maskasky, Kenneth J. Reed, Victor P. Scaccia, James A. Friday
  • Patent number: 6025111
    Abstract: The present invention describes an aqueous coating composition useful in an imaging element which includes polymeric matte beads, an ionic surfactant and a dispersant selected from the group of polymers represented by the generic structures shown below ##STR1## wherein A comprises up to 150 repeat units of ethylene oxide, B comprises 3 to about 100 repeat units of a propylene oxide or higher alkylene oxide or combinations thereof, Q represents a multivalent linking group, x represents 1 or 2 and z represents 1 or 2.
    Type: Grant
    Filed: October 23, 1996
    Date of Patent: February 15, 2000
    Assignee: Eastman Kodak Company
    Inventors: Brian A. Schell, Mridula Nair
  • Patent number: 6022677
    Abstract: The invention relates to a imaging element comprising a layer of biaxially oriented sheet adhered to the bottom surface of a base wherein said biaxially oriented sheet adhered to the bottom surface has a surface roughness average of between about 0.30 to 2.00 .mu.m.
    Type: Grant
    Filed: December 24, 1997
    Date of Patent: February 8, 2000
    Assignee: Eastman Kodak Company
    Inventors: Robert P. Bourdelais, Douglas N. Haydock, Thaddeus S. Gula, Peter T. Aylward, Pang-Chia Lu
  • Patent number: 6020116
    Abstract: The invention relates to a photographic element comprising a transparent polymer base, at least one layer of biaxially oriented polyolefin sheet and at least one image layer wherein said polymer base has a stiffness of between 20 and 100 millinewtons, and said biaxially oriented polyolefin sheet has a spectral transmission of less than 15%.
    Type: Grant
    Filed: September 17, 1998
    Date of Patent: February 1, 2000
    Assignee: Eastman Kodak Company
    Inventors: Alphonse D. Camp, Robert P. Bourdelais, Peter T. Aylward
  • Patent number: 6017686
    Abstract: The invention relates to an photographic element comprising a paper base, one layer of biaxially oriented polyolefin sheet and at least one image layer wherein said paper base sheet has a basis weight of between 40 and 120 g/m.sup.2, and said biaxially oriented polyolefin sheet has a spectral transmission of at least 40% and a reflection density less than 60%.
    Type: Grant
    Filed: September 17, 1998
    Date of Patent: January 25, 2000
    Assignee: Eastman Kodak Company
    Inventors: Peter T. Aylward, Robert P. Bourdelais, Alphonse D. Camp
  • Patent number: 6017685
    Abstract: The invention relates to a photographic element comprising a transparent polymer sheet, a biaxially oriented polyolefin sheet laminated to said transparent polymer sheet, one image layer coated on the top of said biaxially oriented polyolefin sheet and one image layer coated on the bottom of said transparent polymer sheet wherein said polymer sheet has a stiffness of between 20 and 100 millinewtons, and said biaxially oriented polyolefin sheet has a spectral transmission of at least 40% and a reflection density less than 60%.
    Type: Grant
    Filed: September 17, 1998
    Date of Patent: January 25, 2000
    Assignee: Eastman Kodak Company
    Inventors: Robert P. Bourdelais, Alphonse D. Camp, Peter T. Aylward
  • Patent number: 5997993
    Abstract: The present invention provides a lithographic printing plate precursor element capable of being used on a printing press immediately after imagewise exposure without the requirement of bath processing. A preferred embodiment has in order (a) a substrate; and (b) a photoresist photohardenable upon imagewise exposure to actinic radiation, the photoresist comprising (i) a macromolecular organic binder; (ii) a photopolymerizable ethylenically unsaturated monomer having at least one terminal ethylenic group capable of forming a high polymer by chain-propagated polymerization, and (iii) a polymerization initiator activatable by actinic radiation; and (c) an on-press removable polyphosphate-containing overcoat. The polyphosphate-containing overcoat imparts the plate with a non-tacky surface and an enhanced resistance to the adverse influence of ambient humidity.
    Type: Grant
    Filed: November 20, 1997
    Date of Patent: December 7, 1999
    Assignee: Polaroid Corporation
    Inventors: Daoshen Bi, John M. Hardin
  • Patent number: 5998100
    Abstract: A fabrication process includes a step of providing a substrate to be fabricated. A multi-layer antireflective layer is then formed on the substrate. A patterned resist having a thickness less than 850 nanometers is formed on the multi-layer antireflective layer and the substrate is fabricated using the patterned resist as a mask.
    Type: Grant
    Filed: September 5, 1997
    Date of Patent: December 7, 1999
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Tsukasa Azuma, Tokuhisa Ohiwa, Tetsuo Matsuda, David M. Dobuzinsky, Katsuya Okumura
  • Patent number: 5994029
    Abstract: The invention relates to a sheet-like radiation-sensitive recording material whose surface is a discontinuous dulling layer comprising monodisperse particles is present. The dulling layer can be produced by spraying on a dulling liquid. An apparatus comprising an oscillation generator, which can transmit oscillations to the liquid in the apparatus, and has an orifice plate which has at least one hole with a diameter of from 5 to 250 .mu.m and from which the liquid emerges in the form of at least one laminar free jet which disintegrates into monodisperse drops is suitable for this purpose. The oscillation generator is preferably a piezoelectric ceramic.
    Type: Grant
    Filed: March 30, 1998
    Date of Patent: November 30, 1999
    Assignee: Agfa-Gevaert AG
    Inventors: Guenter Brenn, Franz Durst, Andreas Elsaesser, Otfried Gaschler, Guenter Hutzsch, Klaus Joerg
  • Patent number: 5985519
    Abstract: A method of manufacturing a semiconductor device for patterning a semiconductor substrate by photolithography, the semiconductor substrate having a transparent or semitransparent layer having a high transmissivity at an exposure wavelength .lambda., and the transparent or semitransparent layer being formed on an underlying structure with a surface having a high reflectivity at the exposure wavelength .lambda.. The method comprises the steps of: forming a resist layer having a refractive index n.sub.r and a thickness d.sub.r on the transparent or semitransparent layer; forming a top antireflection film having a refractive index n.sub.a and a thickness d.sub.a on the resist layer; selectively exposing the resist layer via the top antireflection film with light having the exposure wavelength .lambda.; removing the top antireflection film; and developing a latent image in the resist layer to form a resist pattern, wherein an optical thickness n.sub.a d.sub.
    Type: Grant
    Filed: October 29, 1997
    Date of Patent: November 16, 1999
    Assignee: Fujitsu Limited
    Inventors: Yoko Kakamu, Yuichiro Yanagishita
  • Patent number: 5985517
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.
    Type: Grant
    Filed: April 1, 1999
    Date of Patent: November 16, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 5972561
    Abstract: The quantity of the matting agent which is applied on a portion of the moving web of continuous photosensitive printing plate to be wound in an inner half of a roll is between 1.1 and 2.0 times as much as the quantity of the matting agent which is applied on a portion of the web to be wound in an outer half of the roll. Thereby, the mat layer is formed thick on the portion of the web to be wound in the inner part of the roll. Thus, the mat layer can withstand the pressure which is generated at the inner part, and it is possible to prevent the mat layer from being flattened during the winding.
    Type: Grant
    Filed: March 27, 1998
    Date of Patent: October 26, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Katsumi Sato, Yuji Asakura
  • Patent number: 5965339
    Abstract: The present invention is a photographic element which includes a support, at least one light sensitive silver halide layer superposed on the support, and a protective overcoat layer overlying the light sensitive silver halide layer. The protective overcoat layer includes a hydrophilic binder and permanent matte particles. The permanent matte particles are greater than 80 mole percent isobutyl methacrylate.
    Type: Grant
    Filed: April 17, 1998
    Date of Patent: October 12, 1999
    Assignee: Eastman Kodak Company
    Inventors: Dennis E. Smith, Yongcai Wang, Alfred B. Fant, John L. Muehlbauer
  • Patent number: 5948598
    Abstract: An anti-reflective coating and method of forming the anti-reflective coating are described wherein the anti-reflective coating is part of a silicon nitride layer formed on a semiconductor integrated circuit substrate. The anti-reflective coating is formed under the photoresist layer for greater effectiveness but does not disrupt the process flow since the anti-reflective coating is part of the silicon nitride layer. A first silicon nitride layer is formed having an index of refraction of about 2.1. A second silicon nitride layer having an index of refraction of about 1.9 and a second thickness is formed on the first silicon nitride layer. A layer of photoresist is then formed on the second silicon nitride layer. The second thickness is chosen to be equal to the wavelength of the light used to expose the layer of photoresist divided by the quantity of 4 multiplied by 1.9. The second silicon nitride layer acts as an effective anti-reflective layer.
    Type: Grant
    Filed: October 31, 1996
    Date of Patent: September 7, 1999
    Assignee: Taiwan Semiconductor Manufacturing Company Ltd.
    Inventors: Meng-Shiun Shieh, Po-Chieh Cheng
  • Patent number: 5948595
    Abstract: A method for producing a presensitized printing plate is disclosed. The method comprises the steps ofproviding a photosensitive layer on a supportspraying a resin dissolved or dispersed in an organic solvent on the surface of the photosensitive layer so that sprayed droplets of the resin solution or dispersion are stuck onto the surface of the photosensitive layer to form dots of the resin, anddrying the droplets stuck on the surface of the photosensitive layer so that the surface of the photosensitive layer is dotted with the particles of the resin.
    Type: Grant
    Filed: December 5, 1997
    Date of Patent: September 7, 1999
    Assignee: Konica Corporation
    Inventor: Shinya Watanabe
  • Patent number: 5935742
    Abstract: A photographic material comprising a cassette containing a processed photographic element, the photographic element comprising a support, at least one light sensitive silver halide layer and a protective overcoat layer on the light sensitive layer, the protective overcoat layer comprising a hydrophilic binder and permanent matte particles, the permanent matte particles comprising greater than 80 mole percent methyl methacrylate and having a mean particle size of from 1 to 1.8 .mu.m and a coating weight of from 70 to 250 mg/m.sup.2.
    Type: Grant
    Filed: April 16, 1996
    Date of Patent: August 10, 1999
    Assignee: Eastman Kodak Company
    Inventors: Yongcai Wang, Dennis Edward Smith, Alfred Bruce Fant, Melvin Michael Kestner
  • Patent number: 5935765
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.
    Type: Grant
    Filed: September 24, 1998
    Date of Patent: August 10, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 5932406
    Abstract: Disclosed is a silver halide photographic material which comprises a monodispersed polymer having an average grain size of from 1 to 10 .mu.m and variation coefficient of 0.10 or less and having a functional group which forms a covalent bond by reacting with an organic hardening agent or gelatin. Preferably, the polymer is a polymer obtained by polymerization by adding to a hydrophilic organic solution a high molecular weight dispersant which is dissolved in the hydrophilic organic solution and further adding at least one vinyl monomer which is dissolved in the hydrophilic organic solution but the polymer to be formed is precipitated from the hydrophilic organic solution. More preferably, the polymer contains 60 wt % or more of the repeating unit derived from methyl methacrylate and has a glass transition point of 60.degree. C. or more.
    Type: Grant
    Filed: July 26, 1996
    Date of Patent: August 3, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yutaka Adegawa, Kentaro Shiratsuchi
  • Patent number: 5932390
    Abstract: A silver halide photographic material which comprises a support having thereon at least one silver halide emulsion layer, wherein the photographic material contains a hydrazine derivative and a polymer latex having a core/shell structure which each are incorporated in at least one of the silver halide emulsion layer and other hydrophilic colloid layers of the photographic material. The photographic material provides superhigh contrast images without impairing the physical properties of the film.
    Type: Grant
    Filed: February 9, 1996
    Date of Patent: August 3, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kunio Ishigaki, Junichi Yamanouchi, Hidetoshi Watanabe
  • Patent number: 5916741
    Abstract: The present invention provides a photographic element comprises a support, at least one hydrophilic light-sensitive layer, and a light-insensitive layer containing a binder and polymer matte particles having the formula:(A).sub.x (B).sub.y (C).sub.z (I)where A is a monofunctional ethylenically unsaturated monomer which forms a homopolymer with a Tg less than 20.degree. C., B is a monofunctional ethylenically unsaturated monomer which forms a homopolymer with a Tg greater than 60.degree. C., C is a monomer with two or more ethylenically unsaturated groups, x is about 10 to 95 mole %, y is less than 85 mole %, and z is about 5 to 90 mole %.
    Type: Grant
    Filed: May 26, 1997
    Date of Patent: June 29, 1999
    Assignee: Eastman Kodak Company
    Inventors: Dennis E. Smith, Yongcai Wang, Patrick M. Jeffries, James R. Bennett
  • Patent number: 5914224
    Abstract: A silver halide photographic light-sensitive material is disclosed. It comprising at least one light-sensitive silver halide emulsion layer and at least one non-light-sensitive layer on a support and the non-light-sensitive layer contains porous fine particles of 400 mg per 1 m.sup.2 or more and the material is hardened utilizing at least one of vinyl sulfone hardener, carboxyl-activating hardener or polymeric hardener.
    Type: Grant
    Filed: October 1, 1997
    Date of Patent: June 22, 1999
    Assignee: Konica Corporation
    Inventors: Katsumasa Yamazaki, Takesi Nakamura
  • Patent number: 5912109
    Abstract: Imaging elements, such as photographic, electrostatographic and thermal imaging elements, comprised of a support, an image-forming layer and an electrically-conductive layer consisting essentially of electrically-conductive fine particles, such as antimony-doped tin oxide particles and, as a binder, water-insoluble polymer particles. The use of water-insoluble polymer particles of an appropriate shear modulus as a binder in the electrically-conductive layer provides a layer with a high degree of conductivity at low concentrations of electrically-conductive fine particles.
    Type: Grant
    Filed: February 12, 1996
    Date of Patent: June 15, 1999
    Assignee: Eastman Kodak Company
    Inventors: Charles Chester Anderson, Yongcai Wang, Mario Dennis DeLaura
  • Patent number: 5910398
    Abstract: Photographic glass plates can be prepared by directly coating the appropriate layer formations onto a glass support. One element comprises a thin subbing layer (less than 2 .mu.m), an antihalation layer, a silver halide emulsion layer, and a protective overcoat layer that can also include a matting agent or lubricant. Another embodiment has the antihalation layer coated directly onto the support.
    Type: Grant
    Filed: June 13, 1996
    Date of Patent: June 8, 1999
    Assignee: Eastman Kodak Company
    Inventors: Ronald James Schmidt, Lawrence Annello Savino
  • Patent number: 5905021
    Abstract: Imaging elements, such as photographic, electrostatographic and thermal imaging elements, comprised of a support, an image-forming layer and an electrically-conductive layer consisting essentially of electrically-conductive fine particles, such as antimony-doped tin oxide particles and, as a binder, water-insoluble polymer particles containing sulfonic acid groups. The use of water-insoluble polymer particles containing sulfonic acid groups as a binder in the electrically-conductive layer provides a layer with a high degree of conductivity at low concentrations of electrically-conductive fine particles.
    Type: Grant
    Filed: February 12, 1996
    Date of Patent: May 18, 1999
    Assignee: Eastman Kodak Company
    Inventors: Charles Chester Anderson, Yongcai Wang, Mario Dennis DeLaura
  • Patent number: 5882846
    Abstract: Infrared sensitive photographic elements comprise an opaque film support, an infrared sensitized silver halide emulsion layer and a hydrophilic colloid protective layer on one side of the film support, said protective layer comprising colloidal silica having an average particle size lower than 15 nanometers.The elements have an increased exposure latitude upon exposure to infrared laser diodes, and higher maximum density upon photographic processing.
    Type: Grant
    Filed: January 8, 1993
    Date of Patent: March 16, 1999
    Assignee: Imation Corp.
    Inventors: Alberto Vacca, Marino Rossi
  • Patent number: 5876908
    Abstract: The present invention is an imaging element including a support having a front side and a back side, at least one backing layer on the back side of the support, at least one silver halide emulsion layer superposed on the front side of the support, an interlayer superposed on the silver halide emulsion layer having a thickness of between 0.2 .mu.m and 1.2 .mu.m and a stiffness ratio of the interlayer to the silver halide emulsion layer of from 2 to 15; and a protective overcoat layer superposed on the interlayer having a thickness of from 0.3 to 2 .mu.m. The ratio of the thickness of the interlayer to the protective overcoat layer is less than or equal to 1.
    Type: Grant
    Filed: March 31, 1998
    Date of Patent: March 2, 1999
    Assignee: Eastman Kodak Company
    Inventors: Justin Z. Gao, Andy H. Tsou, Charles C. Anderson
  • Patent number: 5869217
    Abstract: A silver halide photographic material which has a layer containing a swellable inorganic stratifying compound.
    Type: Grant
    Filed: July 24, 1997
    Date of Patent: February 9, 1999
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Toshiaki Aono
  • Patent number: 5855717
    Abstract: A process for producing an article by transferring to at least one surface of the article, a surface structure of a polymeric film, the surface structure comprising individual, randomly distributed elevations, so that the resultant article comprises the surface structure or a mirror image of the surface structure, the transferring comprising: a) applying the film to the article as a cover layer wherein a surface of the film comprising the structure faces outward from the article; or b) transferring the surface structure of the film to the article by applying a surface of the film having the structure to the article, so as to form a mirror-image of the structure on the molded body, and optionally removing the film; the process produces an article having at least one surface which exhibits antireflection properties.
    Type: Grant
    Filed: February 20, 1992
    Date of Patent: January 5, 1999
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Ekkehard Beer, Hermann Dallmann, Hajo Hagens
  • Patent number: 5856075
    Abstract: Medical diagnostic radiographic elements capable of being processed in less than 45 seconds are disclosed that exhibit reduced gloss non-uniformities, Gloss non-uniformity reduction is attributable to the presence of a hydrophilic colloid layer overlying the imaging layer unit containing radiation-sensitive nontabular silver halide grains accounting for from 0.5 to less than 10 percent of monolayer coverage and having a mean equivalent circular diameter ranging from greater than the thickness of the overlying hydrophilic colloid layer up to 1.6 times the thickness of the overlying hydrophilic colloid layer.
    Type: Grant
    Filed: August 21, 1997
    Date of Patent: January 5, 1999
    Assignee: Eastman Kodak Company
    Inventors: Patrick M. Jeffries, Frank W. Keene, Jr.
  • Patent number: 5853966
    Abstract: A silver halide photographic material is disclosed, comprising a support having thereon at least one silver halide emulsion layer, wherein the photographic material contains a polymer having a number average grain size of from 0.3 to 10 .mu.m and a variation coefficient thereof of 0.40 or less and containing from 5 to 15 mol % of an acid monomer.
    Type: Grant
    Filed: July 24, 1996
    Date of Patent: December 29, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Masahiko Murayama
  • Patent number: 5851747
    Abstract: A silver halide photographic light sensitive material comprising a support having thereon photographic component layers including a light sensitive silver halide emulsion layer and a light insensitive hydrophilic colloid layer, wherein the silver halide emulsion layer comprises a silver halide emulsion which has been subjected to desalting by ultrafiltration, at least one of the component layers containing a composite material comprising a hydrophobic polymer and inorganic particles.
    Type: Grant
    Filed: May 20, 1996
    Date of Patent: December 22, 1998
    Assignee: Konica Corporation
    Inventor: Shigeaki Takahashi
  • Patent number: 5851722
    Abstract: The present invention provides an imaging element comprising in the order given on a hydrophilic base (i) an image receiving layer containing physical development nuclei, (ii) a photosensitive layer containing a silver halide emulsion being in water permeable relationship with said image receiving layer and (iii) an antistress layer being in water permeable relationship with said image receiving layer and comprising gelatin, characterized in that said antistress layer comprises at least 30 mg/m.sup.2 of a matting agent with a weight average diameter of at least 3 .mu.m.
    Type: Grant
    Filed: July 3, 1997
    Date of Patent: December 22, 1998
    Assignee: Agfa-Gevaert, N.V.
    Inventors: Paul Coppens, Guido Hauquier, Eric Verschueren, Eric Hoes
  • Patent number: 5846693
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film. A third method.
    Type: Grant
    Filed: February 10, 1998
    Date of Patent: December 8, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 5845575
    Abstract: Disclosed is a varnishing film and a method of adjusting the surface gloss of prepress color proof using the same for obtaining a color proof with the surface gloss in the particular areas of image adjusted, comprising the step of forming an image on matt surface having been formed using the varnishing film with an adhesive transparent resin layer and a photosensitive layer containing transparent matting agent provided on a transparent supporter, on the prepress color proof formed by Surprint process. It is possible to form an image with difference in the surface glosses on the prepress color proof formed by Surprint process.
    Type: Grant
    Filed: September 8, 1997
    Date of Patent: December 8, 1998
    Assignee: Nippon Paper Industries Co., Ltd.
    Inventors: Toshikazu Eda, Toshihiko Takada, Kazuo Nagashima, Hisashi Nakajima, Norio Yabe
  • Patent number: 5846700
    Abstract: The present invention is a photographic element including a support, at least one silver halide image-forming layer; and a hydrophilic protective layer. The hydrophilic protective layer includes a hydrophilic colloid, and a fluoroolefin-vinyl ether copolymer having a glass transition temperature greater than 25.degree. C. and a hydroxyl number greater than 5.
    Type: Grant
    Filed: June 12, 1997
    Date of Patent: December 8, 1998
    Assignee: Eastman Kodak Company
    Inventors: Yongcai Wang, Charles C. Anderson, James L. Bello
  • Patent number: 5834151
    Abstract: A method of forming an image on an image forming material is disclosed which comprises a transparent support having a first surface side and a second surface side and provided on the first surface side, an imaging layer, the method comprising the step of forming a mirror image on the imaging layer so that the formed image is visible from the second surface side, wherein the second surface side has a glossiness of 80 to 115.
    Type: Grant
    Filed: March 25, 1997
    Date of Patent: November 10, 1998
    Assignee: Konica Corporation
    Inventor: Yasunori Wada
  • Patent number: 5834174
    Abstract: A photographic element comprising a support, at least one hydrophilic light-sensitive layer, and a light-insensitive layer containing a binder and solid, nonporous polymer matte particle having the formula:(A).sub.x (B).sub.ywhere A is a monofunctional ethylenically unsaturated monomer, B is a polyfunctional ethylenically unsaturated monomer, x is from 0 to 55 mole %, and y is about 45 to 100 mole %.
    Type: Grant
    Filed: July 15, 1997
    Date of Patent: November 10, 1998
    Assignee: Eastman Kodak Company
    Inventors: Dennis Edward Smith, Yongcai Wang, Patrick M. Jeffries
  • Patent number: 5830620
    Abstract: The present invention provides a water developable flexographic printing plate for water-developing with a slip layer having excellent properties. The printing plate comprises a substrate, a photosensitive resin composition layer formed on the substrate, a slip layer formed on the photosensitive resin composition layer, and a cover film formed on the slip layer, wherein the slip layer is composed of hydroxyalkyl methyl cellulose, the cover film is a matted film containing silica, and an adhesive strength between the slip layer and the photosensitive resin composition layer is at least 20 g/50 mm higher than that between the cover film and the slip layer.
    Type: Grant
    Filed: September 12, 1996
    Date of Patent: November 3, 1998
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Masahiko Harada, Masataka Iwasaki
  • Patent number: 5830623
    Abstract: It is an object of the present invention to obtain a resist pattern of a high dimensional accuracy. In order to accomplish this object, a pattern lithography method according to the present invention comprises the steps of: forming a resist film 2 on a substrate 1 to be processed; applying a hydrous polymer solution 4 on the resist film 2; cross-linking polymers in the hydrous polymer solution to form a hydrogel film 4a of a predetermined thickness; and pattern-exposing the resist film 2 through the hydrogel film, and then, removing the hydrogel film 4a.
    Type: Grant
    Filed: September 12, 1996
    Date of Patent: November 3, 1998
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yumiko Maruyama, Takahiro Ikeda
  • Patent number: 5821028
    Abstract: A thermal transfer image receiving material is disclosed which comprises a support having a first surface and a second surface, a cushion layer and an image receiving layer provided on the first surface in that order, and a back coat layer provided on the second surface, wherein the surface of the back coat layer has a suction pressure of 300 mmHg or more.
    Type: Grant
    Filed: April 4, 1997
    Date of Patent: October 13, 1998
    Assignee: Konica Corporation
    Inventors: Katsumi Maejima, Tomoko Takeyama, Atsushi Nakajima, Katsuyuki Takeda
  • Patent number: 5807662
    Abstract: A silver halide photographic light-sensitive material is disclosed. The light-sensitive material comprises comprising a support, having thereon, a silver halide emulsion layer and optionally a hydrophilic colloid layer, in which the silver halide emulsion layer comprises silver halide grains sensitized by a selenium compound or a tellurium compound, and a polysulfide compound, and at least one of the silver halide emulsion layer and the hydrophilic colloid layer contains a tabular particle of a silicate compound.
    Type: Grant
    Filed: May 15, 1997
    Date of Patent: September 15, 1998
    Assignee: Konica Corporation
    Inventor: Shigeaki Takahashi
  • Patent number: 5800973
    Abstract: The present invention is an imaging element which includes a support, an image forming layer and a backing layer. The backing layer includes a film forming polymeric binder, hard filler particles in an amount of from 10 to 80 volume percent of the backing layer, and crosslinked elastomeric matte beads having a glass transition temperature of 10.degree. C. or less.
    Type: Grant
    Filed: April 28, 1997
    Date of Patent: September 1, 1998
    Assignee: Eastman Kodak Company
    Inventors: Charles C. Anderson, Andy H. Tsou, Paul E. Woodgate
  • Patent number: 5800972
    Abstract: An image recording material improved in its physical property is disclosed, comprising composite polymer particles which comprise inorganic particles and a hydrophobic polymer compound containing a repeating unit represented by the following formula. The composite polymer particles are formed by polymerizing, in the presence of the inorganic particles, a composition containing a hydrophobic monomer.
    Type: Grant
    Filed: October 25, 1996
    Date of Patent: September 1, 1998
    Assignee: Konica Corporation
    Inventors: Chiaki Kotani, Kiyokazu Morita, Eiichi Ueda, Yasuo Kurachi
  • Patent number: 5795709
    Abstract: There is disclosed a particulate photographic polymer, which at least comprises a repeating unit of the formula (I): ##STR1## wherein R is an alkyl group, a phenyl group, or a hydrogen atom; L is a divalent organic binding group; A is a repeating unit derived from at least one ethylenically unsaturated monomer, or a repeating unit derived by ring opening polymerization of a nitrogen-containing heterocyclic compound, with --(A).sub.m -- being soluble in water or a hydrophilic organic liquid; m is from 2 to 200; and Y is a monovalent binding group. The polymer is excellent in dispersion stability in coating solutions, prevents settling and agglomeratingis and the formation of mat pinholes, and can improve granularity of images.
    Type: Grant
    Filed: March 20, 1997
    Date of Patent: August 18, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yutaka Adegawa, Kentaro Shiratsuchi
  • Patent number: 5795697
    Abstract: The present invention provides an imaging element comprising in the order given on a hydrophilic surface of a support (i) an image receiving layer containing physical development nuclei, (ii) a photosensitive layer containing a silver halide emulsion being in water permeable relationship with said image receiving layer (iii) a first antistress layer and (iv) a second antistress layer, said antistress layers being in water permeable relationship with said image receiving layer and each independently comprising unhardened gelatin, characterized in that said second antistress layer comprises at least 30 mg/m.sup.2 of a matting agent with a weight average diameter of more than 3 .mu.m.
    Type: Grant
    Filed: July 3, 1997
    Date of Patent: August 18, 1998
    Assignee: AGFA-Gevart, N.V.
    Inventors: Paul Coppens, Eric Hoes
  • Patent number: 5792600
    Abstract: Disclosed is a silver halide photographic light sensitive material comprising a support and provided thereon, a light sensitive silver halide emulsion layer and a non-light sensitive hydrophilic binder layer, wherein at least one of the light sensitive silver halide emulsion layer and the non-light sensitive hydrophilic binder layer contains tabular silica particles covered with a hardened gelatin layer.
    Type: Grant
    Filed: November 18, 1997
    Date of Patent: August 11, 1998
    Assignee: Konica Corporation
    Inventor: Ken Nagami