Abstract: A heat treatment apparatus includes: a vertically-extended processing container configured to accommodate a substrate; a gas supply including a gas supply pipe that extends along an inner wall surface of the processing container in a vertical direction; a heater having a heat insulating material provided around the processing container, and a heating element provided along the inner wall surface of the heat insulating material; and a cooler having a fluid flow path formed outside the heat insulating material, and a blowing-out hole penetrating the heat insulating material and configured to blow out a cooling fluid toward the gas supply pipe, the blowing-out hole having one end that communicates with the fluid flow path and a remaining end that communicates with a space between the processing container and the heat insulating material. A plurality of blowing-out holes is provided in the gas supply pipe in a longitudinal direction.

Abstract: A technique for improving stability and safety at the time of boat transfer is provided. A reaction tube configured to process a substrate, a seal cap, provided on an upper surface thereof with a substrate retainer for retaining the substrate, configured to close a furnace opening of the reaction tube, one of a first elevator and a second elevator configured to elevate the seal cap; and another of a first elevator and a second elevator configured to assist the one of the first elevator and the second elevator in elevating the seal cap.

Abstract: A carton conveyer for a packaging machine has upper and lower flights to which sets of flight lugs are attached. Each set of flight lugs comprises leading flight lugs and trailing flight lugs and the leading flight lugs have recesses that face and oppose recesses on the trailing flight lugs. The recesses are formed to confine an open carton therebetween. Notches are formed in the flight lugs in such a way that movement of the leading and trailing flight lugs toward one another causes an un-erected carton between the lugs to be captured and erected.

Abstract: A method and a device for controlling a process for burning lime containing mixture (CaCO3) and converting it to calcinated lime (CaO) in a rotary kiln, the rotary kiln having an elongated cavity surrounded by a wall and a burner arranged to heat the cavity. The method includes collecting measurement data of the temperature in the wall at a plurality of measuring points along the longitudinal axis of the cavity, predicting the actual temperature gradient along the longitudinal axis of the cavity based at least on the measurement data of the temperature in the wall, and by means of a thermal model describing the temperature along the cavity of the kiln, determining a desired temperature gradient along the cavity based on the predicted temperature gradient along the cavity and a predetermined control strategy controlling the temperature in the kiln.

Abstract: The invention relates to a method for processing a slab (1) in a device, which comprises at least one furnace (2), at least one processing device (3, 4) arranged downstream of the furnace (2) in the conveying direction (F) of the slab (1), and a rolling train (5) arranged downstream of the at least one processing device (3, 4) in the conveying direction (F) of the slab (1), wherein means (6, 7) are provided, by means of which a force can be applied to the sides (8, 9) of the slab (1) in order to move the axis (10) of the slab (1) in agreement with a specified position transversely to the conveying direction (F) of the slab (1), in particular in accordance with the axis (11) of the rolling train (5).

Abstract: A material supply device for diffusion furnaces includes a main body, a fixing pedestal mechanism, a transmission mechanism and a cover mechanism for a furnace door. The main body includes a base portion and a main rod. The base portion is mounted on the main rod and the main rod extends through the base portion. The fixing pedestal mechanism is mounted on the main rod and is pivotedly mounted on a fixing pedestal. The transmission mechanism is mounted on the base portion and has a transmission rod slidably mounted on the base portion. The cover mechanism for a furnace door is fixed on an end of the transmission rod which is far away from the main body and is turnablely mounted on a cover of the furnace door. Based on the above assemblies, the present invention runs smoothly and improves production quality.

Abstract: A fiber treatment oven having slots for the fibers to pass through and adjustable gates located proximate the slots. The gates may be connected via a linkage that allows movement of many gates at once and may be connected so that individual gates may be adjusted as well.

Abstract: A furnace of controlled heating and treatment of material using infrared radiation. The furnace is capable of continuous infrared treating of material with consistent radiation being applied to the material, ease of access to the furnace for maintenance cleaning and repair, excellent control of radiant cooling of the material to be treated, and ease of maintenance of a volatile component condenser.

Abstract: A vacuum heat treating furnace for brazing a large metallic part is disclosed. The vacuum furnace includes a pressure vessel having a cylindrical wall and a door dimensioned and positioned for closing an end of the cylindrical wall. A workpiece handling system is mounted on the pressure vessel door for supporting a metallic workpiece to be heat treated or brazed. The workpiece handling system includes apparatus for rotating the workpiece during a processing cycle. A vacuum system is connectable to the workpiece for creating a subatmospheric pressure inside the workpiece during a brazing cycle.

Abstract: The invention relates to an oven for sealing a panel to a funnel, thus forming an envelope suitable for use in a display tube, comprising a tunnel structure 9 and at least one mount for conveying an assembly of a panel and a funnel through the tunnel structure 9. The tunnel structure 9 is provided with a longitudinal slot 16A and the components of the mount for guiding the mount along and through the tunnel structure 9 are placed outside the tunnel structure. It is preferred that the components comprise a means, such as a pump or compressor 24, for flushing the interior of the assembly 22 with a fluid obtained from a source which is substantially separated from the gas(es) circulating in the oven 1, e.g. from the surroundings of the oven 1.

Abstract: A gas or electrically heated kiln furnace in which the hearth is stationary and an outer shell or wall with a door for access rotates around a stationary hearth. Loading and unloading is accomplished by rotating the outer shell to align the door with a position where a workpiece is to be inserted or removed. The kiln can be used as an up draft or down draft kiln, as a single chamber or a progressive chamber kiln. This kiln uses minimum floor space in that a circular shell is not rolled back but rotated about a hearth, around a vertical axis.

Abstract: The method and apparatus is directed toward an annealing furnace and a method of using the same where the annealing furnaces includes a layer forming apparatus suitable to create layers of metal product; an insulated housing having an interior cavity formed by a roof, a floor, opposing side walls extending the annealing furnace length, opposing side walls extending the annealing furnace width, said insulated housing also having an entrance for introducing metal product and exit for discharging metal product; a heating means in the interior cavity for heat treating metal product; transportation device suitable to convey the metal product in form of layers from the chamber entrance to its exit, whereas to guarantee a stay time inside said furnace suitable for obtaining a required heat treatment; and a discharging apparatus suitable to break up the product layers.

Abstract: Heating and/or temperature-maintaining furnace (11) for slabs (35), which includes lateral intake (12a) and outlet (12b) roller conveyors the axis of which is at a right angle to the axis of movement of the slabs (35) within the furnace (11), the roller conveyors (12a-12b) consisting of a plurality of roller-bearing bogies (13) able to move at a right angle to the axis of the roller conveyors (12a-12b), the roller-bearing bogies (13) having a first maintenance/replacement position (13a) outside the furnace (11) and a second working position (13b) in which they cooperate with the inside of the furnace (11), means being also included for the movement of the slabs (35) in the furnace (11), the rollers (10) being supported at both their ends on the roller-bearing bogies (13) by supporting means (19) and being driven by appropriate motor means (21), the supporting means (19) and motor means (21) being located outside the furnace (11) when the roller-bearing bogies (13) is brought to its second working position (13

Abstract: Nozzles that blow an air are disposed in a space between an outer wall of a process tube and a heat generating resistor. The openings of the nozzles are oriented to the process tube corresponding to an arrangement area of semiconductor wafers. An air blowing angle and alignment of the openings of the nozzles are designated corresponding to the length of the arrangement area of the semiconductor wafers. Thus, since a portion where natural heat radiation is weak is forcedly cooled, the cooling effect can become equal in the entire region of the process tube, thereby reducing temperature drop time.

Abstract: Furnace with refractory longitudinal members and with central charging for heating and storing hot products, whereby the central charge arrives from a continuous casting plant or from previous hot processes, the furnace (10) comprising a first furnace portion (10a) for the introduction of a cold charge (12) and for storage and also a second furnace portion (10b) for discharge of the heated charge (15), the first (10a) and second (10b) furnace portions comprising stationary longitudinal members (23) and movable longitudinal members (24), the central charging taking place between the first (10a) and second (10b) furnace portions, a central intake and guide channel (22) being defined as a furnace bed by the plurality of stationary longitudinal members (23) cooperating with the respective plurality of movable longitudinal members (24a-24b) of the first (10a) and second (10b) furnace portions, the movable longitudinal members (24a-24b) in their raised position substantially facing each other, the width of the cent

Abstract: Apparatus is provided for decreasing temperature differentials within rectangular metal blooms being heated in a furnace. The apparatus includes elongated internally cooled members located above the blooms adjacent an exit end of the furnace. The longitudinal axes of the internally cooled members are parallel to each other and to the longitudinal axes of the blooms, the latter axes being aligned so as to extend transversely with respect to the direction of movement of the blooms from an entry to an exit end of the furnace.

Abstract: An elongated, horizontal tunnel-type furnace for heat treating workpieces carried in succession therethrough. The furnace is of modular construction and comprises a series of contiguous individual modular sections that define a tunnel-type enclosure. Each modular section comprises a stationary lower enclosure section and an assembled vertically retractable upper enclosure section. The upper enclosure sections are supported along opposite sides by a plurality of spaced, free-standing lifting devices. A screw-jack is associated with each lifting device for raising and lowering the upper enclosure sections relative to the lower enclosure sections. The upper enclosure sections may be raised and lowered individually or joined together and moved as a unit.

Abstract: A wafer boats supporting wafers is loaded into and unloaded from a reaction tube with a lid therebelow in a vertical heat treatment apparatus, while holding the wafer boat vertical with respect to the lid. An arm is provided in a space below the reaction tube, for transferring wafer boats along a path, while holding the wafer boats vertical and in a substantially horizontal plane. Three stations are formed in the path. At the first station, unprocessed wafers are mounted on a first wafer boat located, while wafers mounted on a first wafer boat is being heat-treated in said reaction tube. Then, the first wafer boat is transferred from the first station to the third station, and is held at the third station. While the first wafer boat is held at the third station, the second wafer boat is lowered to the second station to unload the second wafer boat from the reaction tube, and then is transferred to the first station.

Abstract: A method of heat-processing semiconductor wafers comprising forming a purge tube which encloses the plural wafers by supporting a boat, on which the plural wafers are mounted, by a carrier arm to define a space on the upper side of the wafers while defining another space on the lower side of the wafers when the boat is to be loaded into and unloaded from a heat process furnace by the moving carrier arm or either when the boat is to be loaded into the heat process furnace or when it is to be unloaded from the heat process furnace, moving the carrier arm to communicate the purge tube with the heat process furnace, supplying nitrogen gas into both of the purge tube and the heat process furnace, keeping them connected to each other, pre-heating or cooling the wafers to a predetermined temperature range, and loading the purge tube into the heat process furnace or unloading the purge tube from the heat process furnace.

Abstract: A walking beam furnace with a hearth of fixed beams and of walking beams arranged on supports passing through slots in the floor of the furnace in which, so as to avoid heat loss and undesired heating of the supports in the region of the floor slots, covers are provided for the floor slots that are movable with the supports in at least the feed direction.

Abstract: When pipes 8 are rollingly conveyed through a furnace along parallel rails 7, any lateral migrations of the pipes are periodically corrected by movable stops 18 which are extended inwardly in unison to abut the pipe ends and re-center them. The stops are mounted on elbowed arms 14 articulated about axes 15 disposed beneath the furnace bed together with fluid control cylinders 16 for the arms, thus providing unobstructed access around the side walls 2 of the furnace. The pipes roll over elevated slide runners 11 during their lateral re-centering by the stops, thereby avoiding the wear and abrasion of the rail crowns.

Abstract: A cantilever tube for carrying loaded wafer boats into a diffusion furnace and confining flow of gas through the wafers includes an elongated slot extending from an open end of the tube to a predetermined region in which the wafer boats are positioned, the wafer boats abutting each other and forming a sealing cover for the elongated slot. A narrow boat carrier supported on a carriage system extends through the elongated slot and carries a wafer boat loaded with wafers into the open end and to the predetermined region in the cantilever tube without allowing either the carrier, or the wafer boat, or the wafers to touch the cantilever tube. The carrier lowers the boat onto the bottom inner surface of the tube, causing the boat to cover a portion of the elongated slot. The procedure is repeated for subsequent wafer boats, each of which abuts the previous one, to effectively close and seal the elongated slot when all of the wafer boats are positioned inside the cantilever tube.

Abstract: An improved semiconductor wafer handling system completely eliminates the need for boats, sleds, paddles, wheeled carriers, etc., customarily employed in transporting wafers during heat processing through the use of a plurality of rigid, polished cantilevered rods having a multiplicity of spaced slots for cooperatively holding wafers in an upright position. The system provides a means for achieving higher production yields of such semiconductor elements by generating fewer contaminating particles and through less exposure to ambient environment.

Abstract: A cantilever diffusion tube apparatus includes a quartz cantilever tube having a support end clamped to a laterally movable carriage mechanism and an outer end portion containing a plurality of spaced semiconductor wafers. The cantilever tube is coaxially aligned with a diffusion tube of a diffusion furnace. The support end of the cantilever tube is sealed by a door plate through which a gas tube extends. The wafers are loaded into the cantilever tube through a window opening. The carriage then moves the cantilever tube and wafers therein into the diffusion tube. Reactant gases are caused to flow into the cantilever tube, between the heated wafers therein, and out of the cantilever tube. Then purging gas is caused to flow through the cantilever tube and wafers therein.

Abstract: A vacuum electric furnace is disclosed for operation with a hostile environment therein which may be above the melting temperature of most metals, other than refractory metals, with apparatus in the furnace for advancing the work, the advancing apparatus being a walking beam with provisions for protecting the exposed portions of the walking beam by the use of graphite and with work supporting buttons of molybdenum to prevent the work from reacting with the graphite at high temperatures, and with separation and shielding of portions of the walking beam from the hot zone and with liquid cooling of the shielded portions.

Abstract: A glass sheet to be heated, for example to a bending or a quenching temperature, is supported on its lower edge in an upright disposition and is advanced along a horizontally disposed path through a furnace. Transient support is provided for the upper edge of the sheet which support is positioned to cause the sheet to lean at a near-vertical angle as it is advanced, and thermal conditions in the furnace as well as the time the sheet is within the furnace are set in dependence on the glass thickness so as to heat the glass to the required temperature while permitting the glass to relax as it is heated only by an amount less than a maximum acceptable deformation of the sheet which depends on the use to which the sheet is to be put.