Having Superconductive Component Patents (Class 438/2)
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Publication number: 20120187378Abstract: Computing bus devices that enable quantum information to be coherently transferred between conventional qubit pairs are disclosed. A concrete realization of such a quantum bus acting between conventional semiconductor double quantum dot qubits is described. The disclosed device measures the joint (fermion) parity of the two qubits by using the Aharonov-Casher effect in conjunction with an ancillary superconducting flux qubit that facilitates the measurement. Such a parity measurement, together with the ability to apply Hadamard gates to the two cubits, allows for the production of states in which the qubits are maximally entangled, and for teleporting quantum states between the quantum systems.Type: ApplicationFiled: November 9, 2011Publication date: July 26, 2012Applicant: Microsoft CorporationInventors: Parsa Bonderson, Roman Lutchyn
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Publication number: 20120112168Abstract: Computing bus devices that enable quantum information to be coherently transferred between topological and conventional qubits are disclosed. A concrete realization of such a topological quantum bus acting between a topological qubit in a Majorana wire network and a conventional semiconductor double quantum dot qubit is described, The disclosed device measures the joint (fermion) parity of the two different qubits by using the Aharonov-Casher effect in conjunction. with an ancillary superconducting flux qubit that facilitates the measurement. Such a parity measurement, together with the ability to apply Hadamard gates to the two qubits, allows for the production of states in which the topological and conventional qubits are maximally entangled, and for teleporting quantum states between the topological and conventional quantum systems.Type: ApplicationFiled: November 9, 2011Publication date: May 10, 2012Applicant: MICROSOFT COPORATIONInventors: Parsa Bonderson, Roman Lutchyn
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Publication number: 20120077680Abstract: Systems, articles, and methods are provided related to nanowire-based detectors, which can be used for light detection in, for example, single-photon detectors. In one aspect, a variety of detectors are provided, for example one including an electrically superconductive nanowire or nanowires constructed and arranged to interact with photons to produce a detectable signal. In another aspect, fabrication methods are provided, including techniques to precisely reproduce patterns in subsequently formed layers of material using a relatively small number of fabrication steps. By precisely reproducing patterns in multiple material layers, one can form electrically insulating materials and electrically conductive materials in shapes such that incoming photons are redirected toward a nearby electrically superconductive materials (e.g., electrically superconductive nanowire(s)). For example, one or more resonance structures (e.g.Type: ApplicationFiled: May 27, 2011Publication date: March 29, 2012Applicant: Massachusetts Institute of TechnologyInventors: Karl K. Berggren, Xiaolong Hu, Daniele Masciarelli
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Publication number: 20120049162Abstract: An implementation of a single qubit phase gate for use in a quantum information processing scheme based on the ?=5/2 fractional quantum Hall (FQH) state is disclosed. Using sack geometry, a qubit consisting of two ?-quasiparticles. which may be isolated on respective antidots, may be separated by a constriction from the bulk of a two-dimensional electron gas in the ?=5/2 FQH state. An edge quasiparticle may induce a phase gate on the qubit. The number of quasiparticles that are allowed to traverse the edge path defines which gate is induced. For example, if a certain number of quasiparticles are allowed to traverse the path, then a ?/8 gate may be effected.Type: ApplicationFiled: November 8, 2011Publication date: March 1, 2012Applicant: Microsoft CorporationInventors: Parsa Bonderson, Kirill Shtengel, David Clarke, Chetan Nayak
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Patent number: 8110476Abstract: In accordance with aspects of the invention, a method of forming a memory cell is provided, the method including forming a steering element above a substrate, and forming a memory element coupled to the steering element, wherein the memory element comprises a carbon-based material having a thickness of not more than ten atomic layers. The memory element may be formed by repeatedly performing the following steps: forming a layer of a carbon-based material, the layer having a thickness of about one monolayer, and subjecting the layer of carbon-based material to a thermal anneal. Other aspects are also described.Type: GrantFiled: April 6, 2009Date of Patent: February 7, 2012Assignee: SanDisk 3D LLCInventors: Roy E. Scheuerlein, Alper Ilkbahar, April D. Shricker
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Patent number: 8080432Abstract: A method of forming a STT-MTJ MRAM cell that utilizes transfer of spin angular momentum as a mechanism for changing the magnetic moment direction of a free layer. The device includes an IrMn pinning layer, a SyAP pinned layer, a naturally oxidized, crystalline MgO tunneling barrier layer that is formed on an Ar-ion plasma smoothed surface of the pinned layer and, in one embodiment, a free layer that comprises an amorphous layer of Co60Fe20B20. of approximately 20 angstroms thickness formed between two crystalline layers of Fe of 3 and 6 angstroms thickness respectively. The free layer is characterized by a low Gilbert damping factor and by very strong polarizing action on conduction electrons. The resulting cell has a low critical current, a high dR/R and a plurality of such cells will exhibit a low variation of both resistance and pinned layer magnetization angular dispersion.Type: GrantFiled: June 21, 2010Date of Patent: December 20, 2011Assignee: MagIC Technologies, Inc.Inventors: Cheng T. Horng, Ru-Ying Tong, Chyu-Jiuh Torng, Witold Kula
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Patent number: 8063410Abstract: A nitride semiconductor light-emitting device including a reflecting layer made of a dielectric material, a transparent conductive layer, a p-type nitride semiconductor layer, a light emitting layer and an n-type nitride semiconductor layer in this order and a method of manufacturing the same are provided. The transparent conductive layer is preferably made of a conductive metal oxide or an n-type nitride semiconductor, and the reflecting layer made of a dielectric material preferably has a multilayer structure obtained by alternately stacking a layer made of a dielectric material having a high refractive index and a layer made of a dielectric material having a low refractive index.Type: GrantFiled: August 4, 2009Date of Patent: November 22, 2011Assignee: Sharp Kabushiki KaishaInventor: Mayuko Fudeta
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Publication number: 20110254053Abstract: This field-effect superconductor transistor (2) comprises a source electrode (4) and a drain electrode (6), connected by a superconducting channel (12), the channel (12) and the source (4) and drain (6) electrodes being arranged on a substrate (16), and a gate electrode (8) covering the channel (12). A layer (14) of semiconductor material is arranged between the channel (12) and the gate electrode (8), to control over the critical current of the superconducting channel (12) between a minimum value Ic_min and a maximum value Ic_max, by controlling the surface roughness of said channel (12), said surface roughness being controlled by combining the proximity effect between the superconducting channel (12) and the layer (14) of semiconductor material with the field effect in the layer (14) of semiconductor material by polarising the gate electrode (8).Type: ApplicationFiled: May 29, 2009Publication date: October 20, 2011Applicants: Ensicaen, Centre National De La Recherche Scientifique (C.N.R.S.)Inventors: Christophe Goupil, Alain Pautrat, Charles Simon, Patrice Mathieu
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Patent number: 8034637Abstract: Techniques for exchange coupling of magnetic layers in semiconductor devices are provided. In one aspect, a semiconductor device is provided. The device comprises at least two magnetic layers, and a spacer layer formed between the magnetic layers, the spacer layer being configured to provide ferromagnetic exchange coupling between the layers, the magnetic layers experiencing anti-ferromagnetic dipole coupling, such that a net coupling of the magnetic layers is anti-ferromagnetic in a zero applied magnetic field. The semiconductor device may comprise magnetic random access memory (MRAM). In another aspect, a method for coupling magnetic layers in a semiconductor device comprising at least two magnetic layers and a spacer layer therebetween, the method comprises the following step.Type: GrantFiled: August 11, 2009Date of Patent: October 11, 2011Assignee: International Business Machines CorporationInventor: Daniel Christopher Worledge
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Publication number: 20110222848Abstract: A novel method and apparatus for long distance quantum communication in realistic, lossy photonic channels is disclosed. The method uses single emitters of light as intermediate nodes in the channel. One electronic spin and one nuclear spin coupled via the contact hyperfine interaction in each emitter, provide quantum memory and enable active error purification. It is shown that the fixed, minimal physical resources associated with these two degrees of freedom suffice to correct arbitrary errors, making our protocol robust to all realistic sources of decoherence. The method is particularly well suited for implementation using recently-developed solid-state nano-photonic devices.Type: ApplicationFiled: October 11, 2006Publication date: September 15, 2011Inventors: Mikhail Lukin, Lillian I. Childress, Jacob M. Taylor, Anders S. Sorensen
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Patent number: 8003410Abstract: A method of operating a quantum system comprising computational elements, including an insulated ring of superconductive material, and semi-closed rings used as an interface between the computational elements and the external world, is disclosed. In one aspect, the method comprises providing an electrical signal, e.g. a current, in an input ring magnetically coupled to a computational element, which generates a magnetic field in the computational element and sensing the change in the current and/or voltage of an output element magnetically coupled to the computational element. The electrical input signal can be an AC signal or a DC signal. The computational element is electromagnetically coupled with other adjacent computational elements and/or with the interface elements. The corresponding magnetic flux between the computational elements and/or the interface elements acts as an information carrier. Ferromagnetic cores are used to improve the magnetic coupling between adjacent elements.Type: GrantFiled: September 25, 2008Date of Patent: August 23, 2011Assignees: IMEC, Katholieke Universiteit LeuvenInventors: Christoph Kerner, Wim Magnus, Dusan Golubovic
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Patent number: 7973303Abstract: A nitride semiconductor device includes n-type and p-type nitride semiconductor layers, an active layer, the active layer having a lamination of quantum barrier layers and quantum well layers, a thermal stress control layer disposed between the n-type nitride semiconductor layer and the active layer, and formed of a material having a smaller thermal expansion coefficient than the n-type and p-type nitride semiconductor layers, and a lattice stress control layer disposed between the thermal stress control layer and the active layer, and including a first layer and a second layer.Type: GrantFiled: October 15, 2009Date of Patent: July 5, 2011Assignee: Samsung Led Co., Ltd.Inventors: Tan Sakong, Youn Joon Sung, Jeong Wook Lee
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Publication number: 20110156008Abstract: Disclosed herein is a protocol that enables the ?/8-gate in chiral topological superconductors in which superconducting stiffness ? has been suppressed. The protocol enables a topologically protected ?/8-gate in any pure Ising system that can be fabricated into genus=1 surface. By adding the ?/8-gate to previously known techniques, a design for universal topologically protected quantum computation which may be implemented using rather conventional materials may be obtained.Type: ApplicationFiled: December 28, 2010Publication date: June 30, 2011Applicant: Microsoft CorporationInventors: Michael Freedman, Parsa Bonderson, Chetan Nayak, Sankar Das Sarma
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Patent number: 7968352Abstract: The invention describes a method of achieving superconductivity in Group IV semiconductors via the addition of doubly charged impurity atoms to the crystal lattice. The doubly charged impurities function as composite bosons in the semiconductor. Increasing the density of the composite bosons to a level where their wavefunctions overlap, results in the formation of a Bose condensate. The concentration of the doubly charged impurity atoms in the host lattice and the binding energy of the impurities are important factors in determining whether a Bose condensate will form. Doubly charged impurities must be present in the semiconductor at a concentration at which they exhibit overlapping wavefunctions, but still exist within the crystal lattice as bosons.Type: GrantFiled: November 29, 2010Date of Patent: June 28, 2011Inventor: William G. Wise
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Publication number: 20110129945Abstract: The invention describes a method of achieving superconductivity in Group IV semiconductors via the addition of doubly charged impurity atoms to the crystal lattice. The doubly charged impurities function as composite bosons in the semiconductor. Increasing the density of the composite bosons to a level where their wavefunctions overlap, results in the formation of a Bose condensate. The concentration of the doubly charged impurity atoms in the host lattice and the binding energy of the impurities are important factors in determining whether a Bose condensate will form. Doubly charged impurities must be present in the semiconductor at a concentration at which they exhibit overlapping wavefunctions, but still exist within the crystal lattice as bosons.Type: ApplicationFiled: November 29, 2010Publication date: June 2, 2011Inventor: William Griffin Wise
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Publication number: 20110089405Abstract: Various techniques and apparatus permit fabrication of superconductive circuits and structures, for instance Josephson junctions, which may, for example be useful in quantum computers. For instance, a low magnetic flux noise trilayer structure may be fabricated having a dielectric structure or layer interposed between two elements or layers capable of superconducting. A superconducting via may directly overlie a Josephson junction. A structure, for instance a Josephson junction, may be carried on a planarized dielectric layer. A fin may be employed to remove heat from the structure. A via capable of superconducting may have a width that is less than about 1 micrometer. The structure may be coupled to a resistor, for example by vias and/or a strap connector.Type: ApplicationFiled: February 25, 2010Publication date: April 21, 2011Applicant: D-WAVE SYSTEMS INC.Inventors: Eric Ladizinsky, Geordie Rose, Jeremy P. Hilton, Eugene Dantsker, Byong Hyop Oh
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Patent number: 7923717Abstract: A switching device has an S (Superconductor)-N (Normal Metal)-S superlattice to control the stream of electrons without any dielectric materials. Each layer of said Superconductor has own terminal. The superlattice spacing is selected based on “Dimensional Crossover Effect”. This device can operate at a high frequency without such energy losses as devices breaking the superconducting state. The limit of the operation frequency in the case of the Nb/Cu superlattice is expected to be in the order of 1018 Hz concerning plasmon loss energy of the normal metals (Cu; in the order of 103 eV).Type: GrantFiled: December 28, 2007Date of Patent: April 12, 2011Inventor: Katsuyuki Tsukui
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Publication number: 20110062423Abstract: Terahertz radiation source and method of producing terahertz radiation, said source comprising a junction stack, said junction stack comprising a crystalline material comprising a plurality of self-synchronized intrinsic Josephson junctions; an electrically conductive material in contact with two opposing sides of said crystalline material; and a substrate layer disposed upon at least a portion of both the crystalline material and the electrically-conductive material, wherein the crystalline material has a c-axis which is parallel to the substrate layer, and wherein the source emits at least 1 mW of power.Type: ApplicationFiled: September 14, 2009Publication date: March 17, 2011Applicant: LOS ALAMOS NATIONAL SECURITY, LLCInventors: Lev Boulaevskii, David M. Feldmann, Quanxi Jia, Alexei Koshelev, Nathan A. Moody
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Patent number: 7829352Abstract: This disclosure relates to a system and method for creating nano-object arrays. A nano-object array can be created by exposing troughs in a corrugated surface to nano-objects and depositing the nano-objects within or orienting the nano-objects with the troughs.Type: GrantFiled: July 14, 2006Date of Patent: November 9, 2010Assignee: Hewlett-Packard Development Company, L.P.Inventors: Pavel Kornilovich, Peter Mardilovich, James Stasiak
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Publication number: 20100264402Abstract: An implementation of a single qubit phase gate for use in a quantum information processing scheme based on the ?=5/2 fractional quantum Hall (FQH) state is disclosed. Using sack geometry, a qubit consisting of two ?-quasiparticles. which may be isolated on respective antidots, may be separated by a constriction from the bulk of a two-dimensional electron gas in the ?=5/2 FQH state. An edge quasiparticle may induce a phase gate on the qubit. The number of quasiparticles that are allowed to traverse the edge path defines which gate is induced. For example, if a certain number of quasiparticles are allowed to traverse the path, then a ?/8 gate may be effected.Type: ApplicationFiled: August 28, 2009Publication date: October 21, 2010Applicant: Microsoft CorporationInventors: Parsa Bonderson, Kirill Shtengel, David Clarke, Chetan Nayak
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Patent number: 7767469Abstract: A magnetic random access memory includes, a lower electrode, a magnetoresistive element which is arranged above the lower electrode and has side surfaces, and a protective film which covers the side surfaces of the magnetoresistive element, has a same planar shape as the lower electrode, and is formed by one of sputtering, plasma CVD, and ALD.Type: GrantFiled: April 24, 2008Date of Patent: August 3, 2010Assignee: Kabushiki Kaisha ToshibaInventors: Yoshiaki Asao, Hiroaki Yoda
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Patent number: 7750232Abstract: A multi-crystalline silicon germanium bulk crystal with microscopic compositional distribution is adapted for use in solar cells to substantially increase conversion efficiency. By controlling the average Ge concentration between 0.1 and 8.0 mole percent, significant improvements are attained with respect to short circuit current density and conversion efficiency.Type: GrantFiled: July 8, 2005Date of Patent: July 6, 2010Assignee: Sumco Solar CorporationInventors: Kazuo Nakajima, Wugen Pan, Kozo Fujiwara, Noritaka Usami
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Patent number: 7749774Abstract: A method and apparatus for the manipulation of colloidal particles and biomolecules at the interface between an insulating electrode such as silicon oxide and an electrolyte solution. Light-controlled electrokinetic assembly of particles near surfaces relies on the combination of three functional elements: the AC electric field-induced assembly of planar aggregates; the patterning of the electrolyte/silicon oxide/silicon interface to exert spatial control over the assembly process; and the real-time control of the assembly process via external illumination. The present invention provides a set of fundamental operations enabling interactive control over the creation and placement of planar arrays of several types of particles and biomolecules and the manipulation of array shape and size. The present invention enables sample preparation and handling for diagnostic assays and biochemical analysis in an array format, and the functional integration of these operations.Type: GrantFiled: August 21, 2003Date of Patent: July 6, 2010Inventor: Michael Seul
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Patent number: 7741634Abstract: A Josephson junction (JJ) device includes a buffered substrate comprising a first buffer layer formed on a substrate. A second buffer layer is formed on the first buffer layer. The second buffer layer includes a hexagonal compound structure. A trilayer structure is formed on the buffered substrate comprising at least two layers of a superconducting material. A thin tunnel barrier layer is positioned between the at least two layers. The buffered substrate is used to minimize lattice mismatch and interdiffusion in the trilayer structure so as to allow the JJ device to operate above 20 K.Type: GrantFiled: March 26, 2008Date of Patent: June 22, 2010Assignee: Massachusetts Institute of TechnologyInventors: Heejae Shim, Jagadeesh S. Moodera
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Patent number: 7718487Abstract: A method of manufacturing a ferroelectric layer, including: forming a first ferroelectric layer above a base by a vapor phase method; and forming a second ferroelectric layer above the first ferroelectric layer by a liquid phase method.Type: GrantFiled: April 27, 2006Date of Patent: May 18, 2010Assignee: Seiko Epson CorporationInventor: Takeshi Kijima
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Patent number: 7652370Abstract: Provided are a plastic microfabricated structure, and a microfabricated thermal device, a microfabricated reactor, a microfabricated reactor array and a micro array using the same, which may be applied to a bio chip, and the present invention may fabricate the plastic microfabricated structure for providing a heating region by means of insulating plastic, which has a thin thickness, flatness enough to allow a photolithography process to be performed, thermal isolation in its some or total area, and a small thermal mass, and on top of the heating region of the plastic microfabricated structure, a heater, a temperature sensor for sensing a temperature, an electrode, and an electrode pad are formed to thereby fabricate the microfabricated heating device, whereby element may be readily fabricated at a low cost, and the heating region is formed of a plastic thin layer, so that uniform temperature control is possible even with a low power, and various samples may be thermally treated at a fast speed to obtain theirType: GrantFiled: July 27, 2004Date of Patent: January 26, 2010Assignee: Electronics and Telecommunications Research InstituteInventors: Dae Sik Lee, Hae Sik Yang, Yong Taik Lim, Kwang Hyo Chung, Sung Jin Kim, Se Ho Park, Kyu Won Kim, Yun Tae Kim
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Publication number: 20090321720Abstract: A quantum processor may employ a heterogeneous qubit-coupling architecture to reduce the average number of intermediate coupling steps that separate any two qubits in the quantum processor, while limiting the overall susceptibility to noise of the qubits. The architecture may effectively realize a small-world network where the average qubit has a low connectivity (thereby allowing it to operate substantially quantum mechanically) but each qubit is within a relatively low number of intermediate coupling steps from any other qubit. To realize such, some of the qubits may have a relatively high connectivity, and may thus operate substantially classically.Type: ApplicationFiled: June 12, 2009Publication date: December 31, 2009Inventor: Geordie Rose
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Publication number: 20090315021Abstract: An improved microfabrication technique for Josephson junctions in superconducting integrated circuits, based on the use of a double-layer lithographic mask for partial anodization of the side-walls and base electrode of the junctions. The top layer of the mask is a resist material, and the bottom layer is a dielectric material chosen so to maximize adhesion between the resist and the underlying superconducting layer, be etch-compatible with the underlying superconducting layer, and be insoluble in the resist and anodization processing chemistries. The superconductor is preferably niobium, under a silicon dioxide layer, with a conventional photoresist or electron-beam resist as the top layer. This combination results in a substantial increase in the fabrication yield of high-density superconducting integrated circuits, increase in junction uniformity and reduction in defect density. A dry etch more compatible with microlithography may be employed.Type: ApplicationFiled: December 30, 2008Publication date: December 24, 2009Applicant: HYPRES, INC.Inventor: Sergey K. Tolpygo
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Patent number: 7615385Abstract: A new technique is presented for improving the microfabrication yield of Josephson junctions in superconducting integrated circuits. This is based on the use of a double-layer lithographic mask for partial anodization of the side-walls and base electrode of the junctions. The top layer of the mask is a resist material, and the bottom layer is a dielectric material chosen so as to a) maximize adhesion between the resist and the underlying superconducting layer, b) be etch-compatible with the underlying superconducting layer, and c) be insoluble in the resist and anodization processing chemistries. In a preferred embodiment of the invention, the superconductor is niobium, the material on top of this is silicon dioxide, and the top layer is conventional photoresist or electron-beam resist. The use of this combination results in a substantial increase in the fabrication yield of high-density superconducting integrated circuits due to increase in junction uniformity and reduction in defect density.Type: GrantFiled: December 27, 2006Date of Patent: November 10, 2009Assignee: Hypres, IncInventor: Sergey K. Tolpygo
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Publication number: 20090247410Abstract: A Josephson junction (JJ) device includes a buffered substrate comprising a first buffer layer formed on a substrate. A second buffer layer is formed on the first buffer layer. The second buffer layer includes a hexagonal compound structure. A trilayer structure is formed on the buffered substrate comprising at least two layers of a superconducting material. A thin tunnel barrier layer is positioned between the at least two layers. The buffered substrate is used to minimize lattice mismatch and interdiffusion in the trilayer structure so as to allow the JJ device to operate above 20 K.Type: ApplicationFiled: March 26, 2008Publication date: October 1, 2009Inventors: Heejae Shim, Jagadeesh S. Moodera
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Patent number: 7592656Abstract: An Al2O3 film with a thickness greater than that of a wiring is formed as a protective film, and then the Al2O3 film is polished by CMP until a conductive barrier film is exposed. Namely, CMP is applied to the Al2O3 film by utilizing the conductive barrier film as a stopper film. Next, a silicon oxide film is formed over the entire surface by, for example, a high-density plasma method, and then the surface thereof is flattened. Subsequently, another Al2O3 film is formed on the silicon oxide film as a protective film for preventing intrusion of hydrogen or moisture. Further, another silicon oxide film is formed on the Al2O3 film, for example, by a high-density plasma method. Then, a via hole reaching the conductive barrier film is formed through the silicon oxide film, the Al2O3 film and the silicon oxide film, and then a W plug is embedded therein.Type: GrantFiled: July 29, 2005Date of Patent: September 22, 2009Assignee: Fujitsu LimitedInventors: Hideaki Kikuchi, Kouichi Nagai
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Patent number: 7576355Abstract: Provided is an electronic device, a field effect transistor having the electronic device, and a method of manufacturing the electronic device and the field effect transistor. The electronic device includes: a substrate; a first electrode and a second electrode which are formed in parallel to each other on the substrate, each of the first electrode and the second electrode comprising two electrode pads separated from each other and a heating element that connect the two electrode pads; a catalyst metal layer formed on the heating element of the first electrode; and a carbon nanotube connected to the second electrode by horizontally growing from the catalyst metal layer; wherein the heating elements are separated from the substrate by etching the substrate under the heating elements of the first and the second electrodes.Type: GrantFiled: September 6, 2007Date of Patent: August 18, 2009Assignee: Samsung Electronics Co., Ltd.Inventors: Jun-hee Choi, Andrei Zoulkarneev
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Patent number: 7560291Abstract: A layered article of manufacture and a method of manufacturing same is disclosed. A substrate has a biaxially textured MgO crystalline layer having the c-axes thereof inclined with respect to the plane of the substrate deposited thereon. A layer of one or more of YSZ or Y2O3 and then a layer of CeO2 is deposited on the MgO. A crystalline superconductor layer with the c-axes thereof normal to the plane of the substrate is deposited on the CeO2 layer. Deposition of the MgO layer on the substrate is by the inclined substrate deposition method developed at Argonne National Laboratory. Preferably, the MgO has the c-axes thereof inclined with respect to the normal to the substrate in the range of from about 10° to about 40° and YBCO superconductors are used.Type: GrantFiled: January 11, 2006Date of Patent: July 14, 2009Assignee: UChicago Argonne, LLCInventors: Uthamalingam Balachandran, Beihai Ma, Dean Miller
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Patent number: 7544964Abstract: A method for producing a thin layer device such as a superconductive device excellent in mechanical strength and useful as a submillimeter band receiver is provided. The thin layer device is produced by forming a multilayer structure substance comprising an NbN/MgO/NbN-SIS junction on an MgO temporary substrate, then forming SiO2, as a substrate, on said multilayer structure substance, and subsequently removing the MgO temporary substrate by etching. A superconductive device (a thin layer device) produced by a method of the present invention has excellent performance and high mechanical strength, and therefore introduction to a waveguide for a submillimeter band is also easy.Type: GrantFiled: September 25, 2006Date of Patent: June 9, 2009Assignee: National Institute of Information and Communications Technology, Incorporated Administrative AgencyInventor: Akira Kawakami
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Patent number: 7541198Abstract: A method of forming a quantum system comprising computational elements, consisting of an insulated ring of superconductive material, and semi-closed rings, which are used as an interface or input/output facility between the quantum bit and the external world, is disclosed. Faraday induction is used to provide electromagnetic coupling between adjacent computational elements and between the computational elements with interface elements of the quantum system. Therefore the corresponding magnetic flux acts as an information carrier. Ferromagnetic cores are used to improve the magnetic coupling between adjacent elements of the quantum system.Type: GrantFiled: February 28, 2006Date of Patent: June 2, 2009Assignees: Interuniversitair Microelektronica Centrum vzw (IMEC), Katholieke Universiteit LeuvenInventors: Wim Magnus, Christoph Kerner, Wim Schoenmaker
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Publication number: 20080312088Abstract: Provided are a field effect transistor, a logic circuit including the same and methods of manufacturing the same. The field effect transistor may include an ambipolar layer that includes a source region, a drain region, and a channel region between the source region and the drain region, wherein the source region, the drain region, and the channel region may be formed in a monolithic structure, a gate electrode on the channel region, and an insulating layer separating the gate electrode from the ambipolar layer, wherein the source region and the drain region have a width greater than that of the channel region in a second direction that crosses a first direction in which the source region and the drain region are connected to each other.Type: ApplicationFiled: December 27, 2007Publication date: December 18, 2008Inventors: Hyun-jong Chung, Ran-ju Jung, Sun-ae Seo, Dong-chul Kim, Chang-won Lee
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Patent number: 7371586Abstract: A superconductor and a method for producing the same are provided. The method for producing a superconductor includes the step of forming a superconducting layer on a base layer by performing a film deposition at least three times, wherein the film thickness of a superconducting film in each film deposition is 0.3 ?m or less. In such a case, even when the layer thickness of the superconducting layer is increased, the decrease in the Jc is suppressed and the Ic is increased.Type: GrantFiled: August 6, 2004Date of Patent: May 13, 2008Assignee: Sumitomo Electric Industries, Ltd.Inventors: Shuji Hahakura, Kazuya Ohmatsu
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Publication number: 20080070325Abstract: A new technique is presented for improving the microfabrication yield of Josephson junctions in superconducting integrated circuits. This is based on the use of a double-layer lithographic mask for partial anodization of the side-walls and base electrode of the junctions. The top layer of the mask is a resist material, and the bottom layer is a dielectric material chosen so as to a) maximize adhesion between the resist and the underlying superconducting layer, b) be etch-compatible with the underlying superconducting layer, and c) be insoluble in the resist and anodization processing chemistries. In a preferred embodiment of the invention, the superconductor is niobium, the material on top of this is silicon dioxide, and the top layer is conventional photoresist or electron-beam resist. The use of this combination results in a substantial increase in the fabrication yield of high-density superconducting integrated circuits due to increase in junction uniformity and reduction in defect density.Type: ApplicationFiled: December 27, 2006Publication date: March 20, 2008Inventor: Sergey K. Tolpygo
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Publication number: 20080051292Abstract: A Josephson device includes a first superconducting electrode layer, a barrier layer and a second superconducting electrode layer that are successively stacked. The first and second superconducting electrode layers are made of an oxide superconductor material having (RE)1(AE)2Cu3Oy as a main component, where an element RE is at least one element selected from a group consisting of Y, La, Pr, Nd, Sm, Eu, Gd, Dy, Ho, Er, Tm, Yb and Lu, and an element AE is at least one element selected from a group consisting of Ba, Sr and Ca. The barrier layer is made of a material that includes the element RE, the element AE, Cu and oxygen, where in cations within the material forming the barrier layer, a Cu content is in a range of 35 At. % to 55 At. % and an RE content is in a range of 12 At. % to 30 At. %, and the barrier layer has a composition different from compositions of the first and second superconducting electrode layers.Type: ApplicationFiled: August 23, 2007Publication date: February 28, 2008Inventors: Hironori Wakana, Seiji Adachi, Koji Tsubone, Keiichi Tanabe
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Patent number: 7323348Abstract: A superconducting integrated circuit includes a substrate, a multilayer structure formed on the substrate and composed of a lower superconducting electrode, a tunnel barrier and an upper superconducting electrode sequentially joined together upward in the order mentioned, and an insulating layer perforated to form via holes to get electrical contacts with the lower and upper electrodes. The insulating layer is formed of a high-resolution, photosensitive, solvent-soluble, organic insulating material. The superconducting integrated circuit is produced by a method that includes the steps of depositing the multiplayer on the substrate, applying the insulating material to the front surface of the substrate inclusive of the multiplayer, forming the via holes in the insulating material by the lithographic technique at the prospective positions to get electrical contacts with the upper and lower electrodes, and laying wirings for connecting the upper and lower electrodes through the via holes.Type: GrantFiled: January 11, 2005Date of Patent: January 29, 2008Assignees: National Institute of Advanced Industrial Science and Technology, PI R&D Co., LtdInventors: Masahiro Aoyagi, Hiroshi Nakagawa, Kazuhiko Tokoro, Katsuya Kikuchi, Hiroshi Itatani, Sigemasa Segawa
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Patent number: 7314765Abstract: A switching device has an S (Superconductor)-N (Normal Metal)-S superlattice to control the stream of electrons without any dielectric materials. Each layer of said Superconductor has own terminal. The superlattice spacing is selected based on “Dimensional Crossover Effect”. This device can operate at a high frequency without such energy losses as devices breaking the superconducting state. The limit of the operation frequency in the case of the Nb/Cu superlattice is expected to be in the order of 1018 Hz concerning plasmon loss energy of the normal metals (Cu; in the order of 103 eV).Type: GrantFiled: October 26, 2005Date of Patent: January 1, 2008Inventor: Katsuyuki Tsukui
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Patent number: 7223611Abstract: This disclosure relates to a system and method for creating nanowires. A nanowire can be created by exposing layers of material in a superlattice and dissolving and transferring material from edges of the exposed layers onto a substrate. The nanowire can also be created by exposing layers of material in a superlattice and depositing material onto edges of the exposed layers.Type: GrantFiled: October 7, 2003Date of Patent: May 29, 2007Assignee: Hewlett-Packard Development Company, L.P.Inventors: Pavel Kornilovich, Peter Mardilovich, Kevin Francis Peters, James Stasiak
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Patent number: 7205643Abstract: A stray field shielding structure for die attaching onto a magnetic random access memory chip or to other chips to prevent loss of memory due to magnetic fields or radiation is made by a method which provides a thick layer of magnetic material which is precise in its dimensions and adapted for placement on individual die by existing pick and place machines and die attach bonders. The magnetic shielding material is cut to a desired size by etching to remove all burrs and debris and is then attached only to good die using a die attach film of thermoset plastic or a gob of epoxy adhesive.Type: GrantFiled: March 8, 2005Date of Patent: April 17, 2007Inventor: David Walter Smith
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Patent number: 7141438Abstract: There are provided a magnetic tunnel junction structure and a method of fabricating the same. The magnetic tunnel junction structure includes a lower electrode, a lower magnetic layer pattern and a tunnel layer pattern, which are sequentially formed on the lower electrode. The magnetic tunnel junction structure further includes an upper magnetic layer pattern, a buffer layer pattern, and an upper electrode, which are sequentially formed on a portion of the tunnel layer pattern. The sidewall of the upper magnetic layer pattern is surrounded by an oxidized upper magnetic layer, and the sidewall of the buffer layer pattern is surrounded by an oxidized buffer layer. The depletion of the upper magnetic layer pattern and the lower magnetic layer pattern in the magnetic tunnel junction region can be prevented by the oxidized buffer layer.Type: GrantFiled: August 10, 2004Date of Patent: November 28, 2006Assignee: Samsung Electronics Co., Ltd.Inventors: Young-Ki Ha, Jang-Eun Lee, Hyun-Jo Kim, Se-Chung Oh, Jun-Soo Bae, In-Gyu Baek
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Patent number: 7060508Abstract: A superconductor integrated circuit (1) includes an anodization ring (35) disposed around a perimeter of a tunnel junction region (27) for preventing a short-circuit between an outside contact (41) and the base electrode layer (18). The tunnel junction region (27) includes a junction contact (31) with a diameter of approximately 1.00 ?m or less defined by a top surface of the counter electrode layer (24). The base electrode layer (18) includes an electrode isolation region (36) disposed approximately 0.8 ?m in horizontal distance from the junction contact (31) for providing device isolation.Type: GrantFiled: February 12, 2003Date of Patent: June 13, 2006Assignee: Northrop Grumman CorporationInventor: George L. Kerber
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Patent number: 7018852Abstract: A method for performing a single-qubit gate on an arbitrary quantum state. An ancillary qubit is set to an initial state |I>. The data qubit is coupled to an ancillary qubit. The state of the ancillary qubit is measured, and the data qubit and the ancillary qubit are coupled for a first period of time. A method for applying a single-qubit gate to an arbitrary quantum state. A state of a first and second ancillary qubit are set to an entangled initial state |I>. A state of a data qubit and the first ancillary qubit are measured thereby potentially performing a single qubit operation on the arbitrary quantum state. A first result is determined. The first result indicates whether the single qubit operation applied the single qubit gate to the arbitrary quantum state.Type: GrantFiled: July 25, 2003Date of Patent: March 28, 2006Assignees: D-Wave Systems, Inc., The Governing Council of the University of TorontoInventors: Lian-Ao Wu, Daniel Lidar, Alexandre Blais
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Patent number: 6908771Abstract: A DC superconducting interference device (SQUID) utilizes intrinsic Josephson tunnel junctions formed naturally in stacks of high-Tc superconducting single crystals, where the double-side cleaving technique is used to define a ring-shaped high-Tc superconducting structure with two stacks of intrinsic Josephson junctions inserted in the ring.Type: GrantFiled: May 9, 2003Date of Patent: June 21, 2005Assignee: Postech FoundationInventors: Hu-Jong Lee, Young-Wook Son, Jong-Hoon Bae, Myung-Ho Bae
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Patent number: 6890766Abstract: A microelectronic device includes a gate layer adapted to receive an input voltage. An insulating layer is formed on the gate layer, and a conductive channel layer is formed on the insulating layer and carries current between a source and a drain. The conductive channel layer is adapted to provide a dual channel. The dual channel includes both a p-channel and an n-channel wherein one of the p-channel and the n-channel are selectively enabled responsive to the input voltage polarity. A method for forming the device and applications are also disclosed and claimed.Type: GrantFiled: April 21, 2003Date of Patent: May 10, 2005Assignee: International Business Machines CorporationInventors: Thomas Doderer, Wei Hwang, Chang C. Tsuei
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Patent number: 6846682Abstract: A route to the fabrication of electronic devices is provided, in which the devices consist of two crossed wires sandwiching an electrically addressable molecular species. The approach is extremely simple and inexpensive to implement, and scales from wire dimensions of several micrometers down to nanometer-scale dimensions. The device of the present invention can be used to produce crossbar switch arrays, logic devices, memory devices, and communication and signal routing devices. The present invention enables construction of molecular electronic devices on a length scale than can range from micrometers to nanometers via a straightforward and inexpensive chemical assembly procedure. The device is either partially or completely chemically assembled, and the key to the scaling is that the location of the devices on the substrate are defined once the devices have been assembled, not prior to assembly.Type: GrantFiled: July 17, 2001Date of Patent: January 25, 2005Assignee: Hewlett-Packard Development Company, L.P.Inventors: James R. Heath, R. Stanley Williams, Philip J. Kuekes
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Patent number: 6830950Abstract: Disclosed herein is a method of improving the adhesion of a hydrophobic self-assembled monolayer (SAM) coating to a surface of a MEMS structure, for the purpose of preventing stiction. The method comprises pretreating surfaces of the MEMS structure with a plasma generated from a source gas comprising oxygen and, optionally, hydrogen. The treatment oxidizes the surfaces, which are then reacted with hydrogen to form bonded OH groups on the surfaces. The hydrogen source may be present as part of the plasma source gas, so that the bonded OH groups are created during treatment of the surfaces with the plasma. Also disclosed herein is an integrated method for release and passivation of MEMS structures.Type: GrantFiled: November 20, 2002Date of Patent: December 14, 2004Assignee: Applied Materials, Inc.Inventors: Jeffrey D. Chinn, Rolf A. Guenther, Michael B. Rattner, James A. Cooper, Toi Yue Becky Leung