Abstract: An abrasive element consisting substantially of a glass material that is at least partially devitrified.

Abstract: Curved plastic objects and systems and methods for deburring the same are disclosed. The curved plastic object can be the cap or grill of a headphone or earbud.

Abstract: A vibratory finishing medium element having at least a portion comprising a devitrified material.

Abstract: A structure for deburring a ball is provided. The structure includes an arm, a gear structure for changing the effective length of the arm, and a cam structure for changing the effective angular position of the arm. A finger having an abrasive surface reciprocates on the arm. A ball is placed in a rotating holder and positioned in effective position for the abrasive surface to contact and remove at least one burr on the ball.

Abstract: A vertically oscillating working device 2 has a body to be oscillated 23 having an inner space that is formed by a cover member 21 and a vehicle wheel 22, which is a body to be worked, and receives working materials 25 in it and also has oscillating means for vertically oscillating the body to be oscillated 23. The working materials 25 are allowed to collide with the vehicle wheel 22 by the oscillation, and thereby the vehicle wheel 22 is worked. With the working device 2, a casting can be oscillated together with hardening materials, and excellent mechanical properties can be uniformly added to a predetermined portion of the casting by the oscillation without changing the position of the casting.

Abstract: A mechanical device for lapping, and a method therefore, the device including: (a) a metal workpiece having a metal working surface; (b) a contact surface, disposed generally opposite the working surface, for moving in a relative motion to the working surface; (c) abrasive particles disposed between the contact surface and the working surface, and (d) a mechanism, associated with the working surface and/or the contact surface, for applying the relative motion, and for exerting a load in a substantially normal direction to the contact surface and the working surface, the contact surface for providing an at least partially elastic interaction with the plurality of abrasive particles, wherein, associated with the contact surface is a particulate additive, and wherein, upon activation of the mechanism, the relative motion under the load causes a portion of the abrasive particles to penetrate the working surface, and wherein the relative motion under the load effects incorporation of a portion of the particulate a

Abstract: There is provided a surface treated product that moves relatively in a fluid, wherein a surface of the surface treated product has continuous dimples, each dimple having a diameter of 10 to 2500 ?m and a depth of 50 ?m or less. The surface treated product significantly reduces resistance of a fluid to an object in the fluid, and significantly improves a flow state of the fluid.

Abstract: The a present invention is related to an abrasive cleaning article, made of spread abrasive particles and microencapsulated particles of an aromatizing substance contained in urea-formaldehyde walls, through a three-dimensional non-woven web of fiber that are bonded to the web by a resin adhesive. The item, of any geometric shape, offers the user a sensation of cleanliness due to the constant presence of a “fresh” scent associated to the fiber; the scent remains during the whole life of the abrasive item since the microcapsules break partially during the normal use of the item. The invention also refers to the production process of such abrasive item.

Abstract: There are disclosed a polishing method and a polishing device in which cleaning of a glass substrate surface can be achieved to a high level. A glass substrate (MD substrate 1) in the shape of a circular disc having a circular hole in a center portion is immersed in an abrasive liquid 50 containing free abrasive grains, and an inner peripheral end surface of the glass substrate is polished using the abrasive liquid containing the free abrasive grains by rotating a rotary brush 4 or a polishing pad in contact with the inner peripheral end surface.

Abstract: The outer periphery of a workpiece (semiconductor wafer) 42 is caused to come into contact with an abrasive material (abrasive cloth) 28 in a cylindrical polishing drum 23, and the polishing drum 23 and the workpiece 42 are relatively rotated, whereby the region where the outer periphery of the workpiece is in contact with the abrasive cloth 28 is increased and a polishing effect can be increased.