Abstract: A chromatographic interface for sample handling and manipulation between separations or analyses is provided. The interface has an interfacing unit, a sample acquisition unit, and a sample trapping unit. The sample acquisition unit includes an inflow selector valve, an outflow selector valve, and one or more collection loops. The sample trapping unit includes a trap in fluid communication with the loop and having a stationary phase. The stationary phase can trap an analyte of interest from a fraction of the chromatographic sample separation flow. The tapping unit also has a scavenging gas source and a vacuum source; both can be used to substantially dry the stationary phase.

Abstract: A gas injection system for a chemical vapor deposition system includes a gas manifold comprising a plurality of valves where each of the plurality of valves has an input that is coupled to a process gas source and an output for providing process gas. Each of a plurality of gas injectors has an input that is coupled to the output of one of the plurality of valves and an output that is positioned in one of a plurality of zones in a chemical vapor deposition reactor. A controller having a plurality of outputs where each of the plurality of outputs is coupled to a control input of one of the plurality of valves. The controller instructs at least some of the plurality of valves to open at predetermined times to provide a desired gas flow to each of the plurality of zones in the chemical vapor deposition reactor.

Abstract: A gas supply subsystem for providing a set of process gases to a substrate processing chamber, the set of process gases being a subset of a plurality of process gases available to the substrate processing chamber. The gas supply subsystem has fewer multi-gas mass flow controllers than the number of available process gases, wherein multiple process gases are multiplexed at the input of one or more of the multi-gas mass flow controllers. Pump-purge may be employed to improve gas switching speed for the multi-gas mass flow controllers.

Abstract: A hydrogen vacuum furnace (100) is provided with a process chamber (1) wherein a subject (10) to be heated is stored; a heating chamber (2) wherein a heater lamp (25) is stored; and a crystal board (3) for separating the subject (10) and the heater lamp (25) one from the other. In the hydrogen vacuum furnace (100), the subject (10) is heated by a radiant ray applied from the heater lamp (25). The process chamber (1) and the heating chamber (2) are provided with gas feed ports (11, 21) and exhaust ports (12, 22), respectively, for feeding and exhausting a gas. When the subject (10) is being heated, atmospheric pressure in each chamber is adjusted so that the heating chamber (2) is under positive pressure to the process chamber (1) by feeding or exhausting the gas.

Abstract: The invention relates to a method for heating an industrial furnace, wherein, apart from heating gas, a combustible process gas is also fed to a burner arrangement (9) of the industrial furnace for heating an interior space in the course of a heat treatment cycle. In order to optimize the use of the combustible process gas for the heating of the industrial furnace, the heat treatment cycle is split up into a plurality of process phases, wherein the supply of the process gas to the burner arrangement (9) is regulated depending on the process phase. Furthermore, the invention relates to a heating device (8) for an industrial furnace, as well as an industrial furnace that includes the heating device.

Abstract: A nozzle device for a furnace, having a central supply pipe, on which at least one nozzle opening and a feed connection for connecting the nozzle device to a gas supply are provided, the gas supply feeding a gas into the nozzle device flowing through the nozzle device and issuing from the at least one nozzle opening, and also relates to a furnace for heat treating a steel flat product. The nozzle device and the furnace by simple means ensure that the respective heat treatment produces uniform results in an optimum way. This is achieved by the nozzle device having a first section, in which it has a smaller effective nozzle opening cross-section than in a second section which seen in the flow direction of the gas issuing from the respective feed connection and flowing through the nozzle device is arranged further away from the feed connection in question.

Abstract: The tunnel kiln according to the present invention includes a tunnel kiln main body having an inner wall constituted by a furnace material, and having a debinding zone and a sintering zone wherein respectively debinding and sintering of a body to be fired containing an organic component are performed; a conveying unit for conveying the body to be fired from an inlet side to an outlet side of the tunnel kiln main body; and a lining provided so that at least an inner wall of the debinding zone of the inner wall of the tunnel kiln main body is covered therewith.

Abstract: A sintering apparatus comprising a furnace core tube having an opening in a top end through which the soot deposition body is inserted, and having atmospheric gas introduced therein from below and expelled upward; a shaft from which the soot deposition body hangs; a lid that has the shaft inserted therethrough and can cover the opening; a heating furnace that heats the soot deposition body; an internal lid in a top portion of the furnace core tube that divides the top portion of the furnace core tube into an upper region and a lower region; and a gas flow path that connects the two regions to each other and has the atmospheric gas flow therethrough. Total cross-sectional area, relative to movement direction of the atmospheric gas, of the gas flow path is less than cross-sectional area, relative to movement direction of the atmospheric gas, of the furnace core tube.

Abstract: The present invention is directed to a method for preparing a permanent magnet, and more specifically, to a method for preparing a high-performance sintered Nd—Fe—B permanent magnet, in order to solve the problems of increased brittleness or high cost present in the permanent magnet prepared by the existing process. A method for preparing a sintered Nd—Fe—B permanent magnet includes the following steps: (1) ingredient calculation and raw material preparation in which calculating ingredients and preparing raw materials according to the ingredient formula of the resultantly sintered Nd—Fe—B permanent magnet in mass fraction, i.e., (NdA?XREX)A(Febal?yMy)balB0.95˜1.03, in which A %+(0.95˜4.03)%+bal %=100%; then dividing the raw materials into a rare earth Fe—B compound and rare earth metals, the formula of the rare earth Fe—B compound in mass fraction being (Nd28?aREa)28(Febal?yMy)balB0.95˜1.03 and that of the rare earth metals being (NdA?28?bREb)A?28.

Abstract: Provided is a technology for uniformly increasing atmosphere temperature while rapidly achieving a desired uniform atmosphere composition. A combustion apparatus is provided with: a combustion part including a combustion space with a combustible gas inlet which is opened toward the combustion space for allowing the entry of a combustible gas, an air inlet which is opened toward the combustion space for allowing the entry of air, and a combustion gas outlet for discharging a combustible gas to the outside; and a regulated gas through channel part including a regulated gas outlet for discharging the gas prepared into a desired composition to the outside, the regulated gas outlet located adjacent to the combustion gas outlet and having an opening facing the combustion gas immediately after being discharged from the combustion gas outlet.

Abstract: In order to improve an enveloping gas device for transporting at least one enveloping gas that is allocated to at least one burner head or at least one nozzle of a device for working or processing at least one component or workpiece by autogenous processes, so that a reduction of the contaminant concentration, particularly the concentration of nitrogen oxides (NOX) and other harmful compounds is achieved, it is suggested, a flame issuing from the burner head or nozzle and directed towards the component or workpiece is completely enclosed by the enveloping gas, and the concentration of contaminants contained in the waste gas from the device, particularly the concentration of nitrogen oxides (NOX), is reduced by the enveloping gas.

Abstract: A heat treatment apparatus is provided with a reaction tube having a furnace opening formed at a lower end thereof, a lid body configured to hermetically seal the furnace opening of the reaction tube, a heat treatment boat supported on the lid body through a leg, and a rotating shaft extending through the lid body. The rotating shaft is connected to a lower end of the leg and configured to rotate the leg. The lid body is provided with a surrounding ring protruding upward to surround the lower end of the leg. An inert gas is supplied from an inert gas supply unit to a space between the lid body and the rotating shaft and discharged from a space between the lower end of the leg and the surrounding ring into the reaction tube.

Abstract: According to one aspect of the present disclosure, provided is a heat treatment apparatus configured to heat treat a plurality of objects to be treated which are held and supported by a holding and supporting unit while an inert gas is allowed to flow in a vertical type processing chamber from a bottom to a top thereof, wherein the processing chamber has a heating unit installed therearound. The heat treatment apparatus includes a gas supply system configured to supply the inert gas, wherein the gas supply system includes a gas supply header portion located in a lower end of the processing chamber to allow the inert gas to flow along a circumferential direction of the lower end; and a gas introduction portion in communication with the gas supply header portion to introduce the inert gas into the processing chamber.

Abstract: Provided are an apparatus and method for treating a substrate. More particularly, an apparatus and method for treating a substrate through a supercritical process are provided. The apparatus includes: a housing having an entrance in a predetermined surface thereof and providing a space for performing a high pressure process; a support member disposed in the housing to support a substrate; a door for opening and closing the entrance; and a pressing member configured to apply a force to the door so as to close the housing during the high pressure process.

Abstract: A method and system for treating sewage sludge are described herein. A carbonaceous fuel is mixed with sewage sludge, the mixture is then gasified, and the obtained gas is combusted. The method and system may utilize wet sewage sludge.

Abstract: An apparatus includes a first enclosure, a first door, at least one first valve, at least one inlet diffuser and at least one substrate holder. The first enclosure has a first opening. The first door is configured to seal the first opening. The first valve is coupled to the first enclosure. The inlet diffuser is coupled to the first valve and configured to provide a first gas with a temperature substantially higher than a temperature of an environment around the first enclosure. Each substrate holder disposed within the first enclosure supports at least one substrate.

Abstract: In order to improve an enveloping gas device (20) for transporting at least one enveloping gas (H) that is allocated to at least one burner head or at least one nozzle (10) of a device (100) for working or processing at least one component or workpiece (B) by autogenous processes, so that a reduction of the contaminant concentration, particularly the concentration of nitrogen oxides (NOx) and other harmful compounds is achieved, it is suggested, a flame (F) issuing from the burner head or nozzle (10) and directed towards the component or workpiece (B) is enclosed by the enveloping gas (H), and the concentration of contaminants contained in the waste gas from the device (100), particularly the concentration of nitrogen oxides (NOx), is reduced by the enveloping gas. The present invention further relates to a corresponding method associated with the enveloping gas device (20) for working or processing at least one component or workpiece (B) with autogenous processes.

Abstract: A hydrogen vacuum furnace (100) is provided with a process chamber (1) wherein a subject (10) to be heated is stored; a heating chamber (2) wherein a heater lamp (25) is stored; and a crystal board (3) for separating the subject (10) and the heater lamp (25) one from the other. In the hydrogen vacuum furnace (100), the subject (10) is heated by a radiant ray applied from the heater lamp (25). The process chamber (1) and the heating chamber (2) are provided with gas feed ports (11, 21) and exhaust ports (12, 22), respectively, for feeding and exhausting a gas. When the subject (10) is being heated, atmospheric pressure in each chamber is adjusted so that the heating chamber (2) is under positive pressure to the process chamber (1) by feeding or exhausting the gas.

Abstract: A system for heat treating a metal product has an annealing zone having a first preselected atmosphere condition, a cooling zone having a second preselected atmosphere condition different than the first preselected atmosphere condition, and a blueing zone having a third preselected atmosphere condition different than the first and second preselected atmosphere conditions. A graphical user interface allows an operator select one of the zones for displaying processing information pertaining to the selected zone. The processing information includes a computed ratio of gaseous hydrogen H2 (g) to water vapor H2O (g) for the respective preselected atmosphere condition. The graphical user interface allows an operator to control the respective preselected atmosphere based, at least in part, upon the computed ratio.

Abstract: A diffuser (24) for an annealing furnace has a plurality of radially extending generally and vertically oriented vanes (40) for radially directing furnace gases. The vanes have top edges (42) defining a generally planar support and the top edges of the vanes have a notch (38) therein for receiving a conduit (34) preferably ring shaped that extend substantially around a center portion of the diffuser plate. The conduit (34) is connected to an inlet (32) for receiving enriching gases and exit ports (50) circumferentially space about said conduit (34) passing the enriching gases into the diffuser (24) to be mixed with ambient furnace gases.

Abstract: An apparatus for melting a metal load includes a furnace having a melting chamber with a hearth and a molten metal outlet. The apparatus further includes non-regenerative burners that are operative to fire into the melting chamber, and regenerative burners that also are operative to fire into the melting chamber. The method includes the steps of firing non-regenerative burners into the chamber to provide heat for melting the load, and also firing regenerative burners into the chamber to provide heat for melting the load.

Abstract: A carbon baking furnace having spaced-apart, hollow flue walls defining a soaking pit therebetween. Each of the flue walls is formed of refractory bricks and has a pit face facing the pit and a flue face facing an inner flue gas passage. A coating is provided on the pit face of the flue walls. The coating increases the emissivity value of the pit face, wherein the emissivity value of the pit face is greater than the emissivity value of the flue face.

Abstract: A method for metal processing is provided in which a cooling atmosphere comprising hydrogen is used for accelerated cooling of a processed metal part in a furnace, resulting in improved properties for the metal part. A sintering furnace is also provided and comprises a means for inhibiting gas flows between a heating zone and a cooling zone of the furnace.

Abstract: An apparatus for subjecting a rare earth alloy block to a hydrogenation process includes a casing, gas inlet and outlet ports, a member arranged to produce a gaseous flow, and a windbreak plate. The casing defines an inner space for receiving a container. The container includes an upper opening and stores the rare earth alloy block therein. A hydrogen gas and an inert gas are introduced into the inner space through the gas inlet port, and are exhausted from the inner space through the gas outlet port. The gaseous flow is produced by a fan, for example, in the inner space. The windbreak plate is disposed upstream with respect to the gaseous flow that has been produced inside the inner space. Also, the windbreak plate reduces a flow rate of the gaseous flow that has been produced near the upper opening of the container.

Abstract: Discharge screw (6) for a moving hearth, and in particular for an annular rotary hearth (2) of a reheat furnace for the heat treatment of loose materials, comprising a cylinder (61) arranged above and substantially radially with respect to this annular hearth (2) and turned by suitable actuators (15) so as to discharge the materials from the edges of this annular hearth (2); this cylinder (61) comprises on its lateral surface a first series of helicoids (62) beginning in an area close to its outermost end with respect to the furnace and a second series of helicoids (63) beginning at its innermost end with respect to the furnace; the inclination of the helicoids (62) of this first series is essentially symmetrical to the inclination of the helicoids (63) of this second series; and in this screw (6) each helicoid (62, 63) of one series comprises an inward end that meets the inward end of a corresponding helicoid (63, 62) of the other series in such a way that at at least one of the abovementioned ends a free fi

Abstract: The present invention relates to a reflow furnace for heating a carried circuit module to perform reflow soldering. The reflow furnace has a nozzle 60 for performing an operation of spraying the inert gas on a soldering portion for the circuit module carried into the furnace while the nozzle is moved, maintaining high mounting reliability and high productivity, even if apertures of the carrying inlet and the carrying outlet are large.

Abstract: A calcining system is operated in a substoichiometric mode for reducing nitrogen oxide generation and removing sulfur from materials to be processed by creating an oxygen deficient atmosphere. The calcining system includes a rotary kiln rotating on a slightly inclined horizontal axis. The rotary kiln has a feed end introducing material to be processed and a discharge end. A preheating/precalcining device is positioned adjacent the feed end such that the material passes through the device prior to entering the rotary kiln. A stationary hood surrounds the discharge end. A burner is supported by the stationary hood. The burner introduces combustible fuel and combustion air into the rotary kiln through the discharge end and operates in a substoichiometric mode. At least one air nozzle is located along the length of the rotary kiln. The air nozzle injects combustion air into the rotary kiln.

Abstract: A continuous pusher furnace includes a product carrier assembly incorporating a traveling gas barrier. The product carrier assembly comprises a plate disposed to receive product thereon and a gas barrier extending upwardly from the plate. The perimeter of the gas barrier is sized and configured to fit within a vestibule between heating chambers in the furnace with a clearance gap with the vestibule selected to increase a gas flow velocity through the vestibule sufficient to overcome a gas diffusion velocity through the vestibule in a direction opposite to the gas flow. In this manner, gas is unable to diffuse into an upstream heating chamber. In an alternative embodiment, an exhaust outlet may also be provided in the vestibule or chamber to exhaust gas from upstream and downstream heating chambers from the furnace.

Abstract: Discharge screw (6) for a moving hearth, and in particular for an annular rotary hearth (2) of a reheat furnace for the heat treatment of loose materials, comprising a cylinder (61) arranged above and substantially radially with respect to this annular hearth (2) and turned by suitable actuators (15) so as to discharge the materials from the edges of this annular hearth (2); this cylinder (61) comprises on its lateral surface a first series of helicoids (62) beginning in an area close to its outermost end with respect to the furnace and a second series of helicoids (63) beginning at its innermost end with respect to the furnace; the inclination of the helicoids (62) of this first series is essentially symmetrical to the inclination of the helicoids (63) of this second series; and in this screw (6) each helicoid (62, 63) of one series comprises an inward end that meets the inward end of a corresponding helicoid (63, 62) of the other series in such a way that at at least one of the abovementioned ends a free fi

Abstract: A method is disclosed for speeding workpiece thoughput in low pressure, high temperature semiconductor processing reactor. The method includes loading a workpiece into a chamber at atmospheric pressure, bringing the chamber down to an intermediate pressure, and heating the wafer while under the intermediate pressure. The chamber is then pumped down to the operating pressure. The preferred embodiments involve single wafer plasma ashers, where a wafer is loaded onto lift pins at a position above a wafer chuck, the pressure is rapidly pumped down to about 40 Torr by rapidly opening and closing an isolation valve, and the wafer is simultaneously lowered to the heated chuck. Alternatively, the wafer can be pre-processed to remove an implanted photoresist crust at a first temperature and the chamber then backfilled to about 40 Torr for further heating to close to the chuck temperature. At 40 Torr, the heat transfer from the chuck to the wafer is relatively fast, but still slow enough to avoid thermal shock.

Abstract: A method and apparatus for baking-out and for cooling a vacuum chamber are provided. In a first aspect, an inert gas which conducts heat from the vacuum chamber's bake-out lamps to the shield and from the shield to the other parts within the vacuum chamber is introduced to the chamber during chamber bake-out. The inert gas preferably comprises argon, helium or nitrogen and preferably raises the chamber pressure to about 500 Torr during chamber bake-out. A semiconductor processing apparatus also is provided having a controller programmed to perform the inventive bake-out method. In a second aspect, a process chamber is provided having at least one source of a cooling gas. The cooling gas is input to the chamber and is allowed to thermally communicate with the chamber body and components. The cooling gas may reside in the chamber for a period of time or may be continuously flowed through the chamber. Once the chamber reaches a target temperature the cooling gas is evacuated.

Abstract: A method of treating parts (34) in a treatment chamber (33) by hot-isostatic pressing with an inert gas as pressure medium and in the presence of a purifying agent (25a) for the inert gas comprises the steps of reducing the pressure in the treatment chamber (33), increasing the pressure again by introducing the inert gas, increasing the temperature in the treatment chamber (33) by activating heating elements (9a), and, after a certain holding time, reducing the pressure and the temperature again. Especially if the purifying agent (25a) is of the same material as the parts (34) being treated, the purifying effect of the purifying agent becomes insufficient. The effect of the purifying agent (25a) is improved according to the invention by bringing the inert gas, at least when being introduced, to circulate such that it is heated, passes through the purifying agent and is thereafter cooled before contacting the parts. The invention also relates to a device for carrying out the method.

Abstract: A device adapted for attachment to a thermal processing furnace, the device includes a housing having first and second openings with a chamber located therebetween, the second opening is operatively connected to a thermal processing furnace and in communication with the thermal processing furnace for receiving a thermal process generating gas stream containing combustibles from the thermal processing furnace, a gas supply assembly located within the chamber for supplying a heated oxygen-containing gas at a temperature and velocity sufficient to mix the combustibles and the oxygen-containing gas to oxidize the combustibles into harmless byproducts.

Abstract: A temperature-controlled chamber, such as an inerted oven for soldering, in which the buoyancy-induced motion of gas at the opening of the chamber is suppressed by adjusting the densities of gases. In one embodiment the inertant gas is chosen to be a mixture of inert gases such that the density of warm gas inside the oven approximately equals the density of the external atmosphere. In another embodiment, a buffer region of density-matched warm air is provided between the warm inertant inside the oven and the external atmosphere. The result is reduction in the consumption of inertant.

Abstract: A substrate treatment system comprises process sections provided with at least either of liquid treatment group units and heat treatment group units, an upper space formed above the process sections in order to supply air to the process sections, a purification section for removing alkaline components from the air to be supplied to the upper spaces to purify the air, temperature/humidity controller communicating with the urification section and the upper spaces to control the temperature and humidity of the air passing through the purification sections, and fans for supplying air to the top spaces from the temperature/humidity controller, lowering the air from the upper spaces into the process sections, and supplying at least some of the air lowering through the process sections to the temperature/humidity controller.

Abstract: A multipurpose controlled atmosphere heat treatment system applicable to small-quantity production of multiple items as well as mass-production. A delivery path is provided so as to pass through a workstation and the heat treatment system and an automatic guided vehicle travels along this delivery path. The automatic guided vehicle shuts out external air, comprises a holding chamber in which an inert gas atmosphere can be created, and shifts workpieces from an elevator provided in a high-rise warehouse into treatment cells. Each treatment cell has a sealing door on the side confronting to the automatic guided vehicle and pipes and various devices on a back face, ceiling or front face thereof.

Abstract: A vertical resistive combustion furnace having a vertically oriented combustion zone in which first and second coaxially aligned tubes depend. The first tube is open at one end and closed at the other. The second tube is open at one end and partially closed at the other end and is mounted within and spaced from the first tube with the space between the coaxial tubes defining a passage for combustion products produced from a sample of material to be analyzed, disposed in said second tube. The combustion products pass upwardly in the channel through the combustion zone of the furnace so that the combustion products are hot when they exit the furnace for analysis.

Abstract: A combustion chamber includes an inner cylindrical member concentrically mounted within an outer cylindrical member with a cylindrical space therebetween. The outer cylindrical member is enclosed at one end and both cylindrical members are open at an opposite end for access to the combustion area. The by-products of combustion are withdrawn from the inner cylindrical member at the closed end of the outer cylindrical member such that they reverse direction and circulate through the hot zone of the furnace in the cylindrical space. In a preferred embodiment of the invention, a porous ceramic plug which supports and spaces the tubes in concentric relationship at the one end and captures particulate by-products of the combustion holding them in the hot zone for complete combustion.

Abstract: A manifold (10) for use in a gas solder-reflow oven (50) comprises a hollow tube made from a transition metal having an open end (18) for receiving gas, a closed end (16), and a plurality of holes (12).

Abstract: Reversing the flow of conventional furnace/retort systems prevents damaging exhaust gases from entering the furnace while still maintaining a gas flow through the retort. The gases exit the retort into a treatment system; preventing contamination of any apparatus and the escape of any hazardous gases.

Abstract: A two-stage gas distribution nozzle for a muffle furnace includes an inner pipe with spaced apertures for feeding gas at spaced intervals to an outer pipe enclosing the inner pipe. The outer pipe includes spaced apertures facing in a direction such that the jets of gas from the inner pipe impinge on a wall of the outer pipe opposite the outer pipe apertures. The gas in the outer pipe is at lower pressure than the gas in the inner pipe and is more uniformly distributed along the length of the outer pipe to provide more uniform flow to the ambient atmosphere in the muffle.

Abstract: The present invention provides a method and apparatus for controlling the fluid flow bias of continuous, multiple zone processes having gas or vapor comprising atmospheres that are in immediate access to each other. Active control of the fluid flow bias in at least one process zone or control of the overall process fluid flow bias is achieved by applying force to at least one of the zones of the process in a manner which enables such control. A physical or chemical property or a change thereof in at least one process atmosphere is monitored and an appropriate amount of force is applied in response to the monitored property. The monitored property is related to the furnace flow bias by an algorithm, so that the flow bias can be controlled by controlling the at least one chemical or physical property monitored.

Abstract: An internal gas generator in combination with a standard heat treat furnace is provided for producing either an endothermic product gas or a purge gas. The generator includes a reaction tube containing alternating packed beds of a highly active catalyst and inert heat transfer particulates. The reaction tube is surrounded by an elongated tubular heating element which heats the reaction tube, the combination producing an acceptable product gas in a small arrangement suitable for retrofit applications to existing furnaces. A flanged mounting permits the reaction tube to be easily removed for standard replacement in the event of catalyst poisoning and the like.

Abstract: A controlled environment capsule for fluxless brazing comprising an open-bottom box, an end-plate and a foil gasket sealing means. Diffusion plates are disposed within the interior of the box and connected to an external source of inert gas. The inert gas is uniformly distributed over the work piece, excluding air from the capsule and the work piece by being maintained at a positive pressure relative to the external environment.

Abstract: A vapor processing system which has a vessel for containing a processing vapor generated by heating electronic fluid contained within the vessel. A selected saturated vapor zone level is devined for work product delivered to the vapor zone by generating a signal representative of the actual temperature at one of a plurality of spaced locations within the vessel, generating a signal representative of the desired temperature at the selected location for a saturated vapor zone having a level selected for the work product being conveyed to the saturated vapor zone, and comparing the signals representative of the actual and desired temperatures at the selected location and for varying the output of the heater to change the actual sensed temperature to the desired temperature so that the actual saturated vapor zone level will conform to the desired saturated vapor zone level.

Abstract: Apparatus for the drying of ferrous or non-ferrous turnings or scrap comprises a vertical axis drier (1) in which a drum (2) which encloses a transporter (3) for the turnings in question is mounted transversely. The turnings are heated indirectly via the drum (2) to evaporate their liquid content, while a protective atmosphere is maintained within the drum to prevent oxidation of the material. The vapors leaving the drum (2) are burnt in the drier (1) to heat the material and render the operation of the apparatus self-sufficient. As an alternative the vapors can be treated to recover their oil content, e.g. by distillation.

Abstract: A continuous heat treating furnace for heat treating a ferrous metal work in a protective atmosphere, including a furnace separated into a charge chamber and a heat treating chamber by a partition door and provided with a transport device for transporting the work. A first heating device, a recirculating fan and a gas purge device are provided in the charge chamber, while a second heating device is provided in the heat treating chamber supplied with the protective atmosphere, whereby the work is preheated through convectional heat transfer in the charge chamber simultaneously with high-temperature purging of the charge chamber and then, is heat treated under the protective atmosphere in the heat treating chamber.

Abstract: A non-oxidizing firing furnace for ceramic articles, which comprises a furnace chamber filled with a non-oxidizing gas, a conveyor mechanism provided on the floor portion of the furnace chamber and adapted to move the ceramic articles oppositely to a direction in which the non-oxidizing gas is flown through the furnace chamber for firing the ceramic articles; and at least one partition wall with the surface being composed of molybdenum which partition wall is provided at the ceiling portion of the furnace chamber to define a low temperature zone on the inlet side for the ceramic articles and a high temperature zone.

Abstract: A method and apparatus for heating semiconductor wafers characterized by the release of preheated nitrogen into an oven to considerably reduce heating time for the wafers. The oven is evacuated prior to the release of the preheated nitrogen.

Abstract: A method for annealing semiconductor samples, especially following ion-implantation of semiconductor samples is disclosed. A furnace on a set of rails is passed over the semiconductor sample which is supported on a stationary wire basket made of low thermal mass, fine tungsten wire. The furnace temperature may be about 5.degree. above the desired anneal temperature of the semiconductor sample such that the sample temperature rises to within a few degrees of the furnace temperature within seconds. Utilizing the moveable furnace insures uniform heating without elaborate temperature control or expensive beam generating equipment.The apparatus and process of the present invention are utilized for rapid annealing of ion-implanted indium phosphide semiconductors within 10 to 30 seconds and at temperatures of approximately 700.degree. C., thereby eliminating undesired and damaging movement of impurities within the ion-implanted InP.